US3835320A - Particle-beam device equipped with means for attenuating mechanical movements - Google Patents

Particle-beam device equipped with means for attenuating mechanical movements Download PDF

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Publication number
US3835320A
US3835320A US00039388A US3938870A US3835320A US 3835320 A US3835320 A US 3835320A US 00039388 A US00039388 A US 00039388A US 3938870 A US3938870 A US 3938870A US 3835320 A US3835320 A US 3835320A
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US
United States
Prior art keywords
pressure
particle
column assembly
pressure vessels
column
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Expired - Lifetime
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US00039388A
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English (en)
Inventor
H Helwig
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Siemens AG
Siemens Corp
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Siemens Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details

Definitions

  • a particle-beam device has a beam axis and is exposed tomechanical movements.
  • the device also has a column assembly for housing electro-optical equipment needed for focus the particle beam and a support structure for supporting the column assembly.
  • damping system for damping the mechanical movements has a plurality of elastic pressure vessels communicating with the support structure and the column for holding the column.
  • the damping system includes fluid actuating means connected to the pressure vessels for actuating the pressure vessels in response to the mechanical movements.
  • My invention relates to a particle-beam device with a column supported by a base structure and containing apparatus for influencing a beam in a vacuum and means for attenuating mechanical movements.
  • the invention is intended in the first instance for electron microscopes, it can nevertheless find application with advantage with other particle-beam devices such as ion microscopes and deflection devices. These devices tend, as a consequence of the construction of the vacuum space thereof and with the equipment functioning to focus the beam to form an enlarged image of the specimen, as a standing column, to be subject to mechanical movements.
  • An object of my invention is to substantially reduce the vibration sensitivity or susceptibility to mechanical movements in the columns of theabove-mentioned particle-beam devices.
  • the means for attenuating mechanical movements contains hydraulically or pneumatically operated, elastically formed vessels that grip on the column. Because the means to attenuate mechanical movements grips directly on the column, an especially good attenuation action is ensured. As opposed to the known arrangements of a support suspension, the actuating arm for the movements in the instant invention is considerably reduced. Also atenuated are vibrations caused by equipment such as pumps mounted on the support structure.
  • pressure vessels are arranged between the support structure and the column.
  • the particle-beam device is provided with a swinging apparatus that grasps the column in a fork-like manner and functions to lift parts of the column such as the column part containing the beam generator
  • pressure vessels can be arranged between the fork and the column.
  • Such a swinging apparatus functions so that it first separates the column parts in the direction of the beam axis, the column parts being constructed so as to be swingable toward each other.
  • the parts constructed to be lifted are slightly raised, whereby the parts constructed so as to be swingable toward each other are disengaged- Only thereafter does the lifted part swing out.
  • the first part of the swinging cycle of the swinging apparatus can at the same time be used, by using the always available play, for setting the direction of pressure force that is applied by the pressure vessels.
  • the pressure vessels are arranged so as to operate in a rotational symmetrical relation to the beam axis.
  • three pres sure cylinders can, for example, be grouped around the beam axis at the same angle so as to be opposed to each other.
  • a pressure vessel is especially suitable which is constructed as an elastic hose surrounding the beam and filled with a pressure medium.
  • an equalizing vessel for a pressure medium is arranged between the pressure vessels and a pressure generator.
  • Means for adjusting the pressure in the pressure vessels are arranged with respect to the pressure medium.
  • FIG. 1 is a front view of an electron microscope equipped with a means for attenuating mechanical movements according to the invention
  • FIG. 2 is a side view of the electron microscope according to FIG. 1;
  • FIG. 3 is a top view of the electron microscope illustrated in FIGS. 1 and 2;
  • FIG. 4 illustrates a pressure vessel constructed in the form of a hose and surrounding the microscope column
  • FIG. 5 illustrates a pressure vessel constructed in the A form of a pressure cylinder.
  • the electron microscope comprises two main parts, namely, the microscope column assembly 1 and the support assembly 2, the latter taking on the form of a desk because of its covering.
  • a panel portion 3 is located on the desk and contains measuring and indicating instruments as well as control buttons for operating the microscope.
