TWI820625B - 含有聚醯亞胺之聚合物、正型感光性樹脂組成物、負型感光性樹脂組成物、圖案形成方法、硬化被膜形成方法、層間絕緣膜、表面保護膜、及電子零件 - Google Patents
含有聚醯亞胺之聚合物、正型感光性樹脂組成物、負型感光性樹脂組成物、圖案形成方法、硬化被膜形成方法、層間絕緣膜、表面保護膜、及電子零件 Download PDFInfo
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- TWI820625B TWI820625B TW111108112A TW111108112A TWI820625B TW I820625 B TWI820625 B TW I820625B TW 111108112 A TW111108112 A TW 111108112A TW 111108112 A TW111108112 A TW 111108112A TW I820625 B TWI820625 B TW I820625B
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- photosensitive resin
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- 239000011342 resin composition Substances 0.000 title claims abstract description 192
- 238000000034 method Methods 0.000 title claims abstract description 39
- 230000001681 protective effect Effects 0.000 title claims description 27
- 239000011229 interlayer Substances 0.000 title claims description 13
- 229920001721 polyimide Polymers 0.000 title abstract description 18
- 238000000059 patterning Methods 0.000 title abstract description 6
- 229920000642 polymer Polymers 0.000 claims abstract description 81
- 125000000962 organic group Chemical group 0.000 claims abstract description 74
- 239000002904 solvent Substances 0.000 claims abstract description 43
- -1 methoxy, ethoxy, propoxy, butoxy Chemical group 0.000 claims description 115
- 239000003431 cross linking reagent Substances 0.000 claims description 81
- 150000001875 compounds Chemical class 0.000 claims description 76
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 50
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 44
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 38
- 239000002253 acid Substances 0.000 claims description 37
- 125000004432 carbon atom Chemical group C* 0.000 claims description 37
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 37
- 239000007864 aqueous solution Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 35
- 150000001412 amines Chemical class 0.000 claims description 34
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- 238000011161 development Methods 0.000 claims description 23
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 17
- 125000001424 substituent group Chemical group 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 15
- 229910052731 fluorine Inorganic materials 0.000 claims description 14
- 125000001153 fluoro group Chemical group F* 0.000 claims description 14
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
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- 238000000576 coating method Methods 0.000 claims description 12
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 10
- 150000002989 phenols Chemical class 0.000 claims description 10
- 238000004090 dissolution Methods 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 4
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 2
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 8
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- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 7
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- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
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Classifications
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Abstract
本發明之課題為提供溶劑溶解性良好且可溶於鹼性水溶液中,又可形成微細圖案且能獲得高解析度之正型感光性樹脂組成物及負型感光性樹脂組成物;可使用作為它們的基礎樹脂的含有聚醯亞胺之聚合物;以及使用了上述組成物之圖案形成方法及硬化被膜形成方法。
上述課題之解決手段為一種聚合物,其特徵為:包含下列通式(1)表示之結構單元。
式中,X
1為4價的有機基,Z
1為2價的有機基,k=1~3的整數。
Description
本發明關於含有聚醯亞胺結構之聚合物、正型感光性樹脂組成物、負型感光性樹脂組成物、圖案形成方法、硬化被膜形成方法、層間絕緣膜、表面保護膜、及電子零件。
伴隨個人電腦、數位相機、行動電話等各種電子設備的小型化、高性能化,對半導體元件進一步的小型化、薄型化及高密度化的要求係急速提高。伴隨於此,要求半導體元件之層間絕緣膜、表面保護膜兼具更優異的電特性、耐熱性、機械特性等。
在所謂三維疊層之高密度安裝技術中,就可在基板上形成圖案的感光性絕緣材料而言,聚醯亞胺膜自以往便被應用作為保護被膜、絕緣層,其絕緣性、機械特性、與基板的密接性等係持續受到注目,即便在現在其開發仍然旺盛。
以往,就感光性之聚醯亞胺系材料而言,有人提出利用了係聚醯亞胺之前驅體之聚醯胺酸的材料,例如在聚醯胺酸的羧基將感光基藉由酯鍵予以導入所成者(專利文獻1、專利文獻2)。然而,這些提案中,在形成經圖案化之皮膜後,為了獲得目標之聚醯亞胺皮膜,必須以超過300℃的高溫進行醯亞胺化處理,而為了耐受此高溫,會有基底基材受限制、使配線之銅發生氧化的問題。
就其改善而言,已有人提出將後硬化溫度的低溫化作為目的之使用了醯亞胺化後之鹼可溶性樹脂的感光性聚醯亞胺(專利文獻3、專利文獻4)。通常已閉環的聚醯亞胺會有溶劑溶解性不足的問題,但如專利文獻3、專利文獻4所見,藉由使含氟烷基之單元包含於聚合物結構中,可確保在通用溶劑的溶解性。
專利文獻3提出含有已閉環之聚醯亞胺的負型感光性組成物,藉由使用2,2-雙(4-胺基-3-羥基苯基)六氟丙烷作為二胺單元,來兼顧在環己酮的溶解性及鹼顯影性。
又專利文獻4提出使用了已閉環之聚醯亞胺、光酸產生劑及具有羥甲基之熱交聯劑的正型感光性樹脂組成物,藉由使用2,2-雙(4-胺基-3-羥基苯基)六氟丙烷作為二胺單元,並使用2,2’-雙(3,4-二羧基苯基)六氟丙烷二酐作為酸酐單元,來兼顧在γ-丁內酯的溶解性及鹼顯影性。
氟烷基就溶劑溶解性的改善而言係有效果,但考量屬於全氟烷基化合物及多氟烷基化合物(PFAS)之群組中之化合物的一部分對環境之負荷、有關健康之危害性的擔憂,已成為歐洲之REACH(Registration, Evaluation, Authorization and Restriction of Chemicals)規則中的限制物質,今後該規約也將變得更為嚴苛。在以此種情事為背景下,電子零件中作為絕緣膜、保護膜而永久殘存之材料中之氟烷基的使用係受到限制。
如此這般,今後伴隨著晶片的高密度化、高整合化,絕緣保護膜之再配線技術中之圖案的微細化想必也會日益進展,所以在感光性樹脂組成物中,係強烈期望著能不損及藉由加熱而獲得之圖案及保護被膜之機械特性、密接性等優異的特徵,又溶劑溶解性良好且實現高解析度的組成物。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開昭49-115541號公報
[專利文獻2]日本特開昭55-45746號公報
[專利文獻3]日本特開2011-123278號公報
[專利文獻4]日本特開2006-313237號公報
[發明所欲解決之課題]
本發明係鑑於上述情事而作成,目的為提供一種含有聚醯亞胺之聚合物,係溶劑溶解性良好且可溶於鹼性水溶液中,又可使用作為能形成微細圖案且能獲得高解析度之正型感光性樹脂組成物及負型感光性樹脂組成物的基礎樹脂。
又,本發明之其他目的為提供一種正型感光性樹脂組成物及負型感光性樹脂組成物,使用了係在圖案形成中可溶於鹼性水溶液、解像性優異、且可形成微細圖案的上述聚合物。
[解決課題之手段]
為了解決上述課題,本發明提供一種聚合物,其特徵為:包含下列通式(1)表示之結構單元。
式中,X
1為4價的有機基,Z
1為2價的有機基,k=1~3的整數。
若為此種聚合物,則因為溶劑溶解性良好且不會損及在鹼性水溶液之溶解性,所以可使用作為能形成微細圖案且能獲得高解析度之感光性樹脂組成物的基礎樹脂。
此時,上述通式(1)表示之結構單元為下列通式(2)表示者較為理想。
式中,Z
2為2價的有機基,X
1及k與上述相同。
若為包含上述通式(2)表示之結構單元的聚合物,會因為作為原料之化合物容易取得且容易合成,而使聚合物的生產性提高。
又,本發明之聚合物更包含下列通式(3)表示之結構單元。
式中,X
2為2價的有機基,Z
1及k與上述相同。
