US3672923A - Solid precious metal sensitizing compositions - Google Patents
Solid precious metal sensitizing compositions Download PDFInfo
- Publication number
- US3672923A US3672923A US50918A US3672923DA US3672923A US 3672923 A US3672923 A US 3672923A US 50918 A US50918 A US 50918A US 3672923D A US3672923D A US 3672923DA US 3672923 A US3672923 A US 3672923A
- Authority
- US
- United States
- Prior art keywords
- metal
- group
- acid
- solutions
- sensitizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000001235 sensitizing effect Effects 0.000 title abstract description 50
- 239000010970 precious metal Substances 0.000 title abstract description 40
- 239000000203 mixture Substances 0.000 title description 75
- 239000007787 solid Substances 0.000 title description 14
- 229910052751 metal Inorganic materials 0.000 abstract description 53
- 239000002184 metal Substances 0.000 abstract description 53
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 36
- 238000000034 method Methods 0.000 abstract description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 30
- 229910052802 copper Inorganic materials 0.000 abstract description 27
- 239000010949 copper Substances 0.000 abstract description 27
- 239000008247 solid mixture Substances 0.000 abstract description 25
- 230000008021 deposition Effects 0.000 abstract description 20
- 229910052763 palladium Inorganic materials 0.000 abstract description 19
- 230000008569 process Effects 0.000 abstract description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 14
- 230000001464 adherent effect Effects 0.000 abstract description 10
- 239000000080 wetting agent Substances 0.000 abstract description 10
- 150000004696 coordination complex Chemical class 0.000 abstract description 8
- 230000000737 periodic effect Effects 0.000 abstract description 8
- 235000020354 squash Nutrition 0.000 abstract description 8
- 238000007865 diluting Methods 0.000 abstract description 7
- 229910052759 nickel Inorganic materials 0.000 abstract description 7
- 238000009877 rendering Methods 0.000 abstract description 7
- 229910017052 cobalt Inorganic materials 0.000 abstract description 6
- 239000010941 cobalt Substances 0.000 abstract description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052709 silver Inorganic materials 0.000 abstract description 6
- 239000004332 silver Substances 0.000 abstract description 6
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 80
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 34
- 239000002253 acid Substances 0.000 description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- 150000001450 anions Chemical class 0.000 description 25
- 238000000151 deposition Methods 0.000 description 19
- 150000003839 salts Chemical class 0.000 description 19
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 17
- 239000004615 ingredient Substances 0.000 description 14
- -1 e.g. Substances 0.000 description 12
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 11
- 150000002739 metals Chemical class 0.000 description 11
- 230000000087 stabilizing effect Effects 0.000 description 11
- 206010070834 Sensitisation Diseases 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- 229910052697 platinum Inorganic materials 0.000 description 10
- 230000008313 sensitization Effects 0.000 description 10
- 235000011150 stannous chloride Nutrition 0.000 description 10
- 239000001119 stannous chloride Substances 0.000 description 10
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000004033 plastic Substances 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 229910052737 gold Inorganic materials 0.000 description 8
- 239000010931 gold Substances 0.000 description 8
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 6
- 229910052703 rhodium Inorganic materials 0.000 description 6
- 239000010948 rhodium Substances 0.000 description 6
- 239000012265 solid product Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- 229910052718 tin Inorganic materials 0.000 description 6
- FWPIDFUJEMBDLS-UHFFFAOYSA-L tin(II) chloride dihydrate Chemical compound O.O.Cl[Sn]Cl FWPIDFUJEMBDLS-UHFFFAOYSA-L 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229910052741 iridium Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052762 osmium Inorganic materials 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910052707 ruthenium Inorganic materials 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229920005862 polyol Polymers 0.000 description 4
- 150000003077 polyols Chemical class 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 229960001755 resorcinol Drugs 0.000 description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 235000008504 concentrate Nutrition 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical group 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000003381 solubilizing effect Effects 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001340 alkali metals Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000001246 colloidal dispersion Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- 229960005150 glycerol Drugs 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 229960004337 hydroquinone Drugs 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229960004592 isopropanol Drugs 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000005065 mining Methods 0.000 description 2
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 2
- 229960001553 phloroglucinol Drugs 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 229960002920 sorbitol Drugs 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical class [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 2
- LCALOJSQZMSPHJ-QMMMGPOBSA-N (2s)-2-amino-3-cyclohexa-1,5-dien-1-ylpropanoic acid Chemical compound OC(=O)[C@@H](N)CC1=CCCC=C1 LCALOJSQZMSPHJ-QMMMGPOBSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- SQUHHTBVTRBESD-UHFFFAOYSA-N Hexa-Ac-myo-Inositol Natural products CC(=O)OC1C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C(OC(C)=O)C1OC(C)=O SQUHHTBVTRBESD-UHFFFAOYSA-N 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- 230000002411 adverse Effects 0.000 description 1
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- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Chemical group 0.000 description 1
- 150000001342 alkaline earth metals Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
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- 238000013459 approach Methods 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 239000000084 colloidal system Substances 0.000 description 1
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- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
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- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical group OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- CDAISMWEOUEBRE-GPIVLXJGSA-N inositol Chemical compound O[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@H](O)[C@@H]1O CDAISMWEOUEBRE-GPIVLXJGSA-N 0.000 description 1
- 229960000367 inositol Drugs 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- XOOMNEFVDUTJPP-UHFFFAOYSA-N naphthalene-1,3-diol Chemical compound C1=CC=CC2=CC(O)=CC(O)=C21 XOOMNEFVDUTJPP-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- IHUHXSNGMLUYES-UHFFFAOYSA-J osmium(iv) chloride Chemical compound Cl[Os](Cl)(Cl)Cl IHUHXSNGMLUYES-UHFFFAOYSA-J 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- CDAISMWEOUEBRE-UHFFFAOYSA-N scyllo-inosotol Natural products OC1C(O)C(O)C(O)C(O)C1O CDAISMWEOUEBRE-UHFFFAOYSA-N 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 1
- 239000010934 sterling silver Substances 0.000 description 1
- 229910000898 sterling silver Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- UWPPADMWQVNQFC-UHFFFAOYSA-J tetrachlorostannane;hydrochloride Chemical compound Cl.Cl[Sn](Cl)(Cl)Cl UWPPADMWQVNQFC-UHFFFAOYSA-J 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 1
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
Definitions
- Solid compositions dilutable to optically clear sensitizing solutions for rendering surfaces receptive to the deposition of an adherent electroless metal comprise a metal complex consisting of (a) a precious metal selected from a group consisting of the precious metals of the fifth and sixth periods of Groups VIII and I-B of the Periodic Table of Elements, (b) a Group IV metal of the Periodic Table of Elements Which is capable of two valence states and (c) an anion capable of forming a stable moiety with both valence states of the Group IV metal, in which the molar ratio ot (a) to (b) to (c) is from about 121:3 to 1:6:24.
