US3183563A - Apparatus for continuous foil production by vapor deposition - Google Patents

Apparatus for continuous foil production by vapor deposition Download PDF

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Publication number
US3183563A
US3183563A US200157A US20015762A US3183563A US 3183563 A US3183563 A US 3183563A US 200157 A US200157 A US 200157A US 20015762 A US20015762 A US 20015762A US 3183563 A US3183563 A US 3183563A
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Prior art keywords
drum
vacuum
chamber
crucible
foil
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US200157A
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English (en)
Inventor
Jr Hugh R Smith
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Temescal Metallurgical Corp
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Temescal Metallurgical Corp
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Priority to NL293028D priority Critical patent/NL293028A/xx
Application filed by Temescal Metallurgical Corp filed Critical Temescal Metallurgical Corp
Priority to US200157A priority patent/US3183563A/en
Priority to NL63293028A priority patent/NL139566B/xx
Priority to CH646663A priority patent/CH401632A/fr
Priority to GB20951/63A priority patent/GB1014245A/en
Priority to FR936145A priority patent/FR1364210A/fr
Priority to LU43818D priority patent/LU43818A1/xx
Priority to DE19631521520 priority patent/DE1521520B1/de
Priority to AT448363A priority patent/AT261347B/de
Priority to DK264163AA priority patent/DK116836B/da
Priority to SE6205/63A priority patent/SE309351B/xx
Application granted granted Critical
Publication of US3183563A publication Critical patent/US3183563A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00—Metal founding
    • Y10S164/05—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/05—Foil glass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/30—Foil or other thin sheet-metal making or treating

