TWM619996U - Opening and closing type shielding component and deposition machine having opening and closing type shielding component - Google Patents

Abstract

The present model provides a deposition machine with an opening and closing type shielding member, which mainly includes a reaction chamber, a carrying plate and an opening and closing type shielding member, and part of the opening and closing type shielding member and the carrying plate are located in the reaction chamber. The opening and closing shielding member includes a first shielding plate, a second shielding plate, a first driving device, and a second driving device, wherein the first and second driving devices are respectively connected to the first and second shielding plates and are driven respectively The first and second shielding plates swing in opposite directions. During the cleaning process, the driving device drives the first and second shielding plates to approach each other to shield the pollution generated during the cleaning of the deposition machine.

Description

Opening and closing type shielding member and deposition machine platform with opening and closing type shielding member

The present invention relates to a deposition machine with an opening and closing type shielding member, which mainly shields a carrying plate through the opening and closing type shielding member, so as to avoid contamination of the carrying plate in the process of cleaning a processing chamber.

Chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) are all commonly used thin film deposition equipment, and are commonly used in integrated circuits, light-emitting diodes, and display manufacturing processes.

The deposition equipment mainly includes a cavity and a wafer carrier. The wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the cavity, where the target material faces the wafer on the wafer carrier tray. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the cavity, bias voltage is applied to the target and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated through the wafer carrier.

The inert gas in the cavity forms ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias on the target material and bombard the target material. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and are deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the cavity. Therefore, the cavity needs to be cleaned periodically to prevent the deposited film from falling during the manufacturing process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so it is also necessary to clean the target periodically. Generally speaking, a burn-in process is used to strike a target in the cavity with plasma ions to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to remove the wafer carrier and the wafer from the cavity or isolate the wafer carrier to avoid contamination of the wafer carrier and wafer during the cleaning process.

Generally speaking, after a period of use, the deposition machine usually needs to be cleaned to remove the oxide or nitride on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and contaminants. This model proposes an opening and closing shielding member and a deposition machine with an opening and closing shielding member. Two driving devices are used to drive two shielding plates to swing in opposite directions, so that the two shielding plates operate in an open state and a shielding state. . The shielding plate operating in the shielding state can be used to shield the carrier tray to avoid contamination of the carrier tray with particles generated when cleaning the cavity or the target material.

An object of the present invention is to provide a deposition machine with an opening and closing type shielding member, which mainly includes a reaction chamber, a supporting plate and an opening and closing type shielding member. The opening and closing shielding member includes two driving devices and two shielding plates, and the two driving devices are respectively connected to the two shielding plates.

When cleaning the reaction chamber, the two driving devices respectively drive the two shielding plates to approach each other in a swinging manner, and use the two shielding plates to shield the carrier plate in the accommodating space, so as to avoid the use of plasma or the generation of plasma during the cleaning process. The contamination contacts the carrier plate. During the deposition process, the two driving devices respectively drive the two shielding plates to move away from each other in a swinging manner, and can deposit thin films on the substrate in the reaction chamber.

In addition, the two shielding plates operating in the shielding state partially overlap, so that the shielding plates can completely shield the carrier tray and can effectively isolate the carrier tray and pollution sources. The overlapping parts of the two shielding plates are not in direct contact, which can avoid the generation of particles during the contact between the two shielding plates, thereby reducing pollution to the reaction chamber.

An object of the present invention is to provide a deposition machine with an open-close type shielding member, which mainly constitutes a complete shielding piece through two shielding plates, which can reduce the space required for storing the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, and the two shielding plates can be operated in the open state or the shielded state in the accommodating space of the reaction chamber. , Can simplify the structure of the reaction chamber and reduce the volume of the reaction chamber. In addition, a shielding plate with a larger thickness can be further used to prevent high-temperature deformation of the shielding plate when cleaning the deposition machine table, and to improve the effect of the shielding plate to shield the carrier plate.

