CN115976476A - Double-opening shielding mechanism and film deposition machine - Google Patents
Double-opening shielding mechanism and film deposition machine Download PDFInfo
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- CN115976476A CN115976476A CN202111204712.1A CN202111204712A CN115976476A CN 115976476 A CN115976476 A CN 115976476A CN 202111204712 A CN202111204712 A CN 202111204712A CN 115976476 A CN115976476 A CN 115976476A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention provides a double-open type shielding mechanism and a film deposition machine, which mainly comprise a first shielding plate, a second shielding plate, at least one driving motor and a shaft sealing device, wherein the driving motor is respectively connected with the first shielding plate and the second shielding plate through an outer tube body and a shaft body of the shaft sealing device, drives the first shielding plate and the second shielding plate to swing towards opposite directions and is switched between an opening state and a shielding state. The first and second shielding plates comprise at least one groove to reduce the weight of the first and second shielding plates and reduce the load of the driving motor on and driving the first and second shielding plates.
Description
Technical Field
The invention relates to a double-opening type shielding mechanism, which is mainly characterized in that at least one groove is arranged on a shielding plate to reduce the weight of a first shielding plate and a second shielding plate and reduce the load of a driving motor for bearing and driving the first shielding plate and the second shielding plate.
Background
Chemical Vapor Deposition (CVD), physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is disposed in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposited film, and thus the chamber needs to be periodically cleaned to prevent the deposited film from falling off during the manufacturing process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are generally bombarded onto the target in the chamber through a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.
Disclosure of Invention
After a certain period of time, the thin film deposition tool typically needs to be cleaned to remove the oxide or nitride deposited on the thin film and the target in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The invention provides a double-open type shielding mechanism and a film deposition machine, which mainly drive two shielding plates to swing towards opposite directions through a driving device so that the two shielding plates are switched between an opening state and a shielding state.
When the reaction cavity is cleaned, the driving device drives the two shielding plates to mutually approach in a swinging mode, so that the two shielding plates approach and shield the bearing plate in the accommodating space, and plasma or generated pollution used in the cleaning process is prevented from contacting the bearing plate and/or a substrate borne by the bearing plate. When the deposition process is carried out, the driving device drives the two shielding plates to move away from each other in a swinging mode so as to carry out film deposition on the substrate in the reaction cavity.
The present invention provides a film deposition machine with a dual-open shielding mechanism, which mainly comprises a reaction chamber, a carrying tray and a dual-open shielding mechanism. The double-opening shielding mechanism comprises a driving device and two shielding plates, wherein the driving device is connected with and drives the two shielding plates to respectively swing towards opposite directions, so that the two shielding plates are operated in an opening state and a shielding state.
The surface of the bearing disc of the two shielding plate surfaces is provided with at least one groove, so that the weight of the shielding plate can be reduced on the premise of not influencing the shielding effect of the shielding plate. By reducing the weight of the shield plate, the burden of the driving device for driving the shield plate to rotate can be reduced.
Specifically, the driving device is respectively connected with and bears two shielding plates through two connecting arms, and the shielding plates are provided with at least one groove, so that the burden of bearing the shielding plates by the connecting arms can be reduced. In addition, at least one through hole part can be further arranged on the connecting arm, so that the weight of the connecting arm can be reduced on the premise of not influencing the structural strength of the connecting arm, and the driving device is favorable for driving the two shielding plates to swing towards opposite directions through the two connecting arms respectively.
An objective of the present invention is to provide a thin film deposition machine with a dual-open type shielding mechanism, which includes a driving device, two shielding plates, two connecting arms and two distance sensing units, wherein the driving device is respectively connected to the two shielding plates through the two connecting arms. The surface of the shielding plate is provided with at least one groove, and the connecting arm is provided with at least one through hole part so as to reduce the weight of the shielding plate and the connecting arm.
In addition, the two connecting arms are respectively provided with a reflecting surface, when the two connecting arms are operated in a shielding state, the sensing light beams emitted by the two distance sensing units can be projected on the reflecting surfaces of the two connecting arms, and the distance between the two connecting arms and the two distance sensing units is measured so as to determine that the two connecting arms are operated in the shielding state.