- the solutions can be prepared by diluting the solid compositions. Controlled excesses of (b) and (c) and hydrogen ion and wetting agents enhance the solubility of the powdered product and stability of the diluted solutions. Processes for rendering surfaces receptive to the deposition of an electroless metal, e.g., copper, nickel, cobalt, palladium, gold and silver, are also provided.
- an electroless metal e.g., copper, nickel, cobalt, palladium, gold and silver
- the subject matter of the present invention relates to new and useful precious metal sensitizing compositions. More particularly, the invention relates to solid compositions comprising a precious metal complex, and to solutions prepared therefrom. The solutions are used to render surfaces of a substrate catalytic to the reception of an electroless metal.
- the plural bath process while readily effecting sensitization, deposits on metals a flash coating of the precious metal from the sensitizing bath.
- the precious metal so flash coated from the sensitizing bath disrupts the balance of the bath.
- the addition of the precious metal bearing solution to the bath is required.
- flash coating of precious metal normally leads to a low grade of adhesion, thereby materially affecting the bond and peel strength of an electroless metal deposit.
- Another object of the present invention is to provide new and useful solid compositions which are dilutable to true solutions and methods for sensitizing substrates using them which substantially obviate the problem of nonadherent precious metal flash coatings.
- Yet another object of the invention is to provide solid compositions and methods for sensitizing substrates with a precious metal which involve using very dilute treating solutions and thereby materially diminishing production costs.
- compositions which contain a relatively large excess of component (b) it is preferred to use a large excess of component (c) to solubilize the complex.
- this will be introduced in the form of 01- or Bror SnC1 and preferably as I-ICl. Extremely large excesses of this component do not seem to be detrimental to sensitizing activity. As to HCl, this seems to serve a two-fold purpose: it provides both a large excess of Cl" ion and also H+ ions, both assisting in the solubilization of the powdered product.
- component (c) e.g., sodium chloride
- component (b) is stannous chloride or a similar hydrolyzable composition which forms a basic salt, e.g., Sn(OH)Cl
- acid will be added to prevent hydrolysis of the Group IV metal.
- High concentrations of acid are preferretd, as will be explained hereinafter.
- optically-clear sensitizing solutions which have been prepared by diluting the solid compositions with an acid or a mixture of water and an acid, until the concentration of component (a) has been reduced to a concentration of from about 00003 gram/ liter to about 1.5 grams per liter.
- Another feature of the invention is a process to prepare the concentrate comprising heating an aqueous mixture of the components (a), (b) and (c) at a temperature of from about 80 C. to about the boiling point until formation of the complex is complete, and then concentrating the mixture until a friable, solid product is obtained.
- Still another feature is a process to prepare the concentrate which comprises mixing an aqueous solution of components (a) and (c) with an aqueous solution of components (b) and (c) and heating the mixture at from 80 C. to its boiling point, and then concentrating the mixture until a friable, solid product is obtained.
- the present invention further relates to an improved process for rendering surfaces receptive to the deposition of an adherent electroless metal, as well as a process for electrolessly depositing a metal on a substrate which has been sensitized with the sensitizing solutions of the present invention.
- An additional embodiment of the invention relates to particular acidic precious metal solutions for rendering surfaces receptive to the deposition of electroless copper, nickel, cobalt, palladium, gold or silver, and especially to copper or nickel.
- the invention consists of the novel methods, processes, steps and improvements shown and described.
- the present invention provides a significant improvement over the known sensitization techniques and compositions in that a procedure and composition is provided which will cause conductive and non-conductive materials to be so sensitized simultaneously that efficient and uniform deposition of an adhering electroless metal thereon may be readily effective; thus permitting, by way of illustration, copper plating of the non-metallic surfaces of the side Walls of the apertures defined in a plastic base material, as well as the concomrnitant adherent electroless deposition of copper on pre-formed copper surfaces on the plastic base.
