CN216585186U - Double-layer shielding component and deposition machine table with same - Google Patents
Double-layer shielding component and deposition machine table with same Download PDFInfo
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- CN216585186U CN216585186U CN202121628419.3U CN202121628419U CN216585186U CN 216585186 U CN216585186 U CN 216585186U CN 202121628419 U CN202121628419 U CN 202121628419U CN 216585186 U CN216585186 U CN 216585186U
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Abstract
The utility model provides a deposition machine with a double-layer shielding component, which mainly comprises a reaction cavity, a bearing disc and a double-layer shielding component, wherein part of the double-layer shielding component and the bearing disc are positioned in the reaction cavity. The double-layer shielding component comprises a first shielding plate, a first protecting plate, a second shielding plate, a second protecting plate and a driving device, wherein the driving device is connected with the first shielding plate and the second shielding plate and drives the first shielding plate and the second shielding plate to swing towards opposite directions. When the cleaning process is performed, the driving device drives the first and second shielding plates to approach each other. The first and second protection plates are respectively arranged on the surfaces of the first and second shielding plates, wherein a space is arranged between the first and second protection plates and the first and second shielding plates, so that the first and second shielding plates can be prevented from high-temperature deformation, and the shielding effect is improved.
Description
Technical Field
The utility model relates to a deposition machine with a double-layer shielding component, which mainly shields a bearing disc through the double-layer shielding component so as to avoid polluting the bearing disc in the process of cleaning a processing chamber.
Background
Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, light emitting diode, display and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposition film, and thus the chamber needs to be periodically cleaned to prevent the deposition film from falling off during the process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber by a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.
SUMMERY OF THE UTILITY MODEL
Generally, a deposition tool is cleaned after a period of use to remove oxide or nitride from films and targets deposited in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The utility model provides a double-layer shielding component and a deposition machine table with the same. The surfaces of the two shielding plates facing the target are respectively provided with a protective plate, wherein the protective plates are used for protecting the shielding plates so as to prevent the shielding plates from being damaged by high temperature or high-temperature substances generated in the cleaning process.
An objective of the present invention is to provide a deposition machine with a dual-layer shielding member, which mainly includes a reaction chamber, a carrying tray and a dual-layer shielding member. The double-layer shielding component comprises a driving device, two shielding plates and two protecting plates, wherein the driving device is connected with the two shielding plates, and the protecting plates are arranged on the surfaces of the shielding plates facing the target.
When the reaction cavity is cleaned, the two driving devices respectively drive the two shielding plates to mutually approach in a swinging mode, and the two shielding plates shield the bearing plate in the accommodating space so as to prevent plasma used in the cleaning process or pollution generated in the cleaning process from contacting the bearing plate. When the deposition process is carried out, the two driving devices respectively drive the two shielding plates to be away from each other in a swinging mode, and the thin film deposition can be carried out on the substrate in the reaction cavity.
When the two shielding plates are operated in the shielding state, the two protection plates arranged on the shielding plates are also close to each other and are used for shielding the two shielding plates. In addition, a gap is arranged between the protection plate and the shielding plate, so that the shielding plate and high-temperature or high-temperature substances generated in the cleaning process can be effectively isolated, and the chance of thermal deformation of the shielding plate is reduced.
An objective of the present invention is to provide a deposition machine with a dual-layer shielding member, wherein a first gap is formed between two shielding plates in a shielding state, and a second gap is formed between two protection plates disposed on the shielding plates. The first gap between the two shielding plates and the second gap between the two shielding plates are staggered, so that the shielding plates and the shielding plates operated in a shielding state can effectively block the target and the bearing disc, and pollutants generated in the cleaning process are prevented from contacting the bearing disc.
An objective of the present invention is to provide a deposition machine with a dual-layer shielding member, wherein two shielding plates form a complete shielding member, so as to reduce the space required for accommodating the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, wherein the two shielding plates can be operated in an open state or a shielding state in the accommodating space of the reaction chamber, so as to simplify the structure of the reaction chamber and reduce the volume of the reaction chamber. In addition, a shielding plate with larger thickness can be further used to prevent the shielding plate from generating high-temperature deformation when the deposition machine is cleaned, and the effect of shielding the bearing disc by the shielding plate is improved.
