TWM627664U - Shielding device and thin film deposition machine with shielding device - Google Patents

Abstract

The present invention provides a thin film deposition machine with a shielding device, which includes a reaction chamber, a carrier plate, a shielding device and at least two light sensors, wherein the bearing plate and part of the shielding device are located in the accommodation of the reaction chamber. within the space. The shielding device includes two shielding units and at least one driving device, wherein the driving device connects and drives the two shielding units to swing in opposite directions, so that the two shielding units operate in the open state and the shielding state. The upper surfaces of the two shielding units are provided with a shielding convex portion and a sensing area, wherein the sensing area is adjacent to the shielding convex portion, which is used to prevent pollutants from depositing in the sensing area, so as to improve the sensing shielding of the light sensor Accuracy of unit location.

Description

Shielding device and thin film deposition machine with shielding device

The present invention relates to a thin film deposition machine with a shielding device. The shielding unit is mainly provided with a shielding convex portion and a sensing area, wherein the sensing area is adjacent to the shielding convex portion to prevent pollutants from being deposited on the sensing area. area to improve the accuracy of the light sensor for sensing the position of the blocking unit.

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin-film deposition equipment, and are commonly used in processes such as integrated circuits, light-emitting diodes, and displays.

The deposition equipment mainly includes a cavity and a wafer carrier, wherein the wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target needs to be set in the cavity, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the chamber to apply bias voltages to the target material and the wafer carrier, respectively, and to heat the supported wafer through the wafer carrier.

The inert gas in the cavity forms an ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias voltage on the target and bombard the target. Target atoms or molecules sputtered from the target are attracted by a bias on the wafer carrier and deposit on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposition film will form on the inner surface of the cavity, so the cavity needs to be cleaned periodically to prevent the deposition film from falling off during the process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so periodic cleaning of the target is also required. Generally speaking, usually through a burn-in process, plasma ions strike the target in the cavity to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to take out the wafer carrier and the wafer in the cavity, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process.

Generally speaking, after a period of use, the thin film deposition machine usually needs to be cleaned to remove the thin film deposited in the chamber and the oxide or nitride on the target. Particles generated during the cleaning process can contaminate the carrier plate, so it is necessary to isolate the carrier plate from the contaminants. The present invention provides a thin film deposition machine with a shielding device, which mainly drives two shielding plates to swing in opposite directions through a driving device, so that the two shielding plates operate in an open state and a shielding state.

The upper surfaces of the two shielding plates are respectively provided with a shielding convex portion and a sensing area, wherein the sensing area is adjacent to the shielding convex portion and located outside or inside the shielding convex portion. When cleaning the reaction chamber, the driving device will drive the two shielding units to approach each other in a swinging manner, so that the two shielding units are close to each other and shield the carrier plate in the accommodating space, so as to avoid the plasma used in the cleaning process or the generation of The contamination contacts the carrier plate and/or the substrate it carries. During the deposition process, the driving device drives the two shielding units away from each other in a swinging manner, and performs thin film deposition on the substrate in the reaction chamber.

The novel thin film deposition chamber includes at least two light sensors for projecting a sensing beam on the sensing area of the shielding plate to confirm that the two shielding plates are indeed operating in an open state. However, in the process of cleaning the cavity, a thin film is often deposited on the surface of the sensing area of the shielding plate, thereby affecting the accuracy of the light sensor for sensing the position of the shielding plate. To this end, the present invention further proposes to shield the sensing area through the shielding convex portion, so as to reduce the formation of thin films in the sensing area during the cleaning process, which is beneficial for the light sensor to sense the operation state of the shielding plate.

An object of the present invention is to provide a thin film deposition machine with a shielding device, which mainly includes a reaction chamber, a carrier plate and a shielding device. The shielding device includes at least one driving device, two shielding units and two distance sensing units, wherein the driving device connects and drives the two shielding units to swing in opposite directions respectively, so that the two shielding units operate in an open state or a shielding state .

A reflective surface is set on the two shielding units. When the two shielding units are operating in the shielding state, the sensing beams generated by the two distance sensing units will be projected on the reflecting surfaces of the two shielding units respectively, and the two distance sensing units will be measured. The distance between the two distance sensing units and the two shielding units is used to determine whether the two shielding units are operating in a shielding state.