Definitions

  • FIG- l 4 Sheets-Sheet 1 Mussi Bc'r HTTOPA/IYJ H. R. SMITH, JR
  • the present invention relates to an improved apparatus for the continuous production of thin foils and also to an improved apparatus for the coating of foils or sheets of material with an adherent film.
  • the present invention provides for the vacuum deposition of materials such as metal for the production of foils or films.
  • the invention relates to continuous production wherein a very substantial quantity of foil, for example, may be produced without vacuum difficulties and problems normally attendant high vacuum processing.
  • high vacuums may be established and maintained, even under adverse circumstances, by the utilization of suitable pumping speeds and appropriate vacuum techniques, it has quite commonly been considered that such applications are limited to laboratory utilization.
  • the present invention provides for the practical application of high vacuums to the vapor deposition of materials for the production of very thin films which may be utilized as separate foils or alternatively may be employed in connection with the coating of foil or web material.
  • Continuous high quantity and quality production with high vacuum processing is herein achieved by novel vacuum staging through which continuous foils or the like are fed. Such foils or the like are thus movable between atmospheric pressure and high vacuum processing regions without loss of vacuum in such regions.
  • Truly high quality vapor deposition may be accomplished in very high vacuum regions, wherein substantially free molecular flow is obtained so that no recombination of vaporized molecules occurs in the free flow regions.
  • This provides for the deposition of a substantially molecular coating, i.e., one molecule at a time, so as to achieve maximized uniformity of the coating.
  • Serial Number 132,423 led in the United States Patent Otiice on August l, 1961, for Foil Production, a process and apparatus for producing thin foils.
  • Such process utilizes the aforementioned high vacuum conditions and the present invention constitutes an improvement thereover in providing for a continuity of production through movement of the vapor deposited coating between high vacuum regions and substantially atmospheric conditions.
  • a vapor deposited coating is removed from a high vacuum coating region upon a rotatable drum extending between the vacuum and the atmosphere. Vacuum integrity is maintained by the separate evacuation of consecutive stages about the drum periphery to achieve a large pressure gradient along the path of the coating without applying stresses to the coating.
  • the present invention provides for the vapor deposition of thin films upon a foil or web, either for the purpose of producing multilayer foils or, alternatively, for the coating of a thin backing material in predetermined arrangement, so as, for example, to produce writing thereon.
  • the invention may, for example, be employed to deposit a thin film of metal in predetermined arrangement upon a strip or sheet of transparent backing of minimal thickness, so as to leave transparent portions thereof available for the viewing of materials subsequently packaged or encased in the coated backing material.
  • the apparatus of this invention provides for continuous foil or coating production and additionally provides an 3,183,563 Patented May 18, 1965 improvement in the handling of the product to facilitate removal of same from high vacuum regions without damage.
  • FIGURE 1 is a longitudinal sectional view taken in a central vertical plane through a foil furnace in accordance with the present invention
  • FIGURE 2 is a transverse sectional view of the same furnace as illustrated in FIGURE l and taken in the plane 2 2 of FIGURE 1;
  • FIGURE 3 is a sectional view of a suitable electrongun heat source as employed in the invention hereof;
  • FIGURE 4 is a longitudinal sectional view taken in a central vertical plane through an alternative embodiment of the present invention adapted for the application of coating to a web or the like;
  • FIGURE 5 is a sectional view taken in a central vertical plane of an alternative embodiment of the present invention including stencil means for limiting coating areas upon a substrate webbing or the like to be coated in the furnace illustrated.
  • the continuous foil furnace of the present invention provides a rotary drum as an important component therein. Coating material vaporized in a high vacuum chamber is deposited either upon this drum itself or upon materials carried by the drum.
  • the drum is arranged in relation to walls defining the high vacuum chamber so as to rotate between the chamber and external atmosphere.
  • a plurality of vacuum barriers or walls closely engage the drum at spaced intervals along the periphery thereof, and multistage pumping is provided for successively reducing the pressure between adjacent vapor barrier walls about the drum circumference. In this manner, vacuum integrity is maintained within the reaction chamber of the furnace hereof, while at the same time limiting vacuum sealing problems to that of sealing of the drum.
  • Continuous processing requires extension of the foil or the like from the evacuated reaction volume, in order that such foil may be available for use, and the drum arrangement of the present invention is highly advantageous in this respect.
  • the degree of adhesion of vapor deposited materials may be controlled by controlling substrate temperature upon which such materials are deposited.
  • the rotating drum of the present invention is ideally suited to controlled heating in order to maintain the substrate within desired temperature ranges for improved control over certain characteristics of foil formation. Under those circumstances wherein it is desired to produce a separate foil by vapor deposition with the furnace hereof, it is highly advantageous for the foil to be readily separable from the substrate upon which it is deposited.
  • the rotating drum hereof provides an ideal carrier for the film substrate, so that the latter may be maintained within a predetermined temperature range for maximized adhesion of the vapor deposited material to the substrate.
  • FIGURES l and 2 of the drawing there will be seen to be illustrated a vacuum enclosure 11 defined at least in part by walls 12.
  • High speed pumping means such as diffusion pumps 13 are connected to the interior of the chamber 11 through the walls 12, and backing pumping means 14 may be employed in connection with these diffusion pumps.
  • alternative pumping means may be employed, it is herein briefly noted that quite high pumping speeds are required in order to maintain the pressure of the chamber 11 at a desired minimum amount, particularly during vacuum deposition of materials within this chamber.
  • a vapor source 16 This source is illustrated as comprising a crucible 17 containing molten material 18 for vapor deposition and an electron beam generator 19 producing an electron beam 21 directed onto the top of this molten metal for bombardment heating thereof.
