US3397672A - Control system for vapor-deposition coating apparatus - Google Patents

Control system for vapor-deposition coating apparatus Download PDF

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Publication number
US3397672A
US3397672A US507103A US50710365A US3397672A US 3397672 A US3397672 A US 3397672A US 507103 A US507103 A US 507103A US 50710365 A US50710365 A US 50710365A US 3397672 A US3397672 A US 3397672A
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Prior art keywords
strip
coating
voltage
crucible
power
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US507103A
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English (en)
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Dykeman George
Borough Dormont
Slamar Frank
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United States Steel Corp
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United States Steel Corp
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Priority to US507103A priority Critical patent/US3397672A/en
Priority to GB48945/66A priority patent/GB1168813A/en
Priority to NL6615541A priority patent/NL6615541A/xx
Priority to BE689369D priority patent/BE689369A/xx
Priority to ES0333150A priority patent/ES333150A1/es
Priority to FR83081A priority patent/FR1498949A/fr
Priority to DE19661521573 priority patent/DE1521573A1/de
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Publication of US3397672A publication Critical patent/US3397672A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Definitions

  • a plurality of electron guns spaced across the width of a strip traveling through a vacuum chamber, serving to vaporize coating metal in a crucible, are Controlled in response to the speed Vof the strip and the thickness of the deposited coating, to maintain the latter uniform.
  • a differential is maintained between the guns adjacent the strip edges and those nearer the center line, to obtain uniform deposition transversely of the strip.
  • a second series of guns used for preliminarily degassing the strip is controlled in accordance with the temperature of strip entering the chamber, to insure proper heating and release of occluded gases.
  • This invention relates to a control system for adjusting the several conditions involved in the continuous coating of strip material in a vacuum, by deposition of -metal vapor thereon, according to the speed of travel of the strip. More particularly, it relates to a system for controlling the evolution of vapor from the surfaces of molten pools of the coating metal to insure a substantially uniform thickness of coating both transversely and longitudinally of strip.
  • lBeam power as used herein is the power delivered to the surface of the metal in the crucible by an individual electron-beam gun.
  • a selected beam power I may be achieved at either a relatively high voltage and low level of beam-current or vice versa.
  • the use of electron guns as heating sources in high-vacuum continuous processes involves the resolution of conflicting sets of operating characteristics. For example, linear control of power is desirable but an electron gun is basically a nonlinear device. Again, uninterrupted flow of power is desirable but ionization discharges occur frequently due to impurities brought in by the process materials causing momentary short circuits to the power supply. Wide-range power arent 3,397,672 Patented ug.
  • the beam-power and filament-heating circuits of the gun are interconnected so as to maintain total power distribution according to preselected references and vary the total power as required by process variations and thus tov maintain preselected heating of a crucible or of the continuous strip material itself.
  • the electron-beam guns must be operated within controlled voltage, beam-current and filament-current (temperature) ranges.
  • the filament (emitter) temperature is sufficiently high to make available more electrons than can be attracted to the crucible metal at maximum voltage (emission limited)
  • beam power may be altered by varying the voltage.
  • the voltage is sufficient to attract from the filament to the metal in the Crucible the maximum quantity of electrons the lament can emit (temperature limited)
  • power density may be contr-olled by varying filament current (temperature).
  • the filament is temperature limited and the voltage is below maxim-um
  • beam power may be controlled by varying both filament temperature and voltage until either the first or second condition described above is achieved.
  • FIGURE 1 is a diagrammatic showing of vapor-deposition coating apparatus and partial circuit diagram of the control system of our invention.
  • FIGURE la is the remainder of the control-system diagram.
  • the apparatus with which our invention is adapted to be used comprises a vacuum Chamber 10 having entrance and exit roll seals 11 and 12.
  • ⁇ Chamber 10 is evacuated by suitable pumps (not shown) to a low pressure such as .O2-.1 micron of mercury.
