CN115976476A - Double-open masking mechanism and thin film deposition machine - Google Patents
Double-open masking mechanism and thin film deposition machine Download PDFInfo
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- 230000007246 mechanism Effects 0.000 title claims abstract description 34
- 238000000427 thin-film deposition Methods 0.000 title claims description 24
- 230000000873 masking effect Effects 0.000 title 1
- 238000007789 sealing Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims description 8
- 230000008021 deposition Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
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- 239000011261 inert gas Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000004308 accommodation Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
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- 239000013077 target material Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
技术领域technical field
本发明有关于一种双开式遮蔽机构,主要于遮板板上设置至少一凹槽,以减少第一及第二遮蔽板的重量,并减轻驱动马达承载及驱动第一及第二遮蔽板的负担。The present invention relates to a double-opening type shielding mechanism. At least one groove is mainly arranged on the shielding plate to reduce the weight of the first and second shielding plates, and reduce the load of the driving motor and drive the first and second shielding plates. burden.
背景技术Background technique
化学气相沉积(CVD)、物理气相沉积(PVD)及原子层沉积(ALD)皆是常用的薄膜沉积设备,并普遍被使用在集成电路、发光二极管及显示器等制程中。Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment, and are widely used in the manufacturing processes of integrated circuits, light-emitting diodes and displays.
沉积设备主要包括一腔体及一晶圆承载盘,其中晶圆承载盘位于腔体内,并用以承载至少一晶圆。以物理气相沉积为例,腔体内需要设置一靶材,其中靶材面对晶圆承载盘上的晶圆。在进行物理气相沉积时,可将惰性气体及/或反应气体输送至腔体内,分别对靶材及晶圆承载盘施加偏压,并通过晶圆承载盘加热承载的晶圆。The deposition equipment mainly includes a cavity and a wafer carrier, wherein the wafer carrier is located in the cavity and is used to carry at least one wafer. Taking physical vapor deposition as an example, a target needs to be set in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, the inert gas and/or reaction gas can be delivered into the cavity, bias voltage is applied to the target material and the wafer holding plate respectively, and the carried wafer is heated by the wafer holding plate.
腔体内的惰性气体因为高压电场的作用,形成离子化的惰性气体,离子化的惰性气体会受到靶材上的偏压吸引而轰击靶材。从靶材溅出的靶材原子或分子受到晶圆承载盘上的偏压吸引,并沉积在加热的晶圆的表面,以在晶圆的表面形成薄膜。The inert gas in the cavity forms ionized inert gas due to the action of high-voltage electric field, and the ionized inert gas will be attracted by the bias voltage on the target and bombard the target. Target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier plate and deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.
在经过一段时间的使用后,腔体的内表面会形成沉积薄膜,因此需要周期性的清洁腔体,以避免沉积薄膜在制程中掉落,进而污染晶圆。此外靶材的表面亦可能形成氧化物或其他污染物,因此同样需要周期性的清洁靶材。一般而言,通常会通过预烧(burn-in)制程,以电浆离子撞击腔体内的靶材,以去除靶材表面的氧化物或其他污染物。After a period of use, a deposited film will be formed on the inner surface of the chamber, so the chamber needs to be cleaned periodically to prevent the deposited film from falling during the process and contaminating the wafer. In addition, oxides or other pollutants may also be formed on the surface of the target, so the target needs to be cleaned periodically. Generally speaking, a burn-in process is usually used to impinge the target in the chamber with plasma ions to remove oxides or other pollutants on the surface of the target.
在进行上述清洁腔体及靶材时,需要将腔体内的晶圆承载盘及晶圆取出,或者隔离晶圆承载盘,以避免清洁过程中污染晶圆承载盘及晶圆。When cleaning the cavity and the target, it is necessary to take out the wafer carrier and the wafer in the cavity, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process.
发明内容Contents of the invention
薄膜沉积机台在经过一段时间的使用后,通常需要进行清洁,以去除腔室内沉积的薄膜及靶材上的氧化物或氮化物。在清洁的过程中产生的微粒会污染承载盘,因此需要隔离承载盘及污染物。本发明提出一种双开式遮蔽机构及薄膜沉积机台,主要通过驱动装置带动两个遮蔽板朝相反方向摆动,使得两个遮蔽板在开启状态及遮蔽状态之间切换。After a period of use, the thin film deposition machine usually needs to be cleaned to remove the thin film deposited in the chamber and the oxide or nitride on the target. Particles generated during the cleaning process will contaminate the susceptor, so it is necessary to isolate the susceptor from the contaminants. The present invention proposes a double-opening shielding mechanism and a thin film deposition machine. The driving device drives two shielding plates to swing in opposite directions, so that the two shielding plates switch between an open state and a shielding state.
