KR20240037266A - 타겟 평면과 평행하거나 합동인 이미지 평면을 갖춘 포커싱 장치 - Google Patents

타겟 평면과 평행하거나 합동인 이미지 평면을 갖춘 포커싱 장치 Download PDF

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Publication number
KR20240037266A
KR20240037266A KR1020247004446A KR20247004446A KR20240037266A KR 20240037266 A KR20240037266 A KR 20240037266A KR 1020247004446 A KR1020247004446 A KR 1020247004446A KR 20247004446 A KR20247004446 A KR 20247004446A KR 20240037266 A KR20240037266 A KR 20240037266A
Authority
KR
South Korea
Prior art keywords
focusing
laser beam
target material
optical axis
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247004446A
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English (en)
Korean (ko)
Inventor
보리스 레가드
Original Assignee
트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 filed Critical 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하
Publication of KR20240037266A publication Critical patent/KR20240037266A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H05G2/005—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
KR1020247004446A 2021-07-28 2022-07-27 타겟 평면과 평행하거나 합동인 이미지 평면을 갖춘 포커싱 장치 Pending KR20240037266A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21188167.7 2021-07-28
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
PCT/EP2022/071088 WO2023006821A1 (de) 2021-07-28 2022-07-27 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene

Publications (1)

Publication Number Publication Date
KR20240037266A true KR20240037266A (ko) 2024-03-21

Family

ID=77103962

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247004446A Pending KR20240037266A (ko) 2021-07-28 2022-07-27 타겟 평면과 평행하거나 합동인 이미지 평면을 갖춘 포커싱 장치

Country Status (8)

Country Link
US (1) US20240168306A1 (https=)
EP (1) EP4125165B1 (https=)
JP (1) JP2024530617A (https=)
KR (1) KR20240037266A (https=)
CN (1) CN117769793A (https=)
IL (1) IL310429A (https=)
TW (1) TWI845996B (https=)
WO (1) WO2023006821A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
US9360600B2 (en) * 2013-11-20 2016-06-07 Asml Netherlands B.V. System and method for correcting the focus of a laser beam
JP6556250B2 (ja) * 2015-11-06 2019-08-07 ギガフォトン株式会社 極端紫外光生成装置
WO2017137074A1 (de) * 2016-02-10 2017-08-17 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Treiberlaseranordnung mit einem optischen isolator und euv-strahlungserzeugungsvorrichtung damit
CN111955058B (zh) * 2018-04-03 2025-06-17 Asml荷兰有限公司 光束的空间调制

Also Published As

Publication number Publication date
TWI845996B (zh) 2024-06-21
TW202321756A (zh) 2023-06-01
EP4125165A1 (de) 2023-02-01
US20240168306A1 (en) 2024-05-23
JP2024530617A (ja) 2024-08-23
EP4125165B1 (de) 2023-11-01
IL310429A (en) 2024-03-01
CN117769793A (zh) 2024-03-26
WO2023006821A1 (de) 2023-02-02

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