- Illustrative of the conductive and nonconductive, metallic and non-metallic surfaces which can be plated uniformly with adherent electroless metal by use of the sensitizing solutions and techniques of the present invention are plastic surfaces and surfaces of metallic copper, iron, nickel, cobalt, silver, gold and alloys thereof, such as brass, sterling silver and the like.
- the present invention can be employed to render a surface catalytic to the reception of such metals as copper, nickel, palladium, cobalt, silver, gold and the like.
- a further advantage of the present invention is that sensitization as taught herein leads to practically complete avoidance of the deposition of a flash coating of precious metal from the sensitizing bath.
- a flash coating of precious metal normally leads to a low grade of adhesion. Also, avoidance of such deposition economically conserves the precious metal.
- the sensitizing solution can be directly incorporated in a plastic base at the time of its manufacture. This can be achieved by utilizing an organic sensitizing solution employing a solvent such as cyclohexanone, a highly viscous paste like composition. Alternatively, the solution can be reduced to a solid form by employing a counter ion and directly incorporating such solid in a plastic base at the time of manufacture. Therefore, the advent of the present invention provides for the preparation of presensitized plastic substrates.
- the most notable advantage occasioned by the advent of the present invention resides in the fact that such solutions possess a sensitizing activity at dilute levels.
- a complex is formed between the metals and the anion.
- the preferred palladium-tin-chloride solid complex of this invention is acid soluble. It is optically clear in dilute solution. It is filterable through ultra-membranes through which colloidal sensitizers will not pass. It has an ultraviolet absorption peak in 'aqueous acidic solution at 295-310 m and 320 m
- Solid compositions comprising the complex according to this invention may be diluted to levels of concentration which can easily and reproducibly be directly formulated into active sensitizing solutions.
- the invention makes available stable sensitizing solutions comprising significantly lower concentrations of precious metal than can be produced by other known methods, excluding, of course, the methods of copending applications Ser. No. 9,060, filed Feb. 5, 1970 and Ser. No. 801,167, filed Feb. 20, 1969*.
- the treating or sensitization procedure whichis an embodiment of this invention is an intermediate step between pretreatment or cleaning of the surfaces upon which the metal is to be electrolessly deposited and the actual deposition of the metal.
- the treatment to be afforded the surface to be plated depends upon the cleanliness of the material to be treated and associated factors.
- the first step in the procedure for effecting deposition of adherent electroless metal is to clean thoroughly the article or panel upon which plating is to occur. This is desirably accomplished by scrubbing the panel with pumice or the like to remove he avy soils; rinsing with water; and subsequent removal of soil due to organic substances from the panel and apertures defined therein with a suitable alkali cleaning composition.
- a typical alkaline cleaner composition is as follows:
- Oxides are removed from copper panel surfaces and apertures by application of a light etching solution such as a 25 percent solution of ammonium persulfate in water as is described in Bulletin No. 86 of the Becco Chemical Division of the Food Machinery and Chemical Corporation, Buffalo, NY.
- the surface oxides also may be removed by application of the cupric chloride etchant solution described by Black in US. Pat. No. 2,908,557. This treatment should not exceed 2 to 3 minutes.
- the treatment period and temperature are significant, particularly where the panel surfaces are formed of a conductive metal, in that elevated temperatures and extended periods of time beyond those described may result in removal not only of the oxide materials but of the conductive metal, such as cupper foil, forming the surfaces of the panel.
- the panel is rinsed thoroughly after this step with water to remove all semblance of etching compounds. Care should be taken to avoid the formation of further oxide film during rinsing or as a result of air oxidation.
- the panel may be inserted in an acid solution comprising, for example, 1020 percent by weight of hydrochloric acid in water for a period of from 2 to 5 minutes, and from this bath the panel is placed in the sensitization or treating solution of the present invention.
- a sanding operation with a fine abrasive can also be used to remove oxides.
- the sensitizing solution prepared by diluting the solid composition comprises an acidic aqueous solution of a metal complex as defined above consisting of (a) a precious metal, (b) a Group IV metal and (c) an anion. It is optically-clear, i.e. non-colloidal.
- a precious metal e.g. palladium, platinum, gold, rhodium, osmium, iridium and mixtures of these metals.
- the inorganic and organic acid salts of these metals, and of the Group IV metals such as the chlorides, bromides, fluorides, fiuoborates, iodides, nitrates, sulfates and acetates of stannous tin, titanium and germanium among others may be used.
- Other acid salts of the precious metals and Group IV metals will readily suggest themselves to those skilled in the art.
- the salts are preferably soluble in water, or in organic or inorganic acid aqueous solutions.
- the chloride is preferred, both for the precious metal, and the Group IV metal compound.
- the preferred precious metals and Group IV metal are palladium or platinum, particularly palladium, and stannous tin.
- the precious metal concentration should be from at least about 0.0003 to about 1.5 grams/liter of solution. While the higher end of this range causes sensitization to be completed in very abbreviated periods of time, e.g. ten seconds, the lower end of this range is normally more economic.
- the bath can be prepared directly or by diluting a concentrate.
- the solid composition as defined above are diluted with an aqueous solution of suitable acid. If a dry power acid, e.g., citric acid, is included in the composition, water alone can be used.
- the solid compositions are prepared by heating the salts of the precious metals and a Group IV metal salt in an aqueous solution of suitable acid as will be described hereinafter and evaporating substantially to dryness.
- suitable acid e.g., hydrochloric acid, hydrofluoric acid, sulfuric acid, citric acid, acetic acid and the like.
