CN217324277U - Shielding device and thin film deposition equipment with shielding device - Google Patents
Shielding device and thin film deposition equipment with shielding device Download PDFInfo
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- CN217324277U CN217324277U CN202123118597.4U CN202123118597U CN217324277U CN 217324277 U CN217324277 U CN 217324277U CN 202123118597 U CN202123118597 U CN 202123118597U CN 217324277 U CN217324277 U CN 217324277U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The utility model provides a film deposition equipment with shelter from device, including a reaction cavity, one bear the dish, one shelter from device and two at least optical sensor, wherein bear the dish and partial shelter from the accommodation space that the device lies in the reaction cavity. The shielding device comprises two shielding units and at least one driving device, wherein the driving device is connected with and drives the two shielding units to swing towards opposite directions, so that the two shielding units are operated in an opening state and a shielding state. The upper surfaces of the two shielding units are provided with a shielding convex part and a sensing area, wherein the sensing area is adjacent to the shielding convex part and used for preventing pollutants from depositing in the sensing area so as to improve the accuracy of the optical sensor for sensing the position of the shielding units.
Description
Technical Field
The utility model relates to a film deposition equipment with shelter from device mainly sets up one on sheltering from the unit and shelters from convex part and a sensing area, and wherein the sensing area is adjacent with sheltering from the convex part for the separation pollutant deposits in the sensing area, shelters from the accuracy of unit position with the improvement light sensor sensing.
Background
Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposition film, and thus the chamber needs to be periodically cleaned to prevent the deposition film from falling off during the process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber through a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.
SUMMERY OF THE UTILITY MODEL
Generally, after a certain period of time, the thin film deposition apparatus usually needs to be cleaned to remove the oxide or nitride on the thin film and the target deposited in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The utility model provides a film deposition equipment with shelter from device mainly sees through two shielding plates of drive arrangement drive towards opposite direction swings for two shielding plate operations are at an open mode and one and shelter from the state.
The upper surfaces of the two shielding plates are respectively provided with a shielding convex part and a sensing area, wherein the sensing area is adjacent to the shielding convex part and is positioned at the outer side or the inner side of the shielding convex part. When the reaction cavity is cleaned, the driving device drives the two shielding units to approach each other in a swinging manner, so that the two shielding units approach each other and shield the bearing plate in the accommodating space, thereby preventing plasma used in the cleaning process or generated pollution from contacting the bearing plate and/or a substrate borne by the bearing plate. When the deposition process is carried out, the driving device drives the two shielding units to be away from each other in a swinging mode, and thin film deposition is carried out on the substrate in the reaction cavity.
The film deposition chamber of the present invention includes at least two optical sensors for projecting a sensing beam onto the sensing area of the shielding plate to confirm that the two shielding plates are actually operated in the open state. However, in the process of cleaning the chamber, a thin film is often deposited on the surface of the sensing area of the shielding plate, thereby affecting the accuracy of the position of the shielding plate sensed by the optical sensor. Therefore, the utility model discloses further provide and to see through and shelter from the convex part and shelter from the sensing area to reduce the sensing area and form the film in clean process, and be favorable to the operating condition of light sensor sensing shielding plate.
An object of the utility model is to provide a film deposition equipment with shelter from device mainly includes a reaction cavity, one bears the dish and one shelters from the device. The shielding device comprises at least one driving device, two shielding units and two distance sensing units, wherein the driving device is connected with and drives the two shielding units to swing towards opposite directions respectively, so that the two shielding units are operated in an opening state or a shielding state.
The two shielding units are provided with a reflecting surface, when the two shielding units are operated in a shielding state, the sensing light beams generated by the two distance sensing units are projected on the reflecting surfaces of the two shielding units respectively, and the distance between the two distance sensing units and the two shielding units is measured to judge whether the two shielding units are operated in the shielding state.
