JPH0542510B2 - - Google Patents

Info

Publication number
JPH0542510B2
JPH0542510B2 JP60017079A JP1707985A JPH0542510B2 JP H0542510 B2 JPH0542510 B2 JP H0542510B2 JP 60017079 A JP60017079 A JP 60017079A JP 1707985 A JP1707985 A JP 1707985A JP H0542510 B2 JPH0542510 B2 JP H0542510B2
Authority
JP
Japan
Prior art keywords
electrode
plate
gas
box
frequency electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60017079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61177375A (ja
Inventor
Masahiko Tai
Yoshio Kashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1707985A priority Critical patent/JPS61177375A/ja
Publication of JPS61177375A publication Critical patent/JPS61177375A/ja
Publication of JPH0542510B2 publication Critical patent/JPH0542510B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
JP1707985A 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置 Granted JPS61177375A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1707985A JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1707985A JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS61177375A JPS61177375A (ja) 1986-08-09
JPH0542510B2 true JPH0542510B2 (https=) 1993-06-28

Family

ID=11933967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1707985A Granted JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS61177375A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100290511B1 (ko) * 1999-03-27 2001-05-15 윤영세 반도체 건식각장비의 분리형 상부전극

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5429324U (https=) * 1977-07-29 1979-02-26
JPS5948138B2 (ja) * 1980-05-28 1984-11-24 三洋電機株式会社 アモルフアス半導体膜の製造方法
JPS57149735A (en) * 1981-03-12 1982-09-16 Anelva Corp Plasma treating device
JPS6010107B2 (ja) * 1981-05-25 1985-03-15 日本真空技術株式会社 Ｒｆスパツタリングにおける絶縁物タ−ゲツト用カソ−ド
JPS5938377A (ja) * 1982-08-26 1984-03-02 Canon Inc プラズマｃｖｄ装置

Also Published As

Publication number Publication date
JPS61177375A (ja) 1986-08-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term