TWM619997U - Shielding mechanism and deposition chamber having shielding mechanism - Google Patents

Abstract

The present model provides a deposition chamber with a shielding mechanism, which mainly includes a reaction chamber, a supporting plate and a shielding mechanism, and part of the shielding mechanism and the supporting plate are located in the reaction chamber. The shielding mechanism includes a first carrying arm, a second carrying arm, a first shielding plate, a second shielding plate, and a driving device. The driving device is connected to the first and second carrying arms and passes through the first and second The carrying arm carries the first and second shielding plates to drive the first and second shielding plates to swing in opposite directions. During the cleaning process, the driving device will drive the first and second shielding plates to approach each other, and place the first and second shielding plates operating in the shielding state on the carrier plate to shield the cleaning process of the deposition chamber. Pollution.

Description

Shielding mechanism and deposition chamber with shielding mechanism

The present invention relates to a deposition chamber with a shielding mechanism, which mainly shields a carrying plate through the shielding mechanism, so as to avoid contamination of the carrying plate in the process of cleaning the processing chamber.

Chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) are all commonly used thin film deposition equipment, and are commonly used in integrated circuits, light-emitting diodes, and display manufacturing processes.

The deposition equipment mainly includes a cavity and a wafer carrier. The wafer carrier is located in the cavity and used to carry at least one wafer. Taking physical vapor deposition as an example, a target material needs to be set in the cavity, where the target material faces the wafer on the wafer carrier tray. During physical vapor deposition, inert gas and/or reactive gas can be delivered into the cavity, bias voltage is applied to the target and the wafer carrier respectively, and the wafer carried by the wafer carrier is heated through the wafer carrier.

The inert gas in the cavity forms ionized inert gas due to the action of the high-voltage electric field, and the ionized inert gas will be attracted by the bias on the target material and bombard the target material. The target atoms or molecules sputtered from the target are attracted by the bias voltage on the wafer carrier and are deposited on the surface of the heated wafer to form a thin film on the surface of the wafer.

After a period of use, a deposited film will be formed on the inner surface of the cavity. Therefore, the cavity needs to be cleaned periodically to prevent the deposited film from falling during the manufacturing process and contaminating the wafer. In addition, oxides or other contaminants may also form on the surface of the target, so it is also necessary to clean the target periodically. Generally speaking, a burn-in process is used to strike a target in the cavity with plasma ions to remove oxides or other contaminants on the surface of the target.

When cleaning the cavity and the target, it is necessary to remove the wafer carrier and the wafer from the cavity or isolate the wafer carrier to avoid contamination of the wafer carrier and wafer during the cleaning process.

Generally speaking, after a period of use, the deposition chamber usually needs to be cleaned to remove the oxide or nitride on the thin film deposited in the chamber and the target material. The particles generated during the cleaning process will contaminate the carrier plate, so it is necessary to isolate the carrier plate and contaminants. The present invention provides a shielding mechanism and a deposition chamber with a shielding mechanism. The two shielding plates are driven to swing in opposite directions through a driving device, so that the two shielding plates are operated in an open state and a shielding state. The shielding plate operating in the shielding state can be placed on the carrying tray and shielding the carrying tray to avoid contamination of the carrying tray with particles generated when cleaning the cavity or the target material.

An object of the present invention is to provide a deposition chamber with a shielding mechanism, which mainly includes a reaction chamber, a supporting plate and a shielding mechanism. The shielding mechanism includes a driving device, two carrying arms, and two shielding plates. The driving device carries two shielding plates through the two carrying arms, and drives the two shielding plates to swing in opposite directions, so that the two shielding plates operate In an open state or a shielded state.

When cleaning the reaction chamber, the driving device drives the two shielding plates to approach each other in a swinging manner, and then places the two shielding plates on the carrier plate, and shields the carrier plate in the accommodating space through the two shielding plates to avoid The plasma used in the cleaning process or the pollution generated contact the carrier plate. During the deposition process, the driving device drives the two shielding plates to move away from each other in a swinging manner, and can deposit thin films on the substrate in the reaction chamber.

In addition, the two shielding plates placed on the carrying plate partially overlap, so that the shielding plate can completely cover the carrying plate and can effectively isolate the carrying plate and the pollution source. The overlapping parts of the two shielding plates are not in direct contact, which can avoid the generation of particles during the contact between the two shielding plates, thereby reducing pollution to the reaction chamber.

