US5422505A - FET having gate insulating films whose thickness is different depending on portions - Google Patents

FET having gate insulating films whose thickness is different depending on portions Download PDF

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Publication number
US5422505A
US5422505A US08/155,911 US15591193A US5422505A US 5422505 A US5422505 A US 5422505A US 15591193 A US15591193 A US 15591193A US 5422505 A US5422505 A US 5422505A
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gate electrode
gate insulating
insulating film
impurity concentration
semiconductor substrate
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Expired - Fee Related
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US08/155,911
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English (en)
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Koji Shirai
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Toshiba Corp
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Toshiba Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28158—Making the insulator
    • H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
    • H01L21/28211—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation in a gaseous ambient using an oxygen or a water vapour, e.g. RTO, possibly through a layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28158—Making the insulator
    • H01L21/2822—Making the insulator with substrate doping, e.g. N, Ge, C implantation, before formation of the insulator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025—Channel region of field-effect devices
    • H01L29/1029—Channel region of field-effect devices of field-effect transistors
    • H01L29/1033—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
    • H01L29/1041—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with a non-uniform doping structure in the channel region surface
    • H01L29/1045—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with a non-uniform doping structure in the channel region surface the doping structure being parallel to the channel length, e.g. DMOS like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42364—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity
    • H01L29/42368—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity the thickness being non-uniform
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66568—Lateral single gate silicon transistors
    • H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate

Definitions

  • the present invention relates to a semiconductor device such as an individual semiconductor element or a semiconductor integrated circuit, and more particularly to the structure of a MOSFET (insulating gate type field effect transistor) formed on a semiconductor substrate.
  • MOSFET insulating gate type field effect transistor
  • a source region which is formed of an N type impurity diffusion layer, and a drain region are formed on a part of a surface of a P type semiconductor substrate.
  • a gate electrode On a channel region between the source and drain, there is formed a gate electrode through a gate insulating film.
  • the source region and drain region are in contact with each other to correspond to the source region and drain region. In this case, the thickness of the gate insulating film is uniform.
  • the gate insulating film cannot largely thinned since the thickness of the gate insulating film is determined at the portion having the strongest electric filed (between the drain and gate electrode). Due to this, a switching speed (response speed) is limited. Moreover, since the gate insulating film cannot be largely thinned, impurity concentration of an inverting layer to be generated in the channel region becomes low. Due to this, it is difficult to reduce an on-resistance or improve a current driving ability.
  • An object of the present invention is to provide a semiconductor device showing a distribution of electric field in a suitable MOSFET in an operation mode, and its manufacturing method.
  • the present invention provides a field effect transistor, comprising a first conductive type semiconductor substrate, a second conductive type source region formed on the semiconductor substrate, a second conductive type drain region formed on the semiconductor substrate and non-contacting the source region, and a gate electrode formed on a channel region between the source region and the drain region through a gate insulating film, wherein the thickness of the gate insulating film is thickened at least in a two-step manner in a direction from the source region to the drain region, impurity concentration of the respective channel regions under the gate insulating film having a different film thickness is different, and impurity concentration of the channel region under the thick film portion of the gate insulating film is lower than that of the channel region under the thin film portion of the gate insulating film.
  • the gate insulating film which is in a portion (between the drain and gate electrode) having the strongest electric field can be made thickest, and impurity concentration of the channel region right under the gate insulating film is lowered. Due to this, an uniform distribution of electric filed in MOSFET can be realized, and reliability of the gate insulating film on the drain side can be ensured. Moreover, a threshold voltage is reduced, thereby making possible to improve electrical pressure.
  • FIG. 1 is a cross sectional view showing MOSFET relating to a first embodiment of the present invention
  • FIGS. 2A to 2N are cross sectional views showing a method for forming the MOSFET of FIG. 1;
  • FIG. 3 is a cross sectional view showing a second embodiment of the present invention.
  • FIG. 1 shows a MOSFET section in a semiconductor device (individual semiconductor element or a semiconductor integrated circuit) relating to a first embodiment of the present invention.
  • a source region 11, which is formed of a second conductivity type (N type in this embodiment) impurity diffusion layer, and a drain region 12 are respectively formed on a part of a surface of a first conductivity type (P type in this embodiment) semiconductor substrate 10.
  • a gate electrode G On a channel region 13 between the source and drain, there is formed a gate electrode G through a gate insulating film 14.
  • a source electrode S and a drain electrode D are in contact with each other to correspond to the source region 11 and the drain region 12.
  • the thickness of the gate insulating film 14 of the MOSFET is thickened at least in a two-step (four-step in this embodiment) manner in a direction from the source side to the drain side. Impurity concentration of the respective channel regions under the gate insulating film 14 having a different film thickness is different. Impurity concentration of the channel region under the thick film portion of the gate insulating film is lower than that of the channel region under the thin film portion of the gate insulating film.
  • impurity concentration P1, P2, P3, P4 is gradually lowered (Pi>P2>P3>P4) in the order of the channel regions (13-1, 13-2, 13-3, 13-4) sequentially existing in the direction from the channel region 13-1 on the source side to the channel region 13-4 on the drain side.
  • FIGS. 2A to 2N briefly explain one example of a method of a N channel MOSFET whose thickness of the gate insulating film 14 is formed in a four-step manner.
  • a first gate insulating film SiO 2
  • a thickness of 200 ⁇ as a whole on a P type silicon substrate 10 by dry oxidization in O 2 ambient atmosphere at 950° C.
  • an ion of P type impurity (for example, Boron ion B + ) is implanted into the entire surface of the substrate by an ion implantation. Thereafter, an anneal process is performed in N 2 ambient atmosphere at 950° C. for 30 min.
  • P type impurity for example, Boron ion B +
  • a part of the first gate insulating film 21 is opened by a photo etching method, and boron ion B + is implanted into an opening 22 by an ion implantation.
  • reference numeral 23 is a photoresist.
  • a second gate insulating film (SiO 2 ) 24 having a thickness of 200 ⁇ in the opening 22 by dry oxidization in O 2 ambient atmosphere at 950° C.
  • the first gate insulating film 21 grows to have the thickness of 300 ⁇ .
  • a part of the second gate insulating film 24 is opened by a photo etching method, and boron ion B + is implanted into an opening 25 by an ion implantation.
  • reference numeral 26 is a photoresist.
  • a third second gate insulating film (SiO 2 ) 27 having a thickness of 150 ⁇ in the opening 25 by dry oxidization in O 2 ambient atmosphere at 950° C.
  • the second gate insulating film 24 grows to have the thickness of 250 ⁇ and the first gate insulating film 21 grows to have thickness of 350 ⁇ .
  • a part of a third gate insulating film 27 is opened by a photo etching method, and boron ion B + is implanted into an opening 28 by an ion implantation.