In order to achieve the above object, the present invention provides a deposition apparatus having a dual-layer shielding member, comprising: a reaction cavity comprising a containing space; a bearing disc positioned in the containing space and used for bearing at least one substrate; and a double-layered shielding member including: the first shielding plate is positioned in the accommodating space; the first protection plate is arranged on one surface of the first shielding plate; the second shielding plate is positioned in the accommodating space; the second protection plate is arranged on one surface of the second shielding plate; and the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other and are used for shielding the bearing disc, and the first protection plate and the second protection plate are also close to each other and are used for shielding the first shielding plate and the second shielding plate.
The utility model provides a double-layer shielding component, which is suitable for a deposition machine, and comprises: a first shielding plate; the first protection plate is arranged on one surface of the first shielding plate; a second shielding plate; the second protection plate is arranged on one surface of the second shielding plate; and the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, and the first protection plate and the second protection plate are also close to each other and are used for shielding the first shielding plate and the second shielding plate.
The deposition machine with the double-layer shielding component and the double-layer shielding component are characterized in that the driving device comprises a shaft sealing device and at least one driving motor, and the driving motor is connected with the first shielding plate and the second shielding plate through the shaft sealing device.
The deposition machine with the double-layer shielding component and the double-layer shielding component comprise a target material, a first shielding plate, a second shielding plate and a first protection plate, wherein the target material is positioned in the accommodating space of the reaction cavity and faces the bearing disc, the first shielding plate and the second shielding plate which are operated in a shielding state are positioned between the target material and the bearing disc, and the first protection plate and the second protection plate are positioned between the target material and the first shielding plate and the second shielding plate.
The deposition machine with the double-layer shielding component and the double-layer shielding component are characterized in that a first gap is formed between the first shielding plate and the second shielding plate in a shielding state, a second gap is formed between the first protection plate and the second protection plate, and the first gap and the second gap are not overlapped.
The deposition machine with the double-layer shielding component and the double-layer shielding component are characterized in that the area of the first protection plate is larger than that of the second protection plate, or the area of the first shielding plate is larger than that of the second shielding plate.
The deposition machine with the double-layer shielding member comprises two sensing areas which are connected with a reaction cavity, the two sensing areas respectively comprise a sensing space and a fluid connection accommodating space, the thickness of the two sensing areas is smaller than that of the reaction cavity, and the two sensing areas are respectively provided with at least one position sensing unit for sensing a first shielding plate and a second shielding plate entering the sensing space.
The utility model has the beneficial effects that: when the reaction cavity is cleaned, the driving device drives the first shielding plate and the second shielding plate to approach each other and switch to a shielding state to shield the bearing disc, so that the bearing disc is prevented from being polluted in the process of cleaning the deposition machine.
Drawings
FIG. 1 is a schematic side cross-sectional view illustrating an embodiment of a deposition apparatus with a dual-layer shielding member according to the present invention in a shielding state.
FIG. 2 is a schematic perspective view illustrating an embodiment of a dual-layer shielding member of a deposition apparatus according to the present invention in an open state.
FIG. 3 is a schematic perspective view illustrating a dual-layer shielding member of a deposition apparatus according to an embodiment of the present invention in a shielding state.
FIG. 4 is a schematic perspective view illustrating a dual-layer shielding member of a deposition apparatus according to another embodiment of the present invention in an open state.
FIG. 5 is a schematic perspective view illustrating a dual-layer shielding member of a deposition apparatus according to another embodiment of the present invention in a shielding state.
FIG. 6 is an enlarged cross-sectional view of a portion of an embodiment of a dual-layer shielding member according to the present invention in a shielding state.
Fig. 7 is an enlarged partial cross-sectional view of a double-layered shield member according to another embodiment of the present invention in a shield state.
Fig. 8 is a schematic perspective cross-sectional view of a driving device of a dual-layer shielding member according to an embodiment of the present invention.
FIG. 9 is a top view of an embodiment of a deposition tool with a dual-layer shield according to the present invention in an open state.
FIG. 10 is a top view of an embodiment of a deposition tool with a dual-layer shield member according to the present invention operating in a shielding state.
FIG. 11 is a top view of a deposition tool with a dual-layer shield member according to another embodiment of the present invention in an open state.