  • Viewing means 22 may be provided in extension through a wall of the housing 12 for direct visual observation of the interior thereof. It is possible to charge the crucible 17 with material 18 in a variety of ways, and there is shown a tundish or spout 26 directing molten material into the crucible 17 from a melting Crucible 27.
  • Coating material 18 is provided to the furnace through a vacuum lock 28 extending through a wall of the furnace and the material is fed into the melting erucible 27 whereat the material is initially melted. This melting is shown to be accomplished by bombardment heating with one or more electron beams 29 directed into the Crucible from a source 31.
  • the coating material feed and vaporization system illustrated in FIGURE l and described above is advantageous in providing for initial melting of the material at a distance from the location of vapor deposition. Purification of the coating material fed into the vacuum chamber may thus be accomplished in the melting Crucible 27 by driving volatile impurities therefrom at a distance from the location of vapor deposition.
  • the coating material may be initially provided through the vacuum lock 28 in any desired form. such as for example, solid pieces of scrap metal which are successively dumped into the melting crucible 27 by suitable feed means herein considered to be included in the illustrated vacuum lock means 28.
  • Continuous foil production is attained by the utilization of a movable substrate upon which coating material is vapor deposited.
  • This moving substrate is formed as a drum 41 rotatably mounted by a shaft 42 above the vapor generator 16.
  • Drive means such as an electric motor 43, is coupled to the drum shaft 42 and preferably located exteriorly of the vacuum chamber 1l, as illustrated in FIGURE 2.
  • cooling means schematically illustrated in FIG- URE l as cooling pipes 44. These cooling means serve to prevent overheating of bearing surfaces, for example, and may also be employed to control drum surface temperature, as noted in greater detail below.
  • Vacuum sealing means are provided about the drum 41 to maintain vacuum integrity within the chamber 11, and at the ends of the drum these sealing means may take any conventional form desired. inasmuch as the drum is located to rotate between atmospheric conditions exteriorly of the furnace and high vacuum conditions interiorly thereof, special provision is made for providing vacuum sealing about the drum circumference. This vacuum sealing is accomplished by the provision of a plurality of vacuum stages displaced circumferentially about the drum. These individual stages are defined by separate walls l, 52, 53, and 54, which may be disposed in generally parallel spaced relationship in extension from the side walls of the chamber into close engagement with both sides Gil 4 of the drum periphery.
  • Intermediate vacuum chambers 56, 57, and 58 are defined between the walls 5l to 54, and cach of these intermediate chambers are connected to vacuum pumping means, such as schematically illustrated at 6l, 62, and 63.
  • the walls 51 to 54 extend into very close engagement with the periphery of the drum 41, and there may be provided resiliently mounted rollers 64 at the inner ends of each of the walls substantially engaging the drum itself. Under those circumstances wherein a coating of substantial thickness is to be vapor deposited upon the drum for subsequent removal therefrom as a thick foil, it is apparent that the total drum radius is substantially greater on the side leaving the chamber 11 than on the entering side.
  • the vapor generator 16 serves as a source of vapor of material to be formed into a foil or the like, and as indicated in FIGURE l, this vapor rises from the upper surface of the molten material 18 within the Crucible 17 and to condense upon the relatively cool drum surface above the Crucible. Rotation of the drum provides for vapor condensation upon a continuously replaced substrate, i.e., the drum surface, and this continuous coating is removed from the area of deposition by drum rotation.
  • the coating material is carried on the drum from the vacuum chamber 11 through the intermediate vacuum chambers or stages to the exterior of the furnace. Outside of the furnace the vacuum deposited material or coating 71 upon the drum is separated from the drum as a foil.
  • This removal may be accomplished by the disposition of a knife edge element 72 bearing against the drum periphery and directed toward the coated surface of the drum as it moves past the knife edge.
  • a freely rotatable roller 73 is disposed adjacent the location of coating removal so that the vapor deposited material in the form of a foil then passes over this roller after removal from the drum.
  • the foil 71 may then, for example, be wound about a take-up reel 74 over suitable intermediate rollers or the like, as indicated.
  • FIGURE 3 An exemplary electron beam source suitable for use herein.
  • the source 19 is seen to include an electron emissive filament 81 disposed within a backing electrode 82 and electrically connected to a filament supply 83 for passing a current through the filament to raise the temperature of the filament to that of electron emission.
  • an accelerating electrode 84 which is maintained at a positive potential with respect to the filament by an accelerating voltage supply 86.
  • the electrons emitted from the filament 81 are attracted from the backing electrode in the form of a beam by the potential existing between the accelerating electrode 84 and filament 81.
  • This electron beam 21 is shown to be initially directed generally upward from the electron source, and the beam is curved by the establishment of a magnetic tield passing transversely through the beam trajectory.
  • This magnetic field may be established between magnet pole pieces 87 by energization of a magnet coil 88 therebetween from a magnet power supply 89.
  • the electron beam 21 is curved, somewhat as indicated, to thus traverse an arcuate path and to impinge upon the upper surface of material 18 within the Crucible 17.
  • the electron beam generator briefly described above, is similar to one disclosed in a co-pending patent application of Charles W. Hanks, now Patent No.
  • Electron beams generated by sources such as illustrated in FIGURE 3 may be employed to initially melt material fed into crucible 27 and to vaporize material in the vapor source 16. ln addition, the present invention also provides for heating of the rotating drum 41. This may be quite readily accomplished by electron bombardment of the surface of the drum immediately ahead of the area upon which vapor deposits.
  • a beam generator 77 such as described above, bombards the drum which is formed of a metal such as stainless steel to readily withstand heating.
  • the pumps 61, 62, and 63 are operated to maintain intermediate degrees of vacuum in the vacuum stages 56, 57, and 58, spaced about the drum periphery.
  • the internal atmosphere of chamber 11 was maintained at a pressure of 0.02 micron of mercury.
  • the first vacuum stage 56 was maintained at 0.1 atmosphere ⁇ the next stage 57 was maintained at 0.01 atmosphere, and the third stage 58 was maintained at a pressure of -4 atmospheres. Copper scrap was placed in the lock 28 and fed therefrom into the purification crucible 27.