The present invention provides a film deposition machine with a dual-open shielding mechanism, which mainly comprises a reaction chamber, a carrying tray and a dual-open shielding mechanism. The double-open type shielding mechanism comprises a driving device and two shielding plates, wherein the driving device comprises a shaft sealing device and a driving motor.
The driving motor is respectively connected with the two driving plates through an outer tube body and a shaft body of the shaft sealing device, wherein two sensing units are arranged on the side edges of the outer tube body and/or the shaft body and used for confirming the rotating angle of the outer tube body and/or the shaft body and judging whether the two shielding plates operate in a shielding state or an opening state according to the angle of the outer tube body and/or the shaft body.
In order to achieve the above object, the present invention provides a thin film deposition apparatus, comprising: a reaction cavity comprising a containing space; a bearing disc positioned in the containing space and used for bearing at least one substrate; and a double-open type shielding mechanism, comprising: the first shielding plate is positioned in the accommodating space; the second shielding plate is positioned in the accommodating space, wherein the first shielding plate and the second shielding plate both comprise at least one groove facing the direction of the bearing disc; and a driving device, comprising: a shaft seal device which is connected with the first shielding plate and the second shielding plate; the driving motor is connected with the shaft sealing device and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions through the shaft sealing device, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein a spacing space is formed between the first shielding plate and the second shielding plate which are operated in the opening state, and the first shielding plate and the second shielding plate which are operated in the shielding state are close to each other and are used for shielding the bearing disc.
The invention provides a double-open type shielding mechanism which is suitable for a film deposition machine table and comprises: a first shielding plate; the first shielding plate and the second shielding plate both comprise at least one groove and are arranged on the lower surfaces of the first shielding plate and the second shielding plate; and a driving device, comprising: a shaft seal device which is connected with the first shielding plate and the second shielding plate; the driving motor is connected with the shaft sealing device and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions through the shaft sealing device, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein a spacing space is formed between the first shielding plate and part of the second shielding plate operated in the opening state, and the first shielding plate and the second shielding plate operated in the shielding state are close to each other to form a shielding piece.
The film deposition machine platform and the double-opening type shielding mechanism are characterized in that the shaft sealing device comprises an outer tube body and a shaft body, the outer tube body comprises a space for accommodating the shaft body, the driving motor is connected with the first shielding plate through the shaft body and is connected with the second shielding plate through the outer tube body, and the shaft body and the outer tube body are synchronously driven to rotate in opposite directions.
The film deposition machine platform and the double-opening type shielding mechanism comprise two sensing units which are adjacent to the outer pipe body, a space is formed between the two sensing units and used for sensing the rotation of the outer pipe body to a first position and a second position respectively, when the outer pipe body rotates to the first position, the second shielding plate is operated in an opening state, and when the outer pipe body rotates to the second position, the second shielding plate is operated in a shielding state.
The film deposition machine table and the double-opening type shielding mechanism comprise a first connecting arm and a second connecting arm, the shaft body is connected with the first shielding plate through the first connecting arm, the outer pipe body is connected with the second shielding plate through the second connecting arm, and at least one through hole part is formed in the first connecting arm and the second connecting arm.
The film deposition machine platform and the double-opening type shielding mechanism comprise a first distance sensing unit and a second distance sensing unit, wherein the first connecting arm is provided with a first reflecting surface, the second connecting arm is provided with a second reflecting surface, the first distance sensing unit and the second distance sensing unit are arranged on the reaction cavity and are respectively used for projecting a first sensing light beam and a second sensing light beam to the first reflecting surface of the first connecting arm and the second reflecting surface of the second connecting arm so as to confirm that the first shielding plate and the second shielding plate operate in a shielding state.
The invention has the beneficial effects that: a novel double-open shielding mechanism is provided, wherein at least one groove is arranged on a shielding plate to reduce the weight of a first shielding plate and a second shielding plate and reduce the load of a driving motor for bearing and driving the first shielding plate and the second shielding plate.
Drawings
FIG. 1 is a schematic side sectional view illustrating a thin film deposition apparatus according to an embodiment of the present invention in a shielding state.