  • Guide rolls 13 in the chamber cause strip 14 passing therethrough to trav-el first beside electron-beam gun preheaters 15 and then in reverse directions over pairs of elongated transversely disposed .refractory crucibles 17 and 18 for coating both sides thereof.
  • Groups of electron-beam guns 19 (such as the Model 60-850 gun made ⁇ by Ultek Corporation, Pal-o Alto, Calif.) extend end-toend along each crucible and electromagnets 20 are mounted on appropriate core structures to provide fields for maintaining the desired curvature of the -beams as aforesaid.
  • Wire-feed apparatus 21 for each crucible supplies make-up coating metal, e.g., aluminum, from storage 16.
  • a surface pyrometer 22 (such as Model TD-3, made lby Radiation Electronics Company, Chicago, Ill.) measures the temperature of the strip after preheating and coating thickness gages 23 (such as the Quantrol Analyzer made by Applied Research Laboratories, Inc., Glendale, Calif.) measure the thickness of the coating applied to one side ⁇ of the strip.
  • a tachometer generator 24 generates a voltage proportional to the speed of strip traversing charnber 10 and this voltage applies a signal to a master controller 25 now to be described.
  • the system of our invention is responsive to a master control, the elements of which, enclosed within dotted rectangle 25, hereinafter designated a controller, include potentiometers 26, 27 and 28 which are adjusted automatically to give the wire-feed rate, gun filament current and gun-power input, respectively, suitable for depositing the desired weight of coating on the strip for a given speed of travel thereof.
  • FIGURE la shows the control system for the filaments 29A, 29B, etc., of the group of five electron guns disposed end-to-end, associated with one of the crucibles 17, as indicated at 19.
  • Each crucible has a similar set of guns.
  • the electron-beam power input to each set of guns is obtained from a primary source 30, through a three-phase saturable-core reactor 31 (commercially available from electrical manufacturers such as General Electric Company), a transformer 32 and rectifiers 33 (such as the silicon rectifier made by Westinghouse Electric Corporation), which provide a high direct voltage (5,000-15,() v.) across buses 34 and 35, the positive of which (35) is grounded.
  • the power input drawn from these buses is measured by a wattmeter 36 (such as Weston Instruments Model l483) delivering a signal voltage which is opposed lby that from potentiometer 28, through a resistance network (to be described in detail later) the difference being applied to a power -amplier 37 (such as that made by Norbatrol Electronics Corporation, Pittsburgh, Pa.).
  • the output from the amplifier energizes the field winding of an exciter generator 38 driven by a constant-speed motor (not shown).
  • Generator 38 energizes the several control windings 31A of reactor 31.
  • the result is a closedloop control Acircuit whereby the reactor is energized to maintain a constant power input by correcting the ⁇ applied voltage according to the setting of potentiometer 28, depending, however, upon other variable conditions as will be explained subsequently.
  • the filaments 29A, 29B, etc. of the electron-beam guns are connected to a supply of heating current through transformers 39A, 39B, etc., under the control of magnetic amplifiers 40A, 40B, etc., similar to ⁇ amplifier 37, which are themselves -connected to the A-C power supply.
  • Each of these amplifiers has a control winding 41A, 41B, etc. connected to a bus 42 from an amplifier 43.
  • Amplifier 43 is connected to and derives its input from filament-control potentiometer 27 through a resistance network (to be described in detail later), and a voltage tapped from bus 34 by a voltage-divider network 44 -including a Zener diode 45 (such as that made by International Rectifier Corporation) a local source 46 of bias voltage and ⁇ a manually set potentiometer 47. Accordingly, the current supplied to all filaments 29A, 29B, etc. is controlled by the difference between the voltage from potentiometer 27 and that from network 44. Potentiometer 47 governs the proportionality between the voltage tapped from bus 34 and that from potentiometer 27.
  • Network 44 modifies the input to amplifier 43 only if the voltage on bus 34 is above or below a desired operating range fixed by the selection of the Zener diode 45 and the setting of a potentiometer 48 controlling the application of bias voltage thereto.
  • Amplifiers 40A, 40B, etc. also have control windings 49A, 49B, etc. energized in accordance with the individual filament-currents, as by shunts 50A, 50B, etc. Individual control of the heating currents to the several filaments is effected by transductors 51A, 51B, etc.
  • the transductors are magnetic amplifiers (such as the direct-current transformers made by Magnetic Controls Company, Minneapolis, Minn.) connected to an A-C power source and receiving individual input current signals from high-voltage bus 34, and are connected to the filaments individually.