  • this copper scrap was heated and melted within the purication crucible with a consequent volatilization therefrom of such impurities within the scrap as readily volatilize at melting temperature of copper.
  • the purification crucible 27 substantially full, molten copper tiowed down a tundish 26 into the vapor source crucible 17. Molten copper 18 within this crucible 17 was then further heated by electron beam bombardment to raise the temperature of the copper to that of vaporization.
  • the drum 41 was rotated by the motor 43 at a peripheral velocity in the range of 80'to 250 feet per minute.
  • drum was formed with a diameter of six feet so that this f did not require an undue rotational velocity of the drum.
  • adherence of vapordeposited material to a moving substrate may be limited by controlling the temperature of the substrate.
  • the temperature of the substrate In the instance wherein copper foil, for example, was formed, it was desired for the vapor deposited material to be readily separable from the drum surface. Control over the temperature of the surface of the drum 41 was obtained by heating this surface, as for example, by electron beam bombardment from the source 77, and by providing for cooling of the drum interiorly thereof through the coolingtubes 44. Still considering the example of copper foil production, the drum was heated to a temperature in the range of 275 degrees Fahrenheit to 310 degrees Fahrenheit by electron beam bombardment.
  • a truly continuous foil production is accomplished by the present invention, inasmuch as the drum 4l continues to rotate and, with the maintenance of molten material within the vapor source ⁇ there is established a continuous vapor deposition upon the moving drum surface. 1n this manner it is possible to form extremely large areas of foil without a break therein. Control over the thickness of the foil is readily accomplished by controlling the rate of rotation of the drum, and, of course, the rate of vaporization of the copper is also controllable by controlling the amount of heat applied thereto. Preferably the rate of vaporization is maintained substantially constant, however, inasmuch as undue boiling ofthe copper may result in spattering of molten copper from the crucible.
  • Separation of the vapor source and drum is also variable, however, it has been found in practical applications that a distance of 6 inches to 18 inches is desirable in this respect. Too great a separation of vapor source and drum or moving substrate will result in loss of a relatively large amount of the vapor which would then plate other portions of the interior of the furnace.
  • the present invention is highly advantageous in providing a simplified and improved manner of removing vapor deposited material from a highly evacuated chamber within which deposition is carried out.
  • the rotating drum 41 is highly advantageous in continuous foil production, for the drum itself extends between the vacuum chamber and atmospheric conditions exteriorly thereof.
  • the plurality of intermediate vacuum stages about the drum periphery make it possible to maintain the high vacuum within the chamber while yet passing the vapor deposited coating therefrom.
  • the opening between the atmosphere and the tirst vacuum stage 56 may be limited to about onehalf square inch. This limitation is quite practical in actual constructed apparatus and similar spacing may be employed between successive vacuum stages.
  • conventional vacuum pumping means are suitable to maintain thepressure differentials identified in the example above. 1t is particularly noted that the high vacuum, as of the order of 0.02 micron of mercury, within the chamber 11 is not only initially established therein, but furthermore, is maintained therein throughout vapor deposition. This vacuum is maintained despite the fact that a substantial amount of gas may be evolved from the purification Crucible and, furthermore, that a certain amount of vapor is distributed throughout the chamber. Quite high speed pumping means are required to maintain this low pressure, however, conventional pumping means are suited therefor.
  • the crucibles 17 and 27 within the vacuum chamber 11 may be formed, for example, of graphite under the conditions wherein relatively low temperature metals such as copper are being vapor deposited upon the drum.
  • the drum With copper being employed as the deposited material, the drum may, for example, be formed of stainless steel although many other metals have also been found suitable.
  • Substantially any desired foil surface may be produced by employing an appropriate substrate surface. Thus, for example, if it is desired to obtain a matte foil surface, it is only necessary to roughen the surface of the drum. An extremely smooth foil surface may be obtained by employing a very smooth drum surface. Under those conditions wherein a very high temperature material is to be vapor deposited it may be necessary to provide cooling for the crucibles, and in this case water cooled copper crucibles have been found to be advantageous.
  • the continuous foil plant of the present invention is admirably suited to the production of very thin tantalum foil which finds wide applicability in the manufacture of electrical capacitors.
  • the drum cools rather rapidly, it will be appreciated that the vapor deposited material is relatively cool at the point of separation from the drum outside of the vacuum chamber.
  • the continuous foil production plant is adapted to the production of extremely thin foil as well as foils of greater thickness.
  • FIGURE 4 One embodiment of the present invention adapted to produce thin coatings upon a web or sheet of backing material is illustrated in FIGURE 4. Referring to this figure, there will be seen to be shown a housing 101 defining a vacuum chamber 102 evacuated through suitable outlets 103 and connected to appropriate pumping means not shown.
  • a drum 104 which is mounted for rotation in a position to dispose a part of the periphery of the drum within the chamber 102 and a part of the periphery entirely without the
  • a flexible sheet or web 111 to be coated with a thin layer of vapor deposited material is supplied from a supply reel 112 over suitable rollers 113 to pass about the drum 104, through the chamber 102, and back out of the chamber onto a take-up reel 114.
  • FIGURE 4 there is shown in FIGURE 4 the provision of a separate or secondary drum 116 mounted for rotation within the chamber 102.
  • the web 111 extends about one side of the drum 104 and thence about the drum 116 and back up about the primary drum 104 out of the vacuum chamber.
  • a pair of guide rollers 117 and 118 preferably mounted for lateral movement under control of an operator exteriorly of the vacuum chamber, engage the web between the primary and secondary drums so as to thereby provide for appropriate tension upon the web passing through the vacuum chamber.
  • a suitable vapor source 121 is provided beneath the secondary roller 116 and may, for example, include a crucible 122 and one or more electron beam generators 123 bombarding molten material 124 within the crucible.