Fig. 2 is a schematic exploded perspective view of the dual opening shielding mechanism of the present invention.
Fig. 3 is a schematic perspective view and a schematic partial cross-sectional view of a shielding plate of a dual-opening shielding mechanism according to an embodiment of the present invention.
FIG. 4 is a top view of an embodiment of the connecting arm of the dual open shade mechanism of the present invention.
Fig. 5 is a schematic perspective cross-sectional view of an embodiment of a driving device of a dual-open type shielding mechanism according to the present invention.
FIG. 6 is a schematic structural diagram of a thin film deposition apparatus according to an embodiment of the present invention operating in a shielding state.
FIG. 7 is a schematic view of an embodiment of a thin film deposition apparatus according to the present invention in an ON state.
Description of reference numerals: 10-a thin film deposition machine; 100-a double open shade mechanism; 11-a reaction chamber; a 111-stop; 112-opening; 113-a sensing region; 12-an accommodating space; 131-a sensing unit; 141-first connecting arm; 1411-a first reflective surface; 1413-a first projection; 142-a perforation; 143-a second linking arm; 1431 — a second reflective surface; 1433 — a second projection; 144-a positioning recess; 15-a shield; 151-first shield plate; 153-a second shield plate; 154-grooves; 156-locating boss; 161-target material; 163-a substrate; 165-a carrier tray; 17-a drive means; 171-a drive motor; 1711-a first drive motor; 1713-a second drive motor; 173-a shaft seal device; 1731-a shaft body; 1733-an outer body; 1735-a transmission unit; 1737-fixing the tube; 191-a first distance sensing unit; 193-a second distance sensing unit; 195-a shield plate sensing unit; l1 — first sensing beam; l2-second sensing beam.
Detailed Description
FIG. 1 is a schematic side sectional view of a thin film deposition apparatus according to an embodiment of the present invention in a shielding state. As shown in the figure, the thin film deposition apparatus 10 mainly includes a reaction chamber 11, a carrying tray 165 and a dual-open shielding mechanism 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrying tray 165 and a part of the dual-open shielding mechanism 100.
The susceptor 165 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for supporting at least one substrate 163. Taking the film deposition apparatus 10 as a physical vapor deposition chamber, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the susceptor 165. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the susceptor 165 and/or the substrate 163 in the accommodating space 12.
Referring to fig. 2, the dual-open shielding mechanism 100 includes a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12. The driving device 17 is connected to the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are switched between a shielding state and an opening state, for example, the first shielding plate 151 and the second shielding plate 153 swing synchronously with the driving device 17 as an axis.
The operation of the first shielding plate 151 and the second shielding plate 153 in the shielding state according to the embodiment of the invention can be defined as the first shielding plate 151 and the second shielding plate 153 approaching each other and forming a shielding member 15 to shield the carrier tray 165. Specifically, the first shielding plate 151 and the second shielding plate 153 operating in the shielding state do not directly contact with each other, and the distance between the first shielding plate 151 and the second shielding plate 153 is smaller than a threshold, for example, smaller than 1mm, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process.
Referring to fig. 3, at least one groove 154 may be disposed on the surfaces of the first shielding plate 151 and the second shielding plate 153, and the weight of the first shielding plate 151 and the second shielding plate 153 can be reduced by the arrangement of the groove 154, and the shielding effect of the first shielding plate 151 and the second shielding plate 153 is not affected. For example, the first shielding plate 151 and the second shielding plate 153 may be made of titanium, the depth of the groove 154 is about 30% to 70% of the thickness of the first shielding plate 151 and the second shielding plate 153, and the cross-sectional area of the groove 154 is about 30% to 70% of the area of the first shielding plate 151 and the second shielding plate 153. In addition, a fillet or chamfer may be provided between the bottom and the side of the groove 154.
Specifically, the first shielding plate 151 and the second shielding plate 153 may be semicircular plate bodies, and the groove 154 may be a partial annular groove, such as a half annular groove or a quarter annular groove, near the outer side or radial outer side of the first shielding plate 151 and the second shielding plate 153. In addition, the grooves 154 may be symmetrically disposed on the first shielding plate 151 and the second shielding plate 153, so as to avoid the mass center of gravity of the first shielding plate 151 and the second shielding plate 153 being changed due to the disposition of the grooves 154.
