TWM620965U - Depositing device with split-type shielding member - Google Patents

Abstract

The present model provides a deposition device with a split-type shielding member, which includes a chamber main body, a bearing tray and a pair of split-type shielding members, wherein the load-bearing tray and part of the split-type shielding member are located in the chamber main body. The chamber main body includes a reaction chamber and two sensing areas. The two sensing areas are connected to the reaction chamber, and the thickness of the sensing area is smaller than that of the reaction chamber. The split-type shielding member includes a first shielding plate, a second shielding plate and a driving device, wherein the driving device drives the first and second shielding plates to swing in opposite directions. During the deposition process, the first and second shielding plates are far away from each other, and part of the first and second shielding plates are located in the sensing area. During the cleaning process, the first and second shielding plates will approach each other and switch to a shielding state to shield the carrier plate.

Description

Depositing equipment with split-type shielding member

The present invention relates to a deposition device with a split-type shielding member, which mainly shields a carrier plate through the split-type shielding member, so as to avoid contamination of the carrier plate in the process of cleaning a processing chamber.

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are all commonly used deposition equipment, and are commonly used in integrated circuits, light-emitting diodes, and display manufacturing processes.

The deposition equipment mainly includes a cavity and a wafer carrier. The wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the cavity, where the target material faces the wafer on the wafer carrier tray. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the cavity, bias voltage is applied to the target and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated through the wafer carrier.

The inert gas in the cavity forms ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias on the target material and bombard the target material. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and are deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the cavity. Therefore, the cavity needs to be cleaned periodically to prevent the deposited film from falling during the manufacturing process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so periodic Clean the target. Generally speaking, a burn-in process is used to strike a target in the cavity with plasma ions to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to remove the wafer carrier and the wafer from the cavity or isolate the wafer carrier to avoid contamination of the wafer carrier and wafer during the cleaning process.

Generally speaking, after a period of use, the deposition equipment usually needs to be cleaned to remove the oxide or nitride on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and contaminants. The present invention proposes a deposition device with a split-type shielding member, which mainly drives two shielding plates to swing in opposite directions through a driving device, so that the two shielding plates are operated in an open state and a shielding state. The shielding plate operating in the shielding state can be used to shield the carrier tray to avoid contamination of the carrier tray with particles generated when cleaning the cavity or the target material.

An object of the present invention is to provide a deposition device with a split-type shielding member, which mainly includes a chamber body, a carrier plate and a pair of split-type shielding members, wherein the carrier plate and part of the split-type shielding member are located in the chamber body . The chamber body includes a reaction chamber and two sensing areas, the two sensing areas are connected to the reaction chamber, and the sensing spaces of the two sensing areas are fluidly connected to the accommodating space of the reaction chamber.

The split-type shielding member includes a driving device and two shielding plates, wherein the driving device is connected to and drives the two shielding plates to swing in opposite directions respectively, so that the two shielding plates operate in an open state and a shielding state. When cleaning the reaction chamber, the driving device drives the two shielding plates to approach each other in a swinging manner, so that the two shielding plates are connected and shield the carrier plate in the accommodating space to Avoid the plasma used in the cleaning process or the pollution generated from contacting the carrier plate and/or the substrate it carries. During the deposition process, the driving device drives the two shielding plates to move away from each other in a swinging manner, and can deposit thin films on the substrate in the reaction chamber.

The two shielding plates operating in the open state will be far away from each other, and part of the shielding plates will enter the two sensing areas of the chamber body. At least one position sensing unit is respectively arranged in the two sensing areas to sense the shielding plates entering the sensing area to determine that the two shielding plates are operating in an open state.

An object of the present invention is to provide a deposition device with a split-type shielding member, which mainly constitutes a complete shielding piece through two shielding plates, which can reduce the space required for storing the shielding plates. In an embodiment of the present invention, the two shielding plates can swing or rotate in opposite directions in the chamber body. The chamber body includes a reaction chamber and two sensing areas. The two shielding plates operating in the shielding state are located in the accommodating space of the reaction chamber and used to shield the bearing seat in the accommodating space. The two shielding plates operating in the open state partially enter the sensing area, and the position sensing unit disposed in the sensing area can sense the shielding plates to confirm that the two shielding plates are operating in the open state.

