US3645771A - Multilayer blooming process including precoating of the substrate used for monitoring - Google Patents

Multilayer blooming process including precoating of the substrate used for monitoring Download PDF

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Publication number
US3645771A
US3645771A US822632A US3645771DA US3645771A US 3645771 A US3645771 A US 3645771A US 822632 A US822632 A US 822632A US 3645771D A US3645771D A US 3645771DA US 3645771 A US3645771 A US 3645771A
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Prior art keywords
blooming
quarter wavelength
layer
stack
wavelength
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Expired - Lifetime
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US822632A
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English (en)
Inventor
John Ward
Commonwealth Of Australia The
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Commonwealth of Australia
SEC DEP OF SUPPLY
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Commonwealth of Australia
SEC DEP OF SUPPLY
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Priority claimed from AU37634/68A external-priority patent/AU408544B2/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3494—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising other salts, e.g. sulfate, phosphate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
    • C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3464—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide
    • C03C17/347—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide comprising a sulfide or oxysulfide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Definitions

  • SHEET 1 0F 5 g Ca 51' O3 CRY Pr: [ea/ed 2 l Glass Prism 7%: [ogre fer Carrier Vacuum Chamber Evaporaf/on 5 ource MULTILAYER BLOOMING PROCESS INCLUDING PRECOATING OF THE SUBSTRATE USED FOR MONITORING
  • This invention relates to a method of and means for effecting multilayer blooming of lenses or the like, and includes a novel process of precoating the substrate used for monitoring before applying the blooming layers, whereby checking the thickness of the layer deposited is facilitated by increasing the sensitivity to variation of light transmission or reflection between a light source and a photometer as the layer is deposited to a stage where exact measurements are readily achieved.
  • One of the problems when depositing blooming layers on lenses and the like in a vacuum chamber is to be able to measure the exact thickness ofa deposited layer, and the object of this invention is to provide means whereby the checking ofthe deposition can be effected in a better and more exact manner, and with simple equipment, this being achieved as indicated by so arranging a test piece, which also receives the blooming layers, that the test piece enhances the transmission or reflection differences due to the blooming layers thereby improving measurement accuracy.
  • a high reflecting stack can be formed by depositing first a layer of a substance such as lead fluoride which has a relatively high refractive index, then a layer of magnesium fluoride which has a lower refractive index and then another layer of lead fluoride which again has a higher refractive index than the previous layer. It is also known that if successive layers of certain materials are deposited on this stack the variations of light transmission or reflection caused by the presence in these layers, can be different from the variations which would have taken place in the absence of the high reflecting stack.
  • the present invention makes use of what could be termed a high reflecting stack on a surface placed into the chamber where vacuum deposition is taking place so that this stack receives on it an equal deposition to the deposition being applied to the lenses or the like in the chamber.
  • Such deposition on the stack when the stack is correctly selected, then changes the light transmitting or reflecting characteristics of the stack with the blooming thereon so that a very much greater differential exists than would exist if light was simply transmitted through or reflected by the lenses and blooming layers to a photometer or similar recording device.
  • FIG. 1 shows a glass member having one form of the invention applied thereto
  • FIG. 2 showing a typical setup
  • FIGS. 3 to 6 inclusive are graphs of progressive steps in the prior art and the present invention.
  • the stack generally comprises a substrate having precoated thereon a number of alternately high and low refractive index materials having an optical thickness of a quarter wavelength or multiples thereof at a selected wavelength.
  • Suitable materials are ZnS, Cryolite, MgF PbF and the like.
  • a glass member with a refractive index 1.51 shows on it a precoated stack comprising two quarter wavelength layers of Zinc Sulphide separated by a quarter wavelength layer of cryolite, the same appropriately selected wavelength being considered in all cases, these being deposited on the glass prior to blooming using only a simple photometer to determine the thickness in each case and the glass member then installed between a light system and photometer as shown in FIG. 2, the stack being positioned to accept coating similarly to the lenses which may be mounted on the rotating carrier and which may be masked in a particular way to modify the distribution of the material.
  • the line designated 1 consists of a quarter wavelength thickness of Ca'Si0 while the second line shows this together with a similar thickness of ZrO
  • line 3 a further quarter wavelength layer of Zr0 is added, and the fourth line shows the final blooming which then comprises a system of layers AM of Ca'Si0 ⁇ /2 of Zr0 +)t/4 of MgF Table 1 shows the following approximate differences in reflectivity between successive layers at about 5,000 angstrom.
  • curve 1 represents the first layer, being a quarter wavelength layer of ZnS
  • curve 2 represents the curve when a quarter wavelength layer is cryolite is superimposed
  • the curve 3 shows the final stack characteristic when a further similar layer of ZnS has been added. This then forms the stack shown at the base of FIG. 1 on to which the blooming layers are to be evaporated simultaneously with the evaporation on the lenses.
  • FIGS. 5 and 6 show the reflectivity differences in a typical example of this invention in which the stack of FIG. 4 is first applied to the test glass and four layers similar to the layers of FIG. 3 are then applied as the blooming materials. It will now be noted that the percentage figures for each layer are very considerably altered so that we now have the following table based on the same conditions as table 1.
  • the method of carrying out a multilayer blooming process which comprises placing an object to be bloomed into a vacuum chamber, positioning in the chamber a substrate having precoated thereon a number of alternately high and low refractive index materials to enhance the light transmis sion or reflection differences due to the blooming layers at a selected wavelength, successively evaporating the blooming layers onto both the object to be bloomed and the precoated substrate, and measuring the transmission or reflection of light changes which take place during deposition of each blooming layer whereby to improve measurement accuracy by such enhancement and hence precision of control of the thickness of deposits and hence quality of blooming.
  • the stack comprises a light transmitting base having coated thereon two quarter wavelength layers of ZnS separated by a quarter wavelength of cryolite.
  • the number of alternately high and low refractive index materials have an optical thickness of a quarter wavelength or multiples thereof at a selected wavelength and wherein the high index material is ZnS and the low index material is MgF 7.
  • the number of alternately high and low refractive index materials have an optical thickness of a quarter wavelength or multiples thereof at a selected wavelength and wherein the high index material is PbF and the low index material is MgF 8.
  • the stack comprises a light transmitting base having precoated thereon two quarter wavelength layers separated by a quarter wavelength layer of a further material selected, so that the second layer reduces the reflectivity curve of the first layer, and the third layer enhances the final reflectivity curve.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
US822632A 1968-05-10 1969-05-07 Multilayer blooming process including precoating of the substrate used for monitoring Expired - Lifetime US3645771A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AU37634/68A AU408544B2 (en) 1968-05-10 Multilayer blooming process including pre-coating ofthe substrate usedfor monitoring

