TWI788137B - Shielding device and film deposition machine with shielding device - Google Patents

Abstract

The present invention provides a thin film deposition machine with a shielding device, which includes a reaction cavity, a substrate holder, a shielding device and two light sensors, wherein the substrate holder and part of the shielding device are located within the reaction cavity. The shielding device comprises a first shielding unit, a second shielding unit and a driving device, wherein the driving device is connected to and is used to drive the first and second shielding units in opposite directions swing, so that the two shielding units are operated in an open state and a shielding state. The upper surfaces of the two shielding units are provided with a shielding protrusion and a sensing area, wherein the sensing area is adjacent to the shielding protrusion to prevent contaminants from depositing in the sensing area, so as to facilitate the light sensors to sense the position of the shielding units.

Description

Shielding mechanism and film deposition machine with shielding mechanism

The present invention relates to a thin film deposition machine with a shielding mechanism. A shielding protrusion and a sensing area are mainly arranged on the shielding unit, wherein the sensing area is adjacent to the shielding protrusion to prevent pollutants from being deposited on the sensing area. area, so as to improve the accuracy of the light sensor in sensing the position of the shading unit.

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment, and are widely used in the manufacturing processes of integrated circuits, light-emitting diodes and displays.

The deposition equipment mainly includes a cavity and a wafer carrier, wherein the wafer carrier is located in the cavity and is used to carry at least one wafer. Taking physical vapor deposition as an example, a target needs to be set in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, the inert gas and/or reaction gas can be delivered into the chamber to apply bias voltage to the target material and the wafer carrier plate respectively, and heat the wafer carried by the wafer carrier plate.

The inert gas in the cavity forms ionized inert gas due to the action of high-voltage electric field, and the ionized inert gas will be attracted by the bias voltage on the target and bombard the target. Target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier plate and deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the chamber, so the chamber needs to be cleaned periodically to prevent the deposited film from falling during the process and contaminating the wafer. In addition, oxides or other pollutants may also be formed on the surface of the target, so the target needs to be cleaned periodically. Generally speaking, a burn-in process is usually used to impinge the target in the cavity with plasma ions to remove oxides or other pollutants on the surface of the target.

When cleaning the cavity and the target, it is necessary to take out the wafer carrier and the wafer in the cavity, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process.

Generally speaking, after a period of use, the thin film deposition machine usually needs to be cleaned to remove the thin film deposited in the chamber and the oxide or nitride on the target. Particles generated during the cleaning process will contaminate the susceptor, so it is necessary to isolate the susceptor from the contaminants. The present invention proposes a thin film deposition machine with a shielding mechanism, which mainly drives two shielding plates to swing in opposite directions through a driving device, so that the two shielding plates operate in an open state and a shielding state.

A shielding protrusion and a sensing area are respectively provided on the upper surfaces of the two shielding plates, wherein the sensing area is adjacent to the shielding protrusion and is located outside or inside the shielding protrusion. When cleaning the reaction chamber, the driving device will drive the two shielding units to approach each other in a swinging manner, so that the two shielding units are close to each other and shield the carrier plate in the accommodating space, so as to avoid the plasma used in the cleaning process or produce Contamination from the carrier tray and/or the substrate it carries. During the deposition process, the driving device drives the two shielding units away from each other in a swinging manner, and deposits thin films on the substrate in the reaction chamber.

The thin film deposition chamber of the present invention includes at least two light sensors for projecting a sensing light beam on the sensing area of the shading plate to confirm that the two shading plates are indeed operating in an open state. However, in the process of cleaning the cavity, a thin film is often deposited on the surface of the sensing area of the baffle, thereby affecting the accuracy of the light sensor in sensing the position of the baffle. For this reason, the present invention further proposes to shield the sensing region by the shielding protrusion, so as to reduce the formation of film in the sensing region during the cleaning process, and facilitate the light sensor to sense the operating state of the shielding plate.

