CN115896732A - Thin film deposition apparatus for sensing opening and closing of shielding mechanism - Google Patents
Thin film deposition apparatus for sensing opening and closing of shielding mechanism Download PDFInfo
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- CN115896732A CN115896732A CN202111164198.3A CN202111164198A CN115896732A CN 115896732 A CN115896732 A CN 115896732A CN 202111164198 A CN202111164198 A CN 202111164198A CN 115896732 A CN115896732 A CN 115896732A
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Abstract
The invention provides a film deposition device for sensing the opening and closing of a shielding mechanism, which mainly comprises a reaction cavity, a bearing disc, a shielding mechanism and two distance sensing units, wherein the bearing disc and part of the shielding mechanism are positioned in an accommodating space of the reaction cavity. The shielding mechanism comprises two shielding units and at least one driving device, wherein the driving device is connected with and drives the two shielding units to swing towards opposite directions, so that the two shielding units are operated in an opening state and a shielding state. When the shielding units are operated in the shielding state, the sensing light beams generated by the two distance sensing units are respectively projected on the reflecting surfaces of the two shielding units, and the distances between the two shielding units and the distance sensing units are measured to determine that the shielding mechanism is operated in the shielding state.
Description
Technical Field
The invention relates to a thin film deposition device for sensing the opening and closing of a shielding mechanism.
Background
Chemical Vapor Deposition (CVD), physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposited film, and thus the chamber needs to be periodically cleaned to prevent the deposited film from falling off during the manufacturing process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber by a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer bearing disc and the wafer in the chamber need to be taken out or isolated, so as to avoid the wafer bearing disc and the wafer from being polluted in the cleaning process
Disclosure of Invention
Generally, after a certain period of time, the thin film deposition apparatus usually needs to be cleaned to remove the oxide or nitride on the thin film and the target deposited in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The invention provides a film deposition device for sensing the opening and closing of a shielding mechanism, which mainly drives two shielding plates to swing towards opposite directions through a driving device so that the two shielding plates are operated in an opening state and a shielding state.
When the reaction cavity is cleaned, the driving device drives the two shielding units to mutually approach in a swinging mode, so that the two shielding units approach to each other and shield the bearing plate in the accommodating space, and plasma or generated pollution used in the cleaning process is prevented from contacting the bearing plate and/or a substrate borne by the bearing plate. When the deposition process is carried out, the driving device drives the two shielding units to mutually separate in a swinging mode, and thin film deposition is carried out on the substrate in the reaction cavity.
The present invention provides a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism, which mainly comprises a reaction chamber, a carrier plate and a shielding mechanism. The shielding mechanism comprises at least one driving device, two shielding units and two distance sensing units, wherein the driving device is connected with and drives the two shielding units to swing towards opposite directions respectively, so that the two shielding units are operated in an opening state or a shielding state.
When the two shielding units are operated in the shielding state, the sensing light beams generated by the two distance sensing units are respectively projected on the reflecting surfaces of the two shielding units, and the distance between the two distance sensing units and the two shielding units is measured to judge whether the two shielding units are operated in the shielding state.
After the two distance sensing units judge that the two shielding units are operated in the shielding state, the pre-burning and cleaning can be started, so that the contact of pollutants generated in the pre-burning or cleaning process with the bearing plate and/or the reaction cavity below the bearing plate can be effectively avoided.
An objective of the present invention is to provide a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism, wherein two shielding plate sensing units are disposed on a reaction chamber, wherein the two shielding plate sensing units are respectively used for sensing two shielding units in an open state to confirm that the two shielding units are actually operated in the open state.
When the two shielding plate sensing units judge that the two shielding units are operated in the opening state, the bearing disc can drive the bearing substrate to move upwards, and a film deposition process is carried out on the substrate. Therefore, the substrate can be prevented from being collided with the shielding units by the upward displacement of the substrate driven by the bearing disc when the two shielding units are not really operated in the opening state, and the damage to the shielding units, the bearing disc and the substrate can be avoided.
