FR2455634A1 - Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran - Google Patents

Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran

Info

Publication number
FR2455634A1
FR2455634A1 FR7911311A FR7911311A FR2455634A1 FR 2455634 A1 FR2455634 A1 FR 2455634A1 FR 7911311 A FR7911311 A FR 7911311A FR 7911311 A FR7911311 A FR 7911311A FR 2455634 A1 FR2455634 A1 FR 2455634A1
Authority
FR
France
Prior art keywords
screen
electron beam
vacuum evaporation
evaporation deposition
molded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7911311A
Other languages
English (en)
Other versions
FR2455634B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR7911311A priority Critical patent/FR2455634A1/fr
Priority to GB8014062A priority patent/GB2049739B/en
Priority to US06/145,727 priority patent/US4303694A/en
Priority to CH342480A priority patent/CH637168A5/fr
Publication of FR2455634A1 publication Critical patent/FR2455634A1/fr
Application granted granted Critical
Publication of FR2455634B1 publication Critical patent/FR2455634B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PROCEDE ET DISPOSITIF DE DEPOT PAR EVAPORATION SOUS VIDE UTILISANT UN FAISCEAU D'ELECTRONS. SELON L'INVENTION, LE FAISCEAU EST MODULE EN INTENSITE OU EN POSITION ET UN ECRAN EST DEPLACE EN SYNCHRONISME ENTRE LA CIBLE ET LES SUBSTRATS A REVETIR. DE CETTE MANIERE, LES RAYONS X EMIS PAR LA CIBLE SONT BLOQUES PAR L'ECRAN. APPLICATION A LA FABRICATION DES COMPOSANTS ELECTRONIQUES.
FR7911311A 1979-05-04 1979-05-04 Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran Granted FR2455634A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR7911311A FR2455634A1 (fr) 1979-05-04 1979-05-04 Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran
GB8014062A GB2049739B (en) 1979-05-04 1980-04-29 Vacuum evaporation using a modulated electron beam and x-ray opaque screen
US06/145,727 US4303694A (en) 1979-05-04 1980-05-01 Method and device of deposition through vacuum evaporation making use _of a modulated electron beam and a screen
CH342480A CH637168A5 (fr) 1979-05-04 1980-05-02 Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons module et un ecran.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7911311A FR2455634A1 (fr) 1979-05-04 1979-05-04 Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran

Publications (2)

Publication Number Publication Date
FR2455634A1 true FR2455634A1 (fr) 1980-11-28
FR2455634B1 FR2455634B1 (fr) 1981-10-23

Family

ID=9225058

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7911311A Granted FR2455634A1 (fr) 1979-05-04 1979-05-04 Procede et dispositif de depot par evaporation sous vide utilisant un faisceau d'electrons moule et un ecran

Country Status (4)

Country Link
US (1) US4303694A (fr)
CH (1) CH637168A5 (fr)
FR (1) FR2455634A1 (fr)
GB (1) GB2049739B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4620081A (en) * 1984-08-03 1986-10-28 The United States Of America As Represented By The United States Department Of Energy Self-contained hot-hollow cathode gun source assembly
US4664057A (en) * 1985-12-20 1987-05-12 Allied Corporation Photoprocessing apparatus including conical reflector
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
JP2655094B2 (ja) * 1994-08-30 1997-09-17 日本電気株式会社 電子銃蒸着装置
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
WO1999065626A1 (fr) * 1998-06-16 1999-12-23 University Of Virginia Patent Foundation Dispositif et procede de production d'enduits constituant une barriere thermique
US6064686A (en) * 1999-03-30 2000-05-16 Tfi Telemark Arc-free electron gun
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
USD763807S1 (en) 2014-05-22 2016-08-16 Hzo, Inc. Boat for a deposition apparatus
US9156055B2 (en) 2012-01-10 2015-10-13 Hzo, Inc. Precursor supplies, material processing systems with which precursor supplies are configured to be used and associated methods
US20140335271A1 (en) * 2012-01-10 2014-11-13 Hzo, Inc. Boats configured to optimize vaporization of precursor materials by material deposition apparatuses
USD760180S1 (en) 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
USD764423S1 (en) 2014-03-05 2016-08-23 Hzo, Inc. Corrugated elements for defining longitudinal channels in a boat for a deposition apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1343437A (fr) * 1962-01-16 1963-11-15 Procédé d'application de couches minces par vaporisation thermique sur un élément non soumis au rayonnement calorifique, notamment pour microscope, ainsi que le dispositif pour la mise en application du procédé ou procédé similaire
CH391418A (de) * 1959-12-04 1965-04-30 Fritz Dr Grasenick Verfahren zum Aufbringen von Schichten auf Träger, insbesondere für die elektronenmikroskopische Präparation
FR1582042A (fr) * 1968-03-26 1969-09-26
AT314624B (de) * 1972-01-05 1974-04-10 Herwig Horn Dr Anordnung zur Vakuumbedampfung aus einer thermischen Dampfquelle
AT338886B (de) * 1975-09-22 1977-09-26 Horn Herwig Dr Anordnung zur bedampfung aus einer thermischen dampfquelle

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL287577A (fr) * 1962-01-16
JPS5265783A (en) * 1975-11-28 1977-05-31 Hitachi Ltd Equipment for evaporation by electron beam

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH391418A (de) * 1959-12-04 1965-04-30 Fritz Dr Grasenick Verfahren zum Aufbringen von Schichten auf Träger, insbesondere für die elektronenmikroskopische Präparation
FR1343437A (fr) * 1962-01-16 1963-11-15 Procédé d'application de couches minces par vaporisation thermique sur un élément non soumis au rayonnement calorifique, notamment pour microscope, ainsi que le dispositif pour la mise en application du procédé ou procédé similaire
FR1582042A (fr) * 1968-03-26 1969-09-26
AT314624B (de) * 1972-01-05 1974-04-10 Herwig Horn Dr Anordnung zur Vakuumbedampfung aus einer thermischen Dampfquelle
AT338886B (de) * 1975-09-22 1977-09-26 Horn Herwig Dr Anordnung zur bedampfung aus einer thermischen dampfquelle

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/70 *
EXBK/76 *

Also Published As

Publication number Publication date
CH637168A5 (fr) 1983-07-15
GB2049739B (en) 1983-04-27
GB2049739A (en) 1980-12-31
FR2455634B1 (fr) 1981-10-23
US4303694A (en) 1981-12-01

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