US5260438A - Method for removing the protecting group for hydroxy group - Google Patents

Method for removing the protecting group for hydroxy group Download PDF

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US5260438A
US5260438A US08/052,680 US5268093A US5260438A US 5260438 A US5260438 A US 5260438A US 5268093 A US5268093 A US 5268093A US 5260438 A US5260438 A US 5260438A
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group
tri
substituted
fluoride
substituted silyl
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Hiroshi Horikawa
Kazuhiko Kondo
Tameo Iwasaki
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Tanabe Seiyaku Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D503/00Heterocyclic compounds containing 4-oxa-1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. oxapenicillins, clavulanic acid derivatives; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D205/00Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom
    • C07D205/02Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
    • C07D205/06Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D205/08Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with one oxygen atom directly attached in position 2, e.g. beta-lactams
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D463/00Heterocyclic compounds containing 1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbacephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D463/02Preparation
    • C07D463/06Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D477/00Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring
    • C07D477/02Preparation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D499/00Heterocyclic compounds containing 4-thia-1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. penicillins, penems; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D499/88Compounds with a double bond between positions 2 and 3 and a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D505/00Heterocyclic compounds containing 5-oxa-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. oxacephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Definitions

  • the present invention relates to a novel method for removing the protecting group for hydroxy group.
  • ⁇ -Lactam compounds having a hydroxy group have been known to be useful as an antimicrobial agent having excellent antimicrobial activity or an intermediate thereof.
  • various ⁇ -lactam antimicrobials such as penem antimicrobials [cf. Japanese Patent Second Publication (Kokoku) No. 396/1991, Japanese Patent First Publication (Kokai) No. 105686/1980, Japanese Patent Second Publication (Kokoku) No. 14679/1992], carbapenem antimicrobials [cf. Japanese Patent First Publication (Kokai) No. 202886/1985, Japanese Patent First Publication (Kokai) No. 5081/1986, Japanese Patent First Publication (Kokai) No.
  • methods 1), 2) and 3) are used for removal of t-butyldimethylsilyl group
  • method 4 method 5) and method 6) are used for removal of t-butyldiphenyl silyl group, triethylsiliyl group and trimethylsilyl group, respectively.
  • An object of the present invention is to provide a novel method for removing the protecting groups for hydroxy group. More particularly, the present invention provides a novel method for removing effectively tri-substituted silyl groups from a compound having a tri-substituted silyl group-protecting hydroxy group without decomposition of the desired product, even though the such compound has an unstable structure, such as ⁇ -lactam compounds.
  • the removal of the protecting group from a ⁇ -lactam compound having a tri-substituted silyl group-protecting hydroxy group is carried out by treating said ⁇ -lactam compound with a combination of a fluoride selected from a) an alkali metal fluoride, b) an alkaline earth metal fluoride, and c) a hydrogenfluoride with an inorganic or organic amine, and an acid.
  • a fluoride selected from a) an alkali metal fluoride, b) an alkaline earth metal fluoride, and c) a hydrogenfluoride with an inorganic or organic amine, and an acid.
  • the "fluoride” includes, for example, a) alkali metal fluorides such as potassium fluoride, sodium fluoride, cesium fluoride, etc., b) alkaline earth metal fluorides such as calcium fluoride, etc., c) hydrogenfluorides of an inorganic or organic amine such as ammonium fluoride, a tri-lower alkylammonium fluoride, a benzyl(di-lower alkyl)ammonium fluoride, pyridinium fluoride, etc.
  • the “acid” may be any strong or weak organic or inorganic acids, for example, lower alkanoic acids (e.g. acetic acid, propionic acid, butyric acid, etc.), hydroxy-substituted lower alkanoic acids (e.g. citric acid, etc.), trihalogeno-lower alkanoic acids (e.g. trifluoroacetic acid, etc.), lower alkanesulfonic acids (e.g. methanesulfonic acid, etc.), phenylsulfonic acids which may optionally be substituted by a lower alkyl group or a halogen atom (e.g. p-toluenesulfonic acid, benzenesulfonic acid, etc.), mineral acids (e.g. hydrofluoric acid, hydrobromic acid, sulfuric acid, hydrochloric acid, etc.), and the like.
