CN216141617U

CN216141617U - Open-close type shielding component and deposition machine station with same

Info

Publication number: CN216141617U
Application number: CN202121457134.8U
Authority: CN
Inventors: 林俊成; 沈祐德
Original assignee: Xintianhong Xiamen Technology Co ltd
Current assignee: Xintianhong Xiamen Technology Co ltd
Priority date: 2021-06-29
Filing date: 2021-06-29
Publication date: 2022-03-29
Anticipated expiration: 2031-06-29

Abstract

The utility model provides a deposition machine with an open-close type shielding component, which mainly comprises a reaction cavity, a bearing plate and an open-close type shielding component, wherein part of the open-close type shielding component and the bearing plate are positioned in the reaction cavity. The open-close type shielding component comprises a first shielding plate, a second shielding plate, a first driving device and a second driving device, wherein the first driving device and the second driving device are respectively connected with the first shielding plate and the second shielding plate and respectively drive the first shielding plate and the second shielding plate to swing towards opposite directions. When the cleaning process is performed, the first and second driving devices drive the first and second shielding plates to approach each other to shield the pollution generated in the process of cleaning the deposition machine.

Description

Open-close type shielding component and deposition machine station with same

Technical Field

The utility model relates to a deposition machine with an open-close type shielding component, which mainly shields a bearing disc through the open-close type shielding component so as to avoid polluting the bearing disc in the process of cleaning a processing chamber.

Background

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.

The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.

The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.

After a period of time, the inner surface of the chamber forms a deposition film, and thus the chamber needs to be periodically cleaned to prevent the deposition film from falling off during the process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber by a burn-in process to remove oxides or other contaminants from the surface of the target.

When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.

SUMMERY OF THE UTILITY MODEL

Generally, a deposition tool is cleaned after a period of use to remove oxide or nitride from films and targets deposited in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The utility model provides an open-close type shielding component and a deposition machine with the same. The shielding plate operating in the shielding state can be used for shielding the bearing plate so as to avoid the pollution of particles generated when the cavity or the target material is cleaned on the bearing plate.

The present invention provides a deposition machine with an openable shielding member, which mainly comprises a reaction chamber, a carrying tray and an openable shielding member. The open-close type shielding component comprises two driving devices and two shielding plates, wherein the two driving devices are respectively connected with the two shielding plates.

When the reaction cavity is cleaned, the two driving devices respectively drive the two shielding plates to mutually approach in a swinging mode, and the two shielding plates shield the bearing plate in the accommodating space so as to prevent plasma used in the cleaning process or pollution generated in the cleaning process from contacting the bearing plate. When the deposition process is carried out, the two driving devices respectively drive the two shielding plates to be away from each other in a swinging mode, and the thin film deposition can be carried out on the substrate in the reaction cavity.

In addition, the two shielding plates operated in the shielding state are partially overlapped, so that the shielding plates can completely shield the bearing disc and can effectively isolate the bearing disc from a pollution source. The overlapped parts of the two shielding plates are not in direct contact, thereby avoiding the generation of particles in the contact process of the two shielding plates and reducing the pollution to the reaction cavity.

An objective of the present invention is to provide a deposition machine with an opening/closing type shielding member, wherein two shielding plates form a complete shielding member, so as to reduce the space required for accommodating the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, wherein the two shielding plates can be operated in an open state or a shielding state in the accommodating space of the reaction chamber, so as to simplify the structure of the reaction chamber and reduce the volume of the reaction chamber. In addition, a shielding plate with larger thickness can be further used to prevent the shielding plate from generating high-temperature deformation when the deposition machine is cleaned, and the effect of shielding the bearing disc by the shielding plate is improved.

