JP7185440B2 - 照明光学系、露光装置および物品製造方法 - Google Patents

照明光学系、露光装置および物品製造方法 Download PDF

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Publication number
JP7185440B2
JP7185440B2 JP2018149680A JP2018149680A JP7185440B2 JP 7185440 B2 JP7185440 B2 JP 7185440B2 JP 2018149680 A JP2018149680 A JP 2018149680A JP 2018149680 A JP2018149680 A JP 2018149680A JP 7185440 B2 JP7185440 B2 JP 7185440B2
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Japan
Prior art keywords
optical system
optical integrator
reflective optical
illumination optical
integrator
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JP2018149680A
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English (en)
Japanese (ja)
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JP2020024335A (ja
JP2020024335A5 (enExample
Inventor
広美 須田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018149680A priority Critical patent/JP7185440B2/ja
Priority to TW108126728A priority patent/TWI841580B/zh
Priority to KR1020190095910A priority patent/KR102554101B1/ko
Publication of JP2020024335A publication Critical patent/JP2020024335A/ja
Publication of JP2020024335A5 publication Critical patent/JP2020024335A5/ja
Application granted granted Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2018149680A 2018-08-08 2018-08-08 照明光学系、露光装置および物品製造方法 Active JP7185440B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018149680A JP7185440B2 (ja) 2018-08-08 2018-08-08 照明光学系、露光装置および物品製造方法
TW108126728A TWI841580B (zh) 2018-08-08 2019-07-29 照明光學系統、曝光裝置及物品製造方法
KR1020190095910A KR102554101B1 (ko) 2018-08-08 2019-08-07 조명 광학계, 노광 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018149680A JP7185440B2 (ja) 2018-08-08 2018-08-08 照明光学系、露光装置および物品製造方法

Publications (3)

Publication Number Publication Date
JP2020024335A JP2020024335A (ja) 2020-02-13
JP2020024335A5 JP2020024335A5 (enExample) 2021-09-02
JP7185440B2 true JP7185440B2 (ja) 2022-12-07

Family

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Family Applications (1)

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JP2018149680A Active JP7185440B2 (ja) 2018-08-08 2018-08-08 照明光学系、露光装置および物品製造方法

Country Status (3)

Country Link
JP (1) JP7185440B2 (enExample)
KR (1) KR102554101B1 (enExample)
TW (1) TWI841580B (enExample)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240920A (ja) 2002-02-15 2003-08-27 Fuji Photo Optical Co Ltd ハイブリッドインテグレータ、照明光学系および投写型画像表示装置
JP2004325533A (ja) 2003-04-22 2004-11-18 Sharp Corp ロッドインテグレータ及びこれを用いた照明装置
US20060001845A1 (en) 2004-06-29 2006-01-05 Anvik Corporation Illumination system optimized for throughput and manufacturability
JP2007052231A (ja) 2005-08-18 2007-03-01 Nec Viewtechnology Ltd 投写型表示装置の光学系とその光学系を備えた投写型表示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005032909A (ja) 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置
TWM265652U (en) * 2004-08-03 2005-05-21 Premier Image Technology Corp Solid integration rod for DLP
JP6544972B2 (ja) * 2015-04-08 2019-07-17 キヤノン株式会社 照明光学装置、およびデバイス製造方法
JP6700982B2 (ja) * 2016-06-01 2020-05-27 キヤノン株式会社 光学系、露光装置および物品製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240920A (ja) 2002-02-15 2003-08-27 Fuji Photo Optical Co Ltd ハイブリッドインテグレータ、照明光学系および投写型画像表示装置
JP2004325533A (ja) 2003-04-22 2004-11-18 Sharp Corp ロッドインテグレータ及びこれを用いた照明装置
US20060001845A1 (en) 2004-06-29 2006-01-05 Anvik Corporation Illumination system optimized for throughput and manufacturability
JP2007052231A (ja) 2005-08-18 2007-03-01 Nec Viewtechnology Ltd 投写型表示装置の光学系とその光学系を備えた投写型表示装置

Also Published As

Publication number Publication date
TW202020570A (zh) 2020-06-01
JP2020024335A (ja) 2020-02-13
KR102554101B1 (ko) 2023-07-12
TWI841580B (zh) 2024-05-11
KR20200017359A (ko) 2020-02-18

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