In order to achieve the above object, the present invention provides a thin film deposition apparatus for sensing opening and closing of a shadow mechanism, comprising: a reaction cavity body, including a containing space; a bearing disc positioned in the containing space and used for bearing at least one substrate; and a shielding mechanism, comprising: the first shielding unit is positioned in the accommodating space and comprises a first reflecting surface; the second shielding unit is positioned in the accommodating space and comprises a second reflecting surface; the driving device is connected with the first shielding unit and the second shielding unit and respectively drives the first shielding unit and the second shielding unit to swing towards opposite directions so that the first shielding unit and the second shielding unit are switched between an opening state and a shielding state, wherein the first shielding unit in the shielding state is close to the second shielding unit, and an interval space is formed between the first shielding unit in the opening state and the second shielding unit; the first distance sensing unit is arranged on the reaction cavity and used for projecting a first sensing light beam to the first reflecting surface of the first shielding unit so as to confirm that the first shielding unit operates in a shielding state; and the second distance sensing unit is arranged on the reaction cavity and used for projecting a second sensing light beam to the second reflecting surface of the second shielding unit so as to determine that the second shielding unit operates in a shielding state.
The thin film deposition equipment for sensing the opening and closing of the shielding mechanism comprises two sensing areas which are connected with the reaction cavity, the sensing areas protrude out of the reaction cavity, and the heights of the two sensing areas are smaller than that of the reaction cavity.
The thin film deposition equipment for sensing the opening and closing of the shielding mechanism comprises two shielding plate sensing units which are respectively arranged in two sensing areas and are respectively used for sensing a first shielding unit and a second shielding unit entering the two sensing areas so as to determine that the first shielding unit and the second shielding unit are operated in an opening state.
The thin film deposition equipment for sensing the opening and closing of the shielding mechanism is characterized in that the first shielding unit comprises a first connecting arm and a first shielding plate, the driving device is connected with the first shielding plate through the first connecting arm, the first reflecting surface is arranged on the first connecting arm, the second shielding unit comprises a second connecting arm and a second shielding plate, the driving device is connected with the second shielding plate through the second connecting arm, and the second reflecting surface is arranged on the second connecting arm.
The thin film deposition device for sensing the opening and closing of the shielding mechanism is characterized in that the first connecting arm comprises a first protruding part, the first reflecting surface is arranged on the first protruding part, the second connecting arm comprises a second protruding part, and the second reflecting surface is arranged on the second protruding part.
The thin film deposition equipment for sensing the opening and closing of the shielding mechanism is characterized in that the first shielding unit and the second shielding unit are operated in a shielding state, the first sensing light beam is vertical to the first reflecting surface, and the second sensing light beam is vertical to the second reflecting surface.
The drive device comprises a shaft seal device and at least one drive motor, the shaft seal device comprises an outer tube body and a shaft body, the outer tube body comprises a space for containing the shaft body, the drive motor is connected with the first shielding unit through the outer tube body, is connected with the second shielding unit through the shaft body, and synchronously drives the shaft body and the outer tube body to rotate towards opposite directions.
The thin film deposition equipment for sensing the opening and closing of the shielding mechanism comprises two first sensing units and an outer pipe body, wherein the two first sensing units are adjacent to the outer pipe body and are respectively used for sensing the rotation of the outer pipe body to a first position and a second position, when the outer pipe body rotates to the first position, the first shielding units are operated in an opening state, and when the outer pipe body rotates to the second position, the first shielding units are operated in a shielding state.
The film deposition equipment for sensing the opening and closing of the shielding mechanism comprises two second sensing units which are adjacent to the shaft body and are respectively used for sensing the rotation of the shaft body to a third position and a fourth position, when the shaft body rotates to the third position, the second shielding units are operated in an opening state, and when the shaft body rotates to the fourth position, the second shielding units are operated in a shielding state.
The film deposition equipment for sensing the opening and closing of the shielding mechanism comprises a first protruding unit and a second protruding unit, wherein the first protruding unit is connected with the outer tube body, the second protruding unit is connected with the shaft body, the first protruding unit rotates along with the outer tube body, the first protruding unit is sensed by the first sensing unit, the second protruding unit rotates along with the shaft body, and the second protruding unit is sensed by the second sensing unit.
The beneficial effects of the invention are: the novel thin film deposition equipment for sensing the opening and closing of the shielding mechanism is provided, and mainly two distance sensing units are used for respectively projecting sensing beams to the two shielding units so as to determine that the two shielding units operate in a shielding state.
Drawings
FIG. 1 is a schematic side sectional view illustrating an embodiment of a thin film deposition apparatus for sensing an opening/closing state of a shielding mechanism according to the present invention.