In order to achieve the above object, the present invention provides a deposition machine with an opening/closing type shielding member, comprising: a reaction cavity comprising a containing space; a bearing disc positioned in the containing space and used for bearing at least one substrate; and an openable shielding member comprising: the first shielding plate is positioned in the accommodating space; the second shielding plate is positioned in the accommodating space; the first driving device is connected with the first shielding plate, wherein the height of the first shielding plate is higher than that of the second shielding plate; and the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing towards opposite directions, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, and part of the first shielding plate and part of the second shielding plate are overlapped to shield the bearing disc.

The utility model provides an open-close type shielding component, which is suitable for a deposition machine, and comprises: a first shielding plate; a second shielding plate; the first driving device is connected with the first shielding plate, wherein the height of the first shielding plate is higher than that of the second shielding plate; and the second driving device is connected with the second shielding plate, wherein the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing towards opposite directions, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state are overlapped, the first shielding plate and the second shielding plate in the opening state are mutually far away, and a spacing space is formed between the first shielding plate and the second shielding plate.

The deposition machine with the open-close type shielding component and the open-close type shielding component are characterized in that the first driving device and the second driving device respectively comprise a shaft sealing device and at least one driving motor, and the driving motors of the first driving device and the second driving device are respectively connected with the first shielding plate and the second shielding plate through shaft sealing devices.

The deposition machine with the open-close type shielding component and the open-close type shielding component comprise a first connecting arm and a second connecting arm, wherein the first driving device is connected with the first shielding plate through the first connecting arm, and the second driving device is connected with the second shielding plate through the second connecting arm.

The deposition machine with the opening-closing type shielding member and the opening-closing type shielding member comprise a plurality of position sensing units which are arranged in the reaction cavity and used for sensing the positions of the first shielding plate and the second shielding plate.

The deposition machine with the open-close type shielding member and the open-close type shielding member comprise two sensing areas which are connected with a reaction cavity, the two sensing areas respectively comprise a sensing space which is in fluid connection with an accommodating space, wherein the first shielding plate and the second shielding plate are operated in an open state, and part of the first shielding plate and part of the second shielding plate are respectively positioned in the sensing spaces of the two sensing areas.

The deposition machine station with the opening-closing type shielding member and the opening-closing type shielding member comprise a plurality of position sensing units which are arranged on two sensing areas and used for sensing a first shielding plate and a second shielding plate entering a sensing space.

The deposition machine station with the opening-closing type shielding component and the opening-closing type shielding component are characterized in that the area of the first shielding plate is larger than that of the second shielding plate.

The utility model has the beneficial effects that: when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning a deposition machine.

Drawings

FIG. 1 is a schematic side sectional view of a deposition apparatus with an openable and closable shielding member according to an embodiment of the present invention in a shielding state.

Fig. 2 is a schematic perspective view illustrating an open/close type shielding member of a deposition apparatus according to an embodiment of the utility model in an open state.

FIG. 3 is a schematic perspective view illustrating an embodiment of an opening/closing type shielding member of a deposition apparatus according to the present invention in a shielding state.

FIG. 4 is an enlarged cross-sectional view of a portion of an embodiment of the retractable shielding member of the present invention not in a shielding state.

FIG. 5 is an enlarged cross-sectional view of a portion of an embodiment of the retractable shielding member of the present invention in a shielding state.

FIG. 6 is a top view of an embodiment of a deposition tool with an openable and closable shielding member according to the utility model in an open state.

FIG. 7 is a top view of an embodiment of a deposition tool with an openable and closable shield member according to the present invention in a shielding state.

FIG. 8 is a top view of a deposition apparatus with an openable shielding member according to another embodiment of the present invention, the deposition apparatus being operated in an open state.

Description of reference numerals: 10, a film deposition machine; 100, a shielding component in an opening and closing type; 11, a reaction cavity; 111, a stopper; 112, opening; 113 sensing region; 12, an accommodating space; sensing space 120; 121, cleaning a space; 13, a bearing disc; 141 first connecting arm; 143 a second connecting arm; 15, a shielding member; 151, a first shielding plate; 1511 a first inner side; 1513 a first outer side; 1515, a convex part; 152, spacing space; 153 a second shielding plate; 1531 second medial side; 1533 a second outer side; 1535 a recess; 154, a gap; 161 target material; 163 a substrate; 171, a first driving device; 1711, driving motor; 1713, a shaft seal device; 173 second driving device; 1731, driving motor; 1733, a shaft seal device; 19: a position sensing unit.