  • the direct-current outputs of the -transductors ie., isolated signals proportional to the high-voltage supply currents to the several filaments, are yalso applied to magnetic amplifiers 40A, 40B, etc., to regulate filament temperatures and maintain the -proper .relation thereof to the density of electron-beam discharge from the filaments to the crucible.
  • This means includes further control windings 52A, 52B, 52D and 52E on amplifiers 40A, 40B, 40D and 40E, respectively. There is no such winding on amplifier 40C. These windings are energized by the outputs of transductors 51A, 51B, 51D and 51E, respectively.
  • transductors 51A and 51E are set to energize filaments 29A and 29E at a higher level than that of filaments 29B, 29C and 29D the transductors 51B, 51C and 51D of which all operate at the same level by virtue of their common connection 54. Since transductor 51C does not affect amplifier 40C, the latter energizes filament 29C at a minimum level. Amplifiers 40B and 40D energize filaments 29B and 29D at a higher level and amplifiers 40A and 40E energize filaments 29A and 29E at a still higher level. This produces an increasing evaporation rate from the center of Crucible 17 toward each end, and thereby offsets the decrease in coating thickness ad ⁇ jacent the strip edges which would otherwise result.
  • a second control function exercised by controller 25 is to determine suitable power distribution among the sevn eral successive crucibles 17, 17. It is usually desirable to proportion the power equally among the several crucibles used, although it is recognized that special advantage can be taken of the nonlinear relationship between power and evaporation rate by proportioning the power in a different manner.
  • a multiple-contact switch 72 is used to select resistors 73, 74 which divide the reference signal by one, one-half, or one-third, depending on whether one, two, or three crucibles are in use. As shown in FIGURE la, either the first or the third may be used alone, the first and second used together, or all three used together. Additional network configurations would permit other combinations. Since the signal dividing resistors 73 and 74 are adjustable, various proportions can be set, i.e., all three crucibles could be operated on 100% power reference signal.
  • a third control function exercised by controller 25 is to vary the rate at which wire-feed mechanism 21 operates.
  • a controller ⁇ 55 (such as Type C Basic Electronic Governor made by Linde Div., Union Carbide Corporation) varies the speed of motor 56 driving wire-feed pinch rolls 57.
  • Controller 55 responds to the difference between the voltage from poten ⁇ 1 tiometer 26 and that produced by a tachometer generator 58 coupled to motor 56.
  • the several potentiometers 26, 27 and 28 of controller 25 are driven in unison by a servo 59 (such as Model 6102 made by Solar Electronics Company, Hollywood, Calif), in accord with variations in thickness of coating deposited on strip S from the desired value, and variations in strip speed.
  • Signals of thickness variations ob served by gage 23 are supplied to an intermediate servo 60 (similar to servo 59) mechanically coupled to a potentiometer 61 which applies a voltage to servo 59.
  • Potentiometer 61 is connected in a bias-voltage network 62 which receives input from potentiometers y63 and 64 for introducing thereto voltages corresponding to preselected strip widths and coating thicknesses, respectively.
  • a strip-speed measurement is taken from tachometer generator 24.
  • the voltage from generator 24 is applied to potentiometers 63 and 64 and thus combines with the preset width and coating-thickness adjustments to affect network 62.
  • Timer 65 causes a periodic adjustment of potentiometer 61, if needed, by servo 460, and potentiometer 61 affects servo 59.
  • Servo 59 in turn actuates potentiometers 26, 27 and 28 with the results already explained.
  • Timer 65 affects resetting of controller 25 in accord with the thickness of coating measured by gage 23 at a rate which varies with the strip speed thus compensating the delay between thickness measurement and controller re-adjustment for the time required for a point on the strip to travel from the crucibles 17 to the gage.
  • the timer is a two-period sequencing timer such as that made by Square D Co., Milwaukee, Wis., and controls the operation of servo 60.
  • One period (the on period) of the timer is determined by the setting of a rheostat 65C.
  • the other period (the off period) is controlled by a variable resistor 65D.
  • This resistor is a photocell the resistance of which is controlled by the light from a lamp 65E energized by Voltage from tachometer generator 24.
  • the photocell 65D and lamp 65E form a combination provided in the commercially available Raysistor electrooptical device made by Raytheon Co., Newton, Mass.
  • Rheostat 65C is initially adjusted to make the on period suicient to correct for a 100% error signal input to servo 60.
  • lamp 65E glows more brightly, reducing the resistance of photocell 65D and, consequently, the length of the off periods of timer 65.
