US6064686A - Arc-free electron gun - Google Patents

Arc-free electron gun Download PDF

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Publication number
US6064686A
US6064686A US09/283,898 US28389899A US6064686A US 6064686 A US6064686 A US 6064686A US 28389899 A US28389899 A US 28389899A US 6064686 A US6064686 A US 6064686A
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United States
Prior art keywords
cathode
anode
window
filament
plate
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Expired - Lifetime
Application number
US09/283,898
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English (en)
Inventor
Luis A. Zuniga
Michael E. LaFrance
Larry F. Willitzer
Christopher S. Johnson
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TFI Telemark
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TFI Telemark
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Assigned to TFI TELEMARK reassignment TFI TELEMARK ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: JOHNSON, CHRISTOPHER S., LAFRANCE, MICHAEL E., WILLITZER, LARRY F., ZUNIGA, LUIS A.
Priority to US09/283,898 priority Critical patent/US6064686A/en
Priority to EP00914863A priority patent/EP1204507B1/de
Priority to JP2000607788A priority patent/JP4689049B2/ja
Priority to AU36196/00A priority patent/AU3619600A/en
Priority to PCT/US2000/006015 priority patent/WO2000058049A1/en
Priority to KR20017012316A priority patent/KR100711529B1/ko
Priority to DE60043700T priority patent/DE60043700D1/de
Priority to AT00914863T priority patent/ATE454948T1/de
Priority to TW089105781A priority patent/TW451249B/zh
Publication of US6064686A publication Critical patent/US6064686A/en
Application granted granted Critical
Assigned to VENTURE BANKING GROUP, A DIVISION OF CUPERTINO NATIONAL BANK reassignment VENTURE BANKING GROUP, A DIVISION OF CUPERTINO NATIONAL BANK SECURITY AGREEMENT Assignors: TFI TELEMARK
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Definitions

  • the present invention relates to an arc free, liquid cooled electron gun (E-gun).
  • E-guns are used for various applications, and particularly for vapor deposition processes inside a sealed vacuum chamber.
  • Such E-guns typically include an electron emitting source (emitter) for emitting a stream of electrons, high voltage leads to operate the emitter, a crucible for holding evaporant material, and a magnet for creating a magnetic field that directs the stream of electrons from the emitter onto the surface of the evaporant material.
  • the incident electron stream evaporates the material to fill the chamber with a gaseous cloud for deposition onto substrates positioned in the chamber.
  • U.S. Pat. Nos. 3,710,072 and 5,111,022 show various details of prior art E-guns.
  • E-guns One problem with such E-guns is arcing that occurs during operation, especially as the pressure inside the sealed vacuum chamber increases. More specifically, as the material in the crucible evaporates, a portion of it decomposes to positive ions plus some gas. These positive ions are emitted with a certain kinetic energy into the magnetic field, which guides the ions back toward the emitter along a similar path taken by the electron stream. Some of these ions can enter and damage the emitter.
  • the present invention solves the aforementioned problems by providing an E-gun with an improved electrostatic field, an improved magnetic field, and/or an improved flexible insulation on high voltage leads.
  • the electron gun of the present invention includes an emitter assembly and a magnet assembly.
  • the emitter assembly has a filament that when heated emits electrons, a cathode plate disposed adjacent to the filament and forming a cathode window aligned to the filament, and an anode plate disposed adjacent to the cathode plate and forming an anode window aligned to the cathode window.
  • the cathode plate and anode plate are connectable to a voltage source for forming an electrostatic field that directs the emitted electrons into an electron stream that traverses through the cathode window and the anode window.
  • the magnet assembly includes a crucible, and a magnet that generates a magnetic field for guiding the electron stream along a path to the crucible.
  • the anode window, cathode window and filament are aligned with each other to form an electrostatic lens that minimizes the divergence of the electron stream.
  • the electron gun is mountable to a vacuum deposition chamber for evaporating material therein, and includes an emitter assembly and a magnet assembly.