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DE (1) DE1923645C3 (ru)
FR (1) FR2009873A1 (ru)
GB (1) GB1258096A (ru)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
US5980975A (en) * 1994-05-31 1999-11-09 Toray Industries, Inc. Thin-film-coated substrate manufacturing methods having improved film formation monitoring and manufacturing apparatus
US20050236586A1 (en) * 2002-05-21 2005-10-27 Hartung Martin G Radiation device
US20070104891A1 (en) * 2005-11-04 2007-05-10 Essilor International Compagnie Generale D'optique Process for coating an optical article with an anti-fouling surface coating by vacuum evaporation
US20090186159A1 (en) * 2008-01-22 2009-07-23 Raytheon Company Method and Apparatus for Coating a Curved Surface
US20090258141A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Surfaces
US20090258151A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Curved Surfaces
US20090280244A1 (en) * 2008-05-12 2009-11-12 Raytheon Company Method and Apparatus for Supporting Workpieces in a Coating Apparatus
US20100009074A1 (en) * 2008-07-09 2010-01-14 Raytheon Company Method and Apparatus for Coating Surfaces
US20110020623A1 (en) * 2009-07-22 2011-01-27 Raytheon Company Method and Apparatus for Repairing an Optical Component Substrate Through Coating

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3302827A1 (de) * 1983-01-28 1984-08-02 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum herstellen von optischen elementen mit interferenzschichten

Citations (13)

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Publication number Priority date Publication date Assignee Title
US2239452A (en) * 1937-03-13 1941-04-22 Robley C Williams Method and apparatus for producing semitransparent coatings
US2351537A (en) * 1942-03-05 1944-06-13 Spencer Lens Co Apparatus for treating surfaces
US2386875A (en) * 1943-11-23 1945-10-16 Libbey Owens Ford Glass Co Method of coating with quartz vapor
US2408614A (en) * 1944-07-18 1946-10-01 Rca Corp Surface coating apparatus
US2472605A (en) * 1946-04-15 1949-06-07 Eastman Kodak Co Method of depositing optical interference coatings
US2552184A (en) * 1950-06-02 1951-05-08 Eastman Kodak Co Illuminator for optical projectors
US2660925A (en) * 1949-12-01 1953-12-01 Bausch & Lomb Light reflector which transmits infrared rays
US2700323A (en) * 1948-12-27 1955-01-25 Fish Schurman Corp Infrared transmitting mirror
US2834689A (en) * 1955-04-28 1958-05-13 American Optical Corp Infrared transmitting medium and method of making same
SU122265A1 (ru) * 1958-03-27 1958-11-30 Г.А. Александров Способ изготовлени светоделителей
US2936732A (en) * 1955-07-15 1960-05-17 Nat Res Dev Production of optical filters
CA733928A (en) * 1966-05-10 N.V. Philips Gloeilampenfabrieken Ultra-violet radiator consisting of a quartz envelope coated with an oxide layer of zinc oxide and/or zirconium oxide
US3463574A (en) * 1967-06-26 1969-08-26 Perkin Elmer Corp Multilayer antireflection coating for low index materials

