TWI845996B - 具有與靶面平行或重合地延伸的像平面的聚焦裝置 - Google Patents

具有與靶面平行或重合地延伸的像平面的聚焦裝置 Download PDF

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Publication number
TWI845996B
TWI845996B TW111128178A TW111128178A TWI845996B TW I845996 B TWI845996 B TW I845996B TW 111128178 A TW111128178 A TW 111128178A TW 111128178 A TW111128178 A TW 111128178A TW I845996 B TWI845996 B TW I845996B
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TW
Taiwan
Prior art keywords
focusing
laser beam
focusing element
target
optical axis
Prior art date
Application number
TW111128178A
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English (en)
Chinese (zh)
Other versions
TW202321756A (zh
Inventor
包里斯 雷加德
Original Assignee
德商創浦半導體製造雷射系統公司
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Application filed by 德商創浦半導體製造雷射系統公司 filed Critical 德商創浦半導體製造雷射系統公司
Publication of TW202321756A publication Critical patent/TW202321756A/zh
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Publication of TWI845996B publication Critical patent/TWI845996B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
TW111128178A 2021-07-28 2022-07-27 具有與靶面平行或重合地延伸的像平面的聚焦裝置 TWI845996B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21188167.7 2021-07-28
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene

Publications (2)

Publication Number Publication Date
TW202321756A TW202321756A (zh) 2023-06-01
TWI845996B true TWI845996B (zh) 2024-06-21

Family

ID=77103962

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111128178A TWI845996B (zh) 2021-07-28 2022-07-27 具有與靶面平行或重合地延伸的像平面的聚焦裝置

Country Status (8)

Country Link
US (1) US20240168306A1 (https=)
EP (1) EP4125165B1 (https=)
JP (1) JP2024530617A (https=)
KR (1) KR20240037266A (https=)
CN (1) CN117769793A (https=)
IL (1) IL310429A (https=)
TW (1) TWI845996B (https=)
WO (1) WO2023006821A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120307851A1 (en) * 2010-02-19 2012-12-06 Tsukasa Hori System and method for generating extreme ultraviolet light
TWI609248B (zh) * 2013-11-20 2017-12-21 Ａｓｍｌ荷蘭公司 用於校準雷射光束之聚焦的系統及方法
US10268119B2 (en) * 2015-11-06 2019-04-23 Gigaphoton Inc. Extreme ultraviolet light generating device
US10644473B2 (en) * 2016-02-10 2020-05-05 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Exteme ultraviolet radiation producing systems with driver laser systems having optical isolators
CN111955058A (zh) * 2018-04-03 2020-11-17 Asml荷兰有限公司 光束的空间调制

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120307851A1 (en) * 2010-02-19 2012-12-06 Tsukasa Hori System and method for generating extreme ultraviolet light
TWI609248B (zh) * 2013-11-20 2017-12-21 Ａｓｍｌ荷蘭公司 用於校準雷射光束之聚焦的系統及方法
US10268119B2 (en) * 2015-11-06 2019-04-23 Gigaphoton Inc. Extreme ultraviolet light generating device
US10644473B2 (en) * 2016-02-10 2020-05-05 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Exteme ultraviolet radiation producing systems with driver laser systems having optical isolators
CN111955058A (zh) * 2018-04-03 2020-11-17 Asml荷兰有限公司 光束的空间调制

Also Published As

Publication number Publication date
TW202321756A (zh) 2023-06-01
EP4125165A1 (de) 2023-02-01
KR20240037266A (ko) 2024-03-21
US20240168306A1 (en) 2024-05-23
JP2024530617A (ja) 2024-08-23
EP4125165B1 (de) 2023-11-01
IL310429A (en) 2024-03-01
CN117769793A (zh) 2024-03-26
WO2023006821A1 (de) 2023-02-02

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