An object of the present invention is to provide a deposition chamber with a shielding mechanism, which mainly constitutes a complete shielding member through two shielding plates, which can reduce the space required for storing the shielding plates. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, and the two shielding plates can be operated in the open state or the shielded state in the accommodating space of the reaction chamber. , Can simplify the structure of the reaction chamber and reduce the volume of the reaction chamber.

An object of the present invention is to provide a deposition chamber with a shielding mechanism, in which a driving device is connected to and supports two shielding plates through two carrying arms respectively, so as to reduce the load of the carrying arms. In addition, a shielding plate with a larger thickness can be further used to prevent the shielding plate from being deformed at high temperature when cleaning the deposition chamber, and it is beneficial to improve the effect of the shielding plate to shield the carrier plate.

In order to achieve the above-mentioned purpose, the present invention proposes a deposition chamber with a shielding mechanism, which includes: a reaction chamber, including an accommodating space; A substrate; and a shielding mechanism, including: a first supporting arm located in the accommodating space and including a plurality of first grooves; a second supporting arm located in the accommodating space and including a plurality of second grooves; A first shielding plate, a surface of the first shielding plate includes a plurality of first supporting legs, wherein the first shielding plate is placed on the first supporting arm, and the plurality of first supporting legs are respectively located in the plurality of first grooves In; a second shielding plate, a surface of the second shielding plate includes a plurality of second supporting feet, wherein the second shielding plate is placed on the second carrying arm, and the plurality of second supporting feet are respectively located on the plurality of second In the groove, the height of the first shielding plate is higher than that of the second shielding plate; and a driving device connected to the first carrying arm and the second carrying arm, and driving the first shielding through the first carrying arm and the second carrying arm respectively The plate and the second shielding plate swing in opposite directions, so that the first shielding plate and the second shielding plate switch between an open state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state respectively pass through the first shielding plate and the second shielding plate. The supporting feet and the second supporting feet are placed on the carrying surface of the carrying plate, and part of the first shielding plate and part of the second shielding plate are overlapped, and the carrying plate is covered by the first shielding plate and the second shielding plate.

The present model proposes a shielding mechanism, which is suitable for a deposition chamber, and includes: a first carrying arm including a plurality of first grooves; a second carrying arm including a plurality of second grooves; and a first shielding plate, A surface of the first shielding plate includes a plurality of first supporting legs, wherein the first shielding plate is placed on the first carrying arm, and the plurality of first supporting legs are respectively located in the plurality of first grooves; a second shielding plate A surface of the second shielding plate includes a plurality of second supporting legs, wherein the second shielding plate is placed on the second supporting arm, and the plurality of second supporting legs are respectively located in the plurality of second grooves. The height of a shielding plate is higher than that of the second shielding plate; and a driving device that connects the first carrying arm and the second carrying arm, and drives the first shielding plate and the second shielding plate through the first carrying arm and the second carrying arm, respectively Swing in the opposite direction, so that the first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein part of the first shielding plate in the shielding state overlaps with part of the second shielding plate, and the first shielding plate in the open state is A space is formed between a shielding plate and a second shielding plate.

In the deposition chamber and its shielding mechanism, the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first supporting arm and the second supporting arm through the shaft sealing device.

In the deposition chamber and its shielding mechanism, the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the drive motor is connected to the first carrying arm through the outer tube body, and The shaft body is connected with the second carrying arm, and synchronously drives the shaft body and the outer tube body to rotate in opposite directions.

In the deposition chamber and its shielding mechanism, the first shielding plate includes a first inner side surface, the second shielding plate includes a second inner side surface, the first inner side surface faces the second inner side surface, and the first groove The first inner side surface of the first shielding plate is connected, and the second groove is connected to the second inner side surface of the second shielding plate.

In the deposition chamber and its shielding mechanism, the first shielding plate and the second shielding plate include at least one first alignment portion, and the first and second support arms include at least one second alignment portion, The first shielding plate aligns with the first carrying arm through the first aligning portion and the second aligning portion, and the second shielding plate aligns with the second carrying arm through the first aligning portion and the second aligning portion.