  • the emitter assembly has a filament that when heated emits electrons, a cathode plate disposed adjacent to the filament and forming a cathode window aligned to the filament, and an anode plate disposed adjacent to the cathode plate and forming an anode window aligned to the cathode window.
  • the cathode plate and anode plate are connectable to a voltage source and aligned to each other and the filament for forming an electrostatic field that acts as a lens to focus the emitted electrons into an electron stream with a minimized divergence that traverses through the cathode window and the anode window.
  • the magnet assembly includes a crucible, a magnet having a pair of poles that generates a magnetic field for guiding the electron stream along a path to the crucible, a pair of extension plates each extending from a different one of the poles of the magnet, and a plurality of extension members that extend from the extension plates toward the path of the electron stream.
  • the magnet, pair of extension plates and plurality of extension members provide a uniform field along the electron stream path so that the electron stream is guided to the crucible with a minimum of divergence.
  • the electron gun includes an emitter assembly, a magnet assembly and an ion trap plate.
  • the emitter assembly includes a filament that when heated emits electrons, a cathode plate disposed adjacent to the filament, and an anode plate disposed adjacent to the cathode plate.
  • the cathode plate and anode plate are connectable to a voltage source for forming an electrostatic field that directs the emitted electrons into an electron stream.
  • the magnet assembly includes a crucible, and a magnet that generates a magnetic field for guiding the electron stream along a path to the crucible.
  • the ion trap plate is electrically connectable to the voltage source.
  • the anode plate includes an anode window formed therein that is aligned to the ion trap plate that attracts positive ions during operation.
  • the electron gun includes an emitter assembly, a magnet assembly, a pair of insulated wires, and a cooling fluid jacket.
  • the emitter assembly includes a filament that when heated emits electrons, a cathode plate disposed adjacent to the filament, and an anode plate disposed adjacent to the cathode plate.
  • the cathode plate and anode plate are connectable to a voltage source for forming an electrostatic field that directs the emitted electrons into an electron stream.
  • the magnet assembly includes a crucible, and a magnet that generates a magnetic field for guiding the electron stream along a path to the crucible.
  • the pair of insulated wires are electrically connected to the filament for passing electrical current through and heating the filament.
  • the cooling fluid jacket member forms a first channel through which at least part of one of the wires passes and a second channel through which a cooling fluid flows.
  • FIG. 1 is a partial exploded view of the electron gun of the present invention.
  • FIG. 2A is a partially exploded view of the emitter assembly and emitter block of the present invention.
  • FIG. 2B is an exploded view of the emitter assembly of the present invention.
  • FIG. 2C is a side cross-sectional view of the insulator assemblies of the present invention.
  • FIG. 3A is a top view of the magnet assembly of the present invention.
  • FIG. 3B is a top view of the magnet assembly with the cover plates in place.
  • FIG. 3C is an exploded view of the adapter block of the present invention.
  • FIG. 4A is a top view of the high voltage lead assembly of the present invention.
  • FIG. 4B is a side cross-sectional view of the high voltage lead assembly of the present invention.
  • FIG. 5 is a partial side cross-section view of the emitter assembly and crucible of the present invention.
  • FIG. 6 is a partial side cross-section view of the emitter assembly of the present invention.
  • FIG. 7 is a partial side cross-section view of the emitter assembly of an alternate embodiment of the present invention.
  • FIG. 8A is an exploded view of a second alternate embodiment of the present invention.
  • FIG. 8B is a partial side cross-section view of the emitter assembly of the second alternate embodiment of the present invention.
  • the present invention is an arc-free electron gun (E-gun) for vapor deposition processes, which prevents arcing by providing an improved electrostatic field, an improved magnetic field, and an improved insulation on high voltage leads.
  • E-gun arc-free electron gun
  • the arc-free E-gun of the present invention is illustrated in FIGS. 1 and 3A, and includes an electron emitter assembly 10, a magnet assembly 12, and a high voltage lead assembly 14.
  • the electron emitter assembly 10 is better illustrated in FIGS. 2A and 2B, and includes a shaped cathode plate 20 with a cathode window 22.
