US20090169910A1 - Method of making a coated cutting tool and cutting tool thereof - Google Patents

Method of making a coated cutting tool and cutting tool thereof Download PDF

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Publication number
US20090169910A1
US20090169910A1 US12/336,169 US33616908A US2009169910A1 US 20090169910 A1 US20090169910 A1 US 20090169910A1 US 33616908 A US33616908 A US 33616908A US 2009169910 A1 US2009169910 A1 US 2009169910A1
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metallic
layer
coating
cutting tool
thickness
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Toril Myrtveit
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Sandvik Intellectual Property AB
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Sandvik Intellectual Property AB
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12007—Component of composite having metal continuous phase interengaged with nonmetal continuous phase

Definitions

  • the present invention relates to a method of making a coated cutting tool comprising depositing one or more metallic interlayers in-between deposition of two non-metallic, functional layers. Before each deposition of a metal interlayer, an ion etching step of the non-metallic functional layer is performed.
  • the cutting tools made according to the method of the present invention will exhibit superior life time due to an increased toughness, thus showing better ability to withstand changes in load.
  • this invention facilitates deposition of thicker PVD coatings without the risk of spalling along the edge line, hence thicker coatings with better flank wear resistance can be deposited.
  • PVD coatings have several attractive properties compared to CVD coatings, for instance a residual compressive stress in the as-deposited state, no cooling cracks and finer grained coatings.
  • PVD coatings usually have to be quite thin, since thicker PVD coatings may cause spalling, frittering, so-called edge-line spalling and flaking, either spontaneously, usually around the edge line, or during machining. Since thicker coatings in many applications lead to a longer tool life due to an increased wear resistance, CVD coatings are usually chosen for those applications.
  • PVD-coatings especially arc deposited, suffer from the existence of so-called macros or droplets, which exists as small spheres on the surface of the coating or, buried inside the coating. During the deposition of the coating, these droplets can shadow the incoming flux of charged metal ions, thus creating voids in the coating in the immediate surroundings of the droplet. Due to the subsequent diminished adhesion between the droplet and the coating, the droplet can fall out either during the deposition process or immediately afterwards or even during machining. This may result in an inferior coating quality, with voids, pores or even, in extreme cases, holes straight down to the substrate.
  • Thicker coatings also have the advantage that the maximum temperature that the substrate is exposed to decreases. A lower substrate temperature decreases the risk of plastic deformation of the cutting edge. Thicker coatings allow for higher cutting forces without initializing plastic substrate deformation.
  • Ion etching is a common initial step in the beginning of all kinds of deposition processes.
  • the substrate is usually ion etched prior to deposition to remove surface contaminants and native oxides and nitrides.
  • ion etching is a common initial step in the beginning of all kinds of deposition processes.
  • the substrate is usually ion etched prior to deposition to remove surface contaminants and native oxides and nitrides.
  • few attempts have been done to use ion etching as an intermediate step.
  • Depositing metallic layers with PVD techniques is also an established technology in PVD-processes. It is well-known that depositing a metallic layer directly onto the surface of the substrate before depositing the rest of the coating can in some cases enhance adhesion of the coating.
  • EP 0756019 describes a method of making a PVD-coating for material deforming tools used in punching operations.
  • a PVD-layer composed of (Ti,Al)N, (Ti,Al,Y)N or (Ti,Al,Cr)N or any multilayer thereof is deposited.
  • the surface is then mechanically treated e.g. with sand blasting or metal ion etching to remove any droplets and to achieve a smooth surface.
  • a second, low-friction, PVD coating consisting of MoS 2 is then deposited on top.
  • U.S. Pat. No. 3,755,866 describes an insert comprising two non-metallic interlayers deposited on top of each other.
  • One layer consists of a fine-grained member of the group consisting of TiC, TaC, ZrC, HfC, VC and NbC.
  • the other layer consists of at least one fine grained member of the group consisting of WC, MoC and CrC.
  • These two layers may or may not be separated by a metallic layer consisting of Co, Ni or Fe.
  • the metallic layer is between 0.1 and 2.0 ⁇ m.
  • EP1136585 describes a self-lubricating coating, consisting of small droplets of metal or other soft material in an otherwise hard coating. Thus, a coating with lower levels of friction is created.
