M416187 五、新型說明： 【新型所屬之技術領域】 本創作爲：在配線基板、回路基板的製造步驟中，光 蝕刻所使用之光罩等的基板洗淨裝置。 . 【先前技術】 光蝕刻所使用的光罩，必須將「曝光時所附著之光阻 φ 劑等的污漬」予以洗淨，傳統上已提供了各式各樣的洗淨 裝置。就洗淨方法而言，有著「利用轉動刷子去除污染」 、「浸漬於洗淨槽的洗淨液」的方法、「對基板高壓噴射 洗淨液」的方法、或者將上述各方法合倂使用的方法。此 外’還存有「洗淨時粒子朝基板附著」、「洗淨完成時， 於基板表面形成水痕」之類的問題，而提供了用來解決上 述問題的洗淨裝置。 〔專利文獻1〕日本公開公報：特開2003-293 94號公 報 〔專利文獻2〕日本公開公報：特開2007-317802號公 報 【新型內容】 〔新型欲解決之課題〕 然而，傳統的裝置，僅是單純地將複數的洗淨液浸漬 槽及洗淨機構依洗淨步驟的順序予以排列，爲了更進一步 提高洗淨能力而增加洗淨步驟，以致裝置無法避免地大型 -3- M416187 化。此外，在上述的製造時，因爲使用光罩之配線基板、 回路基板的大型化，連帶使光罩也大型化，對應於該狀況 也使洗淨裝置變得大型化。 本創作是提供一種：在配線基板、回路基板的製造現 場、硏究所、光罩的試作現場等，能有效率地洗淨光罩， 並且小型又具有泛用性的基板洗淨裝置。 〔解決課題之手段〕 爲了解決前述課題，本創作是光蝕刻技術所使用之光 罩等的基板洗淨裝置，其特徵爲：是由被設於裝置上部的 基板設置部、和被設於裝置中間部的乾燥部、和被設於裝 置下部的洗淨部、及用來將基板在「前述基板設置部、前 述乾燥部、前述洗淨部」之間垂直地搬送的搬送機構所構 成， 前述乾燥部，具備一對「用來去除附著於基板之洗淨 液」的氣刀，前述洗淨部是由以下所構成：至少一對洗淨 «嘴，該至少一對洗淨噴嘴是用來對前述基板噴射洗淨液 ;和一對轉動刷子，該一對轉動刷子是用來剝除前述基板 &附著物；及洗淨槽機構，該洗淨槽機構具備1個以上的 & '净槽、及使該洗淨槽可在洗淨位置與待機位置之間移動 的移動機構。 在「用來基板搭載於搬送機構」之基板設置部的正下 方’設有乾燥部與洗淨部，藉由垂直地在基板設置部、乾 @部與洗淨部之間搬送基板，可降低裝置的設置面積。 -4- M416187 本創作的特徵爲：前述基板設置部、前期乾燥部與前 述洗淨部，是由各別的分隔板所分隔。 藉由以分隔板將基板設置部、乾燥部與洗淨部予以隔 開而形成獨立空間的作法，洗淨部的洗淨液飛沬不會污染 乾燥部，此外乾燥部的洗淨液飛沫不會污染基板設置部。 本創作的特徵爲：前述一對洗淨噴嘴、前述一對轉動 刷子與前述一對氣刀，分別是對稱地設在搬送基板之垂直 方向的垂直面上。 由於可以其從兩面對垂直搬送的基板執行各種洗淨處 理，因此裝置不會變大，且能執行有效率的洗淨。 本創作的特徵爲：前述洗淨部，具備覆蓋前述待機位 置之上部的蓋。 當洗淨槽位於待機位置時，由於具有覆蓋待機位置之 上部的蓋，可防止洗淨廢液或飛沬從洗淨位置落入洗淨槽 內。M416187 V. New type of description: [Technical field to which the new type belongs] This is a substrate cleaning device such as a photomask used for photolithography in the manufacturing process of a wiring board or a circuit board. [Prior Art] The reticle used for photo-etching must be cleaned of "stains such as photoresist φ agent adhered during exposure", and various cleaning devices have been conventionally provided. The washing method includes a method of "removing contamination by a rotating brush", "a washing liquid immersed in a washing tank", a method of "high-pressure jet washing liquid for a substrate", or a combination of the above methods. Methods. Further, there are problems such as "the particles are attached to the substrate during washing" and "water marks are formed on the surface of the substrate when the cleaning is completed", and a cleaning device for solving the above problems is provided. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. 2007-317802 (Publication No. 2007-317802) [New Content] [New Problem to be Solved] However, a conventional device, Simply, the plurality of washing liquid immersion tanks and the washing mechanism are arranged in the order of the washing step, and the washing step is increased in order to further improve the washing ability, so that the apparatus is inevitably large -3-M416187. In addition, in the above-mentioned manufacturing, the size of the wiring substrate and the size of the circuit board are increased, and the size of the mask is increased in size, and the cleaning apparatus is also increased in size in response to this situation. The present invention provides a substrate cleaning apparatus which can efficiently clean a photomask and a small and versatile substrate in a manufacturing site of a wiring board, a circuit board, a research institute, and a mask. [Means for Solving the Problem] In order to solve the above problems, the present invention is a substrate cleaning device such as a photomask