  • Various types of material feed means may be employed to initially or ⁇ continuously charge the Crucible 122 with the material 124 for vapor deposition.
  • the take-up reel 114 is driven, as for example by a suitable motor 126, to withdraw the web 111 from the supply reel 112 and pass it through the vacuum chamber 102. With both of the drums 104 and 116 being mounted for rotation they will thus rotate as the web passes thereover. As the web is drawn through the vacuum chamber 102, vapor rising from the vapor generator 121 will be deposited upon the web in the very high vacuum maintained within the vacuum chamber. In distinction to the embodiment of the invention illustrated in FIGURE 1, it is normally desired herein for the vacuum deposited material to tightly adhere to the backing or web. This tight adherence commonly results from vapor deposition upon a clean surface ⁇ how ⁇ ever, for certain materials adhesion may be improved by controlled heating of the web.
  • T is coating may, for example, have a thickness of a ew mi and may comprise any of a wide variety of metals or other types of material.
  • utilization of a web having electricall 'n- Sulating Propertissaasihesm E El conBtEiii-gietal such as cir-perd sheet of composite or coated materia tageous for use in the manufacture of electrical capacitors.
  • FIG- URE 5 An alternative embodiment of the present invention particularly adapted to such usage is illustrated in FIG- URE 5. wherein there is employed two rotatable drums 201 and 202 extending between the interior of a highly evacuated chamber 203 and the atmosphere.
  • a housing 204 defines the vacuum chamber 203, and evacuation piping 206 extends from this housing for connection to suitable high speed pumping means to maintain a very high vacuum within the chamber.
  • material is vacuum deposited upon a exible substrate such as a sheet 207 which is fed into the vacuum chamber 203 about one of the sealing drums 201 and out of the vacuum chamber about the second sealing drum 202.
  • each of the drums 201 and 202 have a plurality of intermediate vacuum stages communicating with the periphery of each drum along both sides thereof, and each of these stages are independently evacuated, as indicated by the arrows in FIGURE 5, to thereby maintain intermediate vacuum conditions in each of the stages.
  • the sheet 207 is fed from a supply reel 211 into the chamber 203 about the drum 201 and thence over a roller 212 and around a rotating drum 213. It -is while passing about this drum 213 that a coating is vacuum deposited upon the moving sheet 207. This sheet then extends about a further roller 214 and about one side of the sealing drum 202 out of -the vacuum chamber and about a take-up reel 216.
  • a vapor generator 217 which, may for example, be formed in the manner described above and includes means containing a molten pool of material to be deposited and means applying heat to such a pool for vaporization ofthe coating material.
  • a second or stencil sheet 221 In the manufacture of partially coated foils or sheets, for example, there is provided in accordance herewith for the passage of a second or stencil sheet 221 through the vacuum chamber 203.
  • This stencil sheet 221 may be formed of any suitable material such as a thin foil of metal or a thin sheet of plastic or the like.
  • the stencil sheet 221 is provided with desired cutouts Corresponding to the areas of desired vapor deposition upon the sheet 207.
  • the stencil sheet 221 which may be one continuous member or belt, is fed into the vacuum chamber 203 about a guide roller 222 onto the sheet 207 thence through the intermediate vacuum chambers about the periphery of sealing drum 201. Consequently, as the sheet 207 passes into the vacuum chamber 203 it is covered on its lower surface by the stencil sheet 221.
  • This stencil sheet then extends about the roller 212 and about the rotating drum 213. As the sheet 207 passes over the vapor generator 217, it will .thus be seen to be covered by the stencil sheet 221 so .that vapor deposits upon both the stencil sheet and upon the backing sheet only through cutout portions of the stencil sheet. This composite sheeting then passes over the guide roller 214 and out of the vacuum chamber 203 about the sealing drum 202. Exteriorly of the housing 204 the stencil sheet 221 is withdrawn from the sheet 207 by passage about a roller 223, so that the sheet 207 as it is wound upon the take-up reel 216 is only coated upon those areas of the sheet which were exposed by openings in the stencil sheet.
  • Suitable drive means may -be connected to the take-up reel 216 in order to move the sheet 207 through the vacuum chamber, and likewise separate drive means may be provided for the stencil sheet, or alternatively it may be sufficiently pressed against the sheet 207 as to travel therewith through the vacuum chamber.
  • partially coated backing sheets A wide variety of applications of partially coated backing sheets is possible. It is thus possible, for example, to produce partially transparent wrapping for commercial items such as bread or the like. By the provision of appropriate openings in the stencil sheet, it is possible to apply writing, pictures, fanciful illustrations and the like to the backing sheet 207 that may in turn be transparent.
  • the ability of the present invention to deposit extreme-ly thin and uniform coatings of metal clearly commends the apparatus to this type of production.
  • An almost monoatomic layer of coating material may be applied in accordance with the present invention, and thus vacuum deposition of metals or the like becomes widely applicable. This ability to deposit such a thin coating in a uniform manner then makes the utilization of the present invention highly advantageous from an economic view point, not only in those fields where vacuum deposition is presently practiced, but furthermore, in many additional fields such as the one suggested above.
  • Vacuum deposition of materials such as metal in the very high vacuum employed -in the plant of this invention results in a uniformity of coating hitherto unavailable.
  • Vapor molecules from the vapor generator travel in substantially straight lines into impingemen't with a substrate to be coated, and the almost total absence of gas molecules in the path of vapor -travel minimizes molecular collisions and agglomeration of vapor molecules. Consequently, these molecules of vapor are deposited almost individually upon the substrate, so that there is thus attained an extremely uniform coating.
  • the coating produced hereby may be maintained extremely thin, it yet entirely covers the substrate without porosity or irregularity normally encountered in coating operations. In this manner then, it is possible to apply a much thinner coating and yet obtain a full and complete coverage of the article coated.
  • the present invention provides for ready movement of very thin foils or coatings from highly evacuated volumes to atmospheric pressure without endangering the high vacuum of the chamber.