在清洁反应腔体时,驱动装置带动两个遮蔽板以摆动的方式相互靠近,使得两个遮蔽板相靠近并遮挡容置空间内的承载盘,以避免清洁过程中使用的电浆或产生的污染接触承载盘及/或其承载的基板。在进行沉积制程时,驱动装置带动两个遮蔽板以摆动的方式相互远离,以对反应腔体内的基板进行薄膜沉积。When cleaning the reaction chamber, the driving device drives the two shielding plates to approach each other in a swinging manner, so that the two shielding plates are close to each other and shield the carrier plate in the accommodating space, so as to avoid the plasma used in the cleaning process or generated Contamination contacts the carrier tray and/or the substrate it carries. During the deposition process, the driving device drives the two shielding plates away from each other in a swinging manner, so as to deposit the thin film on the substrate in the reaction chamber.
本发明的一目的,在于提供一种具有双开式遮蔽机构的薄膜沉积机台,主要包括一反应腔体、一承载盘及一双开式遮蔽机构。双开式遮蔽机构包括一驱动装置及两个遮蔽板,其中驱动装置连接并驱动两个遮蔽板分别朝相反方向摆动,使得两个遮蔽板操作在一开启状态及一遮蔽状态。An object of the present invention is to provide a thin film deposition machine with a double-opening shielding mechanism, which mainly includes a reaction chamber, a carrier plate and a double-opening shielding mechanism. The double-opening shielding mechanism includes a driving device and two shielding plates, wherein the driving device is connected and drives the two shielding plates to swing in opposite directions, so that the two shielding plates operate in an open state and a shielding state.
两个遮蔽板面对承载盘的表面上设置至少一凹槽,可在不影响遮蔽板的遮蔽效果的前提下,减少遮蔽板的重量。通过减少遮蔽板的重量,将有利于减轻驱动装置驱动遮蔽板转动的负担。At least one groove is provided on the surface of the two shielding boards facing the bearing tray, which can reduce the weight of the shielding boards without affecting the shielding effect of the shielding boards. By reducing the weight of the shielding plate, it is beneficial to reduce the burden of the driving device to drive the shielding plate to rotate.
具体而言,驱动装置通过两个连接臂分别连接并承载两个遮蔽板,通过在遮蔽板上设置至少一凹槽,可减少连接臂承载遮蔽板的负担。此外可进一步在连接臂上设置至少一穿孔部,可在不影响连接臂的结构强度的前提下减少连接臂的重量,并有利于驱动装置通过两个连接臂分别驱动两个遮蔽板朝相反方向摆动。Specifically, the driving device is respectively connected to and carries two shielding plates through two connecting arms, and by providing at least one groove on the shielding plate, the load of the connecting arms carrying the shielding plate can be reduced. In addition, at least one perforated portion can be further provided on the connecting arm, which can reduce the weight of the connecting arm without affecting the structural strength of the connecting arm, and facilitate the driving device to drive the two shielding plates in opposite directions through the two connecting arms. swing.
本发明的一目的,在于提供一种具有双开式遮蔽机构的薄膜沉积机台,包括一驱动装置、两个遮蔽板、两个连接臂及两个距离感测单元,其中驱动装置通过两个连接臂分别连接两个遮蔽板。遮蔽板的表面上设置少一凹槽,而连接臂上则设置至少一穿孔部,以减少遮蔽板及连接臂的重量。An object of the present invention is to provide a thin film deposition machine with a double-opening shielding mechanism, including a driving device, two shielding plates, two connecting arms and two distance sensing units, wherein the driving device is connected by two The arms respectively connect the two shielding plates. A groove is provided on the surface of the shielding plate, and at least one perforation is provided on the connecting arm, so as to reduce the weight of the shielding plate and the connecting arm.
此外两个连接臂上分别设置一反射面,当两个连接臂操作在遮蔽状态时,两个距离感测单元发出的感测光束会投射在两个连接臂的反射面上,并量测两个连接臂与两个距离感测单元之间的距离,以确定两个连接臂操作在遮蔽状态。In addition, a reflective surface is respectively arranged on the two connecting arms. When the two connecting arms are operated in the shielding state, the sensing light beams emitted by the two distance sensing units will be projected on the reflecting surfaces of the two connecting arms, and the two distance sensing units will be measured. The distance between a connecting arm and the two distance sensing units is used to determine that the two connecting arms are operating in a shielded state.
