CN216141613U - Shielding mechanism and deposition chamber with same - Google Patents
Shielding mechanism and deposition chamber with same Download PDFInfo
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- CN216141613U CN216141613U CN202121457170.4U CN202121457170U CN216141613U CN 216141613 U CN216141613 U CN 216141613U CN 202121457170 U CN202121457170 U CN 202121457170U CN 216141613 U CN216141613 U CN 216141613U
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Abstract
The utility model provides a deposition chamber with a shielding mechanism, which mainly comprises a reaction chamber, a bearing plate and a shielding mechanism, wherein part of the shielding mechanism and the bearing plate are positioned in the reaction chamber. The shielding mechanism comprises a first bearing arm, a second bearing arm, a first shielding plate, a second shielding plate and a driving device, wherein the driving device is connected with the first bearing arm and the second bearing arm and bears the first shielding plate and the second shielding plate through the first bearing arm and the second bearing arm so as to drive the first shielding plate and the second shielding plate to swing towards opposite directions. When the cleaning process is carried out, the driving device drives the first and second shielding plates to approach each other, and the first and second shielding plates operated in the shielding state are placed on the bearing plate to shield the pollution generated in the process of cleaning the deposition cavity.
Description
Technical Field
The utility model relates to a deposition chamber with a shielding mechanism, which mainly shields a bearing plate through the shielding mechanism so as to avoid polluting the bearing plate in the process of cleaning a processing chamber.
Background
Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposition film, and thus the chamber needs to be periodically cleaned to prevent the deposition film from falling off during the process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber by a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.
SUMMERY OF THE UTILITY MODEL
Generally, after a period of use, the deposition chamber is typically cleaned to remove oxide or nitride from the films and targets deposited in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The utility model provides a shielding mechanism and a deposition cavity with the same. The shielding plate operated in the shielding state can be placed on the bearing plate and shields the bearing plate so as to avoid the pollution of particles generated when the cavity or the target material is cleaned on the bearing plate.
An objective of the present invention is to provide a deposition chamber with a shielding mechanism, which mainly includes a reaction chamber, a carrier plate and a shielding mechanism. The shielding mechanism comprises a driving device, two bearing arms and two shielding plates, wherein the driving device respectively bears the two shielding plates through the two bearing arms and respectively drives the two shielding plates to swing towards opposite directions, so that the two shielding plates are operated in an opening state or a shielding state.
When the reaction cavity is cleaned, the driving device drives the two shielding plates to approach each other in a swinging mode, then the two shielding plates are placed on the bearing plate, and the bearing plate in the accommodating space is shielded by the two shielding plates, so that plasma used in the cleaning process or pollution generated in the cleaning process is prevented from contacting the bearing plate. When the deposition process is carried out, the driving device drives the two shielding plates to move away from each other in a swinging mode, and the thin film deposition can be carried out on the substrate in the reaction cavity.
In addition, the two shielding plates arranged on the bearing plate are partially overlapped, so that the shielding plates can completely shield the bearing plate and can effectively isolate the bearing plate from a pollution source. The overlapped parts of the two shielding plates are not in direct contact, thereby avoiding the generation of particles in the contact process of the two shielding plates and reducing the pollution to the reaction cavity.
An objective of the present invention is to provide a deposition chamber with a shielding mechanism, wherein two shielding plates form a complete shielding member, so as to reduce the space required for accommodating the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, wherein the two shielding plates can be operated in an open state or a shielding state in the accommodating space of the reaction chamber, so as to simplify the structure of the reaction chamber and reduce the volume of the reaction chamber.
An objective of the present invention is to provide a deposition chamber with a shielding mechanism, in which a driving device is connected to and supports two shielding plates through two supporting arms, respectively, so as to reduce the load of the supporting arms. In addition, a shielding plate with larger thickness can be further used to prevent the shielding plate from generating high-temperature deformation when the deposition cavity is cleaned, and the effect of shielding the bearing disc by the shielding plate is improved.
