JP1713189S - - Google Patents
Info
- Publication number
- JP1713189S JP1713189S JP2021019931F JP2021019931F JP1713189S JP 1713189 S JP1713189 S JP 1713189S JP 2021019931 F JP2021019931 F JP 2021019931F JP 2021019931 F JP2021019931 F JP 2021019931F JP 1713189 S JP1713189 S JP 1713189S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021019931F JP1713189S (enrdf_load_stackoverflow) | 2021-09-15 | 2021-09-15 | |
US29/830,627 USD1042340S1 (en) | 2021-09-15 | 2022-03-14 | Tubular reactor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021019931F JP1713189S (enrdf_load_stackoverflow) | 2021-09-15 | 2021-09-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1713189S true JP1713189S (enrdf_load_stackoverflow) | 2022-04-21 |
Family
ID=81209957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021019931F Active JP1713189S (enrdf_load_stackoverflow) | 2021-09-15 | 2021-09-15 |
Country Status (2)
Country | Link |
---|---|
US (1) | USD1042340S1 (enrdf_load_stackoverflow) |
JP (1) | JP1713189S (enrdf_load_stackoverflow) |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3024449B2 (ja) * | 1993-07-24 | 2000-03-21 | ヤマハ株式会社 | 縦型熱処理炉及び熱処理方法 |
USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
JP3985899B2 (ja) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | 基板処理装置 |
TWD118408S1 (zh) * | 2006-02-20 | 2007-08-01 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
TWD127410S1 (zh) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | 半導體製造用製程管 |
TWD125601S (zh) * | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
JP4930438B2 (ja) * | 2008-04-03 | 2012-05-16 | 東京エレクトロン株式会社 | 反応管及び熱処理装置 |
TWD133943S1 (zh) | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | 反應管 |
USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
JP1534829S (enrdf_load_stackoverflow) * | 2015-02-23 | 2015-10-13 | ||
JP1534828S (enrdf_load_stackoverflow) * | 2015-02-23 | 2015-10-13 | ||
JP1535455S (enrdf_load_stackoverflow) * | 2015-02-25 | 2015-10-19 | ||
DE102015211090A1 (de) * | 2015-06-17 | 2016-12-22 | Vistec Electron Beam Gmbh | Korpuskularstrahlgerät und Verfahren zum Betreiben eines Korpuskularstrahlgeräts |
JP1546345S (enrdf_load_stackoverflow) * | 2015-09-04 | 2016-03-22 | ||
JP1546512S (enrdf_load_stackoverflow) * | 2015-09-04 | 2016-03-22 | ||
TWD175510S (zh) | 2015-09-18 | 2016-05-11 | 亞智科技股份有限公司 | 吸附元件 |
JP1731877S (enrdf_load_stackoverflow) * | 2022-03-01 | 2022-12-09 | ||
JP1731878S (enrdf_load_stackoverflow) * | 2022-03-01 | 2022-12-09 | ||
JP1731789S (enrdf_load_stackoverflow) * | 2022-03-01 | 2022-12-09 |
-
2021
- 2021-09-15 JP JP2021019931F patent/JP1713189S/ja active Active
-
2022
- 2022-03-14 US US29/830,627 patent/USD1042340S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
USD1042340S1 (en) | 2024-09-17 |