Description of reference numerals: 10-a deposition machine with a double-layer shielding component; 100-a two-layer shield member; 11-a reaction chamber; a 111-stop; 112-opening; 113-a sensing region; 12-an accommodating space; 120-a sensing space; 121-cleaning the space; 13-a carrier tray; 141-first connecting arm; 143-a second linker arm; 15-a shield; 151-first shield plate; 152-space; 153-a second shield plate; 154-a first gap; 161-target material; 17-a drive device; 171-a drive motor; 173-a shaft seal arrangement; 1731-outer body; 1732-space; 1733-a shaft body; 181-a first guard plate; 182-interval; 183-second protective plate; 184-a second gap; 185-a support unit; 19-position sensing unit.
Detailed Description
Fig. 1 is a schematic side cross-sectional view of a deposition machine with a dual-layer shielding member according to an embodiment of the present invention operating in a shielding state. As shown in the figure, the deposition machine 10 having the dual-layer shielding member mainly includes a reaction chamber 11, a carrying tray 13 and a dual-layer shielding member 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrying tray 13 and a part of the dual-layer shielding member 100.
The susceptor 13 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for supporting at least one substrate 163. Taking the deposition machine 10 with a double-layer shielding member as an example of a physical vapor deposition chamber, a target 161 is disposed in the accommodating space 12 of the reaction chamber 11, wherein the target 161 faces the susceptor 13. For example, the target 161 may be disposed above the reaction chamber 11 and face the susceptor 13 and/or the substrate 163 in the accommodating space 12.
Referring to fig. 2 and fig. 3, the dual-layer shielding member 100 includes a first shielding plate 151, a second shielding plate 153, a first protection plate 181, a second protection plate 183, and a driving device 17, wherein the first shielding plate 151, the second shielding plate 153, the first protection plate 181, and the second protection plate 183 are located in the accommodating space 12, and a portion of the driving device 17 is located in the accommodating space 12.
The driving device 17 is connected to the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are switched between an open state and a shielding state, for example, the first shielding plate 151 and the second shielding plate 153 swing synchronously with the driving device 17 as an axis.
In an embodiment of the present invention, the driving device 17 is connected to a first connecting arm 141 and a second connecting arm 143, and is connected to the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively, wherein the driving device 17 drives the first shielding plate 151/153 and the first shielding plate 181/183 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 143, respectively.
In an embodiment of the present invention, the first shielding plate 151, the second shielding plate 153, the first protecting plate 181 and the second protecting plate 183 may be plate bodies, such as semicircular or partially circular plate bodies. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to operate in the shielding state, the first shielding plate 151 and the second shielding plate 153 are close to each other to form a disc-shaped shielding member 15, wherein the shielding member 15 formed by the first shielding plate 151 and the second shielding plate 153 is located between the carrier tray 13 and the target 161 and is used for shielding the carrier tray 13 and/or the substrate 163.
Specifically, one surface (e.g., upper surface) of the first shield plate 151 and the second shield plate 153, which are operated in the shield state, faces the target 161, and the other surface (e.g., lower surface) faces the susceptor 13. The first protection plate 181 and the second protection plate 183 are respectively provided on surfaces (such as upper surfaces) of the first shielding plate 151 and the second shielding plate 153 facing the target 161, wherein the first and second protection plates 181/183 operating in the shielding state are located between the first and second shielding plates 151/153 and the target 161.
The first and second protection plates 181/183 are mainly used to isolate the high temperature or high temperature substance generated during cleaning the reaction chamber 11 and the target 161 from directly contacting the first and second shielding plates 151/153, so as to prevent the first and second shielding plates 151/153 from high temperature deformation and further affect the effect of shielding the carrier tray 13.
In addition, when the driving device 17 drives the first and second shielding plates 151/153 to move close to each other and operate in the shielding state, the first and second shielding plates 181/183 also move close to each other and operate in the shielding state to shield the first and second shielding plates 151/153.