In order to achieve the above objective, the present invention proposes a deposition machine with an opening and closing type shielding member, which includes: a reaction chamber, including an accommodating space; a carrier plate, located in the accommodating space, and used to carry at least one substrate; And an opening and closing shielding member, including: a first shielding plate located in the accommodating space; a second shielding plate located in the accommodating space; a first driving device connected to the first shielding plate, wherein the first shielding plate Is higher than the second shielding plate; and a second driving device connected to the second shielding plate, wherein the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first A shielding plate and a second shielding plate are operated to switch between an open state and a shielding state, where the first shielding plate and the second shielding plate in the shielding state will be close to each other, and part of the first shielding plate and part of the second shielding The plates overlap to cover the carrier tray.

The present model proposes an opening and closing type shielding member suitable for a deposition machine, comprising: a first shielding plate; a second shielding plate; a first driving device connected to the first shielding plate, wherein the height of the first shielding plate is high On the second shielding plate; and a second driving device connected to the second shielding plate, wherein the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate And the second shielding plate are switched between an open state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state overlap, and the first shielding plate and the second shielding plate in the open state are far away from each other, A space is formed between the first shielding plate and the second shielding plate.

The deposition machine with the opening and closing shielding member and the opening and closing shielding member, wherein the first driving device and the second driving device respectively include a shaft sealing device and at least one driving motor, and the driving of the first driving device and the second driving device The motors are respectively connected to the first shielding plate and the second shielding plate through a shaft sealing device.

The deposition machine with the opening and closing type shielding member and the opening and closing type shielding member include a first connecting arm and a second connecting arm, the first driving device is connected to the first shielding plate through the first connecting arm, and the second driving The device is connected to the second shielding plate through the second connecting arm.

The deposition machine with the opening and closing shielding member and the opening and closing shielding member include a plurality of position sensing units arranged in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate.

The deposition machine with the opening and closing type shielding member and the opening and closing type shielding member include two sensing areas connected to the reaction chamber, and the two sensing areas respectively include a sensing space and fluidly connected accommodating space, wherein the first shielding The plate and the second shielding plate are operated in an open state, and part of the first shielding plate and part of the second shielding plate are respectively located in the sensing space of the two sensing areas.

The deposition machine with the opening and closing shielding member and the opening and closing shielding member include a plurality of position sensing units arranged in two sensing areas and used for sensing the first shielding plate and the second shielding entering the sensing space plate.

In the deposition machine with the opening-closing shielding member and the opening-closing shielding member, the area of the first shielding plate is larger than the area of the second shielding plate.

Please refer to FIG. 1, which is a schematic side sectional view of an embodiment of a deposition machine with an open-close type shielding member operating in a shielding state. As shown in the figure, the deposition machine 10 mainly includes a reaction chamber 11, a carrier plate 13 and an opening and closing shielding member 100. The reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 13 and part of the The opening and closing type shielding member 100.

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 11 and is used to carry at least one substrate 163. Taking the deposition machine 10 as a physical vapor deposition chamber as an example, a target 161 is set in the reaction chamber 11, and the target 161 faces the carrier plate 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the carrier plate 13 and/or the substrate 163 in the accommodating space 12.

Please refer to FIGS. 2 and 3 together, the opening and closing shielding member 100 includes a first shielding plate 151, a second shielding plate 153, a first driving device 171, and a second driving device 173, wherein the first shielding plate 151 and The second shielding plate 153 is located in the accommodating space 12, and part of the first driving device 171 and part of the second driving device 173 are located in the accommodating space 12.

The first driving device 171 and the second driving device 173 are respectively connected to the first shielding plate 151 and the second shielding plate 153, and respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, such as the first shielding plate 151 The second shielding plate 153 and the first driving device 171 and the second driving device 173 are respectively used as axes to synchronously swing in opposite directions.

As shown in FIG. 2, the first shielding plate 151 includes a first inner side surface 1511 and at least one first outer side surface 1513, and the second shielding plate 153 includes a second inner side surface 1531 and at least one second outer side surface 1533. The first inner side 1511 of the first shielding plate 151 faces the second inner side 1531 of the second shielding plate 153.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 may be plate bodies, wherein the area and shape of the first shielding plate 151 and the second shielding plate 153 may be similar, for example, the first shielding plate 151 And the second shielding plate 153 can be a semicircular plate body. When the first driving device 171 and the second driving device 173 drive the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 will approach each other and form a circular plate-shaped shielding member 15 .