In order to achieve the above object, the present invention provides a deposition chamber with a shielding mechanism, comprising: a reaction chamber, comprising an accommodating space: the bearing disc is positioned in the accommodating space and comprises a bearing surface for bearing at least one substrate; and a shielding mechanism, comprising: the first bearing arm is positioned in the accommodating space and comprises a plurality of first grooves; the second bearing arm is positioned in the accommodating space and comprises a plurality of second grooves; a first shielding plate, wherein one surface of the first shielding plate comprises a plurality of first supporting legs, the first shielding plate is arranged on the first bearing arm, and the plurality of first supporting legs are respectively positioned in the plurality of first grooves; a second shielding plate, wherein one surface of the second shielding plate comprises a plurality of second supporting legs, the second shielding plate is arranged on the second bearing arm, the plurality of second supporting legs are respectively positioned in the plurality of second grooves, and the height of the first shielding plate is higher than that of the second shielding plate; and the driving device is connected with the first bearing arm and the second bearing arm and drives the first shielding plate and the second shielding plate to swing towards opposite directions through the first bearing arm and the second bearing arm respectively so as to switch the first shielding plate and the second shielding plate between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are placed on the bearing surface of the bearing disc through the first supporting foot and the second supporting foot respectively, and part of the first shielding plate is overlapped with part of the second shielding plate to shield the bearing disc.
The utility model provides a shielding mechanism, which is suitable for a deposition cavity and comprises: a first carrying arm including a plurality of first grooves; a second bearing arm including a plurality of second grooves; a first shielding plate, wherein one surface of the first shielding plate comprises a plurality of first supporting legs, the first shielding plate is arranged on the first bearing arm, and the plurality of first supporting legs are respectively positioned in the plurality of first grooves; a second shielding plate, wherein one surface of the second shielding plate comprises a plurality of second supporting legs, the second shielding plate is arranged on the second bearing arm, the plurality of second supporting legs are respectively positioned in the plurality of second grooves, and the height of the first shielding plate is higher than that of the second shielding plate; and the driving device is connected with the first bearing arm and the second bearing arm and drives the first shielding plate and the second shielding plate to swing towards opposite directions through the first bearing arm and the second bearing arm respectively, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein part of the first shielding plate in the shielding state is overlapped with part of the second shielding plate, and a spacing space is formed between the first shielding plate in the opening state and the second shielding plate in the shielding state.
The deposition chamber and the shielding mechanism thereof, wherein the driving device comprises a shaft sealing device and at least one driving motor, and the driving motor is connected with the first bearing arm and the second bearing arm through the shaft sealing device.
The deposition chamber and the shielding mechanism thereof are characterized in that the shaft sealing device comprises an outer pipe body and a shaft body, the outer pipe body comprises a space for accommodating the shaft body, the driving motor is connected with the first bearing arm through the outer pipe body, is connected with the second bearing arm through the shaft body, and synchronously drives the shaft body and the outer pipe body to rotate towards opposite directions.
The deposition chamber and the shielding mechanism thereof are characterized in that the first shielding plate comprises a first inner side surface, the second shielding plate comprises a second inner side surface, the first inner side surface is opposite to the second inner side surface, the first groove is communicated with the first inner side surface of the first shielding plate, and the second groove is communicated with the second inner side surface of the second shielding plate.
The deposition chamber and the shielding mechanism thereof, wherein the first shielding plate and the second shielding plate comprise at least one first aligning portion, the first carrying arm and the second carrying arm comprise at least one second aligning portion, the first shielding plate aligns the first carrying arm through the first aligning portion and the second aligning portion, and the second shielding plate aligns the second carrying arm through the first aligning portion and the second aligning portion.
The deposition cavity and the shielding mechanism thereof comprise two sensing areas connected with the reaction cavity, the two sensing areas respectively comprise a sensing space in fluid connection with the accommodating space, the thickness of the two sensing areas is smaller than that of the reaction cavity, and the two sensing areas are respectively provided with at least one position sensing unit for sensing the first shielding plate and the second shielding plate entering the sensing areas.
The utility model has the beneficial effects that: when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning a film deposition machine.
Drawings
FIG. 1 is a schematic side sectional view of one embodiment of a deposition chamber with a shadow mechanism operating in a shadow state according to the present invention.
FIG. 2 is a schematic perspective view and an enlarged sectional perspective view of a masking mechanism of a deposition chamber according to an embodiment of the present invention in a masking state.
FIG. 3 is an exploded view of a shielding mechanism of a deposition chamber according to an embodiment of the utility model.
Fig. 4 is a schematic perspective view of a driving device and a carrying arm of a shielding mechanism according to an embodiment of the utility model.
Fig. 5 is a schematic perspective cross-sectional view of a driving device of a shielding mechanism according to an embodiment of the present invention.
FIG. 6 is a top view of an embodiment of a deposition chamber with a shutter mechanism operating in an open state according to the present invention.
