US11674875B2 - Fluid medium monitoring apparatus - Google Patents
Fluid medium monitoring apparatus Download PDFInfo
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- US11674875B2 US11674875B2 US17/269,162 US202017269162A US11674875B2 US 11674875 B2 US11674875 B2 US 11674875B2 US 202017269162 A US202017269162 A US 202017269162A US 11674875 B2 US11674875 B2 US 11674875B2
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- 239000012530 fluid Substances 0.000 title claims abstract description 109
- 238000012544 monitoring process Methods 0.000 title claims abstract description 49
- 238000001514 detection method Methods 0.000 claims abstract description 73
- 239000013307 optical fiber Substances 0.000 claims description 32
- 238000001228 spectrum Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims 2
- 239000003638 chemical reducing agent Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000005530 etching Methods 0.000 description 26
- 238000000034 method Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
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- 230000035945 sensitivity Effects 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
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- 238000004458 analytical method Methods 0.000 description 3
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Images
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/3103—Atomic absorption analysis
- G01N2021/3122—Atomic absorption analysis using a broad source with a monochromator
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N2021/3129—Determining multicomponents by multiwavelength light
- G01N2021/3137—Determining multicomponents by multiwavelength light with selection of wavelengths after the sample
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Definitions
- the present invention relates to a fluid medium monitoring apparatus, and more particularly, to a fluid medium monitoring apparatus capable of accurately monitoring a state of a fluid medium under usage conditions of the fluid medium.
- etching processes are performed in a semiconductor manufacturing process such as a semiconductor wafer manufacturing process, a solar cell manufacturing process, or the like.
- a high-temperature etching solution such as a phosphoric acid solution is used for etching a silicon nitride film.
- a concentration of the eluate in the etching solution increases as an etching process of the semiconductor wafer proceeds.
- the concentration of the eluate in the etching solution is increased by a certain concentration or higher, the etching solution is replaced.
- etching solution Since it is difficult to perform microanalysis on a concentration of silicon in an etching solution at a high temperature, some of the etching solution is collected and cooled to room temperature. In order to increase detection sensitivity of the cooled etching solution, a concentration of the etching solution is detected after performing chemical treatment on the etching solution multiple times.
- the eluate is easily extracted from the etching solution when the high-temperature etching solution is lowered to room temperature, it may be difficult to accurately measure the concentration of the eluate in the etching solution.
- the present invention is directed to providing a fluid medium monitoring apparatus capable of accurately monitoring a state of a fluid medium under usage conditions of the fluid medium.
- One aspect of the present invention provides a fluid medium monitoring apparatus including a light source unit configured to apply light, a first collimator unit configured to collimate light applied from the light source unit, a flow cell unit in which a fluid medium flows and light is allowed to absorb a wavelength of the fluid medium while proceeding in a moving direction of the fluid medium, and a light detection unit configured to detect a wavelength of the light passing through the flow cell unit.
- the light detection unit may include a second collimator unit configured to collect the light passing through the flow cell unit, and a light detection unit configured to detect a wavelength of light passing through the second collimator unit.
- the light source unit may include a light-emitting lamp configured to apply light, and a convex lens unit configured to collect the light applied from the light-emitting lamp.
- the first collimator unit may make angles of pieces of light, which has a predetermined angle incident from the light source unit, parallel.
- the fluid medium monitoring apparatus may further include a noise reduction unit installed on the light detection unit to cool the light detection unit.
- the fluid medium monitoring apparatus may further include a slit unit configured to diffract the light while the light applied from the second collimator unit passes therethrough, and a wavelength selection unit disposed between the slit unit and the light detection unit to split light incident from the slit unit to the light detection unit in a spectrum manner.
- the fluid medium monitoring apparatus may further include a detection wavelength adjuster configured to adjust a wavelength of light applied to the light detection unit by rotating the wavelength selection unit.
- the fluid medium monitoring apparatus may further include a wavelength selection unit disposed between the light source unit and the first collimator unit to split light incident from the light source unit in a spectrum manner.
- the fluid medium monitoring apparatus may further include a first optical fiber unit connected to the light source unit and the first collimator unit to form an optical path so that the light applied from the light source unit is applied to the first collimator unit.
- the fluid medium monitoring apparatus may further include a second optical fiber unit configured to form an optical path so that light applied through the flow cell unit is applied to the light detection unit.