  • the cathode plate 20 surrounds and forms an enclosure around a filament 24 located adjacent the cathode window 22.
  • the cathode plate 20 is mounted to a cathode assembly 26.
  • An anode plate 28 with an anode window 30 is mounted to emitter block 50. The relative alignment of the cathode window 22, anode window 30 and filament 24 to each other is described later with reference to FIG. 6.
  • the cathode assembly 26 is mounted to the emitter block 50 by electrical insulator assemblies 31 and a mounting plate 35.
  • Insulator assemblies 31 include an outer cup shaped HV shield 32, and an inner cup shaped HV shield 33, which are connected together in an overlapping fashion by an electrical insulator member 34.
  • the open end of cup shaped shield 32 overlaps with the insulator member 34 and the open end of the inner cup shaped shield 33.
  • the cathode assembly 26 includes two cathode blocks 36 and 38 separated by an air gap or insulating member 40, as illustrated in FIG. 2B.
  • the filament 24 is mounted between the cathode blocks 36/38 by filament mounting plates 42/43.
  • the cathode plate 20 is mounted to and is electrically connected with cathode block 36 by a screw 37. However, cathode plate 20 is electrically insulated from cathode block 38 by an insulator member 44 attached to the top of the cathode block 38.
  • a pair of cathode leads 46 and 48 are attached to the cathode blocks 36 and 38 respectively.
  • the emitter assembly 10 is mounted to the magnet assembly 12, which includes a emitter block 50 and a magnet support member 52, as illustrated in FIGS. 2A and 3A. Screws 49 electrically connect the mounting plate 35 and anode plate 28 to the emitter block 50.
  • the emitter block 50 includes an emitter recess 54 for housing the emitter assembly 10 and a crucible recess 56 into which the cathode leads 46/48 extend.
  • the magnet support member 52 supports a pair of opposing magnet extension plates 60, with a magnet 62 extending therebetween at one end and the emitter assembly 10 and emitter block 50 disposed therebetween near the opposite end so as to create a magnetic field M around the emitter assembly 10 and emitter block 50 (see also FIG. 5).
  • a pair of pole pieces 64 are attached to extension plates 60 and extend toward emitter block 50.
  • a pair of auxiliary pole pieces 66 are attached to extension plates 60 and extend toward the anode plate 28.
  • the pole pieces 64 and auxiliary pole pieces 66 act to shape the magnetic field M around emitter assembly 10 and crucible 58 for superior electron stream confinement as described in further detail below.
  • a cover plate 67 over the magnet assembly 12 and another cover plate 68 over the emitter assembly 10 protect the E-gun from positive ions and other matter floating in the chamber, as illustrated in FIG. 3B.
  • An aperture 69 is formed in the cover plate 68 through which the electron stream 100 flows.
  • a crucible 58 is disposed in or above the recess 56.
  • the high voltage lead assembly 14 is best illustrated in FIGS. 4A and 4B, and includes water lines 70 connected to mounting blocks 72, which are connected to inner and outer bellows 74 and 76 (preferably made of stainless steel), which are in turn connected to an insulator block 78.
  • the mounting blocks 72 mount through holes in side wall 80 of a vapor deposition chamber to support the E-gun of the present invention.
  • the mounting blocks 72, inner bellows 74 and insulator block 78 form a pair of wire channels 82 through which a pair of insulated wires 84/85 pass from outside the chamber to the insulator block 78.
  • Water lines 70, mounting blocks 72, inner/outer bellows 47/76 and insulator block 78 form a water path 90, where cooling water enters through one of the water lines 70, passes through one of the mounting blocks 70, between one pair of inner/outer bellows 74/76, through the insulator block 78, and out through the other pair of inner/outer bellows 74/76, mounting block 72 and water line 70.
  • Emitter block 50 is mounted to the top of insulator block 78 with a mounting plate 92 therebetween (see FIG. 1).