FIG. 2 is a schematic perspective view illustrating an embodiment of a shielding mechanism of a thin film deposition apparatus according to the present invention in an open state.
FIG. 3 is a schematic cross-sectional view of a driving device of a shielding mechanism according to an embodiment of the present invention.
FIG. 4 is a schematic perspective view of an embodiment of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention.
FIG. 5 is a schematic side sectional view illustrating a thin film deposition apparatus for sensing whether a shielding mechanism is opened or closed according to another embodiment of the present invention in a shielding state.
FIG. 6 is a schematic perspective view of a reaction chamber of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to an embodiment of the present invention.
FIG. 7 is a top perspective view illustrating an embodiment of the thin film deposition apparatus for sensing the opening and closing of the shadow mechanism in the open state according to the present invention.
FIG. 8 is a top view of an embodiment of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention in a shielding state.
Fig. 9 is a schematic cross-sectional view of a driving device of a screening mechanism according to another embodiment of the present invention.
Description of reference numerals: 10-a thin film deposition device for sensing the opening and closing of the shielding mechanism; 100-a shielding mechanism; 11-a reaction chamber; a 111-stop; 112-opening; 113-a sensing region; 115-a light transmissive window; 12-an accommodating space; 121-a clean space; 131-a first sensing unit; 133-a second sensing unit; 135-a first protruding unit; 137-a second projection unit; 14-a first shielding unit; 141-first connecting arm; 143-a first shield plate; 145-a first reflective surface; 147-a first projection; 15-a second shielding unit; 151-second connecting arm; 152-space; 153-a second shield plate; 155-a second reflective surface; 157-a second projection; 161-target material; 163-substrate; 165-a carrier tray; 17-a drive device; 171-a drive motor; 1711-a first drive motor; 1713-a second drive motor; 173-a shaft seal arrangement; 1731-outer body; 1732-space; 1733-shaft body; 18-a linkage mechanism; 191-a first distance sensing unit; 193-a second distance sensing unit; 195-a shield plate sensing unit; 20-a thin film deposition device for sensing the opening and closing of the shielding mechanism; l1 — first sensing beam; l2-second sensing beam.
Detailed Description
Fig. 1 is a schematic side cross-sectional view illustrating an embodiment of a thin film deposition apparatus for sensing the opening and closing of a shielding mechanism according to the present invention in a shielding state. As shown in the figure, the thin film deposition apparatus 10 for sensing the opening and closing of the shielding mechanism mainly includes a reaction chamber 11, a carrier plate 165 and a shielding mechanism 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 165 and a part of the shielding mechanism 100.
The susceptor 165 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for supporting at least one substrate 163. The thin film deposition apparatus 10 for sensing the opening and closing of the shielding mechanism is a physical vapor deposition chamber, for example, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the susceptor 165. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the susceptor 165 and/or the substrate 163 in the accommodating space 12.
Referring to fig. 2, the shielding mechanism 100 includes a first shielding unit 14, a second shielding unit 15 and a driving device 17, wherein the first shielding unit 14 and the second shielding unit 15 are located in the accommodating space 12. The driving device 17 is connected to the first shielding unit 14 and the second shielding unit 15, and drives the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, for example, the first shielding unit 14 and the second shielding unit 15 swing synchronously with the driving device 17 as an axis.
In an embodiment of the invention, the first shielding unit 14 includes a first connecting arm 141 and a first shielding plate 143, wherein the first connecting arm 141 is used for carrying the first shielding plate 143. The second shielding unit 15 includes a second connecting arm 151 and a second shielding plate 153, wherein the second connecting arm 151 is used for carrying the second shielding plate 153. The driving device 17 drives the first shielding plate 143 and the second shielding plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 151, respectively.
The first shielding plate 143 and the second shielding plate 153 may be plate bodies, wherein the first shielding plate 143 and the second shielding plate 153 may have similar areas and shapes, for example, the first shielding plate 143 and the second shielding plate 153 may be semicircular plate bodies. When the driving device 17 drives the first shielding plate 143 and the second shielding plate 153 to close, the first shielding plate 143 and the second shielding plate 153 approach each other to form a disc-shaped shielding member for shielding the carrier tray 165 and/or the substrate 163. The first shielding plate 143 and the second shielding plate 153 have similar areas and shapes, and are semi-circular plates, which are only an embodiment of the present invention and are not limited by the scope of the present invention.