The deposition chamber and its shielding mechanism include two sensing areas connected to the reaction chamber, the two sensing areas respectively include a sensing space and fluidly connected accommodating space, and the thickness of the two sensing areas is smaller than that of the reaction chamber , Two of the sensing areas are respectively provided with at least one position sensing unit for sensing the first shielding plate and the second shielding plate entering the sensing area.

Please refer to FIG. 1, which is a schematic side sectional view of an embodiment of a deposition chamber with a shielding mechanism operating in a shielded state. As shown in the figure, the deposition chamber 10 mainly includes a reaction chamber 11, a carrier plate 13 and a shielding mechanism 100. The reaction chamber 11 includes an accommodating space 12 for accommodating the carrier plate 13 and part of the shielding mechanism. 100.

The carrier plate 13 is located in the accommodating space 12 of the reaction chamber 11 and is used to carry at least one substrate. Taking the deposition chamber 10 as a physical vapor deposition chamber as an example, a target 161 is set in the reaction chamber 11, and the target 161 faces the carrier plate 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the carrier plate 13 and/or the substrate located in the accommodating space 12.

Please refer to FIGS. 2 and 3 together, the shielding mechanism 100 includes a first carrying arm 141, a second carrying arm 143, a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the first carrying arm The arm 141, the second supporting arm 143, the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12. The driving device 17 is connected to the first supporting arm 141 and the second supporting arm 143, wherein the first supporting arm 141 and the second supporting arm 143 are used for supporting the first shielding plate 151 and the second shielding plate 153, respectively. The driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions through the first carrying arm 141 and the second carrying arm 143, respectively. For example, the first carrying arm 141 and the second carrying arm 143 can drive the device 17 The axis swings in the opposite direction synchronously.

At least one first supporting leg 1513 and/or at least one first positioning portion 1511 can be provided on the surface of the first shielding plate 151 connected to the first supporting arm 141, and the first supporting arm 141 is connected to the surface of the first shielding plate 151 At least one first groove 1413 and/or at least one second alignment portion 1411 may be provided. When the first shielding plate 151 is placed on the first supporting arm 141, the first groove 1413 and the second positioning portion 1411 accommodate and correspond to the first supporting leg 1513 and the first positioning portion 1511, respectively.

At least one second supporting foot 1533 and/or at least one first positioning portion 1531 can be provided on the surface of the second shielding plate 153 connected to the second supporting arm 143, and the second supporting arm 143 is connected to the surface of the second shielding plate 153 At least one second groove 1433 and/or at least one second alignment portion 1431 may be provided, wherein the second groove 1433 and the second alignment portion 1431 respectively accommodate and correspond to the second supporting leg 1533 and the first alignment portion 1431部1531.

Specifically, the first alignment portion 1511/1531 and the second alignment portion 1411/1431 may have corresponding structures, and are used to align the first shielding plate 151 with the first carrying arm 141, and align the second shielding plate 153 and the second carrying arm 143. For example, the first alignment portion 1511/1531 may be a cone protruding from the surfaces of the first shielding plate 151 and the second shielding plate 153, wherein the first alignment portion 1511 is close to the surfaces of the first shielding plate 151 and the second shielding plate 153 /1531 has a larger cross-sectional area, and the second alignment portion 1411/1431 can be a cone-shaped groove or cavity provided on the surface of the first supporting arm 141 and the second supporting arm 143, wherein the first supporting arm 141 and the second supporting arm 141 The two supporting arms 143 are used for supporting the second aligning portions 1411 and 1431 on the surfaces of the first shielding plate 151 and the second shielding plate 153 with a relatively large cross-sectional area. The first supporting leg 1513 and the second supporting leg 1533 may be columnar protrusions provided on the surfaces of the first shielding plate 151 and the second shielding plate 153.

When the first shielding plate 151 and the second shielding plate 153 are placed on the first carrying arm 141 and the second carrying arm 143, the first alignment portion 1511/1531 and the second alignment portion 1411/1431 can respectively separate the first and The second shielding plate 151/153 is guided to a specific or fixed position of the first and second supporting arms 141/143. The first alignment portion 1511/1531 is a convex portion and the second alignment portion 1411/1431 is a concave portion is only an embodiment of the present invention. In different embodiments, the first alignment portion 1511/1531 may be a concave portion and a second pair The position portion 1411/1431 may be a convex portion.