  • lower alkanoic acids e.g. acetic acid, propionic acid, buty
  • fluorides and acids may be used in any form, for example, in the form of a mixture of a fluoride and an acid, or in the form of a compound consisting of these two components including a salt, a double salt, a complex, an adduct, etc.
  • the fluoride is used in an amount sufficient to remove the tri-substituted silyl group, for example, it is usually used in an amount of 1 to 10 equivalents, more preferably 4 to 8 equivalents to the starting compound.
  • the amount of the acid varies according to acidity of the acid to be used, but it is usually used in an amount sufficient to keep the pH value of the reaction solution pH 2 to 7, preferably pH 4 to 7, for example, it is usually used in an amount of 0.01 to 10 equivalents, preferably 0.01 to 8 equivalents to the starting compound.
  • the fluoride is any one as mentioned above, but alkali metal fluorides, alkaline earth metal fluorides, and ammonium fluoride are preferable.
  • the acid is any one as mentioned above, but lower alkanoic acids and mineral acids are preferable.
  • the mixture of the fluoride and the acid is, for example, a mixture of an alkali metal fluoride and a lower alkanoic acid, a mixture of an alkaline earth metal fluoride and a lower alkanoic acid, and a mixture of ammonium fluoride and a mineral acid.
  • the compound may be any one which contains both a fluoride and an acid as a component, such as a compound wherein these two components act not independently but cooperatively in the reaction system, and a compound wherein said acid does not exist in the form of an acid in the reaction system.
  • Suitable examples of the compound are compounds consisting of a fluoride selected from an alkali metal fluoride, an alkaline earth metal fluoride and a hydrogenfluoride of an inorganic or organic amine such as ammonium hydrogenfluoride (NH 4 F.HF) and alkali metal hydrogenfluorides [e.g.
  • KF.HF potassium hydrogenfluoride
  • NaF.HF sodium hydrogenfluoride
  • hydrogen fluoride hydrogen fluoride
  • the compound is used in an amount wherein each component is contained in an amount as mentioned above, and the compound is preferably used in an amount of 1 to 10 equivalents, more preferably 4 to 8 equivalents to the starting compound.
  • the reaction can be carried out under cooling or with heating, for example, at 0° C., to 50° C., preferably at 15° C. to 25° C., in a solvent.
  • the solvent may be any one which does not affect the reaction, polar solvents are preferable.
  • the polar solvent includes, for example, organic solvents such as dimethylformamide, acetonitrile, tetrahydrofuran, dimethylsulfoxide, dimethylacetamide, or a mixture of water and these organic solvents.
  • the alkali metal fluoride or alkaline earth metal fluoride may be either in the form of an anhydride thereof or in the form of a hydrate thereof (e.g. potassium fluoride dihydrate).
  • the solvent used in the reaction is preferably a mixture of water and the above mentioned organic solvent, and water is used in an mount of 1 to 10 equivalents, preferably 2 to 8 equivalents to the alkali metal fluoride or alkaline earth metal fluoride.
  • the ⁇ -lactam compound having a tri-substituted silyl group-protecting hydroxy group may be any conventional ⁇ -lactam compound, for example, a compound having a partial structure of the formula [I]: ##STR1## wherein R is a tri-substituted silyl group, and Alk is a straight chain or branched chain lower alkylene group, more particularly, a compound of the formula [I-a]: ##STR2## wherein R 1 is an organic group, a group of the formula: --COOR 2 is a protected or unprotected carboxyl group, X is a group of the formulae: --CH 2 CH 2 --, --S--CH 2 --, --O--CH 2 --, --CH 2 --, --CH(R 3 )--, --S-- or --O--, in which R 3 is a lower alkyl group, and Y is a sulfur atom, oxygen atom, or single bond, and R and Alk are
  • ⁇ -lactam compounds are useful as antimicrobials, prodrugs thereof, or intermediate thereof.