The first shielding unit 14 and the second shielding unit 15 according to the embodiment of the invention are operated in the shielding state, which may be defined as the first shielding plate 143 and the second shielding plate 153 are close to each other until the distance between the two is smaller than a threshold, for example, smaller than 1mm, so as to prevent the first shielding plate 143 and the second shielding plate 153 from generating particles during the contact process to contaminate the accommodating space 12 of the reaction chamber 11 and/or the carrier tray 165.
Specifically, the thin film deposition apparatus 10 and/or the shielding mechanism 100 for sensing the opening/closing of the shielding mechanism can be operated in two states, i.e., an open state and a shielding state. As shown in fig. 2, the driving device 17 can drive the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, so that the first shielding unit 14 and the second shielding unit 15 are separated from each other and operated in an open state. An interval 152 is formed between the first shielding unit 14 and the second shielding unit 15 in the open state, so that the first shielding unit 14 and the second shielding unit 15 are not present between the target 161, the carrier plate 165 and the substrate 163.
The susceptor 165 and the substrate 163 may then be driven toward the target 161, and the gas, such as inert gas, in the accommodating space 12 may impinge on the target 161 to deposit a thin film on the surface of the substrate 163.
In an embodiment of the invention, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the susceptor 165 is close to the target 161, the reaction chamber 11, the susceptor 165 and the stopper 111 separate a reaction space in the accommodating space 12, and a thin film is deposited on the surface of the substrate 163 in the reaction space.
Further, as shown in fig. 1 and 8, the driving device 17 may drive the first shielding unit 14 and the second shielding unit 15 to swing in opposite directions, so that the first shielding unit 14 and the second shielding unit 15 approach each other and operate in a shielding state. The closed first and second shielding units 14 and 15 are located between the target 161 and the susceptor 165 to shield the susceptor 165 and isolate the target 161 and the susceptor 165.
The first shielding unit 14 and the second shielding unit 15 operating in the shielding state can separate a cleaning space 121 in the accommodating space 12, wherein the cleaning space 121 is partially overlapped or close to the reaction space. A burn-in process may be performed in the cleaning space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space 121, and remove oxides, nitrides or other contaminants on the surface of the target 161 and the deposited film on the surface of the reaction chamber 11 and/or the stopper 111, so as to prevent the substances generated during the cleaning process from contaminating or depositing on the surface of the susceptor 165 and/or the substrate 163.
In an embodiment of the present invention, as shown in fig. 3, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding unit 14 and the second shielding unit 15 through the shaft sealing device 173, for example, the driving motor 171 is connected to and drives the first shielding unit 14 and the second shielding unit 15 to synchronously swing in opposite directions through a linkage mechanism 18. The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed on the reaction chamber 11, wherein a portion of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.
The shaft sealing device 173 includes an outer tube 1731 and a shaft 1733. The outer tube 1731 includes a space 1732 for accommodating the shaft 1733, wherein the outer tube 1731 and the shaft 1733 are coaxially disposed, and the outer tube 1731 and the shaft 1733 can rotate relatively. The outer tube 1731 is connected to the first connecting arm 141 and is connected to the first shielding plate 143 via the first connecting arm 141 to swing. The shaft 1733 is connected to the second connecting arm 151, and is connected to and drives the second shielding plate 153 to swing via the second connecting arm 151.
The shaft seal 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from the external space so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft seal device 173 may be a magnetic fluid shaft seal.
In order to confirm whether the first shielding unit 14 and the second shielding unit 15 operate in the shielding state, as shown in fig. 1 and 8, the present invention further provides a first reflective surface 145 and a second reflective surface 155 on the first shielding unit 14 and the second shielding unit 15, respectively, and a first distance sensing unit 191 and a second distance sensing unit 193 on the reaction chamber 11. In practical applications, the first distance sensing unit 191 and the second distance sensing unit 193 may be optical distance meters.