The operation of the first and second shielding plates 151/153 in the shielding state or the connection state according to the embodiment of the present invention can be defined as the first and second shielding plates 151/153 approaching each other until the distance between the two is smaller than a threshold, for example, smaller than 1 mm. In addition, the distance between the first and second protection boards 181/183 operating in the shielding state may also be smaller than a threshold. Specifically, the first shielding plate 151/153 and the second shielding plate 181/183 do not directly contact each other, so as to prevent particles from being generated during the contact process and contaminating the accommodating space 12 of the reaction chamber 11 and/or the susceptor 13.
In an embodiment of the utility model, as shown in fig. 2, 3 and 6, the first and second shielding plates 151/153 have approximately the same area, and the first and second protecting plates 181/183 also have approximately the same area. The first and second protection plates 181/183 may be connected to the first and second shielding plates 151/153 through a plurality of supporting units 185, wherein a space 182 is formed between the first and second protection plates 181/183 and the first and second shielding plates 151/153. The gap 182 can prevent heat from being conducted from the first and second protection plates 181/183 to the first and second shielding plates 151/153, so as to reduce the probability of thermal deformation of the first and second shielding plates 151/153.
When the first and second shielding plates 151/153 operate in the shielding state, a first gap 154 is formed between the first and second shielding plates 151/153, and a second gap 184 is formed between the first and second protecting plates 181/183. In an embodiment of the utility model, as shown in fig. 3 and 6, the first gap 154 is approximately overlapped with the second gap 184, wherein the first and second shielding plates 151/153 and the first and second protecting plates 181/183 may be semicircular disks with similar areas.
In another embodiment of the present invention, as shown in fig. 5 and 7, the first gap 154 and the second gap 184 do not overlap with each other, wherein the areas of the first shielding plate 151/153 and the second shielding plate 151/153 are approximately the same, but the areas of the first shielding plate 181/183 and the second shielding plate 181/183 are different, for example, the area of the first protecting plate 181 is larger than that of the second protecting plate 183. In practical applications, the areas of the first and second protection plates 181/183 may be approximately the same, and the areas of the first and second shielding plates 151/153 may be different, for example, the area of the first shielding plate 151 is larger than the area of the second shielding plate 153, so that the positions of the first gap 154 and the second gap 184 are staggered.
When the first gap 154 is not overlapped with the second gap 184, the heat or high temperature substance during cleaning can be prevented from passing through the second gap 184 and further transmitted to the carrier tray 13 through the first gap 154, so as to improve the shielding effect of the double-layer shielding member 100 on the carrier tray 13.
In an embodiment of the utility model, the first shielding plate 151 and the second shielding plate 153 may be disposed at different heights, and the first protection plate 181 and the second protection plate 183 may also be disposed at different heights, for example, the first shielding plate 151 is higher than the second shielding plate 153, and the first protection plate 181 is higher than the second protection plate 183. When the first shielding plate 151 and the second shielding plate 153 are operated in the shielding state, a portion of the first shielding plate 151 overlaps a portion of the second shielding plate 153, and a portion of the first protection plate 181 overlaps a portion of the second protection plate 183, so as to further enhance the shielding effect of the carrier tray 13.
The above-mentioned semicircular disc shape of the first and second shielding plates 151/153 and the first and second shielding plates 181/183 is only an embodiment of the present invention, and the first and second shielding plates 151/153 and the first and second shielding plates 181/183 may have any geometric shape in different embodiments.
In an embodiment of the present invention, as shown in fig. 8, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 by the shaft sealing device 173. The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, wherein a part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.
The shaft seal 173 includes an outer body 1731 and a shaft 1733. The outer tube 1731 includes a space 1732 for accommodating the shaft 1733, wherein the outer tube 1731 and the shaft 1733 are coaxially disposed, the outer tube 1731 is fixed on the reaction chamber 11, and the outer tube 1731 and the shaft 1733 can rotate relatively. The outer tube 1731 is connected to the first connecting arm 141 and is connected to the first shielding plate 151 via the first connecting arm 141 to swing. The shaft 1733 is connected to the second connecting arm 143, and is connected to and drives the second shielding plate 153 to swing via the second connecting arm 143. The shaft sealing device 173 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from the external space so as to maintain the vacuum of the accommodating space 12.
In an embodiment of the utility model, as shown in fig. 8, the number of the driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube 1731 and the shaft 1733 of the sealing device 173 and respectively drive the outer tube 1731 and the shaft 1733 to synchronously rotate in opposite directions, so as to respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube 1731 and the shaft 1733.