本發明之聚合物藉由更包含上述通式(3)表示之結構單元而成為溶劑溶解性更佳者,並成為硬化膜的機械特性亦良好者。
此時,上述通式(3)表示之結構單元為下列通式(4)較為理想。
式中,Z
2為2價的有機基,X
2及k與上述相同。
若為包含上述通式(4)表示之結構單元的聚合物,會因為作為原料之化合物容易取得且容易合成,而使聚合物的生產性提高。
又,本發明提供一種正型感光性樹脂組成物,其特徵為包含:
(A)上述聚合物;
(B)因為光而產生酸且使對於鹼性水溶液之溶解速度增大的感光劑,係具有醌二疊氮結構的化合物;及
(D)溶劑。
如此這般,藉由使用(B)成分之感光劑,在圖案形成中曝光部對於鹼性水溶液之顯影液之溶解速度會變大而變得可溶,在未曝光部則因為感光劑之鹼溶解防止性而不會溶解,而可獲得正像。包含上述通式(1)表示之結構單元的聚合物。因為聚合物本身即會表現鹼可溶性,所以在開口之圖案底部會變得不易產生渣滓等殘渣、拖尾等圖案劣化,用以形成微細圖案係具優勢。
又,此時,上述正型感光性樹脂組成物更包含(C)選自藉甲醛或甲醛-醇改性的胺基縮合物、平均1分子中具有2個以上之羥甲基或烷氧羥甲基的苯酚化合物、多元苯酚之羥基之氫原子取代成環氧丙基的化合物、多元苯酚之羥基之氫原子取代成下列式(C-1)表示之取代基的化合物、及含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物中之1種或2種以上的交聯劑較為理想。
式中,虛線表示鍵結,Rc表示碳數1~6的直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
若為包含此種(C)成分者,可在本發明之正型感光性樹脂組成物之圖案形成後之後硬化中發生交聯反應,而使硬化物的強度更為上升,可形成更理想的硬化皮膜。
然後,本發明提供一種負型感光性樹脂組成物,其特徵為包含:
(A’)上述聚合物;
(B’)光酸產生劑;
(C)選自藉甲醛或甲醛-醇改性的胺基縮合物、平均1分子中具有2個以上之羥甲基或烷氧羥甲基的苯酚化合物、多元苯酚之羥基之氫原子取代成環氧丙基的化合物、多元苯酚之羥基之氫原子取代成下列式(C-1)表示之取代基的化合物、及含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物中之1種或2種以上的交聯劑;及
(D)溶劑;
式中,虛線表示鍵結,Rc表示碳數1~6的直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
如此這般,亦可藉由使用(B’)成分之光酸產生劑,而在圖案形成中於曝光部產生酸,使添加之(C)成分之交聯劑的交聯基與聚合物的交聯反應點進行交聯,藉此曝光部會變得不溶於顯影液而製得會獲得負像的組成物。
然後,本發明提提供一種圖案形成方法,其特徵為包括下列步驟:
(1)形成步驟,將上述之正型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;
(2)加熱步驟,將上述感光材皮膜加熱;
(3)曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對上述感光材皮膜進行曝光;及
(4)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
若為此種圖案形成方法,則藉由使用上述正型感光性樹脂組成物,曝光部係可溶於鹼性水溶液中,且可在不產生渣滓等的情況下形成微細圖案,又可獲得高解析度。
又,本發明提供一種圖案形成方法,其特徵為包括下列步驟:
(I)形成步驟,將上述之負型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;
(II)加熱步驟,將上述感光材皮膜加熱;
(III) 曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對上述感光材皮膜進行曝光;及
(IV)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
本發明之負型感光性樹脂組成物之基礎樹脂的聚合物因為含有上述通式(1)表示之結構單元,所以可進行利用鹼性水溶液所為之鹼顯影。
此時,上述曝光步驟(III)與上述顯影步驟(IV)之間,更包括上述感光材皮膜的曝光後加熱步驟較為理想。
藉由在曝光後包括加熱步驟(曝光後烘烤(PEB)),可將因曝光而由光酸產生劑產生之酸作為觸媒,而促進交聯劑之交聯基與聚合物之交聯反應點的交聯反應。
然後,提供一種硬化被膜形成方法,包括下列步驟:對藉由本發明之上述圖案形成方法所獲得之形成有圖案的被膜,於溫度100~300℃進行加熱、後硬化。
若為此種硬化被膜形成方法,即便在以低溫進行硬化的情況下仍能形成機械特性良好的硬化皮膜(圖案)。
又,本發明提供一種層間絕緣膜或表面保護膜,其特徵為:係由上述之正型感光性樹脂組成物或上述之負型感光性樹脂組成物硬化而成之硬化被膜所構成。
本發明之正型感光性樹脂組成物或本發明之負型感光性樹脂組成物硬化而成之硬化被膜係與基板的密接性、耐熱性、電特性、機械強度及對鹼性剝離液等的藥品耐性優異,且將其作為保護用被膜而製成之半導體元件的可靠性亦優異,所以作為電氣、電子零件、半導體元件等的保護用被膜(層間絕緣膜或表面保護膜)係理想。
又,本發明提供一種電子零件,其特徵為:具有上述層間絕緣膜或表面保護膜。
此種保護用被膜(層間絕緣膜或表面保護膜)因為其耐熱性、藥品耐性、及絕緣性,而在包括再配線用途的半導體元件用絕緣膜、多層印刷基板用絕緣膜等係有效,可製成可靠性優異的電子零件。
[發明之效果]
如以上所述,若為本發明,則可提供一種含有聚醯亞胺之聚合物,係溶劑溶解性良好且可溶於鹼性水溶液中,又可使用作為能形成微細圖案且能獲得高解析度之正型感光性樹脂組成物及負型感光性樹脂組成物的基礎樹脂。
又,可提供一種正型感光性樹脂組成物及負型感光性樹脂組成物,使用了係在圖案形成中可溶於鹼性水溶液、解像性優異、且可形成微細圖案的上述聚合物。
如上述,尋求溶劑溶解性良好且可溶於鹼性水溶液中,又可使用作為能形成微細圖案且能獲得高解析度之感光性樹脂組成物之基礎樹脂的聚合物。
本案發明人們為了達成上述目的而努力研究,結果發現將具有下述通式(1)表示之結構單元之聚合物作為感光性樹脂組成物的基礎樹脂使用時,該聚合物因為溶劑溶解性良好且可溶於鹼性水溶液的顯影液中,所以可應用於能進行鹼性水溶液顯影的正型感光性樹脂組成物、及能進行鹼性水溶液顯影的負型感光性樹脂組成物中,而使用這些感光性樹脂組成物所獲得之圖案微細且圖案形狀良好。
然後,使用包含具通式(1)表示之結構單元之聚合物作為基礎樹脂的感光性樹脂組成物,發現在圖案形成後以低溫進行加熱時獲得之保護被膜係機械強度、密接性優異。亦即,發現具有因使用包含具上述結構單元之聚合物作為基礎樹脂之感光性樹脂組成物所形成之圖案而獲得之硬化被膜,作為電氣、電子零件保護被膜、絕緣保護被膜係優異,而完成本發明。另外,本說明書中亦將電氣、電子零件統稱為「電子零件」。
亦即,本發明為一種聚合物,其特徵為:包含下列通式(1)表示之結構單元。
式中,X
1為4價的有機基,Z
1為2價的有機基,k=1~3的整數。
以下,針對本發明詳細地說明,但本發明並不限定於這些。
[含有聚醯亞胺結構之聚合物]
本發明之聚合物係包含下列通式(1)表示之結構單元(以下,亦稱作結構單元(1))。
式中,X
1為4價的有機基,Z
1為2價的有機基,k=1~3的整數。
上述通式(1)中之2個苯酚部分中,各自之苯環係獨立地經1~3個氟原子取代(k=1~3)。氟原子的取代數及取代位置並不特別限定,考量原料的取得容易性,取代數為1較為理想,取代位置為苯酚性羥基的鄰位或對位較為理想,為鄰位更為理想。氟原子位於苯酚性羥基的鄰位或對位時,因為氟原子係具拉電子性,所以苯酚性羥基的酸性度會變高,對於鹼性水溶液之顯影液的溶解性會提高。
如此這般,本發明藉由以氟取代苯酚部分替代氟烷基並導入聚合物中,來同時提高對通用溶劑的溶解性及鹼顯影性。
上述通式(1)中之X
1為4價的有機基,只要是4價的有機基的話並不限定。較理想為碳數4~40之脂環族脂肪族基或芳香族基之4價的有機基或含有矽氧烷骨架之4價的有機基,更甚理想為下式(5)表示之4價的有機基。又,X
1的結構亦可為1種,亦可2種以上的組合。
式中,R
1、R
2各自獨立地表示甲基或苯基,q
1及q
2表示1~20的整數,虛線表示鍵結。
上述通式(1)中之Z
1為2價的有機基,只要是2價的有機基的話並不限定,為碳數4~40之2價的有機基較為理想,為含有1~4個具有取代基之芳香族環或脂肪族環的環狀有機基、或不具有環狀結構的脂肪族基或矽氧烷基更為理想。就更甚理想的Z
1而言,可列舉如下式(6)表示之結構。
式中,Z
2為2價的有機基,虛線表示鍵結。
亦即,本發明之聚合物之以通式(1)表示之結構單元為下列通式(2)表示之結構單元(結構單元(2))較為理想。
式中,Z
2為2價的有機基,X
1及k與上述相同。
只要上述通式(6)中之Z
2為2價的有機基的話並不限定,但為下式(7)表示之結構較為理想。又,Z
2的結構亦可為1種,亦可為2種以上的組合。
式中,q
3表示0~4的整數,q
4表示0~6的整數,q
5表示0~3的整數,q
6表示0~10的整數,q
7表示0或1,q
8表示0~2的整數,q
9表示1~30的整數,q
10表示0~10的整數,q
11表示0~10的整數,q
12表示0~12的整數,q
13表示0~40的整數,q
14表示1~40的整數,R
3表示氟原子、甲基、乙基、丙基、正丁基、甲氧基、乙氧基、丙氧基、丁氧基或三氟甲基,q
3~q
6、q
8、q
10~q
12為2以上時,R
3可分別相同亦可相異,R
4係各自獨立地為氫原子、氟原子、或碳數1~6的烷基,虛線表示鍵結。
若為包含上述通式(1)表示之結構單元的樹脂的話,因為在有機溶劑的溶解性良好且變得可溶於鹼性水溶液中,所以使用了該樹脂之組成物可形成微細圖案且能獲得高解析度,會成為獲得之硬化膜的機械強度、對基板的密接力、耐熱性亦良好者。又,結構單元(1)在後硬化時沒有必要進行閉環反應,可相對地降低硬化反應溫度。
又本發明之聚合物除了上述通式(1)表示之結構單元以外,更含有下列通式(3)表示之結構單元(以下,亦稱作結構單元(3))較為理想。
式中,X
2為2價的有機基,Z
1及k與上述相同。
上述通式(3)中之X
2為2價的有機基,只要是2價的有機基的話並不限定。較理想為碳數4~40之脂肪族鏈長結構或脂環族脂肪族基或芳香族基之2價的有機基。更甚理想為下式(8)表示之2價的有機基。又,X
2的結構亦可為1種,亦可為2種以上的組合。
式中,R
5各自獨立地為氫原子、氟原子、或碳數1~6的烷基,q
15為1~30的整數,虛線表示鍵結。
若為包含上述通式(3)表示之結構單元的樹脂的話,因為能使進行圖案形成後獲得之硬化膜之延伸等機械特性、對基板的密接力改善所以較為理想。
又本發明之聚合物除了上述通式(1)~(3)表示之結構單元以外,可更包含下列通式(9)~(12)表示之結構單元中之任1種以上。
式中,X
3為與上述X
1相同或相異的4價的有機基,X
4為2價的有機基。
式中,X
5為與上述X
2相同或相異的2價的有機基,X
6為與上述X
4相同或相異的2價的有機基。
式中,X
7為與上述X
1相同或相異的4價的有機基,X
8為與上述X
4相同或相異的2價的有機基,Ra及Rb係各自獨立地為氫原子、碳數1~10且之間亦可含有雜原子、亦可具有取代基的有機基。
式中,X
9為與上述X
2相同或相異的2價的有機基,X
10為4價的有機基。
上述通式(9)中之X
3為4價的有機基,可與上述X
1相同或相異,只要是4價的有機基的話並不限定。較理想為碳數4~40之脂環族脂肪族基或芳香族基之4價的有機基或含有矽氧烷骨架之4價的有機基,更甚理想為上式(5)表示之4價的有機基。又,X
3的結構可為1種,亦可為2種以上的組合。
上述通式(9)中之X
4為2價的有機基,只要是2價的有機基的話並不限定,但為碳數6~40之2價的有機基較為理想,為含有1~4個具有取代基之芳香族環或脂肪族環的環狀有機基、或不具有環狀結構的脂肪族基或矽氧烷基更為理想。就更甚理想的X
4而言,可列舉如下式(13)、(14)或(15)表示之結構。又,X
4的結構可為1種,亦可為2種以上的組合。
式中,q
16表示1~20的整數,s
1為1~40的整數,s
2、s
3各自獨立地表示0~40的整數,虛線表示鍵結。