  • An apparatus for the continuous manufacture of a thin foil comprising, a housing defining a main vacuum chamber, a rotatable drum mounted in said housing so that the periphery of said drum forms a portion of a wall of said chamber, a plurality of vacuum sealing chambers disposed about the periphery of said drum immedi ⁇ ately outside said housing, means to'evacuate said main vacuum chamber to a high vacuum and means to evacuate said sealing chambers to provide progressively increased vacuum to the surface of said drum as said surface approaches said main vacuum chamber, a crucible within said chamber for receiving material to be vaporized, ⁇ first electron beam heating means within Said chamber adjacent said crucible for vaporizing the material in said crucible, said rst electron beam heating means including focusing means for focusing the electron beam onto the surface of the material in said crucible for vaporization thereof, and second electron beam heating means within said chamber adjacent said drum, said second electron beam heating means including focusing means for focusing the electron beam onto the surface of said drum for heating the surface of the drum
  • An apparatus for the continuous manufacture of a thin foil comprising, a housing defining a main vacuum chamber, a rotatable drum mountedin said housing so that the periphery of said drum forms a portion of a wall of said chamber, a plurality of vacuum sealing chambers disposed about the periphery of said drum immediately outside said housing, means to evacuate said main vacuum chamber to a high vacuum and means to evacuate said sealing chambers to provide progressively increased vacuum to the surface of said drum as said surface approaches said main vacuum chamber, a crucible within said chamber for receiving coating material to be vaporized, first electron beam heating means within said chamber adjacent said crucible for vaporizing lthe material in said crucible, said electron beam heating means being positioned so that the electron beam is generated at a point below the level of the material in said crucible, said rst electron beam heating means including focusing means for focusing the electron beam in a generally arcuate path onto the surface of the material in said crucible for vaporization thereof second electron beam heating means within said chamber adjacent said drum
  • An apparatus for the continuous manufacture of a thin foil comprising, a housing defining a main vacuum chamber, a rotatable drum mounted in said housing so that the periphery of said drum forms a portion of a wall of said chamber, a plurality of vacuum sealing chambers disposed about the periphery of said drum immediately outside said housing, means to evacuate said main vacuum chamber -to a high vacuum and means to evacuate said sealing chambers to provide progressively increased vacuum to the surface of said drum as said surface approaches said main vacuum chamber, a vaporizing crucible within said chamber for receiving coating material to be vaporized, first electron beam heating means within said chamber adjacent said crucible for vaporizing the material in said crucible, said electron beam heating means being positioned so -that the electron beam is generated at a point below the level of the material in said crucible, said first electron beam heating means including magnetic focusing means for focusing the electron beam in a generally arcuate path onto the surface of the material in said crucible for vaporization thereof, second electron beam heating means within said
  • An apparatus for the continuous manufacture of a thin foil comprising, a housing defining a main chamber, a rotatable drum mounted in said housing so that the periphery of said drum forms a portion of a wall of said chamber, a plurality of vacuum sealing chambers disposed about the periphery of said drum immediately outside said housing, means to evacuate said main vacuum chamber to a high vacuum and means to evacuate said sealing chambers to provide progressively increased vacuum to the surface of said drum as said surface approaches said main vacuum chamber, a crucible within said chamber for receiving coating material to be vaporized, first electron beam heating means within said chamber adjacent said crucible for vaporizing the material in said crucible, said first electron beam heating means including focusing means for focusing the electron beam onto the surface of the material in said crucible for vaporization thereof, second electron beam heating means within said chamber adjacent said drum, said second electron beam heating means including focusing means for focusing the electron beam onto the surface of said drum for heating the surface of said drum prior to the deposition of the coating material thereon in order to
  • An apparatus for the continuous manufacture of a thin foil comprising, a housing defninga main chamber, a rotatable drum moun-ted in said housing so that the periphery of said drum forms a portion of a wall of said chamber, a plurality of vacuum sealing chambers disposed about the periphery of said drum immediately outside said housing, means to evacuate said main vacuum 13 chamber to a high vacuum and means to evacuate said sealing chambers to provide progressively increased vacuum to the surface of said drum as said surface approaches said main vacuum chamber, a Crucible within said chamber for receiving coating material to be vaporized, first electron beam heating means within said chamber adjacent said crucible for vaporizing the material in said crucible, said first electron beam heating means including focusing means for focusing the electron beam onto the surface of the material in said Crucible for vaporization thereof, second electron beam heating means within said chamber adjacent said drum, said second electron beam heating means including focusing means for focusing the electron beam onto the surface of said drum for heating the surface of said dmm prior to the deposition of the coating material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US200157A 1962-06-05 1962-06-05 Apparatus for continuous foil production by vapor deposition Expired - Lifetime US3183563A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
NL293028D NL293028A (xx) 1962-06-05
US200157A US3183563A (en) 1962-06-05 1962-06-05 Apparatus for continuous foil production by vapor deposition
NL63293028A NL139566B (nl) 1962-06-05 1963-05-21 Vacuuemopdampinrichting.
GB20951/63A GB1014245A (en) 1962-06-05 1963-05-24 Improvements in or relating to apparatus for vapor deposition
CH646663A CH401632A (fr) 1962-06-05 1963-05-24 Appareil pour la vaporisation d'une substance et la production d'un dépôt par condensation de la vapeur produite
LU43818D LU43818A1 (xx) 1962-06-05 1963-05-27
FR936145A FR1364210A (fr) 1962-06-05 1963-05-27 Perfectionnements apportés aux dispositifs pour la production de dépôts à partir d'une vapeur
DE19631521520 DE1521520B1 (de) 1962-06-05 1963-05-29 Vorrichtung zur kontinuierlichen Herstellung einer duennen Folie,insbesondere aus Metall,durch Vakuumaufdampfen
AT448363A AT261347B (de) 1962-06-05 1963-06-04 Vorrichtung zur kontinuierlichen Herstellung von dünnen Metallfolien
DK264163AA DK116836B (da) 1962-06-05 1963-06-04 Apparat til kontinuerlig fremstilling af en tynd folie ved vakuumpådampning.
SE6205/63A SE309351B (xx) 1962-06-05 1963-06-05