Detailed Description

Fig. 1 is a schematic side cross-sectional view illustrating an embodiment of a deposition apparatus with an openable shielding member operating in a shielding state according to the present invention. As shown in the figure, the deposition apparatus 10 mainly includes a reaction chamber 11, a carrying tray 13 and an opening/closing type shielding member 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrying tray 13 and a part of the opening/closing type shielding member 100.

The susceptor 13 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for supporting at least one substrate 163. Taking the deposition machine 10 as a physical vapor deposition chamber as an example, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the susceptor 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the susceptor 13 and/or the substrate 163 in the accommodating space 12.

Referring to fig. 2 and fig. 3, the opening/closing shielding member 100 includes a first shielding plate 151, a second shielding plate 153, a first driving device 171 and a second driving device 173, wherein the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12, and a portion of the first driving device 171 and a portion of the second driving device 173 are located in the accommodating space 12.

The first driving device 171 and the second driving device 173 are respectively connected to the first shielding plate 151 and the second shielding plate 153, and respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, for example, the first shielding plate 151 and the second shielding plate 153 synchronously swing in opposite directions around the first driving device 171 and the second driving device 173 as axes.

As shown in fig. 2, the first shielding plate 151 includes a first inner side surface 1511 and at least a first outer side surface 1513, and the second shielding plate 153 includes a second inner side surface 1531 and at least a second outer side surface 1533, wherein the first inner side surface 1511 of the first shielding plate 151 faces the second inner side surface 1531 of the second shielding plate 153.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 may be plate bodies, wherein the first shielding plate 151 and the second shielding plate 153 may have similar areas and shapes, for example, the first shielding plate 151 and the second shielding plate 153 may be semicircular plate bodies. When the first driving device 171 and the second driving device 173 drive the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 approach each other to form a disc-shaped shielding member 15.

The first shielding plate 151 and the second shielding plate 153 have similar areas and shapes, and are semi-circular plates, which are only an embodiment of the present invention and are not intended to limit the scope of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 may be plates with different areas and shapes, and may also be plates with square, oval or any geometric shape, for example, the area of the first shielding plate 151 may be larger than that of the second shielding plate 153.

Specifically, the first driving device 171 and the second driving device 173 can respectively drive the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 to move away from each other, so that the first shielding plate 151 and the second shielding plate 153 are operated in an open state, wherein a space 152 is formed between the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153, as shown in fig. 2. In addition, the first driving device 171 and the second driving device 173 can also drive the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 to approach each other, respectively, so that the first shielding plate 151 and the second shielding plate 153 operate in a shielding state, as shown in fig. 3. The operation of the first shielding plate 151 and the second shielding plate 153 will be described in detail in the following embodiments.

In an embodiment of the utility model, as shown in fig. 2 and 3, the first driving device 171 and the second driving device 173 include at least one driving motor 1711/1731 and a shaft sealing device 1713/1733, wherein the shaft sealing device 1713/1733 is connected to the reaction chamber 11, and a portion of the sealing device 1713/1733 is located in the accommodating space 12 of the reaction chamber 11. The first driving device 171 and the second driving device 173 are respectively connected to and drive the first shielding plate 151 and the second shielding plate 153 to synchronously rotate in opposite directions. The shaft seal 1713/1733 may be a common shaft seal, and is mainly used to isolate the receiving space 12 of the reaction chamber 11 from the external space so as to maintain the vacuum of the receiving space 12. In another embodiment of the present invention, the shaft seal device 1713/1733 may be a magnetic fluid shaft seal.