In order to achieve the above object, the present invention provides a thin film deposition apparatus having a shielding device, comprising: a reaction cavity comprising a containing space; a bearing disc which is positioned in the containing space and comprises a bearing surface used for bearing at least one substrate; a shielding apparatus, comprising: the first shielding unit is positioned in the accommodating space and comprises a first shielding convex part and a first sensing area, wherein the first shielding convex part and the first sensing area are positioned on the surface, which does not face the bearing disc, of the first shielding unit, and the first shielding convex part is adjacent to the first sensing area; the second shielding unit is positioned in the accommodating space and comprises a second shielding convex part and a second sensing area, wherein the second shielding convex part and the second sensing area are positioned on the surface, which does not face the bearing disc, of the second shielding unit, and the second shielding convex part is adjacent to the second sensing area; the driving device is connected with the first shielding unit and the second shielding unit and respectively drives the first shielding unit and the second shielding unit to swing towards opposite directions so that the first shielding unit and the second shielding unit are switched between an opening state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and are used for shielding the bearing disc, and an interval space is formed between the first shielding unit and the second shielding unit in the opening state; and the at least two optical sensors are arranged in the reaction cavity and are respectively used for sensing the first sensing area of the first shielding unit and the second sensing area of the second shielding unit so as to judge whether the first shielding unit and the second shielding unit are really operated in an opening state or not.
The utility model provides a shelter from device, include: a first shielding plate, including a first shielding protrusion and a first sensing region, wherein the first shielding protrusion and the first sensing region are disposed on a first upper surface of the first shielding plate, and the first shielding protrusion is adjacent to the first sensing region; a first connecting arm for carrying the first shielding plate; a second shielding plate including a second shielding protrusion and a second sensing region, wherein the second shielding protrusion and the second sensing region are disposed on a second upper surface of the second shielding unit, and the second shielding protrusion is adjacent to the second sensing region; the second connecting arm is used for bearing the second shielding plate; and the driving device drives the first shielding plate and the second shielding plate to swing towards opposite directions through the first connecting arm and the second connecting arm respectively, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, the first shielding plate and the second shielding plate in the shielding state are close to each other, and a spacing space is formed between the first shielding plate and the second shielding plate in the opening state.
The thin film deposition equipment with the shielding device is characterized in that the first shielding unit comprises a first connecting arm and a first shielding plate, the driving device is connected with the first shielding plate through the first connecting arm, the first shielding convex part and the first sensing area are positioned on the first shielding plate, the second shielding unit comprises a second connecting arm and a second shielding plate, the driving device is connected with the second shielding plate through the second connecting arm, and the second shielding convex part and the second sensing area are positioned on the second shielding plate.
The thin film deposition equipment with the shielding device comprises a target material and a bearing surface facing the bearing plate, wherein the first shielding convex part and the first sensing area are positioned on a first upper surface of the first shielding plate facing the target material, and the second shielding convex part and the second sensing area are positioned on a second upper surface of the second shielding plate facing the target material.
In the thin film deposition apparatus or the shielding device having the shielding device, the first shielding protrusion and the second shielding protrusion in the shielding state form an annular shielding protrusion, the first sensing region and the second sensing region form an annular sensing region, and the annular sensing region is located outside the annular shielding protrusion.
The thin film deposition equipment or the shielding device with the shielding device is characterized in that the first shielding convex part and the second shielding convex part are tubular bulges in a closed shape.
The thin film deposition equipment with the shielding device comprises: the first reflecting surface is arranged on the first connecting arm; the second reflecting surface is arranged on the second connecting arm; the first distance sensing unit is arranged on the reaction cavity and used for projecting a first sensing light beam to a first reflecting surface of the first connecting arm operated in a shielding state; and the second distance sensing unit is arranged on the reaction cavity and used for projecting a second sensing light beam to a second reflecting surface of the second connecting arm operated in a shielding state.
The thin film deposition apparatus with the shielding device, wherein the reaction cavity includes two sensing chambers, and the two photosensors are respectively disposed in the two sensing chambers and respectively used for sensing a first sensing region of the first shielding plate and a second sensing region of the second shielding plate entering the sensing chambers.
The beneficial effects of the utility model are that: a novel film deposition device with a shielding device is provided, which mainly shields the sensing region through the shielding convex part to reduce the formation of a film in the cleaning process of the sensing region, thereby facilitating the operation state of the optical sensor sensing shielding plate.
Drawings
FIG. 1 is a schematic cross-sectional view illustrating an embodiment of a thin film deposition apparatus having a shielding device according to the present invention in a shielding state.
Fig. 2 is a schematic perspective view of the shielding device according to an embodiment of the present invention in an open state.
Fig. 3 is a schematic perspective view of the shielding device of the present invention operating in a shielding state.