As shown in FIG. 4, the first supporting arm 141 includes a first inner side surface 1410, and the second supporting arm 143 includes a second inner side surface 1430, and the first inner side surface 1410 of the first supporting arm 141 faces the second inner side surface 1410. The second inner side 1430 of the supporting arm 143. The first groove 1413 provided on the first supporting arm 141 communicates with the first inner side surface 1410, and the second groove 1433 provided on the second supporting arm 143 communicates with the second inner side surface 1430.

The first shielding plate 151 and the second shielding plate 153 can be separated from the first carrying arm 141 and the second carrying arm 143 and placed on the carrying surface 131 of the carrying tray 13, wherein the carrying surface 131 of the carrying tray 13 is used to carry at least A substrate.

The first shielding plate 151 and the second shielding plate 153 can be plate bodies. The area and shape of the first shielding plate 151 and the second shielding plate 153 can be similar. For example, the first shielding plate 151 and the second shielding plate 153 can be Semi-circular plate body. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 will approach each other to form a disc-shaped shielding member 15, and the shielding member 15 shields the load. Disk 13.

Specifically, when the first shielding plate 151 and the second shielding plate 153 are close to each other to form the shielding member 15, the carrier plate 13 can be driven to move toward the target 161 through the lifting device 18, so that the first shielding plate 151 and the second shielding plate 151 The two shielding plates 153 are respectively placed on the supporting surface 131 of the supporting tray 13 via the first supporting leg 1513 and the second supporting leg 1533. Then the driving device 17 can drive the first supporting arm 141 and the second supporting arm 143 to swing in opposite directions, so that the first supporting arm 141 and the second supporting arm 143 are away from each other.

After the first shielding plate 151 and the second shielding plate 153 are placed on the bearing surface 131 of the carrier tray 13 described above, the driving device 17 drives the first carrier arm 141 and the second carrier arm 143 to move away from each other, which is only an embodiment of the present invention. In different embodiments, after the first shielding plate 151 and the second shielding plate 153 are placed on the carrying surface 131 of the carrying tray 13, the first carrying arm 141 and the second carrying arm 143 can remain stationary.

The first shielding plate 151 and the second shielding plate 153 described in the embodiment of the present invention are operated in the shielding state, which can be defined as the first shielding plate 151 and the second shielding plate 153 close to each other until the distance between the two is less than one. Threshold value, for example, less than 1mm. In addition, the first shielding plate 151 and the second shielding plate 153 in the shielding state are respectively placed on the bearing surface 131 of the carrier tray 13 through the first supporting leg 1513 and the second supporting leg 1533, and are covered by the first shielding plate 151 and the second shielding plate 151 and the second shielding plate. The plate 153 shields the carrier plate 13. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact, so as to prevent the first shielding plate 151 and the second shielding plate 153 from generating particles during the contact process and polluting the accommodation of the reaction chamber 11 Space 12 and/or carrier plate 13.

In an embodiment of the present invention, the first shielding plate 151 and the second shielding plate 153 can be set at different heights. For example, the first shielding plate 151 is higher than the second shielding plate 153. When the plate 153 is operated in the shielding state, part of the first shielding plate 151 and part of the second shielding plate 153 will overlap, and an overlapping area 154 is formed between the first shielding plate 151 and the second shielding plate 153 to improve the shielding The occlusion effect of item 15.

The area and shape of the above-mentioned first shielding plate 151 and the second shielding plate 153 are similar, and the semicircular plate body is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 can be plates with different areas and shapes, or can be square, elliptical, or any geometrical shape, such as the area of the first shielding plate 151 It may be larger than the area of the second shielding plate 153.

Taking the first shielding plate 151 and the second shielding plate 153 as a semicircular plate body as an example, the first shielding plate 151 and the second shielding plate 153 have straight sides and semicircular or arc-shaped sides, respectively. The linear sides of the first shielding plate 151 and the second shielding plate 153 face each other. The connection of the first shielding plate 151 and the second shielding plate 153 through straight sides is only an embodiment of the present invention, and is not a limitation of the scope of rights of the present invention. In practical applications, the linear sides of the first shielding plate 151 and the second shielding plate 153 may also be corresponding curved or zigzag sides.

