US20160013123A1 - Package structure and fabrication method thereof - Google Patents
Package structure and fabrication method thereof Download PDFInfo
- Publication number
- US20160013123A1 US20160013123A1 US14/562,972 US201414562972A US2016013123A1 US 20160013123 A1 US20160013123 A1 US 20160013123A1 US 201414562972 A US201414562972 A US 201414562972A US 2016013123 A1 US2016013123 A1 US 2016013123A1
- Authority
- US
- United States
- Prior art keywords
- dielectric layer
- conductive posts
- cavity
- bonding pads
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 238000010030 laminating Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 13
- 238000004806 packaging method and process Methods 0.000 claims description 10
- 239000003989 dielectric material Substances 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4697—Manufacturing multilayer circuits having cavities, e.g. for mounting components
Definitions
- the present invention relates to package structures and fabrication methods thereof, and more particularly, to a package structure and a fabrication method thereof having simplified processes.
- PoP package on package
- SiP system-in-package
- PoP structure At least two packages are stacked on one another and electrically connected through a plurality of solder balls.
- solder bridging easily occurs between the solder balls, thus adversely affecting the product yield.
- FIGS. 1A and 1B are schematic cross-sectional views showing a method for fabricating a PoP structure 1 according to the prior art.
- a first substrate 11 having a first surface 11 a with a plurality of copper pillars 13 and a second surface 11 b opposite to the first surface 11 a is provided.
- an electronic element 15 is disposed on the first surface 11 a and electrically connected to the first substrate 11 in a flip-chip manner.
- a second substrate 12 is stacked on the first substrate 11 through the copper pillars 13 .
- the second substrate 12 is bonded to the copper pillars 13 through a plurality of conductive elements 17 .
- Each of the conductive elements 17 consists of a metal pillar 170 and a solder material 171 formed on the metal pillar 170 .
- an encapsulant 16 is formed between the first surface 11 a of the first substrate 11 and the second substrate 12 .
- the size of the copper pillars 13 is difficult to control and the copper pillars 13 tend to have uneven heights. As such, a positional deviation easily occurs to the joints between the conductive elements 17 and the copper pillars 13 and hence a poor bonding easily occurs therebetween, thereby reducing the electrical performance and the product yield of the PoP structure 1 .
- the present invention provides a package structure, which comprises: a carrier having a plurality of bonding pads; a dielectric layer having opposite first and second surfaces and formed on the carrier via the first surface thereof, wherein at least a cavity is formed in the second surface of the dielectric layer to expose the bonding pads; and a plurality of conductive posts formed in the dielectric layer and positioned around a periphery of the cavity.
- the present invention further provides a method for fabricating a package structure, which comprises the steps of: providing a carrier having a plurality of bonding pads and a dielectric layer having opposite first and second surfaces; laminating the dielectric layer on the carrier via the first surface thereof, wherein the bonding pads are covered by the dielectric layer; forming a plurality of conductive posts in the dielectric layer; and forming at least a cavity in the second surface of the dielectric layer so as to expose the bonding pads, wherein the conductive posts are positioned around a periphery of the cavity.
- the second surface of the dielectric layer can have a conductive layer used for forming the conductive posts.
- forming the conductive posts can comprise: forming a plurality of through holes penetrating the dielectric layer; and filling a conductive material in the through holes to form the conductive posts.
- the above-described method can further comprise stacking a stack member on the second surface of the dielectric layer, wherein the stack member is electrically connected to the conductive posts.
- the stack member can be a packaging substrate, a semiconductor chip, an interposer or a package.
- the carrier can be a packaging substrate, a semiconductor chip, a wafer, an interposer, or a packaged or unpackaged semiconductor element.
- a circuit layer can be formed on the second surface of the dielectric layer and electrically connected to the conductive posts.
- the dielectric layer can be made of a photo imageable dielectric material.
- the cavity can be formed by exposure and development.
- the above-described structure and method can further comprise disposing an electronic element in the cavity, wherein the electronic element is electrically connected to the bonding pads.
- a dielectric layer is laminated on a carrier and a plurality of conductive posts are formed in the dielectric layer so as to achieve a preferred stand-off effect and prevent bridging from occurring between the conductive posts.
- the size of the conductive posts can be controlled through the through holes so as to cause the conductive posts to have a uniform height. Therefore, the present invention overcomes the conventional drawback of joint deviation and ensures a reliable bonding between the conductive posts and the conductive elements to be formed later, thereby improving the product yield.