The first distance sensing unit 191 and the first shielding unit 14 are disposed on the same side of the reaction chamber 11, wherein the first distance sensing unit 191 is configured to project a first sensing light beam L1 onto the first shielding unit 14. In practical applications, the setting position of the first distance sensing unit 191 can be adjusted, so that when the first shielding unit 14 operates in a shielding state, the first sensing light beam L1 generated by the first distance sensing unit 191 is projected onto the first reflecting surface 145 of the first shielding unit 14. At this time, the first sensing light beam L1 is perpendicular to the first reflection surface 145, so that the first distance sensing unit 191 receives the first sensing light beam L1 reflected by the first reflection surface 145.
When the first distance sensing unit 191 measures the distance between the first shielding unit 14 and the first distance sensing unit 191 from the reflected first sensing light beam L1, and determines whether the first shielding unit 14 is actually operated in the shielding state according to the measured distance.
The second distance sensing unit 193 is disposed on the same side of the reaction chamber 11 as the second shielding unit 15, wherein the second distance sensing unit 193 is configured to project a second sensing light beam L2 onto the second shielding unit 15. When the second shielding unit 15 operates in the shielding state, the second sensing light beam L2 generated by the second distance sensing unit 193 is projected onto the second reflection surface 155 of the second shielding unit 15, wherein the second sensing light beam L2 is perpendicular to the second reflection surface 155, so that the second distance sensing unit 193 can receive the reflected second sensing light beam L2 to measure the distance between the second shielding unit 15 and the second sensing unit 133, and determine whether the second shielding unit 15 operates in the shielding state based on the measured distance.
In an embodiment of the invention, as shown in fig. 1, a light-transmitting window 115 may be respectively disposed on the reaction chamber 11, wherein the first distance sensing unit 191 and the second distance sensing unit 193 respectively face the two light-transmitting windows 115, and respectively project the first sensing light beam L1 and the second sensing light beam L2 on the first shielding unit 14 and the second shielding unit 15 in the reaction chamber 11 through the two light-transmitting windows 115.
In an embodiment of the present invention, as shown in fig. 4, the first connecting arm 141 may include a first protrusion 147, wherein the first reflecting surface 145 is disposed on the first protrusion 147 of the first connecting arm 141. The second connecting arm 151 may include a second protrusion 157, wherein the second reflecting surface 155 is disposed on the second protrusion 157 of the second connecting arm 151.
FIG. 5 is a schematic side cross-sectional view of a thin film deposition apparatus for sensing whether a shielding mechanism is opened or closed according to another embodiment of the present invention. As shown in the figure, the thin film deposition apparatus 20 for sensing the opening and closing of the shielding mechanism mainly includes a reaction chamber 11, a carrier plate 165 and a shielding mechanism 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 165 and a part of the shielding mechanism 100.
Referring to fig. 6, 7 and 8, two sensing regions 113 are respectively disposed on the reaction cavity 11, wherein the two sensing regions 113 protrude from the reaction cavity 11. The height of the two sensing regions 113 is smaller than that of the reaction chamber 11, and a light-transmitting window 115 can be disposed on each of the two sensing regions 113. The first distance sensing unit 191 and the second distance sensing unit 193 are respectively disposed in the two sensing regions 113 and respectively face the two light transmitting windows 115. The first distance sensing unit 191 and the second distance sensing unit 193 generate a first sensing light beam L1 and a second sensing light beam L2 respectively penetrating through the two light transmission windows 115, and project the first sensing light beam and the second sensing light beam onto the first shielding unit 14 and the second shielding unit 15 in the reaction chamber 11.
When the first shielding unit 14 and the second shielding unit 15 operate in the shielding state, the first sensing light beam L1 and the second sensing light beam L2 are respectively projected on the first reflecting surface 145 of the first shielding unit 14 and the second reflecting surface 155 of the second shielding unit 15. The first distance sensing unit 191 and the second distance sensing unit 193 respectively receive the first sensing light beam L1 and the second sensing light beam L2 reflected by the first reflecting surface 145 and the second reflecting surface 155, measure the distance between the first shielding unit 14 and the first distance sensing unit 191, measure the distance between the second shielding unit 15 and the second distance sensing unit 193, and determine whether the first shielding unit 14 and the second shielding unit 15 are actually operated in the shielding state, as shown in fig. 8.
In addition, a shielding plate sensing unit 195 may be further disposed on each of the two sensing regions 113, wherein the two shielding plate sensing units 195 are respectively used for sensing the first shielding unit 14 and the second shielding unit 15 entering the two sensing regions 113. When the two shield plate sensing units 195 sense the first shield unit 14 and the second shield unit 15, it can be determined that the first shield unit 14 and the second shield unit 15 are operated in the open state, as shown in fig. 7.