After the two shielding plates are determined to be operated in the open state, the susceptor is driven to move in the direction of the target material, and the substrate on the susceptor is deposited on the film. Through the above actions, it can be ensured that the carrier plate will not collide with the shielding plate when it is displaced toward the target, so as to avoid damage to the carrier plate and the shielding plate.

An object of the present invention is to provide a deposition device with a split-type shielding member, which mainly constitutes a complete shielding piece through two shielding plates, which can reduce the space required for storing the shielding plates, and simplify the structure and reduction of the chamber body The volume of the chamber body.

An object of the present invention is to provide a deposition equipment with a split shielding member, wherein the driving device is connected to and carries two shielding plates through two connecting arms respectively, so as to reduce the connection The weight of the arm. In addition, a shielding plate with a larger thickness can be further used to prevent high temperature deformation of the shielding plate when cleaning the deposition equipment, and to improve the effect of the shielding plate in shielding the carrier plate.

In order to achieve the above objective, the present invention proposes a deposition device with a split shielding member, which includes: a chamber body, including: a reaction chamber, including an accommodating space; two sensing areas, connected to the reaction chamber, And each includes a sensing space fluidly connected to the accommodating space, in which the thickness of the two sensing regions is smaller than the reaction chamber; a carrier plate located in the accommodating space and used to carry at least one substrate; and a stopper located in the accommodating space In the space, one end of the blocking piece is connected to the reaction chamber, and the other end of the blocking piece forms an opening; and a pair of open shielding members, including: a first shielding plate; a second shielding plate; and a driving device, connected The first shielding plate and the second shielding plate respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, Part of the first shielding plate and part of the second shielding plate operating in the open state are respectively located in the sensing space of the two sensing areas, while the first shielding plate and the second shielding plate operating in the shielding state are located in the accommodating space , And located between the opening and the carrier plate to cover the carrier plate.

In the deposition equipment with split shielding members, the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device.

In the deposition equipment with split-type shielding member, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the driving motor is connected to the first shielding plate through the outer tube body, The second shielding plate is connected through the shaft body, and the shaft body and the outer tube body are synchronously driven to rotate in opposite directions.

The deposition device with a split shielding member includes a first connecting arm and a second connecting arm. The outer tube body is connected to the first shielding plate through the first connecting arm, and the shaft body is connected to the second connecting arm through the second connecting arm. Two shielding board.

The deposition device with split-type shielding member includes two position sensing units respectively arranged in two sensing areas, and respectively used for sensing the first shielding plate and the second shielding plate entering the two sensing spaces .

In the deposition device with split-type shielding member, the position sensing unit includes a transmitter and a receiver, which are respectively arranged on two surfaces facing the sensing area, and are used to sense the first entering the sensing space A shielding board and a second shielding board.

In the deposition apparatus with split-type shielding members, the first shielding plate and the second shielding plate are operated in an open state, and the area of the first shielding plate and the second shielding plate located in the sensing space is smaller than that in the accommodating space The area of the first shielding plate and the second shielding plate inside.

In the deposition apparatus with a split-type shielding member, the first shielding plate and the second shielding plate are operated in a shielding state, and part of the first shielding plate overlaps with a part of the second shielding plate.

The deposition equipment with split-type shielding member includes a target material arranged in the accommodating space and facing the carrying plate, and the first shielding plate and the second shielding plate in the shielding state are located between the target material and the carrying plate .

In the deposition apparatus with the split-type shielding member, the driving device of the split-type shielding member is close to a top corner of the accommodating space.

10: Deposition equipment with split-type shielding member

100: Split type shielding member

11: Chamber body

110: reaction chamber

111: stop

112: opening

113: Sensing area

12: accommodating space

120: Sensing Space

121: clean space

13: Carrier plate

141: First connecting arm

143: second connecting arm

15: Shield

151: The first shielding board

152: Interval

153: The second shielding board

161: Target

163: Substrate

17: Drive

171: drive motor

173: Shaft seal device

1731: Outer tube body

1732: space

1733: Shaft

19: Position sensing unit

191: Launcher

193: Receiver

[Fig. 1] is a schematic side sectional view of an embodiment of a new type of deposition device with a split-type shielding member operating in a shielded state.

[Figure 2] is a three-dimensional schematic diagram of an embodiment of the split-type shielding member of the new deposition device operating in an open state.

[Figure 3] is a three-dimensional schematic diagram of an embodiment of the split-type shielding member of the new deposition device operating in the shielding state.