- FIGS. 1A and 1B are schematic cross-sectional views showing a method for fabricating a PoP structure according to the prior art.
- FIGS. 2A to 2G are schematic cross-sectional views showing a method for fabricating a PoP structure according to the present invention.
- FIGS. 2A to 2G are schematic cross-sectional views showing a method for fabricating a package structure according to the present invention.
- a carrier 21 having a plurality of first bonding pads 210 and a plurality of second bonding pads 211 is provided.
- the carrier 21 is a packaging substrate, a semiconductor chip, a wafer, an interposer, or a packaged or unpackaged semiconductor element.
- the carrier 21 is a coreless packaging substrate, which has a plurality of dielectric layers 213 and a plurality of circuit layers 211 ′ alternately stacked on one another and a plurality of conductive vias 212 penetrating the dielectic layers 213 and electrically connected to the circuit layers 211 ′.
- a metal layer 214 made of such as copper is formed on a lower side of the carrier 21 .
- a carrying area A is defined on the carrier 21 .
- the first bonding pads 210 are positioned inside the carrying area A and the second bonding pads 211 are positioned outside the carrying area A.
- a dielectric layer 22 having a conductive layer 23 thereon is laminated on the carrier 21 to cover the first and second bonding pads 210 , 211 . Then, by performing a laser drilling process, a plurality of through holes 260 are formed to penetrate the dielectric layer 22 and the conductive layer 23 corresponding in position to the second bonding pads 211 .
- the dielectric layer 22 has opposite first and second surfaces 22 a , 22 b .
- the conductive layer 23 is formed on the second surface 22 b of the dielectric layer 22 , and the dielectric layer 22 is laminated on the carrier 21 via the first surface 22 a thereof.
- the dielectric layer 22 is made of a photo imageable dielectric (PID) material and the conductive layer 23 is a copper layer.
- PID photo imageable dielectric
- the present invention simplifies the fabrication process.
- a circuit layer 25 is formed on the second surface 22 b of the dielectric layer 22 and a conductive material is filled in the through holes 260 to form a plurality of conductive posts 26 electrically connecting the circuit layer 25 and the second bonding pads 211 .
- the circuit layer 25 is not formed on the second surface 22 b of the dielectric layer 22 corresponding in position to the carrying area A.
- the metal layer 214 on the lower side of the carrier 21 is patterned to form a circuit layer 25 ′.
- a cavity 220 is formed in the second surface 22 b of the dielectric layer 22 to expose the first bonding pads 210 .
- the conductive posts 26 are positioned around a periphery of the cavity 220 . As such, a package structure 2 is formed.
- an upper side of the carrier 21 in the carrying area A is also exposed from the cavity 220 .
- an insulating layer 27 is formed on the second surface 22 b of the dielectric layer 22 and the lower side of the carrier 21 , and portions of the circuit layers 25 , 25 ′ are exposed from the insulating layer 27 for mounting external elements in subsequent processes.
- At least an electronic element 28 is disposed in the cavity 220 and electrically connected to the first bonding pads 210 through a plurality of conductive bumps 281 .
- a stack member 29 is stacked on the exposed portions of the circuit layer 25 and covers the cavity 220 and the electronic element 28 . As such, a package structure 3 is formed.
- the stack member 29 is a packaging substrate, a semiconductor chip, a wafer, a silicon interposer or a package.
- the stack member 29 is electrically connected to the circuit layer 25 and the conductive posts 26 through a plurality of conductive elements 291 made of such as a solder material or metal posts.
- an encapsulant 30 is formed between the stack member 29 and the carrier 21 for encapsulating the conductive bumps 281 .
- the present invention further provides a package structure 2 , which has: a carrier 21 having a plurality of bonding pads 210 ; a dielectric layer 22 having opposite first and second surfaces 22 a , 22 b and disposed on the carrier 21 via the first surface 22 a thereof, wherein at least a cavity 220 is formed in the second surface 22 b of the dielectric layer 22 to expose the bonding pads 210 ; and a plurality of conductive posts 26 formed in the dielectric layer 22 and positioned around a periphery of the cavity 220 .
- the carrier 21 can be a packaging substrate, and the dielectric layer 22 can be made of a photo imageable dielectric material.
- a circuit layer 25 can be formed on the second surface 22 b of the dielectric layer 22 and electrically connected to the conductive posts 26 .
- the package structure 2 further has an electronic element 28 disposed in the cavity 220 and electrically connected the bonding pads 210 .