FIG. 7 is a top view of an embodiment of a deposition chamber with a shutter mechanism operating in a shutter state according to the present invention.
FIG. 8 is a top view of another embodiment of a deposition chamber with a shutter mechanism of the present invention operating in an open position.
Description of reference numerals: 10-a film deposition chamber; 100-a shielding mechanism; 11-a reaction chamber; a 111-stop; 112-opening; 113-a sensing region; 12-an accommodating space; 120-a sensing space; 121-cleaning the space; 13-a carrier tray; 131-a bearing surface; 141-a first carrying arm; 1410-a first medial side; 1411-a second alignment portion; 1413-a first trench; 143-a second carrying arm; 1430-a second medial side; 1431-a second alignment portion; 1433 — a second trench; 15-a shield; 151-first shield plate; 1511-first alignment portion; 1513-first support leg; 152-space; 153-a second shield plate; 1531 — a first alignment portion; 1533-second support foot; 154-overlapping area; 161-target material; 17-a drive device; 171-a drive motor; 173-a shaft seal arrangement; 1731-outer body; 1732-space; 1733-a shaft body; 18-a lifting device; 19-position sensing unit.
Detailed Description
FIG. 1 is a schematic side cross-sectional view of a deposition chamber with a shielding mechanism according to an embodiment of the present invention in a shielding state. As shown in the figure, the deposition chamber 10 mainly includes a reaction chamber 11, a carrier plate 13 and a shielding mechanism 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 13 and a part of the shielding mechanism 100.
The carrier tray 13 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for carrying at least one substrate. Taking the deposition chamber 10 as a physical vapor deposition chamber as an example, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the susceptor 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the susceptor 13 and/or the substrate in the accommodating space 12.
Referring to fig. 2 and fig. 3, the shielding mechanism 100 includes a first carrying arm 141, a second carrying arm 143, a first shielding plate 151, a second shielding plate 153, and a driving device 17, wherein the first carrying arm 141, the second carrying arm 143, the first shielding plate 151, and the second shielding plate 153 are located in the accommodating space 12. The driving device 17 is connected to the first carrying arm 141 and the second carrying arm 143, wherein the first carrying arm 141 and the second carrying arm 143 are respectively used for carrying the first shielding plate 151 and the second shielding plate 153. The driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions through the first carrying arm 141 and the second carrying arm 143, for example, the first carrying arm 141 and the second carrying arm 143 swing synchronously in opposite directions with the driving device 17 as an axis.
The surface of the first shielding plate 151 connected to the first supporting arm 141 may be provided with at least one first supporting leg 1513 and/or at least one first positioning portion 1511, and the surface of the first supporting arm 141 connected to the first shielding plate 151 may be provided with at least one first groove 1413 and/or at least one second positioning portion 1411. When the first shielding plate 151 is disposed on the first carrying arm 141, the first groove 1413 and the second positioning portion 1411 respectively receive and correspond to the first supporting leg 1513 and the first positioning portion 1511.
The surface of the second shielding plate 153 connected to the second supporting arm 143 may be provided with at least one second supporting leg 1533 and/or at least one first positioning portion 1531, and the surface of the second supporting arm 143 connected to the second shielding plate 153 may be provided with at least one second groove 1433 and/or at least one second positioning portion 1431, wherein the second groove 1433 and the second positioning portion 1431 respectively accommodate and correspond to the second supporting leg 1533 and the first positioning portion 1531.
Specifically, the first positioning portion 1511/1531 and the second positioning portion 1411/1431 may be configured to align the first shielding plate 151 and the first carrying arm 141, and the second shielding plate 153 and the second carrying arm 143. For example, the first positioning portion 1511/1531 may be a cone protruding out of the surface of the first shielding plate 151 and the second shielding plate 153, wherein the cross-sectional area of the first positioning portion 1511/1531 near the surface of the first shielding plate 151 and the second shielding plate 153 is larger, and the second positioning portion 1411/1431 may be a cone-shaped groove or a cavity disposed on the surface of the first carrying arm 141 and the second carrying arm 143, wherein the cross-sectional area of the second positioning portion 1411/1431 on the surface of the first shielding plate 151 and the second shielding plate 153 for carrying the first carrying arm 141 and the second carrying arm 143 is larger. The first supporting leg 1513 and the second supporting leg 1533 may be column-shaped protrusions disposed on the surfaces of the first shielding plate 151 and the second shielding plate 153.