式中,q
17表示1~4的整數,R
6表示氟原子、甲基、乙基、丙基、正丁基、甲氧基、乙氧基、丙氧基、丁氧基或三氟甲基,q
17為2以上時,R
6可各自相同亦可相異,q
18表示1~40的整數,虛線表示鍵結。
式中,q
19、q
20、及q
21表示1~10的整數,q
22表示1~20的整數,虛線表示鍵結。
若為包含上述通式(9)表示之結構單元的樹脂的話,因為能使進行圖案形成後獲得之硬化膜的機械強度、對基板的密接力、耐熱性改善所以較為理想。又,因為結構單元(9)在後硬化時沒有必要進行閉環反應,可相對地降低硬化反應溫度,所以較為理想。
上述通式(10)中之X
5為2價的有機基,可與上述X
2相同或相異,只要是2價的有機基的話並不限定。較理想為碳數4~40之脂肪族鏈長結構或脂環族脂肪族基或芳香族基之2價的有機基。更甚理想為上述式(8)表示之2價的有機基。又,X
5的結構可為1種,亦可為2種以上的組合。
上述通式(10)中之X
6為2價的有機基,可與上述X
4相同或相異,只要是2價的有機基的話並不限定。較理想為碳數6~40之2價的有機基,為含有1~4個具有取代基之芳香族環或脂肪族環的環狀有機基、或不具有環狀結構的脂肪族基或矽氧烷基。更甚理想可列舉如上述式(13)、(14)或(15)表示之結構。又,X
6的結構可為1種,亦可為2種以上的組合。
若為包含上述通式(10)表示之結構單元的樹脂的話,因為能使進行圖案形成後獲得之硬化膜之延伸等機械特性、對基板的密接力改善所以較為理想。
上述通式(11)中之X
7為4價的有機基,可與上述X
1相同或相異,只要是4價的有機基的話並不限定。較理想為碳數4~40之脂環族脂肪族基或芳香族基之4價的有機基或含有矽氧烷骨架之4價的有機基,更甚理想為上述式(5)表示之4價的有機基。又,X
7的結構可為1種,亦可為2種以上的組合。
上述通式(11)中之X
8為2價的有機基,可與上述X
4相同或相異,只要是2價的有機基的話並不限定。較理想為碳數6~40之2價的有機基,為含有1~4個具有取代基之芳香族環或脂肪族環的環狀有機基、或不具有環狀結構的脂肪族基或矽氧烷基。更甚理想可列舉如上述式(13)、(14)或(15)表示之結構。又,X
8的結構可為1種,亦可為2種以上的組合。
若為包含上述通式(11)表示之結構單元的樹脂的話,因為能使進行圖案形成後獲得之硬化膜之延伸等機械特性、對基板的密接力改善所以較為理想。
上述通式(12)中之X
9為2價的有機基,可與上述X
2相同或相異,只要是2價的有機基的話並不限定。較理想為碳數4~40之脂肪族鏈長結構或脂環族脂肪族基或芳香族基之2價的有機基。更甚理想為上述式(8)表示之2價的有機基。又,X
9的結構可為1種,亦可為2種以上的組合。
上述通式(12)中之X
10為4價的有機基,只要是4價的有機基的話並不限定,但為碳數6~40之4價的有機基較為理想,為含有1~4個具有取代基之芳香族環或脂肪族環的環狀有機基、或不具有環狀結構的脂肪族基或矽氧烷基更為理想。就更甚理想的X
10而言,可列舉如下式(16)表示之結構。又,X
10的結構可為1種,亦可為2種以上的組合。
式中,q
23、q
24、及q
25表示1~10的整數,q
26表示1~20的整數,虛線表示鍵結。
若為包含上述通式(12)表示之結構單元的樹脂的話,因為能使進行圖案形成後獲得之硬化膜的機械強度、對基板的密接力、耐熱性改善所以較為理想。又,因為結構單元(12)在後硬化時沒有必要進行閉環反應,可相對地降低硬化反應溫度,所以較為理想。
上述含有聚醯亞胺結構之聚合物之理想的重量平均分子量為5,000~100,000較為理想,為7,000~50,000更為理想。若重量平均分子量為5,000以上,將使用了上述樹脂作為基礎樹脂之感光性樹脂組成物在基板上成膜為所期望之膜厚會變容易,若重量平均分子量為100,000以下,該感光性樹脂組成物的黏度不會變得太高,不會有無法成膜的疑慮。另外,本發明中,重量平均分子量(以下,亦簡單稱作「分子量」),係利用凝膠滲透層析儀(GPC)所獲得之聚苯乙烯換算值。
[含有聚醯亞胺結構之聚合物之製造方法]
本發明之聚合物係包含下列通式(1)表示之結構者,較理想為包含下列通式(2)表示之結構者。
式中,X
1、Z
1及k與上述相同。
式中,Z
2為2價的有機基,X
1及k與上述相同。
包含上述通式(2)表示之結構單元的聚合物,可藉由使下列通式(17)表示之四羧酸二酐與下列通式(18)表示之二胺進行反應來獲得。首先,可藉由使下列通式(17)表示之四羧酸二酐與下列通式(18)表示之二胺進行反應,合成醯胺酸之後,再利用加熱脫水形成醯亞胺環藉此獲得包含結構單元(2)的聚合物。
上述結構單元(2)的製造,可在如γ-丁內酯、N-甲基-2-吡咯啶酮之高沸點且極性高的溶劑中將二胺溶解後,添加酸酐,並以0~80℃,較佳為10~50℃的條件使其反應而製成醯胺酸後,再添加二甲苯等非極性的溶劑,並於100~200℃,較佳為130~180℃進行加熱,一邊從反應系統將水除去一邊進行醯亞胺化反應,藉此實施。
式中,X
1與上述相同。
式中,Z
2及k與上述相同。
就理想的上述通式(17)表示之四羧酸二酐的例子而言,可列舉如芳香族酸二酐、脂環族酸二酐、脂肪族酸二酐、含矽氧烷骨架之二酐等。就芳香族酸二酐而言,可列舉如焦蜜石酸二酐、3,3’,4,4’-聯苯四甲酸二酐、2,3,3’,4’-聯苯四甲酸二酐、2,3,2’,3’-聯苯四甲酸二酐、3,3’,4,4’-三聯苯四羧酸二酐、3,3’,4,4’-氧基苯二甲酸二酐、2,3,3’,4’-氧基苯二甲酸二酐、2,3,2’,3’-氧基苯二甲酸二酐、二苯碸-3,3’,4,4’-四羧酸二酐、二苯甲酮-3,3’,4,4’-四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、1,4-(3,4-二羧基苯氧基)苯二酐、對伸苯基雙(偏苯三甲酸單酯酸酐)、雙(1,3-二側氧基-1,3-二氫異苯并呋喃-5-羧酸)1,4-伸苯基、2,2-雙(4-(4-胺基苯氧基)苯基)丙烷、1,2,5,6-萘四羧酸二酐、2,3,6,7-萘四羧酸二酐、9,9-雙(3,4-二羧基苯基)茀二酐、9,9-雙(4-(3,4-二羧基苯氧基)苯基)茀二酐、2,3,5,6-吡啶四羧酸二酐、3,4,9,10-苝四羧酸二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、2,2-雙(4-(3,4-二羧基苯甲醯氧基)苯基)六氟丙烷二酐、1,6-二氟焦蜜石酸二酐、1-三氟甲基焦蜜石酸二酐、1,6-二三氟甲基焦蜜石酸二酐、2,2’-雙(三氟甲基)-4,4’-雙(3,4-二羧基苯氧基)聯苯二酐、2,2’-雙[(二羧基苯氧基)苯基]丙烷二酐、2,2’-雙[(二羧基苯氧基)苯基]六氟丙烷二酐,或將它們的芳香族環經烷基、烷氧基、鹵素原子等進行取代所得之酸二酐化合物等,但不限定於這些。
就脂環族酸二酐而言,可列舉如1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、1,2,4,5-環己烷四羧酸二酐、1,2,4,5-環戊烷四羧酸二酐、1,2,3,4-四甲基-1,2,3,4-環丁烷四羧酸二酐、1,2-二甲基-1,2,3,4-環丁烷四羧酸二酐、1,3-二甲基-1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環庚烷四羧酸二酐、2,3,4,5-四氫呋喃四羧酸二酐、3,4-二羧基-1-環己基琥珀酸二酐、2,3,5-三羧基環戊基乙酸二酐、3,4-二羧基-1,2,3,4-四氫-1-萘琥珀酸二酐、雙環[3,3,0]辛烷-2,4,6,8-四羧酸二酐、雙環[4,3,0]壬烷-2,4,7,9-四羧酸二酐、雙環[4,4,0]癸烷-2,4,7,9-四羧酸二酐、雙環[4,4,0]癸烷-2,4,8,10-四羧酸二酐、三環[6,3,0,0
2,6]十一烷-3,5,9,11-四羧酸二酐、雙環[2,2,2]辛烷-2,3,5,6-四羧酸二酐、雙環[2,2,2]辛-7-烯-2,3,5,6-四羧酸二酐、雙環[2,2,1]庚烷四羧酸二酐、雙環[2,2,1]庚烷-5-羧基甲基-2,3,6-三羧酸二酐、7-氧雜雙環[2,2,1]庚烷-2,4,6,8-四羧酸二酐、八氫萘-1,2,6,7-四羧酸二酐、十四氫蒽-1,2,8,9-四羧酸二酐、3,3’,4,4’-二環己烷四羧酸二酐、3,3’,4,4’-氧基二環己烷四羧酸二酐、5-(2,5-二側氧基四氫-3- 呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、及「RIKACID」(註冊商標)BT-100(以上、商品名、新日本理化(股)製)及它們的衍生物,或將它們的脂環經烷基、烷氧基、鹵素原子等取代所得之酸二酐化合物等,但並不限定於這些。
就脂肪族酸二酐而言,可列舉如1,2,3,4-丁烷四羧酸二酐、1,2,3,4-戊烷四羧酸二酐、及它們的衍生物等,但並不限定於這些。
就含矽氧烷骨架之二酐而言,可列舉如1,3-雙(3,4-二羧基苯基)-1,1,3,3-四甲基二矽氧烷二酐、3,3’-((1,1,3,3-四甲基-1,3-二矽氧烷二基)二-3,1-丙烷二基)雙(二氫-2,5-呋喃二酮)、及它們的衍生物等,但並不限定於這些。
這些芳香族酸二酐、脂環族酸二酐、脂肪族酸二酐或含矽氧烷骨架之二酐可單獨使用,或可將2種以上組合使用。
就上述通式(18)表示之二胺化合物的製造方法而言,並不特別限定,但可列舉如藉由使下列通式(19)表示之硝基苯酚化合物與下列通式(20)表示之二羥基化合物在有機溶劑中於碳酸鉀等鹼性觸媒的存在下,進行芳香族親核取代反應,獲得下列通式(21)表示之二硝基化合物後,再將硝基還原的方法。
式中,k與上述相同。
式中,Z
2與上述相同。
式中,Z
2、k與上述相同。
就上述芳香族親核取代反應中使用之有機溶劑而言,只要是不會對反應造成影響的溶劑的話並不特別限定,可使用苯、甲苯、二甲苯、等芳香族烴類;正己烷、正庚烷、環己烷等脂肪族烴類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮等醯胺類;二乙醚、四氫呋喃、1,4-二㗁烷、1,2-二甲氧基乙烷、環戊基甲醚等醚類;2-丁酮、4-甲基-2-戊酮等酮類;乙腈等腈類;二甲基亞碸;氯仿、二氯甲烷、二氯乙烷等鹵化烴類;乙酸乙酯、乙酸甲酯、乙酸丁酯等酯類等。這些溶劑可單獨使用,亦可將2種以上組合使用。另外,若溶劑中含有過多水分,會有不期望的副反應發生的可能性,所以溶劑係使用脫水溶劑,或脫水後再使用較為理想。
反應溫度只要在溶劑的沸點以下即可,可設定為0~200℃左右,但為50~170℃較為理想。
就在上述反應使用之鹼性觸媒而言,可例示如三乙胺、三丁胺、N,N-二甲基環己胺等三烷基胺類;N-甲基𠰌啉等脂肪族環狀三級胺類;N,N-二甲基苯胺、三苯基胺等芳香族胺類;吡啶、甲吡啶、二甲基吡啶、喹啉、N,N-二甲基-4-胺基吡啶等雜環胺類;碳酸鈉、碳酸鉀等鹼金屬或鹼土金屬的碳酸鹽或碳酸氫鹽;第三丁氧基鉀、氫化鈉等鹼金屬鹽。較理想可列舉如碳酸鈉、碳酸鉀等鹼金屬或鹼土金屬的碳酸鹽或碳酸氫鹽。這些鹼性觸媒可單獨使用或亦可將2種以上組合使用。
就將上述通式(21)之硝基還原的方法而言,可採用公知的方法,並無特別限制,例如有使用鈀-碳、氧化鉑、雷尼鎳、鉑-碳、銠-氧化鋁、硫化鉑碳、還原鐵、氯化鐵、錫、氯化錫、鋅等作為觸媒,並使用氫氣、聯氨、氯化氫、氯化銨等作為氫原子源來進行的方法。尤其,考量副反應不易發生,可輕易地獲得目標物的觀點,為接觸氫化較為理想。又,觸媒的使用量因為係根據氫源的種類、反應條件而適當地決定,因此並不特別限定,但相對於二硝基化合物並按金屬換算計通常為0.01莫耳%到50莫耳%,較理想為0.1莫耳%到20莫耳%。
就上述還原反應的反應溶劑而言,可使用不會對反應造成影響的溶劑。可列舉如乙酸乙酯、乙酸甲酯等酯系溶劑;甲苯、二甲苯等芳香族烴溶劑;正己烷、正庚烷、環己烷等脂肪族烴溶劑;1,2-二甲氧基乙烷、四氫呋喃、二㗁烷等醚系溶劑;甲醇、乙醇等醇系溶劑;2-丁酮、4-甲基-2-戊酮等酮系溶劑;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮、二甲基亞碸等非質子性極性溶劑;水等。這些溶劑可單獨使用,或亦可將2種以上組合使用。
上述還原反應的反應溫度為0~100℃較為理想,為10~50℃更為理想。又,就接觸氫化而言,考量反應速度提升以及能以低溫進行反應等的觀點,使用高壓釜等而在加壓條件下進行較佳。
