KR102554101B1 - 조명 광학계, 노광 장치 및 물품 제조 방법 - Google Patents

조명 광학계, 노광 장치 및 물품 제조 방법 Download PDF

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Publication number
KR102554101B1
KR102554101B1 KR1020190095910A KR20190095910A KR102554101B1 KR 102554101 B1 KR102554101 B1 KR 102554101B1 KR 1020190095910 A KR1020190095910 A KR 1020190095910A KR 20190095910 A KR20190095910 A KR 20190095910A KR 102554101 B1 KR102554101 B1 KR 102554101B1
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South Korea
Prior art keywords
optical system
optical integrator
illumination optical
reflection type
integrator
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KR1020190095910A
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English (en)
Korean (ko)
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KR20200017359A (ko
Inventor
히로미 스다
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캐논 가부시끼가이샤
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Publication of KR20200017359A publication Critical patent/KR20200017359A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020190095910A 2018-08-08 2019-08-07 조명 광학계, 노광 장치 및 물품 제조 방법 Active KR102554101B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2018-149680 2018-08-08
JP2018149680A JP7185440B2 (ja) 2018-08-08 2018-08-08 照明光学系、露光装置および物品製造方法

Publications (2)

Publication Number Publication Date
KR20200017359A KR20200017359A (ko) 2020-02-18
KR102554101B1 true KR102554101B1 (ko) 2023-07-12

Family

ID=69618635

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190095910A Active KR102554101B1 (ko) 2018-08-08 2019-08-07 조명 광학계, 노광 장치 및 물품 제조 방법

Country Status (3)

Country Link
JP (1) JP7185440B2 (enExample)
KR (1) KR102554101B1 (enExample)
TW (1) TWI841580B (enExample)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240920A (ja) 2002-02-15 2003-08-27 Fuji Photo Optical Co Ltd ハイブリッドインテグレータ、照明光学系および投写型画像表示装置
JP2004325533A (ja) 2003-04-22 2004-11-18 Sharp Corp ロッドインテグレータ及びこれを用いた照明装置
US20060001845A1 (en) * 2004-06-29 2006-01-05 Anvik Corporation Illumination system optimized for throughput and manufacturability
JP2007052231A (ja) * 2005-08-18 2007-03-01 Nec Viewtechnology Ltd 投写型表示装置の光学系とその光学系を備えた投写型表示装置
JP2017215485A (ja) 2016-06-01 2017-12-07 キヤノン株式会社 光学系、露光装置および物品製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005032909A (ja) 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置
TWM265652U (en) * 2004-08-03 2005-05-21 Premier Image Technology Corp Solid integration rod for DLP
JP6544972B2 (ja) * 2015-04-08 2019-07-17 キヤノン株式会社 照明光学装置、およびデバイス製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240920A (ja) 2002-02-15 2003-08-27 Fuji Photo Optical Co Ltd ハイブリッドインテグレータ、照明光学系および投写型画像表示装置
JP2004325533A (ja) 2003-04-22 2004-11-18 Sharp Corp ロッドインテグレータ及びこれを用いた照明装置
US20060001845A1 (en) * 2004-06-29 2006-01-05 Anvik Corporation Illumination system optimized for throughput and manufacturability
JP2007052231A (ja) * 2005-08-18 2007-03-01 Nec Viewtechnology Ltd 投写型表示装置の光学系とその光学系を備えた投写型表示装置
JP2017215485A (ja) 2016-06-01 2017-12-07 キヤノン株式会社 光学系、露光装置および物品製造方法

Also Published As

Publication number Publication date
TW202020570A (zh) 2020-06-01
JP2020024335A (ja) 2020-02-13
TWI841580B (zh) 2024-05-11
JP7185440B2 (ja) 2022-12-07
KR20200017359A (ko) 2020-02-18

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