本发明的一目的,在于提供一种具有双开式遮蔽机构的薄膜沉积机台,主要包括一反应腔体、一承载盘及一双开式遮蔽机构。双开式遮蔽机构包括一驱动装置及两个遮蔽板,其中驱动装置包括一轴封装置及一驱动马达。An object of the present invention is to provide a thin film deposition machine with a double-opening shielding mechanism, which mainly includes a reaction chamber, a carrier plate and a double-opening shielding mechanism. The double-opening shielding mechanism includes a driving device and two shielding plates, wherein the driving device includes a shaft sealing device and a driving motor.
驱动马达分别通过轴封装置的外管体及轴体连接两个驱动板,其中外管体及/或轴体的侧边设置两个感测单元,用以确认外管体及/或轴体转动的角度,并由外管体及/或轴体的角度判断两个遮蔽板操作在遮蔽状态或开启状态。The drive motor is connected to the two drive plates through the outer tube body and the shaft body of the shaft seal device respectively, wherein two sensing units are arranged on the side of the outer tube body and/or the shaft body to confirm the outer tube body and/or shaft body The angle of rotation, and judging from the angle of the outer tube body and/or the shaft body whether the two shielding plates operate in a shielding state or an open state.
为了达到上述的目的,本发明提出一种薄膜沉积机台,包括:一反应腔体,包括一容置空间;一承载盘,位于容置空间内,并用以承载至少一基板;及一双开式遮蔽机构,包括:一第一遮蔽板,位于容置空间内;一第二遮蔽板,位于容置空间内,其中第一遮蔽板及第二遮蔽板皆包括至少一凹槽,朝向承载盘的方向;及一驱动装置,包括:一轴封装置,连接第一遮蔽板及第二遮蔽板;至少一驱动马达,连接轴封装置,并经由轴封装置分别驱动第一遮蔽板及第二遮蔽板朝相反的方向摆动,使得第一遮蔽板及第二遮蔽板在一开启状态及一遮蔽状态之间切换,其中操作在开启状态的第一遮蔽板及第二遮蔽板之间会形成一间隔空间,而操作在遮蔽状态的第一遮蔽板及第二遮蔽板会相互靠近,并用以遮挡承载盘。In order to achieve the above object, the present invention proposes a thin film deposition machine, comprising: a reaction chamber, including an accommodating space; a carrier plate, located in the accommodating space, and used to carry at least one substrate; and a double-opening The shielding mechanism includes: a first shielding plate located in the accommodating space; a second shielding plate located in the accommodating space, wherein both the first shielding plate and the second shielding plate include at least one groove facing the side of the carrying tray direction; and a driving device, including: a shaft sealing device, connected to the first shielding plate and the second shielding plate; at least one driving motor, connected to the shaft sealing device, and driving the first shielding plate and the second shielding device respectively through the shaft sealing device The plates swing in opposite directions, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein a gap is formed between the first shielding plate and the second shielding plate operating in the open state space, and the first shielding plate and the second shielding plate operating in the shielding state are close to each other, and are used to shield the carrier tray.
本发明提出一种双开式遮蔽机构,适用于一薄膜沉积机台,包括:一第一遮蔽板;一第二遮蔽板,其中第一遮蔽板及第二遮蔽板皆包括至少一凹槽,设置在第一遮蔽板及第二遮蔽板的一下表面;及一驱动装置,包括:一轴封装置,连接第一遮蔽板及第二遮蔽板;至少一驱动马达,连接轴封装置,并经由轴封装置分别驱动第一遮蔽板及第二遮蔽板朝相反的方向摆动,使得第一遮蔽板及第二遮蔽板在一开启状态及一遮蔽状态之间切换,其中操作在开启状态的第一遮蔽板及部分第二遮蔽板之间会形成一间隔空间,而操作在遮蔽状态的第一遮蔽板及第二遮蔽板会相互靠近,并形成一遮蔽件。The present invention proposes a double-opening shielding mechanism, which is suitable for a thin film deposition machine, including: a first shielding plate; a second shielding plate, wherein the first shielding plate and the second shielding plate both include at least one groove, set On the lower surface of the first shielding plate and the second shielding plate; and a driving device, including: a shaft sealing device, connected to the first shielding plate and the second shielding plate; at least one driving motor, connected to the shaft sealing device, and through the shaft The sealing device respectively drives the first shielding plate and the second shielding plate to swing in opposite directions, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate operating in the open state A space is formed between the plate and part of the second shielding plate, and the first shielding plate and the second shielding plate operating in the shielding state are close to each other to form a shielding member.