  • a pair of adaptor blocks 94/95 connect between the high voltage leads 88/89 and the respective cathode leads 46/48. More specifically, an adapter block 94/95 is illustrated in FIG. 3C, and includes a clamp member 96 that clamps to one of the high voltage leads 88/89, and a cathode lead socket 97 for receiving one of the cathode leads 46/48.
  • An annular gold spring 98 can be used in socket 97 for making better electrical contact between the adaptor block 94/95 and the cathode lead 46/48 engaged therein.
  • Cathode leads 46/48 removably plug into sockets 97 so that the emitter assembly 10 can be easily removed in its entirety for maintenance (such as replacing the filament 24).
  • a voltage is placed on wire 84, that same voltage is present on lead 88, adaptor block 94, cathode lead 46, cathode block 36, cathode plate 20 and filament mounting plate 42, which are all electrically conductive and connected together.
  • another voltage is placed on wire 85, that same voltage is present on lead 89, adaptor block 95, cathode lead 48, cathode block 38, and filament mounting plate 43, which are all electrically conductive and connected together.
  • cooling water is circulated through water path 90.
  • the flowing cooling water keeps the temperature of various E-gun elements at a safe temperature even if the chamber interior reaches temperatures that would otherwise destroy high-temperature intolerant elements.
  • the flowing cooling water keeps the insulation around the wires 84/85 from being damaged by high temperatures. The presence of the insulation prevents arcing between the two wires 84/85 and ground.
  • the cooling water also keeps the insulating block 78 and high voltage leads 88/89 from melting under the high chamber temperatures.
  • a voltage V 1 is impressed onto wires 84 and 85 by the secondary winding of a 0-7 VAC iso-transformer. This allows the AC current through the filament to be raised and lowered while keeping the filament at a negative DC potential V 1 .
  • the AC current flow through filament 24 raises the filament temperature and drives off electrons from the filament surface in all directions.
  • An electrostatic field F is created by cathode plate 20 (which is at a voltage of V 1 ) and anode plate 28 (which is at system ground potential). Voltage V 1 is below the system ground potential to repel the electrons emitted by filament 24 through cathode window 22 and into a confined stream 100, as illustrated in FIG. 5. The electrons in stream 100 are accelerated by the electrostatic field F until the electron stream 100 passes through anode window 30.
  • the magnetic field M generated by the magnet assembly 12 and surrounding emitter assembly 10, induces a force on the moving electron stream 100 in a direction perpendicular to the direction of motion, thus causing the electron stream 100 to move in a circular path until the electrons strike the evaporant 102 in the crucible 58.
  • the electron stream 100 incident on the crucible 58 evaporates the material 102 therein and forms a gas cloud in the chamber.
  • cathode plate 20 and anode plate 28 The relative alignment of cathode plate 20 and anode plate 28 is illustrated in FIG. 6.
  • Cathode and anode plates 20/28 are spaced from each other to produce the electrostatic field F near filament 24.
  • Cathode window 22 and anode window 30 are aligned to each other and to filament 24 to form an electrostatic lens for the electrons emitted by filament 24 and forming electron stream 100. Electrons emitted by filament 24 are trapped by cathode plate 20 and cathode blocks 36/38.
  • Cathode window 22 is the only exit for these trapped electrons, which causes a more defined stream path for the electrons.
  • the windows 22/30 need to be as small as possible to prevent ions from passing therethrough and damaging the filament, but not too small so as to impede the electrons in stream 100. Therefore, the sizes of the windows 22/30 are just slightly larger than filament 28 to freely allow electron stream 100 to pass therethrough.
  • the upper edge 104 of anode window 30 is higher than the upper edge 106 of cathode window 22 by a predetermined amount to take into account the vertical displacement of the electrons caused by magnetic field M as the electrons travel between the cathode plate 20 and anode plate 28. Without this offset between window edges 104/106, the upper edge 104 of anode plate window 30 would block part of the electron stream 100 resulting in a scattered electron stream 100 and a burned anode plate 28.