  • the organic group represented by R 1 in the formula [I-a] may be any one which is used for conventional ⁇ -lactam antimicrobials, for example, lower alkyl groups, cycloalkyl groups, aryl groups (e.g. phenyl group, etc.), heterocyclic groups having at least one heteroatom selected from nitrogen atom, oxygen atom or sulfur atom (e.g. pyrrolidinyl group, piperidinyl group, furyl group, thienyl group, imidazolinyl group, pyridyl group, etc.), and the like.
  • aryl groups e.g. phenyl group, etc.
  • heterocyclic groups having at least one heteroatom selected from nitrogen atom, oxygen atom or sulfur atom e.g. pyrrolidinyl group, piperidinyl group, furyl group, thienyl group, imidazolinyl group, pyridyl group, etc.
  • these groups may optionally have one or more substituents, and the substituent includes, for example, hydroxy group, a lower alkyl group, an amino-lower alkyl group, a lower alkoxy group, amino group, a lower alkylamino group, mercapto group, a lower alkylthio group, amidino group, guanidino group, carbamoyl group, thiocarbamoyl group, sulfamoyl group, carbamoyloxy group, cyano group, carboxyl group, a lower alkoxycarbonyl group, an aralkyloxycarbonyl group, oxo group, thioxo group, a halogeno group, a cycloalkyl group, an aryl group (e.g.
  • phenyl group etc.
  • a heterocyclic group e.g. pyrrolidinyl group, piperidinyl group, furyl group, thienyl group, imidazolinyl group, pyridyl group, etc.
  • a heterocyclic group e.g. pyrrolidinyl group, piperidinyl group, furyl group, thienyl group, imidazolinyl group, pyridyl group, etc.
  • the protecting group for the carboxyl group may be any conventional one, for example, groups which can be used for prodrugs of ⁇ -lactam antimicrobials, or groups which can be removed during the synthesis of ⁇ -lactam antimicrobials.
  • the groups which can be used for prodrugs of ⁇ -lactam antimicrobials are, for example, ester residues which are metabolized in living body by hydrolysis, and the like, for example, groups of the formulae: --Z--OCOR 4 , --Z--OCO 2 R 4 and --Z--O--R 4 (in which Z is a lower alkylene group, R 4 is a lower alkyl group, a cycloalkyl group, a lower alkenoyl group, a lower alkoxy-lower alkyl group, a lower alkanoyloxy-lower alkyl group).
  • Suitable examples of these groups are a lower alkanoyloxy-lower alkyl group, a cycloalkylcarbonyloxy-lower alkyl group, a lower alkenoyloxy-lower alkyl group, a lower alkoxy-lower alkanoyloxy-lower alkyl group, a lower alkanoyloxy-lower alkoxy-lower alkyl group, a lower alkoxy-lower alkyl group, a lower alkoxy-lower alkoxy-lower alkyl group, a lower alkoxycarbonyloxy-lower alkyl group, a lower alkoxy-lower alkoxycarbonyloxy-lower alkyl group.
  • the groups which can be removed during the synthesis of ⁇ -lactam antimicrobials may be any conventional one, for example, a lower alkyl group, a lower alkenyl group, a halogeno-lower alkyl group, nitrobenzyl group, and a lower alkoxybenzhydryl group.
  • the "tri-substituted silyl group" used for protecting hydroxy group is silyl groups which are substituted by three groups selected from a straight chain or branched chain lower alkyl group and phenyl group, for example, tri-lower alkylsilyl groups (e.g. trimethylsilyl group, triethylsilyl group, etc.), branched chain lower alkyl group-substituted di-lower alkylsilyl groups (e.g. t-butyldimethylsilyl group, etc.), lower alkyl group-substituted di-branched chain lower alkylsilyl group (e.g.
  • methyldiisopropylsilyl group, etc. methyldiisopropylsilyl group, etc.
  • branched chain lower alkyl group-substituted diphenylsilyl groups e.g. t-butyldiphenylsilyl group, etc.
  • triphenylsilyl group e.g. t-butyldiphenylsilyl group, etc.
  • tri-substituted silyl group having 6 to 18 carbon atoms especially, branched chain lower alkyl group-substituted di-lower alkylsilyl groups, lower alkyl group-substituted di-branched chain lower alkylsilyl groups, branched chain lower alkyl group-substituted diphenylsilyl group, triphenylsilyl group are preferable, and branched chain lower alkyl group-substituted di-lower alkylsilyl groups are more preferable.
