TWI782532B - Shielding device and substrate processing chamber with shielding device - Google Patents

Abstract

The present invention provides a substrate processing chamber with a shielding device, which includes a reaction cavity, a substrate holder, a storing cavity and a shielding device, wherein the reaction cavity is connected to the storing cavity, and the substrate holder is located in the reaction cavity. The shielding device includes at least one guiding unit, at least one connecting seat, a shielding plate, and at least one driving arm that is connected to and drives the shielding plate to move between the storing cavity and the reaction cavity, wherein the shielding plate displaces along the guiding unit. During the deposition process, the driving arm will drive the shielding plate to move into the storing cavity. During the cleaning process, the driving arm will drive the shielding plate to move into the reaction cavity to avoid contamination of the substrate holder during the cleaning processing.

Description

Shielding member and substrate processing chamber with shielding member

The invention relates to a shielding member and a substrate processing chamber with the shielding member. The shielding member is used to isolate the reaction space of the reaction chamber and the carrier plate to avoid contamination of the carrier plate during the process of cleaning the processing chamber.

Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment, and are widely used in the manufacturing processes of integrated circuits, light-emitting diodes and displays.

The deposition equipment mainly includes a cavity and a wafer carrier, wherein the wafer carrier is located in the cavity and is used to carry at least one wafer. Taking physical vapor deposition as an example, a target needs to be set in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, the inert gas and/or reaction gas can be delivered into the chamber to apply bias voltage to the target material and the wafer carrier plate respectively, and heat the wafer carried by the wafer carrier plate.

The inert gas in the cavity forms ionized inert gas due to the action of high-voltage electric field, and the ionized inert gas will be attracted by the bias voltage on the target and bombard the target. Target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier plate and deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the chamber, so the chamber needs to be cleaned periodically to prevent the deposited film from falling during the process and contaminating the wafer. In addition, oxides or other pollutants may also be formed on the surface of the target, so the target needs to be cleaned periodically. Generally speaking, a burn-in process is usually used to impinge the target in the cavity with plasma ions to remove oxides or other pollutants on the surface of the target.

When cleaning the cavity and the target, it is necessary to take out the wafer carrier and the wafer in the cavity, or isolate the wafer carrier to avoid contamination of the wafer carrier and the wafer during the cleaning process.

Generally speaking, after a period of use, the substrate processing chamber usually needs to be cleaned to remove the film deposited in the chamber and the oxide or nitride on the target. Particles generated during the cleaning process will contaminate the susceptor, so it is necessary to isolate the susceptor from the contaminants. The present invention proposes a shielding member and a substrate processing chamber with the shielding member. The shielding plate is mainly driven by the driving arm to move along the guide unit between a storage position and a shielding position, which can avoid the occurrence of cleaning the cavity or the target. Particles contaminate the carrier tray.

An object of the present invention is to provide a substrate processing chamber with a shielding member, which mainly includes a reaction chamber, a carrier plate, a storage chamber and a shielding member, wherein the storage chamber is connected to the reaction chamber. The shielding member includes a guide unit, a connecting seat, a shielding plate and a driving arm, wherein the driving arm is connected to drive the shielding plate or the connecting seat to move along the guiding unit between the storage chamber and the reaction chamber.

When cleaning the reaction chamber, the driving arm will drive the shielding plate to move into the reaction chamber, and shield the carrier plate in the accommodating space, so as to avoid the plasma used in the cleaning process or the pollution produced. Contact the carrier and/or the substrate it carries. During the deposition process, the driving arm will drive the shielding plate to move into the storage chamber, and deposit the thin film on the substrate in the reaction chamber.

An object of the present invention is to provide a substrate processing chamber with a shielding member, wherein the number of guide units is two, and are respectively connected to two sides of the shielding plate. Through the use of two guide units, the shielding plate can be carried and driven more stably, and a thicker and heavier shielding plate can be used. Using a thicker baffle plate can avoid the deformation of the baffle plate due to high temperature during the cleaning process, and prevent the plasma used in the cleaning process or the pollution generated from contacting the carrier plate or the substrate through the deformed baffle plate.