In an embodiment of the invention, the first shielding plate 151 and the second shielding plate 153 operating in the shielding state are used for shielding the carrier tray 165, wherein the lower surfaces of the first shielding plate 151 and the second shielding plate 153 face the carrier tray 165, and the groove 154 is disposed on the lower surfaces of the first shielding plate 151 and the second shielding plate 153, such that the groove 154 faces the carrier tray 165.
In an embodiment of the invention, the driving device 17 is connected to and drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through a first connecting arm 141 and a second connecting arm 143, for example, the first connecting arm 141 and the second connecting arm 143 are similar to scissors, wherein the first connecting arm 141 and the second connecting arm 143 are used to carry the first shielding plate 151 and the second shielding plate 153, respectively. By reducing the weight of the first shielding plate 151 and the second shielding plate 153, the burden on the first connecting arm 141 and the second connecting arm 143 can be reduced, and the first connecting arm 141 and the second connecting arm 143 can be prevented from being deformed or broken.
Referring to fig. 4, the first connecting arm 141 and the second connecting arm 143 are respectively provided with at least one through hole 142 to reduce the weight of the first connecting arm 141 and the second connecting arm 143. In addition, the through holes 142 formed in the first connecting arms 141 and the second connecting arms 143 do not reduce the structural strength of the first connecting arms 141 and the second connecting arms 143.
In an embodiment of the invention, a plurality of positioning protrusions 156 may also be disposed on the surfaces of the first shielding plate 151 and the second shielding plate 153, wherein the positioning protrusions 156 and the grooves 154 are disposed on the same surface, such as the lower surface, of the first shielding plate 151 and the second shielding plate 153. The surfaces of the first connecting arm 141 and the second connecting arm 143 for carrying the first shielding plate 151 and the second shielding plate 153 are provided with a plurality of positioning recesses 144, and the first shielding plate 151 and the second shielding plate 153 can be respectively placed at the fixed positions of the first connecting arm 141 and the second connecting arm 143 by the positioning protrusions 156 and the positioning recesses 144, so that the first shielding plate 151 and the second shielding plate 153 can be prevented from being displaced relative to the first connecting arm 141 and the second connecting arm 143.
The positioning protrusions 156 and the positioning recesses 144 are formed on the lower surfaces of the first shielding plate 151 and the second shielding plate 153, respectively, and the upper surfaces of the first connecting arm 141 and the second connecting arm 143, respectively, are only an embodiment of the present invention, and are not limited by the scope of the present invention.
In different embodiments, the first shielding plate 151 and the second shielding plate 153 may have positioning recesses on their lower surfaces, and the first connecting arm 141 and the second connecting arm 143 may have positioning protrusions on their upper surfaces. For example, a plurality of screw holes may be formed on the first connecting arm 141 and the second connecting arm 143, and screws may be fastened to the screw holes to form positioning protrusions on the upper surfaces of the first connecting arm 141 and the second connecting arm 143, and the positioning protrusions are aligned with the positioning recesses on the lower surfaces of the first shielding plate 151 and the second shielding plate 153 by the screws protruding from the upper surfaces of the first connecting arm 141 and the second connecting arm 143.
In an embodiment of the present invention, referring to fig. 5, the driving device 17 includes a driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 through the shaft sealing device 173, and the shaft sealing device 173 drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are switched between an open state and a shielding state.
Specifically, the shaft sealing device 173 includes an outer tube 1733 and a shaft 1731, wherein the outer tube 1733 includes a space for accommodating the shaft 1731, and the driving motor 171 drives the outer tube 1733 and the shaft 1731 to rotate in opposite directions.
The outer tube 1733 and the shaft 1731 are coaxially disposed, and the outer tube 1733 and the shaft 1731 can rotate relatively. The driving motor 171 is connected to the first connecting arm 141 through the shaft 1731, and is connected to and drives the first shielding plate 151 to swing through the first connecting arm 141. The driving motor 171 is connected to the second connecting arm 143 through the outer tube 1733, and is connected to and drives the second shielding plate 153 to swing through the second connecting arm 143.