In an embodiment of the invention, as shown in fig. 9, the number of the driving motors 171 may be two, which are respectively a first driving motor 1711 and a second driving motor 1713, the first driving motor 1711 and the second driving motor 1713 are respectively connected to the outer tube 1731 and the shaft 1733 of the sealing device 173, and the outer tube 1731 and the shaft 1733 respectively drive the first shielding unit 14 and the second shielding unit 15 to swing in different directions.
The two first sensing units 131 are adjacent to the outer tube 1731 of the shaft sealing device 173, wherein a distance is formed between the two first sensing units 131, for example, an included angle is formed between the two first sensing units 131 and the axis of the outer tube 1731, and the two first sensing units 131 are used for sensing whether the outer tube 1731 rotates to a first position (or a first angle) and a second position (or a second angle), respectively.
When the outer tube 1731 rotates to the first position, the first shielding plate 143 is driven to rotate to the open state, and when the outer tube 1731 rotates to the second position, the first shielding plate 143 is driven to rotate to the shielding state. Since the outer tube 1731 and the first shielding plate 143 do not rotate relative to each other, the two first sensing units 131 can sense that the outer tube 1731 rotates to the first position or the second position, and determine whether the first shielding plate 143 is actually operated in the open state or the shielding state.
In an embodiment of the invention, the outer tube 1731 may be provided with a first protrusion unit 135, wherein the first protrusion unit 135 protrudes toward the radial outer side of the outer tube 1731, for example, the first protrusion unit 135 may be a strip-shaped body and fixed on the outer tube 1731 by a screw or welding method. When the outer tube 1731 rotates, the first protruding unit 135 is driven to rotate, so that the first protruding unit 135 interferes with the first sensing unit 131, and the first sensing unit 131 can sense that the outer tube 1731 rotates to the first position or the second position.
In another embodiment of the present invention, the shielding mechanism 100 may further include two second sensing units 133, wherein the two second sensing units 133 are adjacent to the shaft 1733 of the shaft sealing device 173. The two second sensing units 133 are spaced apart from each other and are respectively used for sensing the rotation of the shaft 1733 to a third position (or a third angle) and a fourth position (or a fourth angle).
When the shaft 1733 rotates to the third position, the second shielding plate 153 is driven to rotate to the open state, and when the shaft 1733 rotates to the fourth position, the second shielding plate 153 is driven to rotate to the shielding state. Since the shaft 1733 and the second shielding plate 153 do not substantially rotate relatively, the two second sensing units 133 can sense that the shaft 1733 rotates to the third position or the fourth position, and determine whether the second shielding plate 153 actually rotates to the open state or the shielding state.
In an embodiment of the present invention, a second protrusion unit 137 may be disposed on the shaft 1733, wherein the second protrusion unit 137 protrudes along the radial direction of the shaft 1733 and interferes with the second sensing unit 133, so that the second sensing unit 133 can sense that the shaft 1733 rotates to the third position or the fourth position.
The first sensing unit 131 and the second sensing unit 133 of the present invention can also be applied to a structure having only a single driving motor 171, such as the structure shown in fig. 3. Through the above structure design of the present invention, it can be confirmed that the first shielding unit 14 and the second shielding unit 15 are operated in the shielding state or the opening state, so as to effectively prevent the reaction chamber 11 and the carrying tray 165 from being contaminated during the cleaning or burn-in process, and prevent the carrying tray 165 from colliding with the first shielding unit 14 and/or the second shielding unit 15 to cause the damage of the mechanism.
The invention has the advantages that:
the novel thin film deposition equipment for sensing the opening and closing of the shielding mechanism is provided, and mainly two distance sensing units are used for respectively projecting sensing beams to the two shielding units so as to determine that the two shielding units operate in a shielding state.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, i.e., all equivalent variations and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.