An object of the present invention is to provide a thin film deposition machine with a shielding mechanism, which mainly includes a reaction chamber, a carrier plate and a shielding mechanism. The blocking mechanism includes at least one driving device, two blocking units and two distance sensing units, wherein the driving device is connected and drives the two blocking units to swing in opposite directions, so that the two blocking units operate in an open state or a blocking state .

A reflective surface is set on the two shading units. When the two shading units operate in the shading state, the sensing light beams generated by the two distance sensing units will be respectively projected on the reflecting surfaces of the two shading units, and the two distance sensing beams will be measured. The distance between a distance sensing unit and two shading units to determine whether the two shading units are operating in the shading state.

In order to achieve the above object, the present invention proposes a thin film deposition machine with a shielding mechanism, comprising: a reaction chamber, including an accommodating space; a carrying plate, located in the accommodating space, and including a carrying surface At least one substrate; a shielding mechanism, including: a first shielding unit, located in the accommodating space, and including a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area Located on the surface of the first shielding unit not facing the carrier plate, and the first shielding protrusion is adjacent to the first sensing area; a second shielding unit is located in the accommodation space and includes a second shielding protrusion and a first shielding unit Two sensing regions, wherein the second shielding convex portion and the second sensing region are located at the second The shielding unit is not facing the surface of the carrier tray, and the second shielding protrusion is adjacent to the second sensing area; at least one driving device is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit respectively. The shielding unit swings in opposite directions, so that the first shielding unit and the second shielding unit are switched between an open state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and are used to shield the bearing disk, and a space is formed between the first shielding unit and the second shielding unit in the open state; A sensing region and a second sensing region of the second shielding unit are used to determine whether the first shielding unit and the second shielding unit are indeed operating in an open state.

The present invention provides a shielding mechanism, comprising: a first shielding plate, including a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are arranged on one side of the first shielding plate A first upper surface, and the first shielding protrusion is adjacent to the first sensing area; a first connecting arm, used to carry the first shielding plate; a second shielding plate, including a second shielding protrusion and a first shielding plate Two sensing regions, wherein the second shielding protrusion and the second sensing region are arranged on a second upper surface of the second shielding unit, and the second shielding protrusion is adjacent to the second sensing region; a second connecting arm , used to carry the second shading plate; and at least one driving device, respectively drives the first shading plate and the second shading plate to swing in opposite directions through the first connecting arm and the second connecting arm, so that the first shading plate and the second shading plate The shading plate is switched between an open state and a shading state, wherein the first shading plate and the second shading plate in the shading state are close to each other, and a space is formed between the first shading plate and the second shading plate in the open state .

In the thin film deposition machine with a shielding mechanism, the first shielding unit includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate, the first shielding protrusion and the first shielding plate through the first connecting arm. A sensing area is located on the first shielding plate, wherein the second shielding unit includes a The second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, the second shielding protrusion and the second sensing area are located on the second shielding plate.

The thin film deposition machine with a shielding mechanism includes a target facing the carrying surface of the carrier tray, wherein the first shielding protrusion and the first sensing area are located on a first shielding plate facing the target. The upper surface, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target.

In the thin film deposition machine or shielding mechanism with a shielding mechanism, the first shielding protrusion and the second shielding protrusion in the shielding state form an annular shielding protrusion, and the first sensing area and the second sensing area Then a ring-shaped sensing area is formed, and the ring-shaped sensing area is located outside the ring-shaped blocking protrusion.

In the thin film deposition machine or the shielding mechanism with a shielding mechanism, the first shielding protrusion and the second shielding protrusion are closed tubular protrusions.

The film deposition machine with a shielding mechanism includes: a first reflective surface set on the first connecting arm; a second reflective surface set on the second connecting arm; a first distance sensing unit, set on the reaction cavity, and used to project a first sensing light beam to the first reflective surface of the first connecting arm operating in a blocking state; and a second distance sensing unit, set on the reaction cavity, and use to project a second sensing light beam to the second reflective surface of the second connecting arm operating in the blocking state.