used in a photolithography technique, and is characterized in that it is provided on a substrate mounting portion provided on an upper portion of the device, and is provided in the device. a drying unit at the intermediate portion, a cleaning unit provided at a lower portion of the apparatus, and a transport mechanism for vertically transporting the substrate between the “substrate installation unit, the drying unit, and the cleaning unit”. The drying unit includes a pair of air knives for removing the cleaning liquid adhering to the substrate, and the cleaning unit is configured to: at least one pair of cleaning nozzles, the at least one pair of cleaning nozzles being used for Spraying the cleaning liquid on the substrate; and a pair of rotating brushes for stripping the substrate & the attachment; and a cleaning tank mechanism having one or more & The cleaning groove and the moving mechanism for moving the cleaning tank between the cleaning position and the standby position. The drying unit and the cleaning unit are provided immediately below the substrate installation portion for mounting the substrate on the transport mechanism, and the substrate is transported vertically between the substrate installation portion, the dry portion, and the cleaning portion. The set area of the device. -4- M416187 The present invention is characterized in that the substrate setting portion, the pre-drying portion, and the cleaning portion are separated by separate partition plates. By separating the substrate installation portion, the drying portion, and the cleaning portion by a partition plate to form an independent space, the cleaning liquid droplets of the cleaning portion do not contaminate the drying portion, and the washing liquid droplets of the drying portion The substrate setting portion is not contaminated. The present invention is characterized in that the pair of cleaning nozzles, the pair of rotating brushes, and the pair of air knives are symmetrically disposed on a vertical plane perpendicular to the conveying substrate. Since it is possible to perform various washing processes from the substrates which are vertically conveyed from both sides, the apparatus does not become large, and efficient washing can be performed. The present invention is characterized in that the cleaning unit includes a cover that covers an upper portion of the standby position. When the washing tank is in the standby position, since the lid covering the upper portion of the standby position is provided, it is possible to prevent the washing waste liquid or the fly hopper from falling into the washing tank from the washing position.
本創作的特徵爲：前述一對轉動刷子，含有可變更其 間隔的間隔變更裝置。 由於可以調整「相對向之轉動刷子的間隔」，因此可 對應於基板厚度的差異，此外，使刷毛壓力的調整變得可The present invention is characterized in that the pair of rotating brushes include a space changing device that can change the interval therebetween. Since the "interval of rotating the brush relative to the brush" can be adjusted, it can correspond to the difference in the thickness of the substrate, and in addition, the adjustment of the pressure of the bristles can be made