The shaft sealing device 173 may be a common shaft sealing device, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from the external space, so as to maintain the vacuum of the accommodating space 12. For example, the outer tube 1733 is located inside a fixed tube 1737 and connected to the fixed tube 1737 by a plurality of bearings, and the shaft 1731 is connected to the outer tube 1733 by a plurality of bearings. In another embodiment of the present invention, the shaft sealing device 173 can be a magnetic fluid shaft seal and includes a plurality of bearings, at least one permanent magnet, at least one magnetic pole piece and at least one magnetic fluid.
The number of the driving motors 171 may be one, as shown in fig. 2, wherein the driving motors 171 drive the shaft 1731 and the outer tube 1733 to rotate in opposite directions through a linkage mechanism. In another embodiment of the present invention, as shown in fig. 5, the number of the driving motors 171 can be two, i.e. a first driving motor 1711 and a second driving motor 1713. The first driving motor 1711 is connected to and drives the shaft 1731 to rotate, and drives the first shielding plate 151 to swing through the shaft 1731 and the first connecting arm 141. The second driving motor 1713 drives the outer tube 1733 to rotate through a transmission unit 1735, for example, the transmission unit 1735 may be a transmission belt, and drives the second shielding plate 153 to swing through the outer tube 1733 and the second connecting arm 143.
Generally, the rotation angle or position of the shaft 1731 can be known by the rotation angle of the first driving motor 1711, and the rotation angle or position of the outer tube 1733 can be known by the rotation angle of the second driving motor 1713. However, when the second driving motor 1713 drives the outer tube 1733 to rotate, the transmission unit 1735 may slide relative to the second driving motor 1713 and the outer tube 1733. Therefore, it is not possible to accurately determine whether the outer tube 1733 rotates to the default angle or position according to the rotation angle of the second driving motor 1713, and certainly not to determine whether the second shielding plate 153 connected and driven by the outer tube 1733 operates in the shielding state or the opening state.
Therefore, two sensing units 131 can be disposed on the lateral side of the outer tube 1733 of the shaft sealing device 173, wherein a space is formed between the two sensing units 131. For example, the two sensing units 131 form an included angle with the axis of the outer tube 1733, and are respectively used for sensing the rotation of the outer tube 1733 to a first position (or a first angle) and a second position (or a second angle).
Specifically, when the outer tube 1733 rotates to the first position, the second shielding plate 153 is driven to rotate to the open state, and when the outer tube 1733 rotates to the second position, the second shielding plate 153 is driven to rotate to the shielding state. The outer tube 1733 and the second shielding plate 153 do not rotate relative to each other substantially, so that the two sensing units 131 can sense that the outer tube 1733 rotates to the first position or the second position, and determine whether the second shielding plate 153 is actually operated in the open state or the shielding state.
In another embodiment of the present invention, two sensing units 131 may also be disposed on the side of the shaft 1731 of the shaft sealing device 173, wherein a gap is formed between the two sensing units 131 for sensing the rotation of the shaft 1731 to a third position (or a third angle) and a fourth position (or a fourth angle), respectively.
When the shaft 1731 rotates to the third position, it will drive the first shielding plate 151 to rotate to the open state, when the shaft 1731 rotates to the fourth position, the first shielding plate 151 is driven to rotate to the shielding state. Therefore, the two sensing units 131 can sense that the shaft 1731 rotates to the third position or the fourth position, and determine whether the first shielding plate 151 actually rotates to the open state or the shielding state.
In addition, in order to further confirm whether the first shielding plate 151 and the second shielding plate 153 operate in the shielding state, as shown in fig. 2, 4 and 6, the present invention further provides a first reflecting surface 1411 and a second reflecting surface 1431 on the first connecting arm 141 and the second connecting arm 143, respectively, and a first distance sensing unit 191 and a second distance sensing unit 193 are disposed on the reaction chamber 11, for example, the first distance sensing unit 191 and the second distance sensing unit 193 may be optical distance meters.