In another embodiment of the present invention, the number of the driving motors 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are connected and driven to synchronously swing in opposite directions through the outer tube 1731 and the shaft 1733, respectively, by a linkage mechanism. In the above embodiment of the present invention, a single driving device 17 is used as an illustration, but in practical applications, two driving devices 17 may be used, and are respectively connected to and drive the first and second shielding plates 151/153.
Specifically, the deposition tool 10 and/or the dual-layer shielding member 100 of the present invention can be operated in two states, i.e., an open state and a shielding state. As shown in fig. 2, 4, 9 and 11, the driving device 17 can drive the first and second shielding plates 151/153 and the first and second shielding plates 181/183 to swing in opposite directions, so that the first and second shielding plates 151/153 and the first and second shielding plates 181/183 are separated from each other and operate in an open state. A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 in the opened state, so that there are no first and second shielding plates 151/153 and first and second protective plates 181/183 between the target 161 and the carrier platter 13 and the substrate 163, wherein the target 161 faces the carrier platter 13 through the space 152.
In an embodiment of the utility model, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 separate a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, thereby preventing the formation of a deposited thin film on the surfaces of the reaction chamber 11 and the carrier plate 13 outside the reaction space.
Further, as shown in fig. 3, 5, and 10, the driving device 17 may drive the first and second shielding plates 151/153 and the first and second shielding plates 181/183 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 approach each other and form the shielding member 15.
The shielding member 15 can separate a cleaning space 121 in the accommodating space 12, wherein the cleaning space 121 is partially overlapped or close to the reaction space. A burn-in process may be performed in the cleaning space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space 121, and remove oxide, nitride or other contaminants on the surface of the target 161 and the film deposited on the surface of the reaction chamber 11 and/or the stopper 111.
During the cleaning process of the deposition station 10 having the dual-layer shielding member, the carrier tray 13 and/or the substrate 163 are shielded or isolated by the shielding member 15, so as to prevent the substances generated during the cleaning process from contaminating or depositing on the surface of the carrier tray 13 and/or the substrate 163.
In an embodiment of the utility model, as shown in fig. 9 and 10, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielding state in the accommodating space 12 of the reaction chamber 11 without additionally providing one or more storage chambers for storing the shielding plates in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 may be slightly larger than the original volume.
In an embodiment of the utility model, a plurality of position sensing units 19 may be further disposed on the reaction chamber 11, for example, the position sensing units 19 may be light sensing units and are used for sensing the positions of the first and second shielding plates 151/153 and/or the first and second protecting plates 181/183 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state, so as to prevent the carrier tray 13, the first shielding plate 151, and the second shielding plate 153 from abnormal collision.
In addition, the position of the dual-layer shielding member 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or moving lines on the thin film deposition machine 10 having the dual-layer shielding member. Taking the accommodating space 12 of the reaction chamber 11 as a cube as an example, as shown in fig. 9 and 10, the driving device 17 of the dual-layer shielding member 100 may be disposed at a side of the reaction chamber 11 and/or the accommodating space 12. As shown in fig. 11, the driving device 17 of the dual-layer shielding member 100 may also be disposed at a corner or a top corner of the reaction chamber 11 and/or the accommodating space 12, so as to facilitate disposing mechanisms such as a substrate feeding port and an exhaust line at a side of the reaction chamber 11.
In an embodiment of the utility model, the reaction cavity 11 may be connected to two sensing regions 113, wherein the sensing regions 113 protrude from a side surface of the reaction cavity 11, and a thickness of the sensing regions 113 is smaller than that of the reaction cavity 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing regions 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than that of the accommodating space 12. When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, a portion of the first shielding plate 151/153 and a portion of the first protecting plate 181/183 enter the two sensing spaces 120 fluidly connected to the accommodating space 12, respectively, wherein the area of the first shielding plate 151 and the second shielding plate 153 in the sensing space 120 is smaller than the area of the first shielding plate 151 and the second shielding plate 153 in the accommodating space 12.
As shown in fig. 11, two sensing regions 113 are respectively disposed on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively disposed on the two sensing regions 113 for sensing the first and second shielding plates 151/153 and/or the first and second protecting plates 181/183 entering the sensing space 120.