  • rheostat ⁇ 65C may be adjusted to reduce the length of the on periods and thus shorten the times for operation of servo 60.
  • the input to servo 59 will be determined by potentiometers 63 and 64. If the actual coating weight differs, the action of servo 60, timer 65 and the bias-voltage network 62 serve to increase or decrease the signal applied to servo 59 in proportion to this difference.
  • Servo 59 proportionally increases or decreases the setting of lpotentiometers 26, 27 and 28 to adjust the entire control system to a level that will provide the desired coating thickness. Since the coating operations and the thickness measurement are necessarily separated in space, the delay between coating and measurement is made proportional to line speed. As explained above, timer 65 effects the delay between corrections to servo 59 by servo 60, so as to make the delay proportional to line speed.
  • the current supply to the winding of electromagnet 20 is controlled by a current regulator 67 (as an example, see application brief dated May 17, 1963, published by George A. Philbrick researchers, Inc., Boston, Mass.) according to the input voltage of wattmeter 36 applied to a potentiometer 68.
  • control systern described above is intended for the electron-beam guns of one crucible and is duplicated for the guns of each of the other crucibles.
  • One feature of our invention remaining to be described is the control of the preheating electron guns 15.
  • This in cludes a power supply 69 (comprising units similar to 31, 32 and 33), a filament-control circuit 70 (duplicating all units designated by numerals 39 through 54 with and without reference letters added) and a master control 71 similar to that indicated at 25 except that, instead of coating thickness, the temperature of the strip as noted by pyrometer 22, governs the operation, after predetermined settings for strip width, strip thickness and desired temperature have been established on potentiometers similar to those shown at 63 and 64.
  • the system may be set up in advance for a specific desired coating thickness to be applied to strip of a certain width at a given speed of travel.
  • the filament-current needed for thesemconditions, the voltage applied between filament and crucible and the power input to the electron guns will be maintained at the proper values or adjusted as ⁇ necessary to assure the desired result, i.e. uniform coating thickness ⁇ over the strip area, despite such possible changes in strip speed or coating thickness actually applied as may occur for various reasons.
  • the preheating of the strip and the rate of deposition of the coating metal furthermore, tendto decrease from the center line of the strip toward the edges.
  • Apparatus as defined in claim 1 characterized by means varying the current from said power-supply means to the emitter of said gun and said speed-responsive means including means to vary said emitter-current varying means.
  • Apparatus as defined in claim 2 characterized by means modifying the action of said current-varying means according to the voltage applied to the emitter.
  • Apparatus as defined in claim 1 characterized by means feeding make-up metal to said crucible and said speed-responsive means including means varying the speed of said make-up metal feeding means.
  • Apparatus as defined in claim 1 characterized by an electro-magnet adjacent said crucible to deflect said beam and means responsive to the voltage of said power-supply means controlling the excitation of said magnet.
  • Apparatus as defined in claim 1 characterized by said gun including a plurality of thermionic emitters spaced across the width of the strip and means varying the current supplied to the emitters adjacent the strip edges relative to that supplied to the emitters nearer the center line of the strip.
  • each magnetic amplifier also having a control winding and means energizing it in accord with the current supplied by the amplifier to its emitter.
  • Apparatus as defined in claim 8 characterized by means energizing the transductors of the emitters adjacent the edges of said path to eiect energization thereof at a level higher than that of the remaining emitters.
US507103A 1965-11-10 1965-11-10 Control system for vapor-deposition coating apparatus Expired - Lifetime US3397672A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US507103A US3397672A (en) 1965-11-10 1965-11-10 Control system for vapor-deposition coating apparatus
GB48945/66A GB1168813A (en) 1965-11-10 1966-11-01 Control System for Vapour-Deposition Coating apparatus
NL6615541A NL6615541A (de) 1965-11-10 1966-11-03
BE689369D BE689369A (de) 1965-11-10 1966-11-07
ES0333150A ES333150A1 (es) 1965-11-10 1966-11-08 Perfeccionamientos en sistemas de control para aparatos de revestimiento.
FR83081A FR1498949A (fr) 1965-11-10 1966-11-09 Système de commande pour appareil de revêtement par dépôt de vapeurs
DE19661521573 DE1521573A1 (de) 1965-11-10 1966-11-10 Regelanlage fuer Bedampfungsapparate