[Fig. 4] is a three-dimensional cross-sectional schematic diagram of an embodiment of the driving device of the novel split-type shielding member.

[Figure 5] is a top view of an embodiment of the new deposition device operating in an open state.

[Figure 6] is a top view of an embodiment of the new deposition device operating in a shielded state.

[Figure 7] is a schematic cross-sectional view of an embodiment of the split-type shielding member of the new deposition device operating in an open state.

[Figure 8] is a schematic cross-sectional view of an embodiment of the split-type shielding member of the new deposition device operating in the shielding state.

[Figure 9] is a top view of another embodiment of the new deposition device operating in an open state.

Please refer to FIG. 1, which is a schematic side sectional view of an embodiment of a deposition device with a split-type shielding member operating in a shielding state of the new type. As shown in the figure, the deposition apparatus 10 with split-type shielding members mainly includes a chamber body 11, a carrier plate 13, and a pair of split-type shielding members 100. The chamber body 11 includes a reaction chamber 110 and two sensors. Area 113, and the two sensing areas 113 are connected to the reaction chamber 110.

The reaction chamber 110 includes an accommodating space 12 for accommodating the carrier plate 13 and part of the split-type shielding member 100, and the two sensing areas 113 respectively include a sensing space 120, in which the two sensing areas 113 The sensing space 120 is fluidly connected to the accommodating space 12 of the reaction chamber 110.

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 110 and is used to carry at least one substrate 163. Taking the deposition device 10 with the split-type shielding member as a physical vapor deposition chamber as an example, a target 161 is set in the accommodating space 12 of the reaction chamber 110, wherein the target 161 faces the substrate 163 and the carrier plate 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 110 and face the carrier plate 13 and/or the substrate 163 in the accommodating space 12.

Please refer to FIGS. 2 and 3 together. The split-type shielding member 100 includes a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the split-type shielding member 100 is connected to the reaction chamber 110. The first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12, and part of the driving device 17 is also located in the accommodating space 12. The driving device 17 connects the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are in the open state For example, the first shielding plate 151 and the second shielding plate 153 swing synchronously with the driving device 17 as the axis.

In an embodiment of the present invention, the driving device 17 is connected to a first connecting arm 141 and a second connecting arm 143, and is connected to the first shielding plate 151 and the second shielding plate 151 through the first connecting arm 141 and the second connecting arm 143, respectively. The shielding plate 153, wherein the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 143, respectively.

The first shielding plate 151 and the second shielding plate 153 can be plate bodies. The area and shape of the first shielding plate 151 and the second shielding plate 153 can be similar. For example, the first shielding plate 151 and the second shielding plate 153 can be Semi-circular plate body. When the driving device 17 drives the first shielding plate 151 and the second shielding plate When the 153 is operated in the shielding state, the first shielding plate 151 and the second shielding plate 153 will approach to form a circular plate-shaped shielding member 15, wherein the shielding member 15 formed by the first shielding plate 151 and the second shielding plate 153 will be located in the reaction The accommodating space 12 of the cavity 110 is used to cover the carrier plate 13 and/or the substrate 163.

The first shielding plate 151 and the second shielding plate 153 described in the embodiment of the present invention are operated in the shielding state or the first shielding plate 151 and the second shielding plate 153 are connected, which can be defined as the first shielding plate 151 and the second shielding plate. The plates 153 are close to each other until the distance between the two is less than a threshold value, for example, less than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process, which will contaminate the housing of the reaction chamber 110 Space 12 and/or carrier plate 13.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be set at different heights. For example, the first shielding plate 151 is higher than the second shielding plate 153. When the plate 153 is operated in the shielding state, part of the first shielding plate 151 and part of the second shielding plate 153 will overlap, which can improve the shielding effect of the shield 15.

The area and shape of the above-mentioned first shielding plate 151 and the second shielding plate 153 are similar, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, or can be square, elliptical, or any geometrical shape, such as the area of the first shielding plate 151 It may be larger than the area of the second shielding plate 153. As long as the shielding member 15 is composed of the first shielding plate 151 and the second shielding plate 153, when the first shielding plate 151 and the second shielding plate 153 are closed, they can achieve the purpose of shielding the carrier plate 13 and/or the substrate 163. The scope of rights of the present model.