- a high-temperature fluid medium is introduced into the flow cell unit and light is applied to the fluid medium, it is not necessary to chemically treat the fluid medium multiple times in order to measure the concentration of the fluid medium and increase detection sensitivity of the fluid medium under conditions in which the fluid medium is used in an actual semiconductor process.
- FIG. 1 is a configuration diagram illustrating a fluid medium monitoring apparatus according to a first embodiment of the present invention.
- FIG. 3 is a configuration diagram illustrating a fluid medium monitoring apparatus according to a third embodiment of the present invention.
- FIG. 1 is a configuration diagram illustrating the fluid medium monitoring apparatus according to the first embodiment of the present invention.
- the fluid medium monitoring apparatus includes a light source unit 10 , a first collimator unit 20 , a flow cell unit 30 , and light detection units 40 and 50 .
- the light source unit 10 applies light.
- the light source unit 10 includes a light-emitting lamp 11 which applies light and a convex lens unit 13 which collects the light applied from the light-emitting lamp 11 .
- a light-emitting lamp 11 an ultraviolet lamp which applies ultraviolet rays (UV) in a wavelength range of 150 to 450 nm may be applied.
- UV ultraviolet rays
- the first collimator unit 20 collimates the light applied from the light source unit 10 in a parallel manner. Since the first collimator unit 20 collimates the light in the parallel manner, the light is incident on the flow cell unit 30 in the parallel manner. Of course, the first collimator unit 20 may apply the light applied from the light source unit 10 to be slightly refracted or apply the light so that wavelengths of the light cross, according to optical design.
- the first collimator unit 20 applies pieces of light having a predetermined angle passing through the convex lens unit 13 to be parallel to an inside of the flow cell unit 30 .
- the flow cell unit 30 allows a fluid medium to flow and allows light to absorb a wavelength of the fluid medium while proceeding in a moving direction of the fluid medium.
- a flow chamber (not illustrated) is formed inside the flow cell unit 30 so that the fluid medium flows. Since the light proceeds in the flow cell unit 30 in the moving direction of the fluid medium, scattering and refraction of the light due to bubbles or eluates when the light passes through the fluid medium may be minimized so that light loss may be reduced. Further, wavelengths of eluates contained in the fluid medium may be smoothly absorbed while the light passes through the fluid medium, and thus light detection efficiency may be improved.
- the fluid medium may be an etching solution which is used in a semiconductor process when a semiconductor wafer, a solar cell, or the like is manufactured.
- the etching solution may include a phosphoric acid solution of 150 to 200° C.
- the flow cell unit 30 may be formed of a quartz material, a Pyrex glass, or a Teflon material that may prevent heat deformation and corrosion by a high-temperature etching solution.
- An inlet pipe 31 is connected to a lower portion of the flow cell unit 30 so that the fluid medium is introduced, and a discharge pipe 33 is formed on an upper portion of the flow cell unit 30 so that the flowing fluid medium is discharged from the flow cell unit 30 .
- the light proceeds in a longitudinal direction of the flow cell unit 30 . Since the inlet pipe 31 is connected to the lower portion of the flow cell unit 30 and the discharge pipe 33 is connected to the upper portion of the flow cell unit 30 , the fluid medium flows from a lower side to an upper side of the flow cell unit 30 .
- the light detection units 40 and 50 include a second collimator unit 40 which collects the light passing through the flow cell unit 30 , and the light detection unit 50 which detects the wavelength of the light applied from the second collimator unit 40 .
- the second collimator unit 40 collects parallel light applied from the flow cell unit 30 . Since the parallel light is collected while passing through the second collimator unit 40 , detection efficiency in the light detection unit 50 may be improved.
- the fluid medium monitoring apparatus further includes a noise reduction unit 51 which is installed on the light detection unit 50 to cool the light detection unit 50 .
- the noise reduction unit 51 may be a cooling element or cooling device which reduces noise of the light detection unit 50 by cooling the light detection unit 50 . Since the noise reduction unit 51 suppresses overheating of the light detection unit 50 , noise of detection signals may be reduced.
- the fluid medium monitoring apparatus further includes a slit unit 53 which diffracts the light while the parallel light applied from the second collimator unit 40 passes therethrough, and a wavelength selection unit 55 which is disposed between the slit unit 53 and the light detection unit 50 and splits light incident from the slit unit 53 in a spectrum manner.