In order to achieve the above-mentioned purpose, the present invention proposes a thin film deposition machine with a shielding device, which includes: a reaction chamber, including an accommodating space; a bearing tray, located in the accommodating space, and including a bearing surface for carrying At least one substrate; a shielding device including: a first shielding unit located in the accommodating space and including a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area The first shielding unit is located on the surface of the first shielding unit not facing the carrier plate, and the first shielding convex portion is adjacent to the first sensing area; a second shielding unit is located in the accommodating space and includes a second shielding convex portion and a first shielding convex portion. Two sensing areas, wherein the second blocking protrusion and the second sensing area are located in the second The shielding unit does not face the surface of the carrier plate, and the second shielding protrusion is adjacent to the second sensing area; at least one driving device is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit respectively. The shielding unit swings in the opposite direction, so that the first shielding unit and the second shielding unit are switched between an open state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and used to shield the bearing plate, and a space is formed between the first shielding unit and the second shielding unit in the open state; and at least two light sensors are arranged in the reaction chamber and are respectively used for sensing the first shielding unit of the first shielding unit. A sensing area and a second sensing area of the second shielding unit to determine whether the first shielding unit and the second shielding unit are indeed operating in an open state.

The present invention provides a shielding device, comprising: a first shielding plate, including a first shielding convex part and a first sensing area, wherein the first shielding convex part and the first sensing area are arranged on a part of the first shielding plate a first upper surface, and the first shielding convex portion is adjacent to the first sensing area; a first connecting arm is used to carry the first shielding plate; a second shielding plate includes a second shielding convex portion and a first shielding plate Two sensing areas, wherein the second blocking protrusion and the second sensing area are disposed on a second upper surface of the second blocking plate, and the second blocking protrusion is adjacent to the second sensing area; a second connecting arm , used to carry the second shielding plate; and at least one driving device, which drives the first shielding plate and the second shielding plate to swing in opposite directions through the first connecting arm and the second connecting arm respectively, so that the first shielding plate and the second shielding plate are respectively driven to swing in opposite directions. The shielding plate is switched between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, and a space is formed between the first shielding plate and the second shielding plate in the open state .

The film deposition machine with a shielding device, wherein the first shielding unit includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate, the first shielding protrusion and the first shielding plate through the first connecting arm. A sensing area is located on the first shielding plate, wherein the second shielding unit includes a The second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, and the second shielding convex portion and the second sensing area are located on the second shielding plate.

The thin film deposition machine with a shielding device includes a target material facing the bearing surface of the bearing plate, wherein the first shielding protrusion and the first sensing area are located on a first shielding plate facing the target material. the upper surface, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target.

The thin film deposition machine or the shielding device with the shielding device, wherein the first shielding convex portion and the second shielding convex portion in the shielding state form a ring-shaped shielding convex portion, and the first sensing area and the second sensing area are Then, a ring-shaped sensing area is formed, and the ring-shaped sensing area is located outside the ring-shaped shielding convex portion.

In the thin film deposition machine or the shielding device with a shielding device, the first shielding convex part and the second shielding convex part are closed-shaped tubular protrusions.

The film deposition machine with the shielding device includes: a first reflective surface arranged on the first connecting arm; a second reflective surface arranged on the second connecting arm; a first distance sensing unit, is arranged on the reaction cavity, and is used to project a first sensing beam to the first reflection surface of the first connecting arm operating in a blocking state; and a second distance sensing unit is arranged on the reaction cavity and used so as to project a second sensing beam to the second reflecting surface of the second connecting arm operating in a blocking state.

In the thin film deposition machine with a shielding device, the reaction chamber includes two sensing chambers, and the two light sensors are respectively arranged in the two sensing chambers, and are respectively used for sensing incoming sensing The first sensing area of the first shielding plate and the second sensing area of the second shielding plate of the chamber.

10: Thin film deposition machine with shielding device

100: Blocking device

11: Reaction chamber

111: Stopper

112: Opening

113: Sensing Chamber

115: Translucent window

12: Accommodating space

13: Ring-shaped shielding convex part

130: Ring-shaped sensing area

131: The first blocking protrusion

132: The first sensing area

133: Second shielding protrusion

134: Second sensing area

14: The first blocking unit

141: The first connecting arm

143: The first shield

1431: First upper surface

145: The first reflecting surface

15: The second blocking unit

151: Second connecting arm

153: Second shield

1531: Second upper surface

155: Second reflective surface

161: Target

163: Substrate

165: Carrier plate

1651: Bearing surface

17: Drive unit

171: Drive Motor

173: Shaft seal device

18: Interval space

191: The first distance sensing unit

193: Second distance sensing unit

195: Light Sensor

L1: The first sensing beam

L2: Second sensing beam

1 is a schematic cross-sectional view of an embodiment of the novel thin film deposition machine with a shielding device operating in a shielding state.

