US3695327A - Wiped thin film evaporation and treatment apparatus - Google Patents

Wiped thin film evaporation and treatment apparatus Download PDF

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Publication number
US3695327A
US3695327A US20674A US3695327DA US3695327A US 3695327 A US3695327 A US 3695327A US 20674 A US20674 A US 20674A US 3695327D A US3695327D A US 3695327DA US 3695327 A US3695327 A US 3695327A
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United States
Prior art keywords
wiper
rotor
thin film
vane
treatment apparatus
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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US20674A
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English (en)
Inventor
Fritz Widmer
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Luwa Ltd
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Luwa Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B01D1/222—In rotating vessels; vessels with movable parts
    • B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
    • B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J10/00—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor
    • B01J10/02—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor of the thin-film type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/18—Stationary reactors having moving elements inside
    • B01J19/1887—Stationary reactors having moving elements inside forming a thin film

Definitions

  • ABSIRACT A thin film treatment apparatus, especially for treatment of viscous materials, which is of the type com- [30] Forelgn Apphcauon Priomy Data prising a rotationally symmetrical treatment chamber March 21, 1969 Switzerland ..428l/69 which is surrounded y a heatingor cooling jacket and which contains a rotor.
  • the rotor is equipped with 52 us. c1. ..159/6 w, 159/49 material conveying means which are inclined with 51 Int. Cl. "B0111 1/22 respect o the ads of rotation of the rotor.
  • Furth 58 Field 6 Search ..159/6, 6 w, 49; 202/236; the rotor provlded Wlth wiper a which extend 203/89 generally axially and are arranged in offset fashion I with respect to the conveying means in the peripheral 5 References a or circumferential direction.
  • the conveying means are UNITED STATES PATENTS formed of a plurality of vane stubs arranged in at least one axial row, wherein the confronting ends of g a neighboring vane stubs, viewed in the axial direction, 309O732 5 1963 are spaced from one'another and, in each instance, 3l99574 8/l965 et 6 form a gap.
  • the wiper means are offset in l er 5 l w trailing fashion with respect to the row of vane stubs 3, KG i6!
  • the present invention relates to a new and improved thin film treatment apparatus for the treatment or handling of viscous materials.
  • the rotor possesses essentially a centrally disposed shaftmember upon which there is arranged 'a spiral or helix possessing large pitch. Between the spiral there are mounted upon the shaft member in the directionof rotation, and offset through l 80, vane stubs which mutually overlap in the axial direction and whichextend axially. Both the spiral as well as the vane studs extendup to the region of the inner wall of the treatment chamber.
  • the material introduced into the treatment chamber is contacted by the spiral and spread in the form of a thin layer upon the treatment wall.
  • the vane stud following the spiral only performs a smoothingaction upon the surface of the thin film.
  • This apparatus possesses the primary disadvantage that as soon'as the treatment wall is covered with a thin layer of the material to be treated, the surplus material is practically conveyed by the spiral in a single thrust through the treatment chamber. It should be apparent that such excess material is subjected to a shorter treatment time, and therefore, experiences a less intensive heart treatment than that material which has been deposited upon the treatment wall. Hence, the material discharging from the treatment chamber does not possess any uniform properties.
  • the speed of rotation must be coordinated to this predetermined treatment time. Therefore, it is not possible to accommodate the speed of rotation to other factors, which for instance influence the treatment intensity or the uniformity of the product.
  • Still another significant object of the present invention relates to an improved thin film treatment apparatus which is relatively simple in construction, ex-v tremely reliable in operation, not readily subject to breakdown, and extremely efficient in carrying out proper treatment of a material according to desired processing conditions.
  • the inventive thin film treatment apparatus possesses material conveying means which are formed from a number of vane stubs which are arranged in at least one axial row, wherein the confronting ends of neighboring vane stubs, viewed in axial direction, are spaced from one another and, in each instance, form a respective gap. Furthermore, the wiper means are offset in trailing fashion in the direction of rotation of the rotor with respect to the row of vane studs through an angle which is less than and at least partially bridge the gaps between neighboring vane stubs.
  • the conveying means instead of being formed as a continuous spiral, now consist of a plurality of vanes, there is prevented that the material to be treated is conveyed through the apparatus without experiencing any residence time upon the treatment chamber walls. Quite to the contrary, the conveying, distribution and treatment of the material occurs stepwise and alternatingly. This results from the fact that the material conveyed by one vane cannot arrive in the operable region of a successive vane in the discharge direction, before this material has been contacted and treated by the wiper means.
  • the wiper means directly trail or follow the vanes during the rotation of the rotor, the wiper means act upon the collected material which forms at the discharge end of each vane, and specifically, before this collection of material has flown away under the influence of the force of gravity.
  • the wiper blade members therefore act extremely intensively upon the material which has accumulated. Therefore, the admixing of the material upon the wall of the treatment chamber is intensified and the distribution of this material upon such wall is improved.
  • FIG. 1 is a schematic illustration in elevational view of a preferred embodiment of inventive thin film treatment apparatus
  • FIG. 2 is a cross-sectional view of the thin film treatment apparatus depicted in FIG. 1, taken substantially along the line II-II thereof;
