TWI841580B - 照明光學系統、曝光裝置及物品製造方法 - Google Patents
照明光學系統、曝光裝置及物品製造方法 Download PDFInfo
- Publication number
- TWI841580B TWI841580B TW108126728A TW108126728A TWI841580B TW I841580 B TWI841580 B TW I841580B TW 108126728 A TW108126728 A TW 108126728A TW 108126728 A TW108126728 A TW 108126728A TW I841580 B TWI841580 B TW I841580B
- Authority
- TW
- Taiwan
- Prior art keywords
- optical system
- optical integrator
- illumination optical
- reflective optical
- integrator
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 230
- 238000005286 illumination Methods 0.000 title claims abstract description 83
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 230000007246 mechanism Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 6
- 238000009826 distribution Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018-149680 | 2018-08-08 | ||
| JP2018149680A JP7185440B2 (ja) | 2018-08-08 | 2018-08-08 | 照明光学系、露光装置および物品製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202020570A TW202020570A (zh) | 2020-06-01 |
| TWI841580B true TWI841580B (zh) | 2024-05-11 |
Family
ID=69618635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108126728A TWI841580B (zh) | 2018-08-08 | 2019-07-29 | 照明光學系統、曝光裝置及物品製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7185440B2 (enExample) |
| KR (1) | KR102554101B1 (enExample) |
| TW (1) | TWI841580B (enExample) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM265652U (en) * | 2004-08-03 | 2005-05-21 | Premier Image Technology Corp | Solid integration rod for DLP |
| US20060001845A1 (en) * | 2004-06-29 | 2006-01-05 | Anvik Corporation | Illumination system optimized for throughput and manufacturability |
| TW201636743A (zh) * | 2015-04-08 | 2016-10-16 | 佳能股份有限公司 | 照明光學設備及裝置製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4005380B2 (ja) | 2002-02-15 | 2007-11-07 | フジノン株式会社 | ハイブリッドインテグレータ、照明光学系および投写型画像表示装置 |
| JP4229747B2 (ja) | 2003-04-22 | 2009-02-25 | シャープ株式会社 | ロッドインテグレータ及びこれを用いた照明装置 |
| JP2005032909A (ja) | 2003-07-10 | 2005-02-03 | Fuji Photo Film Co Ltd | 照明光学系およびそれを用いた露光装置 |
| JP4796803B2 (ja) | 2005-08-18 | 2011-10-19 | Ｎｅｃディスプレイソリューションズ株式会社 | 投写型表示装置の光学系とその光学系を備えた投写型表示装置 |
| JP6700982B2 (ja) * | 2016-06-01 | 2020-05-27 | キヤノン株式会社 | 光学系、露光装置および物品製造方法 |
-
2018
- 2018-08-08 JP JP2018149680A patent/JP7185440B2/ja active Active
-
2019
- 2019-07-29 TW TW108126728A patent/TWI841580B/zh active
- 2019-08-07 KR KR1020190095910A patent/KR102554101B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060001845A1 (en) * | 2004-06-29 | 2006-01-05 | Anvik Corporation | Illumination system optimized for throughput and manufacturability |
| TWM265652U (en) * | 2004-08-03 | 2005-05-21 | Premier Image Technology Corp | Solid integration rod for DLP |
| TW201636743A (zh) * | 2015-04-08 | 2016-10-16 | 佳能股份有限公司 | 照明光學設備及裝置製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202020570A (zh) | 2020-06-01 |
| JP2020024335A (ja) | 2020-02-13 |
| KR102554101B1 (ko) | 2023-07-12 |
| JP7185440B2 (ja) | 2022-12-07 |
| KR20200017359A (ko) | 2020-02-18 |
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