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US507103A US3397672A (en) 1965-11-10 1965-11-10 Control system for vapor-deposition coating apparatus

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US3397672A true US3397672A (en) 1968-08-20

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US (1) US3397672A (de)
BE (1) BE689369A (de)
DE (1) DE1521573A1 (de)
ES (1) ES333150A1 (de)
FR (1) FR1498949A (de)
GB (1) GB1168813A (de)
NL (1) NL6615541A (de)

Cited By (15)

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US3498259A (en) * 1966-06-15 1970-03-03 Michel A Braguier Apparatus for continuous metallization of dielectric strips
US3505974A (en) * 1967-11-14 1970-04-14 Edwards High Vacuum Int Ltd Vacuum deposition apparatus
US3547683A (en) * 1966-05-19 1970-12-15 British Iron Steel Research Vacuum deposition and radiation polymerisation of polymer coatings on substrates
US3636916A (en) * 1966-03-14 1972-01-25 Optical Coating Laboratory Inc Coating apparatus and system
US3683648A (en) * 1968-11-22 1972-08-15 Vepa Ag Apparatus for coating a material length with a fluid coating substance
US3709192A (en) * 1970-06-01 1973-01-09 Sierracin Corp Coating control system
US3853093A (en) * 1970-01-14 1974-12-10 Optical Coating Laboratory Inc Optical thickness rate monitor
US3907607A (en) * 1969-07-14 1975-09-23 Corning Glass Works Continuous processing of ribbon material
US3998181A (en) * 1973-09-07 1976-12-21 Aggust Thyssen-Hutte Ag Apparatus for scraping metal coating on hot-coated metal strips
US4778975A (en) * 1987-04-29 1988-10-18 V T U "A. Kanchev Electrical supply circuit for electron beam evaporators
US6623686B1 (en) 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US6652654B1 (en) * 2000-09-27 2003-11-25 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
CN105555994A (zh) * 2013-12-20 2016-05-04 株式会社爱发科 电子枪装置以及真空蒸镀装置
US20220316050A1 (en) * 2019-04-23 2022-10-06 Sms Group Gmbh Pvd thickness control

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DE3330092A1 (de) * 1983-08-20 1985-03-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen
CN115491663B (zh) * 2022-11-21 2023-03-24 常州翊迈新材料科技有限公司 燃料电池金属极板涂层厚度在线监控装置

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US3308264A (en) * 1963-04-19 1967-03-07 United Aircraft Corp Adaptive positioning device
US3235647A (en) * 1963-06-06 1966-02-15 Temescal Metallurgical Corp Electron bombardment heating with adjustable impact pattern
US3244855A (en) * 1963-07-19 1966-04-05 United States Steel Corp System for correcting the shift of an electron-gun beam from the desired region of impingement
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3276902A (en) * 1963-10-01 1966-10-04 Itt Method of vapor deposition employing an electron beam

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3636916A (en) * 1966-03-14 1972-01-25 Optical Coating Laboratory Inc Coating apparatus and system
US3547683A (en) * 1966-05-19 1970-12-15 British Iron Steel Research Vacuum deposition and radiation polymerisation of polymer coatings on substrates
US3498259A (en) * 1966-06-15 1970-03-03 Michel A Braguier Apparatus for continuous metallization of dielectric strips
US3505974A (en) * 1967-11-14 1970-04-14 Edwards High Vacuum Int Ltd Vacuum deposition apparatus
US3683648A (en) * 1968-11-22 1972-08-15 Vepa Ag Apparatus for coating a material length with a fluid coating substance
US3907607A (en) * 1969-07-14 1975-09-23 Corning Glass Works Continuous processing of ribbon material
US3853093A (en) * 1970-01-14 1974-12-10 Optical Coating Laboratory Inc Optical thickness rate monitor
US3709192A (en) * 1970-06-01 1973-01-09 Sierracin Corp Coating control system
US3998181A (en) * 1973-09-07 1976-12-21 Aggust Thyssen-Hutte Ag Apparatus for scraping metal coating on hot-coated metal strips
US4778975A (en) * 1987-04-29 1988-10-18 V T U "A. Kanchev Electrical supply circuit for electron beam evaporators
US6962731B2 (en) 2000-09-27 2005-11-08 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US6652654B1 (en) * 2000-09-27 2003-11-25 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US20040058085A1 (en) * 2000-09-27 2004-03-25 Propp W. Alan System configured for applying multiple modifying agents to a substrate
US20040028764A1 (en) * 2000-09-28 2004-02-12 Janikowski Stuart K. System configured for applying a modifying agent to a non-equidimensional substrate
US6623686B1 (en) 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US7241340B2 (en) 2000-09-28 2007-07-10 Battelle Energy Alliance, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
CN105555994A (zh) * 2013-12-20 2016-05-04 株式会社爱发科 电子枪装置以及真空蒸镀装置
CN105555994B (zh) * 2013-12-20 2018-05-29 株式会社爱发科 电子枪装置以及真空蒸镀装置
US20220316050A1 (en) * 2019-04-23 2022-10-06 Sms Group Gmbh Pvd thickness control

Also Published As

Publication number Publication date
FR1498949A (fr) 1967-10-20
GB1168813A (en) 1969-10-29
DE1521573A1 (de) 1969-11-06
BE689369A (de) 1967-05-08
NL6615541A (de) 1967-05-11
ES333150A1 (es) 1967-07-16

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