  • the coating is deposited in a sequence consisting of: deposition of a nitride/carbide, followed by ion etching in Ar atmosphere. During the ion etching step a thin metal foil is bombarded with Ar ions, and small metal droplets are emitted.
  • This coating thus consists of layers with small droplets of metal in an otherwise hard coating of a nitride or carbide.
  • JP2002-103122A describes hard-anodic-oxidation-coatings covering small diameter tools, where the coating consist of an inner Ti layer, followed by a TiCN-layer, an intermediate metallic TiAl-layer and finally covered by an outer TiAlCN-layer.
  • EP1553210 A1 discloses a method of depositing ⁇ -Al 2 O 3 layers by PVD technique.
  • a substrate possibly provided with a primary coating is ion bombarded with either gas ions or metal ions, followed by oxidation of the bombarded surface and finally deposition of a ⁇ -Al 2 O 3 layer.
  • metal ions are used for the bombardment, metal ions are implanted into the surface.
  • a method of making a coated cutting tool comprising providing a substrate and coating said substrate with a coating process which comprises at least one sequence comprising the steps of: depositing a non-metallic, functional layer or layer system, subjecting the surface of said non-metallic layer or layer system to an ion etching step, and depositing at least one metallic interlayer.
  • FIG. 1 shows a SEM-picture of a polished cross section showing thin metallic interlayers inside the coating.
  • the metallic interlayers are placed every 0.7-1.5 ⁇ m distance, the total thickness of the coating is 10 ⁇ m.
  • the present invention relates to a method of making a coated cutting tool comprising providing a substrate and coating said substrate with a coating process comprising at least one sequence comprising the steps of:
  • the three steps, as described above are herein after named a sequence, may be repeated any number of times until the desired total coating thickness is achieved.
  • the number of sequences is preferably between about 1 and about 20, more preferably between about 1 and about 10, more preferably between about 2 and about 10 and most preferably between about 3 and about 10.
  • the final deposition step in the coating process is deposition of a non-metallic layer or layer system.
  • a deposition sequence further comprises, after the ion etching step, deposition of a thin non-metallic layer prior to deposition of the metallic interlayer.
  • All layers are preferably deposited in the same coating process.
  • the ion etching step is achieved by ion bombardment with, for example, argon ions or metal ions.
  • argon ions are used.
  • the argon ions are created by igniting plasma in the deposition chamber which is filled with argon.
  • the argon ions are accelerated towards the substrates which are being kept at a negative potential with a value of preferably from about 50 to about 300 V, more preferably from about 100 to about 300 V.
  • the pressure during the etching step is preferably from about 1 to about 15 ⁇ bar, more preferably from about 1 to about 5 ⁇ bar, the temperature is the same as during deposition, preferably from about 300 to about 800° C., more preferably from about 450 to about 750° C.
  • metal ions are used.
  • the deposition chamber is filled with argon, and an arc is ignited at a metal target, thus forming a dense vapor of metal ions.
  • These metal ions are accelerated towards the substrates which are being kept at a high negative potential.
  • the metal ions are preferably one or more of Ti, Zr, Cr, Nb, V, Mo, most preferably Cr.
  • the substrate bias during the metal ion etching step is negative with a value of preferably from about 300 to about 2000 V, more preferably from about 500 to about 1300 V.
  • the pressure during the etching step is preferably from about 1 to about 15 ⁇ bar, more preferably from about 1 to about 5 ⁇ bar, the temperature is the same as the same as during deposition, preferably from about 300 to about 800° C., more preferably from about 450 to about 750° C.
  • the metallic interlayer is deposited using the same coating process as for the non-metallic layers by changing the atmosphere to an inert gas, e.g. He, Ar, Kr, Xe or a combination of these gases.
  • an inert gas e.g. He, Ar, Kr, Xe or a combination of these gases.
  • metallic interlayer is herein meant a layer comprising at least about 60 at %, preferably 70 at %, more preferably at least about 80 at % and most preferably at least about 90 at % metal elements chosen from one or more of Ti, Mo, Al, Cr, V, Y, Nb, Hf, W, Ta and Zr.