In practical applications, the first driving device 171 and the second driving device 173 may be connected to the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively. In an embodiment of the utility model, the first shielding plate 151 and the second shielding plate 153 are separable from the first connecting arm 141 and the second connecting arm 143, and the first shielding plate 151 and the second shielding plate 153 are disposed on the carrying surface 131 of the carrying tray 13, wherein the carrying surface 131 of the carrying tray 13 is used for carrying at least one substrate 163.

In an embodiment of the utility model, the first shielding plate 151 and the second shielding plate 153 may be disposed at different heights, for example, the first shielding plate 151 is higher than the second shielding plate 153, when the first shielding plate 151 and the second shielding plate 153 operate in the shielding state, a portion of the first shielding plate 151 overlaps a portion of the second shielding plate 153, and an overlapping region is formed between the first shielding plate 151 and the second shielding plate 153, so as to improve the shielding effect of the shielding member 15.

In an embodiment of the utility model, as shown in fig. 4, the first shielding plate 151 and the second shielding plate 153 are not operated in the shielding state, wherein the first inner side surface 1511 of the first shielding plate 151 includes at least one protrusion 1515, and the second inner side surface 1531 of the second shielding plate 153 includes at least one recess 1535. The protrusion 1515 of the first interior side 1511 corresponds to the recess 1535 of the second interior side 1531, wherein the protrusion 1515 has a volume slightly less than the recess 1535.

As shown in fig. 5, the operation of the first shielding plate 151 and the second shielding plate 153 in the shielding state according to the embodiment of the present invention can be defined as the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 approaching each other, wherein a gap 154 is formed between the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 in the shielding state.

When the first shielding plate 151 and the second shielding plate 153 are operated in the shielding state, the protrusion 1515 of the first inner side surface 1511 enters the recess 1535 of the second inner side surface 1531, wherein a gap 154 is also present between the protrusion 1515 and the recess 1535.

The gap 154 between the first inner side surface 1511 and the second inner side surface 1531 is less than a threshold, such as less than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact each other, and the protrusion 1515 of the first shielding plate 151 and the recess 1535 of the second shielding plate 153 do not directly contact each other, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process and contaminating the accommodating space 12 and/or the carrier tray 13 of the reaction chamber 11.

Specifically, the deposition tool 10 and/or the retractable shielding member 100 of the present invention can be operated in two states, i.e., an open state and a shielding state. As shown in fig. 2 and 6, the first driving device 171 and the second driving device 173 can respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in an open state. An interval 152 is formed between the first shielding plate 151 and the second shielding plate 153 in the open state, so that the first shielding plate 151 and the second shielding plate 153 are not present between the target 161, the susceptor 13 and the deposition machine.

The susceptor 13 and the substrate 163 may then be driven toward the target 161, and the process gas, such as an inert gas, in the receiving space 12 may impinge on the target 161 to deposit a thin film on the surface of the substrate 163.

In an embodiment of the utility model, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 separate a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, thereby preventing the formation of a deposited thin film on the surfaces of the reaction chamber 11 and the carrier plate 13 outside the reaction space.

As shown in fig. 3 and 7, the first driving device 171 and the second driving device 173 can respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 approach each other and operate in a shielding state. The first shielding plate 151 and the second shielding plate 153 form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the susceptor 13 and is used for shielding the susceptor 13 to isolate the target 161 from the susceptor 13.

The shielding member 15 can separate a cleaning space 121 in the accommodating space 12, wherein the cleaning space 121 is partially overlapped or close to the reaction space. A burn-in process may be performed in the cleaning space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space 121, and remove oxide, nitride or other contaminants on the surface of the target 161 and the deposited film on the surface of the reaction chamber 11 and/or the stopper 111.

During the cleaning process of the deposition tool 10, the susceptor 13 and/or the substrate 163 are shielded or isolated by the shielding member 15 to prevent the substances generated during the cleaning process from contaminating or depositing on the surface of the susceptor 13 and/or the substrate 163.