The area and shape of the above-mentioned first shielding plate 151 and the second shielding plate 153 are similar, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, or can be square, elliptical, or any geometrical shape, such as the area of the first shielding plate 151 The area of the second shielding plate 153 may be larger.

Specifically, the first driving device 171 and the second driving device 173 can respectively drive the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 to move away from each other, so that the first shielding plate 151 The second shielding plate 153 and the second shielding plate 153 are operated in the open state, wherein a space 152 is formed between the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153, as shown in FIG. 2. In addition, the first driving device 171 and the second driving device 173 can also drive the first inner side surface 1511 of the first shielding plate 151 and the second inner side surface 1531 of the second shielding plate 153 to be close to each other, so that the first shielding plate 151 and The second shielding plate 153 is operated in a shielding state, as shown in FIG. 3. The operation modes of the first shielding plate 151 and the second shielding plate 153 will be described in detail in the following embodiments.

In an embodiment of the present invention, as shown in FIGS. 2 and 3, the first driving device 171 and the second driving device 173 include at least one driving motor 1711/1731 and a shaft sealing device 1713/1733, wherein the shaft sealing device 1713 1733 is connected to the reaction chamber 11, and some packaging devices 1713/1733 are located in the accommodating space 12 of the reaction chamber 11. The first driving device 171 and the second driving device 173 are respectively connected to and drive the first shielding plate 151 and the second shielding plate 153 to synchronously rotate in opposite directions. The shaft sealing device 1713/1733 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from an external space, so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft seal device 1713/1733 may be a magnetic fluid shaft seal.

In practical applications, the first driving device 171 and the second driving device 173 can be connected to the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively. In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be separated from the first connecting arm 141 and the second connecting arm 143, and the first shielding arm plate 151 and the second shielding plate 153 are placed on The supporting surface of the supporting plate 13, wherein the supporting surface of the supporting plate 13 is used for supporting at least one substrate 163.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be set at different heights. For example, the first shielding plate 151 is higher than the second shielding plate 153. When the plate 153 is operated in the shielding state, part of the first shielding plate 151 and part of the second shielding plate 153 will overlap, and an overlapping area is formed between the first shielding plate 151 and the second shielding plate 153 to improve the shielding 15 occlusion effect.

In an embodiment of the present invention, as shown in FIG. 4, the first shielding plate 151 and the second shielding plate 153 are not operated in the shielding state, wherein the first inner side 1511 of the first shielding plate 151 includes at least one convex portion 1515, The second inner surface 1531 of the second shielding plate 153 includes at least one recess 1535. The convex portion 1515 of the first inner side surface 1511 corresponds to the concave portion 1535 of the second inner side surface 1531, wherein the volume of the convex portion 1515 is slightly smaller than the concave portion 1535.

As shown in FIG. 5, the first shielding plate 151 and the second shielding plate 153 according to the embodiment of the present invention are operated in the shielding state, which can be defined as the first inner side 1511 of the first shielding plate 151 and the second shielding plate 153 The second inner side surfaces 1531 of each are close to each other, wherein a gap 154 is formed between the first inner side surface 1511 of the first shielding plate 151 operating in the shielding state and the second inner side surface 1531 of the second shielding plate 153.

When the first shielding plate 151 and the second shielding plate 153 are operated in the shielding state, the convex portion 1515 of the first inner side surface 1511 will enter the concave portion 1535 of the second inner side surface 1531, and there will also be between the convex portion 1515 and the concave portion 1535 Gap 154.

The gap 154 between the first inner side surface 1511 and the second inner side surface 1531 is smaller than a threshold value, for example, smaller than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact, and the convex part 1515 of the first shielding plate 151 and the concave part 1535 of the second shielding plate 153 do not directly contact, so as to prevent the first shielding The plate 151 and the second shielding plate 153 generate particles during the contact process, which contaminate the accommodating space 12 of the reaction chamber 11 and/or the carrier plate 13.

Specifically, the deposition machine 10 and/or the open-close shielding member 100 of the present invention can be operated in two states, namely, an open state and a shielding state. As shown in FIGS. 2 and 6, the first driving device 171 and the second driving device 173 can respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are far away from each other and operate in the open state. A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 operating in the open state, so that there is no first shielding plate 151 and second shielding between the target 161 and the carrier plate 13 and the deposition machine.板153.