所述的薄膜沉积机台及双开式遮蔽机构,其中轴封装置包括一外管体及一轴体,外管体包括一空间用以容置轴体,驱动马达通过轴体连接第一遮蔽板,通过外管体连接第二遮蔽板,并同步驱动轴体及外管体朝相反的方向转动。The thin film deposition machine and the double-opening shielding mechanism, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the drive motor is connected to the first shielding plate through the shaft body , connecting the second shielding plate through the outer tube body, and synchronously driving the shaft body and the outer tube body to rotate in opposite directions.
所述的薄膜沉积机台及双开式遮蔽机构,包括两个感测单元与外管体相邻,两个感测单元之间具有一间距,并分别用以感测外管体转动至一第一位置及一第二位置,其中外管体转动至第一位置时,第二遮蔽板操作在开启状态,而外管体转动至第二位置时,第二遮蔽板操作在遮蔽状态。The thin film deposition machine and the double-opening shielding mechanism include two sensing units adjacent to the outer tube body, and there is a distance between the two sensing units, which are used to sense the rotation of the outer tube body to a first A position and a second position, wherein when the outer tube body rotates to the first position, the second shielding plate operates in an open state, and when the outer tube body rotates to the second position, the second shielding plate operates in a shielding state.
所述的薄膜沉积机台及双开式遮蔽机构,包括一第一连接臂及一第二连接臂,轴体通过第一连接臂连接第一遮蔽板,而外管体则通过第二连接臂连接第二遮蔽板,第一连接臂及第二连接臂上设置至少一穿孔部。The film deposition machine and the double-opening shielding mechanism include a first connecting arm and a second connecting arm, the shaft body is connected to the first shielding plate through the first connecting arm, and the outer tube is connected to the first shielding plate through the second connecting arm. At least one perforation portion is arranged on the second shielding plate, the first connecting arm and the second connecting arm.
所述的薄膜沉积机台及双开式遮蔽机构,包括一第一距离感测单元及一第二距离感测单元,而第一连接臂具有一第一反射面,第二连接臂则具有一第二反射面,其中第一距离感测单元及第二距离感测单元设置在反应腔体上,并分别用以将一第一感测光束及一第二感测光束投射至第一连接臂的第一反射面及第二连接臂的第二反射面,以确认第一遮蔽板及第二遮蔽板操作在遮蔽状态。The film deposition machine and the double-opening shielding mechanism include a first distance sensing unit and a second distance sensing unit, and the first connecting arm has a first reflective surface, and the second connecting arm has a first Two reflective surfaces, wherein the first distance sensing unit and the second distance sensing unit are arranged on the reaction cavity, and are respectively used to project a first sensing light beam and a second sensing light beam to the first connecting arm The first reflective surface and the second reflective surface of the second connecting arm are used to confirm that the first shielding plate and the second shielding plate are operating in a shielding state.
本发明的有益效果是:提供一种新颖的双开式遮蔽机构,主要于遮板板上设置至少一凹槽,以减少第一及第二遮蔽板的重量,并减轻驱动马达承载及驱动第一及第二遮蔽板的负担。The beneficial effects of the present invention are: to provide a novel double-opening shielding mechanism, at least one groove is mainly arranged on the shielding plate to reduce the weight of the first and second shielding plates, and reduce the load of the driving motor and drive the first And the burden of the second shielding plate.
附图说明Description of drawings
图1为本发明薄膜沉积机台操作在遮蔽状态一实施例的侧面剖面示意图。FIG. 1 is a schematic side sectional view of an embodiment of a thin film deposition machine operating in a shielded state according to the present invention.
图2为本发明双开式遮蔽机构的立体分解示意图。Fig. 2 is a three-dimensional exploded schematic view of the double-opening type shielding mechanism of the present invention.
图3为本发明双开式遮蔽机构的遮蔽板一实施例的立体示意图及部分剖面示意图。FIG. 3 is a three-dimensional schematic diagram and a partial cross-sectional schematic diagram of an embodiment of the shielding plate of the double-opening shielding mechanism of the present invention.