2 is a perspective view of an embodiment of the novel shielding device operating in an open state.

FIG. 3 is a three-dimensional schematic diagram of an embodiment of the novel shielding device operating in a shielding state.

FIG. 4 is a perspective view of an embodiment of a partial structure of a novel thin film deposition machine with a shielding device.

5 is a top perspective view of an embodiment of the novel thin film deposition machine with a shielding device operating in an open state.

6 is a top plan view of an embodiment of the novel thin film deposition machine with a shielding device operating in a shielded state.

7 is a schematic cross-sectional view of yet another embodiment of the novel thin film deposition machine with a shielding device operating in a shielded state.

FIG. 8 is a perspective view of another embodiment of the novel shielding device operating in an open state.

[ Fig. 9 ] is a top perspective view of yet another embodiment of the novel thin film deposition machine with a shielding device operating in an open state.

Please refer to FIG. 1 , which is a schematic side cross-sectional view of an embodiment of the novel thin film deposition machine with a shielding device operating in a shielding state. As shown in the figure, the thin film deposition machine 10 with a shielding device mainly includes a reaction chamber 11 , a carrier plate 165 and a shielding device 100 , wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the supporting plate 165 and part of the shielding device 100 .

As shown in FIG. 1 , the carrying tray 165 is located in the accommodating space 12 of the reaction chamber 11 , and includes a carrying surface 1651 for carrying at least one substrate 163 . When the thin film deposition machine 10 with the shielding device is a physical vapor deposition chamber, a target 161 is disposed in the reaction chamber 11 , wherein the target 161 faces the substrate 163 and the bearing surface 1651 of the bearing tray 165 . For example, the target 161 may be disposed on the upper surface of the accommodating space 12 of the reaction chamber 11 .

Please refer to FIG. 2 and FIG. 3 , the shielding device 100 includes a first shielding unit 14 , a second shielding unit 15 and a driving device 17 , wherein the first shielding unit 14 and the second shielding unit 15 are located in the accommodating space within 12. The driving device 17 is connected to the first shielding unit 14 and the second shielding unit 15 , and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions respectively.

As shown in FIGS. 2 and 3 , in an embodiment of the present invention, the first shielding unit 14 includes a first connecting arm 141 and a first shielding plate 143 , wherein the first connecting arm 141 is used to support the first shielding plate 143. The second shielding unit 15 includes a second connecting arm 151 and a second shielding plate 153 , wherein the second connecting arm 151 is used for supporting the second shielding plate 153 . The driving device 17 is connected through the first connecting arm 141 and a second connecting arm 151 respectively and drives the first shielding plate 143 and the second shielding plate 153 to swing or rotate in opposite directions.

The first shielding plate 143 and the second shielding plate 153 can be plate bodies, and a first shielding protrusion 131 and a first sensing area 132 are disposed on the first upper surface 1431 of the first shielding plate 143 not facing the carrier plate 165 . , wherein the first shielding convex portion 131 is adjacent to the first sensing region 132 , for example, the first upper surface 1431 is the surface of the first shielding plate 143 facing the target 161 .

As shown in FIG. 1 , FIG. 2 and FIG. 3 , in an embodiment of the present invention, the first sensing area 132 is located on the outer side or radially outer side of the first shielding protrusion 131 , for example, the first shielding plate 143 is a semicircle The first shielding protrusion 131 is a C-shaped or semi-circular protrusion. on the second shield The second shielding protrusion 133 and the second sensing area 134 are not disposed on the second upper surface 1531 of the carrier plate 165 , for example, the second upper surface 1531 faces the target 161 , wherein the structure of the second shielding plate 153 is the same as that of the first shielding Plate 143 is similar.