FIG. 4 is a schematic perspective view of an embodiment of a thin film deposition apparatus having a shielding device according to the present invention.
FIG. 5 is a top perspective view of one embodiment of the thin film deposition apparatus having a shielding device of the present invention operating in an open state.
FIG. 6 is a top plan view of an embodiment of the thin film deposition apparatus with a shielding device according to the present invention in a shielding state.
FIG. 7 is a schematic cross-sectional view illustrating another embodiment of the thin film deposition apparatus having a shielding device according to the present invention, which is operated in a shielding state.
Fig. 8 is a schematic perspective view of the shielding device according to another embodiment of the present invention in an open state.
Fig. 9 is a top perspective view of still another embodiment of the thin film deposition apparatus of the present invention having a shielding device operating in an open state.
Description of reference numerals: 10-thin film deposition apparatus with shutter means; 100-shielding means; 11-a reaction chamber; a 111-stop; 112-an opening; 113-a sensing chamber; 115-a light transmissive window; 12-an accommodating space; 13-an annular shielding projection; 130-ring sensing region; 131-a first shielding protrusion; 132-a first sensing zone; 133-a second shielding protrusion; 134-a second sensing region; 14-a first shielding unit; 141-first connecting arm; 143 — a first shielding plate; 1431 — a first upper surface; 145-a first reflective surface; 15-a second shielding unit; 151-a second connecting arm; 153-a second shutter; 1531 — a second upper surface; 155-a second reflective surface; 161-target material; 163-substrate; 165-a carrier tray; 1651-carrying surface; 17-a drive device; 171-a drive motor; 173-a shaft seal arrangement; 18-a separation space; 191-a first distance sensing unit; 193-a second distance sensing unit; 195-a light sensor; l1 — first sensing beam; l2 — second sensing beam.
Detailed Description
Please refer to fig. 1, which is a schematic side sectional view illustrating an embodiment of a thin film deposition apparatus with a shielding device according to the present invention operating in a shielding state. As shown in the figure, the thin film deposition apparatus 10 with the shielding device mainly includes a reaction chamber 11, a susceptor 165 and a shielding device 100, wherein the reaction chamber 11 includes a receiving space 12 for receiving the susceptor 165 and a portion of the shielding device 100.
As shown in fig. 1, the carrier tray 165 is disposed in the accommodating space 12 of the reaction chamber 11 and includes a carrying surface 1651 for carrying at least one substrate 163. When the thin film deposition apparatus 10 with the shielding device is a physical vapor deposition chamber, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the carrying surface 1651 of the carrying plate 165. For example, the target 161 may be disposed on the upper surface of the accommodating space 12 of the reaction chamber 11.
Referring to fig. 2 and fig. 3, the shielding apparatus 100 includes a first shielding unit 14, a second shielding unit 15 and a driving device 17, wherein the first shielding unit 14 and the second shielding unit 15 are located in the accommodating space 12. The driving device 17 is connected to the first shielding unit 14 and the second shielding unit 15, and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions.
As shown in fig. 2 and fig. 3, in an embodiment of the present invention, the first shielding unit 14 includes a first connecting arm 141 and a first shielding plate 143, wherein the first connecting arm 141 is used for carrying the first shielding plate 143. The second shielding unit 15 includes a second connecting arm 151 and a second shielding plate 153, wherein the second connecting arm 151 is used for carrying the second shielding plate 153. The driving device 17 is connected to the first connecting arm 141 and the second connecting arm 151 respectively and drives the first shielding plate 143 and the second shielding plate 153 to swing or rotate in opposite directions.
The first and second shielding plates 143, 153 may be plate bodies, and a first shielding protrusion 131 and a first sensing region 132 are disposed on a first upper surface 1431 of the first shielding plate 143, which does not face the susceptor 165, wherein the first shielding protrusion 131 is adjacent to the first sensing region 132, for example, the first upper surface 1431 is a surface of the first shielding plate 143 facing the target 161.
As shown in fig. 1, fig. 2 and fig. 3, in an embodiment of the present invention, the first sensing region 132 is located outside or radially outside the first shielding protrusion 131, for example, the first shielding plate 143 is a semicircular plate, and the first shielding protrusion 131 is a protrusion with an approximate C-shape or a semicircular ring shape. The second shielding protrusion 133 and the second sensing region 134 are disposed on the second shielding plate 153 not facing the second upper surface 1531 of the susceptor 165, for example, the second upper surface 1531 faces the target 161, wherein the second shielding plate 153 is similar to the first shielding plate 143.