Claims (10)
1. A thin film deposition apparatus for sensing opening and closing of a shadow mechanism, comprising:
a reaction cavity comprising a containing space;
a bearing disc positioned in the containing space and used for bearing at least one substrate; and
a screening arrangement comprising:
the first shielding unit is positioned in the accommodating space and comprises a first reflecting surface;
the second shielding unit is positioned in the accommodating space and comprises a second reflecting surface;
at least one driving device, which is connected to the first shielding unit and the second shielding unit and drives the first shielding unit and the second shielding unit to swing in opposite directions, so that the first shielding unit and the second shielding unit are switched between an open state and a shielding state, wherein the first shielding unit in the shielding state is close to the second shielding unit, and a spacing space is formed between the first shielding unit in the open state and the second shielding unit;
a first distance sensing unit disposed on the reaction chamber for projecting a first sensing beam to the first reflection surface of the first shielding unit to confirm the operation of the first shielding unit in the shielding state; and
the second distance sensing unit is arranged on the reaction cavity and used for projecting a second sensing light beam to the second reflecting surface of the second shielding unit so as to determine that the second shielding unit operates in the shielding state.
2. The apparatus of claim 1, comprising two sensing regions connected to the reaction chamber, wherein the sensing regions protrude from the reaction chamber, and the two sensing regions have a height smaller than that of the reaction chamber.
3. The thin film deposition apparatus for sensing the opening and closing of a shielding mechanism as claimed in claim 2, comprising two shielding plate sensing units respectively disposed in the two sensing regions and respectively sensing the first shielding unit and the second shielding unit entering the two sensing regions to determine that the first shielding unit and the second shielding unit are operated in the open state.
4. The apparatus of claim 1, wherein the first shielding unit comprises a first connecting arm and a first shielding plate, the driving device is connected to the first shielding plate via the first connecting arm, the first reflective surface is disposed on the first connecting arm, the second shielding unit comprises a second connecting arm and a second shielding plate, the driving device is connected to the second shielding plate via the second connecting arm, and the second reflective surface is disposed on the second connecting arm.
5. The apparatus of claim 4, wherein the first connecting arm includes a first protrusion, the first reflective surface is disposed on the first protrusion, and the second connecting arm includes a second protrusion, the second reflective surface is disposed on the second protrusion.
6. The apparatus of claim 1, wherein the first shielding unit and the second shielding unit are operated in the shielding state, the first sensing beam is perpendicular to the first reflective surface, and the second sensing beam is perpendicular to the second reflective surface.
7. The apparatus of claim 1, wherein the driving device comprises a shaft sealing device and at least one driving motor, the shaft sealing device comprises an outer tube and a shaft, the outer tube comprises a space for accommodating the shaft, and the driving motor is connected to the first shielding unit through the outer tube, connected to the second shielding unit through the shaft, and synchronously drives the shaft and the outer tube to rotate in opposite directions.
8. The apparatus of claim 7, comprising two first sensing units adjacent to the outer tube for sensing the rotation of the outer tube to a first position and a second position, wherein the first shielding unit operates in the open state when the outer tube rotates to the first position, and the first shielding unit operates in the shielding state when the outer tube rotates to the second position.
9. The apparatus of claim 8, further comprising two second sensing units adjacent to the shaft for sensing whether the shaft rotates to a third position and a fourth position, wherein the second sensing units are operated in the open state when the shaft rotates to the third position, and the second sensing units are operated in the shielding state when the shaft rotates to the fourth position.
10. The apparatus of claim 9, further comprising a first protrusion unit and a second protrusion unit, the first protrusion unit is connected to the outer tube, and the second protrusion unit is connected to the outer tube, wherein the first protrusion unit rotates with the outer tube, the first protrusion unit is sensed by the first sensing unit, the second protrusion unit rotates with the outer tube, and the second protrusion unit is sensed by the second sensing unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111164198.3A CN115896732A (en) | 2021-09-30 | 2021-09-30 | Thin film deposition apparatus for sensing opening and closing of shielding mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111164198.3A CN115896732A (en) | 2021-09-30 | 2021-09-30 | Thin film deposition apparatus for sensing opening and closing of shielding mechanism |
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| Publication Number | Publication Date |
|---|---|
| CN115896732A true CN115896732A (en) | 2023-04-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111164198.3A Pending CN115896732A (en) | 2021-09-30 | 2021-09-30 | Thin film deposition apparatus for sensing opening and closing of shielding mechanism |
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| Country | Link |
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| CN (1) | CN115896732A (en) |
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- 2021-09-30 CN CN202111164198.3A patent/CN115896732A/en active Pending
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