  • Arcing in the above described E-gun is prevented in several ways, which allows arc-free operation of the E-gun at much higher pressures.
  • the focused electron stream 100 which is produced by the lensing effect of electrostatic field F and guided by the shaped magnetic field M, is maintained in a close parallel circular stream with a concentrated footprint as it strikes the crucible.
  • cathode and anode plates 20/28 with windows 22/30 formed therein prevent positive ions, which are emitted from the evaporated material and directed back toward the electron emitter 10 by magnetic field M, from reaching and damaging the filament 24 and cathode plate 20. Since these ions have much greater mass than electrons, their radius of curvature under the influence of magnetic field M will be larger than that of the electron stream 100, making most of the ions strike the anode plate 28 below anode window 30.
  • outer cup shaped HV shields 32 which are maintained at system ground potential along with mounting plate 35 and anode plate 28 mounted adjacent thereto, shield the insulator members 34 and inner cup shaped HV shields 33, which are held at a large negative electric potential, from the positive ions.
  • the elements exposed to incoming positive ions are all at system ground (instead of significantly below system ground).
  • cover plates 67 and 68 are placed over the magnetic assembly to prevent positive ions and other contaminants from accessing the emitter assembly 10.
  • arcing between wires 84/85 is prevented by the presence of insulation layers around wires 84/85, the use of which is made possible by the cooling fluid flowing through water path 90. Otherwise, the insulation would be damaged and fail due to the extreme temperatures inside the chamber.
  • the high voltages from wires 84/85 are not exposed to the chamber, except for at the cathode blocks 36 and filament 24, which are surrounded and protected by cathode plate 20. Surrounding the high voltage wires by the grounded, water cooled bellows prevents positive ions from collecting on the otherwise exposed high voltage wires.
  • An arc free E-gun according to the present invention has been developed, where the cathode window 22 is 0.04-0.06 inches taller, and 0.08-0.1 inches longer, than the height (0.125 inches) and length (0.775 inches) of filament 24.
  • the anode plate 28 is spaced about 0.100 ⁇ 0.005 inches from the cathode plate 20.
  • the anode window is 0.085-0.095 inches taller, and 0.020 inches longer, than the height and length of cathode window 22.
  • the upper edge 104 of anode window 30 is 0.075 higher than the upper edge 106 of cathode window 22 to accommodate the circular trajectory of the electron stream 100.
  • an AC current of 0-7 VAC through the filament raises the filament 24 to 850-950° C. to drive off electrons from the filament surface.
  • the electrostatic field is approximately 4-10 KV. It has been found that the above described arc free E-gun can be run at pressures exceeding two orders of magnitude greater than conventional E-guns without incurring any
  • FIG. 7 illustrates an alternate embodiment of the present invention, which include an ion trap to attract positive ions incident on anode plate 28 away from anode window 30.
  • a second anode window 110 is formed in anode plate 28, below window 30 and directly opposite flange portion 112 of cathode plate 20. The flange portion 112 of cathode plate 20 will attract positive ions through second window 110, thus reducing the number of ions that travel through window 30 and damage filament 24.
  • FIGS. 8A and 8B illustrate a second alternate embodiment of the present invention, where an ion trap plate 118 is attached to a mounting plate 120, which in turn is insulated from the filament mounting plate 43 by an insulator 122, but is electrically connected to the filament mounting plate 42.
  • the anode plate 28 is mounted so that the ion trap plate 118 is aligned to the second anode window 110 (which includes aligned adjacent to, protruding into, or protruding through (as shown in FIG. 8B) the anode window 10).
  • the ion trap plate attracts positive ions through second window 110.
  • a large quantity of positive ions are formed by the collision of highly energetic moving electrons and neutral molecules on the surface of the stationary target material and its evaporation vapor cloud.
  • the vapor cloud composed of neutral atoms
  • a large number of neutral atoms collide with the electron, loosing electrons from their outer shell, and become positively charged ions.
  • the ions are immediately exposed to the magnetic field used to direct the electron stream.