  • reference numeral 29 is a photoresist.
  • a fourth gate insulating film (SiO 2 ) 30 having a thickness of 100 ⁇ in the opening 28 by dry oxidization in O 2 ambient atmosphere at 900° C.
  • the third gate insulating film 27 grows to have the thickness of 200 ⁇
  • the first gate insulating film 21 grows to have the thickness of 400 ⁇ .
  • a polysilicon film 31 is deposited on the entire surface of the substrate by a CVD (Chemical Vapor-phase Deposition) method to have the thickness of 2000 ⁇ .
  • CVD Chemical Vapor-phase Deposition
  • the polysilicon film 31 is patterned by the photo etching method, and a gate electrode G is formed. Thereafter, the gate electrode G is masked and an exposing portion of the first gate insulating film 21 is removed. Thereby, there can be obtained a gate insulating film 14 to have the thickness in a four-step manner in the order of the fourth gate insulating film 30, the third gate insulating film 27, the second gate insulating film 24, and the first gate insulating film 21.
  • the channel regions (13-1, 13-2, 13-3, 13-4) whose impurity concentration (P1, P2, P3, P4) is sequentially lowered exist under the fourth gate insulating film 30, the third gate insulating film 27, the second gate insulating film 24, and the first gate insulating film 21.
  • N type impurity ion for example, arsenic ion As + ) is implanted in the entire surface by the ion implantation.
  • an insulating film (SiO 2 ) 32 having a thickness of 200 ⁇ to cover the entire surface of the substrate by dry oxidization in O 2 ambient atmosphere at 900° C.
  • the implanted arsenic ion is made active, thereby the source region 11 and the drain region 12 are formed.
  • an interlayer insulating film (SiO 2 ) 15 is deposited on the entire surface of the substrate to have a thickness of 0.5 ⁇ m by the CVD method, thereafter an anneal process is performed in N 2 ambient atmosphere at 950° C.
  • a part of the interlayer insulating film 15 is opened by the photo etching method, thereby forming a contact hole 33.
  • a metal wire film for example, Al
  • the metal wire film is patterned by the photo etching. Thereby, there is formed a source electrode S, which is in contact with the source region 11 and the drain region 12 through the contact hole 33, and a drain electrode D. Thereafter, a sinter process is performed at temperature of 400° C.
  • the portion (between the drain and gate electrode) having the strongest electric filed in the gate insulating film 14 is formed to be the thickest portion. Then, impurity concentration of the channel region 13-4 right under such a portion is reduced most.
  • the distribution of the electric field can be appropriately set to equalize the electric field in the MOSFET.
  • the electrical field between the drain and gate electrode becomes weaker and the drop voltage of the drain connection rises.
  • breakage of the gate insulating film 14 is difficult to be generated due to a hot carrier, thereby improving reliability of the element.
  • punch resisting pressure between the source and drain is improved, and the punch-through dropping of the depletion layer, which is from the drain region 12 to the source region 11 can be prevented, and the distance (gate length) between the source and drain can be shortened, and made fine.
  • the average value of the thickness of the gate insulating film 14 is reduced, the current driving ability per a gate can be improved and the switching speed is improved, and the channel resistance is reduced. For these reasons, as compared with the prior art, it is possible to largely reduce the area of the element and largely improve the operation speed of the element.
  • the threshold voltages of the respective channel regions 13-1 to 13-4 under the gate insulating film 14 having a different thickness are set to be substantially equal, thereby evenness of the electric field and that of the threshold voltage can be appropriately set.
  • FIG. 3 shows a MOSFET of source and drain changeable type in the semiconductor device of the present invention relating to the second embodiment.
  • the thickness of a gate insulating film 14' is thickened at least in a two-step (in this embodiment, four-step) manner in a direction from the portion corresponding to the central portion between of the source and drain to one source and drain electrode SD side and other source and drain electrode SD' side.
  • the impurity concentration of the respective channel regions under the gate insulating film 14' having a different film thickness is different.
  • the impurity concentration of the channel region under the thick film portion of the gate insulating film is lower than that of the channel region under the thin film portion of the gate insulating film.
  • impurity concentration P1, (P2, P2'), (P3, P3'), (P4, P4') is gradually lowered in the order of the channel regions (13-1, 13-2, 13-3, 13-4) which sequentially exist directing from the channel region 13-1 of the central portion between the source and drain to the channel region 13-4 on one source and drain region 16 or the channel region 13-4' on the other source and drain region 16', or in the order of the channel regions (13-1', 13-2', 13-3', 13-4') (P1 >P2 A P2'>P3 ⁇ P3'>P4 ⁇ P4').
  • G' is a gate electrode, and the same reference numerals are added to the same portions as the FIG. 1.
  • the electrical distribution in the MOSFET is appropriately set, thereby making it possible to realize to ensure reliability of the gate insulating film on the drain side, reduce the threshold voltage, and improve the electrical resisting pressure. Also, the punch-through dropping of the depletion layer, which is from the drain region to the source region can be prevented.
  • the gate length can be shortened, and made fine. Moreover, since the average value of the thickness of the gate insulating film is reduced, thereby making it easy to reduce the on-resistance, improve the switching speed and the current driving ability.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
US08/155,911 1990-10-17 1993-11-23 FET having gate insulating films whose thickness is different depending on portions Expired - Fee Related US5422505A (en)

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JP2280201A JP2744126B2 (ja) 1990-10-17 1990-10-17 半導体装置
US77759791A 1991-10-16 1991-10-16
US08/155,911 US5422505A (en) 1990-10-17 1993-11-23 FET having gate insulating films whose thickness is different depending on portions

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