In addition, the two guide units can be further covered by two bushings, so as to prevent particles generated when the driving arm drives the shutter plate to displace from diffusing into the accommodating space of the reaction chamber. The distance between the two guiding units and the two bushings is greater than the diameters of the carrier disc and the substrate, so as to avoid disturbing the displacement of the carrier disc and affecting the progress of the deposition process.

In one embodiment of the present invention, the driving arm may be a folding mechanical arm, and includes a first driving arm and a second driving arm, wherein the first driving arm is connected to the second driving arm through a joint shaft, and can be connected through the second driving arm. The first driving arm and the second driving arm drive the shielding plate to move along the guiding unit between the reaction cavity and the storage cavity. In different embodiments, the driving arm can also be a telescopic mechanical arm or a scissor-type mechanical arm, which can also achieve the purpose of driving the displacement of the shielding plate.

In order to achieve the above object, the present invention proposes a substrate processing chamber, comprising: a reaction chamber including an accommodating space; a carrier plate located in the accommodating space and used to carry at least one substrate; a receiving chamber, Connect the reaction cavity, wherein the storage cavity includes a storage space, which is fluidly connected to the storage space; and a shielding member, including: at least one guide unit, extending the storage space from the storage space; at least one connecting seat, connected to the guide unit ; a baffle plate, connected to the connecting seat; and at least one driving arm, connected to the shielding plate or the connecting seat, and used to drive the shielding plate and the connecting seat to move along the guide unit between the storage space and the accommodating space, wherein the displacement direction of the shielding plate is parallel to the guide unit.

The present invention proposes a shielding component suitable for a substrate processing chamber, comprising: at least one guiding unit; at least one connecting seat connected to the guiding unit; a shielding plate connected to the connecting seat; and at least one driving arm connected to the shielding plate or a connecting seat, and used to drive the shielding plate to move along the guide unit, wherein the displacement direction of the shielding plate is parallel to the guide unit.

In the substrate processing chamber and the shielding member, the driving arm includes at least one first driving arm and at least one second driving arm, and the first driving arm is connected to the shielding plate through the second driving arm.

The substrate processing chamber and the shielding member include a drive unit connected to the first driving arm, and drives the shielding plate to move in the accommodation space and the accommodation space through the first driving arm and the second driving arm.

The substrate processing chamber includes at least one position sensing unit disposed in the storage chamber or the reaction chamber, and used to sense the position of the shielding plate.

The substrate processing chamber includes a target disposed in the accommodating space and facing the carrying tray, and a shielding plate displaced to the accommodating space is located between the target and the carrying tray.

The substrate processing chamber and the shielding member include at least one bushing located in the accommodating space and the receiving space, the bushing includes an isolation space, and the guide unit and the connecting seat are located in the isolation space of the bushing.

10: Substrate processing chamber

11: Reaction chamber

111: block

112: opening

12:Accommodating space

121: Reaction space

123:Clean space

13: carrying plate

14: storage space

15: Storage cavity

151: Position sensing unit

161: target

163: Substrate

17: Blocking components

171: Guide unit

173: Connection seat

175: baffle plate

177: drive arm

1771: First drive arm

1773: Second drive arm

178: Bushing

1781: Isolation Space

179: drive unit

[ FIG. 1 ] is a schematic side sectional view of an embodiment of the substrate processing chamber of the present invention operating in a shielded state.

[ FIG. 2 ] is a schematic side sectional view of an embodiment of the substrate processing chamber of the present invention operating in a storage state.

[ FIG. 3 ] is a perspective cross-sectional schematic view of an embodiment of the shielding member of the substrate processing chamber of the present invention.

[ FIG. 4 ] is a top perspective view of an embodiment of the substrate processing chamber of the present invention operating in a storage state.

[ FIG. 5 ] is a top perspective view of an embodiment of the substrate processing chamber of the present invention operating in a shielded state.

Please refer to FIG. 1 and FIG. 2 , which are schematic side cross-sectional views of an embodiment of a substrate processing chamber of the present invention operating in a shielding state and a storage state, respectively. As shown in the figure, the substrate processing chamber 10 mainly includes a reaction chamber 11, a carrier plate 13, a storage cavity 15 and a shielding member 17, wherein the reaction chamber 11 is connected to the storage cavity 15, and the carrier plate 13 is Set in the reaction chamber 11.