In the thin film deposition machine with a shielding mechanism, the reaction chamber includes two sensing chambers, and the two photosensors are respectively arranged in the two sensing chambers, and are used to sense the incoming sensing chambers respectively. The first sensing area of the first shading plate and the second sensing area of the second shading plate of the chamber.

10: Thin film deposition machine with shielding mechanism

100: Blocking mechanism

11: Reaction chamber

111: block

112: opening

113: sensing chamber

115: Light-transmitting window

12:Accommodating space

13: Annular blocking convex part

130: ring sensing area

131: the first blocking convex part

132: The first sensing area

133: the second blocking convex part

134: The second sensing area

14: The first occlusion unit

141: the first connecting arm

143: The first shield

1431: The first upper surface

145: the first reflective surface

15: The second occlusion unit

151: the second connecting arm

153: Second shielding plate

1531: second upper surface

155: second reflective surface

161: target

163: Substrate

165: carrying plate

1651: bearing surface

17: Drive device

171: Drive motor

173: shaft sealing device

18: Interval space

191: The first distance sensing unit

193: The second distance sensing unit

195: Light sensor

L1: the first sensing beam

L2: Second sensing beam

[ FIG. 1 ] is a schematic cross-sectional view of an embodiment of a thin film deposition machine with a shielding mechanism operating in a shielding state according to the present invention.

[ FIG. 2 ] is a three-dimensional schematic view of an embodiment of the shielding mechanism of the present invention operating in an open state.

[ FIG. 3 ] is a three-dimensional schematic view of an embodiment of the shielding mechanism of the present invention operating in a shielding state.

[ FIG. 4 ] is a three-dimensional schematic diagram of an embodiment of a partial structure of a thin film deposition machine with a shielding mechanism according to the present invention.

[ FIG. 5 ] is an upper perspective view of an embodiment of the thin film deposition machine with a shielding mechanism operating in an open state according to the present invention.

[ FIG. 6 ] is a top plan view of an embodiment of a thin film deposition machine with a shielding mechanism operating in a shielding state according to the present invention.

[ FIG. 7 ] is a schematic cross-sectional view of another embodiment of the thin film deposition machine with a shielding mechanism operating in a shielding state according to the present invention.

[ FIG. 8 ] is a schematic perspective view of another embodiment of the shielding mechanism of the present invention operating in an open state.

[ FIG. 9 ] is an upper perspective view of another embodiment of the thin film deposition machine with a shielding mechanism operating in an open state according to the present invention.

Please refer to FIG. 1 , which is a schematic side sectional view of an embodiment of a thin film deposition machine with a shielding mechanism operating in a shielding state according to the present invention. As shown in the figure, the thin film deposition machine 10 with a shielding mechanism mainly includes a reaction chamber 11, a carrier plate 165 and a shielding mechanism 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 165 And part of the shielding mechanism 100.

As shown in FIG. 1 , the carrier plate 165 is located in the accommodating space 12 of the reaction chamber 11 and includes a carrier surface 1651 for carrying at least one substrate 163 . When the thin film deposition machine 10 with the shielding mechanism is a physical vapor deposition chamber, a target 161 is disposed in the reaction chamber 11 , wherein the target 161 faces the substrate 163 and the carrying surface 1651 of the carrying plate 165 . For example, the target 161 may be disposed on the upper surface of the containing space 12 of the reaction chamber 11 .

Please refer to FIG. 2 and FIG. 3 , the shielding mechanism 100 includes a first shielding unit 14, a second shielding unit 15 and a driving device 17, wherein the first shielding unit 14 and the second shielding unit 15 are located in the accommodating space within 12. The driving device 17 is connected to the first shielding unit 14 and the second shielding unit 15 , and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions respectively.

