USD1042340S1 - Tubular reactor - Google Patents

Tubular reactor Download PDF

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Publication number
USD1042340S1
USD1042340S1 US29/830,627 US202229830627F USD1042340S US D1042340 S1 USD1042340 S1 US D1042340S1 US 202229830627 F US202229830627 F US 202229830627F US D1042340 S USD1042340 S US D1042340S
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US
United States
Prior art keywords
tubular reactor
view
elevational view
design
tubular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
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US29/830,627
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English (en)
Inventor
Yusaku OKAJIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
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Publication date
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Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKAJIMA, YUSAKU
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Publication of USD1042340S1 publication Critical patent/USD1042340S1/en
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US29/830,627 2021-09-15 2022-03-14 Tubular reactor Active USD1042340S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021019931F JP1713189S (enrdf_load_stackoverflow) 2021-09-15 2021-09-15
JP2021019931D 2021-09-15

Publications (1)

Publication Number Publication Date
USD1042340S1 true USD1042340S1 (en) 2024-09-17

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ID=81209957

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/830,627 Active USD1042340S1 (en) 2021-09-15 2022-03-14 Tubular reactor

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US (1) USD1042340S1 (enrdf_load_stackoverflow)
JP (1) JP1713189S (enrdf_load_stackoverflow)

Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618349A (en) * 1993-07-24 1997-04-08 Yamaha Corporation Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
TWD175510S (zh) 2015-09-18 2016-05-11 亞智科技股份有限公司 吸附元件
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
US20160368031A1 (en) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Particle beam apparatus and method for operating a particle beam apparatus
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
TWD230585S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230584S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230586S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618349A (en) * 1993-07-24 1997-04-08 Yamaha Corporation Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
US20160368031A1 (en) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Particle beam apparatus and method for operating a particle beam apparatus
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
TWD175510S (zh) 2015-09-18 2016-05-11 亞智科技股份有限公司 吸附元件
TWD230585S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230584S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管
TWD230586S (zh) * 2022-03-01 2024-04-01 日商國際電氣股份有限公司 (日本) 反應管

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Notification of Review Opinions dated May 2, 2023 in corresponding TW Application 111300907.

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