图4为本发明双开式遮蔽机构的连接臂一实施例的俯视图。Fig. 4 is a top view of an embodiment of the connecting arm of the double-opening type shielding mechanism of the present invention.
图5为本发明双开式遮蔽机构的驱动装置一实施例的立体剖面示意图。FIG. 5 is a perspective cross-sectional schematic view of an embodiment of the driving device of the double-opening type shielding mechanism of the present invention.
图6为本发明薄膜沉积机台操作在遮蔽状态一实施例的构造示意图。FIG. 6 is a schematic structural view of an embodiment of the thin film deposition machine operating in a shielded state according to the present invention.
图7为本发明薄膜沉积机台操作在开启状态一实施例的构造示意图。FIG. 7 is a structural diagram of an embodiment of the thin film deposition machine operating in the open state of the present invention.
附图标记说明:10-薄膜沉积机台;100-双开式遮蔽机构;11-反应腔体;111-挡件;112-开口;113-感测区;12-容置空间;131-感测单元;141-第一连接臂;1411-第一反射面;1413-第一凸出部;142-穿孔部;143-第二连接臂;1431-第二反射面;1433-第二凸出部;144-定位凹部;15-遮蔽件;151-第一遮蔽板;153-第二遮蔽板;154-凹槽;156-定位凸部;161-靶材;163-基板;165-承载盘;17-驱动装置;171-驱动马达;1711-第一驱动马达;1713-第二驱动马达;173-轴封装置;1731-轴体;1733-外管体;1735-传动单元;1737-固定管体;191-第一距离感测单元;193-第二距离感测单元;195-遮蔽板感测单元;L1-第一感测光束;L2-第二感测光束。Explanation of reference numerals: 10-thin film deposition machine; 100-double-open shielding mechanism; 11-reaction chamber; 111-stopper; 112-opening; 113-sensing area; Unit; 141-first connecting arm; 1411-first reflecting surface; 1413-first protruding part; 142-perforated part; 143-second connecting arm; 1431-second reflecting surface; 1433-second protruding part ; 144-positioning recess; 15-shielding member; 151-first shielding plate; 153-second shielding plate; 154-groove; 156-positioning protrusion; 161-target material; 17-drive device; 171-drive motor; 1711-first drive motor; 1713-second drive motor; 173-shaft seal device; 1731-shaft body; 1733-outer tube body; 1735-transmission unit; Body; 191—the first distance sensing unit; 193—the second distance sensing unit; 195—the shielding plate sensing unit; L1—the first sensing beam; L2—the second sensing beam.
具体实施方式Detailed ways
请参阅图1,为本发明薄膜沉积机台操作在遮蔽状态一实施例的侧面剖面示意图。如图所示,薄膜沉积机台10主要包括一反应腔体11、一承载盘165及一双开式遮蔽机构100,其中反应腔体11包括一容置空间12用以容置承载盘165及部分的双开式遮蔽机构100。Please refer to FIG. 1 , which is a schematic side sectional view of an embodiment of a thin film deposition machine operating in a shielded state according to the present invention. As shown in the figure, the thin
承载盘165位于反应腔体11的容置空间12内,并用以承载至少一基板163。以薄膜沉积机台10为物理气相沉积腔体为例,反应腔体11内设置一靶材161,其中靶材161面对基板163及承载盘165。例如靶材161可设置在反应腔体11的上表面,并朝向位于容置空间12内的承载盘165及/或基板163。The