  • the deposited metallic interlayers can also comprise smaller amounts of other elements but then at a level corresponding to a technical impurity thus not significantly affecting the ductility of the layers.
  • the metallic interlayer is a pure metal layer where the metal(s) are chosen from Ti, Mo, Al, Cr, V, Y, Nb, Hf, W, Ta, Zr, preferably Ti, Mo, Al, V, Ta, Zr, Cr, most preferably Ti, Al, Zr, Cr, or mixtures thereof, where one of these elements constitute at least about 50 at % of the pure metal layer.
  • the metallic interlayer is a substoichiometric ceramic, preferably a nitride, oxide, carbide or boride, more preferably a nitride MeN, where Me is a metal that can be one or more of the metals included in the case of a pure metal interlayer as described above.
  • the amount of the metal element is at least about 60 at %, preferably 70 at %, more preferably at least about 80 at % and most preferably at least about 90 at % of the substoichiometric ceramic.
  • the average thickness of the metallic interlayers is preferably from about 5 nm to about 500 nm, more preferably from about 10 nm to about 200 nm and most preferably from about 20 nm to about 70 mm.
  • the thicknesses given herein refer to measurements conducted on a reasonably flat surface being in direct line of sight from the targets. For inserts, being mounted on sticks during deposition, it means that the thickness has been measured on the middle of the flank side.
  • the thicknesses given herein refers to the thickness measured on any reasonably flat surface or a surface having a relatively large curvature and some distance away from any edge or corner. For instance, on a drill, the measurements have been performed on the periphery and on an end mill the measurements has been performed on the flank side.
  • the non-metallic functional layers or layer systems can have any composition suitable for cutting tools, such as nitrides, oxides, borides, carbides, or combinations thereof.
  • the coating comprises one or more layers of one or more of (Al,Ti)N, TiN, (Al,Cr)N, CrN, Al 2 O 3 , Ti(B,N), TiB 2 , (Zr,Al)N, (Ti,X)N, more preferably (Al,Ti)N, Ti(B,N), (Ti,X)N, where X can be one or more of Si, B, C, Ta, V, Y, Cr, Hf, Zr, and most preferably (Al,Ti)N.
  • the non-metallic, functional layers or layer systems according to the present invention can have any coating structure common in the art of coating cutting tools.
  • the layers or layer systems, in-between which the sequence of ion etching and deposition of a metallic interlayer takes place, can be the same or different from each other with regard to structure and composition.
  • layer system is herein meant at least two layers which are deposited on top of each other without any ion etching step or deposition of a metallic interlayer in-between.
  • a layer system is a multilayered structure comprising at least 5 individual layers. However, such a multilayered structure can comprise up to several thousands of individual layers.
  • the thickness of the non-metallic, functional layers or layer systems can be from about 0.2 to about 5 ⁇ m, preferably from about 0.3 to about 2 ⁇ m, most preferably from about 0.5 to about 1.5 ⁇ m.
  • the non-metallic layers or layer systems are significantly thicker than the metallic interlayers, the thickness of the non-metallic layers is preferably from about 3 to about 200 times the thickness of the metallic interlayers, more preferably from about 5 to about 150 times thicker, most preferably from about 10 to about 100 times thicker.
  • the total thickness of the coating can be within a wide range since the etching followed by the metallic interlayers makes it possible to deposit coatings thicker than the conventional PVD coatings.
  • the thickness of the whole coating which comprises both metallic and non-metallic layers, can be from about 0.6 to about 15 ⁇ m, preferably from about 1 to about 12 ⁇ m, and most preferably from about 2 to about 10 ⁇ m.
  • a non-metallic PVD-layer or layer system is deposited with a thickness of between from about 0.2 to about 2 ⁇ m which is subsequently etched followed by the deposition of a thin metallic interlayer of Ti with a thickness preferably between from about 20 to about 70 nm. This sequence is repeated until the target coating thickness is achieved.
  • the metallic layer is an alloy of Ti and Al.
  • the metallic layer is an alloy of Al and Cr.
  • the coating process can, in addition to the deposition sequences as described above, also further comprise sequences where the metallic interlayer is deposited directly onto the non-metallic layer or layer system, without the ion etching step, in order to decrease the deposition time.