As shown in Figure 2 and Figure 3, in one embodiment of the present invention, the first shielding unit 14 includes a first connecting arm 141 and a first shielding plate 143, wherein the first connecting arm 141 is used to carry the first shielding plate 143. The second shielding unit 15 includes a second connecting arm 151 and a second shielding plate 153 , wherein the second connecting arm 151 is used to carry the second shielding plate 153 . The driving device 17 is respectively connected through the first connecting arm 141 and a second connecting arm 151 to drive the first shielding plate 143 and the second shielding plate 153 to swing or rotate in opposite directions.

The first shielding plate 143 and the second shielding plate 153 can be plate bodies, and a first shielding protrusion 131 and a first sensing region 132 are provided on the first upper surface 1431 of the first shielding plate 143 not facing the carrier plate 165 , wherein the first shielding protrusion 131 is adjacent to the first sensing region 132 , for example, the first upper surface 1431 is the surface of the first shielding plate 143 facing the target 161 .

As shown in FIG. 1 , FIG. 2 and FIG. 3 , in an embodiment of the present invention, the first sensing area 132 is located outside or radially outside the first shielding protrusion 131 , for example, the first shielding plate 143 is semicircular. plate body, and the first shielding protrusion 131 is approximately C-shaped or semicircular-shaped protrusion. on the second shield 153 is not provided with the second shielding protrusion 133 and the second sensing area 134 facing the second upper surface 1531 of the carrier plate 165, for example, the second upper surface 1531 faces the target 161, wherein the structure of the second shielding plate 153 is the same as that of the first shielding plate 153. Plate 143 is adjacent.

The thin film deposition machine 10 with a shielding mechanism and/or the shielding mechanism 100 of the present invention can be operated in an open state and a shielded state. As shown in FIG. 2 and FIG. 5 , the driving device 17 drives the first shielding unit 14 and the second shielding unit 15 away from each other, and operates in an open state. A space 18 is formed between the first shielding unit 14 and the second shielding unit 15 , so that the first shielding unit 14 and the second shielding unit 15 do not exist between the target 161 , the carrier plate 165 and the substrate 163 . Then, the carrier plate 165 and the substrate 163 can be driven towards the target 161 , and the gas in the accommodating space 12 hits the target 161 to deposit a thin film on the surface of the substrate 163 .

Please refer to FIG. 1 , FIG. 5 and FIG. 6 , the reaction chamber 11 includes two sensing chambers 113 , and the two sensing chambers 113 protrude from the reaction chamber 11 . The height of the two sensing chambers 113 is smaller than the reaction chamber 11, and a light sensor 195 can be respectively arranged on the two sensing chambers 113, for example, the light sensor 195 can be a distance light sensor, a reflection Type light sensor or contrast type light sensor, and include at least one light emitting unit and at least one light receiving unit.

As shown in FIG. 1, FIG. 2 and FIG. 5, when the first and second shielding units 14/15 operate in the open state, part of the first and second shielding plates 143/153 will enter the two sensing chambers 113 respectively. , and the two photosensors 195 are used to sense the first and second sensing regions 132/134 respectively, and determine whether the first and second blocking units 14/15 are indeed operating in the open state. For example, the light-emitting units of the two photosensors 195 respectively project the sensing light beams on the first and second sensing areas 132/134, and receive the first and second sensing light through the light-receiving unit of the photosensor 195. Regions 132/134 reflect and/or scatter the sensing beam.