The thin film deposition apparatus 10 and/or the shielding device 100 having the shielding device of the present invention can be operated in the open state and the shielding state. As shown in fig. 2 and 5, the driving device 17 drives the first shutter unit 14 and the second shutter unit 15 to move away from each other, and operates in an open state. A space 18 is formed between the first shielding unit 14 and the second shielding unit 15, so that the first shielding unit 14 and the second shielding unit 15 are not present between the target 161, the susceptor 165 and the substrate 163. Then, the susceptor 165 and the substrate 163 are driven to approach the target 161, and the gas in the accommodating space 12 collides with the target 161 to deposit a thin film on the surface of the substrate 163.
Referring to fig. 1, 5 and 6, the reaction cavity 11 includes two sensing chambers 113, wherein the two sensing chambers 113 protrude from the reaction cavity 11. The height of the two sensing chambers 113 is smaller than that of the reaction chamber 11, and a light sensor 195 can be respectively disposed on the two sensing chambers 113, for example, the light sensor 195 can be a distance light sensor, a reflection light sensor or a contrast light sensor, and includes at least one light emitting unit and at least one light receiving unit.
As shown in fig. 1, 2 and 5, when the first shielding unit 14/15 is operated in the open state, a portion of the first shielding plate 143/153 and a portion of the second shielding plate 143/153 enter the two sensing chambers 113, and the two light sensors 195 are respectively used for sensing the first sensing region 132/134 and determining whether the first shielding unit 14/15 is actually operated in the open state. For example, the light emitting units of the two light sensors 195 respectively project the sensing light beams onto the first and second sensing regions 132/134, and receive the sensing light beams reflected and/or scattered by the first and second sensing regions 132/134 through the light receiving units of the light sensors 195.
As shown in fig. 1, 3 and 6, during the process of cleaning the reaction chamber 11 and/or the target 161, contaminants or particles may deposit on the first and second shielding plates 143 and 153, so that the optical sensor 195 may not accurately sense the first and second shielding plates 143 and 153. Therefore, the present invention further provides that the first and second shielding protrusions 131/133 are disposed on the surface of the first and second shielding plates 143/153 facing the target 161, and the first and second sensing regions 132/134 are defined on the first and second shielding plates 143/153 through the first and second shielding protrusions 131/133. The first and second shielding protrusions 131/133 are respectively adjacent to the first and second sensing regions 132/134, and the first and second sensing regions 132/134 are respectively located outside the first and second shielding protrusions 131/133. The first and second shielding protrusions 131/133 are used to shield the first and second sensing regions 132/134 and prevent the deposition of films on the first and second sensing regions 132/134.
As shown in fig. 1, 3, 4, 6 and 7, the driving device 17 can drive the first shielding unit 14 and the second shielding unit 15 to approach each other and operate in a shielding state, in which the first shielding plate 143 and the second shielding plate 153 approach each other and form a circular shielding member to shield the carrier tray 165 and/or the substrate 163.
As shown in fig. 2, 3, 5 and 6, the first shielding protrusion 131 and the second shielding protrusion 133 may be C-shaped or semi-circular protrusions, and when the first shielding plate 143/153 is in the shielding state, the first shielding protrusion 131/133 forms an annular shielding protrusion 13, wherein an annular sensing region 130 is formed outside the annular shielding protrusion 13. By forming the annular shielding protrusion 13 on the surface of the first shielding plate 143 and the second shielding plate 153 facing the target 161, it is not only beneficial to shield the first and second sensing regions 132/134, but also the shielding effect of the first shielding plate 143 and the second shielding plate 153 can be further improved.
The embodiment of the present invention provides that the first shielding unit 14 and the second shielding unit 15 are operated in a shielding state, which can be defined as the first shielding plate 143 and the second shielding plate 153 are close to each other until the distance between the two is smaller than a threshold, for example, smaller than 1mm, so as to prevent the first shielding plate 143 and the second shielding plate 153 from generating particles in the contact process.