The novel thin film deposition machine 10 with a shielding device and/or the shielding device 100 of the present invention can be operated in an open state and a shielding state. As shown in FIG. 2 and FIG. 5 , the driving device 17 drives the first shielding unit 14 and the second shielding unit 15 away from each other, and operates in an open state. A space 18 is formed between the first shielding unit 14 and the second shielding unit 15 , so that the first shielding unit 14 and the second shielding unit 15 do not exist between the target 161 , the carrier plate 165 and the substrate 163 . Then, the carrier plate 165 and the substrate 163 can be driven to approach the target 161 , and the gas in the accommodating space 12 strikes the target 161 to deposit a thin film on the surface of the substrate 163 .

Please refer to FIG. 1 , FIG. 5 and FIG. 6 , the reaction chamber 11 includes two sensing chambers 113 , wherein the two sensing chambers 113 protrude from the reaction chamber 11 . The height of the two sensing chambers 113 is smaller than that of the reaction chamber 11, and a photo sensor 195 can be disposed on the two sensing chambers 113, for example, the photo sensor 195 can be a distance photo sensor, a reflection A type light sensor or a contrast type light sensor, and includes at least one light emitting unit and at least one light receiving unit.

As shown in FIG. 1 , FIG. 2 and FIG. 5 , when the first and second shielding units 14 / 15 are operated in the open state, part of the first and second shielding plates 143 / 153 will enter the two sensing chambers 113 respectively. , and the two light sensors 195 are respectively used to sense the first and second sensing regions 132/134, and determine whether the first and second shielding units 14/15 are indeed operating in an open state. For example, the light emitting units of the two light sensors 195 project the sensing beams on the first and second sensing regions 132/134, respectively, and receive the first and second sensing beams through the light receiving units of the light sensors 195. Regions 132/134 reflect and/or scatter the sense beam.

As shown in FIG. 1 , FIG. 3 and FIG. 6 , in the process of cleaning the reaction chamber 11 and/or the target material 161 , contaminants or particles may be deposited on the first shielding plate 143 and the second shielding plate 153 , causing light The sensor 195 cannot accurately sense the first shielding plate 143 and the second shielding plate 153 . To this end, the present invention further proposes to provide first and second shielding protrusions 131/133 on the surfaces of the first and second shielding plates 143/153 facing the target 161, and through the first and second shielding protrusions 131/133 First and second sensing regions 132/134 are defined on the first and second shielding plates 143/153. The first and second shielding protrusions 131/133 are adjacent to the first and second sensing regions 132/134, respectively, and the first and second sensing regions 132/134 are located at the first and second shielding protrusions 131, respectively /133 outside. The first and second shielding protrusions 131/133 are used for shielding the first and second sensing regions 132/134, and preventing film deposition on the first and second sensing regions 132/134.

As shown in FIG. 1 , FIG. 3 , FIG. 4 , FIG. 6 and FIG. 7 , the driving device 17 can drive the first shielding unit 14 and the second shielding unit 15 to approach each other and operate in a shielding state, wherein the first shielding plate 143 and the second shielding unit 15 are in a shielding state. The second shielding plates 153 are close to each other and form a circular plate-shaped shielding member to shield the carrier plate 165 and/or the substrate 163 .

As shown in FIG. 2 , FIG. 3 , FIG. 5 and FIG. 6 , the first shielding convex portion 131 and the second shielding convex portion 133 may be C-shaped or semi-circular protrusions. When the first and second shielding plates 143 / When the 153 operates in the blocking state, the first and second blocking protrusions 131 / 133 form an annular blocking protrusion 13 , wherein an annular sensing area 130 is formed on the outer side of the annular blocking protrusion 13 . By forming the annular shielding protrusions 13 on the surfaces of the first shielding plate 143 and the second shielding plate 153 facing the target 161 , not only is it beneficial to shield the first and second sensing regions 132 / 134 , but also the first shielding can be further improved. The shielding effect of the plate 143 and the second shielding plate 153 .

The first shielding unit 14 and the second shielding unit 15 according to the new embodiment operate in the shielding state, which can be defined as the first shielding plate 143 and the second shielding plate 153 approaching each other until the distance between them is smaller than a threshold The value is, for example, less than 1 mm, so as to prevent the first shielding plate 143 and the second shielding plate 153 from generating particles during the contact process.

The first shielding unit 14 and the second shielding unit 15 operating in the shielding state are located between the target material 161 and the carrier plate 165, and separate a cleaning space in the accommodating space 12, wherein the cleaning space and the reaction space are part of the area overlapping or close. Then, a burn-in process can be performed in the clean space to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space, and to remove oxides, nitrides or other oxides on the surface of the target 161 . Other contaminants, and deposited films on the surfaces of the reaction chamber 11 and/or the blocking member 111 .