请配合参阅图2,双开式遮蔽机构100包括一第一遮蔽板151、一第二遮蔽板153及一驱动装置17,其中第一遮蔽板151及第二遮蔽板153位于容置空间12内。驱动装置17连接第一遮蔽板151及第二遮蔽板153,并分别驱动第一遮蔽板151及第二遮蔽板153朝相反方向摆动,使得第一遮蔽板151及第二遮蔽板153在遮蔽状态及开启状态之间切换,例如第一遮蔽板151及第二遮蔽板153以驱动装置17为轴心同步摆动。Please refer to FIG. 2 , the double-
本发明实施例所述的第一遮蔽板151及第二遮蔽板153操作在遮蔽状态,可被定义为第一遮蔽板151及第二遮蔽板153相互靠近,并形成一遮蔽件15,以遮挡承载盘165。具体而言,操作在遮蔽状态的第一遮蔽板151及第二遮蔽板153不会直接接触,两者之间的间距小于一门坎值,例如小于1mm,以防止第一遮蔽板151及第二遮蔽板153在接触过程中产生微粒。The
请配合参阅图3,第一遮蔽板151及第二遮蔽板153的表面可设置至少一凹槽154,通过凹槽154的设置可减少第一遮蔽板151及第二遮蔽板153的重量,同时亦不会影响第一遮蔽板151及第二遮蔽板153的遮蔽效果。例如第一遮蔽板151及第二遮蔽板153可为钛,凹槽154的深度约为第一遮蔽板151及第二遮蔽板153厚度的30%至70%之间,凹槽154的截面积约为第一遮蔽板151及第二遮蔽板153面积的30%至70%之间。此外凹槽154的底部及侧边之间可设置一圆角或倒角。Please refer to Fig. 3, at least one
具体而言,第一遮蔽板151及第二遮蔽板153可为半圆形的板体,而凹槽154可以是部份环状凹槽,例如二分之一环状凹槽或四分之一环状凹槽,并靠近第一遮蔽板151及第二遮蔽板153的外侧或径向外侧。此外凹槽154可以对称的方式设置在第一遮蔽板151及第二遮蔽板153上,以避免因为设置凹槽154而改变第一遮蔽板151及第二遮蔽板153的质量重心。Specifically, the
在本发明一实施例中,操作在遮蔽状态的第一遮蔽板151及第二遮蔽板153用以遮蔽承载盘165,其中第一遮蔽板151及第二遮蔽板153的下表面朝向承载盘165,并将凹槽154设置在第一遮蔽板151及第二遮蔽板153的下表面,使得凹槽154面对承载盘165。In one embodiment of the present invention, the
在本发明一实施例中,驱动装置17通过第一连接臂141及一第二连接臂143分别连接并驱动第一遮蔽板151及第二遮蔽板153朝相反方向摆动或转动,例如第一连接臂141及第二连接臂143类似剪刀,其中第一连接臂141及第二连接臂143分别用以承载第一遮蔽板151及第二遮蔽板153。通过减少第一遮蔽板151及第二遮蔽板153的重量,可降低第一连接臂141及第二连接臂143的负担,以避免第一连接臂141及第二连接臂143变形或断裂。In one embodiment of the present invention, the driving
请配合参阅图4,第一连接臂141及第二连接臂143分别设置至少一穿孔部142,以减少第一连接臂141及第二连接臂143的重量。此外在第一连接臂141及第二连接臂143上设置穿孔部142,亦不会降低第一连接臂141及第二连接臂143的结构强度。Please refer to FIG. 4 , the first connecting
在本发明一实施例中,第一遮蔽板151及第二遮蔽板153的表面亦可设置复数个定位凸部156,其中定位凸部156与凹槽154设置在第一遮蔽板151及第二遮蔽板153的同一表面上,例如下表面。第一连接臂141及第二连接臂143用以承载第一遮蔽板151及第二遮蔽板153的表面则设置复数个定位凹部144,通过定位凸部156及定位凹部144的设置,可将第一遮蔽板151及第二遮蔽板153分别放置在第一连接臂141及第二连接臂143的固定位置,并可避免第一遮蔽板151及第二遮蔽板153相对于第一连接臂141及第二连接臂143位移。In an embodiment of the present invention, the surfaces of the
上述在第一遮蔽板151及第二遮蔽板153的下表面设置定位凸部156,并于第一连接臂141及第二连接臂143的上表面设置定位凹部144仅为本发明一实施例,而非本发明权利范围的限制。The
在不同实施例中,亦可于第一遮蔽板151及第二遮蔽板153的下表面设置定位凹部,并于第一连接臂141及第二连接臂143的上表面设置定位凸部。例如可于第一连接臂141及第二连接臂143上设置复数个螺孔,并将螺丝锁固在螺孔上,以在第一连接臂141及第二连接臂143的上表面形成定位凸部,并通过凸出第一连接臂141及第二连接臂143上表面的螺丝与第一遮蔽板151及第二遮蔽板153下表面的定位凹部对位。In different embodiments, positioning recesses may be provided on the lower surfaces of the
在本发明一实施例中,请配合参阅图5,驱动装置17包括一驱动马达171及一轴封装置173,其中驱动马达171通过轴封装置173连接第一遮蔽板151及第二遮蔽板153,并通过轴封装置173分别驱动第一遮蔽板151及第二遮蔽板153朝相反方向摆动,使得第一遮蔽板151及第二遮蔽板153在一开启状态及一遮蔽状态之间切换。In one embodiment of the present invention, please refer to FIG. 5 , the driving
