CN119256626A - 活性气体生成装置 - Google Patents

活性气体生成装置 Download PDF

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Publication number
CN119256626A
CN119256626A CN202380039675.4A CN202380039675A CN119256626A CN 119256626 A CN119256626 A CN 119256626A CN 202380039675 A CN202380039675 A CN 202380039675A CN 119256626 A CN119256626 A CN 119256626A
Authority
CN
China
Prior art keywords
electrode
dielectric film
region
space
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380039675.4A
Other languages
English (en)
Chinese (zh)
Inventor
有田廉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Mitsubishi Electric Industrial Systems Corp
Original Assignee
Toshiba Mitsubishi Electric Industrial Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Mitsubishi Electric Industrial Systems Corp filed Critical Toshiba Mitsubishi Electric Industrial Systems Corp
Publication of CN119256626A publication Critical patent/CN119256626A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
CN202380039675.4A 2023-05-01 2023-05-01 活性气体生成装置 Pending CN119256626A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/017030 WO2024228233A1 (ja) 2023-05-01 2023-05-01 活性ガス生成装置

Publications (1)

Publication Number Publication Date
CN119256626A true CN119256626A (zh) 2025-01-03

Family

ID=91321816

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380039675.4A Pending CN119256626A (zh) 2023-05-01 2023-05-01 活性气体生成装置

Country Status (7)

Country Link
US (1) US20250331093A1 (https=)
EP (1) EP4709056A1 (https=)
JP (1) JP7493905B1 (https=)
KR (1) KR20250002602A (https=)
CN (1) CN119256626A (https=)
TW (1) TWI875468B (https=)
WO (1) WO2024228233A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4804854B2 (ja) * 2005-09-28 2011-11-02 中国電力株式会社 複合トーチ型プラズマ溶射装置
JP5678603B2 (ja) * 2010-11-22 2015-03-04 株式会社Ihi 微粉炭バーナ
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
KR102510329B1 (ko) * 2018-06-25 2023-03-17 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치 및 성막 처리 장치
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置
US11839014B2 (en) * 2019-11-27 2023-12-05 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generating apparatus
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus

Also Published As

Publication number Publication date
JP7493905B1 (ja) 2024-06-03
JPWO2024228233A1 (https=) 2024-11-07
US20250331093A1 (en) 2025-10-23
EP4709056A1 (en) 2026-03-11
WO2024228233A1 (ja) 2024-11-07
TWI875468B (zh) 2025-03-01
KR20250002602A (ko) 2025-01-07
TW202444955A (zh) 2024-11-16

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