Then, the carrier plate 13 and the substrate 163 can be driven to approach the target 161, and the process gas, such as inert gas, in the containing space 12 can hit the target 161 to deposit a thin film on the surface of the substrate 163.

In an embodiment of the present invention, as shown in FIG. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 partition a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, which can prevent the reaction chamber 11 and the reaction space outside the reaction space. A deposited film is formed on the surface of the carrier plate 13.

In addition, as shown in FIGS. 3 and 7, the first driving device 171 and the second driving device 173 can respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 151 The shielding plates 153 are close to each other and operate in a shielding state. The first shielding plate 151 and the second shielding plate 153 can form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the carrier plate 13 and is used to shield the carrier plate 13 to isolate the target material 161 and the carrier plate 13.

The shielding member 15 may partition a clean space 121 in the accommodating space 12, wherein the clean space 121 and the reaction space partially overlap or are close to each other. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space 121, and to remove oxides and nitrides on the surface of the target 161 Or other contaminants, and the deposition film on the surface of the reaction chamber 11 and/or the stopper 111.

In the process of cleaning the deposition machine 10, the carrier plate 13 and/or the substrate 163 will be shielded or isolated by the shielding member 15 to avoid contamination or deposition on the surface of the carrier plate 13 and/or the substrate 163 by substances generated during the cleaning process.

In an embodiment of the present invention, as shown in FIGS. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielded state in the accommodating space 12 of the reaction chamber 11, without One or more storage cavities need to be additionally provided to store the shielding plate in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 can be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.

In an embodiment of the present invention, a plurality of position sensing units 19 may be further provided on the reaction chamber 11, for example, the position sensing unit 19 may be a light sensing unit. The position sensing unit 19 faces the accommodating space 12 and is used to sense the positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state, and Avoid abnormal collision of the tray 13, the first shielding plate 151 and the second shielding plate 153.

In addition, the position of the open-close shielding member 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or moving lines on the deposition machine 10. Taking the accommodating space 12 of the reaction chamber 11 as a cube as an example, as shown in FIG. 6 and FIG. The side of the accommodating space 12. As shown in FIG. 8, the first and second driving devices 171/173 of the opening-and-closing shielding member 100 can also be arranged at the corners or top corners of the reaction chamber 11/or the accommodating space 12, so as to facilitate the installation in the reaction chamber 11 A substrate 163 feed port and a suction pipeline are provided on the side.

In an embodiment of the present invention, the reaction cavity 11 can be connected to two sensing areas 113, wherein the sensing area 113 protrudes from the side surface of the reaction cavity 11, and the thickness of the sensing area 113 is smaller than that of the reaction cavity 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing region 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than the accommodating space 12 . When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, part of the first shielding plate 151 and part of the second shielding plate 153 will respectively enter the two sensing spaces 120 fluidly connected to the accommodation space 12. The area of the first shielding plate 151 and the second shielding plate 153 located in the sensing space 120 is smaller than the area of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12.

As shown in FIG. 8, two sensing areas 113 are respectively disposed on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively disposed on the two sensing areas 113, respectively for sensing The first shielding plate 151 and the second shielding plate 153 that enter the sensing space 120 are detected.

The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10: Deposition machine 100: Open and close shielding member 11: Reaction chamber 111: stop 112: opening 113: Sensing area 12: accommodating space 120: Sensing Space 121: clean space 13: Carrier plate 141: First connecting arm 143: second connecting arm 15: Shield 151: The first shielding board 1511: first inner side 1513: first outer side 1515: convex 152: Interval 153: The second shielding board 1531: second inner side 1533: second outer side 1535: recess 154: Gap 161: Target 163: Substrate 171: The first drive device 1711: drive motor 1713: Shaft seal device 173: second drive device 1731: drive motor 1733: Shaft seal device 19: Position sensing unit

[Figure 1] is a schematic side sectional view of an embodiment of a new type of deposition machine with an open-close shielding member operating in a shielded state.

