JP7493905B1 - 活性ガス生成装置 - Google Patents

活性ガス生成装置 Download PDF

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Publication number
JP7493905B1
JP7493905B1 JP2023562753A JP2023562753A JP7493905B1 JP 7493905 B1 JP7493905 B1 JP 7493905B1 JP 2023562753 A JP2023562753 A JP 2023562753A JP 2023562753 A JP2023562753 A JP 2023562753A JP 7493905 B1 JP7493905 B1 JP 7493905B1
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JP
Japan
Prior art keywords
electrode
dielectric film
space
active gas
region
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JP2023562753A
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English (en)
Japanese (ja)
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JPWO2024228233A5 (https=
JPWO2024228233A1 (https=
Inventor
廉 有田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TMEIC Corp
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TMEIC Corp
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Publication of JP7493905B1 publication Critical patent/JP7493905B1/ja
Publication of JPWO2024228233A1 publication Critical patent/JPWO2024228233A1/ja
Publication of JPWO2024228233A5 publication Critical patent/JPWO2024228233A5/ja
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32568Relative arrangement or disposition of electrodes; moving means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
JP2023562753A 2023-05-01 2023-05-01 活性ガス生成装置 Active JP7493905B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/017030 WO2024228233A1 (ja) 2023-05-01 2023-05-01 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JP7493905B1 true JP7493905B1 (ja) 2024-06-03
JPWO2024228233A1 JPWO2024228233A1 (https=) 2024-11-07
JPWO2024228233A5 JPWO2024228233A5 (https=) 2025-04-08

Family

ID=91321816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023562753A Active JP7493905B1 (ja) 2023-05-01 2023-05-01 活性ガス生成装置

Country Status (7)

Country Link
US (1) US20250331093A1 (https=)
EP (1) EP4709056A1 (https=)
JP (1) JP7493905B1 (https=)
KR (1) KR20250002602A (https=)
CN (1) CN119256626A (https=)
TW (1) TWI875468B (https=)
WO (1) WO2024228233A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090209A (ja) * 2005-09-28 2007-04-12 Chugoku Electric Power Co Inc:The 複合トーチ型プラズマ溶射装置
JP2012112549A (ja) * 2010-11-22 2012-06-14 Ihi Corp 微粉炭バーナ
WO2021106100A1 (ja) * 2019-11-27 2021-06-03 東芝三菱電機産業システム株式会社 活性ガス生成装置
JP7297399B1 (ja) * 2022-05-18 2023-06-26 東芝三菱電機産業システム株式会社 活性ガス生成装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
KR102510329B1 (ko) * 2018-06-25 2023-03-17 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치 및 성막 처리 장치
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090209A (ja) * 2005-09-28 2007-04-12 Chugoku Electric Power Co Inc:The 複合トーチ型プラズマ溶射装置
JP2012112549A (ja) * 2010-11-22 2012-06-14 Ihi Corp 微粉炭バーナ
WO2021106100A1 (ja) * 2019-11-27 2021-06-03 東芝三菱電機産業システム株式会社 活性ガス生成装置
JP7297399B1 (ja) * 2022-05-18 2023-06-26 東芝三菱電機産業システム株式会社 活性ガス生成装置
WO2023223454A1 (ja) * 2022-05-18 2023-11-23 東芝三菱電機産業システム株式会社 活性ガス生成装置

Also Published As

Publication number Publication date
JPWO2024228233A1 (https=) 2024-11-07
US20250331093A1 (en) 2025-10-23
EP4709056A1 (en) 2026-03-11
CN119256626A (zh) 2025-01-03
WO2024228233A1 (ja) 2024-11-07
TWI875468B (zh) 2025-03-01
KR20250002602A (ko) 2025-01-07
TW202444955A (zh) 2024-11-16

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