- a diffraction grating which splits light into a plurality of wavelengths in the spectrum manner may be applied. The diffraction grating splits light into a plurality of wavelengths in an almost parallel manner and the spectrum manner.
- the light detection unit 50 Since the slit unit 53 and the wavelength selection unit 55 split the light into the plurality of wavelengths in the spectrum manner, the light detection unit 50 detects the plurality of wavelengths in a short period of about 5 to 10 msec. Therefore, a scan time of the light detection unit 50 is significantly reduced.
- the fluid medium monitoring apparatus further includes a first optical fiber unit 61 which is connected to the light source unit 10 and the first collimator unit 20 and forms an optical path so that the light applied from the light source unit 10 is applied to the first collimator unit 20 .
- the first collimator unit 20 and the first optical fiber unit 61 are connected by a first optical fiber coupler 62 .
- the light source unit 10 may be installed at various positions regardless of the installation position of the flow cell unit 30 , a degree of freedom of installation of the light source unit 10 and the flow cell unit 30 may be increased.
- the light source unit 10 may be installed to be spaced apart from the flow cell unit 30 .
- a high-temperature fluid medium of about 150 to 200° C. passes through the flow cell unit 30 so that the flow cell unit 30 is heated by the high-temperature fluid medium. Since the light source unit 10 is installed to be spaced apart from the flow cell unit 30 by the first optical fiber unit 61 , the light source unit 10 may be prevented from being overheated due to the heat of the flow cell unit 30 . Further, in order to cool or thermally insulate the light source unit 10 , it is not necessary to install a separate cooling device or thermal insulating member.
- the fluid medium monitoring apparatus further includes a second optical fiber unit 65 which forms an optical path so that the parallel light applied through the flow cell unit 30 is applied to the light detection unit 50 .
- the second optical fiber unit 65 is connected to the second collimator unit 40 on which the light is incident through the flow cell unit 30 and to the light detection unit 50 .
- the second optical fiber unit 65 is connected to the light detection unit 50 by a second optical fiber coupler 66 .
- the second optical fiber unit 65 may be connected to the flow cell unit 30 and the light detection unit 50 .
- the light detection unit 50 may be installed at various positions regardless of the installation position of the flow cell unit 30 , a degree of freedom of installation of the light detection unit 50 and the flow cell unit 30 may be increased.
- the light detection unit 50 may be provided to be spaced apart from the flow cell unit 30 .
- a high-temperature fluid medium of about 150 to 200° C. passes through the flow cell unit 30 so that the flow cell unit 30 is heated by the high-temperature fluid medium. Since the light detection unit 50 is installed to be spaced apart from the flow cell unit 30 by the second optical fiber unit 65 , the light detection unit 50 may be prevented from being overheated due to the heat of the flow cell unit 30 . Further, in order to cool or thermally insulate the light detection unit 50 , it is not necessary to install a separate cooling device or thermal insulating member.
- first optical fiber unit 61 and the second optical fiber unit 65 may be installed or both of the first optical fiber unit 61 and the second optical fiber unit 65 may be installed.
- first optical fiber unit 61 and the second optical fiber unit 65 are installed on both sides of the flow cell unit 30 , the flow cell unit 30 , the light source unit 10 , and the light detection unit 50 do not need to be arranged in a line, and thus a degree of freedom of installation of the fluid medium monitoring apparatus may be increased.
- the first optical fiber unit 61 and the second optical fiber unit 65 may not be installed.
- the light source unit 10 and the flow cell unit 30 may be connected by the first collimator unit 20
- the light detection unit 50 and the flow cell unit 30 may be connected by the second collimator unit 40 .
- a fluid medium monitoring apparatus according to a second embodiment of the present invention will be described.
- components are substantially the same as those of the first embodiment except for a light detection unit and a detection wavelength adjuster. Therefore, the same reference numerals are assigned to the same components as the first embodiment and descriptions thereof will be omitted.
- FIG. 2 is a configuration diagram illustrating the fluid medium monitoring apparatus according to the second embodiment of the present invention.
- the fluid medium monitoring apparatus further includes a detection wavelength adjuster 57 which adjusts a wavelength of light applied to a light detection unit 50 by rotating a wavelength selection unit 55 .
