TWI875468B - 活性氣體生成裝置 - Google Patents

活性氣體生成裝置 Download PDF

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Publication number
TWI875468B
TWI875468B TW113104754A TW113104754A TWI875468B TW I875468 B TWI875468 B TW I875468B TW 113104754 A TW113104754 A TW 113104754A TW 113104754 A TW113104754 A TW 113104754A TW I875468 B TWI875468 B TW I875468B
Authority
TW
Taiwan
Prior art keywords
aforementioned
electrode
dielectric film
active gas
space
Prior art date
Application number
TW113104754A
Other languages
English (en)
Chinese (zh)
Other versions
TW202444955A (zh
Inventor
有田廉
Original Assignee
日商Ｔｍｅｉｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ｔｍｅｉｃ股份有限公司 filed Critical 日商Ｔｍｅｉｃ股份有限公司
Publication of TW202444955A publication Critical patent/TW202444955A/zh
Application granted granted Critical
Publication of TWI875468B publication Critical patent/TWI875468B/zh

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
TW113104754A 2023-05-01 2024-02-06 活性氣體生成裝置 TWI875468B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2023/017030 2023-05-01
PCT/JP2023/017030 WO2024228233A1 (ja) 2023-05-01 2023-05-01 活性ガス生成装置

Publications (2)

Publication Number Publication Date
TW202444955A TW202444955A (zh) 2024-11-16
TWI875468B true TWI875468B (zh) 2025-03-01

Family

ID=91321816

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113104754A TWI875468B (zh) 2023-05-01 2024-02-06 活性氣體生成裝置

Country Status (7)

Country Link
US (1) US20250331093A1 (https=)
EP (1) EP4709056A1 (https=)
JP (1) JP7493905B1 (https=)
KR (1) KR20250002602A (https=)
CN (1) CN119256626A (https=)
TW (1) TWI875468B (https=)
WO (1) WO2024228233A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090209A (ja) * 2005-09-28 2007-04-12 Chugoku Electric Power Co Inc:The 複合トーチ型プラズマ溶射装置
TW202001984A (zh) * 2018-06-25 2020-01-01 日商東芝三菱電機產業系統股份有限公司 活性氣體生成裝置及成膜處理裝置
CN113179676A (zh) * 2019-11-27 2021-07-27 东芝三菱电机产业系统株式会社 活性气体生成装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5678603B2 (ja) * 2010-11-22 2015-03-04 株式会社Ihi 微粉炭バーナ
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090209A (ja) * 2005-09-28 2007-04-12 Chugoku Electric Power Co Inc:The 複合トーチ型プラズマ溶射装置
TW202001984A (zh) * 2018-06-25 2020-01-01 日商東芝三菱電機產業系統股份有限公司 活性氣體生成裝置及成膜處理裝置
CN113179676A (zh) * 2019-11-27 2021-07-27 东芝三菱电机产业系统株式会社 活性气体生成装置

Also Published As

Publication number Publication date
JP7493905B1 (ja) 2024-06-03
JPWO2024228233A1 (https=) 2024-11-07
US20250331093A1 (en) 2025-10-23
EP4709056A1 (en) 2026-03-11
CN119256626A (zh) 2025-01-03
WO2024228233A1 (ja) 2024-11-07
KR20250002602A (ko) 2025-01-07
TW202444955A (zh) 2024-11-16

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