〔創作的效果〕 本裝置，由於是由上述的構造所形成，因此儘管能執 行有效率的洗淨，也能在裝置不會變大的前提下，形成小 -5- M416187 型且具有泛用性的基板洗淨裝置。 【實施方式】 以下，針對本創作的實施形態，參考圖面進行說明， 說明書中所表示的左右方向、及上下方向，是指第1圖之 本裝置正面圖中的左右、及上下方向，而前後方向是指垂 直於第1圖之紙面的方向。 基板洗淨裝置1，如第1〜4圖所示，在裝置的上部分設 有基板設置部10，該基板設置部10是用來將被洗淨的之光 罩等的基板2組裝於基板承座61，並取下洗淨已完成的基 板2;在裝置的下部設有洗淨部30，該洗淨部30設有用來 洗淨基板2的複數個洗淨機構；在其中間部設有乾燥部20 ，該乾燥部20是用來執行洗淨後之基板2的瀝乾而促使其 乾燥。 將裝置的控制部4設於裝置的左側部分，並將該上部 前面作爲操作面板3。控制部4的後部，設有「如搬送機構 60的移動裝置62等，被設於本裝置之各機構」的驅動裝置 〇 基板設置部10的正面形成雙扇門1 1 ( double door ;指 左右對稱地安裝有兩片門板者），藉由將其開啓，可將基 板2搭載於基板承座61。 至少基板設置部1 〇的門1 1與基板設置部1 〇右側面，是 由透明玻璃或壓克力材料所構成，而可透視裝置內部。 在「被設於裝置左上面」的操作面板3設有：電源開 -6- M416187 關、緊急用電源遮斷開關、作業面板5等，可利用作業面 板5來執行基板2之洗淨目錄的選擇、指示、決定、啓動、 停止等。 乾燥部20，被設於基板設置部10的正下方，基板設置 部1〇與乾燥部20是由分隔板12所分隔。在分隔板12設有： 當基板2藉由搬送機構60而移動於基板設置部10與乾燥部 2 0之間時，可供其通過的槽縫13。[Effects of Creation] Since this device is formed by the above-described structure, it is possible to form a small-5-M416187 type and have a general purpose without increasing the size of the device, although efficient cleaning can be performed. Sexual substrate cleaning device. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The left-right direction and the vertical direction shown in the specification refer to the left and right and the vertical direction in the front view of the device of Fig. 1 . The front-rear direction refers to the direction perpendicular to the paper surface of Fig. 1. As shown in FIGS. 1 to 4, the substrate cleaning apparatus 1 is provided with a substrate installation portion 10 for assembling the substrate 2 such as a mask to be cleaned on the substrate. The seat 61 is removed, and the cleaned substrate 2 is removed; and a cleaning portion 30 is provided at a lower portion of the device, and the cleaning portion 30 is provided with a plurality of cleaning mechanisms for cleaning the substrate 2; There is a drying section 20 for performing draining of the cleaned substrate 2 to promote drying. The control unit 4 of the apparatus is provided on the left side portion of the apparatus, and the upper front side is used as the operation panel 3. The rear portion of the control unit 4 is provided with a drive device such as "the moving device 62 of the transport mechanism 60 and the like, and is provided in each mechanism of the device". The front surface of the substrate installation portion 10 is formed with a double door 1 1 (double door; The two-piece door panel is symmetrically mounted, and the substrate 2 can be mounted on the substrate holder 61 by being opened. At least the door 1 1 of the substrate setting portion 1 and the right side surface of the substrate setting portion 1 are made of transparent glass or acrylic material, and the inside of the device can be seen through. The operation panel 3 of "the upper left side of the apparatus" is provided with a power supply opening -6-M416187, an emergency power supply interruption switch, a work panel 5, and the like, and the cleaning panel of the substrate 2 can be executed by the work panel 5. Select, indicate, decide, start, stop, and more. The drying unit 20 is disposed directly below the substrate installation portion 10, and the substrate installation portion 1A and the drying portion 20 are partitioned by the partition plate 12. The partition plate 12 is provided with a slit 13 through which the substrate 2 can be moved when it is moved between the substrate setting portion 10 and the drying portion 20 by the conveying mechanism 60.