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US200157A US3183563A (en) 1962-06-05 1962-06-05 Apparatus for continuous foil production by vapor deposition

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US3183563A true US3183563A (en) 1965-05-18

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AT (1) AT261347B (xx)
CH (1) CH401632A (xx)
DE (1) DE1521520B1 (xx)
DK (1) DK116836B (xx)
FR (1) FR1364210A (xx)
GB (1) GB1014245A (xx)
LU (1) LU43818A1 (xx)
NL (2) NL139566B (xx)
SE (1) SE309351B (xx)

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3303320A (en) * 1962-09-25 1967-02-07 Heraeus Gmbh W C Vapor-coating apparatus
US3322577A (en) * 1963-05-03 1967-05-30 Temescal Metallurgical Corp Method and apparatus for the continuous production of oxide coatings
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
US3351126A (en) * 1964-09-25 1967-11-07 Western Electric Co Casting wheel apparatus
US3381739A (en) * 1965-08-20 1968-05-07 Phelps Dodge Corp Method and apparatus for processing materials into foil and strip form
US3394679A (en) * 1966-12-05 1968-07-30 Dresser Ind Vacuum coating apparatus
US3406040A (en) * 1964-06-24 1968-10-15 Ibm Vapor deposition method for forming thin polymeric films
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material
US3414251A (en) * 1968-01-19 1968-12-03 United States Steel Corp Metal vaporization crucible with upstanding walls for confining and condensing vapor
US3420978A (en) * 1965-06-30 1969-01-07 Nasa Pretreatment method for antiwettable materials
US3440390A (en) * 1966-04-20 1969-04-22 Little Inc A Method and apparatus for treating continuous strip material under vacuum
US3442321A (en) * 1965-06-03 1969-05-06 Commissariat Energie Atomique Device for continuous casting of refractory materials
US3476525A (en) * 1966-09-26 1969-11-04 Nat Res Corp Production of boron carbide flakes
US3498259A (en) * 1966-06-15 1970-03-03 Michel A Braguier Apparatus for continuous metallization of dielectric strips
US3511212A (en) * 1968-05-16 1970-05-12 Du Pont Vapor deposition apparatus including a polyimide containing mask
US3535489A (en) * 1968-05-03 1970-10-20 Smith Corp A O Electron beam welding apparatus
US3608615A (en) * 1970-08-20 1971-09-28 Phelps Dodge Corp Foil production
US3956031A (en) * 1969-12-24 1976-05-11 Texas Instruments Incorporated Magnetic materials and the formation thereof
US3989862A (en) * 1970-10-13 1976-11-02 Jones & Laughlin Steel Corporation Method and apparatus for vapor-depositing coatings on substrates
US4080926A (en) * 1975-03-30 1978-03-28 Massachusetts Institute Of Technology Apparatus for growing films by flash vaporization
US4277516A (en) * 1979-01-10 1981-07-07 Siemens Aktiengesellschaft Method for generating layers on a carrier foil
US4294194A (en) * 1978-11-08 1981-10-13 Siemens Aktiengesellschaft Device for coating objects
US4301765A (en) * 1979-01-10 1981-11-24 Siemens Aktiengesellschaft Apparatus for generating layers on a carrier foil
EP0337369A1 (en) * 1988-04-11 1989-10-18 Mitsubishi Jukogyo Kabushiki Kaisha Continuous vacuum vapor deposition apparatus
US5411075A (en) * 1993-08-31 1995-05-02 Aluminum Company Of America Roll for use in casting metal products and an associated method
US20090148598A1 (en) * 2007-12-10 2009-06-11 Zolla Howard G Methods and Apparatus to Provide Group VIA Materials to Reactors for Group IBIIIAVIA Film Formation
WO2010051311A1 (en) * 2008-10-28 2010-05-06 Solopower, Inc. Improved drum design for web processing
US20120031336A1 (en) * 2010-08-09 2012-02-09 Hon Hai Precision Industry Co., Ltd. Chemical vapor deposition device
JP2013087297A (ja) * 2011-10-13 2013-05-13 Sumitomo Electric Ind Ltd 金属膜の製造方法
CN113906598A (zh) * 2019-04-17 2022-01-07 2555663安大略有限公司 锂金属阳极组件及其制造设备和方法
US20230137506A1 (en) * 2020-08-21 2023-05-04 Applied Materials, Inc. Processing system for processing a flexible substrate and method of measuring at least one of a property of a flexible substrate and a property of one or more coatings on the flexible substrate

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NL293028A (xx) * 1962-06-05
EP0403987B1 (en) * 1989-06-19 1994-09-21 Matsushita Electric Industrial Co., Ltd. Method for supplying vacuum evaporation material and apparatus therefor

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US2864137A (en) * 1952-10-25 1958-12-16 Helen E Brennan Apparatus and method for producing metal strip
US2996037A (en) * 1959-01-26 1961-08-15 Nat Res Corp Vacuum coating apparatus
US3040702A (en) * 1958-06-19 1962-06-26 Nat Res Corp Vacuum coating apparatus having sealing means formed of membranes and fibers
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US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof

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US2384500A (en) * 1942-07-08 1945-09-11 Crown Cork & Seal Co Apparatus and method of coating
CH334330A (de) * 1953-09-29 1958-11-30 Siemens Ag Apparatur mit Hochvakuumraum und kontinuierlich benutzbarer Vakuumschleuse für Bänder und Drähte
DE1741856U (de) * 1956-02-16 1957-03-21 Siemens Schukkertwerke Ag Einrichtung zur kontinuierlichen bedampfung von folien.
DE1078402B (de) * 1956-12-06 1960-03-24 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen von Baendern
NL293028A (xx) * 1962-06-05