Taking the first shielding plate 151 and the second shielding plate 153 as a semicircular plate body as an example, the first shielding plate 151 and the second shielding plate 153 have straight sides and semicircular or arc-shaped sides, respectively. The linear sides of the first shielding plate 151 and the second shielding plate 153 face each other. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to approach each other, the linear sides of the first shielding plate 151 and the second shielding plate 153 will approach and form a circular shielding member 15. The proximity of the first shielding plate 151 and the second shielding plate 153 through straight sides is only an embodiment of the present invention, and is not a limitation of the scope of the present invention. In practical applications, the straight sides of the first shielding plate 151 and the second shielding plate 153 can also be corresponding curved or zigzag sides, as long as the first shielding plate 151 and the second shielding plate 153 can form the shielding member 15 , Can effectively shield the carrier plate 13.

In an embodiment of the present invention, as shown in FIG. 4, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 through the shaft sealing device 173 . The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 110, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 110, and part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 110.

The shaft sealing device 173 includes an outer tube body 1731 and a shaft body 1733. The outer tube body 1731 includes a space 1732 for accommodating the shaft body 1733, wherein the outer tube body 1731 and the shaft body 1733 are coaxially arranged, the outer tube body 1731 is fixed on the reaction chamber 110, and the outer tube body 1731 and the shaft body 1733 can be Relative rotation. The outer tube body 1731 is connected to the first connecting arm 141, and is connected via the first connecting arm 141 to drive the first shielding plate 151 to swing. The shaft 1733 is connected to the second connecting arm 143 and connected via the second connecting arm 143 to drive the second shielding plate 153 to swing.

The shaft sealing device 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 110 from an external space, so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft sealing device 173 may be a magnetic fluid shaft seal, and includes a plurality of bearings, at least one permanent magnet, at least one pole piece, and at least one magnetic fluid. For example, the bearing can be sleeved outside the shaft body 1733 The surface is located between the shaft body 1733 and the outer tube body 1731, so that the shaft body 1733 and the outer tube body 1731 can rotate relatively. The permanent magnet is arranged on the inner surface of the outer tube body 1731 and located between the two bearings. Two magnetic pole pieces are arranged on the inner surface of the outer tube body 1731, and are respectively located between the permanent magnet and the two bearings. There is a gap between the pole piece and the outer surface of the shaft body 1733, and the magnetic fluid is arranged in the gap. The above-mentioned structure of the magnetic fluid shaft seal is only an embodiment of the present invention, and is not a limitation of the scope of the rights of the present invention.

In an embodiment of the present invention, as shown in FIG. 4, the number of driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube body 1731 and the shaft body 1733 of the shaft sealing device 173, and drive the outer tube separately The body 1731 and the shaft body 1733 rotate in opposite directions synchronously to drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube body 1731 and the shaft body 1733, respectively.

In another embodiment of the present invention, the number of the driving motor 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are respectively connected and driven by a linkage mechanism through the outer tube body 1731 and the shaft body 1733 to face opposite directions. The direction swings synchronously.

Specifically, the deposition apparatus 10 and/or the split shielding member 100 of the present invention with the split-type shielding member of the present invention can be operated in two states, namely the open state and the shielding state. As shown in Figures 2 and 5, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in the open state . A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 operating in the open state, so that there is no first shielding plate 151 and second shielding plate between the target 161 and the carrier plate 13 and the substrate 163 153, wherein the target 161 faces the carrier plate 13 via the space 152.

In addition, when the first shielding plate 151 and the second shielding plate 153 are operated in the open state, part of the first shielding plate 151 and part of the second shielding plate 153 will respectively enter the fluid connection accommodation space 12 of the two sensing spaces 120, in which the area of the first shielding plate 151 and the second shielding plate 153 located in the sensing space 120 is smaller than that of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12 area.

In an embodiment of the present invention, as shown in FIG. 1, the accommodating space 12 of the reaction chamber 110 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 110, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 110, the carrier plate 13 and the stopper 111 partition a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, which can prevent the reaction chamber 110 and the reaction space outside the reaction space. A deposited film is formed on the surface of the carrier plate 13.

In addition, as shown in FIGS. 3 and 6, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are close to each other and operate at Covered state. The closed first shielding plate 151 and the second shielding plate 153 will not directly contact, there may be a slight gap between the two, or the two may be set at different heights and form an overlapping area between the two. The closed first shielding plate 151 and the second shielding plate 153 will form a shielding member 15, wherein the shielding member 15 will be located between the target 161 and the carrier plate 13 or the opening 112 and the carrier plate 13, and is used to shield the carrier plate 13 from Separate the target 161 and the carrier plate 13.

