US20070017758A1 - Magnetorheological damper and use thereof - Google Patents

Magnetorheological damper and use thereof Download PDF

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Publication number
US20070017758A1
US20070017758A1 US11/185,026 US18502605A US2007017758A1 US 20070017758 A1 US20070017758 A1 US 20070017758A1 US 18502605 A US18502605 A US 18502605A US 2007017758 A1 US2007017758 A1 US 2007017758A1
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US
United States
Prior art keywords
damper
sensor
piezoelectric
magnetorheological
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/185,026
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English (en)
Inventor
Siu Or
Yiqing Ni
Yuanfeng Duan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hong Kong Polytechnic University HKPU
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Hong Kong Polytechnic University HKPU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hong Kong Polytechnic University HKPU filed Critical Hong Kong Polytechnic University HKPU
Priority to US11/185,026 priority Critical patent/US20070017758A1/en
Assigned to HONG KONG POLYTECHNIC UNIVERSITY, THE reassignment HONG KONG POLYTECHNIC UNIVERSITY, THE ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: DUAN, YUANFENG, NI, YIQING, OR, SIU WING
Priority to PCT/CN2006/001422 priority patent/WO2007009341A1/en
Priority to JP2008521774A priority patent/JP4850248B2/ja
Priority to KR1020087003984A priority patent/KR101255350B1/ko
Priority to CN2006101061474A priority patent/CN1932327B/zh
Publication of US20070017758A1 publication Critical patent/US20070017758A1/en
Priority to US11/808,136 priority patent/US7775333B2/en
Abandoned legal-status Critical Current

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F9/00—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium
    • F16F9/32—Details
    • F16F9/53—Means for adjusting damping characteristics by varying fluid viscosity, e.g. electromagnetically
    • F16F9/535—Magnetorheological [MR] fluid dampers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F9/00—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium
    • F16F9/32—Details
    • F16F9/53—Means for adjusting damping characteristics by varying fluid viscosity, e.g. electromagnetically
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F9/00—Springs, vibration-dampers, shock-absorbers, or similarly-constructed movement-dampers using a fluid or the equivalent as damping medium
    • F16F9/32—Details