就理想的上述通式(19)表示之硝基苯酚化合物而言,可列舉如2,3-二氟-4-硝基苯酚、2,3-二氟-5-硝基苯酚、2,3-二氟-6-硝基苯酚、2,4-二氟-5-硝基苯酚、2,4-二氟-3-硝基苯酚、2,4-二氟-6-硝基苯酚、2,5-二氟-4-硝基苯酚、2,5-二氟-3-硝基苯酚、2,5-二氟-6-硝基苯酚、2,6-二氟-4-硝基苯酚、2,6-二氟-3-硝基苯酚、3,4-二氟-2-硝基苯酚、3,4-二氟-5-硝基苯酚、3,4-二氟-6-硝基苯酚、3,5-二氟-2-硝基苯酚、3,5-二氟-4-硝基苯酚、2,3,4-三氟-5-硝基苯酚、2,3,4-三氟-6-硝基苯酚、2,3,5-三氟-4-硝基苯酚、2,3,5-三氟-6-硝基苯酚、2,3,6-三氟-4-硝基苯酚、2,3,6-三氟-5-硝基苯酚、2,4,5-三氟-3-硝基苯酚、2,4,5-三氟-6-硝基苯酚、2,4,6-三氟-3-硝基苯酚、2,3,4,5-四氟-6-硝基苯酚、2,3,4,6-四氟-5-硝基苯酚、2,3,5,6-四氟-4-硝基苯酚等,但並不限定於這些。
又就理想的上述通式(20)表示之二羥基化合物而言,可列舉如鄰苯二酚、間苯二酚、對苯二酚、4-氟鄰苯二酚、5-氟間苯二酚、四氟對苯二酚、1,5-二羥基萘、2,6-二羥基萘、4,4’-聯苯酚、八氟-4,4’-聯苯酚、4,4’-二羥基二苯醚、雙(4-羥基苯基)硫醚、4,4’-二羥基二苯甲酮、4,4’-二羥基二苯甲烷、1,4-苯二甲醇、4-羥基苄醇、2,5-二羥基苯甲酸、雙(4-羥基苯基)碸、2,2-雙(4-羥基苯基)丙烷、2,2-雙(4-羥基苯基)六氟丙烷、1,4-雙(4-羥基苯氧基)苯、4,4’-(2,6-萘二基雙(氧基))雙酚、4,4’-(1,1’-聯苯基-4,4’-二基雙(氧基))雙酚、4,4’-雙(4-羥基苯氧基)二苯碸、2,2’-雙(4-(4-羥基苯氧基)苯基)丙烷、2,2’-雙(4-(4-羥基苯氧基)苯基)六氟丙烷、1,4-雙(2-(4-羥基苯基)-2-丙基)苯、9,9’-雙(4-羥基苯基)茀、1,1’-雙(4-羥基苯基)環己烷、9H-咔唑-2,7-二醇、茀-2,7-二醇、2,7-二羥基-9,10-蒽二酮、2,3-二氫-1H-茚-1,2-二醇、2,3-二氫-1H-茚-2,5-二醇、2,3-二氫-1-(4-羥基苯基)-1,3,3-三甲基-1H-茚-5-醇、1,6-己二醇、1,10-癸二醇、1,4-環己二醇、1,4-環己烷二甲醇、4,4’-亞甲基雙(環己醇)、5-羥基-1,3,3-三甲基環己甲醇、雙環(2,2,1)庚烷-2,5-二醇、雙環(2,2,1)庚烷-2,5-二甲醇、1,3-金剛烷二醇、3-(羥甲基)-1-金剛烷醇、1,3-金剛烷二甲醇、二乙二醇、三乙二醇、二丁二醇、2-(2-(2-羥基丙氧基)丙氧基)-1-丙醇、3,3’-(1,2-乙烷二基雙(氧基))雙-1-丙醇、3,3’-(1,4-伸苯基雙(二甲基亞矽基))雙-1-丙醇、3,3’-(1,1,3,3-四甲基-1,3-二矽氧烷二基)雙-1-丙醇等,但並不限定於這些。
另一方面,如上述般,本發明之聚合物除了上述通式(1)表示之結構單元以外,可更含有下列結構單元(3),可更含有下列結構單元(4)較為理想。
式中,X
2、Z
1及k與上述相同。
式中,X
2、Z
2及k與上述相同。
包含上述通式(4)表示之結構單元的聚合物,可藉由使下列通式(22)表示之二羧酸化合物與上述通式(18)表示之二胺進行反應來獲得。
式中,X
2與上述相同。
在此,包含結構單元(4)的聚合物,例如可藉由使上述通式(22)表示之二羧酸化合物與上述通式(18)表示之二胺在脫水縮合劑存在下進行反應來獲得。亦即,上述通式(22)表示之二羧酸化合物係於反應溶劑中以溶解後的狀態使用於反應中,並在此反應溶液中,於冰冷條件下投入並混合已知的脫水縮合劑(例如二環己基碳二亞胺、1-乙氧基羰基-2-乙氧基-1,2-二氫喹啉、1,1-羰基二氧基-二-1,2,3-苯并三唑、N,N’-二琥珀醯亞胺基碳酸酯等),將上述通式(22)表示之二羧酸化合物製成酸酐後,將使上述通式(18)表示之二胺於其他溶劑中溶解或分散後所得者滴加投入至其中,使其聚縮合,藉此可獲得包含結構單元(4)的聚合物。
又,就使上述通式(22)表示之二羧酸化合物與上述通式(18)表示之二胺(二胺化合物)進行反應而獲得包含結構單元(4)的聚合物的其他方法而言,可列舉如使用氯化亞碸或二氯草酸等氯化劑將上述通式(22)表示之二羧酸化合物轉換為醯氯,再使其與上述通式(18)表示之二胺進行反應藉此合成的方法。
將上述二羧酸化合物使用氯化劑轉換成醯氯的反應中,亦可更使用鹼性化合物。就此鹼性化合物而言,例如可使用吡啶、N,N-二甲基-4-胺基吡啶、三乙胺等。
然後,藉由使獲得之二羧酸化合物的醯氯與上述通式(18)表示之二胺在鹼性觸媒存在下進行反應,可獲得目標之包含結構單元(4)的聚合物。此時,就鹼性觸媒而言,可列舉如吡啶、N,N-二甲基-4-胺基吡啶、1,8-二氮雜雙環[5.4.0]十一-7-烯、1,5-二氮雜雙環[4.3.0]九-5-烯等。這些鹼性觸媒可單獨使用,或亦可將2種以上組合使用。
製造本發明之聚合物的方法中,就經由醯氯的方法中所使用的有機溶劑而言,較理想為會將藉由上述二羧酸化合物及其醯氯、與二胺類的聚縮合反應所獲得的聚合物充分溶解者。具體而言,可列舉如N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、二甲基亞碸、四甲基脲、六甲基磷酸三醯胺、γ-丁內酯等極性溶劑。又,除了極性溶劑以外,亦可使用酮類、酯類、內酯類、醚類、鹵化烴類、烴類等。可列舉如丙酮、二乙酮、甲乙酮、甲基異丁基酮、環己酮、乙酸甲酯、乙酸乙酯、乙酸丁酯、草酸二乙酯、丙二酸二乙酯、二乙醚、乙二醇二甲醚、二乙二醇二甲醚、四氫呋喃、二氯甲烷、1,2-二氯乙烷、1,4-二氯丁烷、三氯乙烷、氯苯、鄰二氯苯、己烷、庚烷、辛烷、苯、甲苯、二甲苯等。這些有機溶劑可單獨使用,或將2種以上組合使用。
就上述通式(22)表示之二羧酸化合物中之X
2的理想例而言,可列舉如與上述相同的例子。
又,就上述通式(22)表示之二羧酸化合物而言,可列舉如丙二酸、二甲基丙二酸、乙基丙二酸、異丙基丙二酸、二正丁基丙二酸、琥珀酸、四氟琥珀酸、甲基琥珀酸、2,2-二甲基琥珀酸、2,3-二甲基琥珀酸、二甲基甲基琥珀酸、戊二酸、六氟戊二酸、2-甲基戊二酸、3-甲基戊二酸、2,2-二甲基戊二酸、3,3-二甲基戊二酸、3-乙基-3-甲基戊二酸、己二酸、2-甲基己二酸、3-甲基己二酸、八氟己二酸、庚二酸、2,2,6,6-四甲基庚二酸、辛二酸、十二氟辛二酸、壬二酸、癸二酸、十六氟癸二酸、1,9-壬二酸、十二烷二酸、十三烷二酸、十四烷二酸、十五烷二酸、十六烷二酸、十七烷二酸、十八烷二酸、十九烷二酸、二十烷二酸、二十一烷二酸、二十二烷二酸、二十三烷二酸、二十四烷二酸、二十五烷二酸、二十六烷二酸、二十七烷二酸、二十八烷二酸、二十九烷二酸、三十烷二酸、三十一烷二酸、三十二烷二酸、二乙醇酸等。
又,就具有芳香環之二羧酸化合物而言,可列舉如鄰苯二甲酸、間苯二甲酸、對苯二甲酸、4,4’-二苯醚二甲酸、3,4’-二苯醚二甲酸、3,3’-二苯醚二甲酸、4,4’-聯苯二甲酸、3,4’-聯苯二甲酸、3,3’-聯苯二甲酸、4,4’-二苯甲酮二羧酸、3,4’-二苯甲酮二羧酸、3,3’-二苯甲酮二羧酸、4,4’-六氟異亞丙基二苯甲酸、4,4’-二羧基二苯基醯胺、1,4-伸苯基二乙酸、雙(4-羧基苯基)硫醚、2,2-雙(4-羧基苯基)-1,1,1,3,3,3-六氟丙烷、雙(4-羧基苯基)四苯基二矽氧烷、雙(4-羧基苯基)四甲基二矽氧烷、雙(4-羧基苯基)碸、雙(4-羧基苯基)甲烷、5-第三丁基間苯二甲酸、5-溴間苯二甲酸、5-氟間苯二甲酸、5-氯間苯二甲酸、2,2-雙-(對羧基苯基)丙烷、2,6-萘二羧酸等,但並不限定於這些。又,這些可單獨使用,或亦可混合使用。
(聚合物之分子量及封端劑的導入)
上述鹼可溶性樹脂之理想的分子量較理想為5,000~100,000,更理想為7,000~50,000。若分子量為5,000以上,將使用了上述鹼可溶性樹脂作為基礎樹脂之感光性樹脂組成物在基板上成膜為所期望的膜厚會變容易,若分子量為100,000以下,該感光性樹脂組成物的黏度不會變得太高,不會有無法成膜的疑慮。
上述鹼可溶性樹脂,考量縮聚合反應時分子量的控制、獲得之聚合物之經時的分子量變化,亦即抑制凝膠化的目的,可藉由封端劑將兩末端予以封端。就與酸二酐反應之封端劑而言,可列舉如單胺、一元醇等。又,就與二胺化合物反應之封端劑而言,酸酐、單羧酸、單醯氯化合物、單活性酯化合物、二碳酸酯類、乙烯醚類等。又,藉由使封端劑進行反應,可將各種有機基導入而作為末端基。
就使用作為酸酐基末端之封端劑的單胺而言,可列舉如苯胺、5-胺基-8-羥基喹啉、4-胺基-8-羥基喹啉、1-羥基-8-胺基萘、1-羥基-7-胺基萘、1-羥基-6-胺基萘、1-羥基-5-胺基萘、1-羥基-4-胺基萘、1-羥基-3-胺基萘、1-羥基-2-胺基萘、1-胺基-7-羥基萘、2-羥基-7-胺基萘、2-羥基-6-胺基萘、2-羥基-5-胺基萘、2-羥基-4-胺基萘、2-羥基-3-胺基萘、1-胺基-2-羥基萘、1-羧基-8-胺基萘、1-羧基-7-胺基萘、1-羧基-6-胺基萘、1-羧基-5-胺基萘、1-羧基-4-胺基萘、1-羧基-3-胺基萘、1-羧基-2-胺基萘、1-胺基-7-羧基萘、2-羧基-7-胺基萘、2-羧基-6-胺基萘、2-羧基-5-胺基萘、2-羧基-4-胺基萘、2-羧基-3-胺基萘、1-胺基-2-羧基萘、2-胺基菸鹼酸、4-胺基菸鹼酸、5-胺基菸鹼酸、6-胺基菸鹼酸、4-胺基水楊酸、5-胺基水楊酸、6-胺基水楊酸、三聚氰酸一醯胺、2-胺基苯甲酸、3-胺基苯甲酸、4-胺基苯甲酸、2-胺基苯磺酸、3-胺基苯磺酸、4-胺基苯磺酸、3-胺基-4,6-二羥基嘧啶、2-胺基苯酚、3-胺基苯酚、4-胺基苯酚、5-胺基-8-巰基喹啉、4-胺基-8-巰基喹啉、1-巰基-8-胺基萘、1-巰基-7-胺基萘、1-巰基-6-胺基萘、1-巰基-5-胺基萘、1-巰基-4-胺基萘、1-巰基-3-胺基萘、1-巰基-2-胺基萘、1-胺基-7-巰基萘、2-巰基-7-胺基萘、2-巰基-6-胺基萘、2-巰基-5-胺基萘、2-巰基-4-胺基萘、2-巰基-3-胺基萘、1-胺基-2-巰基萘、3-胺基-4,6-二巰基嘧啶、2-胺基硫基苯酚、3-胺基硫基苯酚、4-胺基硫基苯酚、2-乙炔基苯胺、3-乙炔基苯胺、4-乙炔基苯胺、2,4-二乙炔基苯胺、2,5-二乙炔基苯胺、2,6-二乙炔基苯胺、3,4-二乙炔基苯胺、3,5-二乙炔基苯胺、1-乙炔基-2-胺基萘、1-乙炔基-3-胺基萘、1-乙炔基-4-胺基萘、1-乙炔基-5-胺基萘、1-乙炔基-6-胺基萘、1-乙炔基-7-胺基萘、1-乙炔基-8-胺基萘、2-乙炔基-1-胺基萘、2-乙炔基-3-胺基萘、2-乙炔基-4-胺基萘、2-乙炔基-5-胺基萘、2-乙炔基-6-胺基萘、2-乙炔基-7-胺基萘、2-乙炔基-8-胺基萘、3,5-二乙炔基-1-胺基萘、3,5-二乙炔基-2-胺基萘、3,6-二乙炔基-1-胺基萘、3,6-二乙炔基-2-胺基萘、3,7-二乙炔基-1-胺基萘、3,7-二乙炔基-2-胺基萘、4,8-二乙炔基-1-胺基萘、4,8-二乙炔基-2-胺基萘、4-氟苯胺、3-氟苯胺、2-氟苯胺、2,4-二氟苯胺、3,4-二氟苯胺、2,4,6-三氟苯胺、2,3,4-三氟苯胺、五氟苯胺等,但並不限定於這些。這些可單獨使用1種,亦可將2種以上併用。
另一方面,就使用作為酸酐基末端之封端劑的一元醇而言,可列舉如甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、1-戊醇、2-戊醇、3-戊醇、1-己醇、2-己醇、3-己醇、1-庚醇、2-庚醇、3-庚醇、1-辛醇、2-辛醇、3-辛醇、1-壬醇、2-壬醇、1-癸醇、2-癸醇、1-十一烷醇、2-十一烷醇、1-十二烷醇、2-十二烷醇、1-十三烷醇、2-十三烷醇、1-十四烷醇、2-十四烷醇、1-十五烷醇、2-十五烷醇、1-十六烷醇、2-十六烷醇、1-十七烷醇、2-十七烷醇、1-十八烷醇、2-十八烷醇、1-十九烷醇、2-十九烷醇、1-二十烷醇、2-甲基-1-丙醇、2-甲基-2-丙醇、2-甲基-1-丁醇、3-甲基-1-丁醇、2-甲基-2-丁醇、3-甲基-2-丁醇、2-丙基-1-戊醇、2-乙基-1-己醇、4-甲基-3-庚醇、6-甲基-2-庚醇、2,4,4-三甲基-1-己醇、2,6-二甲基-4-庚醇、異壬基醇、3,7二甲基-3-辛醇、2,4二甲基-1-庚醇、2-庚基十一烷醇、乙二醇單乙醚、乙二醇單甲醚、乙二醇單丁醚、丙二醇1-甲醚、二乙二醇單乙醚、二乙二醇單甲醚、二乙二醇單丁醚、環戊醇、環己醇、單羥甲基環戊烷、單羥甲基二環戊烷、單羥甲基三環癸烷、降冰片、萜品醇等,但並不限定於這些。又,這些可單獨使用1種,亦可將2種以上併用。