As shown in FIG. 1, FIG. 3 and FIG. 6, during the process of cleaning the reaction chamber 11 and/or the target 161, pollutants or particles will be deposited on the first shielding plate 143 and the second shielding plate 153, causing light The sensor 195 cannot accurately sense the first shielding plate 143 and the second shielding plate 153 . For this reason, the present invention further proposes to set the first and second shielding protrusions 131/133 on the surfaces of the first and second shielding plates 143/153 facing the target 161, and through the first and second shielding protrusions 131/133 to First and second sensing regions 132/134 are defined on the first and second shielding plates 143/153. The first and second blocking protrusions 131/133 are respectively adjacent to the first and second sensing regions 132/134, and the first and second sensing regions 132/134 are respectively located on the first and second blocking protrusions 131 The outside of the /133. The first and second shielding protrusions 131/133 are used to shield the first and second sensing regions 132/134, and avoid depositing a film on the first and second sensing regions 132/134.

As shown in Fig. 1, Fig. 3, Fig. 4, Fig. 6 and Fig. 7, the driving device 17 can drive the first shading unit 14 and the second shading unit 15 to approach each other and operate in a shading state, wherein the first shading plate 143 and The second shielding plates 153 are close to each other and form a disk-shaped shielding member to shield the carrier tray 165 and/or the substrate 163 .

As shown in Fig. 2, Fig. 3, Fig. 5 and Fig. 6, the first shielding convex portion 131 and the second shielding convex portion 133 can be C-shaped or semicircular protrusions, when the first and second shielding plates 143/ When 153 operates in the shielding state, the first and second shielding protrusions 131 / 133 form an annular shielding protrusion 13 , wherein an annular sensing area 130 is formed outside the annular shielding protrusion 13 . By forming the ring-shaped shielding protrusion 13 on the surface of the first shielding plate 143 and the second shielding plate 153 facing the target 161, it is not only beneficial to shield the first and second sensing regions 132/134, but also further improve the first shielding The shielding effect of the board 143 and the second shielding board 153 .

The first shading unit 14 and the second shading unit 15 described in the embodiment of the present invention operate in a shading state, which can be defined as the first shading plate 143 and the second shading plate 153 approaching each other until the distance between them is less than a threshold The value is, for example, less than 1 mm, so as to prevent particles from being generated during contact between the first shielding plate 143 and the second shielding plate 153 .

The first shielding unit 14 and the second shielding unit 15 operating in the shielding state are located between the target 161 and the carrier plate 165, and a clean space is partitioned in the accommodating space 12, wherein the area part of the clean space and the reaction space overlapping or similar. Then, a burn-in process can be carried out in the clean space to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space, and remove oxides, nitrides or oxides on the surface of the target 161. Other pollutants, and the deposited film on the surface of the reaction chamber 11 and/or the baffle 111 .

As shown in Fig. 7 and Fig. 8, the first and second shielding protrusions 131/133 can also be polygonal pipes or cylindrical pipes, for example, the cross section of the first and second shielding protrusions 131/133 is a closed shape The tubular protrusions form a first and second sensing region 132/134 inside the first and second shielding protrusions 131/133.

As shown in Figure 9, the cross section of the first and second shielding protrusions 131/133 is a non-closed protrusion, such as a C-shaped or U-shaped protrusion, wherein the first and second shielding protrusions 131 /133 can connect the edges of the first and second shielding plates 143/153.

In one embodiment of the present invention, as shown in FIG. 1 , a stopper 111 can be provided in the accommodation space 12 of the reaction chamber 11, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 165 approaches the target 161 , the reaction chamber 11 , the carrier plate 165 and the stopper 111 define a reaction space in the accommodating space 12 , and deposit a thin film on the surface of the substrate 163 in the reaction space.

When the first shielding plate 143 and the second shielding plate 153 are operated in the shielding state, the annular shielding convex portion 13 will be located below or outside the blocking member 111, so that the inner area of the annular shielding convex portion 13 is greater than or equal to the area of the opening 112. , to improve the occlusion effect.

In one embodiment of the present invention, as shown in FIG. 2 and FIG. 3 , the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to and drives the first shielding unit 14 and the shaft sealing device 173 through the shaft sealing device 173. The second shielding unit 15 swings in the opposite direction, and the shaft seal device 173 can be a common shaft seal or a magnetic fluid shaft seal.

