JPS61177375A - 平面型プラズマｃｖｄ装置 - Google Patents

平面型プラズマｃｖｄ装置

Info

Publication number
JPS61177375A
JPS61177375A JP1707985A JP1707985A JPS61177375A JP S61177375 A JPS61177375 A JP S61177375A JP 1707985 A JP1707985 A JP 1707985A JP 1707985 A JP1707985 A JP 1707985A JP S61177375 A JPS61177375 A JP S61177375A
Authority
JP
Japan
Prior art keywords
electrode
frequency electrode
plate
high frequency
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1707985A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0542510B2 (https=
Inventor
Masahiko Tai
田井　雅彦
Yoshio Kashima
義雄 鹿島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1707985A priority Critical patent/JPS61177375A/ja
Publication of JPS61177375A publication Critical patent/JPS61177375A/ja
Publication of JPH0542510B2 publication Critical patent/JPH0542510B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
JP1707985A 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置 Granted JPS61177375A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1707985A JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1707985A JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS61177375A true JPS61177375A (ja) 1986-08-09
JPH0542510B2 JPH0542510B2 (https=) 1993-06-28

Family

ID=11933967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1707985A Granted JPS61177375A (ja) 1985-01-30 1985-01-30 平面型プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS61177375A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100290511B1 (ko) * 1999-03-27 2001-05-15 윤영세 반도체 건식각장비의 분리형 상부전극

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5429324U (https=) * 1977-07-29 1979-02-26
JPS56169116A (en) * 1980-05-28 1981-12-25 Sanyo Electric Co Ltd Manufacture of amorphous silicon film
JPS57149735A (en) * 1981-03-12 1982-09-16 Anelva Corp Plasma treating device
JPS57194254A (en) * 1981-05-25 1982-11-29 Ulvac Corp Cathode for insulator target in rf sputtering
JPS5938377A (ja) * 1982-08-26 1984-03-02 Canon Inc プラズマｃｖｄ装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5429324U (https=) * 1977-07-29 1979-02-26
JPS56169116A (en) * 1980-05-28 1981-12-25 Sanyo Electric Co Ltd Manufacture of amorphous silicon film
JPS57149735A (en) * 1981-03-12 1982-09-16 Anelva Corp Plasma treating device
JPS57194254A (en) * 1981-05-25 1982-11-29 Ulvac Corp Cathode for insulator target in rf sputtering
JPS5938377A (ja) * 1982-08-26 1984-03-02 Canon Inc プラズマｃｖｄ装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100290511B1 (ko) * 1999-03-27 2001-05-15 윤영세 반도체 건식각장비의 분리형 상부전극

Also Published As

Publication number Publication date
JPH0542510B2 (https=) 1993-06-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term