Definitions

  • the present application relates to structural vibration control mechanism, and particularly to magnetorheological (MR) dampers useful in such controls.
  • MR magnetorheological
  • Magnetorheological dampers have been used in vibration control of civil and mechanical structures. Application examples include vibration damping of the suspension cables in cable-stayed bridges, vibration damping of automotive seats and suspension systems, and vibration isolation of automation and/or precision equipment/machines, to name a few.
  • the MR materials used in the MR dampers have the ability to reversibly change their rheological characteristics upon applying a magnetic field. In more details, they can change themselves from a free-flowing, linear viscous fluid to a semi-solid with adjustable/controllable yield stress in milliseconds when exposed to an applied magnetic field.
  • the electromagnet of such an MR damper By inputting different electrical currents to the electromagnet of such an MR damper, it can adjust/control the magnetic field applied to the MR material so that the yield stress of the material and hence the yield force and rheological damping of the damper can readily be adjusted/controlled in milliseconds. While possessing adjustable/controllable yield force and rheological damping capabilities, the existing MR dampers are incapable of sensing structural vibrations for implementing real-time, close-loop vibration controls; they are only limited to an open-loop mode of operation instead, and their adjustable/controllable capability cannot be fully utilized.
  • an magnetorheological damper useful in structural vibration control has a damper body and a moveable portion relative to the damper body.
  • the damper includes an magnetorheological material contained within the damper body for resisting movement of the moveable portion. Rheology changes can be generated in the magnetorheological material owing to changes in a magnetic field, to which the magnetorheological material is exposed.
  • the damper further includes at least a sensor embedded in the damper for monitoring an external force exerted on the damper, and for generating a signal to control the magnetic field and hence the resulting yield force and rheological damping of the damper in response to a variance in the external force.
  • a structural vibration control system includes:
  • the senor is a piezoelectric sensor.
  • FIG. 1 is a plan view of a traditional linear magnetorheological damper
  • FIG. 2 is a plan view of an exemplary magnetorheological damper according to an embodiment of the present intention
  • FIG. 3 is an exploded isometric view of sensor components of a first sensor useful in the damper of FIG. 2 :
  • FIG. 4 is an exploded isometric view of sensor components of a second sensor useful in the damper of FIG. 2 ;
  • FIG. 5 is an exploded isometric view of sensor components of a third sensor useful in the damper of FIG. 2 ;
  • FIG. 6 is an exploded isometric view of sensor components a fourth sensor useful in the damper of FIG. 2 ;
  • FIG. 7 is an isometric view of piezoelectric wafers of the sensor of FIGS. 3-6 , made of different piezoelectric materials;
  • FIG. 8 is an isometric view of piezoelectric wafers of the sensor of FIGS. 3-6 , with different electrical patterns;
  • FIG. 9 illustrates two test results of the sensor.
  • FIG. 1 illustrates a conventional magnetorheological (MR) damper 100 known in the art.
  • the conventional MR damper 100 generally includes a pair of electrical wires 11 , a bearing and seal unit 12 , a cylinder housing MR material or fluid 13 , an electromagnet 14 , a diaphragm 15 , an accumulator 16 , a piston 17 , an upper connection support 18 , and a lower connection support 19 .
  • the bearing and seal unit 12 guides the movement of the piston 17 and prevents the leakage of the MR material 13 .
  • the MR material 13 may be reversibly changed from a free-flowing, linear viscous fluid to a semi-solid with adjustable/controllable yield stress such that the yield force and rheological damping of the damper can be changed accordingly.
  • FIG. 2 illustrates an exemplary MR damper embodiment 200 of the present invention. Similar to the conventional MR damper 100 of FIG. 1 , the MR damper 200 also includes a pair of electrical wires 11 , a bearing and seal unit 12 , a cylinder housing MR material or fluid 13 , an electromagnet 14 , a diaphragm 15 , an accumulator 16 , and a piston 17 . The MR damper 200 further includes a first piezoelectric sensor 28 and a second piezoelectric sensor 29 for measuring the external forces exerted on the damper due to structural vibrations.
  • the piezoelectric sensors 28 and 29 are, respectively, attached to the lower part 38 of the upper connection support 18 and the lower part 39 of the lower connection support 19 in this invention by substituting part of the upper connection support 18 and lower connection support 19 of the conventional damper 100 shown in FIG. 1 . These locations may essentially assure the MR damper 200 that its embedded piezoelectric sensors 28 and 29 are: 1) capable of producing strong output signals in proportional to the external forces (i.e., good mechanical coupling and linearity); 2) sensitive to the variances in the external forces; and 3) ease of installation.
  • the piezoelectric sensors 28 and 29 sense the variances in the external forces exerted on the damper due to structural vibrations and generate electrical signals in accordance with the variances in the external forces imposed onto their electroded surfaces (i.e., the pressures; to be is described in FIG. 8 ), which signals can be used to assist adjusting/controlling the current inputs to the electromagnet 14 so as to adjust/control the magnetic field applied to the damper and hence the resulting yield force and rheological damping of the damper. Since the piezoelectric sensors 28 and 29 are capable of monitoring real-time variances in the external forces (or pressures), real-time adjustment/control of the yield force and rheological damping of the damper can also be achieved.
  • the piezoelectric sensors 28 and 29 can be all the same except that their sizes may be different.