The utility model has the advantages that:
when the reaction cavity is cleaned, the driving device drives the first shielding plate and the second shielding plate to approach each other and switch to a shielding state to shield the bearing disc, so that the bearing disc is prevented from being polluted in the process of cleaning the deposition machine.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, i.e., all equivalent variations and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.
Claims (9)
1. A deposition machine with a dual-layer shielding member, comprising:
a reaction cavity comprising a containing space;
a bearing disc which is positioned in the containing space and is used for bearing at least one substrate; and
a stopper located in the containing space, one end of the stopper being connected to the reaction chamber, and the other end of the stopper forming an opening; and
a two-layer shield member comprising:
a first shielding plate located in the accommodating space;
a first protection plate arranged on one surface of the first shielding plate;
a second shielding plate located in the accommodating space;
the second protection plate is arranged on one surface of the second shielding plate; and
the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions, so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other and are used for shielding the bearing disc, the first protection plate and the second protection plate are also close to each other and are used for shielding the first shielding plate and the second shielding plate, a first gap is formed between the first shielding plate and the second shielding plate in the shielding state, a second gap is formed between the first protection plate and the second protection plate, and the first gap and the second gap are not overlapped.
2. The deposition apparatus with dual-layer shielding structure as claimed in claim 1, wherein the driving device comprises a shaft seal device and at least one driving motor, the driving motor is connected to the first shielding plate and the second shielding plate via the shaft seal device.
3. The deposition apparatus with dual-layered shielding member as claimed in claim 1, wherein a target is disposed in the receiving space of the reaction chamber and faces the carrier plate, the first shielding plate and the second shielding plate operating in the shielding state are disposed between the target and the carrier plate, and the first protection plate and the second protection plate are disposed between the target and the first shielding plate and the second shielding plate.
4. The deposition apparatus with two-layer shielding structure as claimed in claim 1, wherein the first protection plate has an area larger than the second protection plate, or the first protection plate has an area larger than the second protection plate.
5. The deposition apparatus with two-layer shielding members according to claim 1, wherein two sensing regions are connected to the reaction chamber, each of the two sensing regions comprises a sensing space in fluid communication with the accommodating space, and the two sensing regions have a thickness smaller than that of the reaction chamber, and at least one position sensing unit is disposed in each of the two sensing regions for sensing the first shielding plate and the second shielding plate entering the sensing space.
6. A double-layer shielding component is suitable for a deposition machine, and is characterized by comprising:
a first shielding plate;
a first protection plate arranged on one surface of the first shielding plate;
a second shielding plate;
the second protection plate is arranged on one surface of the second shielding plate, wherein the height of the first protection plate is higher than that of the second protection plate; and
the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other, the first protection plate and the second protection plate are also close to each other, and part of the first protection plate is overlapped with part of the second protection plate and is used for shielding the first shielding plate and the second shielding plate.
7. The dual-layer shielding member according to claim 6, wherein the driving device comprises a shaft sealing device and at least one driving motor, the driving motor connects the first shielding plate and the second shielding plate via the shaft sealing device.
8. The dual-layer shield member according to claim 6, wherein the first shield plate is higher than the second shield plate such that a portion of the first shield plate overlaps a portion of the second shield plate in the shield state.
9. The two-layer shield member according to claim 8, wherein the area of the first shield plate is larger than the area of the second shield plate, or the area of the first shield plate is larger than the area of the second shield plate.
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| CN202121628419.3U CN216585186U (en) | 2021-07-16 | 2021-07-16 | Double-layer shielding component and deposition machine table with same |
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| CN202121628419.3U CN216585186U (en) | 2021-07-16 | 2021-07-16 | Double-layer shielding component and deposition machine table with same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115612981A (en) * | 2021-07-16 | 2023-01-17 | 鑫天虹(厦门)科技有限公司 | Double-layer shielding component and film deposition machine table with same |
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2021
- 2021-07-16 CN CN202121628419.3U patent/CN216585186U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115612981A (en) * | 2021-07-16 | 2023-01-17 | 鑫天虹(厦门)科技有限公司 | Double-layer shielding component and film deposition machine table with same |
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