The reaction chamber 11 has an accommodating space 12 for accommodating a carrier plate 13 . The storage chamber 15 is connected to the reaction chamber 11 and has a storage space 14 , wherein the storage space 14 is fluidly connected to the storage space 12 and is used for accommodating the shielding plate 175 of the shielding member 17 .

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 11 and is used for carrying at least one substrate 163 . Taking the substrate processing chamber 10 as a physical vapor deposition chamber as an example, a target 161 is disposed in the reaction chamber 11 , wherein the target 161 faces the substrate 163 and the carrier plate 13 .

Please refer to FIG. 3, the blocking member 17 includes at least one guiding unit 171, at least one connecting seat 173, a blocking plate 175 and a driving arm 177, wherein the connecting seat 173 connects the blocking plate 175 and the guiding unit 171, and the driving arm 177 is connected to the shielding plate 175 or the connecting seat 173, and is used to drive the shielding plate 175 and the connecting seat 173 to move relative to the guide unit 171. Set the displacement between the spaces 12.

In one embodiment of the present invention, the guide unit 171 can be a rod body, wherein the guide unit 171 extends from the storage space 14 of the storage cavity 15 to the storage space 12 of the reaction cavity 11, for example, the storage cavity 15 One wall faces a wall of the reaction chamber 11 , and the guiding unit 171 extends from the wall of the storage chamber 15 to the opposite wall of the reaction chamber 11 .

The connecting seat 173 is disposed on the guiding unit 171 and can be displaced along the guiding unit 171 . For example, the connecting base 173 may include at least one through hole, wherein the guiding unit 171 passes through the through hole of the connecting base 173 , so that the displacement directions of the connecting base 173 and the shielding plate 175 are parallel to the guiding unit 171 . In different embodiments, the guiding unit 171 can be a sliding rail, and the connecting seat 173 is a sliding seat connected to the guiding unit 171 . The fact that the guide unit 171 is a rod or a sliding rail is only an embodiment of the present invention, and is not a limitation of the scope of the present invention.

In actual application, the driving arm 177 can be connected to a driving unit 179, and the driving arm 177 is driven by the driving unit 179 to drive the shielding plate 175 to move along the guiding unit 171 in the storage space 14 and the storage space 12, such as the driving unit 179 It can be a motor or a stepping motor, and can be connected to the storage cavity 15 through a magnetic fluid shaft seal.

In one embodiment of the present invention, the driving arm 177 may include a first driving arm 1771 and a second driving arm 1773, for example, the driving arm 177 may be a folding mechanical arm, wherein one end of the first driving arm 1771 is connected to the driving unit 179, and the other end is connected to the second drive through the joint shaft or the rotating shaft One end of the arm 1773. The other end of the second driving arm 1773 is connected to the shielding plate 175 or the connecting seat 173 , and drives the first driving arm 1771 and the second driving arm 1773 through the driving unit 179 to drive the shielding plate 175 to move.

The driving arm 177 is a folding robot arm, and including the first driving arm 1771 and the second driving arm 1773 is only an embodiment of the present invention, rather than limiting the scope of the present invention. In another embodiment of the present invention, the driving arm 177 can also be a telescopic robot arm or a scissor-type robot arm, which can also drive the shielding plate 175 to move along the guide unit 171 between the storage space 14 and the storage space 12 .

The substrate processing chamber 10 of the present invention can be operated in two states, which are a storage state and a shielding state. The driving arm 177 can drive the connecting seat 173 and the shielding plate 175 to move along the guide unit 171 to the storage space 14 of the storage cavity 15, so that the substrate processing chamber 10 operates in a storage state, as shown in FIGS. 2 and 4 , wherein There is no shielding plate 175 between the target 161 , the substrate 163 and the carrier plate 13 .

Then, the carrier plate 13 and the substrate 163 can be driven towards the target 161 , and the gas passing through the accommodating space 12 , such as an inert gas, hits the target 161 to deposit a thin film on the surface of the substrate 163 .

In an embodiment of the present invention, a blocking member 111 may be provided in the accommodating space 12 of the reaction chamber 11 , wherein one end of the blocking member 111 is connected to the reaction chamber 11 , and the other end of the blocking member 111 forms an opening 112 . When the carrier plate 13 approaches the target 161, it will enter or contact the opening 112 formed by the stopper 111, wherein the reaction chamber 11, the carrier plate 13 and the stopper 111 will define a reaction space 121 in the accommodation space 12, Prevent the deposition film from forming on the surfaces of the reaction chamber 11 and the carrier plate 13 outside the reaction space 121 .