- a detection wavelength adjuster 57 As the detection wavelength adjuster 57 , a step motor capable of rotating a wavelength selection unit 55 by one pitch is provided. Pieces of light having a specific unit wavelength is applied one by one to the light detection unit 50 each time the wavelength selection unit 55 is rotated by one pitch. A pitch angle of the detection wavelength adjuster 57 may be appropriately adjusted according to a range of the unit wavelength.
- the light detection unit 50 detects and combines the plurality of unit wavelengths one by one. Therefore, it is possible to monitor a state such as a concentration of the fluid medium or the like by combining the plurality of unit wavelengths.
- a photomultiplier tube capable of sequentially detecting the unit wavelengths of the light applied from the wavelength selection unit 55 may be applied.
- the unit wavelengths are sequentially read, and thus detection sensitivity may be significantly increased. Further, since it is necessary to combine the plurality of unit wavelengths, an analysis speed may be increased.
- a fluid medium monitoring apparatus according to a third embodiment of the present invention will be described.
- components are substantially the same as those of the first embodiment except for a wavelength selection unit. Therefore, the same reference numerals are assigned to the same components as the first embodiment and descriptions thereof will be omitted.
- FIG. 3 is a configuration diagram illustrating the fluid medium monitoring apparatus according to the third embodiment of the present invention.
- the fluid medium monitoring apparatus further includes a wavelength selection unit 55 which is disposed between a light source unit 10 and a first collimator unit 20 and splits light incident from the light source unit 10 in a spectrum manner.
- the wavelength selection unit 55 is disposed between a first optical fiber coupler 62 and a convex lens unit 13 of the light source unit 10 .
- the wavelength selection unit 55 selects one unit wavelength from among a plurality of unit wavelengths of light applied from the light source unit 10 and transmits the one unit wavelength to a first optical fiber unit 61 .
- the light having the one unit wavelength reaches the first collimator unit 20 , a flow cell unit 30 , and a second collimator unit 40 through the first optical fiber unit 61 and reaches a light detection unit 50 through a second optical fiber unit 65 .
- the one unit wavelength described above is defined as a wavelength that absorbs a wavelength of one type of eluate among a plurality of eluates contained in a fluid medium.
- the light having the one unit wavelength is applied to the flow cell unit 30 and the fluid medium absorbs the wavelength of one type of eluate, a background phenomenon in which spectrum disturbance occurs between the wavelengths when a plurality of types of eluates absorb the plurality of wavelengths may be prevented. Therefore, only a specific eluate contained in the fluid medium absorbs the unit wavelength, and thus the concentration of the fluid medium and the like may be detected more accurately.
- a second convex lens 56 is disposed between the light detection unit 50 and a second optical fiber coupler 66 .
- the second convex lens 56 collects light applied from the second optical fiber coupler 66 to the light detection unit 50 .
- a detection element a PMT or avalanche photodiode (APD) with improved sensitivity may be applied.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20180113038 | 2018-09-20 | ||
KR1020190055827A KR20200034563A (ko) | 2018-09-20 | 2019-05-13 | 유동매체 모니터링장치 |
KR10-2019-0055827 | 2019-05-13 | ||
PCT/KR2020/003822 WO2020230995A1 (ko) | 2018-09-20 | 2020-03-20 | 유동매체 모니터링장치 |
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US20220057314A1 US20220057314A1 (en) | 2022-02-24 |
US11674875B2 true US11674875B2 (en) | 2023-06-13 |
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US20220349814A1 (en) | 2022-11-03 |
TWI784250B (zh) | 2022-11-21 |
KR102580490B1 (ko) | 2023-09-21 |
CN112654853A (zh) | 2021-04-13 |
CN112654852A (zh) | 2021-04-13 |
KR20210093917A (ko) | 2021-07-28 |
KR102531525B1 (ko) | 2023-05-15 |
KR20210074392A (ko) | 2021-06-21 |
TW202107062A (zh) | 2021-02-16 |
US20220057314A1 (en) | 2022-02-24 |
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TWI741537B (zh) | 2021-10-01 |
KR20200034563A (ko) | 2020-03-31 |
WO2020230995A1 (ko) | 2020-11-19 |
TW202109005A (zh) | 2021-03-01 |
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