  • the "lower alkyl” group, the “lower alkylene group” and the “lower alkoxy group” are ones having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, respectively.
  • the "lower alkanoyl group” and the “lower alkenyl group” are ones having 2 to 7 carbon atoms, preferably 2 to 5 carbon atoms, respectively.
  • the “lower alkenoyl group” and the “cycloalkyl group” are ones having 3 to 8 carbon atoms, preferably 3 to 6 carbon atoms, respectively.
  • the "lower alkanoic acid” is ones having 2 to 7 carbon atoms, preferably 2 to 5 carbon atoms
  • the “lower alkanesulfonic acid” is ones having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms.
  • Example 1 The same procedures as Example 1 are repeated except that calcium fluoride is used instead of potassium fluoride to give (1R,5S,6S)-2-[(4R)-pyrrolidine-2-thion-4-ylthio]-6-[(1R)-1-hydroxyethyl]-1-methylcarbapen-2-em-3-carboxylic acid isobutyryloxymethyl ester.
  • Example 2 The same procedures as Example 1 are repeated except that hydrobromic acid and ammonium fluoride are used instead of acetic acid and potassium fluoride to give (1R,5S,6S)-2-[(4R)-pyrrolidine-2-thion-4-ylthio]-6-[(1R)-1-hydroxyethyl]-1-methylcarbapen-2-em-3-carboxylic acid isobutyryloxymethyl ester.
  • Example 2 The same procedures as Example 1 are repeated except that sulfuric acid and ammonium fluoride are used instead of acetic acid and potassium fluoride to give (1R,5S,6S)-2-[(4R)-pyrrolidine-2-thion-4-ylthio]-6-[(1R)-1-hydroxyethyl]-1-methylcarbapen-2-em-3-carboxylic acid isobutyryloxymethyl ester.
  • Example 2 The same procedures as Example 2 are repeated except that potassium hydrogenfluoride is used instead of ammonium hydrogenfluoride to give (1R,5S,6S)-2-[(4R)-pyrrolidine-2-thion-4-ylthio]-6-[(1R)-1-hydroxyethyl]-1-methylcarbapen-2-em-3-carboxylic acid ally ester.
  • (3S,4S)-3-[(1R)-1-t-Butyldimethylsilyloxyethyl]-4-[(1S)-1-phenylthiocarbonylethyl]-1-(1-methoxycarbonylmethyl)-2-azetidinone is treated in the same manner as in Example 1, 2 or 3 to give (3S,4S)-3-[(1R)-1-hydroxyethyl]-4-[(1S)-1-phenylthiocarbonylethyl]-1-(1-methoxycarbonylmethyl)-2-azetidinone.
  • tri-substituted silyl groups are effectively removed under moderate conditions from a compound having tri-substituted silyl group-protecting hydroxy group, even though said compound has an unstable structure such as ⁇ -lactam compounds, so that the desired compound can be obtained easily and in high yield without decomposition of the desired compounds.
  • the method of the present invention is industrially useful as a method for removing protecting groups for hydroxy group.

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5821362A (en) * 1993-02-12 1998-10-13 Suntory Limited Method of desilylating silylether compounds
WO2011048583A1 (en) 2009-10-23 2011-04-28 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
US20110224426A1 (en) * 2008-07-30 2011-09-15 Neera Tewari Process for the preparation of carbapenem compounds
US10695322B2 (en) 2016-01-29 2020-06-30 The Johns Hopkins University Inhibitors of bacterial growth

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US5821362A (en) * 1993-02-12 1998-10-13 Suntory Limited Method of desilylating silylether compounds
US20110224426A1 (en) * 2008-07-30 2011-09-15 Neera Tewari Process for the preparation of carbapenem compounds
US8841444B2 (en) 2008-07-30 2014-09-23 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
WO2011048583A1 (en) 2009-10-23 2011-04-28 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
US10695322B2 (en) 2016-01-29 2020-06-30 The Johns Hopkins University Inhibitors of bacterial growth

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