具体而言,轴封装置173包括一外管体1733及一轴体1731,其中外管体1733包括一空间用以容置轴体1731,而驱动马达171则同步驱动外管体1733及轴体1731朝相反方向转动。Specifically, the
外管体1733及轴体1731同轴设置,且外管体1733及轴体1731可相对转动。驱动马达171通过轴体1731连接第一连接臂141,并经由第一连接臂141连接并带动第一遮蔽板151摆动。驱动马达171通过外管体1733连接第二连接臂143,并经由第二连接臂143连接并带动第二遮蔽板153摆动。The
轴封装置173可以是一般常见的轴封,主要用以隔离反应腔体11的容置空间12与外部的空间,以维持容置空间12的真空。例如外管体1733位于一固定管体1737内,并通过复数个轴承连接一固定管体1737,而轴体1731则通过复数个轴承连接外管体1733。在本发明另一实施例中,轴封装置173可以是磁流体轴封,并包括复数个轴承、至少一永久磁铁、至少一磁极片及至少一磁性流体。The
驱动马达171的数量可为一个,如图2所示,其中驱动马达171通过一连动机构同时带动轴体1731及外管体1733朝相反方向转动。在本发明另一实施例中,如图5所示,驱动马达171的数量可为两个,分别为第一驱动马达1711及第二驱动马达1713。第一驱动马达1711连接并带动轴体1731转动,并经由轴体1731及第一连接臂141带动第一遮蔽板151摆动。第二驱动马达1713通过一传动单元1735带动外管体1733转动,例如传动单元1735可为传动带,并经由外管体1733及第二连接臂143带动第二遮蔽板153摆动。The number of the driving
一般而言,可通过第一驱动马达1711转动的角度得知轴体1731转动的角度或位置,并通过第二驱动马达1713转动的角度得知外管体1733转动的角度或位置。然而第二驱动马达1713在驱动外管体1733转动的过程中,传动单元1735有可能会相对于第二驱动马达1713及外管体1733滑动。如此一来便无法以第二驱动马达1713转动的角度,正确的判断外管体1733是否转动到默认的角度或位置,当然亦无法判断外管体1733连接及驱动的第二遮蔽板153是否正确的操作在遮蔽状态或开启状态。Generally speaking, the rotation angle or position of the
为此,可于轴封装置173的外管体1733侧边分别设置两个感测单元131,其中两个感测单元131之间具有一间距。例如两个感测单元131与外管体1733的轴心形成一夹角,并分别用以感测外管体1733转动到一第一位置(或第一角度)及一第二位置(或第二角度)。To this end, two sensing
具体而言,当外管体1733转动第一位置时,会带动第二遮蔽板153转动至开启状态,而当外管体1733转动到第二位置时,则会带动第二遮蔽板153转动至遮蔽状态。外管体1733与第二遮蔽板153之间基本上不会相对转动,因此可通过两个感测单元131感测到外管体1733转动到第一位置或第二位置,确认第二遮蔽板153是否确实操作在开启状态或遮蔽状态。Specifically, when the
在本发明另一实施例中,轴封装置173的轴体1731的侧边亦可设两个感测单元131,其中两个感测单元131之间具有一间距,并分别用以感测轴体1731转动到一第三位置(或第三角度)及一第四位置(或第四角度)。In another embodiment of the present invention, two sensing
当轴体1731转动第三位置时,会带动第一遮蔽板151转动至开启状态,而当轴体1731转动到第四位置时,则会带动第一遮蔽板151转动至遮蔽状态。因此可通过两个感测单元131感测到轴体1731转动到第三位置或第四位置,确认第一遮蔽板151是否确实转动到开启状态或遮蔽状态。When the
此外为了进一步确认第一遮蔽板151及第二遮蔽板153是否操作在遮蔽状态,如图2、图4及图6所示,本发明进一步在第一连接臂141及第二连接臂143上分别设置一第一反射面1411及一第二反射面1431,并于反应腔体11上设置一第一距离感测单元191及一第二距离感测单元193,例如第一距离感测单元191及第二距离感测单元193可以是光学测距仪。In addition, in order to further confirm whether the
具体而言,第一连接臂141及第二连接臂143分别包括一第一凸出部1413及一第二凸出部1433,并将第一反射面1411及第二反射面1431分别设置在第一凸出部1413及第二凸出部1433上。例如第一凸出部1413及第二凸出部1433分别沿着第一遮蔽板151及第二遮蔽板153的径向凸出第一连接臂141及第二连接臂143。Specifically, the first connecting
第一距离感测单元191与第一连接臂141及第一遮蔽板151设置在反应腔体11的同一侧,其中第一距离感测单元191用以将一第一感测光束L1投射至第一连接臂141。在实际应用时可调整第一距离感测单元191的设置位置,使得第一遮蔽板151操作在遮蔽状态时,第一距离感测单元191产生的第一感测光束L1投射在第一连接臂141的第一反射面1411。此时第一感测光束L1会与第一反射面1411垂直,使得第一距离感测单元191接收到第一反射面1411反射的第一感测光束L1。第一距离感测单元191可由反射的第一感测光束L1量测出第一连接臂141与第一距离感测单元191之间的距离,并由量测的距离判断第一遮蔽板151是否确实操作在遮蔽状态。The first