  • FIGS. 3-5 inclusive show in enlarged views three further respective constructions of the inventive arrangement of the wiper blade elements.
  • FIG. 1 the exemplary embodiment of thin film treatment apparatus depicted in FIG. 1 will be seen to comprise an essentially vertically arranged, rotationally symmetrical treatment chamber 12.
  • An inlet connection 14 is provided at the chamber wall 120 at the upper end of the treatment chamber 12 and at the lower end thereof, coaxially with respect to such treatment chamber, there is provided the outlet or discharge connection 16.
  • This outlet connection 16 is operatively connected with the treatment chamber 12 by means of an associated conical member 18.
  • the treatment chamber 12 is encircled or surrounded by a suitable jacket 20 which is provided with an inlet connection 22 and an outlet connection 24 for a suitable heating or cooling medium.
  • the conical member 18 is encased by a jacket 26 which is equipped with an inlet connection 28 and an outlet connection 30. Additionally, at the upper end of the treatment chamber 12 there is provided a vapor chamber or compartment 32 which possesses a diameter corresponding to that of the treatment chamber 12. The upper end of this vapor compartment 32 is closed by a cover member 36. Finally, at the wall or jacket 'of the vapor compartment 32 there is provided the vapor discharge connection 34.
  • a rotor member 40 which essentially extends over the entire length of the treatment chamber 12 and the therewith connected vapor chamber 32.
  • This rotor member 40 embodies a substantially centrally disposed rotor body member or shaft 42 which is connected at its upper end with a shaft stub 56 and, in turn, is rotatably mounted in a bearing 54 arranged in the cover member 36.
  • the shaft stub 56 is coupled with a suitable drive motor 58.
  • the end of the central tubular rotor body 42 which confronts or faces the outlet connection 16 is rotatably mounted at the inner wall 120 of the treatment chamber 12 by means of a rim member 50 through the agency of a number of webs 51 (FIG. 2) which are connected with the tubular body member 42 of the rotor.
  • a rim member 50 At the outer periphery of the rim member50 there are provided grooves or ridges 52 which are inclined with respect to the axis of the rotor 40, and the significance of which will be more fully explained hereinafter.
  • the section of the tubular rotor body member 42 extending over the length of the treatment chamber 12, will be seen to be equipped with two radial, axially extending rows of conveyor elements, which are displaced through an angle of 180 with respect to one another, and which are composed of a plurality of vane stubs 44. More precisely, it will be observed that the vane stubs 44 are secured to the tubular body member 42 by means of the webs or struts 45 (FIG. 2) along an imaginary helical line. Further, the vane stubs 44 are inclined with respect to the axis of the rotor 40 and in the direction of rotation of the rotor.
  • axially extending wiper elements 46 are secured to the tubular rotor body member 42 between the vane elements 44 arranged in axial rows. It is important for the functionality of the apparatus that the wiper elements 46, in the peripheral or circumferential direction, together with the material conveying element 44, form an angle 0: (alpha) which is smaller than This first material conveyor wiper element combination is followed by a second wiper-material conveyor combination spaced to provide an angle [3 (beta) between the first wiper 46 and the second material conveyor 44.
  • a plurality of axially extending wipers 48 are arranged at the region of the vapor compartment 32 upon the tubular rotor body member 42.
  • a suitable material removal device in this instance in the form of a removal worm member 60 is provided in the conical member 18.
  • the material removal worm member 60 is rotatably connected via a shaft stub 62 with an appropriate drive mechanism 66.
  • This shaft stub 62 is rotatably mounted in a bearing 64 arranged at the discharge or outlet connection 16.
  • the viscous material to be treated is introduced into the treatment chamber 12, which is heated and/or cooled by the jacket 20, via the inlet connection 14 and is engaged by the wiper elements 46 and the vane stubs 44 which are placed into rotation.
  • the wiper elements 46 spread the engaged material in the form of a thin film upon the inner wall 12a of the treatment chamber 12, the inclined positioned vane stubs 44 impart to the engaged material a displacement component which is directed towards the discharge or outlet connection 16.
  • vane stubs 44 contact the material by means of their inlet or leading edges 44a, they displace such material in front of each such vane stub for such length of time until the material has reached the discharge or trailing edge 44b of such vane stub 44 and remains in the form of a material bead 74 (FIG. 3) upon the inner wall of the treatment chamber 12 at the region of the gaps 43 between neighboring vane stubs 44.
  • the next successive or trailing wiper element 46 now contacts the material bead 74, spreads the material which has been passed through the gap opening upon the inner wall of the treatment chamber 12 and distributes the material excess of the bead 74 upon the entire width of the wiper element 46.
  • next successive vane stub 44 as well as the wiper element 46 repeat this treatment for such length of time until the viscous material has reached the lower end of the rotor 40.
  • the tre'ated material is further conveyed into the discharge or removal worm member 60.
  • This material removal worm member 60 presses the treated material under large pressure through the outlet connection 16 where it can be further processed, for instance discharges such into a suitable container or granulator, which to preserve clarity in illustration has not been shown in the drawmg.
  • vapors which are formed during the heat treatment of viscous materials ascend in countercurrent with respect to the viscous material undergoing treatment, into the vapor compartment or chamber 32, where they are contacted by the rotating blades or vanes 48 and separated from any entraineddroplets which may be present in known manner.
  • the thus cleaned vapor current now arrives via the vapor dischargeconnection 34, for instance, into a suitable non-illustrated condenser.
  • FIG. 3 illustrates a modified version of wiper element.