The first shielding unit 14 and the second shielding unit 15, which are operated in the shielding state, are located between the target 161 and the susceptor 165, and separate a cleaning space in the accommodating space 12, wherein the cleaning space is partially overlapped or close to the region of the reaction space. Then, a burn-in process may be performed in the cleaning space to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space, and remove the oxide, nitride or other contaminants on the surface of the target 161 and the deposited film on the surface of the reaction chamber 11 and/or the stopper 111.
As shown in fig. 7 and 8, the first and second shielding protrusions 131/133 can also be polygonal tubes or cylindrical tubes, such as tubular protrusions with a closed cross section of the first and second shielding protrusions 131/133, and form a first and second sensing regions 132/134 inside the first and second shielding protrusions 131/133.
As shown in fig. 9, the cross section of the first and second shielding protrusions 131/133 is a protrusion with a non-closed shape, such as a protrusion with a C-shape or a U-shape, wherein the first and second shielding protrusions 131/133 can connect the edges of the first and second shielding plates 143/153.
In an embodiment of the present invention, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the susceptor 165 is close to the target 161, the reaction chamber 11, the susceptor 165 and the stopper 111 separate a reaction space in the accommodating space 12, and a thin film is deposited on the surface of the substrate 163 in the reaction space.
When the first shielding plate 143 and the second shielding plate 153 are operated in the shielding state, the annular shielding protrusion 13 is located below or outside the shielding member 111, so that the area of the inner side of the annular shielding protrusion 13 is greater than or equal to the area of the opening 112, thereby improving the shielding effect.
In an embodiment of the present invention, as shown in fig. 2 and fig. 3, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions through the shaft sealing device 173, and the shaft sealing device 173 can be a common shaft seal or a magnetic fluid shaft seal.
As shown in fig. 1, fig. 4 and fig. 6, the present invention further provides a first reflective surface 145 and a second reflective surface 155 on the first connecting arm 141 and the second connecting arm 151, respectively, and a first distance sensing unit 191 and a second distance sensing unit 193 on the reaction chamber 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 can be optical distance measuring devices.
As shown in FIG. 4, the first distance sensing unit 191 and the first shielding unit 14 are disposed on the same side of the reaction chamber 11, and the second distance sensing unit 193 and the second shielding unit 15 are disposed on the same side of the reaction chamber 11. The first and second distance sensing units 191/193 project a first and second sensing light beams L1/L2 onto the first and second reflecting surfaces 145/155 of the first and second shielding units 14/15, respectively, wherein the first and second sensing light beams L1/L2 are perpendicular to the first and second reflecting surfaces 145/155, respectively.
As shown in fig. 4, the first distance sensing unit 191 can measure the distance between the first shielding unit 14 and the first distance sensing unit 191 by the reflected first sensing light beam L1, and the second distance sensing unit 193 can measure the distance between the second shielding unit 15 and the second distance sensing unit 193 by the reflected second sensing light beam L2, and determine whether the first shielding unit 14/15 is actually operated in the shielding state or not according to the measured distance.
In an embodiment of the present invention, as shown in fig. 5 and 6, the reaction chamber 11 may be respectively provided with a light-transmitting window 115, wherein the first distance sensing unit 191 and the second distance sensing unit 193 respectively face the two light-transmitting windows 115.
The utility model discloses the advantage:
a novel film deposition device with a shielding device is provided, which mainly shields the sensing region through the shielding convex part to reduce the formation of a film in the cleaning process of the sensing region, thereby facilitating the operation state of the optical sensor sensing shielding plate.
The foregoing is merely a preferred embodiment of the invention, and is not intended to limit the scope of the invention, which is defined by the appended claims, in which all equivalent changes and modifications in the shapes, constructions, features, and spirit of the invention are intended to be included.