Specifically, the first connecting arm 141 and the second connecting arm 143 respectively include a first protrusion 1413 and a second protrusion 1433, and the first reflecting surface 1411 and the second reflecting surface 1431 are respectively disposed on the first protrusion 1413 and the second protrusion 1433. For example, the first protrusion 1413 and the second protrusion 1433 respectively protrude the first connecting arm 141 and the second connecting arm 143 along the radial direction of the first shielding plate 151 and the second shielding plate 153.
The first distance sensing unit 191, the first connecting arm 141 and the first shielding plate 151 are disposed on the same side of the reaction chamber 11, wherein the first distance sensing unit 191 is configured to project a first sensing light beam L1 to the first connecting arm 141. In practical applications, the position of the first distance sensing unit 191 can be adjusted, so that when the first shielding plate 151 is in the shielding state, the first sensing light beam L1 generated by the first distance sensing unit 191 is projected onto the first reflecting surface 1411 of the first connecting arm 141. At this time, the first sensing light beam L1 is perpendicular to the first reflection surface 1411, so that the first distance sensing unit 191 receives the first sensing light beam L1 reflected by the first reflection surface 1411. The first distance sensing unit 191 measures a distance between the first connecting arm 141 and the first distance sensing unit 191 from the reflected first sensing light beam L1, and determines whether the first shielding plate 151 is actually operated in the shielding state according to the measured distance.
The second distance sensing unit 193, the second connecting arm 143 and the second shielding plate 153 are disposed on the same side of the reaction chamber 11, wherein the second distance sensing unit 193 is used for projecting a second sensing light beam L2 to the second connecting arm 143. When the second shielding plate 153 is operated in the shielding state, the second sensing light beam L2 generated by the second distance sensing unit 193 is projected onto the second reflection surface 1431 of the second connecting arm 143, wherein the second sensing light beam L2 is perpendicular to the second reflection surface 1431, so that the second distance sensing unit 193 can receive the reflected second sensing light beam L2 to measure the distance between the second connecting arm 143 and the second distance sensing unit 193, and determine whether the second shielding plate 153 is actually operated in the shielding state according to the measured distance.
In an embodiment of the invention, as shown in fig. 6 and 7, two sensing regions 113 are respectively disposed on the reaction cavity 11, wherein the two sensing regions 113 protrude out of the reaction cavity 11, and the first distance sensing unit 191 and the second distance sensing unit 193 are respectively disposed on the two sensing regions 113.
In addition, a shielding plate sensing unit 195 may be further disposed on each of the two sensing regions 113, wherein the two shielding plate sensing units 195 are respectively configured to sense the first shielding plate 151 and the second shielding plate 153 entering the two sensing regions 113. When the two shielding plate sensing units 195 sense the first shielding plate 151 and the second shielding plate 153, it can be determined that the first shielding plate 151 and the second shielding plate 153 are operated in an open state, as shown in fig. 7. When the device is operated in the open state, the first shielding plate 151 and the second shielding plate 153 are away from each other, wherein a space 152 is formed between the first shielding plate 151 and the second shielding plate 153, so that the first shielding plate 151 and the second shielding plate 153 do not shield the carrier tray 165.
In an embodiment of the invention, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. The susceptor 165, as it approaches the target 161, enters or contacts the opening 112 formed by the shutter 111. The reaction chamber 11, the susceptor 165 and the stopper 111 separate a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, thereby preventing the formation of a deposited thin film on the surfaces of the reaction chamber 11 and the susceptor 165 outside the reaction space.
The invention has the advantages that:
a novel double-open shielding mechanism is provided, wherein at least one groove is arranged on a shielding plate to reduce the weight of a first shielding plate and a second shielding plate and reduce the load of a driving motor for bearing and driving the first shielding plate and the second shielding plate.
The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the scope of the invention, which is intended to include all equivalent variations and modifications in shape, structure, characteristics and spirit of the invention.
Claims (10)
1. A thin film deposition machine, comprising:
a reaction cavity comprising a containing space;
a bearing disc which is positioned in the containing space and is used for bearing at least one substrate; and
a dual-open screening mechanism comprising:
a first shielding plate located in the accommodating space;
a second shielding plate located in the accommodating space, wherein the first shielding plate and the second shielding plate both comprise at least one groove facing the direction of the bearing disc; and
a drive device, comprising:
a shaft seal device connecting the first shielding plate and the second shielding plate;
at least one driving motor connected to the shaft seal device and driving the first and second shielding plates to swing in opposite directions via the shaft seal device, so that the first and second shielding plates are switched between an open state and a shielding state, wherein a space is formed between the first and second shielding plates operating in the open state, and the first and second shielding plates operating in the shielding state are close to each other and used for shielding the carrier tray.