In an embodiment of the utility model, as shown in fig. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielding state in the accommodating space 12 of the reaction chamber 11 without additionally providing one or more storage chambers for storing the shielding plates in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 may be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.

In an embodiment of the present invention, a plurality of position sensing units 19 may be further disposed on the reaction chamber 11, for example, the position sensing units 19 may be light sensing units. The position sensing unit 19 faces the accommodating space 12 and is configured to sense positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state, and to avoid an abnormal collision of the carrier tray 13 and the first shielding plate 151 and the second shielding plate 153.

In addition, the position of the retractable shielding member 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or lines on the deposition tool 10. Taking the accommodating space 12 of the reaction chamber 11 as a cube as an example, as shown in fig. 6 and 7, the first and second driving devices 171/173 of the retractable shielding member 100 may be disposed at the side of the reaction chamber 11 and/or the accommodating space 12. As shown in fig. 8, the first and second driving devices 171/173 of the retractable shielding member 100 can also be disposed at the corners or corners of the reaction chamber 11 and/or the accommodating space 12, so as to facilitate disposing mechanisms such as the substrate 163 feeding port and the gas exhaust line at the side of the reaction chamber 11.

In an embodiment of the utility model, the reaction chamber 11 may be connected to two sensing regions 113, wherein the sensing regions 113 protrude from a side surface of the reaction chamber 11, and the thickness of the sensing regions 113 is smaller than that of the reaction chamber 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing regions 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than that of the accommodating space 12. When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, a portion of the first shielding plate 151 and a portion of the second shielding plate 153 enter the two sensing spaces 120 fluidly connected to the accommodating space 12, respectively, wherein the areas of the first shielding plate 151 and the second shielding plate 153 located in the sensing spaces 120 are smaller than the areas of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12.

As shown in fig. 8, two sensing regions 113 are respectively disposed on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively disposed on the two sensing regions 113 for sensing the first shielding plate 151 and the second shielding plate 153 entering the sensing space 120.

The utility model has the advantages that:

when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning a deposition machine.

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, i.e., all equivalent variations and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.

Claims

1. A deposition machine with an open-close type shielding component is characterized by comprising:

a reaction cavity comprising a containing space;

a bearing disc which is positioned in the containing space and is used for bearing at least one substrate; and

an openable shade member comprising:

a first shielding plate located in the accommodating space;

the second shielding plate is positioned in the accommodating space, wherein the height of the first shielding plate is higher than that of the second shielding plate;

a first driving device connected to the first shielding plate; and

and the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing towards opposite directions, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, the first shielding plate and the second shielding plate in the shielding state are close to each other, and part of the first shielding plate and part of the second shielding plate are overlapped to shield the bearing disc.

2. The deposition apparatus with an opening/closing shielding member as claimed in claim 1, wherein the first driving device and the second driving device respectively comprise a shaft sealing device and at least one driving motor, and the driving motors of the first driving device and the second driving device are respectively connected to the first shielding plate and the second shielding plate through the shaft sealing device.

3. The apparatus of claim 1, comprising a first connecting arm and a second connecting arm, wherein the first driving device is connected to the first shielding plate via the first connecting arm, and the second driving device is connected to the second shielding plate via the second connecting arm.

4. The deposition apparatus of claim 1, comprising a plurality of position sensing units disposed in the reaction chamber and configured to sense positions of the first shielding plate and the second shielding plate.

5. The deposition apparatus with an opening/closing type shielding member of claim 1, wherein two sensing regions are connected to the reaction chamber, each of the two sensing regions comprises a sensing space in fluid communication with the receiving space, wherein the first shielding plate and the second shielding plate are operated in the open state, and a portion of the first shielding plate and a portion of the second shielding plate are respectively located in the sensing spaces of the two sensing regions.

6. The deposition apparatus with an opening/closing type shielding member as claimed in claim 5, wherein a plurality of position sensing units are disposed in the two sensing regions and are configured to sense the first shielding plate and the second shielding plate entering the sensing space.