As shown in Fig. 1, Fig. 4 and Fig. 6, the present invention further sets a first reflective surface 145 and a second reflective surface 155 on the first connecting arm 141 and the second connecting arm 151 respectively, and in the reaction chamber 11 A first distance sensing unit 191 and a second distance sensing unit 193 are disposed thereon, wherein the first distance sensing unit 191 and the second distance sensing unit 193 may be optical distance meters.

As shown in FIG. 4 , the first distance sensing unit 191 and the first shielding unit 14 are arranged on the same side of the reaction chamber 11 , while the second distance sensing unit 193 and the second shielding unit 15 are arranged on the same side of the reaction chamber 11 on the same side. The first and second distance sensing units 191/193 respectively project a first and a second sensing light beam L1/L2 to the first and second reflective surfaces 145/155 of the first and second shielding units 14/15 , wherein the first and second sensing light beams L1/L2 are perpendicular to the first and second reflective surfaces 145/155 respectively.

As shown in FIG. 4, the first distance sensing unit 191 can measure the distance between the first blocking unit 14 and the first distance sensing unit 191 by the reflected first sensing light beam L1, and the second distance sensing unit 193 can measure the distance between the second shading unit 15 and the second distance sensing unit 193 by the reflected second sensing light beam L2, and judge whether the first and second shading units 14/15 are correct based on the measured distance. The operation is in the blocked state.

In an embodiment of the present invention, as shown in FIG. 5 and FIG. 6 , a light-transmitting window 115 can be respectively provided on the reaction chamber 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 respectively face Two light-transmitting windows 115 .

The above is only one of the preferred embodiments of the present invention, and is not used to limit the scope of the present invention, that is, all changes and equal changes made according to the shape, structure, characteristics and spirit described in the patent scope of the present invention Modifications should be included in the patent application scope of the present invention.

100: Blocking mechanism

131: the first blocking convex part

132: The first sensing area

133: the second blocking convex part

134: The second sensing area

14: The first occlusion unit

141: the first connecting arm

143: The first shield

1431: The first upper surface

15: The second occlusion unit

151: the second connecting arm

153: Second shielding plate

1531: second upper surface

17: Drive device

171: Drive motor

173: shaft sealing device

18: Interval space

Claims (6)