  • the microscope Because of the height of the microscope and especially because of the length of the column 1 in which the particle beam travels and which contains all the electro-optical assemblies as well as the specimen, the microscope has the tendency to undergo swinging movements in response to external mechanical vibrations. In older electron microscopes, the mere leaning on the console by the operator could result in the beam wandering at the final image screen.
  • the microscope column 1 is divided into several subparts. To swing the uppermost part 4 of the column away in a sideward direction from the other parts of the column, the latter is gripped by the fork-like swinging apparatus at the required elevation.
  • the uppermost part 4 contains the beam generator and condensor lenses.
  • the swinging apparatus 5 functions together with a collar 5a to first move the column part 4, as already mentioned, in the upward direction and then to swing the same.
  • the column 1 is placed with the base plate 6 on the support surface 7 of the support structure 2.
  • three pressure cylinders 8 are disposed intermediate base plate 6 and support surface 7 and are disposed in rotation-symmetrical order with respect to the beam axis as shown in FIG. 3.
  • the pressure cylinders can be equipped with cap-type gaskets.
  • the pressure cylinder 8 is shown in FIG. 5 and comprises a stationary base 8a and a moveable cap portion 8b.
  • the cap portion 812 is sealed against the base 8a by means of an elastic, flexible cap-type gasket 8c.
  • the interior of cap portion 812 is divided by a plate 8d, the latter being provided with a bore 8e having a relatively small diameter.
  • the interior of cap portion 8b is connected by line 13 with the compensator vessel 11 shown in FIGS. 1 and 2.
  • a single pressure vessel 9 is arranged between the fork 5 and the column 1.
  • the pressure vessel is in the form of an elastic hose 9 filled with a pressure medium.
  • Hose 9 initiates, in dependence upon the movement of the fork 5 parallel to the direction of the beam axis, either a pressure directed upwardly or downwardly.
  • FIG. 4 The construction of the column 1 and the fork 5 for receiving the hose 9 is illustrated in FIG. 4.
  • a compensating vessel 11 having a manometer 12 is located between the pressure vessels 8 and 9 and the pump 10.
  • the line system 13 connects the various pressure vessels with the compensating vessel 11.
  • the pressure in the various pressure vessels can be adjusted by means of the valve 14, so that a proper damping or attenuation is achieved.
  • spring bodies 15 can be added between the support surface of the support structure 2 and the floor of the room in which the microscope is located.
  • cap 8b is divided, in order to impede or slow down the movement, by means of a plate 8d which has a bore 8e of relatively slight diameter.
  • the interior space of the cap 8b is connected via a lead 13 to the compensating vessel 11 (FIGS. 1 and 2).
  • a particle-beam device having a beam axis and being exposed to mechanical movements, comprising a column assembly for housing electro-opticai equipment needed to focus the particle beam, a support structure for supporting said column assembly, and damping means for damping the mechanical movements having a plurality of elastic pressure vessels mounted intermediate said column assembly and said support structure and communicating with said support structure and said column assembly for holding said column assembly, said damping means including fluid actuating means connected to said pressure vessels for actuating said pressure vessels in response to the mechanical movements.
  • said pressure vessels being disposed in rotationsymmetrical relation with respect to said beam axis.
  • each of said pressure vessels being a pressure cylinder.
  • a particle-beam device comprising a pressure generator and a compensator vessel, said compensator vessel being connected between said pressure generator and said pressure vessels, and adjusting means connected to said compensator vessel for adjusting the pressure in said pressure vessels.
  • a particle-beam device wherein said column assembly has upper and lower portions and wherein said support structure includes swinging means having a fork-like member engaging said column assembly for displacing said upper portion from said lower portion and, at least one of said pressure vessels being disposed intermediate said fork-like member and said column assembly, whereby said one pressure vessel applies pressure forces to said column assembly in the vertical direction in dependence upon the movement of said fork-like member.
  • said one pressure vessel being in the form of a hose surrounding said beam axis.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Sources, Ion Sources (AREA)
US00039388A 1969-05-28 1970-05-21 Particle-beam device equipped with means for attenuating mechanical movements Expired - Lifetime US3835320A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691927410 DE1927410B2 (de) 1969-05-28 1969-05-28 Korpuskularstrahlgeraet mit mitteln zur daempfung mechanischer schwingungen

Publications (1)

Publication Number Publication Date
US3835320A true US3835320A (en) 1974-09-10

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US00039388A Expired - Lifetime US3835320A (en) 1969-05-28 1970-05-21 Particle-beam device equipped with means for attenuating mechanical movements