In addition, the driving arm 177 can drive the connecting seat 173 and the shielding plate 175 to move along the guiding unit 171 to the accommodating space 12 of the reaction chamber 11, so that the substrate processing chamber 10 operates in a shielding state, As shown in Figure 1 and Figure 5. The shielding plate 175 is located between the target 161 , the substrate 163 and the carrier 13 , and is used to isolate the target 161 and the substrate 163 from the carrier 13 .

The shielding plate 175 can partition a clean space 123 in the accommodating space 12 , wherein the clean space 123 and the reaction space 121 partially overlap or are close to each other. The clean space 123 is used to perform a burn-in process to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space 123, and remove oxides, nitrides or oxides on the surface of the target 161. Other pollutants, and the deposited film on the surface of the reaction chamber 11 and/or the baffle 111 .

During the process of cleaning the substrate processing chamber 10, the susceptor 13 and/or the substrate 163 will be blocked or isolated by the shielding plate 175, so as to prevent contamination or deposition of substances generated during the cleaning process on the surface of the susceptor 13 and/or the substrate 163 .

The shielding plate 175 of the present invention is generally plate-shaped, such as a circular plate but not limited thereto, wherein the shielding plate 175 has an area larger than that of the opening 112 formed by the blocking member 111 and/or the carrying tray 13 .

In an embodiment of the present invention, the number of the guiding unit 171 and the connecting seat 173 of the shielding member 17 may be one, wherein the guiding unit 171 is connected to the side of the shielding plate 175 through the connecting seat 173 . The guide unit 171 will not overlap or interfere with the opening 112 of the stopper 111 , the substrate 163 and/or the carrier plate 13 , so as to avoid affecting the lifting of the carrier plate 13 and the deposition process.

In another embodiment of the present invention, as shown in FIGS. 3 to 5 , the number of guiding units 171 and connecting seats 173 can be two, and the two guiding units 171 are respectively connected to the shielding plate 175 through the connecting seats 173. two sides. In addition, the two guiding units 171 will not overlap or interfere with the opening 112 of the blocking member 111, the substrate 163 and/or the carrier plate 13, and the vertical distance between the two guiding units 171 will be greater than the opening 112, The maximum length, such as diameter, of the substrate 163 and/or the susceptor 13 . Therefore, the guiding unit 171 will not affect the lifting of the susceptor 13 and the progress of the deposition process.

Specifically, when the number of the guiding unit 171 and the connecting seat 173 is two or more, the shielding plate 175 can be more stably supported and driven to displace. In addition, the use of two guide units 171 and the connecting seat 173 is beneficial for carrying a thicker or heavier shielding plate 175 . The thicker shielding plate 175 can avoid high temperature deformation during cleaning of the substrate processing chamber 10 , and prevent the plasma during cleaning from contacting the lower susceptor 13 or substrate 163 through the deformed shielding plate 175 .

In an embodiment of the present invention, the shielding member 17 may include at least one bushing 178 , wherein the bushing 178 is located in the accommodating space 12 and the accommodating space 14 and used to cover the guiding unit 171 and the connecting seat 173 . Specifically, the liner 178 can be strip-shaped, and extends from the wall of the receiving chamber 15 to the opposite wall of the reaction chamber 11 .

The bushing 178 has an isolation space 1781 , wherein the guide unit 171 and the connecting seat 173 are located in the isolation space 1781 . Through the arrangement of the bushing 178, the particles generated during the displacement of the connecting seat 173 along the guide unit 171 can be prevented from falling into the accommodating space 12 and/or the accommodating space 14, so as to maintain the accommodating space of the reaction chamber 11 12 for cleanliness. For example, the section of the bushing 178 is U-shaped, and the top of the bushing 178 is provided with a strip-shaped gap, so that the connecting seat 173 can be displaced along the gap.

In an embodiment of the present invention, at least one position sensing unit 151 can be further disposed on the storage cavity 15 , wherein the position sensing unit 151 faces the storage space 14 and is used for sensing whether the shielding plate 175 enters the storage space 14 . For example, the position sensing unit 151 may be a light sensing unit.