- the anion of the inorganic acid corresponds to the anion of the salt of the precious metal, or to the anion of the Group IV metal salt.
- the anion of the acid should preferably correspond to the common anion of the salts. Where the anion of the precious metal differs from that of the Group IV metal salt, the anion of the acid preferably corresponds to the anion of the precious metal salt.
- acids having anions which differ from the anions of the precious metal salts or of the Group IV metal salt may also be used.
- the hydride anion, I-I- can be part of the complex.
- Preferred anions are Cland SnC1
- concentration of the acid in the sensitizing solutions depends upon the strength of the acid employed. The concentration of the acid should be at least sufiicient to prevent hydrolysis of the Group IV metal, at the final concentration.
- a suitable lower limit is 0.001 normal.
- At the upper end of the concentration of the acid may be as high as 15 normal, or even higher.
- the concentration of the acid in the sensitizing solution generally varies between about 0.02 and 7.5 normal.
- the concentration of the acid in the sensitizing solution approaches the upper limit given hereinabove.
- the concentration of acid in the sensitizing solution should, of course, also be high enough to solubilize the salts of the precious metals and the Group IV metal and also be high enough to render the solution suitable for use as a sensitizer for the material being treated. Care should be used in selecting the acid concentration to insure that the specimen being treated is not adversely attacked or corroded by the treating solution.
- the Group IV metal ion concentrtaion may vary widely but must be maintained in excess of a stoichiometric amount based on the amount of precious metal ions present in the sensitizing solution. Normally a large excess of, for example, stannous chloride, is maintained to allow for air oxidation of the stannous ion. Illustratively, concentrations of as high as 50 grams per liter of stannous chloride are not detrimental to the effectiveness of the sensitizing activity of the diluted solutions.
- the sensitizing solutions of the present invention may contain additional agents to stabilize the solution, e.g., against the effects of atmospheric oxidation.
- agents will include the use of additional quantities of the Group IV metal, as for example, additional stannous chloride may be added to a palladium-stannous chloride sensitizing solution, as well as compounds, such as organic hydroxy compounds (01s), dihydroxy compounds (diols) and polyhydroxy compounds (polyols), the fiuorinated hydrocarbon wetting agents and hydrogen fluoride.
- One result of the addition of such compounds to the sensitizing solution is the inhibition of oxidation of the Group IV metals and the subsequent reduction of the precious metals.
- the stabilizers if solid, can be compounded with the solid sensitizer or they can be co-deposited therewith by mixing solutions and evaporating the solvents.
- stabilizing ingredients to the complex is an embodiment of this invention which improves the stability of the solution and avoids formation of undesirable sludges on surfaces, e.g.,
- the nature of the stabilizing ingredient is not particularly critical. It should be soluble at least in an amount great enough to provide the desired stabilization effect. Evidence of effective stabilization is easily observed in comparison with control baths, i.e., those without the stabilizing ingredient present. These latter baths over a period of one week or so will be seen to deposit a film of metallic compound or to precipitate such a compound. On the other hand, baths to which an effective amount of the stabilizing ingredient has been added will remain clear and be stable and storable for periods of at least two weeks and even longer. In any event, the minimum amount will vary somewhat from compound to compound but is easy to determine routinely. There is no apparent reason to limit the quantity of the stabilizing ingredient to the minimum effective amount and often substantially more will be used, the choice being primarily dictated by economic considerations.
- the stabilizing ingredient need not be completely water soluble, although for ease of formulation a high degree of water solubility is desirable.
- the hydroxy compounds which can be used most efliciently would be of relatively low molecular weight, polysubstituted with hydroxy groups or containing at least one hydroxy group and other functional groups such as sulfonic acid groups, phosphate groups, amino groups, halogens, carboxyl groups and the like, which tend to enhance solubility in polar media.
- the solubilizing group can be organic or inorganic, anionic, cationic, nonionic, amphoteric and water soluble.
- the wetting agents should be active in acidic solutions and have good thermal stability. Especially preferred are those wherein Z is anionic.
- a preferred species has the following spectrum of solubilities in acid media, in grams/ 1000 grams of solution: 12 /2% hydrochloric acid, 1; 37% hydrochloric acid, 0.1; 12 /2% nitric acid, 1; 70% nitric acid, 5; 12 /2% phosphoric acid, 1; 85% phosphoric acid, 1; l2 /2% sulfuric acid, and 97% sulfuric acid, 0.5.
- Another preferred species has the folowing solubility spectrum: 12 /2% hydrochloric acid, 10; 12 /2% nitric acid, 20; and 12 /2% sulfuric acid, 10.
- Particularly useful fluorinated hydrocarbon wetting agents of this type are sold under the trade name Fluorad by the Minnesota Mining and Manufacturing Company, St. Paul, Minn.
- the preferred species, described above, are designated Fluorad FC-9S and FC98, respectively.
- Preferred hydroxyl-containing stabilizing ingredients are open chain aliphatic mono-01s, diols or polyols of from about 1 to about 12 carbon atoms, e.g., methanol, ethanol, iso-propanol, ethylene glycol, propylene glycol, 1,4-butane diol, glycerol, glucose, sucrose, and the like; and closed chain aliphatic or aromatic monoor dicarboxylic mono-01s, diols or polyols of from about 6 to 12 carbon atoms, e.g., cyclohexanol, cyclohexanediol, inositol, phenol, fi-naphthol, resorcinol, sorbitol, hydroquinone, pyrogallol, phloroglucinol, naphthoresorcinol, and the like.
