UA100533C2 - Способ электрохимического осаждения при изготовлении металлического электрода - Google Patents

Способ электрохимического осаждения при изготовлении металлического электрода

Info

Publication number
UA100533C2
UA100533C2 UAA201006914A UAA201006914A UA100533C2 UA 100533 C2 UA100533 C2 UA 100533C2 UA A201006914 A UAA201006914 A UA A201006914A UA A201006914 A UAA201006914 A UA A201006914A UA 100533 C2 UA100533 C2 UA 100533C2
Authority
UA
Ukraine
Prior art keywords
solar cell
metal
anode
electrolyte solution
metal electrode
Prior art date
Application number
UAA201006914A
Other languages
English (en)
Ukrainian (uk)
Inventor
Джинджиа Джи
Стюарт Венхам
Липинг Чен
Джанронг Ши
Original Assignee
Вуси Сантек Пауе Ко., Лтд
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Вуси Сантек Пауе Ко., Лтд filed Critical Вуси Сантек Пауе Ко., Лтд
Publication of UA100533C2 publication Critical patent/UA100533C2/ru

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/011Electroplating using electromagnetic wave irradiation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
    • C25D7/123Semiconductors first coated with a seed layer or a conductive layer
    • C25D7/126Semiconductors first coated with a seed layer or a conductive layer for solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Electroplating Methods And Accessories (AREA)
UAA201006914A 2007-11-30 2008-01-29 Способ электрохимического осаждения при изготовлении металлического электрода UA100533C2 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2007101882678A CN101257059B (zh) 2007-11-30 2007-11-30 一种电化学沉积太阳能电池金属电极的方法
PCT/CN2008/000220 WO2009070945A1 (fr) 2007-11-30 2008-01-29 Procédé de dépôt électrochimique d'électrode métallique d'une photopile

Publications (1)

Publication Number Publication Date
UA100533C2 true UA100533C2 (ru) 2013-01-10

Family

ID=39891659

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA201006914A UA100533C2 (ru) 2007-11-30 2008-01-29 Способ электрохимического осаждения при изготовлении металлического электрода

Country Status (10)

Country Link
US (1) US20110011745A1 (ru)
EP (1) EP2216823A1 (ru)
JP (1) JP5123394B2 (ru)
KR (1) KR101125418B1 (ru)
CN (1) CN101257059B (ru)
AU (1) AU2008331357B2 (ru)
CA (1) CA2707242A1 (ru)
EA (1) EA201000760A1 (ru)
UA (1) UA100533C2 (ru)
WO (1) WO2009070945A1 (ru)