Country Status (5)

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US (1) US3835320A (enExample)
DE (1) DE1927410B2 (enExample)
FR (1) FR2048687A5 (enExample)
GB (1) GB1290235A (enExample)
NL (1) NL7000300A (enExample)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4019389A (en) * 1976-02-11 1977-04-26 The Singer Company Viscous damper
USD381031S (en) * 1995-07-03 1997-07-15 Hitachi, Ltd. Electron microscope
US5864138A (en) * 1995-09-14 1999-01-26 Hitachi, Ltd. Electron Microscope
DE10102542B4 (de) * 2001-01-19 2009-01-15 Vistec Semiconductor Systems Jena Gmbh Anordnung zur visuellen Inspektion von Substraten
USD638046S1 (en) * 2010-02-22 2011-05-17 Hitachi High-Technologies Corporation Electron microscope
USD644258S1 (en) * 2010-02-22 2011-08-30 Hitachi High-Technologies Corporation Electron microscope
USD671654S1 (en) * 2009-02-20 2012-11-27 Sii Nano Technology Inc. Compound charged particle beam device
USD687475S1 (en) * 2012-05-10 2013-08-06 Hitachi High-Technologies Corporation Electron microscope
USD708245S1 (en) * 2012-11-30 2014-07-01 Hitachi High-Technologies Corporation Cover for an electron microscope
USD708244S1 (en) * 2012-11-30 2014-07-01 Hitachi High-Technologies Corporation Electron microscope
USD711950S1 (en) * 2012-11-30 2014-08-26 Hitachi High-Technologies Corporation Portion of a cover for an electron microscope
USD851151S1 (en) * 2017-07-25 2019-06-11 Hitachi High-Tech Science Corporation Microscope

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3050554A1 (de) * 1980-09-01 1982-09-23 Le N Proizv Ob Burevestnik Electron microscope

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2370373A (en) * 1939-01-17 1945-02-27 Ruska Ernst Electronic microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2370373A (en) * 1939-01-17 1945-02-27 Ruska Ernst Electronic microscope

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
The Electron Microscope, Second Edition, by E. F. Burton et al., Reinhold Publishing Corp., New York, 1946, page 225. *

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4019389A (en) * 1976-02-11 1977-04-26 The Singer Company Viscous damper
USD381031S (en) * 1995-07-03 1997-07-15 Hitachi, Ltd. Electron microscope
US5864138A (en) * 1995-09-14 1999-01-26 Hitachi, Ltd. Electron Microscope
US6084239A (en) * 1995-09-14 2000-07-04 Hitachi, Ltd. Electron microscope
DE10102542B4 (de) * 2001-01-19 2009-01-15 Vistec Semiconductor Systems Jena Gmbh Anordnung zur visuellen Inspektion von Substraten
USD671654S1 (en) * 2009-02-20 2012-11-27 Sii Nano Technology Inc. Compound charged particle beam device
USD679026S1 (en) * 2009-02-20 2013-03-26 Sii Nano Technology Inc. Compound charged particle beam device
USD644258S1 (en) * 2010-02-22 2011-08-30 Hitachi High-Technologies Corporation Electron microscope
USD638046S1 (en) * 2010-02-22 2011-05-17 Hitachi High-Technologies Corporation Electron microscope
USD687475S1 (en) * 2012-05-10 2013-08-06 Hitachi High-Technologies Corporation Electron microscope
USD708245S1 (en) * 2012-11-30 2014-07-01 Hitachi High-Technologies Corporation Cover for an electron microscope
USD708244S1 (en) * 2012-11-30 2014-07-01 Hitachi High-Technologies Corporation Electron microscope
USD711950S1 (en) * 2012-11-30 2014-08-26 Hitachi High-Technologies Corporation Portion of a cover for an electron microscope
USD851151S1 (en) * 2017-07-25 2019-06-11 Hitachi High-Tech Science Corporation Microscope

Also Published As

Publication number Publication date
GB1290235A (enExample) 1972-09-20
DE1927410B2 (de) 1972-03-30
FR2048687A5 (enExample) 1971-03-19
NL7000300A (enExample) 1970-12-01
DE1927410A1 (de) 1970-12-03

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