As shown in FIG. 7 and FIG. 8 , the first and second shielding protrusions 131/133 may also be polygonal or cylindrical pipes, for example, the cross-sections of the first and second shielding protrusions 131/133 are closed shapes A first and a second sensing area 132/134 are formed inside the first and second shielding protrusions 131/133.

As shown in FIG. 9 , the cross-sections of the first and second shielding protrusions 131 / 133 are non-closed-shaped protrusions, such as C-shaped or U-shaped protrusions, wherein the first and second shielding protrusions 131 /133 can connect the edges of the first and second shielding plates 143/153.

In an embodiment of the present invention, as shown in FIG. 1 , a blocking member 111 may be disposed in the accommodating space 12 of the reaction chamber 11 , wherein one end of the blocking member 111 is connected to the reaction chamber 11 , and the other end of the blocking member 111 is connected to the reaction chamber 11 . An opening 112 is formed. When the carrier plate 165 approaches the target 161 , the reaction chamber 11 , the carrier plate 165 and the blocking member 111 will define a reaction space in the accommodating space 12 , and deposit a film on the surface of the substrate 163 in the reaction space.

When the first shielding plate 143 and the second shielding plate 153 operate in the shielding state, the annular shielding convex portion 13 will be located below or outside the blocking member 111 , so that the inner area of the annular shielding convex portion 13 is greater than or equal to the area of the opening 112 , to improve the occlusion effect.

In an embodiment of the present invention, as shown in FIG. 2 and FIG. 3 , the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173 , wherein the driving motor 171 is connected through the shaft sealing device 173 and drives the first shielding unit 14 and the The second shielding unit 15 swings in the opposite direction, and the shaft seal device 173 may be a common shaft seal or a magnetic fluid shaft seal.

As shown in FIG. 1 , FIG. 4 and FIG. 6 , in the present invention, a first reflecting surface 145 and a second reflecting surface 155 are further disposed on the first connecting arm 141 and the second connecting arm 151 , respectively, and the reaction chamber 11 A first distance sensing unit 191 and a second distance sensing unit 193 are disposed thereon, wherein the first distance sensing unit 191 and the second distance sensing unit 193 may be optical distance meters.

As shown in FIG. 4 , the first distance sensing unit 191 and the first shielding unit 14 are arranged on the same side of the reaction chamber 11 , and the second distance sensing unit 193 and the second shielding unit 15 are arranged at the reaction chamber 11 . on the same side. The first and second distance sensing units 191/193 respectively project a first and a second sensing light beam L1/L2 to the first and second reflecting surfaces 145/155 of the first and second shielding units 14/15 , wherein the first and second sensing light beams L1/L2 are perpendicular to the first and second reflecting surfaces 145/155, respectively.

As shown in FIG. 4 , the first distance sensing unit 191 can measure the distance between the first shielding unit 14 and the first distance sensing unit 191 from the reflected first sensing light beam L1 , and the second distance sensing unit 193 The distance between the second shielding unit 15 and the second distance sensing unit 193 can be measured by the reflected second sensing light beam L2, and the measured distance can be used to determine whether the first and second shielding units 14/15 are correct The operation is in the occluded state.

In an embodiment of the present invention, as shown in FIG. 5 and FIG. 6 , a light-transmitting window 115 may be respectively disposed on the reaction chamber 11 , wherein the first distance sensing unit 191 and the second distance sensing unit 193 face respectively Two light-transmitting windows 115 .

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included in the scope of the patent application of the present invention.

100: Blocking device

131: The first blocking protrusion

132: The first sensing area

133: Second shielding protrusion

134: Second sensing area

14: The first blocking unit

141: The first connecting arm

143: The first shield

1431: First upper surface

15: The second blocking unit

151: Second connecting arm

153: Second shield

1531: Second upper surface

17: Drive unit

171: Drive Motor

173: Shaft seal device

18: Interval space

Claims (10)