第二距离感测单元193与第二连接臂143及第二遮蔽板153设置在反应腔体11的同一侧,其中第二距离感测单元193用以将一第二感测光束L2投射至第二连接臂143。当第二遮蔽板153操作在遮蔽状态时,第二距离感测单元193产生的第二感测光束L2会投射在第二连接臂143的第二反射面1431,其中第二感测光束L2与第二反射面1431垂直,使得第二距离感测单元193可接收到反射的第二感测光束L2,以量测出第二连接臂143与第二距离感测单元193之间的距离,并由量测的距离判断第二遮蔽板153是否确实操作在遮蔽状态。The second
在本发明一实施例中,如图6及图7所示,反应腔体11上分别设置两个感测区113,其中两个感测区113凸出反应腔体11,而第一距离感测单元191及第二距离感测单元193分别设置在两个感测区113。In one embodiment of the present invention, as shown in FIG. 6 and FIG. 7, two sensing
此外,可进一步在两个感测区113上分别设置一遮蔽板感测单元195,其中两个遮蔽板感测单元195分别用以感测进入两个感测区113的第一遮蔽板151及第二遮蔽板153。当两个遮蔽板感测单元195感测到第一遮蔽板151及第二遮蔽板153时,可判断第一遮蔽板151及第二遮蔽板153操作在开启状态,如图7所示。操作在开启状态时第一遮蔽板151及第二遮蔽板153会相互远离,其中第一遮蔽板151及第二遮蔽板153之间会形成一间隔空间152,使得第一遮蔽板151及第二遮蔽板153不会遮蔽承载盘165。In addition, a shielding
在本发明一实施例中,如图1所示,反应腔体11的容置空间12可设置一挡件111,其中挡件111的一端连接反应腔体11,而挡件111的另一端则形成一开口112。承载盘165朝靶材161靠近时,会进入或接触挡件111形成的开口112。反应腔体11、承载盘165及挡件111会在容置空间12内区隔出一反应空间,并在反应空间内的基板163表面沉积薄膜,可防止在反应空间外的反应腔体11及承载盘165的表面形成沉积薄膜。In one embodiment of the present invention, as shown in FIG. 1 , a stopper 111 can be provided in the
本发明优点:Advantages of the present invention:
提供一种新颖的双开式遮蔽机构,主要于遮板板上设置至少一凹槽,以减少第一及第二遮蔽板的重量,并减轻驱动马达承载及驱动第一及第二遮蔽板的负担。Provide a novel double-opening type shielding mechanism, at least one groove is provided on the shielding plate to reduce the weight of the first and second shielding plates, and reduce the load of the driving motor to carry and drive the first and second shielding plates .
以上所述,仅为本发明的一较佳实施例而已,并非用来限定本发明实施的范围,即凡依本发明申请专利范围所述的形状、构造、特征及精神所为的均等变化与修饰,均应包括于本发明的申请专利范围内。The above description is only a preferred embodiment of the present invention, and is not intended to limit the implementation scope of the present invention, that is, any equal changes and changes made according to the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the patent application scope of the present invention.
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CN110036135A (en) * | 2016-12-14 | 2019-07-19 | 株式会社神户制钢所 | Target block piece mechanism and the film formation device for having the target block piece mechanism |
TWM615719U (en) * | 2021-05-28 | 2021-08-11 | 天虹科技股份有限公司 | Magnetic field adjusting device and thin film deposition equipment capable of generating uniform magnetic field |
CN216192670U (en) * | 2021-10-15 | 2022-04-05 | 天虹科技股份有限公司 | Double-open type shielding component and film deposition machine |
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