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DE1065689B (de) * 1959-09-17 Ernst Leitz GmbH ,Wetzlar/Lahn Verfahren und Vorrichtung zum Her stellen von Interferenzschichten auf optisch wirksamen Flachen
DE1079920B (de) * 1952-04-25 1960-04-14 Technicolor Corp Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum
BE578799A (ru) * 1958-05-21

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Publication number Priority date Publication date Assignee Title
CA733928A (en) * 1966-05-10 N.V. Philips Gloeilampenfabrieken Ultra-violet radiator consisting of a quartz envelope coated with an oxide layer of zinc oxide and/or zirconium oxide
US2239452A (en) * 1937-03-13 1941-04-22 Robley C Williams Method and apparatus for producing semitransparent coatings
US2351537A (en) * 1942-03-05 1944-06-13 Spencer Lens Co Apparatus for treating surfaces
US2386875A (en) * 1943-11-23 1945-10-16 Libbey Owens Ford Glass Co Method of coating with quartz vapor
US2408614A (en) * 1944-07-18 1946-10-01 Rca Corp Surface coating apparatus
US2472605A (en) * 1946-04-15 1949-06-07 Eastman Kodak Co Method of depositing optical interference coatings
US2700323A (en) * 1948-12-27 1955-01-25 Fish Schurman Corp Infrared transmitting mirror
US2660925A (en) * 1949-12-01 1953-12-01 Bausch & Lomb Light reflector which transmits infrared rays
US2552184A (en) * 1950-06-02 1951-05-08 Eastman Kodak Co Illuminator for optical projectors
US2834689A (en) * 1955-04-28 1958-05-13 American Optical Corp Infrared transmitting medium and method of making same
US2936732A (en) * 1955-07-15 1960-05-17 Nat Res Dev Production of optical filters
SU122265A1 (ru) * 1958-03-27 1958-11-30 Г.А. Александров Способ изготовлени светоделителей
US3463574A (en) * 1967-06-26 1969-08-26 Perkin Elmer Corp Multilayer antireflection coating for low index materials

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* Cited by examiner, † Cited by third party
Title
Gottling et al., Double Layer Interference in Air CDS Films, Journal of the Optical Society, Vol. 56, No. 9, 9/66 pp. 1227 1231. *
Paff, Control of Thickness, The Review of Scientific Instruments, Vol. 30, No. 10, 10/50 pp. 911 912. *

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
US5980975A (en) * 1994-05-31 1999-11-09 Toray Industries, Inc. Thin-film-coated substrate manufacturing methods having improved film formation monitoring and manufacturing apparatus
US20110033816A1 (en) * 2002-05-21 2011-02-10 3M Innovative Properties Company Irradiation appliance
US20050236586A1 (en) * 2002-05-21 2005-10-27 Hartung Martin G Radiation device
US8415647B2 (en) 2002-05-21 2013-04-09 3M Innovative Properties Company Irradiation appliance
US20070104891A1 (en) * 2005-11-04 2007-05-10 Essilor International Compagnie Generale D'optique Process for coating an optical article with an anti-fouling surface coating by vacuum evaporation
US8945684B2 (en) * 2005-11-04 2015-02-03 Essilor International (Compagnie Generale D'optique) Process for coating an article with an anti-fouling surface coating by vacuum evaporation
US20090186159A1 (en) * 2008-01-22 2009-07-23 Raytheon Company Method and Apparatus for Coating a Curved Surface
US8347814B2 (en) * 2008-01-22 2013-01-08 Raytheon Canada Limited Method and apparatus for coating a curved surface
US8293017B2 (en) 2008-04-10 2012-10-23 Raytheon Canada Limited Method and apparatus for coating surfaces
US20090258151A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Curved Surfaces
US20090258141A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Surfaces
US20090280244A1 (en) * 2008-05-12 2009-11-12 Raytheon Company Method and Apparatus for Supporting Workpieces in a Coating Apparatus
US8398776B2 (en) 2008-05-12 2013-03-19 Raytheon Canada Limited Method and apparatus for supporting workpieces in a coating apparatus
US8246748B2 (en) 2008-07-09 2012-08-21 Raytheon Canada Limited Method and apparatus for coating surfaces
US20100009074A1 (en) * 2008-07-09 2010-01-14 Raytheon Company Method and Apparatus for Coating Surfaces
US20110020623A1 (en) * 2009-07-22 2011-01-27 Raytheon Company Method and Apparatus for Repairing an Optical Component Substrate Through Coating

Also Published As

Publication number Publication date
FR2009873B1 (ru) 1974-06-14
DE1923645B2 (de) 1979-02-08
DE1923645C3 (de) 1985-01-31
GB1258096A (ru) 1971-12-22
FR2009873A1 (fr) 1970-02-13
DE1923645A1 (de) 1970-08-27

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