在乾燥部20組裝有一對氣刀21，該一對氣刀21被組裝 成：對垂直搬送基板2之垂直面呈對稱，且在空氣噴射口 略微朝下的狀態下，彼此相對向。氣刀2 1，是從其噴射口 對基板表面噴吹刀狀的薄層氣流，而將殘留於洗淨後之基 板表面的清洗液、微細的粒子等予以噴飛後去除，且在乾 燥後不會殘留水痕。各氣刀21是利用空氣軟管等連接於外 部的壓縮空氣來源，可從空氣噴射口噴射氣流。空氣來源 亦可設於裝置內。 洗淨部30，被設於乾燥部20的正下方，乾燥部20與洗 淨部30是由分隔板22所分隔。在分隔板22設有：當基板2 藉由搬送機構60而移動於乾燥部20與洗淨部30之間時，可 供其通過的槽縫23。在洗淨部30的側面（裝置右側面）設 有觀視窗39，可觀察洗淨部30的內部。 搬送機構60是由以下所構成：基板承座61，該基板乘 坐61是用來搭載基板2;及移動裝置62，該移動裝置62可 促使基板承座61通過分隔板12的槽縫13、與分隔板22的槽 縫23，而垂直地移動於基板設置部1〇與乾燥部20與洗淨部 M416187 3 0之間。移動裝置62，被設於裝置的左側空間部，該空間 部是藉由分隔壁6而與基板設置部10'乾燥部20、洗淨部 30隔開。在分隔壁6設有槽縫7，該槽縫7可使下述的動作 變得可能：由移動裝置62使基板2從基板設置部10通過乾 燥部20，而垂直移動至洗淨部30。基板承座61的臂部63是 貫穿槽縫7並將移動裝置62與基板承座61予以連結。 基板承座61是由以下所構成：凹字狀的框架、及被組 裝於其內側面的3個基板支承構件。在3個基板支承構件切 開有槽縫，藉由將基板2插入該槽縫，可藉由3個基板支承 構件將基板2保持於基板承座61。 在洗淨部30，是於「將被搬送機構60所搬送的基板2 搭載於基板承座61」的狀態下執行洗淨。在洗淨部30設有 1對洗淨刷子3 5 ;及2對洗淨噴嘴3 2、3 3，該2對洗淨噴嘴 32、33相對於「搬送基板2的移動通路」的垂直面呈對稱 狀，且從上部保持間隔；在洗淨部30的底部設有「具有2 個洗淨槽42、43」的洗淨槽機構40。 2對洗淨噴嘴32、33，是在高度方向上保持間隔並設 於分隔板22的下方。1對洗淨噴嘴具備4個噴射口，並將各 2個噴射口組裝成包挾「搬送基板2的移動通路」且相對向 。各2個噴射□，各別在左右方向上保持間隔。 位於上部的洗淨噴嘴3 2，在利用藥液或洗淨劑洗淨基 板2後，對基板表面噴射用來沖洗該藥液、洗淨液的清洗 液（純水等）。4個噴射口是「對基板表面保持略微朝下 的角度」所組裝，而形成：在基板2上下移動的狀態下， -8- M416187 保持向下的角度地噴射清洗液，使附著物容易脫落且洗淨 後清洗液不易附著於基板表面的構造。 位於下部的洗淨噴嘴33，在利用藥液洗淨基板2後， 對基板表面噴射用來沖洗「該附著的藥液、或未完全洗淨 的光阻劑」的洗淨液（表面活性劑）。洗淨噴嘴33也是對 ^ 基板表面保持略微向下的角度地組裝有4個噴射口，而形 成：而形成：在基板2上下移動的狀態下，保持向下的角 φ 度地噴射清洗液，使附著物容易脫落且洗淨後清洗液不易 附著於基板表面的構造。 1對洗淨刷子3 5爲轉動式的圓筒刷子構造，是將圓筒 刷子35b組裝於轉動軸35a的構件。洗淨刷子35，可藉由轉 動軸35a而自由轉動，且將「搬送基板的垂直面」置於內 側地組裝成相對向（亦即，將「搬送基板的垂直面」挾持 於一對洗淨刷子3 5之間）。各個轉動軸3 5 a，其兩端部是 由可移動的軸承機構35 c所支承，該可移動的軸承機構35c φ. 被組裝於洗淨部之相對向的左右兩側面。 . 1對洗淨刷子3 5，爲了能變更彼此相對向的間隔，而 具備間隔變更裝置35d。間隔變更裝置35 d被設於裝置左側 的空間部，藉由通過設於分隔壁6的槽縫來移動用來支承 轉動軸35a的軸承機構35c，而變更「被設成相對向之洗淨 刷子35」的間隔。因此，裝置右側的軸承機構35c也被組 裝成可以滑動。 1對洗淨刷子35，可藉由變更其間隔，而對應於不同 厚度之欲洗淨的基板2。此外，即使是相同厚度的基板， -9 - M416187 也能變更刷子對基板表面的洗刷壓力。或者’也可以將該 間隔設成最大，使基板2在不接觸於洗淨刷子3 5的狀態下 搬送。 被搭載於基板承座61的基板2’是藉由「利用移動裝 置62而在1對洗淨刷子35之間上下移動於垂直方向」被洗 淨。圓筒刷子35b的前端部，是藉由洗刷後剝除，來去除 「浸漬於藥液、噴射洗淨液時所無法去除」之基板表面的 污漬。在利用洗淨刷子3 5洗淨時，亦可噴射洗淨噴嘴3 3的 洗淨液，而在夾雜著洗淨液的狀態下進行洗淨。在該場合 中，基板2是在洗淨噴嘴3 3與洗淨刷子3 5的高度間反覆地 上下移動並執行洗淨。 洗淨槽機構40是由以下所構成：2個洗淨槽42、43 : 和搭載著洗淨槽42、43且能移動的台車41 ;及促使台車移 動的移動裝置45。台車41被設於洗淨部30的底面，並具有 :用來搭載2個洗淨槽42、43的架台；及被組裝於架台下 的4個車輪。 蓋37，是將其洗淨部3 0的中心側設成傾斜面，並在洗 淨部30的前部下側，架設於相對向的左右側面，而將洗淨 部30劃分成洗淨位置50與待機位置51。台車41搭載著2個 洗淨槽42、43，並在用來洗淨基板2的洗淨位置50、及從 該處脫離之蓋37下方的待機位置51間移動。 移動裝置45被設在「被洗淨部30與分隔壁6所隔開」 之裝置左側空間部的下部，並藉由連結裝置而連結於台車 41，而促使台車41移動。移動機構45亦可設於洗淨部內。 -10- M416187 洗淨槽42、43，貯留著「用來去除附著於基板2之光 阻劑等」的藥液。藉由使其中一個洗淨槽42移動至基板2 的搬送通路上’可如第3、4圖的虛線所示，使基板2浸漬 於洗淨槽42所貯留的藥液。藥液是氨溶液之類的鹼性洗淨 液。另一個洗淨槽43爲預備槽，可視需要而用來貯留必要 的洗淨液、或者清洗液。 在洗淨部30，爲了使洗淨液在洗淨基板2時飛散，主 要的開口、槽縫部可視需要而設成密閉或者遮蔽構造。流 至洗淨部30底部的廢液，是通過圖面中未顯示的排水口， 而流至外部的廢液裝置。亦可在裝置內設置廢液處理裝置 與廢液槽。 · 接著，說明在上述構造的基板洗淨裝置1中，基板2之 洗淨步驟的其中一例。一開始，是打開基板設置部1 〇的門 1 1並將基板2搭載於基板承座6 1。將門1 1關閉，並在利用 作業面板5確認洗淨步驟後，按壓啓動的開關。A pair of air knives 21 are assembled in the drying unit 20, and the pair of air knives 21 are assembled so as to be symmetrical with respect to the vertical plane of the vertical transfer substrate 2, and to face each other with the air ejection ports slightly downward. The air knife 2 1 is a thin layer airflow that blows a blade shape from the ejection opening to the surface of the substrate, and the cleaning liquid and fine particles remaining on the surface of the cleaned substrate are sprayed and removed, and after drying, No water marks will remain. Each of the air knives 