- a dielectric layer 22 is formed on a carrier 21 , a plurality of conductive posts 26 are embedded in the dielectric layer 22 and a stack member 29 is stacked on the dielectric layer 22 and electrically connected to the conductive posts 26 .
- the present invention achieves a preferred stand-off effect between the conductive posts 26 so as to prevent bridging from occurring between the conductive posts 26 .
- the size of the conductive posts 26 can be controlled through the through holes 260 so as to cause the conductive posts 26 to have a uniform height. Therefore, the present invention overcomes the conventional drawback of joint deviation and ensures a reliable bonding between the conductive posts 26 and conductive elements 291 , thus improving the product yield.
- the cavity 220 can be formed in the dielectric layer 22 by exposure and development, thereby simplifying the fabrication process.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Geometry (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/636,217 US20170301658A1 (en) | 2014-07-11 | 2017-06-28 | Fabrication method of package structure |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW103123899 | 2014-07-11 | ||
TW103123899A TWI660476B (zh) | 2014-07-11 | 2014-07-11 | 封裝結構及其製法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/636,217 Division US20170301658A1 (en) | 2014-07-11 | 2017-06-28 | Fabrication method of package structure |
Publications (1)
Publication Number | Publication Date |
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US20160013123A1 true US20160013123A1 (en) | 2016-01-14 |
Family
ID=55068141
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/562,972 Abandoned US20160013123A1 (en) | 2014-07-11 | 2014-12-08 | Package structure and fabrication method thereof |
US15/636,217 Abandoned US20170301658A1 (en) | 2014-07-11 | 2017-06-28 | Fabrication method of package structure |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/636,217 Abandoned US20170301658A1 (en) | 2014-07-11 | 2017-06-28 | Fabrication method of package structure |
Country Status (3)
Country | Link |
---|---|
US (2) | US20160013123A1 (zh) |
CN (1) | CN105321902B (zh) |
TW (1) | TWI660476B (zh) |
Cited By (5)
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US20140146504A1 (en) * | 2012-11-28 | 2014-05-29 | Zhen Ding Technology Co., Ltd. | Circuit board, package structure and method for manufacturing same |
US20190131227A1 (en) * | 2016-07-01 | 2019-05-02 | Intel Corporation | Device, method and system for providing recessed interconnect structures of a substrate |
US20200037450A1 (en) * | 2018-07-27 | 2020-01-30 | HongQiSheng Precision Electronics (QinHuangDao) Co.,Ltd. | Embedded circuit board and method of making same |
US10769546B1 (en) * | 2015-04-27 | 2020-09-08 | Rigetti & Co, Inc. | Microwave integrated quantum circuits with cap wafer and methods for making the same |
US11121301B1 (en) | 2017-06-19 | 2021-09-14 | Rigetti & Co, Inc. | Microwave integrated quantum circuits with cap wafers and their methods of manufacture |
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TWI605557B (zh) * | 2015-12-31 | 2017-11-11 | 矽品精密工業股份有限公司 | 電子封裝件及其製法與基板結構 |
TWI610402B (zh) * | 2016-08-24 | 2018-01-01 | 矽品精密工業股份有限公司 | 電子封裝結構及其製法 |
CN109216214B (zh) * | 2017-07-07 | 2021-03-30 | 欣兴电子股份有限公司 | 半导体封装结构及其制作方法 |
TWI657516B (zh) * | 2018-07-27 | 2019-04-21 | 矽品精密工業股份有限公司 | 承載結構及封裝結構 |
CN111816569B (zh) * | 2020-07-28 | 2022-04-08 | 珠海越亚半导体股份有限公司 | 封装框架及其制作方法和基板 |
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US20140146504A1 (en) * | 2012-11-28 | 2014-05-29 | Zhen Ding Technology Co., Ltd. | Circuit board, package structure and method for manufacturing same |
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Also Published As
Publication number | Publication date |
---|---|
TWI660476B (zh) | 2019-05-21 |
US20170301658A1 (en) | 2017-10-19 |
CN105321902B (zh) | 2018-07-27 |
TW201603215A (zh) | 2016-01-16 |
CN105321902A (zh) | 2016-02-10 |
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Owner name: SILICONWARE PRECISION INDUSTRIES CO., LTD., TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAI, YU-CHENG;LIN, CHUN-HSIEN;CHIU, SHIH-CHAO;AND OTHERS;REEL/FRAME:034421/0799 Effective date: 20140530 |
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