就使用作為胺基末端之封端劑的酸酐、單羧酸、單醯氯、及單活性酯化合物而言,可列舉如鄰苯二甲酸酐、馬來酸酐、納迪克酸酐、環己烷二羧酸酐、3-羥基苯二甲酸酐等酸酐;2-羧基苯酚、3-羧基苯酚、4-羧基苯酚、2-羧基硫基苯酚、3-羧基硫基苯酚、4-羧基硫基苯酚、1-羥基-8-羧基萘、1-羥基-7-羧基萘、1-羥基-6-羧基萘、1-羥基-5-羧基萘、1-羥基-4-羧基萘、1-羥基-3-羧基萘、1-羥基-2-羧基萘、1-巰基-8-羧基萘、1-巰基-7-羧基萘、1-巰基-6-羧基萘、1-巰基-5-羧基萘、1-巰基-4-羧基萘、1-巰基-3-羧基萘、1-巰基-2-羧基萘、2-羧基苯磺酸、3-羧基苯磺酸、4-羧基苯磺酸、2-乙炔基苯甲酸、3-乙炔基苯甲酸、4-乙炔基苯甲酸、2,4-二乙炔基苯甲酸、2,5-二乙炔基苯甲酸、2,6-二乙炔基苯甲酸、3,4-二乙炔基苯甲酸、3,5-二乙炔基苯甲酸、2-乙炔基-1-萘甲酸、3-乙炔基-1-萘甲酸、4-乙炔基-1-萘甲酸、5-乙炔基-1-萘甲酸、6-乙炔基-1-萘甲酸、7-乙炔基-1-萘甲酸、8-乙炔基-1-萘甲酸、2-乙炔基-2-萘甲酸、3-乙炔基-2-萘甲酸、4-乙炔基-2-萘甲酸、5-乙炔基-2-萘甲酸、6-乙炔基-2-萘甲酸、7-乙炔基-2-萘甲酸、8-乙炔基-2-萘甲酸等單羧酸類以及它們的羧基被醯氯化後的單醯氯化合物;及對苯二甲酸、鄰苯二甲酸、馬來酸、環己烷二羧酸、3-羥基苯二甲酸、5-降冰片烯-2,3-二羧酸、1,2-二羧基萘、1,3-二羧基萘、1,4-二羧基萘、1,5-二羧基萘、1,6-二羧基萘、1,7-二羧基萘、1,8-二羧基萘、2,3-二羧基萘、2,6-二羧基萘、2,7-二羧基萘等二羧酸類之僅單羧基被醯氯化後的單醯氯化合物;藉由單醯氯化合物與N-羥基苯并三唑、N-羥基-5-降冰片烯-2,3-二羧基醯亞胺的反應所獲得的活性酯化合物等。
就使用作為胺基末端之封端劑的二碳酸酯化合物而言,可列舉如二碳酸二第三丁酯、二碳酸二苄酯、二碳酸二甲酯、二碳酸二乙酯等。
就使用作為胺基末端之封端劑的乙烯醚化合物而言,可列舉如丁基乙烯醚、環己基乙烯醚、乙基乙烯醚、2-乙基己基乙烯醚、異丁基乙烯醚、異丙基乙烯醚、正丙基乙烯醚、第三丁基乙烯醚、苄基乙烯醚等。
就使用作為胺基末端之封端劑的其他化合物而言,可列舉如苯甲醯氯、氯甲酸茀甲酯、氯甲酸2,2,2-三氯乙酯、氯甲酸-第三丁酯、氯甲酸正丁酯、氯甲酸異丁酯、氯甲酸苄酯、氯甲酸烯丙酯、氯甲酸乙酯、氯甲酸異丙酯等氯甲酸酯類;異氰酸丁酯、異氰酸1-萘酯、異氰酸十八烷酯、異氰酸苯酯等異氰酸酯化合物類;甲磺醯氯、對甲苯磺醯氯等。
酸酐基末端之封端劑的導入比例,相對於相當為本發明之聚合物之原料亦即上述通式(17)的四羧酸二酐成分為0.1~60莫耳%的範圍較為理想,為5~50莫耳%特別理想,為5~20莫耳%更甚理想。又,胺基末端之封端劑的導入比例,相對於二胺成分為0.1~100莫耳%的範圍較為理想,為5~90莫耳%特別理想。又,亦可藉由使複數之封端劑進行反應來導入複數之相異的末端基。
[感光性樹脂組成物]
接著,說明有關將本發明之聚合物作為基礎樹脂的感光性樹脂組成物。本發明中,藉由將上述本發明之聚合物作為基礎樹脂來使用,可獲得正型感光性樹脂組成物、負型感光性樹脂組成物。
[正型感光性樹脂組成物]
首先,針對將本發明之聚合物作為基礎樹脂的感光性樹脂組成物中之可進行鹼顯影的正型感光性樹脂組成物進行說明。本發明之正型感光性樹脂組成物可設定成例如以下說明之2種形態,並不限定於這些。
本發明之正型感光性樹脂組成物之第1形態係包含:
(A)包含結構單元(1)之聚合物、或除了結構單元(1)以外更包含結構單元(3)之聚合物;
(B)因為光而產生酸且使對於鹼性水溶液之溶解速度增大的感光劑,係具有醌二疊氮結構的化合物;及
(D)溶劑。
本發明之正型感光性樹脂組成物中之(A)成分之包含結構單元(1)、或除了結構單元(1)以外更包含結構單元(3)之聚合物,含有如上述般至少被一個氟原子取代的苯酚性羥基。此苯酚性羥基藉由氟原子的電子吸引性而酸性度變高。藉此可獲得對於係鹼性水溶液之顯影液之期望的鹼溶解速度,在圖案形成時,不會在圖案的開口產生阻礙、不會在圖案的底部觀察到渣滓,不會有損及解像性的疑慮。又藉由氟原子之抑制分子間之相互作用的效果,會使聚合物的溶劑溶解性提升。
本發明之正型感光性樹脂組成物中之(B)成分,係會因為光而產生酸且使對於鹼性水溶液之溶解速度增大的感光劑,係具有醌二疊氮結構的化合物。就(B)成分而言,可列舉如在分子中具有1,2-重氮萘醌(naphthoquinonediazide)磺醯基的化合物。
就分子中具有1,2-重氮萘醌磺醯基的化合物而言,可列舉如在分子中具有下列通式(23)或(24)表示之1,2-重氮萘醌磺醯基的化合物。
就導入了上述1,2-重氮萘醌磺醯基的化合物而言,具體來說,可理想地使用三羥基二苯甲酮或四羥基二苯甲酮、具有苯酚性羥基之下列通式(25)表示之鎮定物分子(ballast molecule)或具有下式(30)表示之重複單元之重量平均分子量為2,000~20,000而較理想為3,000~10,000之範圍的酚醛清漆樹脂。亦即,將以下列舉之具有苯酚性羥基之樹脂、化合物之苯酚性羥基的氫原子以上述1,2-重氮萘醌磺醯基取代後所得者係可理想地使用作為(B)成分。
在此,R
101~R
106各自獨立地為氫原子、甲基、下式(26)表示之基或下式(27)表示之基。w為0~2的整數、z為0~2的整數,z為0時,w為1或2。E,在z為0且w為1時,為氫原子、甲基、或下式(26)表示之基;在z為0且w為2時,其中一者為亞甲基或下式(28)表示之基,另一者為氫原子、甲基或下式(26)表示之基;在z為1時,為亞甲基或下式(28)表示之基。在z為2的情況,當w為1時,E為次甲基或下式(29)表示之基;當w為2時,E的其中一者為亞甲基或下式(28)表示之基,另一者為次甲基或下式(29)表示之基。
式中,a1、a2、a3、a4、a5、a6、及a7各自為0~3的整數,但a1+a2≦5、a3+a4≦4、a6+a7≦3。
此時,上式(25)之低核體(鎮定物分子)係苯環數為2~20個,更理想為2~10個,更甚理想為3~6個;且苯酚性羥基數與苯環數的比例為0.5~2.5,更理想為0.7~2.0,更甚理想為0.8~1.5者較佳。
就此種低核體(鎮定物分子)而言,具體可列舉如下列者。
上述例示之低核體(鎮定物分子)中,可理想地使用(B-3)、(B-29)、(B-33)、(B-38)等,將這些鎮定物分子之苯酚性羥基的氫原子以1,2-重氮萘醌磺醯基取代而成之化合物可理想地使用為本發明之正型感光性樹脂組成物的(B)成分。
式中,mm為0~3的整數。
具有上述式(30)表示之重複單元的酚醛清漆樹脂,可藉由使下式(31)表示之苯酚類,具體而言為鄰甲酚、間甲酚、對甲酚、3,5-二甲苯酚等中之至少1種的苯酚類,與醛類以一般方法進行縮合來合成。
式中,mm為0~3的整數。
此時,就醛類而言,可列舉如甲醛、多聚甲醛、乙醛、苯甲醛等,但為甲醛較佳。
另外,上式(31)表示之苯酚類與醛類的比例,按莫耳比計為0.2~2,尤其為0.3~2的比例較為理想。
就導入了上述1,2-重氮萘醌磺醯基的化合物中之1,2-重氮萘醌磺醯基的導入方法而言,使用以1,2-重氮萘醌磺醯氯與苯酚性羥基的鹼觸媒所為之脫鹽酸縮合反應較為理想。在上式(25)表示之鎮定物分子、三羥基二苯甲酮或四羥基二苯甲酮的情況時,將苯酚性羥基的氫原子以1,2-重氮萘醌磺醯基予以取代的比例為10~100莫耳%,為50~100莫耳%較為理想;在具有上式(30)表示之重複單元之酚醛清漆樹脂的情況時,將苯酚性羥基的氫原子以1,2-重氮萘醌磺醯基予以取代的比例為2~50莫耳%,為3~27莫耳%較為理想。
(B)成分之添加量,相對於(A)成分100質量份為1~50質量份,更理想為10~40質量份較佳。又,可使用(B)成分中之1種,或亦可將2種以上組合使用。
藉由摻合此種(B)成分,在曝光前會因為(B)成分之抗溶解性而抑制對於鹼性水溶液的溶解性,系統會成為鹼不溶性,在曝光時(B)成分之感光劑會因為光而產生酸,對於鹼性水溶液之溶解速度會增大,系統會成為鹼可溶性。
亦即,在顯影液中使用鹼性水溶液時,因為未曝光部不會溶解於顯影液中,而曝光部在顯影液中係可溶,所以變得可形成正型的圖案。
然後,第1形態之正型感光性樹脂組成物中之(D)成分為溶劑。(D)成分的溶劑只要是能溶解(A)成分及(B)成分者並不限定。就溶劑而言,可列舉如環己酮、環戊酮、甲基-2-正戊酮等酮類;3-甲氧基丁醇、3-甲基-3-甲氧基丁醇、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇等醇類;丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇二甲醚、二乙二醇二甲醚等醚類;丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、乳酸乙酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸第三丁酯、丙酸第三丁酯、丙二醇-單-第三丁基醚乙酸酯、γ-丁內酯等酯類等,可使用這些的1種以上。尤其,為乳酸乙酯、環己酮、環戊酮、丙二醇單甲醚乙酸酯、γ-丁內酯或它們的混合溶劑較為理想。
(D)成分之摻合量,相對於(A)成分及(B)成分之摻合量的合計100質量份為50~2,000質量份較為理想,尤其為100~l,000質量份較為理想。
接著,針對本發明之第2形態之正型感光性樹脂組成物作敘述。本發明之第2形態之正型感光性樹脂組成物除了上述(A)、(B)、(D)成分以外,更包含(C)選自藉甲醛或甲醛-醇改性的胺基縮合物、平均1分子中具有2個以上之羥甲基或烷氧羥甲基的苯酚化合物、多元苯酚之羥基之氫原子取代成環氧丙基的化合物、多元苯酚之羥基之氫原子取代成下列式(C-1)表示之取代基的化合物、及含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物中之1種或2種以上的交聯劑。
式中,虛線表示鍵結,Rc表示碳數1~6之直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
本發明之第2形態之正型感光性樹脂組成物之(A)成分、(B)成分可理想地用與上述第1形態之正型感光性樹脂組成物相同者。
本發明之第2形態之正型感光性樹脂組成物中之(C)成分係選自藉甲醛或甲醛-醇改性的胺基縮合物、平均1分子中具有2個以上之羥甲基或烷氧羥甲基(烷氧基甲基)的苯酚化合物、多元苯酚之羥基之氫原子取代成環氧丙基的化合物、多元苯酚之羥基之氫原子取代成下列式(C-1)表示之基的化合物、及含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物中之1種或2種以上的交聯劑。
式中,虛線表示鍵結,Rc表示碳數1~6之直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
就上述經甲醛或甲醛-醇改性的胺基縮合物而言,可列舉如經甲醛或甲醛-醇改性的三聚氰胺縮合物、或經甲醛或甲醛-醇改性的脲縮合物。
就上述經甲醛或甲醛-醇改性的三聚氰胺縮合物的製備而言,例如先依循公知的方法將三聚氰胺單體以福馬林進行羥甲基化來改性,或將其再以醇進行烷氧化來改性,以製得下列通式(32)所示之改性三聚氰胺。另外,就上述醇而言,為低級醇,例如碳數1~4的醇較為理想。
式中,R
7可相同亦可相異,為羥甲基、包含碳數1~4之烷氧基的烷氧基甲基或氫原子,但至少1者係羥甲基或上述烷氧基甲基。
就上述R
7而言,可列舉如羥甲基、甲氧基甲基、乙氧基甲基等烷氧基甲基及氫原子等。
就以上述通式(32)表示之改性三聚氰胺而言,具體可列舉如三甲氧基甲基單羥甲基三聚氰胺、二甲氧基甲基單羥甲基三聚氰胺、三羥甲基三聚氰胺、六羥甲基三聚氰胺、六甲氧基羥甲基三聚氰胺等。然後,將以上述通式(32)表示之改性三聚氰胺或其多聚物(例如二聚體、三聚體等寡聚物體)依循一般方法,與甲醛進行加成縮合聚合直到成為所期望之分子量為止,獲得經甲醛或甲醛-醇改性的三聚氰胺縮合物。