In an embodiment of the present invention, as shown in FIG. 5, the driving device 17 includes at least one driving motor 171 and a shaft sealing device 173, wherein the driving motor 171 is connected to the first carrying arm 141 and the second carrying arm 143 through the shaft sealing device 173 . The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, and part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.

The shaft sealing device 173 includes an outer tube body 1731 and a shaft body 1733. The outer tube body 1731 includes a space 1732 for accommodating the shaft body 1733, wherein the outer tube body 1731 and the shaft body 1733 are coaxially arranged, and the outer tube body 1731 and the shaft body 1733 can rotate relatively. The outer tube 1731 is connected to the first supporting arm 141, and is connected via the first supporting arm 141 to drive the first shielding plate 151 to swing. The shaft 1733 is connected to the second supporting arm 143, is connected via the second supporting arm 143 and drives the second shielding plate 153 to swing.

The shaft sealing device 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from an external space, so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft sealing device 173 may be a magnetic fluid shaft seal.

In an embodiment of the present invention, as shown in FIG. 5, the number of driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube body 1731 and the shaft body 1733 of the shaft sealing device 173, and drive the outer tube separately The body 1731 and the shaft body 1733 rotate in opposite directions synchronously to drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube body 1731 and the shaft body 1733, respectively.

In another embodiment of the present invention, the number of the driving motor 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are respectively connected and driven through the first carrying arm 141 and the second carrying arm 143 through a linkage mechanism Swing synchronously in the opposite direction.

Specifically, the deposition chamber 10 and/or the shielding mechanism 100 of the present invention can be operated in two states, namely an open state and a shielded state. As shown in FIG. 6, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in an open state. A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 operating in the open state, so that there is no first shielding plate 151 and second shielding between the target 161 and the carrier plate 13 and the deposition chamber.板153.

Then, the carrier plate 13 and the substrate can be driven to approach the target 161, and the gas in the accommodating space 12, such as an inert gas, strikes the target 161 to deposit a thin film on the surface of the substrate.

In an embodiment of the present invention, as shown in FIG. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 is An opening 112 is formed. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 partition a reaction space in the accommodating space 12, and deposit a film on the surface of the substrate in the reaction space, which can prevent the reaction chamber 11 and the carrier from being outside the reaction space. A deposited film is formed on the surface of the disk 13.

In addition, as shown in FIGS. 2 and 7, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are close to each other and operate at Covered state. The first shielding plate 151 and the second shielding plate 153 can form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the carrier plate 13 and is used to shield the carrier plate 13 to isolate the target material 161 and the carrier plate 13.

The shielding member 15 may partition a clean space 121 in the accommodating space 12, wherein the clean space 121 and the reaction space partially overlap or are close to each other. A burn-in process can be performed in the clean space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the clean space 121, and to remove oxides and nitrides on the surface of the target 161 Or other contaminants, and the deposition film on the surface of the reaction chamber 11 and/or the stopper 111.

In an embodiment of the present invention, as shown in FIGS. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielded state in the accommodating space 12 of the reaction chamber 11, without One or more storage cavities need to be additionally provided to store the shielding plate in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 can be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.

In an embodiment of the present invention, a plurality of position sensing units 19 may be further provided on the reaction chamber 11, for example, the position sensing unit 19 may be a light sensing unit. The position sensing unit 19 faces the accommodating space 12 and is used to sense the positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state, which can avoid The tray 13, the first shielding plate 151 and the second shielding plate 153 collide abnormally.

In addition, the position of the shielding mechanism 100 in the reaction chamber 11 can be adjusted according to the configuration of other mechanisms or moving lines on the deposition chamber 10. Taking the accommodating space 12 of the reaction cavity 11 as a cube as an example, as shown in FIGS. 6 and 7, the driving device 17 of the shielding mechanism 100 can be arranged on the side of the reaction cavity 11 and/or the accommodating space 12. As shown in FIG. 8, the driving device 17 of the shielding mechanism 100 can also be arranged at the corner or the top corner of the reaction chamber 11/or the accommodating space 12, so as to facilitate the provision of substrate feeding ports and pumping on the side of the reaction chamber 11. Gas pipeline and other institutions.