  • PVD-coating the coating according to the present invention can also be deposited with for example a PECVD technique (Plasma Enhanced Chemical Vapor Deposition) which will generate coatings with properties closer to those of PVD coatings than conventional CVD coatings.
  • PECVD Pullasma Enhanced Chemical Vapor Deposition
  • Substrates suitable for the present invention are preferably cutting tool inserts, or round tools such as drills, end mills etc.
  • the substrate is preferably made of any of cemented carbide, cermets, ceramics, cubic boron-nitride or high speed steels, more preferably cemented carbide.
  • the substrate can be pre-coated with an inner layer deposited directly onto the substrate to ensure a good adhesion to the substrate, the inner layer comprising a pure metal and/or a nitride, preferably Ti and/or TiN, said layer being from about 0.005 to about 0.5 ⁇ m, preferably from about 0.02 to about 0.2 ⁇ m and is deposited within the same coating process as the rest of the layers.
  • the present invention also relates to a coated cutting tool comprising a substrate provided with a coating comprising one or more sequences, comprising a metallic interlayer and a non-metallic layer or layer system, which has been made according to the method described above.
  • the metallic interlayer(s) is placed between two non-metallic functional layers or layer systems.
  • metallic interlayer is herein meant a layer comprising at least from about 60 at %, preferably 70 at %, more preferably at least from about 80 at % and most preferably at least from about 90 at % metal elements chosen from one or more of Ti, Mo, Al, Cr, V, Y, Nb, Hf, W, Ta and Zr.
  • the metallic interlayer is a pure metal layer where the metal(s) are chosen from Ti, Mo, Al, Cr, V, Y, Nb, Hf, W, Ta, Zr or any mixture thereof, preferably Ti, Mo, Al, V, Ta, Zr, most preferably Ti, Al, Zr or mixtures of elements where one of these elements constitute at least from about 50 at % of the pure metal layer.
  • the metallic interlayer is a substoichiometric ceramic, preferably a nitride, oxide, carbide or boride, more preferably a nitride MeN, where Me is a metal that can be one or more of the metals included in the case of a pure metal interlayer as described above or mixtures thereof.
  • the amount of the metal element is at least from about 60 at %, preferably 70 at %, more preferably at least from about 80 at % and most preferably at least from about 90 at % of the substoichiometric ceramic.
  • the average thickness of the metallic interlayers can be from about 5 nm to about 500 nm, preferably from about 10 nm to about 200 nm and most preferably from about 20 nm to about 70 nm.
  • the number of metallic interlayers alternated with non-metallic layers is between from about 1 and to about 20, preferably from about 1 to about 10 layers, more preferably between from about 2 to about 10 layers and most preferably between from about 3 to about 10 layers.
  • the non-metallic layers or layer systems can have any composition suitable for cutting tools, such as nitrides, oxides, borides, carbides, carbonitrides, carbooxynitrides or combinations thereof.
  • the coating comprises one or more layers of one or more of (Al,Ti)N, TiN, Ti(C,N), (Al,Cr)N, CrN, Al 2 O 3 , Ti(B,N), TiB 2 , (Zr,Al)N, (Ti,X)N, more preferably (Al,Ti)N, Ti(B,N), (Ti,X)N where X can be one or more of Si, B, C, Ta, V, Y, Cr, Hf, Zr, and most preferably (Al,Ti)N.
  • the layers or layer systems, in-between which the metallic interlayer is placed can be the same or different from each other with regard to structure and composition.
  • layer system is herein meant at least two layers which are deposited on top of each other without any metallic interlayer in-between.
  • One example of such a layer system is a multilayered structure comprising at least 5 individual layers. However, such a multilayered structure can comprise up to several thousands of individual layers.
  • the thickness of the non-metallic, functional layers, placed between the metallic interlayers can be from about 0.2 to about 5 ⁇ m, preferably from about 0.3 to about 2 ⁇ m, most preferably from about 0.5 to about 1.5 ⁇ m.
  • the non-metallic layers are significantly thicker than the metallic interlayers, the thickness of the non-metallic layers are preferably from about 3 to about 200 times the thickness of the metallic interlayers, more preferably from about 5 to about 150 times thicker, most preferably from about 10 to about 100 times thicker.