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LU91561B1 (en) * 2009-04-30 2010-11-02 Univ Luxembourg Electrical and opto-electrical characterisation oflarge-area semiconductor devices.
DE112009004975T5 (de) * 2009-06-02 2012-10-11 Mitsubishi Electric Corp. Herstellungsverfahren für ein Halbleiterbauteil, und Leiterplatteund Herstellungsverfahren für diese
US20110192316A1 (en) 2010-02-05 2011-08-11 E-Chem Enterprise Corp. Electroless plating solution for providing solar cell electrode
US20110195542A1 (en) 2010-02-05 2011-08-11 E-Chem Enterprise Corp. Method of providing solar cell electrode by electroless plating and an activator used therein
CN101807625B (zh) * 2010-02-26 2012-05-09 华南师范大学 一种晶体硅太阳能电池栅状阵列电极的制造方法
US8795502B2 (en) * 2010-05-12 2014-08-05 International Business Machines Corporation Electrodeposition under illumination without electrical contacts
US9085829B2 (en) * 2010-08-31 2015-07-21 International Business Machines Corporation Electrodeposition of thin-film cells containing non-toxic elements
DE102010042642B4 (de) * 2010-10-19 2013-12-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur galvanischen Beschichtung von Substraten und Solarzellen
JP5996244B2 (ja) * 2011-04-19 2016-09-21 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 半導体上の銅のめっき
CN103374737A (zh) * 2012-04-27 2013-10-30 库特勒自动化系统(苏州)有限公司 太阳能电池电镀装置
FR2995451B1 (fr) * 2012-09-11 2014-10-24 Commissariat Energie Atomique Procede de metallisation d'une cellule photovoltaique et cellule photovoltaique ainsi obtenue
CN102956749A (zh) * 2012-11-20 2013-03-06 泰通(泰州)工业有限公司 一种太阳能电池电极的制备工艺
CN104178787A (zh) * 2013-05-26 2014-12-03 无锡尚德太阳能电力有限公司 一种太阳电池镀膜设备以及镀膜方法
CN103311558B (zh) * 2013-05-30 2015-09-30 中国科学院宁波材料技术与工程研究所 一种固体氧化物燃料电池发电系统中的电堆阵列
CN103996752B (zh) * 2014-06-10 2016-04-13 中节能太阳能科技(镇江)有限公司 一种太阳能电池正电极栅线制备方法
KR101575068B1 (ko) * 2014-09-16 2015-12-07 주식회사 호진플라텍 광유도 도금 및 순방향 바이어스 도금을 병행하는 태양전지 기판용 도금장치
CN105590987B (zh) * 2014-10-20 2022-06-14 苏州易益新能源科技有限公司 一种水平电化学沉积金属的方法
CN106531817A (zh) * 2015-09-08 2017-03-22 英属开曼群岛商精曜有限公司 半导体元件及其制作方法
CN105762069A (zh) * 2016-02-04 2016-07-13 浙江大学 一种使用电化学沉积在半导体衬底表面选择性生长金属的方法
WO2018044930A1 (en) * 2016-08-29 2018-03-08 Board Of Trustees Of The University Of Arkansas Light-directed electrochemical patterning of copper structures
WO2018119675A1 (en) * 2016-12-27 2018-07-05 China Triumph International Engineering Co., Ltd. Method for visualizing defects in a semi-finished cdte thin film solar cell
KR102011041B1 (ko) * 2017-09-12 2019-08-14 한국과학기술연구원 화합물 박막 제조 방법, 이로부터 제조된 화합물 박막 및 이러한 화합물 박막을 포함하는 태양 전지
WO2019093558A1 (ko) * 2017-11-08 2019-05-16 한국과학기술연구원 투광형 화합물 박막 제조 방법, 이로부터 제조된 화합물 박막 및 이러한 화합물 박막을 포함하는 태양 전지
US11031517B2 (en) 2017-11-08 2021-06-08 Korea Institute Of Science And Technology Method of manufacturing light transmission type compound thin film, compound thin film manufactured therefrom, and solar cell including the same
CN111826692A (zh) * 2020-07-08 2020-10-27 苏州太阳井新能源有限公司 一种光伏电池光诱导或光辅助电镀的方法
CN113502513B (zh) * 2021-08-12 2023-05-30 辽宁大学 一种利用太阳能直接沉积铜金属的方法

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CN100576578C (zh) * 2006-04-20 2009-12-30 无锡尚德太阳能电力有限公司 制备太阳电池电极的方法及其电化学沉积装置
US20070256937A1 (en) * 2006-05-04 2007-11-08 International Business Machines Corporation Apparatus and method for electrochemical processing of thin films on resistive substrates

Also Published As

Publication number Publication date
KR20100089898A (ko) 2010-08-12
KR101125418B1 (ko) 2012-03-27
AU2008331357B2 (en) 2012-05-31
CN101257059A (zh) 2008-09-03
AU2008331357A1 (en) 2009-06-11
EP2216823A1 (en) 2010-08-11
CN101257059B (zh) 2011-04-13
EA201000760A1 (ru) 2010-12-30
CA2707242A1 (en) 2009-06-11
WO2009070945A1 (fr) 2009-06-11
US20110011745A1 (en) 2011-01-20
JP2011505068A (ja) 2011-02-17
JP5123394B2 (ja) 2013-01-23

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