  • the ions move opposite to the stream of electrons, eventually striking the surface of the electron beam source filament, causing rapid erosion on its surface and hence limiting its performance and lifetime.
  • the second anode window of FIGS. 7 and 8A-B prevent such erosion.
  • the advantage of using the ion trap plate 118 of FIGS. 8A-B instead of the flange portion 112 of FIG. 7 is that the ion trap plate can be made to better tolerate the incoming ions.
  • inner and outer bellows 74 and 76 can instead be any type of water jacket member, rigid or not, that provides separate concentric or non-concentric wire channels 82 and water paths 90.
  • the e-gun is described as being attached to a sidewall of the vacuum deposition chamber, the e-gun of the present invention can be disposed in any position inside the chamber.
  • the voltage source supplying the various voltages discussed above could be a single voltage source device, or separate voltage source devices.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
US09/283,898 1999-03-30 1999-03-30 Arc-free electron gun Expired - Lifetime US6064686A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
US09/283,898 US6064686A (en) 1999-03-30 1999-03-30 Arc-free electron gun
DE60043700T DE60043700D1 (de) 1999-03-30 2000-03-08 Lichtbogenfreie elektronenkanone
JP2000607788A JP4689049B2 (ja) 1999-03-30 2000-03-08 無アーク電子銃
AU36196/00A AU3619600A (en) 1999-03-30 2000-03-08 Arc-free electron gun
PCT/US2000/006015 WO2000058049A1 (en) 1999-03-30 2000-03-08 Arc-free electron gun
KR20017012316A KR100711529B1 (ko) 1999-03-30 2000-03-08 아크-프리 전자총
EP00914863A EP1204507B1 (de) 1999-03-30 2000-03-08 Lichtbogenfreie elektronenkanone
AT00914863T ATE454948T1 (de) 1999-03-30 2000-03-08 Lichtbogenfreie elektronenkanone
TW089105781A TW451249B (en) 1999-03-30 2000-05-02 ARC-free electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/283,898 US6064686A (en) 1999-03-30 1999-03-30 Arc-free electron gun

Publications (1)

Publication Number Publication Date
US6064686A true US6064686A (en) 2000-05-16

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US09/283,898 Expired - Lifetime US6064686A (en) 1999-03-30 1999-03-30 Arc-free electron gun

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US (1) US6064686A (de)
EP (1) EP1204507B1 (de)
JP (1) JP4689049B2 (de)
KR (1) KR100711529B1 (de)
AT (1) ATE454948T1 (de)
AU (1) AU3619600A (de)
DE (1) DE60043700D1 (de)
TW (1) TW451249B (de)
WO (1) WO2000058049A1 (de)

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WO2008016719A1 (en) * 2006-08-03 2008-02-07 Titanium Metals Corporation Overheat detection system
CN101712091B (zh) * 2009-10-23 2012-08-29 江苏达胜加速器制造有限公司 电子枪盖板装配模具及装配方法

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JP2004192903A (ja) * 2002-12-10 2004-07-08 Prazmatec:Kk 電子銃
JP4584008B2 (ja) * 2005-04-14 2010-11-17 浜松ホトニクス株式会社 電子線補助照射レーザアブレーション成膜装置
US7544523B2 (en) * 2005-12-23 2009-06-09 Fei Company Method of fabricating nanodevices
KR100787168B1 (ko) * 2006-02-10 2007-12-21 (주)인텍 전자빔 발생장치
US7764008B2 (en) * 2006-02-24 2010-07-27 Ferrotec (Usa) Corporation Electron beam gun
KR100964094B1 (ko) * 2008-11-10 2010-06-16 포항공과대학교 산학협력단 펨토초 전자 빔 발생 장치 및 방법
DE102020213174A1 (de) 2020-10-19 2022-04-21 THEVA DüNNSCHICHTTECHNIK GMBH Aktiv gekühlte elektronenkanone zur materialverdampfung im vakuum

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AU3619600A (en) 2000-10-16
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DE60043700D1 (de) 2010-03-04
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