A thin film deposition machine with a shielding mechanism, comprising: a reaction chamber, including an accommodating space; a carrying plate, located in the accommodating space, and including a carrying surface for carrying at least one substrate; a first shielding The unit is located in the accommodating space and includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located in the first shielding unit not facing the carrier tray surface, and the first shielding protrusion is adjacent to the first sensing area; a second shielding unit is located in the accommodating space and includes a second shielding protrusion and a second sensing area, wherein The second shielding protrusion and the second sensing area are located on the surface of the second shielding unit not facing the carrier plate, and the second shielding protrusion is adjacent to the second sensing area, wherein the first shielding unit It includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate through the first connecting arm, the first shielding protrusion and the first sensing area are located on the first shielding plate, Wherein the second shielding unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, the second shielding protrusion and the second sensing area are located on the On the second shielding plate, the first shielding protrusion and the second shielding protrusion in the shielding state form a ring-shaped shielding protrusion, and the first sensing region and the second sensing region form a ring The ring-shaped sensing area is located outside the ring-shaped shielding protrusion; at least one driving device is connected to the first shielding unit and the second shielding unit, and drives the first shielding unit and the second shielding unit respectively. The two shielding units swing in opposite directions, so that the first shielding unit and the second shielding unit switch between an open state and a shielding state, wherein the shielding state of the first shielding unit and the second shielding unit are mutually close to and used to cover the carrier tray, and a space is formed between the first cover unit and the second cover unit in the opened state; At least two photosensors are arranged in the reaction cavity and are used to sense the first sensing area of the first shielding unit and the second sensing area of the second shielding unit respectively, so as to judge the first Whether a shielding unit and the second shielding unit are indeed operated in the open state; and a target, facing the bearing surface of the carrier plate, wherein the first shielding protrusion and the first sensing area are located towards the target A first upper surface of the first shielding plate of the target material, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target material. A thin film deposition machine with a shielding mechanism, comprising: a reaction chamber, including an accommodating space; a carrying plate, located in the accommodating space, and including a carrying surface for carrying at least one substrate; a first shielding The unit is located in the accommodating space and includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located in the first shielding unit not facing the carrier tray surface, and the first shielding protrusion is adjacent to the first sensing area; a second shielding unit is located in the accommodating space and includes a second shielding protrusion and a second sensing area, wherein The second shielding protrusion and the second sensing area are located on the surface of the second shielding unit not facing the carrier plate, and the second shielding protrusion is adjacent to the second sensing area, wherein the first shielding unit It includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate through the first connecting arm, the first shielding protrusion and the first sensing area are located on the first shielding plate, Wherein the second shielding unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, the second shielding protrusion and the second sensing area are located on the On the second shielding plate, the first shielding protrusion and the second shielding protrusion are tubular protrusions in a closed shape; at least one driving device is connected to the first shielding unit and the second shielding unit, and respectively drives the The first shielding unit and the second shielding unit swing in opposite directions, so that the first shielding unit and the second shielding unit switch between an open state and a shielding state, wherein the first shielding unit in the shielding state The shielding unit and the second shielding unit are close to each other and are used to shield the carrier tray, and a space is formed between the first shielding unit and the second shielding unit in the open state; at least two light sensors, installed in the reaction chamber, respectively used to sense the first sensing region of the first shielding unit and the second sensing region of the second shielding unit to determine whether the first shielding unit and the second shielding unit Whether the unit is indeed operating in the open state; and a target, facing the carrying surface of the carrying plate, wherein the first shielding protrusion and the first sensing area are located on the first shielding plate facing the target A first upper surface, and the second shielding protrusion and the second sensing area are located on a second upper surface of the second shielding plate facing the target. A thin film deposition machine with a shielding mechanism, comprising: a reaction chamber, including an accommodating space; a carrying plate, located in the accommodating space, and including a carrying surface for carrying at least one substrate; a first shielding The unit is located in the accommodating space and includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located in the first shielding unit not facing the carrier tray surface, and the first shielding protrusion is adjacent to the first sensing area; a second shielding unit is located in the accommodating space and includes a second shielding protrusion and a second sensing area, wherein The second shielding protrusion and the second sensing area are located on the surface of the second shielding unit not facing the carrier plate, and the second shielding protrusion is adjacent to the second sensing area, wherein the first shielding unit It includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate through the first connecting arm, the first shielding protrusion and the first sensing area are located on the first shielding plate, Wherein the second shielding unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, the second shielding protrusion and the second sensing area are located on the On the second shading plate; at least one driving device is connected to the first shading unit and the second shading unit, and respectively