21 is a source of compressed air that is connected to the outside by an air hose or the like, and can eject the airflow from the air ejection ports. The air source can also be located in the unit. The cleaning unit 30 is disposed directly below the drying unit 20, and the drying unit 20 and the cleaning unit 30 are partitioned by a partition plate 22. The partitioning plate 22 is provided with a slit 23 through which the substrate 2 can pass when it is moved between the drying section 20 and the cleaning section 30 by the conveying mechanism 60. A viewing window 39 is provided on the side surface (the right side surface of the apparatus) of the cleaning unit 30, and the inside of the cleaning unit 30 can be observed. The transport mechanism 60 is configured by a substrate holder 61 for mounting the substrate 2 and a moving device 62 that urges the substrate holder 61 through the slit 13 of the partition plate 12, The slit 23 of the partitioning plate 22 is vertically moved between the substrate setting portion 1A and the drying portion 20 and the cleaning portion M416187 3 0. The moving device 62 is provided in the left space portion of the device, and the space portion is partitioned from the substrate mounting portion 10'drying portion 20 and the cleaning portion 30 by the partition wall 6. The partition wall 6 is provided with a slit 7 which enables an operation in which the substrate 2 is moved from the substrate setting portion 10 through the drying portion 20 to the cleaning portion 30 by the moving means 62. The arm portion 63 of the substrate holder 61 penetrates the slit 7 and connects the moving device 62 to the substrate holder 61. The substrate holder 61 is composed of a concave frame and three substrate supporting members assembled on the inner side surface thereof. A slit is cut in the three substrate supporting members, and by inserting the substrate 2 into the slit, the substrate 2 can be held by the substrate holder 61 by the three substrate supporting members. In the cleaning unit 30, the cleaning is performed in a state where the substrate 2 conveyed by the conveyance mechanism 60 is mounted on the substrate holder 61. The cleaning unit 30 is provided with a pair of cleaning brushes 3 5 and two pairs of cleaning nozzles 3 2 and 3 3 , and the vertical faces of the pair of cleaning nozzles 32 and 33 with respect to the "moving path of the transfer substrate 2" are The symmetry is maintained at intervals from the upper portion; and the washing tank mechanism 40 having "two washing grooves 42, 43" is provided at the bottom of the washing portion 30. The pair of cleaning nozzles 32 and 33 are spaced apart from each other in the height direction and are disposed below the partition plate 22. One pair of cleaning nozzles has four injection ports, and each of the two injection ports is assembled so as to be "moving path of the transfer substrate 2" and facing each other. Each of the two injections □ is kept at a distance in the left-right direction. After cleaning the substrate 2 with a chemical solution or a detergent, the cleaning nozzle 32 located at the upper portion sprays a cleaning liquid (pure water or the like) for rinsing the chemical liquid and the cleaning liquid on the surface of the