The shielding member 15 may partition a clean space 121 in the accommodating space 12, wherein the clean space 121 and the reaction space partially overlap or are close to each other. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 110 and/or the stopper 111 in the clean space 121, and to remove oxides and nitrides on the surface of the target 161 Or other contaminants, and the film deposited on the surface of the reaction chamber 110 and/or the stopper 111.

In the process of cleaning the deposition equipment 10 with the split shielding member, the carrier plate 13 and/or the substrate 163 will be shielded or isolated by the shielding member 15, so as to avoid the contamination of substances generated during the cleaning process or the deposition on the carrier plate 13 and/or The surface of the substrate 163.

Specifically, the present invention constitutes the shield 15 through the first shielding plate 151 and the second shielding plate 153, and carries the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively. The weight can reduce the burden of the first connecting arm 141 and the second connecting arm 143.

By using the two connecting arms 141/143 to respectively carry the weight of part of the shielding plate 151/153, the thickness or weight of the first shielding plate 151 and the second shielding plate 153 can be further increased. The thicker first shielding plate 151 and the second shielding plate 153 can avoid high temperature deformation during the cleaning of the deposition apparatus 10 with split-type shielding members, and can prevent plasma or pollution during the cleaning process from passing through the deformed first shielding plate. The shielding plate 151 and the second shielding plate 153 contact the carrier tray 13 or the substrate 163 below.

In addition, the shielding member 15 is divided into two first shielding plate 151 and second shielding plate 153 that can be connected and separated, which is more conducive to reducing the storage space required by the first shielding plate 151 and the second shielding plate 153 in the open state. , And the structure of the reaction chamber 110 can be simplified or adjusted.

In an embodiment of the present invention, as shown in FIGS. 5 and 6, the reaction chamber 110 may be a tetragon, and the two sensing regions 113 are respectively disposed on two opposite side surfaces of the reaction chamber 110. As shown in Figures 5 and 7, the first shielding plate 151 and the second shielding plate 153 are operated in an open state, and part of the first shielding plate 151 and part of the second shielding plate 153 are located at the two sensing areas 113, respectively. In the sensing space 120.

In an embodiment of the present invention, at least one position sensing unit 19 may be further provided on the two sensing regions 113, and the position sensing units 19 of the two sensing regions 113 can be used to sense the access sensing. The first shielding plate 151 and the second shielding plate 153 of the space 120. When the position sensing unit 19 When the first shielding plate 151 and the second shielding plate 153 are sensed, it can be determined that the first shielding plate 151 and the second shielding plate 153 enter the sensing space 120 and operate in the open state. Then, the carrier plate 13 and the substrate 163 are driven to approach the target 161, and the gas in the accommodating space 12, such as an inert gas, strikes the target 161 to deposit a thin film on the surface of the substrate 163.

If the first shielding plate 151 and the second shielding plate 153 are not fully opened, the carrier tray 13 will be displaced toward the target 161, which may cause the carrier tray 13 to collide with the first shielding plate 151 and the second shielding plate 153, and This causes damage to the carrier plate 13, the first shielding plate 151 and/or the second shielding plate 153.

In practical applications, the sensing area 113 may be an extension of the reaction cavity 110, wherein the thickness of the sensing area 113 is smaller than the thickness of the reaction cavity 110, or the height of the sensing space 120 is smaller than the height of the accommodating space 12. The sensing area 113 has two facing surfaces, such as an upper surface and a lower surface, and the position sensing unit 19 is disposed on the two facing surfaces of the sensing area 113. Specifically, the position sensing unit 19 may include a transmitter 191 and a receiver 193, wherein the transmitter 191 and the receiver 193 are respectively disposed on two surfaces facing the sensing area 113, so that the receiver 193 can To receive the signal emitted by the transmitter 191, for example, the position sensing unit 19 may be a light sensing unit.

As shown in FIG. 7, the first shielding plate 151 and the second shielding plate 153 are operated in the open state and enter the sensing space 120 of the sensing area 113. The first shielding plate 151 and the second shielding plate 151 and the second shielding plate 151 located in the sensing space 120 The second shielding plate 153 shields the signal emitted by the light transmitter, so that the light receiver cannot receive the signal from the light transmitter, and determines that the first shielding plate 151 and the second shielding plate 153 are operating in the open state.