- these stabilizing ingredients have a water solubility of at least greater than about 4% by weight, especially those in the aromatic family.
- Particularly preferred stabilizing ingredients of this type are isopropanol, ethylene glycol, glycerol, resorcinol, sorbitol, hydroquinone, pyrogallol and phloroglucinol. These can generally be employed at an appropriate concentration in the range of from about 2 to about 50% by weight in the final mixture.
- the aromatic compounds will be employed at 2 to 7 Wt. percent and the aliphatic compounds will be used in concentrations of from about 4 to 50 wt. percent, although higher and lower amounts can be formulated, as mentioned above.
- An especially preferred stabilizer is resorcinol at 20 to 70 grams/liter.
- Illustrative fluorinated hydrocarbon wetting agents have a formula selected from the group consisting of and wherein n is an integer of from 3 through 10, and Z is a hydrophilic group.
- n is an integer of from 3 through 10
- Z is a hydrophilic group.
- surfactants are composed of molecules containing a perfluorinated tail portion and a hydrophilic head portion.
- the fluorocarbon portion of the molecules advantageously contains either 3 or 7 carbon atoms where the surfactant is a perfluorosulfonic acid derivatives.
- the hydrophilic portion of the fluorocarbon surfactants can be any typical hydrophilic group such as hydroxyl, alkali metal or alkaline earth metal substituted hydroxyl, an alkali metal group, an ammonium group, amine groups, substituted amine groups, quaternary ammonium salts amide and substituted amide groups, and the like.
- An illustrative surfactant for this embodiment of the invention has the formula:
- m m s Useful too is hydrogen fluoride itself. This will be employed at l to 10 g./liter of solution and preferably at about 3 g./liter. Conveniently, this latter concentration is made by adding enough 60% aqueous HF to provide 50 mL/liter.
- complexing reaction which occurs between the metals and the anion results in the formation of more than one and possibly several complexes.
- these can be depicted as including complex anions of the formula (MeSn X mixtures thereof, wherein Me is Ru, Rh, Pd, Os, Ir, Pt, Au or a mixture thereof, and X is halogen, i.e., fluorine, chlorine, bromine, or iodine; preferably chlorine or bromine.
- Preferred complexes are those wherein Me is Pd or Pt.
- the concentrations of the components of the complexes are expressed in terms of molar ratio. Therefore, the molar ratio of precious metal to Group IV metal to anion of the complexes of the present invention is from about 1:1:3 to 1:6:24.
- Sensitizing solutions of the instant invention can be prepared from the solid compositions, which may be stored, and shipped and diluted when the sensitizing solution is to be used for electroless plating. When properly prepared, in accordance with the teachings hereof, such diluted solids form true, clear solutions.
- compositions of this invention can be prepared in oneor two-steps:
- an aqueous mixture which contains components (a) (b) and (c), as defined above, in which mixture component (a) is present in a concentration of at least about 1.5 grams/liter, the molar ratios of (a) to (b) to (c) each being, respectively 1: at least 1: at least 3; is heated at a temperature of from about 80 C. to about the boiling point of the mixture until formation of the metal complex is substantially complete, then concentrating, e.g., by evaporation, with or without heat, at atmospheric or reduced pressure or by freeze drying, the mixture until a friable, solid product is obtained.
- an aqueous solution containing a salt of component (a) in a concentration of from about 1.5 grams per liter up to about the limit of solubility of the salt in water at the boiling point and component and an aqueous solution of component (b) and (c), the ratios of (a):(b):(c) each being respectievly, 1: at least about 1: at least about 3, are first prepared.
- the two solutions are mixed together and heated at a temperature of from about 80 C. to about the boiling point of the mixture until formation of the complex is substantially complete, and then concentrating the mixture until a friable, solid product is obtained.
- palladium 4.8 to 100 grams/liter (calculated as metal) can be conveniently used. Depending on the temperature, it is preferred to heat the mixture for from about 20 to 90 minutes, although this is not critical.
- a completely dry product can be made which will be soluble and stable in plain water (as opposed to acid or water and acid) can be prepared by providing:
- a co-mixed dried form of a stabilizer such as a fluorinated hydrocarbon wetting agent or resorcinol
- EXAMPLE 1 A solid composition, dilutable to an optically clear, sensitizing solution is prepared.
- a first solution comprising the following ingredients:
- EXAMPLE 3 A solid composition, dilutable to an optically-clear sensitizing solution is prepared in one step. The followingformulation is used:
- Palladium chloride (g.) 62.5 Hydrochloric acid (37%, ml.) 700 Stannous chloride dihydrate (g.) 800 Water to make total (ml.) 1295 Stannous chloride is dissolved in the hydrochloric acid, then the water is added. The palladium chloride is added with agitation. The mixture is heated to C. for 20 minutes, then boiled for .1.5 hours and cooled, The mixture is evaporated to a friable dark solid by the procedure of Example 1 using a steam bath to assist in water removal.
- Palladium chloride (g.) 10 Hydrochloric acid (37%, ml.) 200 Water to make total (ml.) 500 The palladium salt dissolves slowly in the acid-water mixture.
- a second solution is prepared comprising the following ingredients: Stannous chloride dihydrate (g.) 800 Hydrochloric acid (37%, ml.) 500
- the first solution is added to the second with agitation, then the mixture is boiled for 1.5 hours, during which time it changes color from blue or purple, through green, then straw-yellow and, finally, brown.