Claims (10)
1. A thin film deposition apparatus having a shielding device, comprising:
a reaction cavity comprising a containing space;
a stopper located in the containing space, one end of the stopper being connected to the reaction chamber, and the other end of the stopper forming an opening;
a bearing disc which is positioned in the containing space and comprises a bearing surface for bearing at least one substrate;
a first shielding unit located in the accommodating space and including a first shielding protrusion and a first sensing region, wherein the first shielding protrusion and the first sensing region are located on the surface of the first shielding unit not facing the carrier plate, and the first shielding protrusion is adjacent to the first sensing region;
a second shielding unit located in the accommodating space and including a second shielding protrusion and a second sensing region, wherein the second shielding protrusion and the second sensing region are located on the surface of the second shielding unit not facing the carrier tray, and the second shielding protrusion is adjacent to the second sensing region;
at least one driving device, which is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit to swing in opposite directions, respectively, so that the first shielding unit and the second shielding unit are switched between an open state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and are used for shielding the carrying disc, and a spacing space is formed between the first shielding unit and the second shielding unit in the open state; and
at least two light sensors are disposed in the reaction cavity for sensing the first sensing region of the first shielding unit and the second sensing region of the second shielding unit, respectively, to determine whether the first shielding unit and the second shielding unit are actually operated in the open state.
2. The apparatus of claim 1, wherein the first shielding unit comprises a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate via the first connecting arm, the first shielding protrusion and the first sensing region are located on the first shielding plate, wherein the second shielding unit comprises a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate via the second connecting arm, and the second shielding protrusion and the second sensing region are located on the second shielding plate.
3. The apparatus of claim 2, comprising a target facing the carrying surface of the carrying plate, wherein the first shielding protrusion and the first sensing region are located on a first upper surface of the first shielding plate facing the target, and the second shielding protrusion and the second sensing region are located on a second upper surface of the second shielding plate facing the target.
4. The apparatus of claim 3, wherein the first shielding protrusion and the second shielding protrusion form an annular shielding protrusion, and the first sensing region and the second sensing region form an annular sensing region outside the annular shielding protrusion.
5. The thin film deposition apparatus having a shielding device according to claim 3, wherein the first shielding protrusion and the second shielding protrusion are tubular protrusions having a closed shape.
6. The thin film deposition apparatus having a shielding device according to claim 2, comprising:
a first reflecting surface arranged on the first connecting arm;
the second reflecting surface is arranged on the second connecting arm;
a first distance sensing unit disposed on the reaction chamber for projecting a first sensing beam to the first reflection surface of the first connection arm operating in the shielding state; and
and the second distance sensing unit is arranged on the reaction cavity and used for projecting a second sensing light beam to the second reflecting surface of the second connecting arm operated in the shielding state.
7. The apparatus of claim 2, wherein the reaction chamber comprises two sensing chambers, and the two light sensors are respectively disposed in the two sensing chambers and respectively configured to sense the first sensing region of the first shielding plate and the second sensing region of the second shielding plate entering the sensing chambers.
8. A shielding device, comprising:
a first shielding plate, including a first shielding protrusion and a first sensing region, wherein the first shielding protrusion and the first sensing region are disposed on a first upper surface of the first shielding plate, and the first shielding protrusion is adjacent to the first sensing region;
a first connecting arm for carrying the first shielding plate;
a second shielding plate including a second shielding protrusion and a second sensing region, wherein the second shielding protrusion and the second sensing region are disposed on a second upper surface of the second shielding unit, and the second shielding protrusion is adjacent to the second sensing region;
the second connecting arm is used for bearing the second shielding plate; and
the driving motor is connected with the first connecting arm and the second connecting arm through the shaft sealing device and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, and a spacing space is formed between the first shielding plate and the second shielding plate in the opening state.
9. The shielding apparatus of claim 8, wherein the first shielding protrusion and the second shielding protrusion form an annular shielding protrusion in the shielding state, and the first sensing region and the second sensing region form an annular sensing region located outside the annular shielding protrusion.
10. The shielding device according to claim 8, wherein the first shielding protrusion and the second shielding protrusion are tubular protrusions having a closed shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123118597.4U CN217324277U (en) | 2021-12-09 | 2021-12-09 | Shielding device and thin film deposition equipment with shielding device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202123118597.4U CN217324277U (en) | 2021-12-09 | 2021-12-09 | Shielding device and thin film deposition equipment with shielding device |
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| CN217324277U true CN217324277U (en) | 2022-08-30 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115642112A (en) * | 2022-11-24 | 2023-01-24 | 西安奕斯伟材料科技有限公司 | Back sealing device and method for silicon wafer |
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2021
- 2021-12-09 CN CN202123118597.4U patent/CN217324277U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115642112A (en) * | 2022-11-24 | 2023-01-24 | 西安奕斯伟材料科技有限公司 | Back sealing device and method for silicon wafer |
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