When the first shielding plate 151 and the second shielding plate 153 are disposed on the first carrying arm 141 and the second carrying arm 143, the first positioning portion 1511/1531 and the second positioning portion 1411/1431 can guide the first shielding plate 151/153 to a specific or fixed position of the first carrying arm 141/143. The first positioning portion 1511/1531 and the second positioning portion 1411/1431 are protrusions and recesses, respectively, but the utility model is not limited to these embodiments, and the first positioning portion 1511/1531 and the second positioning portion 1411/1431 may be recesses and protrusions, respectively.
As shown in fig. 4, the first carrying arm 141 includes a first inner side surface 1410, and the second carrying arm 143 includes a second inner side surface 1430, wherein the first inner side surface 1410 of the first carrying arm 141 faces the second inner side surface 1430 of the second carrying arm 143. The first grooves 1413 of the first arm 141 communicate with the first inner surface 1410, and the second grooves 1433 of the second arm 143 communicate with the second inner surface 1430.
The first shielding plate 151 and the second shielding plate 153 are separated from the first carrying arm 141 and the second carrying arm 143, and are disposed on the carrying surface 131 of the carrying tray 13, wherein the carrying surface 131 of the carrying tray 13 is used for carrying at least one substrate.
The first shielding plate 151 and the second shielding plate 153 may be plate bodies, wherein the first shielding plate 151 and the second shielding plate 153 may have similar areas and shapes, for example, the first shielding plate 151 and the second shielding plate 153 may be semicircular plate bodies. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 approach each other to form a disc-shaped shielding member 15, and the carrying tray 13 is shielded by the shielding member 15.
Specifically, after the first shielding plate 151 and the second shielding plate 153 are close to each other and form the shielding member 15, the lifting device 18 can drive the carrier tray 13 to move toward the target 161, so that the first shielding plate 151 and the second shielding plate 153 are respectively placed on the carrier surface 131 of the carrier tray 13 through the first supporting leg 1513 and the second supporting leg 1533. Then, the driving device 17 can drive the first carrying arm 141 and the second carrying arm 143 to swing in opposite directions, so that the first carrying arm 141 and the second carrying arm 143 move away from each other.
After the first shielding plate 151 and the second shielding plate 153 are disposed on the carrying surface 131 of the carrying tray 13, the driving device 17 drives the first carrying arm 141 and the second carrying arm 143 to move away from each other. In various embodiments, after the first shielding plate 151 and the second shielding plate 13 are placed on the carrying surface 131 of the carrying tray 13, the first carrying arm 141 and the second carrying arm 143 can be kept still.
The operation of the first shielding plate 151 and the second shielding plate 153 in the shielding state according to the embodiment of the utility model can be defined as that the first shielding plate 151 and the second shielding plate 153 are close to each other until the distance between the two is smaller than a threshold, for example, smaller than 1 mm. In addition, the first shielding plate 151 and the second shielding plate 153 in the shielding state are respectively disposed on the supporting surface 131 of the carrier tray 13 through the first supporting leg 1513 and the second supporting leg 1533, and the first shielding plate 151 and the second shielding plate 153 are used to shield the carrier tray 13. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact each other, so as to prevent particles generated by the first shielding plate 151 and the second shielding plate 153 during the contact process from contaminating the accommodating space 12 of the reaction chamber 11 and/or the susceptor 13.
In an embodiment of the utility model, the first shielding plate 151 and the second shielding plate 153 may be disposed at different heights, for example, the first shielding plate 151 is higher than the second shielding plate 153, when the first shielding plate 151 and the second shielding plate 153 operate in the shielding state, a portion of the first shielding plate 151 overlaps a portion of the second shielding plate 153, and an overlapping region 154 is formed between the first shielding plate 151 and the second shielding plate 153, so as to improve the shielding effect of the shielding member 15.
The first shielding plate 151 and the second shielding plate 153 have similar areas and shapes, and are semi-circular plates, which are only an embodiment of the present invention and are not intended to limit the scope of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 may be plates with different areas and shapes, and may also be plates with square, oval or any geometric shape, for example, the area of the first shielding plate 151 may be larger than that of the second shielding plate 153.
Taking the first shielding plate 151 and the second shielding plate 153 as semicircular plates, the first shielding plate 151 and the second shielding plate 153 have a linear side and a semicircular or arc side, respectively, wherein the linear sides of the first shielding plate 151 and the second shielding plate 153 face each other. The first shielding plate 151 and the second shielding plate 153 are connected by straight side edges, which is only an embodiment of the present invention and is not intended to limit the scope of the present invention. In practical applications, the straight sides of the first shielding plate 151 and the second shielding plate 153 may also be curved or zigzag sides.