[Figure 2] is a three-dimensional schematic diagram of an embodiment of the opening and closing shielding member of the new deposition machine operating in an open state.

[Figure 3] is a three-dimensional schematic diagram of an embodiment of the opening and closing shielding member of the new deposition machine operating in the shielding state.

[Fig. 4] is a schematic partial enlarged cross-sectional view of an embodiment of the new open-close shielding member in a shielding state when it is not operated.

[Figure 5] is a partial enlarged schematic cross-sectional view of an embodiment of the new open-close shielding member operating in the shielding state.

[Figure 6] is a top view of an embodiment of the new deposition machine with an open-close shielding member operating in an open state.

[Figure 7] is a top view of an embodiment of a new type of deposition machine with an opening and closing shielding member operating in a shielded state.

[Figure 8] is a top view of another embodiment of the deposition machine with an open-close shielding member operating in an open state.

10: Deposition machine

100: Open and close shielding member

11: Reaction chamber

111: stop

112: opening

12: accommodating space

121: clean space

13: Carrier plate

141: First connecting arm

143: second connecting arm

15: Shield

151: The first shielding board

153: The second shielding board

161: Target

163: Substrate

171: The first drive device

173: second drive device

Claims (10)

A deposition machine with an opening and closing type shielding member, including: A reaction chamber, including an accommodating space; A carrying tray located in the accommodating space and used for carrying at least one substrate; and An open and close type shielding member, including: A first shielding plate located in the accommodating space; A second shielding plate located in the accommodating space, wherein the height of the first shielding plate is higher than that of the second shielding plate; A first driving device connected to the first shielding plate; and A second driving device is connected to the second shielding plate, wherein the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and The second shielding plate is operated to switch between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state will be close to each other, and part of the first shielding plate and part of the first shielding plate will be close to each other. The two shielding plates overlap to shield the carrying tray. The deposition machine with an opening and closing type shielding member according to claim 1, wherein the first driving device and the second driving device respectively include a shaft sealing device and at least one driving motor, the first driving device and the second driving device The driving motor of the device is respectively connected to the first shielding plate and the second shielding plate through the shaft sealing device. The deposition machine with an opening and closing shielding member according to claim 1, comprising a first connecting arm and a second connecting arm, the first driving device is connected to the first shielding plate through the first connecting arm, and the The second driving device is connected to the second shielding plate through the second connecting arm. The deposition machine with an open-close shielding member according to claim 1, including a plurality of position sensing units arranged in the reaction chamber and used for sensing the positions of the first shielding plate and the second shielding plate. The deposition machine with an open-close shielding member as described in claim 1, comprising two sensing areas connected to the reaction chamber, the two sensing areas each include a sensing space fluidly connected to the accommodating space, wherein the The first shielding plate and the second shielding plate are operated in the open state, and part of the first shielding plate and part of the second shielding plate are respectively located in the sensing space of the two sensing areas. The deposition machine with an opening and closing shielding member according to claim 5, comprising a plurality of position sensing units arranged in the two sensing areas, and used for sensing the first shielding plate and the first shielding plate entering the sensing space The second shielding board. An opening and closing type shielding member suitable for a deposition machine, including: A first shielding plate; A second shielding plate, wherein the height of the first shielding plate is higher than that of the second shielding plate; A first driving device connected to the first shielding plate; and A second driving device is connected to the second shielding plate, wherein the first driving device and the second driving device respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and The second shielding plate is switched between an open state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state overlap, and the first shielding plate and the first shielding plate in the open state are The two shielding plates are far away from each other, and a space is formed between the first shielding plate and the second shielding plate. The opening-and-closing shielding member according to claim 7, wherein the first driving device and the second driving device respectively include a shaft sealing device and at least one driving motor, and the driving motor of the first driving device and the second driving device The first shielding plate and the second shielding plate are respectively connected through the shaft sealing device. The opening and closing shielding member according to claim 7, comprising a first connecting arm and a second connecting arm, the first driving device is connected to the first shielding plate through the first connecting arm, and the second driving device is The second shielding plate is connected through the second connecting arm. The opening and closing shielding member according to claim 7, wherein the area of the first shielding plate is larger than the area of the second shielding plate.

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