2. The apparatus of claim 1, wherein the shaft seal device comprises an outer tube and a shaft, the outer tube includes a space for receiving the shaft, the driving motor is connected to the first shielding plate through the shaft and connected to the second shielding plate through the outer tube, and the shaft and the outer tube are synchronously driven to rotate in opposite directions.
3. The apparatus of claim 2, comprising two sensing units adjacent to the outer tube, the two sensing units having a gap therebetween and being configured to sense rotation of the outer tube to a first position and a second position, wherein the second shielding plate operates in the open state when the outer tube rotates to the first position, and the second shielding plate operates in the shielding state when the outer tube rotates to the second position.
4. The apparatus of claim 2, comprising a first connecting arm and a second connecting arm, wherein the shaft is connected to the first shielding plate via the first connecting arm, and the outer tube is connected to the second shielding plate via the second connecting arm, and at least one through hole is disposed on the first connecting arm and the second connecting arm.
5. The apparatus of claim 4, comprising a first distance sensor and a second distance sensor, wherein the first connecting arm has a first reflective surface and the second connecting arm has a second reflective surface, and wherein the first distance sensor and the second distance sensor are disposed on the reaction chamber and project a first sensing beam and a second sensing beam to the first reflective surface of the first connecting arm and the second reflective surface of the second connecting arm, respectively, to confirm the operation of the first shielding plate and the second shielding plate in the shielding state.
6. A dual-open type shielding mechanism is applicable to a thin film deposition machine, and comprises:
a first shielding plate;
a second shielding plate, wherein the first shielding plate and the second shielding plate both comprise at least one groove which is arranged on the lower surfaces of the first shielding plate and the second shielding plate; and
a drive device, comprising:
a shaft seal device connecting the first shielding plate and the second shielding plate;
at least one driving motor connected to the shaft seal device and driving the first and second shielding plates to swing in opposite directions via the shaft seal device, so that the first and second shielding plates are switched between an open state and a shielding state, wherein a space is formed between the first and second shielding plates in the open state, and the first and second shielding plates in the shielding state approach each other to form a shielding member.
7. The dual opening shielding mechanism of claim 6 wherein the shaft sealing device comprises an outer tube and a shaft, the outer tube comprises a space for receiving the shaft, the driving motor is connected to the first shielding plate through the shaft and connected to the second shielding plate through the outer tube, and synchronously drives the shaft and the outer tube to rotate in opposite directions.
8. The dual opening shade mechanism of claim 7, comprising two sensing units adjacent to the outer tube, the two sensing units having a gap therebetween and being configured to sense rotation of the outer tube to a first position and a second position, respectively, wherein the second shade panel operates in the open state when the outer tube is rotated to the first position and the second shade panel operates in the shade state when the outer tube is rotated to the second position.
9. The dual opening shade mechanism of claim 7, including a first connecting arm and a second connecting arm, the shaft being connected to the first shade plate via the first connecting arm, and the outer tube being connected to the second shade plate via the second connecting arm, the first connecting arm and the second connecting arm having at least one through hole.
10. The dual opening shade mechanism of claim 9, wherein the first link arm has a first projection comprising a first reflective surface and the second link arm has a second projection comprising a second reflective surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111204712.1A CN115976476A (en) | 2021-10-15 | 2021-10-15 | Double-opening shielding mechanism and film deposition machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111204712.1A CN115976476A (en) | 2021-10-15 | 2021-10-15 | Double-opening shielding mechanism and film deposition machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115976476A true CN115976476A (en) | 2023-04-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111204712.1A Pending CN115976476A (en) | 2021-10-15 | 2021-10-15 | Double-opening shielding mechanism and film deposition machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115976476A (en) |
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2021
- 2021-10-15 CN CN202111204712.1A patent/CN115976476A/en active Pending
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