  • MR dampers with a single sensor can be developed by solely using either piezoelectric sensor 28 or piezoelectric sensor 29 of FIG. 2 .
  • the duel-sensor design shown in FIG. 2 provides a more accurate and reliable measurement of structural vibrations as compared with the single-sensor designs.
  • sensor components of a first exemplary sensor include two wafer electrodes 31 and 32 mounted on either side of a piezoelectric wafer 30 .
  • wafer electrode 31 is set as the positive
  • electrode 32 is set as the negative.
  • Insulating wafer 33 is mounted between the electrode 31 and the neighboring surface 40 of the lower part of a connection support that, referring to FIG. 2 , corresponds to the lower part 38 of the upper connection support 18 or the lower part 39 of the lower connection support 19 .
  • These sensor components are sandwiched centrally in a stack 35 under the mechanical pressure by using a threaded shaft 41 protruding from a new connection support 42 to a shaft hole 43 opened in the lower part ( 38 or 39 ) of a connection support ( 38 or 39 ).
  • the preloading pressure is large enough so that the piezoelectric wafer 30 remains in compression during operation.
  • the threaded shaft 41 should be insulated from the wafer electrodes 31 and 32 and piezoelectric wafer 30 .
  • Electrical wires (not shown) are connected in use to the wafer electrodes 31 and 32 to deliver electrical charges (and hence voltages) generated from the piezoelectric wafer 30 , through a signal conditioning unit 24 , and a data acquisition unit 25 .
  • the results can be recorded and processed using a personal computer 26 and displayed on a monitor 27 . This enables the external forces (or pressures) to be monitored in the operation of the damper.
  • real-time adjustment/control of the yield force and rheological damping can also be achieved by using said results to adjust/control the current inputs to the electromagnet 14 .
  • a stack 36 including another two piezoelectric wafers 30 and two wafer electrodes 31 and 32 are added to the sensor shown in FIG. 3 .
  • the piezoelectric wafers and the wafer electrodes are placed in alternating order.
  • the charges generated from the two nodes representing the effect of all the three piezoelectric wafers can be obtained to monitor the external forces exerted on the damper. In such a way, the sensitivity of the sensor can be enhanced.
  • five, seven, and more piezoelectric wafers can be deployed to enhance the sensor sensitivity.
  • two piezoelectric wafers 30 are deployed with three wafer electrodes (two 32 and one 31 ) in an alternating order to form the stack 37 .
  • the charges generated from the positive wafer electrode 31 and the two negative wafer electrodes 32 can be obtained for monitoring the external forces exerted on the damper.
  • the insulating wafer 33 as in the stack 35 may not be necessary in that one of the piezoelectric wafers also functions as an insulating wafer.
  • FIG. 6 by adding a stack 36 (the same as in FIG. 4 ) to the stack 37 , four piezoelectric wafers can be deployed. Similarly, by adding more stacks 36 , six, eight, and more piezoelectric wafers can be deployed in monitoring the external forces with improved sensor sensitivity.
  • the piezoelectric wafer 30 can be any suitable piezoelectric material including piezoelectric ceramics, polymers, and composites due to their effectiveness over a large frequency range, simplicity, reliability, compactness, and light weight.
  • piezoelectric ceramic sensors have sharp resonances and high sensitivity within a narrow bandwidth. Signals with frequencies within their resonances will be greatly amplified and artifacts may be created.
  • Piezoelectric polymer sensors As ceramics are hard and brittle, it is difficult to produce ceramic sensors with large element size and complex shape and damage caused by mechanical shock or vibration is more serious. Piezoelectric polymer sensors, however, have wider bandwidth, and all signals will be received with more or less equal sensitivity over a wide range of frequency. They can be fabricated into complex shapes and are more resilient to mechanical stress as they are more flexible. Their major drawbacks are lower sensitivity and less temperature stability. Piezoelectric composite sensors, on the other hand, can be tailored to combine the desired properties of ceramics and polymers and may be most suitable for this sensor.
  • FIG. 8 different electrode patterns for the wafer 30 are presented by the forms of an “active” area 51 and an “inactive” area 50 . According to the relative position of the “active” and “inactive” areas, whole-face ( FIG. 8 a ), inner ( FIG. 8 b ), in-between ( FIG. 8 c ), and outer ( FIG. 8 d ) electrode patterns are clarified.
  • Such electrode patterns can be used for the wafer 30 of any kind of material among ceramics, polymers, and composites as mentioned before.
  • FIG. 9 two test results show that the quasi-sinusoidal ( FIG. 9 a ) and square ( FIG. 9 b ) forces exerted on the damper including both the amplitude and phase can be finely monitored by measuring the charges generated from the piezoelectric sensor(s) ( 28 and/or 29 ) and displayed on the monitor 27 of FIG. 3 as voltages.
  • embodiments of the invention can be provided with other shaped wafers including irregular and rectangular cross-sectioned uniform or composite wafers.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Fluid-Damping Devices (AREA)
US11/185,026 2005-07-20 2005-07-20 Magnetorheological damper and use thereof Abandoned US20070017758A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US11/185,026 US20070017758A1 (en) 2005-07-20 2005-07-20 Magnetorheological damper and use thereof
PCT/CN2006/001422 WO2007009341A1 (en) 2005-07-20 2006-06-22 Magnetorheological damper and use thereof
JP2008521774A JP4850248B2 (ja) 2005-07-20 2006-06-22 磁気レオロジーダンパーおよびその使用
KR1020087003984A KR101255350B1 (ko) 2005-07-20 2006-06-22 자기유변성 댐퍼 및 그 용도
CN2006101061474A CN1932327B (zh) 2005-07-20 2006-07-19 磁流变阻尼器及其使用
US11/808,136 US7775333B2 (en) 2005-07-20 2007-06-06 Magnetorheological damper and use thereof

