CN117769793A - 具有与靶平面平行或者叠合地延伸的图像平面的聚焦装置 - Google Patents

具有与靶平面平行或者叠合地延伸的图像平面的聚焦装置 Download PDF

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Publication number
CN117769793A
CN117769793A CN202280052584.XA CN202280052584A CN117769793A CN 117769793 A CN117769793 A CN 117769793A CN 202280052584 A CN202280052584 A CN 202280052584A CN 117769793 A CN117769793 A CN 117769793A
Authority
CN
China
Prior art keywords
focusing
laser beam
target material
focusing device
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280052584.XA
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English (en)
Chinese (zh)
Inventor
B·雷加阿尔德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trumpf Laser und Systemtechnik GmbH
Original Assignee
Trumpf Laser und Systemtechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Laser und Systemtechnik GmbH filed Critical Trumpf Laser und Systemtechnik GmbH
Publication of CN117769793A publication Critical patent/CN117769793A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/16—Beam splitting or combining systems used as aids for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
CN202280052584.XA 2021-07-28 2022-07-27 具有与靶平面平行或者叠合地延伸的图像平面的聚焦装置 Pending CN117769793A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21188167.7 2021-07-28
EP21188167.7A EP4125165B1 (de) 2021-07-28 2021-07-28 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
PCT/EP2022/071088 WO2023006821A1 (de) 2021-07-28 2022-07-27 Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene

Publications (1)

Publication Number Publication Date
CN117769793A true CN117769793A (zh) 2024-03-26

Family

ID=77103962

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280052584.XA Pending CN117769793A (zh) 2021-07-28 2022-07-27 具有与靶平面平行或者叠合地延伸的图像平面的聚焦装置

Country Status (8)

Country Link
US (1) US20240168306A1 (https=)
EP (1) EP4125165B1 (https=)
JP (1) JP2024530617A (https=)
KR (1) KR20240037266A (https=)
CN (1) CN117769793A (https=)
IL (1) IL310429A (https=)
TW (1) TWI845996B (https=)
WO (1) WO2023006821A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458243B2 (ja) * 2007-10-25 2014-04-02 国立大学法人大阪大学 Ｅｕｖ光の放射方法、および前記ｅｕｖ光を用いた感応基板の露光方法
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP5758662B2 (ja) * 2011-03-23 2015-08-05 国立大学法人大阪大学 極端紫外光生成装置及び極端紫外光生成方法
WO2013161760A1 (ja) * 2012-04-27 2013-10-31 ギガフォトン株式会社 レーザシステム及び極端紫外光生成システム
WO2015036024A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
WO2015036025A1 (de) 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
US9360600B2 (en) * 2013-11-20 2016-06-07 Asml Netherlands B.V. System and method for correcting the focus of a laser beam
JP6556250B2 (ja) * 2015-11-06 2019-08-07 ギガフォトン株式会社 極端紫外光生成装置
WO2017137074A1 (de) * 2016-02-10 2017-08-17 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Treiberlaseranordnung mit einem optischen isolator und euv-strahlungserzeugungsvorrichtung damit
CN111955058B (zh) * 2018-04-03 2025-06-17 Asml荷兰有限公司 光束的空间调制

Also Published As

Publication number Publication date
TWI845996B (zh) 2024-06-21
TW202321756A (zh) 2023-06-01
EP4125165A1 (de) 2023-02-01
KR20240037266A (ko) 2024-03-21
US20240168306A1 (en) 2024-05-23
JP2024530617A (ja) 2024-08-23
EP4125165B1 (de) 2023-11-01
IL310429A (en) 2024-03-01
WO2023006821A1 (de) 2023-02-02

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