  • the thickness of the whole coating comprising both metallic and non-metallic layers can be from about 0.6 to about 15 ⁇ m, preferably from about 1 to about 12 ⁇ m and most preferably from about 2 to about 10 ⁇ m.
  • the non-metallic, functional layers or layer systems has a thickness of between from about 0.2 and to about 2 ⁇ m, and the thin metallic interlayer is Ti with a thickness preferably between from about 20 and to about 70 nm.
  • the metallic interlayer is an alloy of Ti and Al.
  • the metallic interlayer is an alloy of Al and Cr.
  • Substrates suitable for the present invention are preferably cutting tool inserts, or round tools such as drills, end mills etc.
  • the substrate is preferably made of any one of cemented carbide, cermets, ceramics, cubic boronitride or high speed steels, more preferably cemented carbide.
  • Inserts A were coated in accordance with prior art, by depositing a 6 ⁇ m thick homogenous Ti 0.33 Al 0.67 N layer as measured in the middle of the flank side. The coating was deposited by cathodic arc evaporation in an N 2 -atmosphere and the inserts were mounted on a 3-fold rotating substrate table and the layer was deposited from two pairs of Ti 0.33 Al 0.67 -targets.
  • Inserts B were coated according to the present invention.
  • the same deposition conditions as for inserts A were applied except that, after having deposited a layer with a thickness 0.7-0.8 ⁇ m, deposition was stopped, and the reactor chamber was filled with Ar.
  • a negative bias was applied to the inserts and the plasma was ignited, and the inserts were ion etched, i.e., bombarded with Ar-ions. After ion bombardment, the deposition was restarted.
  • the reactor filled with Ar one pair of Ti-targets were ignited and a thin, approximately 30 nm, metallic Ti layer deposited. Then the reactor was filled with N 2 -gas and a new Ti 0.33 Al 0.67 N-layer was deposited.
  • Cemented carbide inserts of geometry CNMG120408-MM were coated with a coating wherein insert C was coated in accordance with prior art, by depositing a 4 ⁇ m aperiodic multilayered (Ti,Al)N coating by using cathodic arc evaporation in an N 2 -atmosphere.
  • the insert were mounted on a 3-fold rotating substrate table arranged in order to obtain the aperiodic structure.
  • the multilayered coating was deposited from two pair of Ti 0.33 Al 0.67 -targets and one pair of Ti 0.84 Al 0.16 -targets being run simultaneously.
  • Insert D was coated in accordance with the present invention.
  • the deposition conditions were the same as for insert C but after having reached a thickness of 1.5 ⁇ m, deposition was stopped, and the reactor chamber was filled with argon.
  • the inserts were argon ion etched, and a thin metallic layer, approx. 30 nm, of Ti 0.84 Al 0.16 was deposited.
  • a new multilayer of Ti 0.33 Al 0.67 N/Ti 0.84 Al 0.16 N was deposited.
  • the procedure was repeated until a final coating thickness of 8 ⁇ m was achieved. All coating thicknesses are measured in the middle of the flank side of a CNMG insert which has been deposited mounted on a stick.
  • Tool life criterion was a flank wear exceeding 0.3 mm or insert failure. Decisive difference in wear type for increasing the tool life was less crater wear.
  • Insert A (prior art) lasted 8 minutes in this application, whereas insert B (invention), lasted 12 minutes.
  • Insert C (prior art) lasted 13 minutes, whereas insert D (invention) lasted 21 minutes.
  • Tool life criterion was flank wear more than 0.2 mm or fritting more than 0.3 mm.
  • Insert A (prior art) lasted only 13 minutes in this application, whereas insert B (invention) lasted 48 minutes. Decisive difference in wear type for increasing the tool life was less chipping in the edge line combined with less flank wear.
  • Tool life criterion was flank wear more than 0.3 mm or fritting more than 0.4 mm.
  • insert A (prior art) lasted 12 minutes in this application, whereas insert B (invention) lasted 20 minutes.
  • insert A prior art
  • insert B invention

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  • Inorganic Chemistry (AREA)
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  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
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IL195962A0 (en) 2009-09-01
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EP2072636B1 (en) 2016-08-31
CN101463461B (zh) 2012-02-29

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