  • the marginal portion 72 of the therein illustrated wiper element and which confronts the inner wall 12a of the treatment chamber 12 is flexed or bent in a direction opposite to the direction of rotation of the rotor.
  • This radially extending wiper element 70 encloses together with the bent marginal portion 72 an angle a between 100 and l70, advantageously between 130 and l50. Due to the flexed marginal portion 72 of the 'wiper element 70 there is achieved that the material collected in front of the wiper element 70 is subjected to a wedge action, so that this material is pressed through between the edge of the flexed marginal portion 72 and the inner wall 12a of the treatment chamber 12.
  • This form of wiper element 70 enhances the processing of highly viscous materials without the danger of clogging the treatment chamber 12.
  • FIG. 4 illustrates a further embodiment of wiper element.
  • a blade stub is secured to the tubular rotor body member 42.
  • a blade or leaf spring 82 which is bent or flexed opposite the direction of rotation of the rotor 40 is secured to this blade stub 80 by means of the attachment wiping element 84. This blade spring 82 wipes in idleness, during rotation of the rotor 40, along the inner wall of the treatment chamber 12.
  • FIG. 5 there is shown a further modification of the wiper element.
  • hinge elements 94 are provided at the blade stubs secured to the tubular rotor body member 42. These hinge elements 94 hingedly connect a wiper member or element 92 with the blade stub 90.
  • the spacing between the center of the tubular rotor body member 42 and the hinge axis of the hinge joint or member 94 is adjustable in such a way that the gap between the wiper element 92 and the inner wall 12a of the treatment chamber 12 can be exactly adjusted.
  • the use of the wiper element 92 has proven particularly advantageous when the material to be treated at the beginning of the treatment processes a low viscosity.
  • the gap between the wiper element 92 and the inner wall of the treatment chamber 12 which gap can be controlled in size, it is possible to. also contact materials of low viscosity and to effectively spread such in the form of a thin layer upon the inner wall 12a of the treatment chamber 12.
  • each such wiper element 46 depicted in FIGS. 1 and 2 need not of necessity be constructed to be continuous throughout the entire length of the treatment chamber 12.
  • each such wiper element 46 can also be formed of a plurality of axially extending partial or component elements, not shown in the drawing. What is important is only that the individual partial elements which face the discharge or outlet connection 16, protrude at both sides in axial direction past the radially extending edges of the vane stubs 44.
  • the properties of the material to be treated require a particularly long residence time in the thin film treatment apparatus, then, it is even possible to secure the individual partial elements in an arrangement which is inclined opposite the direction of rotation of the rotor 40, so that the treated material is subjected to a displacement component which is directed towards the inlet connection by virtue of the action of the partial elements of the wiper members 46.
  • the rotator 40 Due to the conveying action of the rotator 40 in the inventive thin film treatment apparatus, it is possible to operate such in any random desired position. Thus, in case the necessity exists, it is possible to have the treatment chamber 12 assume an inclined or horizontal position. it is even possible to introduce the material at the lower end of a vertically extending treatment chamber and to convey such by means of the rotor 40 towards the upper end of the treatment chamber 12, where it is removed by an appropriate mechanism out of the chamber 12.
  • the material removal worm member 60 instead of being driven by an independent drive member 66, as explained above, is directly coupled with the rotor member 40. if this be the case, then, the rotor drive mechanism 58 must be appropriately designed to possess a greater driving capacity.
  • the inventive thin film treatment apparatus for carryinglout reaction processes.
  • the materials to be reacted are advantageously admixed prior to introduction into the treatment chamber 12.
  • the jacket for cooling the reacting material. in such case, it is necessary to deliver via the inlet connections 22 or 24, respectively, a medium to the jacket 20 which possesses a temperature below the reaction temperature.
  • a wiped thin film treatment apparatus especially for treating viscous materials, comprising means defining a rotationally symmetrical treatment chamber, heating or cooling jacket means encircling said treatment chamber, rotor means within said treatment chamber, said rotor means comprising a rotor shaft, material conveying means and wiper means, said material conveying means comprising a plurality of vane stubs arranged in at least one row extending in axial direction along said rotor shaft and being supported thereby, each vane stub having a conveying surface inclined with respect to the axis of rotation of said rotor shaft at an angle of less than 90 with respect to said axis, each vane stub further having a leading edge and a trailing edge, each trailing edge of one vane stub of said row being spaced from the leading of the succeeding vane stub of said row as viewed in the axial direction to form a respective axial gap between adjacent vane stubs in said row, which is not swept b y any vane
  • said wiper means comprises at least one wiper blade member having a marginal portion which neighbors the inner wall of said treatment chamber and is rearwardly flexed with respect to the direction of rotation of said rotor means.
  • said wiper means comprises at least one wiper blade member incorporating a blade stub element and a wiper element, said blade stub element being secured to said rotor means, and means for pivotally connecting said wiper element with said blade stub element.
  • said wiper means comprises at least one wiper blade member incorporating a blade stub element and a wiper element, said wiper element being a blade spring member secured to said blade stub element, each such blade spring member having a wiper edge which contacts the inner wall of said treatment chamber.
US20674A 1969-03-21 1970-03-18 Wiped thin film evaporation and treatment apparatus Expired - Lifetime US3695327A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH428169A CH523087A (de) 1969-03-21 1969-03-21 Dünnschichtbehandlungsapparat