A thin film deposition machine with a shielding device, comprising: a reaction cavity, including an accommodating space; a blocking piece, located in the accommodating space, one end of the blocking piece is connected to the reaction cavity, and the blocking piece is located in the accommodating space. An opening is formed at the other end; a carrying plate is located in the accommodating space and includes a carrying surface for carrying at least one substrate; a first shielding unit is located in the accommodating space and includes a first shielding protrusion part and a first sensing area, wherein the first shielding convex part and the first sensing area are located on the surface of the first shielding unit not facing the carrier plate, and the first shielding convex part and the first sensing area The areas are adjacent; a second shielding unit is located in the accommodating space and includes a second shielding protrusion and a second sensing area, wherein the second shielding protrusion and the second sensing area are located in the first shielding convex portion and the second sensing area. Two shielding units do not face the surface of the carrier plate, and the second shielding protrusion is adjacent to the second sensing area; at least one driving device is connected to the first shielding unit and the second shielding unit, and drives the The first shielding unit and the second shielding unit swing in opposite directions, so that the first shielding unit and the second shielding unit are switched between an open state and a shielding state, wherein the first shielding unit in the shielding state and the second shielding unit are close to each other and are used to shield the carrier plate, and a space is formed between the first shielding unit and the second shielding unit in the open state; and at least two light sensors are provided. In the reaction chamber, the first sensing area of the first shielding unit and the second sensing area of the second shielding unit are respectively used to sense the first shielding unit and the second shielding unit Whether the operation is indeed in the open state. The thin film deposition machine with a shielding device as claimed in claim 1, wherein the first shielding unit comprises a first connecting arm and a first shielding plate, and the driving device is connected to the first shielding plate through the first connecting arm , the first shielding protrusion and the first sensing area are located on the first shielding plate, wherein the The second shielding unit includes a second connecting arm and a second shielding plate. The driving device is connected to the second shielding plate through the second connecting arm. The second shielding protrusion and the second sensing area are located in the second shielding plate. cover plate. The thin film deposition machine with a shielding device as claimed in claim 2, comprising a target material facing the bearing surface of the bearing plate, wherein the first shielding protrusion and the first sensing area are located toward the target material a first upper surface of the first shielding plate, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target. The thin film deposition machine with a shielding device as claimed in claim 3, wherein the first shielding convex portion and the second shielding convex portion in the shielding state form a ring-shaped shielding convex portion, and the first sensing area and The second sensing area forms an annular sensing area, and the annular sensing area is located outside the annular shielding protrusion. The thin film deposition machine with a shielding device according to claim 3, wherein the first shielding protrusion and the second shielding protrusion are closed-shaped tubular protrusions. The thin film deposition machine with a shielding device according to claim 2, comprising: a first reflective surface arranged on the first connecting arm; a second reflective surface arranged on the second connecting arm; a first reflective surface a distance sensing unit disposed on the reaction cavity and used for projecting a first sensing beam to the first reflection surface of the first connecting arm operating in the shielding state; and a second distance sensing The unit is arranged on the reaction cavity and is used for projecting a second sensing beam to the second reflection surface of the second connecting arm operating in the shielding state. The thin film deposition machine with a shielding device as claimed in claim 2, wherein the reaction chamber includes two sensing chambers, and the two light sensors are respectively disposed in the two sensing chambers, and are respectively for sensing the first sensing area of the first shielding plate and the second sensing area of the second shielding plate entering each of the sensing chambers. A shielding device, comprising: a first shielding plate, including a first shielding convex part and a first sensing area, wherein the first shielding convex part and the first sensing area are arranged on a part of the first shielding plate a first upper surface, and the first shielding convex portion is adjacent to the first sensing area; a first connecting arm is used to carry the first shielding plate; a second shielding plate includes a second shielding convex portion and a second sensing area, wherein the second blocking protrusion and the second sensing area are disposed on a second upper surface of the second blocking plate, and the second blocking protrusion and the second sensing area adjacent; a second connecting arm for carrying the second shielding plate; and at least one driving device including a driving motor and a shaft sealing device, the driving motor is connected to the first connecting arm and the first connecting arm through the shaft sealing device two connecting arms, and respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein the The first shielding plate and the second shielding plate in the shielding state are close to each other, and a space is formed between the first shielding plate and the second shielding plate in the open state. The shielding device of claim 8, wherein the first shielding convex portion and the second shielding convex portion in the shielding state form an annular shielding convex portion, and the first sensing area and the second sensing area Then, a ring-shaped sensing area is formed, and the ring-shaped sensing area is located outside the ring-shaped shielding protrusion. The shielding device according to claim 8, wherein the first shielding convex portion and the second shielding convex portion are closed-shaped tubular protrusions.

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