drives the first shading unit and the second shading unit to swing in opposite directions, so that the first shading unit and the The two shielding units switch between an open state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and are used to shield the carrier tray, and the first shielding unit in the open state A space is formed between the unit and the second shielding unit; at least two photosensors are arranged in the reaction chamber and are used to sense the first sensing region and the second shielding unit respectively. The second sensing area of the two shielding units is used to determine whether the first shielding unit and the second shielding unit are indeed operating in the open state; a first reflective surface is arranged on the first connecting arm; a second shielding unit a reflective surface disposed on the second connecting arm; a first distance sensing unit disposed on the reaction chamber and used to project a first sensing light beam to the first connecting arm operating in the blocking state the first reflective surface; and a second distance sensing unit arranged on the reaction chamber and used to project a second sensing light beam to the second connecting arm operating in the blocking state Reflective surface. A thin film deposition machine with a shielding mechanism, comprising: a reaction chamber, including an accommodating space; a carrying plate, located in the accommodating space, and including a carrying surface for carrying at least one substrate; a first shielding The unit is located in the accommodating space and includes a first shielding protrusion and a first sensing area, wherein the first shielding protrusion and the first sensing area are located in the first shielding unit not facing the carrier tray surface, and the first shielding protrusion is adjacent to the first sensing area; a second shielding unit is located in the accommodating space and includes a second shielding protrusion and a second sensing area, wherein The second shielding protrusion and the second sensing area are located on the surface of the second shielding unit not facing the carrier plate, and the second shielding protrusion is adjacent to the second sensing area, wherein the first shielding unit It includes a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate through the first connecting arm, the first shielding protrusion and the first sensing area are located on the first shielding plate, where the second shade The unit includes a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate through the second connecting arm, the second shielding protrusion and the second sensing area are located on the second shielding plate ; at least one driving device, connected to the first shielding unit and the second shielding unit, and respectively drives the first shielding unit and the second shielding unit to swing in opposite directions, so that the first shielding unit and the second shielding unit The unit switches between an open state and a shielding state, wherein the first shielding unit and the second shielding unit in the shielding state are close to each other and are used to shield the carrier tray, and the first shielding unit and the second shielding unit in the open state A space is formed between the second shielding units; and at least two photosensors are arranged in the reaction cavity and are used to sense the first sensing area and the second sensing area of the first shielding unit respectively. The second sensing area of the shielding unit is used to determine whether the first shielding unit and the second shielding unit are indeed operating in the open state, wherein the reaction cavity includes two sensing chambers, and the two light sensors The detectors are respectively arranged in the two sensing chambers, and are respectively used to sense the first sensing area of the first shielding plate and the second sensing area of the second shielding plate entering each sensing chamber. measuring area. A shielding mechanism, comprising: a first shielding plate, including a first shielding convex portion and a first sensing region, wherein the first shielding convex portion and the first sensing region are arranged on a side of the first shielding plate A first upper surface, and the first shielding protrusion is adjacent to the first sensing area; a first connecting arm, used to carry the first shielding plate; a second shielding plate, including a second shielding protrusion and a second sensing region, wherein the second shielding protrusion and the second sensing region are arranged on a second upper surface of the second shielding unit, and the second shielding protrusion and the second sensing region Adjacent; a second connecting arm, used to carry the second shading plate; and at least one driving device, through the first connecting arm and the second connecting arm, respectively drive the first shading plate and the second shading plate toward Swing in the opposite direction, so that the first shading plate and the second shading plate are in an open switch between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, and a gap is formed between the first shielding plate and the second shielding plate in the open state The interval space, wherein the first shielding protrusion and the second shielding protrusion in the shielding state form an annular shielding protrusion, and the first sensing area and the second sensing area form an annular sensing area, the ring-shaped sensing area is located outside the ring-shaped blocking protrusion. A shielding mechanism, comprising: a first shielding plate, including a first shielding convex portion and a first sensing region, wherein the first shielding convex portion and the first sensing region are arranged on a side of the first shielding plate A first upper surface, and the first shielding protrusion is adjacent to the first sensing area; a first connecting arm, used to carry the first shielding plate; a second shielding plate, including a second shielding protrusion and a second sensing region, wherein the second shielding protrusion and the second sensing region are arranged on a second upper surface of the second shielding unit, and the second shielding protrusion and the second sensing region Adjacent, wherein the first shielding protrusion and the second shielding protrusion are tubular protrusions in a closed shape; a second connecting arm is used to carry the second shielding plate; and at least one driving device passes through the first The connecting arm and the second connecting arm respectively drive the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state , wherein the first shielding plate and the second shielding plate in the blocking state are close to each other, and a space is formed between the first shielding plate and the second shielding plate in the open state.

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