If the blocking plate 175 does not leave the accommodating space 12 of the reaction chamber 11, the carrier plate 13 will be displaced toward the target 161, which may cause the carrier plate 13 to collide with the blocking plate 175, causing the carrier plate 13 and/or the blocking plate 175 to break. damage. In practical application, it can be set that the carrier plate 13 can approach the target 161 only after the position sensing unit 151 senses that the shielding plate 175 has completely entered the storage cavity 15, so as to avoid the occurrence of damage to the carrier plate 13 and the shielding plate 175. collision.

In another embodiment of the present invention, the position sensing unit 151 can also be arranged on the reaction chamber 11, facing the accommodating space 12 of the reaction chamber 11, wherein the position sensing unit 151 is used to sense whether the blocking plate 175 is Still in the accommodating space 12 . Specifically, as long as the position sensing unit 151 can sense the position of the shielding plate 175, for example, confirming that the shielding plate 175 has completely entered the storage chamber 15 and/or that there is no shielding plate 175 in the reaction chamber 11, the position sensing The location or type of the unit 151 is not a limitation of the scope of rights of the present invention.

The above is only one of the preferred embodiments of the present invention, and is not used to limit the scope of the present invention, that is, all changes and equal changes made according to the shape, structure, characteristics and spirit described in the patent scope of the present invention Modifications should be included in the patent application scope of the present invention.

10: Substrate processing chamber

11: Reaction chamber

111: block

112: opening

12:Accommodating space

123:Clean space

13: carrying plate

14: storage space

15: Storage cavity

151: Position sensing unit

161: target

163: Substrate

171: Guide unit

173: Connection seat

175: baffle plate

177: drive arm

178: Bushing

179: drive unit

Claims (8)

A substrate processing chamber, comprising: a reaction chamber including an accommodating space; a carrier plate located in the accommodating space and used to carry at least one substrate; a receiving chamber connected to the reaction chamber, wherein the The storage cavity includes a storage space fluidly connected to the storage space; and a shielding member including: at least one guide unit extending from the storage space to the storage space; at least one connecting seat connected to the guide unit; The shielding plate is connected to the connecting seat, and is connected to the guide unit through the connecting seat; at least one driving arm is connected to the shielding plate or the connecting seat, and is used to drive the shielding plate and the connecting seat along the guiding unit. Displacement between the accommodation space and the accommodation space, wherein the displacement direction of the shielding plate is parallel to the guide unit; and at least one bushing, located in the accommodation space and the accommodation space, the bushing includes an isolation space , and the guiding unit and the connecting seat are located in the isolated space of the bushing. The substrate processing chamber as claimed in claim 1, wherein the driving arm includes at least one first driving arm and at least one second driving arm, and the first driving arm is connected to the shielding plate through the second driving arm. The substrate processing chamber according to claim 2, comprising a driving unit connected to the first driving arm, and driving the shielding plate to move between the storage space and the storage space through the first driving arm and the second driving arm . The substrate processing chamber as claimed in claim 1 includes at least one position sensing unit disposed in the storage chamber or the reaction chamber, and configured to sense the position of the shielding plate. The substrate processing chamber according to claim 1, comprising a target disposed in the accommodating space and facing the carrier plate, the shielding plate displaced to the accommodating space is located between the target material and the carrier plate . A shielding member suitable for a substrate processing chamber, comprising: at least one guiding unit; at least one connecting seat connected to the guiding unit; a shielding plate connected to the connecting seat and connected to the guiding unit via the connecting seat ; at least one driving arm, connected to the baffle plate or the connecting seat, and used to drive the baffle plate to displace along the guide unit, wherein the displacement direction of the baffle plate is parallel to the guide unit; and at least one bushing having An isolated space, and the guide unit and the connecting seat are located in the isolated space of the bushing. The shielding member as claimed in claim 6, wherein the driving arm includes at least one first driving arm and at least one second driving arm, and the first driving arm is connected to the shielding plate through the second driving arm. The shielding member as claimed in claim 7 includes a driving unit connected to the first driving arm, and drives the shielding plate to be displaced along the guiding unit via the first driving arm and the second driving arm.

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