In an embodiment of the present invention, the reaction cavity 11 can be connected to two sensing areas 113, wherein the sensing area 113 protrudes from the side surface of the reaction cavity 11, and the thickness of the sensing area 113 is smaller than that of the reaction cavity 11. The two sensing regions 113 respectively include a sensing space 120, and the sensing space 120 of the sensing region 113 is fluidly connected to the accommodating space 12 of the reaction chamber 11, wherein the thickness or height of the sensing space 120 is smaller than the accommodating space 12 . When the first shielding plate 151 and the second shielding plate 153 are operated in the open state, part of the first shielding plate 151 and part of the second shielding plate 153 will respectively enter the two sensing spaces 120 fluidly connected to the accommodation space 12. The area of the first shielding plate 151 and the second shielding plate 153 located in the sensing space 120 is smaller than the area of the first shielding plate 151 and the second shielding plate 153 located in the accommodating space 12.

As shown in FIG. 8, two sensing areas 113 are respectively disposed on two adjacent sides of the reaction chamber 11, and at least one position sensing unit 19 is respectively disposed on the two sensing areas 113, respectively for sensing The first shielding plate 151 and the second shielding plate 153 that enter the sensing space 120 are detected.

The foregoing is only one of the preferred embodiments of the present invention, and is not used to limit the scope of implementation of the present invention, that is, all the equivalent changes and changes in the shape, structure, characteristics and spirit described in the scope of the patent application of the present invention Modifications should be included in the scope of the patent application for this new model.

10: Deposition chamber 100: Shading mechanism 11: Reaction chamber 111: stop 112: opening 113: Sensing area 12: accommodating space 120: Sensing Space 121: clean space 13: Carrier plate 131: bearing surface 141: The first carrying arm 1410: first inner side 1411: The second counterpoint 1413: first groove 143: The second carrying arm 1430: second inner side 1431: The second counterpoint 1433: second groove 15: Shield 151: The first shielding board 1511: The first alignment 1513: first support foot 152: Interval 153: The second shielding board 1531: The first alignment 1533: second support foot 154: Overlap area 161: Target 17: Drive 171: drive motor 173: Shaft seal device 1731: Outer tube body 1732: space 1733: Shaft 18: Lifting device 19: Position sensing unit

[Figure 1] is a schematic side sectional view of an embodiment of a new deposition chamber with a shielding mechanism operating in a shielded state.

[Fig. 2] is a three-dimensional schematic diagram of an embodiment of the shielding mechanism of the new deposition chamber operating in a shielded state and an enlarged cross-sectional perspective view thereof.

[Fig. 3] is a three-dimensional exploded schematic diagram of an embodiment of the shielding mechanism of the novel deposition chamber.

[Figure 4] is a three-dimensional schematic diagram of an embodiment of the driving device and the carrying arm of the new shielding mechanism.

[Fig. 5] is a schematic three-dimensional cross-sectional view of an embodiment of the driving device of the novel shielding mechanism.

[Figure 6] is a top view of an embodiment of the new deposition chamber with a shielding mechanism operating in an open state.

[Fig. 7] is a top view of an embodiment of a new type of deposition chamber with a shielding mechanism operating in a shielded state.

[Figure 8] is a top view of another embodiment of the deposition chamber with a shielding mechanism operating in an open state.

10: Deposition chamber

11: Reaction chamber

111: stop

112: opening

12: accommodating space

121: clean space

13: Carrier plate

131: bearing surface

15: Shield

151: The first shielding board

1513: first support foot

153: The second shielding board

1533: second support foot

161: Target

18: Lifting device

Claims (10)