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US2864137A (en) * 1952-10-25 1958-12-16 Helen E Brennan Apparatus and method for producing metal strip
US3043728A (en) * 1958-03-17 1962-07-10 Nat Res Corp Apparatus and process for metallic vapor coating
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3040702A (en) * 1958-06-19 1962-06-26 Nat Res Corp Vacuum coating apparatus having sealing means formed of membranes and fibers
US2996037A (en) * 1959-01-26 1961-08-15 Nat Res Corp Vacuum coating apparatus

Cited By (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3303320A (en) * 1962-09-25 1967-02-07 Heraeus Gmbh W C Vapor-coating apparatus
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
US3322577A (en) * 1963-05-03 1967-05-30 Temescal Metallurgical Corp Method and apparatus for the continuous production of oxide coatings
US3406040A (en) * 1964-06-24 1968-10-15 Ibm Vapor deposition method for forming thin polymeric films
US3351126A (en) * 1964-09-25 1967-11-07 Western Electric Co Casting wheel apparatus
US3442321A (en) * 1965-06-03 1969-05-06 Commissariat Energie Atomique Device for continuous casting of refractory materials
US3420978A (en) * 1965-06-30 1969-01-07 Nasa Pretreatment method for antiwettable materials
US3381739A (en) * 1965-08-20 1968-05-07 Phelps Dodge Corp Method and apparatus for processing materials into foil and strip form
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material
US3440390A (en) * 1966-04-20 1969-04-22 Little Inc A Method and apparatus for treating continuous strip material under vacuum
US3498259A (en) * 1966-06-15 1970-03-03 Michel A Braguier Apparatus for continuous metallization of dielectric strips
US3476525A (en) * 1966-09-26 1969-11-04 Nat Res Corp Production of boron carbide flakes
US3394679A (en) * 1966-12-05 1968-07-30 Dresser Ind Vacuum coating apparatus
US3414251A (en) * 1968-01-19 1968-12-03 United States Steel Corp Metal vaporization crucible with upstanding walls for confining and condensing vapor
US3535489A (en) * 1968-05-03 1970-10-20 Smith Corp A O Electron beam welding apparatus
US3511212A (en) * 1968-05-16 1970-05-12 Du Pont Vapor deposition apparatus including a polyimide containing mask
US3956031A (en) * 1969-12-24 1976-05-11 Texas Instruments Incorporated Magnetic materials and the formation thereof
US3608615A (en) * 1970-08-20 1971-09-28 Phelps Dodge Corp Foil production
US3989862A (en) * 1970-10-13 1976-11-02 Jones & Laughlin Steel Corporation Method and apparatus for vapor-depositing coatings on substrates
US4080926A (en) * 1975-03-30 1978-03-28 Massachusetts Institute Of Technology Apparatus for growing films by flash vaporization
US4294194A (en) * 1978-11-08 1981-10-13 Siemens Aktiengesellschaft Device for coating objects
US4277516A (en) * 1979-01-10 1981-07-07 Siemens Aktiengesellschaft Method for generating layers on a carrier foil
US4301765A (en) * 1979-01-10 1981-11-24 Siemens Aktiengesellschaft Apparatus for generating layers on a carrier foil
EP0337369A1 (en) * 1988-04-11 1989-10-18 Mitsubishi Jukogyo Kabushiki Kaisha Continuous vacuum vapor deposition apparatus
US5000114A (en) * 1988-04-11 1991-03-19 Mitsubishi Jukogyo Kabushiki Kaisha Continuous vacuum vapor deposition system having reduced pressure sub-chambers separated by seal devices
US5411075A (en) * 1993-08-31 1995-05-02 Aluminum Company Of America Roll for use in casting metal products and an associated method
US20090148598A1 (en) * 2007-12-10 2009-06-11 Zolla Howard G Methods and Apparatus to Provide Group VIA Materials to Reactors for Group IBIIIAVIA Film Formation
US8323408B2 (en) * 2007-12-10 2012-12-04 Solopower, Inc. Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
WO2010051311A1 (en) * 2008-10-28 2010-05-06 Solopower, Inc. Improved drum design for web processing
US20100147677A1 (en) * 2008-10-28 2010-06-17 Mustafa Pinarbasi Drum design for web processing
US20120031336A1 (en) * 2010-08-09 2012-02-09 Hon Hai Precision Industry Co., Ltd. Chemical vapor deposition device
JP2013087297A (ja) * 2011-10-13 2013-05-13 Sumitomo Electric Ind Ltd 金属膜の製造方法
CN113906598A (zh) * 2019-04-17 2022-01-07 2555663安大略有限公司 锂金属阳极组件及其制造设备和方法
US20230137506A1 (en) * 2020-08-21 2023-05-04 Applied Materials, Inc. Processing system for processing a flexible substrate and method of measuring at least one of a property of a flexible substrate and a property of one or more coatings on the flexible substrate

Also Published As

Publication number Publication date
LU43818A1 (xx) 1964-05-27
NL293028A (xx)
AT261347B (de) 1968-04-25
DK116836B (da) 1970-02-16
DE1521520B1 (de) 1970-09-03
GB1014245A (en) 1965-12-22
NL139566B (nl) 1973-08-15
SE309351B (xx) 1969-03-17
CH401632A (fr) 1965-10-31
FR1364210A (fr) 1964-06-19

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