- 0.8 g. of a fluorocarbon wetting agent (PC-95, 3M Company, St. Paul, Minn.) is added.
- the dark product can be diluted with 12% aqueous hydrochloric acid to obtain a highly active sensitizing solution.
- Example 5 The procedure of Example 1 is repeated, respectively substituting for the palladium chloride, stoichiometricallyequivalent amounts of the following: ruthenium chloride (RuCl rhodium chloride (RhCl3); osmium chloride ('OsCl iridium chloride (IrCl and platinum chloride (PtCl Solid compositions according to this invention are obtained containing, respectively, ruthenium, rhodium, osmium, iridium and platinum.
- a sensitizing solution according to this invention is prepared by taking an appropriate weight of the composition from Example 1, diluting it with a mixture comprising 490 ml. of 37 percent hydrochloric acid and 490 ml. of water. The resulting solution will contain about 0.6 gram/liter of palladium in the form of the palladiumstannous chloride complex of this invention and will have good catalytic activity.
- catalytically active sensitizing solutions are prepared by taking 11 appropriate portions of the compositions of Example 1 and diluting them, respectively, to 1 liter in 1:1 by volume of a mixture of 37% aqueous hydrochloric acid and water.
- the solutions contain, respectively, about 0.0003 gram and 1.5 grams of palladium per liter.
- EXAMPLE 7 The solids of Example are diluted with enough 1:1 mixture by volume of 37% hydrochloric acid and water to provide sensitizing solutions according to this invention containing, respectively, 0.6 and 1.5 grams/liter of ruthenium, rhodium, osmium, iridium and platinum.
- stannous chloride is preferred in the practice of the present invention
- other stannous tin compounds such as, for example, stannous fluoborate and stannous sulfate are also suitable for use in the seeding, i.e., sensitizing compositions described herein and in equivalent concentrations.
- the panel surfaces including any side walls of the apertures defined therein are thereafter thoroughly rinsed with water to entirely remove the sensitizing solution therefrom.
- the panel is then passed through a further bath of lactic acid, suitably diluted, e.g., about 10-20 percent, the passage employing a period of from 10 to 20 seconds, and the panel is again rinsed with water prior to immersion in a suitable electroless plating bath.
- lactic acid suitably diluted, e.g., about 10-20 percent
- electroless plating baths may be used for the deposition of the adherent metal after sensitizing of the plating surface wtih the compositions of the present invention.
- the electroless copper deposition may be followed by electroplating with copper or other metals to build up copper thicknesses of 0.001 to 0.002 inch or greater.
- electroless copper is ordinarily deposited on apertures formed in plas tic insulation sheets which have conductive copper foil laminated on both top and bottom surfaces.
- the circuits are conventionally electroplated with copper or other metals to build up copper thicknesses of 0.001 to 0.002 inch or greater.
- Electroplated copper is required over the electroless copper to form rugged conductive copper on the walls of the aperture approximately 0.001 inch thick or greater.
- the adhesion between the electroless copper and the foil originally laminated to the plastic sheet has been very poor due to a poorly adherent flash coating of precious metal from the catalyzing step.
- the subsequent electrodeposits fail because of the flash coating and could easily be stripped off merely by the application of pressure sensitive adhesive coated cellophane tape such as Scotch cellophane tape manufactured by the Minnesota Mining and Manufacturing Company. Therefore, prior to the advent of the present invention, in order to achieve adherent coating, the surface of the copper foil had to be mechanically abraded before electroplating to remove all trace of the electroless copper deposits.
- the electroplated copper may be deposited directly and will adhere so strongly that if the plastic base sheet is broken, the copper foil may be bent back and forth on itself until it breaks but no separation is evident between the original laminated foil and the electroplated copper film.
- a solid composition, dilutable to an optically clear, sensitizing solution for rendering a surface receptive to the deposition of an adherent electroless metal which comprises a metal complex consisting essentially of:
- composition as defined in claim 1 which includes, in addition to the amount of component (b) in said complex, a sufficient excess of component (b) to provide from 3 to 100 moles of component (b) per mole of complex in the total composition.
- composition as defined in claim 2 wherein said excess of component (b) provides from 5 to moles of component (b) per mole of complex in the total composition.
- composition as defined in claim 2 which also includes an excess of component (c) over that present in the complex.
- a composition as defined in claim 1 which includes an acid in an amount at least sufiicient to prevent hydrolysis of the Group IV metal when said composition is diluted.
- component (c) is C11 SnCl or a mixture thereof.
- component (c) is Cl, SnCl or a mixture thereof.
- Me is Ru, Rh, Pd, Os, Ir, Pt, Au or a mixture thereof, and X is halogen.
- a process for the preparation of a solid composition as defined in claim 1 which comprises heating an aqueous mixture containing said components (a), (b) and (c), in which mixture component (a) is present in a concentration of at least about 1.5 grams/liter, at a temperature of from about C. to about the boiling point of said mixture, until formation of said metal complex is substantially complete, then concentrating said mixture until a solid product is obtained.
- a process for the preparation of a solid composition as defined in claim 1 which comprises (1) providing an aqueous solution containing a salt of said component (a) in a concentration of from 13 about 1.5 grams per liter up to about the limit of solubility of said salt in water and component (2) providing an aqueous solution of said components (b) and (c), the ratios of components (a):(b'):(c) being 1: at least 1: at least 3; (3) mixing said solutions and heating the mixture at a temperature of from about 80 C. to about the boiling point of said mixture; and
- step (3) (4) concentrating the mixture from step (3) until a solid product is obtained.