substrate. The four injection ports are assembled by "the angle at which the surface of the substrate is slightly lowered downward", and the -8-M416187 is sprayed with the cleaning liquid at a downward angle while the substrate 2 is moved up and down, so that the deposits are easily detached. Moreover, the structure in which the cleaning liquid is less likely to adhere to the surface of the substrate after washing. After cleaning the substrate 2 with the chemical solution, the cleaning nozzle 33 located at the lower portion sprays a cleaning liquid (surfactant) for rinsing the "attached chemical solution or the photoresist that is not completely washed" on the surface of the substrate. ). The cleaning nozzle 33 is also formed by assembling four ejection openings at a slight downward angle to the surface of the substrate, and is formed to: in a state where the substrate 2 is moved up and down, the cleaning liquid is sprayed while maintaining a downward angle φ degrees. The structure in which the deposit is easily detached and the cleaning liquid is less likely to adhere to the surface of the substrate after washing. The pair of cleaning brushes 35 are a rotary cylindrical brush structure, and are members for assembling the cylindrical brush 35b to the rotating shaft 35a. The cleaning brush 35 is rotatably rotated by the rotating shaft 35a, and the "vertical surface of the conveying substrate" is placed inside to be assembled in a relative direction (that is, the "vertical surface of the conveying substrate" is held in a pair of washings. Brush between 3 and 5). Each of the rotating shafts 35a is supported at its both ends by a movable bearing mechanism 35c which is assembled to the opposite left and right sides of the washing portion. The pair of cleaning brushes 35 are provided with a gap changing device 35d in order to change the interval in which they face each other. The space changing device 35 d is provided in the space portion on the left side of the device, and the bearing mechanism 35c for supporting the rotating shaft 35a is moved by the slit provided in the partition wall 6, and the "washing brush is set to be opposed to the cleaning brush". 35" interval. Therefore, the bearing mechanism 35c on the right side of the apparatus is also assembled to be slidable. The pair of cleaning brushes 35 can be changed to the substrate 2 to be washed with different thicknesses by changing the interval. In addition, even for substrates of the same thickness, -9 - M416187 can change the brushing pressure of the brush on the substrate surface. Alternatively, the interval may be set to the maximum, and the substrate 2 may be conveyed without being in contact with the cleaning brush 35. The substrate 2' mounted on the substrate holder 61 is washed by "moving up and down between the pair of cleaning brushes 35 in the vertical direction by the moving device 62". The tip end portion of the cylindrical brush 35b is removed by washing and then removed to remove stains on the surface of the substrate which cannot be removed when immersed in the chemical solution or sprayed with the cleaning liquid. When the cleaning brush 35 is used for washing, the cleaning liquid of the cleaning nozzle 3 3 may be sprayed, and the cleaning liquid may