In an embodiment of the present invention, as shown in fig. 5, the driving device 17 includes at least one driving motor 171 and a shaft seal 173, wherein the driving motor 171 is connected to the first carrying arm 141 and the second carrying arm 143 through the shaft seal 173. The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, wherein a part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.
The shaft seal 173 includes an outer body 1731 and a shaft 1733. The outer tube 1731 includes a space 1732 for accommodating the shaft 1733, wherein the outer tube 1731 and the shaft 1733 are coaxially disposed, and the outer tube 1731 and the shaft 1733 can rotate relatively. The outer tube 1731 is connected to the first carrying arm 141, and is connected to and drives the first shielding plate 151 to swing via the first carrying arm 141. The shaft 1733 is connected to the second carrying arm 143, and is connected to and drives the second shielding plate 153 to swing via the second carrying arm 143.
The shaft seal 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from the external space so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft seal device 173 may be a magnetic fluid shaft seal.
In an embodiment of the utility model, as shown in fig. 5, the number of the driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube 1731 and the shaft 1733 of the sealing device 173 and respectively drive the outer tube 1731 and the shaft 1733 to synchronously rotate in opposite directions, so as to respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube 1731 and the shaft 1733.
In another embodiment of the present invention, the number of the driving motors 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are connected and driven to synchronously swing in opposite directions through a linkage mechanism via the first carrying arm 141 and the second carrying arm 143, respectively.
Specifically, the deposition chamber 10 and/or the shielding mechanism 100 of the present invention can be operated in two states, i.e., an open state and a shielding state. As shown in fig. 6, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in an open state. An interval 152 is formed between the first shielding plate 151 and the second shielding plate 153 in the open state, so that the first shielding plate 151 and the second shielding plate 153 are not present between the target 161, the susceptor 13 and the deposition chamber.
The susceptor 13 and the substrate may then be driven toward the target 161, and the gas, such as inert gas, in the accommodating space 12 may impact the target 161 to deposit a thin film on the surface of the substrate.
In an embodiment of the utility model, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrying plate 13 and the stopper 111 separate a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate in the reaction space, thereby preventing the formation of a deposited thin film on the surfaces of the reaction chamber 11 and the carrying plate 13 outside the reaction space.
Further, as shown in fig. 2 and 7, the driving device 17 may drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 approach each other and operate in a shielding state. The first shielding plate 151 and the second shielding plate 153 form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the susceptor 13 and is used for shielding the susceptor 13 to isolate the target 161 from the susceptor 13.
The shielding member 15 can separate a cleaning space 121 in the accommodating space 12, wherein the cleaning space 121 is partially overlapped or close to the reaction space. A burn-in process may be performed in the cleaning space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space 121, and remove oxide, nitride or other contaminants on the surface of the target 161 and the deposited film on the surface of the reaction chamber 11 and/or the stopper 111.
In an embodiment of the utility model, as shown in fig. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielding state in the accommodating space 12 of the reaction chamber 11 without additionally providing one or more storage chambers for storing the shielding plates in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 may be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.
In an embodiment of the present invention, a plurality of position sensing units 19 may be further disposed on the reaction chamber 11, for example, the position sensing units 19 may be light sensing units. The position sensing unit 19 faces the accommodating space 12 and is used for sensing the positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state, so as to prevent the carrier tray 13, the first shielding plate 151, and the second shielding plate 153 from abnormal collision.
In addition, the position of the shielding mechanism 100 in the reaction chamber 11 can be adjusted according to the arrangement of other mechanisms or moving lines on the deposition chamber 10. Taking the accommodating space 12 of the reaction chamber 11 as a cube as an example, as shown in fig. 6 and 7, the driving device 17 of the shielding mechanism 100 may be disposed at a side of the reaction chamber 11 and/or the accommodating space 12. As shown in fig. 8, the driving device 17 of the shielding mechanism 100 may also be disposed at a corner or a top corner of the reaction chamber 11 and/or the accommodating space 12, so as to facilitate disposing mechanisms such as a substrate feeding port and an exhaust line at a side of the reaction chamber 11.