- a solid composition as defined in claim 1 which includes, as a stabilizing ingredient, a compound selected from the group consisting of organic mono-01s, diols and polyols and a fluorinated hydrocarbon wetting agent, the amount of said compound in said cmposition being at least sufiicient to prevent separation from diluted solutions thereof of component (a) as a metallic film or precipitate.
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Catalysts (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5091870A | 1970-06-29 | 1970-06-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3672923A true US3672923A (en) | 1972-06-27 |
Family
ID=21968302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US50918A Expired - Lifetime US3672923A (en) | 1970-06-29 | 1970-06-29 | Solid precious metal sensitizing compositions |
Country Status (12)
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3841881A (en) * | 1972-09-13 | 1974-10-15 | Rca Corp | Method for electroless deposition of metal using improved colloidal catalyzing solution |
US3874882A (en) * | 1972-02-09 | 1975-04-01 | Shipley Co | Catalyst solution for electroless deposition of metal on substrate |
US3917486A (en) * | 1973-07-24 | 1975-11-04 | Kollmorgen Photocircuits | Immersion tin bath composition and process for using same |
US3960573A (en) * | 1972-08-07 | 1976-06-01 | Photocircuits Division Of Kollmorgan Corporation | Novel precious metal sensitizing solutions |
US3961109A (en) * | 1973-08-01 | 1976-06-01 | Photocircuits Division Of Kollmorgen Corporation | Sensitizers and process for electroless metal deposition |
US3993848A (en) * | 1975-02-18 | 1976-11-23 | Surface Technology, Inc. | Catalytic primer |
US4020009A (en) * | 1975-09-30 | 1977-04-26 | Shipley Company, Inc. | Catalyst composition and method of preparation |
US4027055A (en) * | 1973-07-24 | 1977-05-31 | Photocircuits Division Of Kollmorgan Corporation | Process of tin plating by immersion |
DE2639797A1 (de) * | 1976-01-26 | 1977-07-28 | Borg Warner | Zusammensetzung fuer die aktivierung stromloser metallablagerungen |
US4061588A (en) * | 1975-09-30 | 1977-12-06 | Shipley Company Inc. | Catalyst composition and method of preparation |
DE2742777A1 (de) * | 1976-09-20 | 1978-03-30 | Kollmorgen Tech Corp | Sensibilisierungsloesungen und verfahren zu deren herstellung und anwendung |
US4082899A (en) * | 1976-09-07 | 1978-04-04 | Nathan Feldstein | Method of applying catalysts for electroless deposition and article |
US4160050A (en) * | 1976-04-13 | 1979-07-03 | Kollmorgen Technologies Corporation | Catalyzation processes for electroless metal deposition |
US4187198A (en) * | 1972-08-07 | 1980-02-05 | Kollmorgen Technologies Corp. | Novel precious metal sensitizing solutions |
US4212768A (en) * | 1975-05-05 | 1980-07-15 | Jameson Melvin N | Electroless plating of nonconductive substrates |
US4321285A (en) * | 1974-10-04 | 1982-03-23 | Surface Technology, Inc. | Electroless plating |
US4681630A (en) * | 1982-09-27 | 1987-07-21 | Learonal, Inc. | Method of making copper colloid for activating insulating surfaces |
US4717421A (en) * | 1986-04-28 | 1988-01-05 | Mcgean-Rohco, Inc. | Solid tin-palladium catalyst for electroless deposition incorporating stannous salts of organic acids |
US4762560A (en) * | 1982-09-27 | 1988-08-09 | Learonal, Inc. | Copper colloid and method of activating insulating surfaces for subsequent electroplating |
DE19524601C1 (de) * | 1995-07-06 | 1996-03-21 | Deutsche Automobilgesellsch | Verfahren zum Aktivieren von Kunststoffoberflächen auf der Basis von Pd/Sn mit photometrischer Reifungskontrolle |
US20040067312A1 (en) * | 2002-10-02 | 2004-04-08 | Kanagawa University | Method for forming thin film and catalyzed treatment solution used therefor |
US20180016482A1 (en) * | 2012-12-18 | 2018-01-18 | University Of South Florida | Encapsulation of Thermal Energy Storage Media |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1021761A (en) * | 1973-08-01 | 1977-11-29 | Kollmorgen Corporation | Sensitizers for electroless metal deposition |
JPS58189365A (ja) * | 1982-04-28 | 1983-11-05 | Okuno Seiyaku Kogyo Kk | 化学メッキ用アンダーコート組成物 |
SE454250B (sv) * | 1984-09-24 | 1988-04-18 | Asea Ab | Industrirobot med linjera drivanordningar |
-
1970
- 1970-06-29 US US50918A patent/US3672923A/en not_active Expired - Lifetime
-
1971
- 1971-04-20 CA CA110846A patent/CA934902A/en not_active Expired
- 1971-06-24 AT AT549171A patent/AT314306B/de not_active IP Right Cessation
- 1971-06-25 CH CH937671A patent/CH571577A5/xx not_active IP Right Cessation
- 1971-06-25 GB GB2987471A patent/GB1349666A/en not_active Expired
- 1971-06-28 DK DK316171A patent/DK148919C/da not_active IP Right Cessation