又,就經上述甲醛或甲醛-醇改性的脲縮合物之製備而言,例如係依循公知的方法,將所期望之分子量的脲縮合物以甲醛進行羥甲基化來改性,或將其再以醇進行烷氧化來改性。
就經上述甲醛或甲醛-醇改性之脲縮合物的具體例而言,可列舉如甲氧基甲基化脲縮合物、乙氧基甲基化脲縮合物、丙氧基甲基化脲縮合物等。
另外,亦可將這些改性三聚氰胺縮合物及改性脲縮合物的1種或2種以上混合使用。
然後,就平均1分子中具有2個以上之羥甲基或烷氧羥甲基的苯酚化合物而言,可列舉如(2-羥基-5-甲基)-1,3-苯二甲醇、2,2’,6,6’-四甲氧基甲基雙酚A、以下式(C-3)~(C-7)表示之化合物等。
另外,上述交聯劑可使用1種或將2種以上組合使用。
另一方面,就將多元苯酚之羥基之氫原子取代成環氧丙基的化合物而言,可列舉如將雙酚A、參(4-羥基苯基)甲烷、1,1,1-參(4-羥基苯基)乙烷的羥基在鹼存在下與環氧氯丙烷反應而藉此獲得之化合物。就將多元苯酚之羥基之氫原子取代成環氧丙基之化合物的理想例而言,可列舉如下式(C-8)~(C-14)表示之化合物。
式中,t係2≦t≦3。
可將這些多元苯酚之羥基經環氧丙氧基取代而得之化合物(多元苯酚之羥基之氫原子取代成環氧丙基的化合物)的1種或2種作為交聯劑來使用。
就將多元苯酚之羥基之氫原子取代成下式(C-1)表示之取代基的化合物而言,可列舉如含有2個以上之該取代基並以下列式(C-15)表示者。
式中,虛線表示鍵結。
式中,1≦u≦3。
另一方面,就含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物而言,可列舉如下列式(C-16)表示者。
式中,虛線表示鍵結,Rc表示碳數1~6之直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
式中,U表示碳數2~12之直鏈狀、分枝狀、環狀的伸烷基、或2價的芳香族基。
就上述式(C-16)表示之化合物而言,可例示如下列式(C-17)~(C-20)表示之化合物。
又,另一方面,就含有2個以上之上述式(C-2)表示之具有環氧丙基之氮原子的化合物而言,可理想地使用下列式(C-21)表示之化合物。
可將這些含有2個以上之上述式(C-2)表示之具有環氧丙基之氮原子的化合物的1種或2種使用作為交聯劑。
(C)成分係在使用了本發明之聚醯亞胺前驅體之聚合物的正型感光性樹脂組成物的圖案形成後,會在後硬化時發生交聯反應,而使硬化物之強度更為提升的成分。此種(C)成分之重量平均分子量考量光硬化性及耐熱性的觀點,為150~10,000較為理想,尤其為200~3,000較為理想。
(C)成分之摻合量,在本發明之第2形態之正型感光性樹脂組成物中相對於(A)成分100質量份為0.5~50質量份較為理想,尤其為1~30質量份較為理想。
又,就本發明之第2形態之正型感光性樹脂組成物中之(D)成分的溶劑而言,可列舉如與第1形態之正型感光性樹脂組成物中說明之溶劑相同的溶劑作為理想例。
本發明之正型感光性樹脂組成物可更包含(E)因為熱而產生酸的化合物。(E)成分之因為熱而產生酸的化合物可出於以下目的而添加:在上述圖案形成後於施以溫度100~300℃之加熱、後硬化步驟中,以熱來促進與(A)成分的交聯反應。
就(E)成分而言,尤以在直到利用顯影來形成圖案為止皆不會促進膜的硬化,且不會阻礙圖案形成者較為理想。為了實現這點,(E)成分為在將感光性樹脂組成物予以塗膜後,在將溶劑除去、乾燥之步驟的溫度下不會產生酸,並因為圖案形成後之熱處理才開始產生酸而促進正型感光性樹脂組成物之圖案、被膜的硬化較為理想。具體而言,較佳為會因為100℃~300℃,更理想為150℃~300℃的熱處理而分解並產生酸的化合物較為理想。藉由含有此種(E)成分,在將正型感光性樹脂組成物之圖案、被膜於圖案形成後施以之溫度100~300℃下進行加熱、後硬化的步驟中,可使其成為交聯、硬化反應充分進行而得之圖案、被膜。(E)成分,藉由使交聯、硬化反應更進一步地進行,可使獲得之圖案或被膜的機械強度、耐藥品性、密接性等更為提升。
就理想的因為熱而產生酸的化合物而言,並不特別限定,可使用日本特開2007-199653號公報之段落[0061]~[0085]中記載的化合物。
因為熱而產生酸的化合物的摻合量,相對於本發明之正型感光性樹脂組成物中之(A)成分100質量份為0.1質量份以上較為理想,為0.5質量份以上更為理想,又,為30質量份以下較為理想,為10質量份以下更為理想。
又,本發明之正型感光性樹脂組成物中,亦可更含有(A)成分、(B)成分、(C)成分、(D)成分、及(E)成分以外的成分。就其他成分而言,可列舉如密接助劑、(F)界面活性劑等,就(F)界面活性劑而言,可理想地使用下列例示之化合物等。
就(F)界面活性劑而言,為非離子性者較為理想,例如氟系界面活性劑,具體可列舉如的全氟烷基聚氧乙烯乙醇、氟化烷基酯、全氟烷基胺氧化物、含氟有機矽氧烷系化合物、含聚氧伸烷基之有機矽氧烷系化合物等。
就這些界面活性劑而言,可使用市售品,可列舉如Fluorad「FC-4430」(住友3M(股)製)、Surflon「S-141」及「S-145」(以上,旭玻璃(股)製)、UNIDYNE「DS-401」、「DS-4031」及「DS-451」(以上,大金工業(股)製)、Megafac「F-8151」(DIC(股)製)、「X-70-093」及「KP-341」(以上,信越化學工業(股)製)等。這些當中以Fluorad「FC-4430」(住友3M(股)製)、「X-70-093」及「KP-341」(信越化學工業(股)製)較為理想。
[負型感光性樹脂組成物]
針對將本發明之聚合物作為基礎樹脂而得之感光性樹脂組成物中,可進行鹼顯影的負型感光性樹脂組成物進行說明。本發明之負型感光性樹脂組成物,例如可設定為以下所說明之形態,但並不限定於這些。
本發明之負型感光性樹脂組成物係包含:
(A’)包含結構單元(1)之聚合物、或除了結構單元(1)以外更包含結構單元(3)之聚合物;
(B’)光酸產生劑;
(C)選自藉甲醛或甲醛-醇改性的胺基縮合物、平均1分子中具有2個以上之羥甲基或烷氧羥甲基的苯酚化合物、多元苯酚之羥基之氫原子取代成環氧丙基的化合物、多元苯酚之羥基之氫原子取代成下列式(C-1)表示之取代基的化合物、及含有2個以上之下列式(C-2)表示之具有環氧丙基之氮原子的化合物中之1種或2種以上的交聯劑;及
(D)溶劑;
式中,虛線表示鍵結,Rc表示碳數1~6之直鏈狀、分枝狀、或環狀的烷基,s表示1或2。
負型感光性樹脂組成物之(A’)成分係包含結構單元(1)之聚合物、或除了結構單元(1)以外更包含結構單元(3)之聚合物。
負型感光性樹脂組成物,可藉由將由(B’)成分產生之酸作為觸媒,並藉由(C)成分之交聯基與(A’)成分之聚合物進行交聯,來形成負型的感光性樹脂組成物。
負型感光性樹脂組成物之(B’)成分係光酸產生劑。就光酸產生劑而言,可使用會因為波長190~500nm的光照射而產生酸並成為硬化觸媒者。可列舉如鎓鹽、二偶氮甲烷衍生物、乙二肟衍生物、β-酮碸衍生物、二碸衍生物、硝基苄基磺酸酯衍生物、磺酸酯衍生物、醯亞胺-基-磺酸酯衍生物、肟磺酸酯衍生物、亞胺基磺酸酯衍生物、三𠯤衍生物等。
就上述鎓鹽而言,可列舉如下列通式(33)表示之化合物。
(R
8)
jM
+K
-(33)
式中,R
8表示亦可有取代基之碳數1~12之直鏈狀、分支狀、或環狀的烷基、碳數6~12的芳基或碳數7~12的芳烷基,M
+表示錪或鋶,K
-表示非親核性相對離子,j表示2或3。
上述R
8中,就烷基而言,可列舉如甲基、乙基、丙基、丁基、環己基、2-側氧基環己基、降莰基、金剛烷基等。就芳基而言,可列舉如苯基;鄰、間或對甲氧基苯基、乙氧苯基、間或對第三丁氧基苯基等烷氧基苯基;2-、3-或4-甲基苯基、乙基苯基、4-第三丁基苯基、4-丁基苯基、二甲基苯基等烷基苯基等。就芳烷基而言,可列舉如苄基、苯乙基等各種基。
就K
-之非親核性相對離子而言,可列舉如氯化物離子、溴化物離子等鹵化離子;三氟甲磺酸根、1,1,1-三氟乙磺酸根、九氟丁磺酸根等氟烷基磺酸根;甲苯磺酸根、苯磺酸根、4-氟苯磺酸根、1,2,3,4,5-五氟苯磺酸根等芳基磺酸根;甲磺酸根、丁烷磺酸根等烷基磺酸根等。
就二偶氮甲烷衍生物而言,可列舉如下列通式(34)表示之化合物。
式中,R
9可相同亦可相異地表示碳數1~12之直鏈狀、分支狀、或環狀的烷基或鹵化烷基、碳數6~12的芳基或鹵化芳基、或碳數7~12的芳烷基。
上述R
9中,就烷基而言,可列舉如甲基、乙基、丙基、丁基、戊基、環戊基、環己基、降莰基、金剛烷基等。就鹵化烷基而言,可列舉如三氟甲基、1,1,1-三氟乙基、1,1,1-三氯乙基、九氟丁基等。就芳基而言,可列舉如苯基;鄰、間或對甲氧基苯基、乙氧基苯基、間或對第三丁氧基苯基等烷氧苯基;2-、3-或4-甲基苯基、乙基苯基、4-第三丁基苯基、4-丁基苯基、二甲基苯基等烷基苯基等。就鹵化芳基而言,可列舉如氟苯基、氯苯基、1,2,3,4,5-五氟苯基等。就芳烷基而言,可列舉如苄基、苯乙基等。
就此種光酸產生劑而言,具體而言,可列舉如三氟甲磺酸二苯基錪、三氟甲磺酸(對第三丁氧基苯基)苯基錪、對甲苯磺酸二苯基錪、對甲苯磺酸(對第三丁氧基苯基)苯基錪、三氟甲磺酸三苯基鋶、三氟甲磺酸(對第三丁氧基苯基)二苯基鋶、三氟甲磺酸雙(對第三丁氧基苯基)苯基鋶、三氟甲磺酸參(對第三丁氧基苯基)鋶、對甲苯磺酸三苯基鋶、對甲苯磺酸(對第三丁氧基苯基)二苯基鋶、對甲苯磺酸雙(對第三丁氧基苯基)苯基鋶、對甲苯磺酸參(對第三丁氧基苯基)鋶、九氟丁烷磺酸三苯基鋶、丁烷磺酸三苯基鋶、三氟甲磺酸三甲基鋶、對甲苯磺酸三甲基鋶、三氟甲磺酸環己基甲基(2-側氧基環己基)鋶、對甲苯磺酸環己基甲基(2-側氧基環己基)鋶、三氟甲磺酸二甲基苯基鋶、對甲苯磺酸二甲基苯基鋶、三氟甲磺酸二環己基苯基鋶、對甲苯磺酸二環己基苯基鋶、二苯基(4-硫基苯氧基苯基)鋶六氟銻酸鹽等鎓鹽;雙(苯磺醯基)二偶氮甲烷、雙(對甲苯磺醯基)二偶氮甲烷、雙(二甲苯磺醯基)二偶氮甲烷、雙(環己基磺醯基)二偶氮甲烷、雙(環戊基磺醯基)二偶氮甲烷、雙(正丁基磺醯基)二偶氮甲烷、雙(異丁基磺醯基)二偶氮甲烷、雙(第二丁基磺醯基)二偶氮甲烷、雙(正丙基磺醯基)二偶氮甲烷、雙(異丙基磺醯基)二偶氮甲烷、雙(第三丁基磺醯基)二偶氮甲烷、雙(正戊基磺醯基)二偶氮甲烷、雙(異戊基磺醯基)二偶氮甲烷、雙(第二戊基磺醯基)二偶氮甲烷、雙(第三戊基磺醯基)二偶氮甲烷、1-環己基磺醯基-1-(第三丁基磺醯基)二偶氮甲烷、1-環己基磺醯基-1-(第三戊基磺醯基)二偶氮甲烷、1-第三戊基磺醯基-1-(第三丁基磺醯基)二偶氮甲烷等二偶氮甲烷衍生物;雙-鄰(對甲苯磺醯基)-α-二甲基乙二肟、雙-鄰(對甲苯磺醯基)-α-二苯基乙二肟、雙-鄰(對甲苯磺醯基)-α-二環己基乙二肟、雙-鄰(對甲苯磺醯基)-2,3-戊烷二酮乙二肟、雙-(對甲苯磺醯基)-2-甲基-3,4-戊烷二酮乙二肟、雙-鄰(正丁烷磺醯基)-α-二甲基乙二肟、雙-鄰(正丁烷磺醯基)-α-二苯基乙二肟、雙-鄰(正丁烷磺醯基)-α-二環己基乙二肟、雙-鄰(正丁烷磺醯基)-2,3-戊烷二酮乙二肟、雙-鄰(正丁烷磺醯基)-2-甲基-3,4-戊烷二酮乙二肟、雙-鄰(甲烷磺醯基)-α-二甲基乙二肟、雙-鄰(三氟甲烷磺醯基)-α-二甲基乙二肟、雙-鄰(1,1,1-三氟乙烷磺醯基)-α-二甲基乙二肟、雙-鄰(第三丁烷磺醯基)-α-二甲基乙二肟、雙-鄰(全氟辛烷磺醯基)-α-二甲基乙二肟、雙-鄰(環己烷磺醯基)-α-二甲基乙二肟、雙-鄰(苯磺醯基)-α-二甲基乙二肟、雙-鄰(對氟苯磺醯基)-α-二甲基乙二肟、雙-鄰(對第三丁基苯磺醯基)-α-二甲基乙二肟、雙-鄰(二甲苯磺醯基)-α-二甲基乙二肟、雙-鄰(樟腦磺醯基)-α-二甲基乙二肟等乙二肟衍生物;α-(苯鋶氧基亞胺基)-4-甲基苯基乙腈等肟磺酸酯衍生物;2-環己基羰基-2-(對甲苯磺醯基)丙烷、2-異丙基羰基-2-(對甲苯磺醯基)丙烷等β-酮碸衍生物;二苯基二碸、二環己基二碸等二碸衍生物;對甲苯磺酸2,6-二硝基苄酯、對甲苯磺酸2,4-二硝基苄酯等磺酸硝基苄酯衍生物;1,2,3-參(甲烷磺醯基氧基)苯、1,2,3-參(三氟甲烷磺醯基氧基)苯、1,2,3-參(對甲苯磺醯基氧基)苯等磺酸酯衍生物;鄰苯二甲醯亞胺-基-三氟甲磺酸酯、鄰苯二甲醯亞胺-基-甲苯磺酸酯、5-降冰片烯2,3-二羧基醯亞胺-基-三氟甲磺酸酯、5-降冰片烯2,3-二羧基醯亞胺-基-甲苯磺酸酯、5-降冰片烯2,3-二羧基醯亞胺-基-正丁基磺酸酯、正三氟甲基磺醯基氧基萘基醯亞胺等醯亞胺-基-磺酸酯衍生物;(5-(4-甲基苯基)磺醯基氧基亞胺基-5H-噻吩-2-亞基)-(2-甲基苯基)乙腈、(5-(4-(4-甲基苯基磺醯基氧基)苯基磺醯基氧基亞胺基)-5H-噻吩-2-亞基)-(2-甲基苯基)-乙腈等亞胺基磺酸酯衍生物;2-(甲氧基苯基)-4,6-雙(三氯甲基)-均三𠯤、2-[2-(3,4-二甲氧基苯基)乙烯基]-4,6-雙(三氯甲基)-均三𠯤、2-[2-(呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)-均三𠯤、2-[2-(5-甲基呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)-均三𠯤等三𠯤衍生物、2-甲基-2[(4-甲基苯基)磺醯基]-1-[(4-甲硫基)苯基]-1-丙烷等。這些當中,可理想地使用醯亞胺-基-磺酸酯類、亞胺基磺酸酯類、肟磺酸酯類等。上述光酸產生劑可使用1種或2種以上。