be washed while being mixed with the cleaning liquid. In this case, the substrate 2 is vertically moved up and down between the cleaning nozzles 3 3 and the height of the cleaning brush 35 to perform cleaning. The washing tank mechanism 40 is composed of two washing tanks 42 and 43 and a trolley 41 that can move the washing tanks 42 and 43 and a moving device 45 that causes the trolley to move. The carriage 41 is provided on the bottom surface of the washing unit 30, and has a gantry for mounting the two washing grooves 42, 43 and four wheels assembled under the gantry. The lid 37 is provided with an inclined surface on the center side of the cleaning portion 30, and is placed on the left and right side surfaces facing each other on the lower side of the front portion of the cleaning portion 30, and the cleaning portion 30 is divided into the washing position 50. With the standby position 51. The carriage 41 is provided with two washing tanks 42, 43 and moved between the washing position 50 for washing the substrate 2 and the standby position 51 below the lid 37 which is detached therefrom. The moving device 45 is provided at a lower portion of the left side space portion of the device in which the "cleaned portion 30 is separated from the partition wall 6", and is coupled to the carriage 41 by a connecting device to urge the carriage 41 to move. The moving mechanism 45 may also be provided in the washing unit. -10- M416187 The cleaning tanks 42, 43 store the chemical liquid for "removing the photoresist attached to the substrate 2, etc.". By moving one of the cleaning tanks 42 to the conveyance path of the substrate 2, the substrate 2 can be immersed in the chemical liquid stored in the cleaning tank 42 as indicated by broken lines in Figs. The liquid is an alkaline washing solution such as an ammonia solution. The other cleaning tank 43 is a preliminary tank for storing necessary washing liquid or washing liquid as needed. In the cleaning unit 30, in order to scatter the cleaning liquid when the substrate 2 is washed, the main opening and the slit portion may be sealed or shielded as needed. The waste liquid flowing to the bottom of the washing unit 30 is a waste liquid device that flows to the outside through a drain port not shown in the drawing. It is also possible to install a waste liquid treatment device and a waste liquid tank in the device. Next, an example of the step of cleaning the substrate 2 in the substrate cleaning apparatus 1 having the above structure will be described. Initially, the door 1 1 of the substrate setting portion 1 is opened, and the substrate 2 is mounted on the substrate holder 61. The door 11 is closed, and after the cleaning step is confirmed by the work panel 5, the activated switch is pressed.
基板2，是由移動裝置62從基板設置部10搬送至洗淨 部3 0，並在一對洗淨刷子3 5之間上下移動。藉此，大型的 附著物被剝除而落下至洗淨部30的底面。此時，由於洗淨 槽42、43在待機位置5 1待機，因此落下的附著物不會進入 洗淨槽42 ' 43。 接下來，被搭載於台車41之「貯留有洗淨液」的洗淨 槽42，是藉由移動裝置45而從待機位置5〗移動至洗淨位置 50的基板移動通路上。基板2是藉由移動裝置62而下降， 並進入至洗淨槽42內且浸漬於藥液，進而將光阻劑等附著 -11 - M416187 物予以去除。 基板2，被浸漬於洗淨槽42的氨水溶液等藥液，而去 除光阻劑等附著物，在此之後將其升起，在洗淨噴嘴32的 高度位置朝兩面噴射清洗液而對藥液施以沖洗。此時洗淨 槽42、43移動至待機位置51，落下的洗淨廢液不會進入洗 淨槽4 2、4 3。 接著，基板2在洗淨噴嘴33的高度位置，朝兩面噴射 洗淨液（表面活性劑等）後洗淨。此時，亦可與「位於洗 淨噴嘴3 3下部」的洗淨刷子一起洗淨基板2。在此之後， 再度將基板2上升至洗淨噴嘴32的高度位置爲止，並再度 以清洗液洗淨其兩面。 