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US3695327A true US3695327A (en) 1972-10-03

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US (1) US3695327A (nl)
AT (1) AT321245B (nl)
BE (1) BE747557A (nl)
CH (1) CH523087A (nl)
DE (1) DE2011493A1 (nl)
FR (1) FR2039823A5 (nl)
GB (1) GB1278734A (nl)
NL (1) NL165938C (nl)
SE (1) SE375698B (nl)

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US4193837A (en) * 1977-06-07 1980-03-18 Gebrueder Buehler Ag Thin layer evaporators
US4490553A (en) * 1980-08-29 1984-12-25 Celanese Corporation Process for production of ethyl acrylate
EP0267025A1 (en) * 1986-11-04 1988-05-11 ECP ENICHEM POLIMERI S.r.l. (abbreviated: ECP S.r.l.) Thin-layer evaporator for high-viscosity fluids
AT388112B (de) * 1983-12-16 1989-05-10 Oesterr Forsch Seibersdorf Trockner, insbesondere vertikaler duennschichttrockner
US5094690A (en) * 1988-08-16 1992-03-10 Lenzing Aktiengesellschaft Process and arrangement for preparing a solution of cellulose
US5330567A (en) * 1988-08-16 1994-07-19 Lenzing Aktiengesellschaft Process and arrangement for preparing a solution of cellulose
US5534113A (en) * 1992-09-17 1996-07-09 Courtaulds Fibres (Holdings) Limited & Buss Ag Forming solutions
US6444782B1 (en) 1999-04-26 2002-09-03 Eastman Chemical Company Process for making pre-gels for a cross-linked branched polyester
US6469129B1 (en) 1999-04-26 2002-10-22 Eastman Chemical Company Process for crosslinked branched polyesters
US20040211657A1 (en) * 2003-04-11 2004-10-28 Ingelbrecht Hugo Gerard Eduard Method of purifying 2,6-xylenol and method of producing poly(arylene ether) therefrom
WO2008154666A1 (en) * 2007-06-21 2008-12-24 Lenzing Aktiengesellschaft Thin film treatment apparatus
WO2008154667A1 (en) * 2007-06-21 2008-12-24 Lenzing Aktiengesellschaft Thin film treatment apparatus
WO2008154668A1 (en) * 2007-06-21 2008-12-24 Lenzing Aktiengesellschaft Thin film treatment apparatus
WO2012012397A3 (en) * 2010-07-21 2012-03-15 Aquaback Technologies, Inc. Distiller with wipers for film evaporation and scrapers for removing deposit
WO2013158997A1 (en) * 2012-04-20 2013-10-24 Halliburton Energy Services, Inc. A method and apparatus for solid-liquid separation of drilling fluids for analysis
WO2016138343A1 (en) * 2015-02-27 2016-09-01 Caloris Engineering, LLC Compact mechanical vapor recompression evaporator system
CN106552438A (zh) * 2015-09-29 2017-04-05 亚申科技研发中心（上海）有限公司 分子蒸馏器
US20190247823A1 (en) * 2018-02-09 2019-08-15 Buss-Sms-Canzler Gmbh Device for the thermal treatment of viscous material, in particular for the thermal separation of material components contained in viscous material
CN110180196A (zh) * 2019-06-25 2019-08-30 无锡科伦达化工热力装备有限公司 一种高效刮板薄膜蒸发器
US10612191B2 (en) 2012-03-05 2020-04-07 Lenzing Aktiengesellschaft Method for producing a cellulose suspension
CN112080807A (zh) * 2019-06-12 2020-12-15 奥若泰克股份有限公司 薄膜处理设备
US11027215B1 (en) 2019-04-01 2021-06-08 Marion Mechanical LLC Vacuum distillation apparatus and methods
US11173416B2 (en) * 2019-03-29 2021-11-16 Julian Alexander Bublies Short-path evaporator
US11241637B2 (en) * 2019-08-12 2022-02-08 Buss-Sms-Canzler Gmbh Device for the thermal treatment of material, in particular for the thermal separation of material components contained in the material