上述(B’)成分之光酸產生劑的摻合量,考量光酸產生劑本身之光吸收以及在厚膜之光硬化性的觀點,在本發明之負型感光性樹脂組成物中,相對於(A’)成分100質量份為0.05~20質量份較為理想,尤以0.2~5質量份較為理想。
本發明之負型感光性樹脂組成物之(C)成分,可較理想地使用與在正型感光性樹脂組成物之第2形態中說明過之(C)成分相同的交聯劑。
本發明之負型感光性樹脂組成物之(C)成分,如上述,不僅是能藉由將從(B’)成分產生之酸作為觸媒,並藉由(C)成分之交聯基與(A’)成分之聚合物進行交聯來形成負型的圖案,更是會在圖案形成後於後硬化中發生交聯反應,而使硬化之強度更為上昇的成分。此種(C)成分之重量平均分子量,考量光硬化性及耐熱性的觀點,為150~10,000較為理想,尤以200~3,000較為理想。
(C)成分,係在使用了本發明之聚合物之負型感光性樹脂組成物的圖案形成後,會於後硬化中發生交聯反應,而使硬化物之強度更為上昇的成分。此種(C)成分之重量平均分子量,考量光硬化性及耐熱性的觀點,為150~10,000較為理想,尤以200~3,000較為理想。
(C)成分之摻合量,在本發明之負型感光性樹脂組成物中,相對於(A’)成分100質量份為0.5~50質量份較為理想,尤以1~30質量份較為理想。
就(D)成分之溶劑而言,可較理想地使用在上述正型感光性樹脂組成物中例示之溶劑。
(D)成分之摻合量,相對於(A’)成分及(B’)成分之摻合量之合計100質量份為50~2,000質量份較為理想,尤以100~1,000質量份較為理想。
在本發明之負型感光性樹脂組成物中也一樣,亦可更含有(A’)成分、(B’)成分、(C)成分、及(D)成分以外之其他成分。就其他成分而言,可列舉如密接助劑、用於使保存穩定性提高之聚合抑制劑、以改善塗佈性能為目的而含有之(F)界面活性劑等,就(F)界面活性劑而言,可理想地使用上述所例示之化合物等。
本發明之負型感光性樹脂組成物中,視需要可添加鹼性化合物作為(G)成分。就此鹼性化合物而言,適合使用能抑制由光酸產生劑所產生之酸在阻劑皮膜擴散時之擴散速度的化合物。又,藉由上述鹼性化合物之摻合,能使解析度提昇,能抑制曝光後之感度變化,能使基板、環境相依性變小,還能改善曝光餘裕度、圖案形狀等。
就上述鹼性化合物而言,可列舉如一級、二級、三級脂肪族胺類、混成胺類、芳香族胺類、雜環胺類、具羧基之含氮化合物、具磺醯基之含氮化合物、具羥基之含氮化合物、具羥基苯基之含氮化合物、醇性含氮化合物、醯胺衍生物、醯亞胺衍生物、還有下列通式(35)表示之化合物等。
N(α)
q(β)
3-q(35)
式中,q=1、2、或3。側鏈α可相同亦可相異,係下列通式(36)~(38)表示之任意取代基。側鏈β可相同亦可相異,表示氫原子、或直鏈狀、分支狀或環狀之碳數1~20的烷基,亦可含有醚鍵或羥基。又,側鏈α之間亦可鍵結而形成環。
在此,R
300、R
302、R
305係碳數1~4之直鏈狀或分支狀的伸烷基,R
301、R
304係氫原子或碳數1~20之直鏈狀、分支狀或環狀的烷基,亦可含有1或複數個羥基、醚鍵、酯鍵、內酯環。R
303係單鍵或碳數1~4之直鏈狀或分支狀的伸烷基,R
306係碳數1~20之直鏈狀、分支狀或環狀的烷基,亦可含有1或複數個羥基、醚鍵、酯鍵、內酯環。另外,*表示鍵結末端。
就一級脂肪族胺類而言,係例示如甲胺、乙胺、正丙胺、異丙胺、正丁胺、異丁胺、第二丁胺、第三丁胺、戊胺、第三戊胺、環戊胺、己胺、環己胺、庚胺、辛胺、壬胺、癸胺、十二胺、十六胺、亞甲基二胺、亞乙基二胺、四亞乙基五胺等。
就二級脂肪族胺類而言,係例示如二甲胺、二乙胺、二正丙胺、二異丙胺、二正丁胺、二異丁胺、二第二丁胺、二戊胺、二環戊胺、二己胺、二環己胺、二庚胺、二辛胺、二壬胺、二癸胺、雙十二烷基胺、雙十六烷基胺、N,N-二甲基亞甲基二胺、N,N-二甲基亞乙基二胺、N,N-二甲基四亞乙基五胺等。
就三級脂肪族胺類而言,係例示如三甲胺、三乙胺、三正丙胺、三異丙胺、三正丁胺、三異丁胺、三第二丁胺、三戊胺、三環戊胺、三己胺、三環己胺、三庚胺、三辛胺、三壬胺、三癸胺、三(十二烷基)胺、三(十六烷基)胺、N,N,N’,N’-四甲基亞甲基二胺、N,N,N’,N’-四甲基亞乙基二胺、N,N,N’,N’-四甲基四亞乙基五胺等。
就混成胺類而言,係例示如二甲基乙胺、甲基乙基丙胺、苄胺、苯乙胺、苄基二甲胺等。
就芳香族胺類及雜環胺類而言,係例示如苯胺衍生物(例如苯胺、N-甲基苯胺、N-乙基苯胺、N-丙基苯胺、N,N-二甲基苯胺、2-甲基苯胺、3-甲基苯胺、4-甲基苯胺、乙基苯胺、丙基苯胺、三甲基苯胺、2-硝基苯胺、3-硝基苯胺、4-硝基苯胺、2,4-二硝基苯胺、2,6-二硝基苯胺、3,5-二硝基苯胺、N,N-二甲基甲苯胺等)、二苯基(對甲苯基)胺、甲基二苯胺、三苯胺、伸苯基二胺、萘胺、二胺基萘、吡咯衍生物(例如吡咯、2H-吡咯、1-甲基吡咯、2,4-二甲基吡咯、2,5-二甲基吡咯、N-甲基吡咯等)、㗁唑衍生物(例如㗁唑、異㗁唑等)、噻唑衍生物(例如噻唑、異噻唑等)、咪唑衍生物(例如咪唑、4-甲基咪唑、4-甲基-2-苯基咪唑等)、吡唑衍生物、呋咱衍生物、吡咯啉衍生物(例如吡咯啉、2-甲基-1-吡咯啉等)、吡咯啶衍生物(例如、吡咯啶、N-甲基吡咯啶、吡咯啶酮、N-甲基吡咯啶酮等)、咪唑啉衍生物、咪唑啉啶衍生物、吡啶衍生物(例如吡啶、甲基吡啶、乙基吡啶、丙基吡啶、丁基吡啶、4-(1-丁基戊基)吡啶、二甲基吡啶、三甲基吡啶、三乙基吡啶、苯基吡啶、3-甲基-2-苯基吡啶、4-第三丁基吡啶、二苯基吡啶、苄基吡啶、甲氧基吡啶、丁氧基吡啶、二甲氧基吡啶、1-甲基-2-吡啶、4-吡咯啶基吡啶、1-甲基-4-苯基吡啶、2-(1-乙基丙基)吡啶、胺基吡啶、二甲基胺基吡啶等)、嗒𠯤衍生物、嘧啶衍生物、吡𠯤衍生物、吡唑啉衍生物、吡唑烷衍生物、哌啶衍生物、哌𠯤衍生物、𠰌啉衍生物、吲哚衍生物、異吲哚衍生物、1H-吲唑衍生物、吲哚啉衍生物、喹啉衍生物(例如、喹啉、3-喹啉碳化腈等)、異喹啉衍生物、噌啉衍生物、喹唑啉衍生物、喹㗁啉衍生物、呔𠯤衍生物、嘌呤衍生物、蝶啶衍生物、咔唑衍生物、菲啶衍生物、吖啶衍生物、吩𠯤衍生物、1,10-鄰二氮菲衍生物、腺嘌呤衍生物、腺苷衍生物、鳥嘌呤衍生物、鳥苷衍生物、脲嘧啶衍生物、脲苷衍生物等。
就具有羧基之含氮化合物而言,係例示如胺基苯甲酸、吲哚羧酸、胺基酸衍生物(例如菸鹼酸、丙胺酸、精胺酸、天門冬胺酸、麩胺酸、甘胺酸、組胺酸、異白胺酸、甘氨醯白胺酸、白胺酸、甲硫胺酸、苯丙胺酸、蘇胺酸、離胺酸、3-胺基吡𠯤-2-羧酸、甲氧基丙胺酸等)等。
就具有磺醯基之含氮化合物而言,係例示如3-吡啶磺酸、對甲苯磺酸吡啶鎓等。
就具有羥基之含氮化合物,具有羥基苯基之含氮化合物、醇性含氮化合物而言,係例示如2-羥基吡啶、胺基甲酚、2,4-喹啉二醇、3-吲哚甲醇水合物、單乙醇胺、二乙醇胺、三乙醇胺、N-乙基二乙醇胺、N,N-二乙基乙醇胺、三異丙醇胺、2,2’-亞胺基二乙醇、2-胺基乙醇、3-胺基-1-丙醇、4-胺基-1-丁醇、4-(2-羥乙基)𠰌啉、2-(2-羥乙基)吡啶、1-(2-羥乙基)哌𠯤、1-[2-(2-羥基乙氧基)乙基]哌𠯤、哌啶乙醇、1-(2-羥乙基)吡咯啶、1-(2-羥乙基)-2-吡咯啶酮、3-哌啶基-1,2-丙二醇、3-吡咯啶基-1,2-丙二醇、8-羥基𠮻咯啶(8-hydroxy-julolidine)、3-奎寧環醇、3-托品醇、1-甲基-2-吡咯啶乙醇、1-氮丙啶乙醇、N-(2-羥乙基)鄰苯二甲醯亞胺、N-(2-羥乙基)異菸鹼醯胺等。
就醯胺衍生物而言,係例示如甲醯胺、N-甲基甲醯胺、N,N-二甲基甲醯胺、乙醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、丙醯胺、苯并醯胺等。
就醯亞胺衍生物而言,係例示如鄰苯二甲醯亞胺、琥珀醯亞胺、馬來醯亞胺等。
就上述通式(35)表示之化合物而言,可例示如參[2-(甲氧基甲氧基)乙基]胺、參[2-(2-甲氧基乙氧基)乙基]胺、參[2-(2-甲氧基乙氧基甲氧基)乙基]胺、參[2-(1-甲氧基乙氧基)乙基]胺、參[2-(1-乙氧基乙氧基)乙基]胺、參[2-(1-乙氧基丙氧基)乙基]胺、參[2-{2-(2-羥基乙氧基)乙氧基}乙基]胺、4,7,13,16,21,24-六氧雜-1,10-二氮雜雙環[8.8.8]二十六烷、4,7,13,18-四氧雜-1,10-二氮雜雙環[8.5.5]二十烷、1,4,10,13-四氧雜-7,16-二氮雜雙環十八烷、1-氮雜-12-冠-4、1-氮雜-15-冠-5、1-氮雜-18-冠-6、參(2-甲醯氧基乙基)胺、參(2-乙醯氧基乙基)胺、參(2-丙醯氧基乙基)胺、參(2-丁醯氧基乙基)胺、參(2-異丁醯氧基乙基)胺、參(2-戊醯氧基乙基)胺、參(2-新戊醯氧基乙基)胺、N,N-雙(2-乙醯氧基乙基)2-(乙醯氧基乙醯氧基)乙胺、參(2-甲氧基羰基氧基乙基)胺、參(2-第三丁氧基羰基氧基乙基)胺、參[2-(2-側氧基丙氧基)乙基]胺、參[2-(甲氧基羰基甲基)氧基乙基]胺、參[2-(第三丁氧基羰基甲基氧基)乙基]胺、參[2-(環己氧基羰基甲基氧基)乙基]胺、參(2-甲氧基羰基乙基)胺、參(2-乙氧基羰基乙基)胺、N,N-雙(2-羥乙基)2-(甲氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(甲氧基羰基)乙胺、N,N-雙(2-羥乙基)2-(乙氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(乙氧基羰基)乙胺、N,N-雙(2-羥乙基)2-(2-甲氧基乙氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(2-甲氧基乙氧基羰基)乙胺、N,N-雙(2-羥乙基)2-(2-羥基乙氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(2-乙醯氧基乙氧基羰基)乙胺、N,N-雙(2-羥乙基)2-[(甲氧基羰基)甲氧基羰基]乙胺、N,N-雙(2-乙醯氧基乙基)2-[(甲氧基羰基)甲氧基羰基]乙胺、N,N-雙(2-羥乙基)2-(2-側氧基丙氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(2-側氧基丙氧基羰基)乙胺、N,N-雙(2-羥乙基)2-(四氫糠基氧基羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(四氫糠基氧基羰基)乙胺、N,N-雙(2-羥乙基)2-[(2-側氧基四氫呋喃-3-基)氧基羰基]乙胺、N,N-雙(2-乙醯氧基乙基)2-[(2-側氧基四氫呋喃-3-基)氧基羰基]乙胺、N,N-雙(2-羥乙基)2-(4-羥基丁氧基羰基)乙胺、N,N-雙(2-甲醯氧基乙基)2-(4-甲醯氧基丁氧基羰基)乙胺、N,N-雙(2-甲醯氧基乙基)2-(2-甲醯氧基乙氧基羰基)乙胺、N,N-雙(2-甲氧基乙基)2-(甲氧基羰基)乙胺、N-(2-羥乙基)雙[2-(甲氧基羰基)乙基]胺、N-(2-乙醯氧基乙基)雙[2-(甲氧基羰基)乙基]胺、N-(2-羥乙基)雙[2-(乙氧基羰基)乙基]胺、N-(2-乙醯氧基乙基)雙[2-(乙氧基羰基)乙基]胺、N-(3-羥基-1-丙基)雙[2-(甲氧基羰基)乙基]胺、N-(3-乙醯氧基-1-丙基)雙[2-(甲氧基羰基)乙基]胺、N-(2-甲氧基乙基)雙[2-(甲氧基羰基)乙基]胺、N-丁基雙[2-(甲氧基羰基)乙基]胺、N-丁基雙[2-(2-甲氧基乙氧基羰基)乙基]胺、N-甲基雙(2-乙醯氧基乙基)胺、N-乙基雙(2-乙醯氧基乙基)胺、N-甲基雙(2-新戊醯氧基乙基)胺、N-乙基雙[2-(甲氧基羰基氧基)乙基]胺、N-乙基雙[2-(第三丁氧基羰基氧基)乙基]胺、參(甲氧基羰基甲基)胺、參(乙氧基羰基甲基)胺、N-丁基雙(甲氧基羰基甲基)胺、N-己基雙(甲氧基羰基甲基)胺、β-(二乙基胺基)-δ-戊內酯,但不限定於這些。上述鹼性化合物可使用1種或2種以上。