A deposition chamber with a shielding mechanism, including: A reaction chamber, including an accommodating space: A carrying tray located in the accommodating space and including a carrying surface for carrying at least one substrate; and A sheltering mechanism, including: A first carrying arm, located in the accommodating space, including a plurality of first grooves; A second carrying arm, located in the accommodating space, including a plurality of second grooves; A first shielding plate, a surface of the first shielding plate includes a plurality of first supporting legs, wherein the first shielding plate is placed on the first carrying arm, and the plurality of first supporting legs are respectively located on the plurality of first supporting legs In the first groove; A second shielding plate, a surface of the second shielding plate includes a plurality of second supporting legs, wherein the second shielding plate is placed on the second carrying arm, and the plurality of second supporting legs are respectively located on the plurality of second supporting legs In a second groove, wherein the height of the first shielding plate is higher than that of the second shielding plate; and A driving device connects the first carrying arm and the second carrying arm, and drives the first shielding plate and the second shielding plate to swing in opposite directions through the first carrying arm and the second carrying arm, respectively, so that The first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein the shielding state the first shielding plate and the second shielding plate pass through the first support leg and the second support, respectively The feet are placed on the carrying surface of the carrying tray, and part of the first shielding plate and part of the second shielding plate overlap to cover the carrying tray. The deposition chamber with a shielding mechanism according to claim 1, wherein the driving device includes a shaft sealing device and at least one driving motor, and the driving motor is connected to the first carrying arm and the second carrying arm through the shaft sealing device. The deposition chamber with a shielding mechanism according to claim 2, wherein the shaft sealing device includes an outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, and the drive motor penetrates the outer tube body. The tube body is connected to the first carrying arm, and the second carrying arm is connected through the shaft body, and synchronously driving the shaft body and the outer tube body to rotate in opposite directions. The deposition chamber with a shielding mechanism according to claim 1, wherein the first shielding plate includes a first inner side surface, the second shielding plate includes a second inner side surface, the first inner side surface and the second inner side surface Facing each other, the first groove communicates with the first inner side surface of the first shielding plate, and the second groove communicates with the second inner side surface of the second shielding plate. The deposition chamber with a shielding mechanism according to claim 4, wherein the first shielding plate and the second shielding plate include at least one first alignment portion, and the first carrying arm and the second carrying arm include At least one second alignment portion, the first shielding plate aligns the first carrier arm through the first alignment portion and the second alignment portion, and the second shielding plate penetrates the first alignment portion and The second aligning part aligns the second carrying arm. The deposition chamber with a shielding mechanism according to claim 1, comprising two sensing areas connected to the reaction chamber, the two sensing areas respectively include a sensing space fluidly connected to the accommodating space, the two sensing areas The thickness of the sensing area is smaller than that of the reaction chamber, wherein the two sensing areas are respectively provided with at least one position sensing unit for sensing the first shielding plate and the second shielding plate entering the sensing area. A shielding mechanism, suitable for a deposition chamber, includes: A first carrying arm, including a plurality of first grooves; A second carrying arm, including a plurality of second grooves; A first shielding plate, a surface of the first shielding plate includes a plurality of first supporting legs, wherein the first shielding plate is placed on the first carrying arm, and the plurality of first supporting legs are respectively located on the plurality of first supporting legs In the first groove; A second shielding plate, a surface of the second shielding plate includes a plurality of second supporting legs, wherein the second shielding plate is placed on the second carrying arm, and the plurality of second supporting legs are respectively located on the plurality of second supporting legs In a second groove, wherein the height of the first shielding plate is higher than that of the second shielding plate; and A driving device connects the first carrying arm and the second carrying arm, and drives the first shielding plate and the second shielding plate to swing in opposite directions through the first carrying arm and the second carrying arm, respectively, so that The first shielding plate and the second shielding plate are switched between an open state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state overlap, and the first shielding plate in the open state is A space is formed between a shielding plate and the second shielding plate. The shielding mechanism according to claim 7, wherein the first shielding plate includes a first inner side surface, the second shielding plate includes a second inner side surface, the first inner side surface faces the second inner side surface, and the The first groove communicates with the first inner side surface of the first shielding plate, and the second groove communicates with the second inner side surface of the second shielding plate. The shielding mechanism according to claim 8, wherein the first shielding plate and the second shielding plate include at least one first alignment portion, and the first carrying arm and the second carrying arm include at least one second pair Position part, the first shielding plate aligns the first carrying arm through the first positioning part and the second positioning part, and the second shielding plate aligns the first supporting arm through the first positioning part and the second aligning part Aligns with the second carrying arm. The shielding mechanism according to claim 7, wherein the driving device includes a shaft sealing device and at least one driving motor, the driving motor is connected to the first carrying arm and the second carrying arm through the shaft sealing device, and the shaft sealing device includes An outer tube body and a shaft body, the outer tube body includes a space for accommodating the shaft body, the drive motor is connected to the first carrying arm through the shaft body, and the second carrying arm is connected through the outer tube body, and The shaft body and the outer tube body are synchronously driven to rotate in opposite directions.

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