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US4416672A (en) * 1980-07-18 1983-11-22 Underwood Gene E Degasser
DE4117630A1 (de) * 1991-05-29 1992-12-03 Schmidt Burr Peter Thermischer reaktor, insbesondere duennschichttrockner
DE4201046A1 (de) * 1992-01-17 1993-07-22 Bayer Ag Verfahren zur reinigung von polymerloesungen
AT402411B (de) * 1995-04-19 1997-05-26 Chemiefaser Lenzing Ag Anlage sowie integriertes folien- und faserwerk zur herstellung cellulosischer folien und fasern
AT402410B (de) * 1995-04-19 1997-05-26 Chemiefaser Lenzing Ag Verfahren zur herstellung einer cellulosesuspension
DE10200405A1 (de) 2002-01-08 2002-08-01 Zimmer Ag Spinnvorrichtung und -verfahren mit Kühlbeblasung
DE10204381A1 (de) 2002-01-28 2003-08-07 Zimmer Ag Ergonomische Spinnanlage
DE102004024030A1 (de) 2004-05-13 2005-12-08 Zimmer Ag Lyocell-Verfahren mit polymerisationsgradabhängiger Einstellung der Verarbeitungsdauer
DE102012103749A1 (de) * 2012-04-27 2013-10-31 BUSS-SMS-Canzler GmbH -Zweigniederlassung Düren- Reaktor mit einem beheizbaren Gehäuse
ES2914179T3 (es) 2016-11-08 2022-06-07 Buss Sms Canzler Gmbh Dispositivo de tratamiento de capa delgada
EP3318590B1 (de) 2016-11-08 2020-08-05 thyssenkrupp AG Verfahren zur abtrennung von flüchtigen verbindungen aus viskosen produkten mit einem dünnschichtverdampfer
CN110102071A (zh) * 2019-06-06 2019-08-09 无锡力马化工机械有限公司 一种采用上下独立传动装置的薄膜蒸发器
CN117500859A (zh) 2021-06-15 2024-02-02 科思创德国股份有限公司 包含间苯二酚和间苯二甲酸和/或对苯二甲酸的低聚酯、相应的聚酯碳酸酯及其制备
WO2023006512A1 (de) 2021-07-27 2023-02-02 Covestro Deutschland Ag Verfahren zur herstellung eines polysiloxan-polycarbonat-blockcopolymers unter verwendung mindestens eines spezial-kondensationsreaktors
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Cited By (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4193837A (en) * 1977-06-07 1980-03-18 Gebrueder Buehler Ag Thin layer evaporators
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Also Published As

Publication number Publication date
SE375698B (nl) 1975-04-28
BE747557A (fr) 1970-08-31
CH523087A (de) 1972-05-31
NL165938C (nl) 1981-06-15
NL165938B (nl) 1981-01-15
GB1278734A (en) 1972-06-21
AT321245B (de) 1975-03-25
FR2039823A5 (nl) 1971-01-15
NL7003845A (nl) 1970-09-23
DE2011493A1 (de) 1970-10-29

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