In an embodiment of the utility model, the reaction chamber 11 may be connected to two sensing regions 113, wherein the sensing regions 113 protrude from a side surface of the reaction chamber 11, and the thickness of the sensing regions 113 is smaller than that of the reaction chamber 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing regions 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than that of the accommodating space 12. When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, a portion of the first shielding plate 151 and a portion of the second shielding plate 153 enter the two sensing spaces 120 fluidly connected to the accommodating space 12, respectively, wherein the areas of the first shielding plate 151 and the second shielding plate 153 located in the sensing spaces 120 are smaller than the areas of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12.
As shown in fig. 8, two sensing regions 113 are respectively disposed on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively disposed on the two sensing regions 113 for sensing the first shielding plate 151 and the second shielding plate 153 entering the sensing space 120.
The utility model has the advantages that:
when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning a film deposition machine.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, i.e., all equivalent variations and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.
Claims (6)
1. A deposition chamber with a shield mechanism, comprising:
a reaction chamber, comprising an accommodating space:
a bearing disc which is positioned in the containing space and comprises a bearing surface for bearing at least one substrate; and
a screening arrangement comprising:
a first bearing arm, located in the containing space and including a plurality of first grooves;
the second bearing arm is positioned in the accommodating space and comprises a plurality of second grooves;
a first shielding plate, wherein a surface of the first shielding plate comprises a plurality of first supporting legs, the first shielding plate is disposed on the first bearing arm, and the plurality of first supporting legs are respectively located in the plurality of first grooves;
a second shielding plate, wherein a surface of the second shielding plate comprises a plurality of second supporting legs, the second shielding plate is disposed on the second bearing arm, and the plurality of second supporting legs are respectively disposed in the plurality of second grooves, wherein the first shielding plate is higher than the second shielding plate; and
and the driving device is connected with the first bearing arm and the second bearing arm and drives the first shielding plate and the second shielding plate to swing towards opposite directions through the first bearing arm and the second bearing arm respectively so as to switch the first shielding plate and the second shielding plate between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are placed on the bearing surface of the bearing disc through the first supporting leg and the second supporting leg respectively, and part of the first shielding plate is overlapped with part of the second shielding plate to shield the bearing disc.
2. The deposition chamber of claim 1, wherein the driving device comprises a shaft seal and at least one driving motor, the driving motor is coupled to the first and second support arms via the shaft seal.
3. The deposition chamber of claim 2, wherein the shaft seal device comprises an outer body and a shaft, the outer body comprises a space for receiving the shaft, the driving motor is coupled to the first carrying arm through the outer body and coupled to the second carrying arm through the shaft, and synchronously drives the shaft and the outer body to rotate in opposite directions.
4. The deposition chamber of claim 1, wherein the first shield plate comprises a first inner side surface, the second shield plate comprises a second inner side surface, the first inner side surface faces the second inner side surface, the first groove communicates with the first inner side surface of the first shield plate, and the second groove communicates with the second inner side surface of the second shield plate.
5. The deposition chamber of claim 4, wherein the first and second shields comprise at least a first alignment portion and the first and second support arms comprise at least a second alignment portion, the first shield being aligned to the first support arm by the first and second alignment portions and the second shield being aligned to the second support arm by the first and second alignment portions.
6. The deposition chamber of claim 1, comprising two sensing regions connected to the reaction chamber, wherein the two sensing regions respectively comprise a sensing space in fluid connection with the receiving space, and the two sensing regions have a thickness smaller than that of the reaction chamber, and wherein the two sensing regions are respectively provided with at least one position sensing unit for sensing the first shielding plate and the second shielding plate entering the sensing regions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121457170.4U CN216141613U (en) | 2021-06-29 | 2021-06-29 | Shielding mechanism and deposition chamber with same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121457170.4U CN216141613U (en) | 2021-06-29 | 2021-06-29 | Shielding mechanism and deposition chamber with same |
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| CN216141613U true CN216141613U (en) | 2022-03-29 |
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| CN202121457170.4U Active CN216141613U (en) | 2021-06-29 | 2021-06-29 | Shielding mechanism and deposition chamber with same |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115537751A (en) * | 2021-06-29 | 2022-12-30 | 鑫天虹(厦门)科技有限公司 | Shielding mechanism and film deposition cavity with same |
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2021
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115537751A (en) * | 2021-06-29 | 2022-12-30 | 鑫天虹(厦门)科技有限公司 | Shielding mechanism and film deposition cavity with same |
| CN115537751B (en) * | 2021-06-29 | 2024-09-27 | 鑫天虹(厦门)科技有限公司 | Masking mechanism and thin film deposition chamber having the same |
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