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Application Number Priority Date Filing Date Title
US11/185,026 US20070017758A1 (en) 2005-07-20 2005-07-20 Magnetorheological damper and use thereof

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US11/808,136 Continuation US7775333B2 (en) 2005-07-20 2007-06-06 Magnetorheological damper and use thereof

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US20070017758A1 true US20070017758A1 (en) 2007-01-25

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JP (1) JP4850248B2 (zh)
KR (1) KR101255350B1 (zh)
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WO (1) WO2007009341A1 (zh)

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US20080023278A1 (en) * 2006-06-16 2008-01-31 University Of Maryland System and method for magnetorheological-fluid damping utilizing porous media
US20090071772A1 (en) * 2007-09-17 2009-03-19 S & T Daewoo Co.,Ltd Sensor module comprising acceleration sensor and relative displacement sensor, damper and electronically controllable suspension system comprising the same, and method of controlling vehicle movement using the same
US20100125404A1 (en) * 2008-11-14 2010-05-20 Honeywell International Inc Adaptive mounting within an inertial navigation system
CN101915283A (zh) * 2010-08-06 2010-12-15 浙江大学 一种磁流变复合阻尼控制方法与装置
US20120076652A1 (en) * 2010-09-28 2012-03-29 Klaus Ventzke Wind turbine active damping arrangement
KR101257352B1 (ko) 2011-06-02 2013-04-23 인하대학교 산학협력단 다이아프레임을 이용한 저탄성 댐퍼
US20130134712A1 (en) * 2010-08-06 2013-05-30 Alstom Wind, S.L.U. Direct drive wind turbine and method for controlling an air gap
CN105909721A (zh) * 2016-05-20 2016-08-31 河海大学 一种串联刚度宽频磁流变智能减振装置
CN110145564A (zh) * 2019-01-22 2019-08-20 天津大学 一种用于薄壁零件切削加工的可控柔性减振装置
US10710645B2 (en) 2018-08-31 2020-07-14 Cnh Industrial America Llc Vibration dampening system for a work vehicle with chassis dampers
US10711861B1 (en) * 2019-03-19 2020-07-14 The United States Of America As Represented By The Secretary Of The Navy Controllable oleo-pneumatic damper using magnetorheological fluid
US10752298B2 (en) 2018-08-31 2020-08-25 Cnh Industrial America Llc Vibration dampening system for a work vehicle with elastomeric dampers
US10960936B2 (en) 2018-08-31 2021-03-30 Cnh Industrial America Llc Vibration dampening system for a work vehicle with cab dampers
CN114810908A (zh) * 2022-04-26 2022-07-29 清华大学 自传感式磁流变阻尼器

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US9879746B2 (en) 2013-03-15 2018-01-30 Tenneco Automotive Operating Company Inc. Rod guide system and method with multiple solenoid valve cartridges and multiple pressure regulated valve assemblies
WO2014144110A1 (en) 2013-03-15 2014-09-18 Tenneco Automotive Operating Company Inc. Rod guide assembly with multi-piece valve assembly
US9163691B2 (en) 2013-03-15 2015-10-20 Tenneco Automotive Operating Company Inc. Rod guide arrangement for electronically controlled valve applications
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CN103615492B (zh) * 2013-11-29 2016-05-18 重庆材料研究院有限公司 悬挂式磁流变阻尼器及系统
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CN106702672B (zh) * 2015-07-14 2019-08-27 青岛海尔滚筒洗衣机有限公司 一种洗衣机磁性变阻尼减振控制方法
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KR20080037032A (ko) 2008-04-29
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JP2009501882A (ja) 2009-01-22
US20080128230A1 (en) 2008-06-05

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