On the contrary, as shown in FIGS. 6 and 8, the first shielding plate 151 and the second shielding plate 153 are operated in a shielding state, wherein the first shielding plate 151 and the second shielding plate 153 will leave the sensing space 120, so that the light receiver Can receive the signal generated by the light transmitter, and determine the first shielding plate 151 and the second shielding plate 153 is operating in the shielding state or not operating in the open state. At this time, the carrier plate 13 cannot be driven to move in the direction of the target 161 to prevent the carrier plate 13 from colliding with the first shielding plate 151 and the second shielding plate 153.

In practical applications, the position of the split shielding member 100 in the reaction chamber 110 can be adjusted according to the configuration of other mechanisms or moving lines on the deposition device 10 with the split shielding member. As shown in FIG. 9, the driving device 17 of the split shielding member 100 can be arranged at or close to the corner or top corner of the reaction chamber 110/or the accommodating space 12, and the two sensing regions 113 are arranged at the opposite side of the reaction chamber 110. The two adjacent sides facilitate the installation of substrate feed ports and air extraction pipelines on the sides of the reaction chamber 11.

The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10: Deposition equipment with split-type shielding member

100: Split type shielding member

11: Chamber body

110: reaction chamber

111: stop

112: opening

113: Sensing area

12: accommodating space

120: Sensing Space

121: clean space

13: Carrier plate

141: First connecting arm

143: second connecting arm

15: Shield

151: The first shielding board

153: The second shielding board

161: Target

163: Substrate

17: Drive

19: Position sensing unit

191: Launcher

193: Receiver

Claims (10)

A deposition device with a split shielding member includes: a chamber body, including: a reaction chamber, including an accommodating space; two sensing areas, connected to the reaction chamber, and each including a sensing space fluid Connected to the accommodating space, wherein the thickness of the two sensing areas is smaller than the reaction chamber; a carrier plate located in the accommodating space and used to carry at least one substrate; and a stopper located in the accommodating space, One end of the blocking piece is connected to the reaction chamber, and the other end of the blocking piece forms an opening; and a pair of open shielding members includes: a first shielding plate; a second shielding plate; and a driving device connected to The first shielding plate and the second shielding plate respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are in an open state and a Switch between the shielding states, wherein part of the first shielding plate and part of the second shielding plate operating in the open state are respectively located in the sensing space of the two sensing areas, and the first shielding plate operating in the shielding state The shielding plate and the second shielding plate are located in the accommodating space and located between the opening and the carrying tray to shield the carrying tray. The deposition apparatus with a split shielding member according to claim 1, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate through the shaft sealing device . According to claim 2, the deposition equipment with the split-type shielding member, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the driving horse It connects the first shielding plate through the outer tube body, connects the second shielding plate through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions. The deposition apparatus with a split shielding member according to claim 3, comprising a first connecting arm and a second connecting arm, the outer tube body is connected to the first shielding plate through the first connecting arm, and the shaft body The second shielding plate is connected through the second connecting arm. The deposition apparatus with the split-type shielding member according to claim 1, including two position sensing units respectively disposed in the two sensing areas, and respectively used to sense the first position entering the two sensing spaces The shielding plate and the second shielding plate. According to claim 5, the deposition apparatus with split shielding members, wherein the position sensing unit includes a transmitter and a receiver, which are respectively arranged on two surfaces of the sensing area facing each other, and are used for sensing The first shielding plate and the second shielding plate that enter the sensing space. The deposition apparatus having a split-type shielding member according to claim 1, wherein the first shielding plate and the second shielding plate are operated in the open state, and the first shielding plate and the first shielding plate and the second shielding plate are located in the sensing space. The area of the two shielding plates is smaller than the area of the first shielding plate and the second shielding plate located in the accommodating space. The deposition apparatus with the split-type shielding member according to claim 1, wherein the first shielding plate and the second shielding plate are operated in the shielding state, and part of the first shielding plate overlaps with part of the second shielding plate. The deposition apparatus with the split shielding member according to claim 1, comprising a target located in the accommodating space and facing the carrier plate, the first shielding plate and the second shielding plate operating in the shielding state Located between the target and the carrier plate. The deposition apparatus with the split-type shielding member according to claim 1, wherein the driving device of the split-type shielding member is close to a vertex of the accommodating space.

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