接著，使基板2移動至乾燥部20之氣刀31的高度位置 ，並對其兩面噴吹刀狀的薄層氣流》藉由在「使基板2從 下方上升至上方」的狀態下，將氣流略微朝下地噴吹於基 板面，基板2只要將附著於其表面的清洗液朝下噴飛，該 飛沫便不會附著，且不會殘留水痕地乾燥。 經乾燥部20乾燥的基板2，是藉由移動裝置62從乾燥 部2 0移動至基板設置部1〇，而完成洗淨。亦可透過透明構 件的裝置右側面蓋及門1 1確認基板2的洗淨結果，再度啓 動必要的步驟。 根據如同基板洗淨裝置1的構造，作爲被洗淨物的基 板2，由於將其移動通路設成垂直方向，因此不會使裝置 面積變大，可形成小型化。此外，由於對稱地在「移動基 板2之移動通路的垂直面」設置複數個洗淨機構，因此能 -12-The substrate 2 is transferred from the substrate installation portion 10 to the cleaning portion 30 by the moving device 62, and is moved up and down between the pair of cleaning brushes 35. Thereby, the large deposit is peeled off and falls to the bottom surface of the washing portion 30. At this time, since the cleaning tanks 42, 43 stand by at the standby position 51, the fallen deposit does not enter the washing tank 42'43. Then, the washing tank 42 mounted on the trolley 41 "storing the washing liquid" is moved from the standby position 5 to the washing path 50 by the moving device 45. The substrate 2 is lowered by the moving device 62, enters the cleaning tank 42, and is immersed in the chemical liquid, and the photoresist -11-M416187 is removed. The substrate 2 is immersed in a chemical solution such as an aqueous ammonia solution in the cleaning tank 42 to remove an adherent such as a photoresist, and thereafter, it is lifted up, and the cleaning liquid is sprayed on both sides at the height position of the cleaning nozzle 32 to treat the medicine. The liquid is applied for rinsing. At this time, the washing tanks 42, 43 are moved to the standby position 51, and the fallen washing waste liquid does not enter the washing tanks 4 2, 4 3 . Next, the substrate 2 is washed at a height position of the cleaning nozzle 33 by spraying a cleaning liquid (surfactant or the like) on both surfaces. At this time, the substrate 2 may be washed together with the cleaning brush "located at the lower portion of the cleaning nozzle 33". After that, the substrate 2 is again raised to the height position of the cleaning nozzle 32, and both surfaces are washed again with the cleaning liquid. Then, the substrate 2 is moved to the height position of the air knife 31 of the drying unit 20, and the blade-shaped thin layer airflow is blown on both surfaces thereof. The airflow is performed in a state where the substrate 2 is raised from below to the upper side. The substrate 2 is sprayed slightly downward on the substrate surface, and the substrate 2 is sprayed downward with the cleaning liquid adhering to the surface thereof, so that the droplets do not adhere and dry without leaving water marks. The substrate 2 dried by the drying unit 20 is moved from the drying unit 20 to the substrate setting unit 1 by the moving device 62, and the cleaning is completed. It is also possible to confirm the cleaning result of the substrate 2 through the right side cover of the device of the transparent member and the door 11 to restart the necessary steps. According to the structure of the substrate cleaning apparatus 1, the substrate 2 as the object to be cleaned is formed in the vertical direction, so that the apparatus area is not increased and the size can be reduced. Further, since a plurality of cleaning mechanisms are provided symmetrically on the "vertical plane of the moving path of the moving substrate 2", it is possible to