JP1713189S - - Google Patents

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Publication number
JP1713189S
JP1713189S JP2021019931F JP2021019931F JP1713189S JP 1713189 S JP1713189 S JP 1713189S JP 2021019931 F JP2021019931 F JP 2021019931F JP 2021019931 F JP2021019931 F JP 2021019931F JP 1713189 S JP1713189 S JP 1713189S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021019931F
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Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2021019931F priority Critical patent/JP1713189S/ja
Priority to US29/830,627 priority patent/USD1042340S1/en
Application granted granted Critical
Publication of JP1713189S publication Critical patent/JP1713189S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021019931F 2021-09-15 2021-09-15 Active JP1713189S (enrdf_load_stackoverflow)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021019931F JP1713189S (enrdf_load_stackoverflow) 2021-09-15 2021-09-15
US29/830,627 USD1042340S1 (en) 2021-09-15 2022-03-14 Tubular reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021019931F JP1713189S (enrdf_load_stackoverflow) 2021-09-15 2021-09-15

Publications (1)

Publication Number Publication Date
JP1713189S true JP1713189S (enrdf_load_stackoverflow) 2022-04-21

Family

ID=81209957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021019931F Active JP1713189S (enrdf_load_stackoverflow) 2021-09-15 2021-09-15

Country Status (2)

Country Link
US (1) USD1042340S1 (enrdf_load_stackoverflow)
JP (1) JP1713189S (enrdf_load_stackoverflow)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3024449B2 (ja) * 1993-07-24 2000-03-21 ヤマハ株式会社 縦型熱処理炉及び熱処理方法
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
TWD118408S1 (zh) * 2006-02-20 2007-08-01 東京威力科創股份有限公司 半導體製造用加工處理管
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD125601S (zh) * 2007-05-08 2008-10-21 東京威力科創股份有限公司 半導體製造用加工處理管
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
TWD133943S1 (zh) 2008-05-09 2010-03-21 日立國際電氣股份有限公司 反應管
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
JP1534829S (enrdf_load_stackoverflow) * 2015-02-23 2015-10-13
JP1534828S (enrdf_load_stackoverflow) * 2015-02-23 2015-10-13
JP1535455S (enrdf_load_stackoverflow) * 2015-02-25 2015-10-19
DE102015211090A1 (de) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Korpuskularstrahlgerät und Verfahren zum Betreiben eines Korpuskularstrahlgeräts
JP1546345S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1546512S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
TWD175510S (zh) 2015-09-18 2016-05-11 亞智科技股份有限公司 吸附元件
JP1731877S (enrdf_load_stackoverflow) * 2022-03-01 2022-12-09
JP1731878S (enrdf_load_stackoverflow) * 2022-03-01 2022-12-09
JP1731789S (enrdf_load_stackoverflow) * 2022-03-01 2022-12-09

Also Published As

Publication number Publication date
USD1042340S1 (en) 2024-09-17

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