- 1971-06-28 ES ES392729A patent/ES392729A1/es not_active Expired
- 1971-06-29 SE SE7108398A patent/SE427190B/xx unknown
- 1971-06-29 NL NLAANVRAGE7109004,A patent/NL169757C/xx not_active IP Right Cessation
- 1971-06-29 JP JP4757771A patent/JPS5515544B1/ja active Pending
- 1971-06-29 FR FR7123698A patent/FR2100042A5/fr not_active Expired
- 1971-06-30 IT IT51295/71A patent/IT954171B/it active
-
1973
- 1973-07-20 AT AT643273*1A patent/AT326443B/de active
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3874882A (en) * | 1972-02-09 | 1975-04-01 | Shipley Co | Catalyst solution for electroless deposition of metal on substrate |
US3960573A (en) * | 1972-08-07 | 1976-06-01 | Photocircuits Division Of Kollmorgan Corporation | Novel precious metal sensitizing solutions |
US4187198A (en) * | 1972-08-07 | 1980-02-05 | Kollmorgen Technologies Corp. | Novel precious metal sensitizing solutions |
US3841881A (en) * | 1972-09-13 | 1974-10-15 | Rca Corp | Method for electroless deposition of metal using improved colloidal catalyzing solution |
US3917486A (en) * | 1973-07-24 | 1975-11-04 | Kollmorgen Photocircuits | Immersion tin bath composition and process for using same |
US4027055A (en) * | 1973-07-24 | 1977-05-31 | Photocircuits Division Of Kollmorgan Corporation | Process of tin plating by immersion |
US3961109A (en) * | 1973-08-01 | 1976-06-01 | Photocircuits Division Of Kollmorgen Corporation | Sensitizers and process for electroless metal deposition |
US4321285A (en) * | 1974-10-04 | 1982-03-23 | Surface Technology, Inc. | Electroless plating |
US3993848A (en) * | 1975-02-18 | 1976-11-23 | Surface Technology, Inc. | Catalytic primer |
US4212768A (en) * | 1975-05-05 | 1980-07-15 | Jameson Melvin N | Electroless plating of nonconductive substrates |
US4085066A (en) * | 1975-09-30 | 1978-04-18 | Shipley Company Inc. | Catalyst composition and method of preparation |
US4061588A (en) * | 1975-09-30 | 1977-12-06 | Shipley Company Inc. | Catalyst composition and method of preparation |
US4020009A (en) * | 1975-09-30 | 1977-04-26 | Shipley Company, Inc. | Catalyst composition and method of preparation |
DE2639797A1 (de) * | 1976-01-26 | 1977-07-28 | Borg Warner | Zusammensetzung fuer die aktivierung stromloser metallablagerungen |
US4160050A (en) * | 1976-04-13 | 1979-07-03 | Kollmorgen Technologies Corporation | Catalyzation processes for electroless metal deposition |
US4082899A (en) * | 1976-09-07 | 1978-04-04 | Nathan Feldstein | Method of applying catalysts for electroless deposition and article |
DE2742777A1 (de) * | 1976-09-20 | 1978-03-30 | Kollmorgen Tech Corp | Sensibilisierungsloesungen und verfahren zu deren herstellung und anwendung |
US4681630A (en) * | 1982-09-27 | 1987-07-21 | Learonal, Inc. | Method of making copper colloid for activating insulating surfaces |
US4762560A (en) * | 1982-09-27 | 1988-08-09 | Learonal, Inc. | Copper colloid and method of activating insulating surfaces for subsequent electroplating |
US4717421A (en) * | 1986-04-28 | 1988-01-05 | Mcgean-Rohco, Inc. | Solid tin-palladium catalyst for electroless deposition incorporating stannous salts of organic acids |
DE19524601C1 (de) * | 1995-07-06 | 1996-03-21 | Deutsche Automobilgesellsch | Verfahren zum Aktivieren von Kunststoffoberflächen auf der Basis von Pd/Sn mit photometrischer Reifungskontrolle |
US20040067312A1 (en) * | 2002-10-02 | 2004-04-08 | Kanagawa University | Method for forming thin film and catalyzed treatment solution used therefor |
US20180016482A1 (en) * | 2012-12-18 | 2018-01-18 | University Of South Florida | Encapsulation of Thermal Energy Storage Media |
US10501668B2 (en) * | 2012-12-18 | 2019-12-10 | University Of South Florida | Encapsulation of thermal energy storage media |
US11732171B2 (en) | 2012-12-18 | 2023-08-22 | University Of South Florida | Encapsulation of thermal energy storage media |
Also Published As
Publication number | Publication date |
---|---|
NL7109004A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1971-12-31 |
JPS5515544B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1980-04-24 |
IT954171B (it) | 1973-08-30 |
DE2132863B2 (de) | 1974-02-28 |
GB1349666A (en) | 1974-04-10 |
NL169757C (nl) | 1982-08-16 |
DK148919B (da) | 1985-11-18 |
CH571577A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-01-15 |
SE427190B (sv) | 1983-03-14 |
DK148919C (da) | 1986-07-14 |
DE2132863A1 (de) | 1972-01-05 |
AT314306B (de) | 1974-03-25 |
FR2100042A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-03-17 |
CA934902A (en) | 1973-10-09 |
NL169757B (nl) | 1982-03-16 |
ATA643273A (de) | 1975-02-15 |
ES392729A1 (es) | 1973-07-16 |
AT326443B (de) | 1975-12-10 |
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