上述鹼性化合物的摻合量,考量感度的觀點,在本發明之負型感光性樹脂組成物中,相對於(A’)成分100質量份為0~3質量份較為理想,尤以0.01~1質量份較為理想。
(圖案形成方法)
接著,針對使用了本發明之正型感光性樹脂組成物及負型感光性樹脂組成物的圖案形成方法進行說明。
正型之圖案形成方法,可藉由包括下列步驟之圖案形成方法來進行:
(1)形成步驟,將上述正型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;
(2)加熱步驟,將該感光材皮膜加熱;
(3)曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對該感光材皮膜進行曝光;及
(4)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
負型之圖案形成方法,可藉由包括下列步驟之圖案形成方法來進行:
(I)形成步驟,將上述負型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;
(II)加熱步驟,將該感光材皮膜加熱;
(III)曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對該感光材皮膜進行曝光;及
(IV)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
上述負型之圖案形成方法中,在曝光步驟(III)與顯影步驟(IV)之間更包括上述感光材皮膜的曝光後加熱步驟較為理想。
不論在本發明之正型感光性樹脂組成物、負型感光性樹脂組成物中之任一者的情況下,皆可在形成圖案時採用公知的微影技術來進行,例如在矽晶圓或SiO
2基板、SiN基板、或銅配線等形成有圖案的基板上,將感光性樹脂組成物以旋轉塗覆的方法(Spin coating)予以塗佈,再以80~130℃、50~600秒左右的條件進行預烘,形成厚度1~50μm,較理想為1~30μm,更理想為5~20μm的感光材皮膜。
旋轉塗覆法中,可在將感光性樹脂組成物大約5mL點膠於聚矽氧基板上之後旋轉基板,藉此在基板上塗佈感光性樹脂組成物。此時,藉由調整旋轉速度可輕易地調整基板上之感光材皮膜的膜厚。之後,可藉由預烘將剩下的溶劑去除。
然後,將用於形成目標圖案之遮罩遮蓋於上述感光材皮膜上,並將i線、g線等波長190~500nm的高能射線或電子束以使曝光量成為1~5,000mJ/cm
2左右,較佳為100~2,000mJ/cm
2左右的方式進行照射。
然後視需要,亦可在曝光步驟與顯影步驟之間於加熱板上進行60~150℃、1~10分鐘,較佳為80~120℃、1~5分鐘的曝光後加熱處理(曝光後烘烤(PEB))。
之後,實施顯影。可於上述本發明之正型感光性樹脂組成物、及負型感光性樹脂組成物進行鹼性水溶液所為之鹼顯影。
另一方面,可用於鹼顯影之理想的鹼性水溶液係2.38%的四甲基羥基銨(TMAH)水溶液。顯影可藉由噴灑法、浸置法等一般方法、浸漬於顯影液中等來進行。之後,可視需要而進行洗淨、沖洗、乾燥等,來獲得具有所期望之圖案的阻劑皮膜。
(硬化被膜形成方法)
又,可使用烘箱、加熱板等將形成有利用上述圖案形成方法所獲得之圖案的被膜於溫度100~300℃,較理想為150~300℃,更理想為180~250℃進行加熱、後硬化,藉此形成硬化被膜。若後硬化溫度為100~300℃,可使感光性樹脂組成物之皮膜的交聯密度上昇、除去殘存的揮發成分,考量對於基板之密接力、耐熱性、強度、以及電特性的觀點較為理想。然後,後硬化時間可設定為10分鐘~10小時。
上述所形成之圖案係使用作為覆蓋配線、電路及基板等的保護用被膜之目的,這些形成之圖案及保護用被膜係具有優異的絕緣性,同時還會在被覆之配線、電路之如Cu般的金屬層、存在於基板上之金屬電極上,或存在於被覆之配線、電路之如SiN般的絕緣基板上表現優異的密接力,且能在仍具備與作為保護用被膜相稱之機械強度的情況下,大幅地改善使更微細的圖案能夠形成的解像性能。
(硬化被膜)
以此方式進行所獲得之硬化被膜,係與基板的密接性、耐熱性、電特性、機械強度及對於鹼性剝離液等的藥品耐性優異,將其使用作為保護用被膜之半導體元件的可靠性亦優異,尤其可防止在溫度循環試驗時的裂紋發生,可理想地使用作為電氣電子零件、半導體元件等的保護用被膜(層間絕緣膜或表面保護膜)。
亦即,本發明係提供由上述正型感光性樹脂組成物、或上述負型感光性樹脂組成物硬化而成之硬化被膜所構成的層間絕緣膜或表面保護膜。
上述保護用被膜,因為其耐熱性、藥品耐性、絕緣性,在包括再配線用途之半導體元件用絕緣膜、多層印刷基板用絕緣膜、焊罩、表覆層薄膜用途等用途中係有用。
然後,本發明係提供具有上述層間絕緣膜或上述表面保護膜的電子零件。
此種電子零件因為具有具耐熱性、藥品耐性、絕緣性之保護用被膜(層間絕緣膜或表面保護膜),所以會成為可靠性優異者。
[實施例]
以下,顯示合成例、比較合成例、實施例及比較例對本發明具體地說明,但本發明並不限制於下列例子中。
I.樹脂之合成
將在下列合成例中使用之化合物的化學結構式及名稱表示於下。
ODA 4,4’-二胺基二苯醚
APB 1,3-雙(3-胺基苯氧基)苯
s-ODPA 3,3’,4,4’-氧基二鄰苯二甲酸二酐
s-BPDA 3,3’,4,4’-聯苯四甲酸二酐
DC-1 癸二醯氯
PAP 4-胺基苯酚
3FA 3-氟苯胺
BAP 2,2-雙(3-胺基-4-羥基苯基)丙烷
D-400、RT-1000係HUNTSMAN(股)製之二胺。
[合成例1]氟胺基苯酚(AP-1)之合成
在具備攪拌機、溫度計且以氮氣置換後之500ml的燒瓶內加入2,2-雙(4-羥基苯基)丙烷20.0g(87.6mmol)、碳酸鉀25.4g(184.0mmol)、N-甲基-2-吡咯啶酮100g,昇溫直到150℃,並於攪拌時將使2,3-二氟-6-硝基苯酚31.4g(179.6mmol)溶解於N-甲基-2-吡咯啶酮126g後所成者費時30分鐘予以滴加後,於160℃攪拌24小時。之後,冷卻至室溫,加入水400g、10%鹽酸水溶液400g、乙酸乙酯600g,將有機層予以分離取樣後,以水400g洗淨5次。將獲得之有機層的溶劑餾去,並使產物於乙醇中再結晶,再將獲得之結晶於60℃進行15小時之減壓乾燥藉此獲得2,2-雙[4-(4-硝基-3-羥基-2-氟苯氧基)苯基]丙烷42.7g。
接著,在具備攪拌機、溫度計之500ml的燒瓶內加入上述2,2-雙[4-(4-硝基-3-羥基-2-氟苯氧基)苯基]丙烷20.0g(37.1mmol)、10wt%鈀-碳2.0g、乙醇300g,並將燒瓶內以氫氣置換,在室溫下攪拌3小時。將此反應液使用矽藻土進行過濾後,將乙醇餾去,再將獲得之結晶於60℃進行15小時之減壓乾燥,藉此獲得氟胺基苯酚(AP-1)14.7g。
[合成例2]氟胺基苯酚(AP-2)之合成
在合成例1中,將2,2-雙(4-羥基苯基)丙烷替換成間苯二酚9.6g(87.6mmol),除此以外,以同樣的配方獲得氟胺基苯酚(AP-2)。
[合成例3]氟胺基苯酚(AP-3)之合成
在合成例1中,將2,2-雙(4-羥基苯基)丙烷替換成9,9-雙(4-羥基苯基)茀30.7g(87.6mmol),除此以外,以同樣的配方獲得氟胺基苯酚(AP-3)。
[合成例4]氟胺基苯酚(AP-4)之合成
在合成例1中,將2,2-雙(4-羥基苯基)丙烷替換成1,6-己二醇10.4g(87.6mmol),除此以外,以同樣的配方獲得氟胺基苯酚(AP-4)。
<合成例5~合成例15、比較合成例1、2>
聚醯亞胺樹脂、或聚醯胺醯亞胺樹脂(A-1)~(A-11)、(B-1)、(B-2)之合成係依如下方式進行。
[合成例5]聚醯亞胺樹脂(A-1)之合成
在具備攪拌機、溫度計之1L的燒瓶內加入在合成例1合成出之胺基苯酚(AP-1)38.3g(80.0mmol)、4-胺基苯酚(PAP)0.9g(8.4mmol)、N-甲基-2-吡咯啶酮157g,於室溫下攪拌並溶解。然後在室溫下滴加將3,3’,4,4’-氧基二鄰苯二甲酸二酐(s-ODPA)26.1g(84.2mmol)溶解於N-甲基-2-吡咯啶酮264g中所成之溶液,於滴加結束後在室溫下攪拌3小時。之後,在此反應液中加入二甲苯20g,於170℃下一邊將生成的水排除至系統外,一邊進行3小時的加熱回流。冷卻至室溫後,將此反應液在超純水2L的攪拌下予以滴加,過濾分離出析出物並適當地水洗後,於40℃進行48小時之減壓乾燥,藉此獲得聚醯亞胺樹脂(A-1)。利用GPC測定此聚合物之分子量,以聚苯乙烯換算之重量平均分子量係34,000。
[合成例13]聚醯胺醯亞胺樹脂(A-9)之合成
在具備攪拌機、溫度計之1L的燒瓶內加入在合成例2合成出之胺基苯酚(AP-2)28.8g(80.0mmol)、4-胺基苯酚(PAP)0.9g(8.4mmol)、N-甲基-2-吡咯啶酮119g,於室溫下攪拌並溶解。然後在室溫下滴加將3,3’,4,4’-氧基二鄰苯二甲酸二酐(s-ODPA)20.9g(67.4mmol)溶解於N-甲基-2-吡咯啶酮211g中所成之溶液,於滴加結束後在室溫下攪拌3小時。之後,在此反應液中加入二甲苯20g,於170℃下一邊將生成的水排除至系統外,一邊進行3小時的加熱回流。冷卻至室溫後,加入吡啶2.7g(33.6mmol),並將癸二醯氯(DC-1)4.0g(16.8mmol)以保持在5℃以下的方式進行滴加。滴加結束後,返回至室溫,將此反應液在超純水2L的攪拌下予以滴加,過濾分離出析出物並適當地水洗後,於40℃進行48小時之減壓乾燥,藉此獲得聚醯胺醯亞胺樹脂(A-9)。利用GPC測定此聚合物之分子量,以聚苯乙烯換算之重量平均分子量係32,000。
[合成例6]~[合成例12]、[合成例14、15][比較合成例1、2]聚醯亞胺樹脂、或聚醯胺醯亞胺樹脂(A-2)~(A-8)、(A-10)、(A-11)(B-1)、(B-2)之合成
使用下列表1中所示之重量的化合物作為二胺化合物、單胺化合物、四羧酸二酐、二羧酸二氯化物,在聚醯亞胺樹脂的情況,係以與合成例5同樣的配方,在聚醯胺醯亞胺樹脂的情況,係以與合成例13同樣的配方,來獲得樹脂(A-2)~(A-8)、(A-10)、(A-11)(B-1)、(B-2)。利用GPC測定各個聚合物的分子量,並將以聚苯乙烯換算之重量平均分子量顯示於下列表1中。
[表1]
二胺化合物 | 單胺化合物 | 四羧酸二酐 | 二羧酸二氯化物 | 分子量 | |||||
合成例5 | A-1 | AP-1 38.3g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 34,000 | ||||
合成例6 | A-2 | AP-2 28.8g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 36,000 | ||||
合成例7 | A-3 | AP-3 48.0g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 33,000 | ||||
合成例8 | A-4 | AP-4 29.5g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 32,000 | ||||
合成例9 | A-5 | AP-1 38.3g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 23.5g (75.8mmol) | s-BPDA 2.5g (8.4mmol) | 32,000 | |||
合成例10 | A-6 | AP-2 28.8g (80.0mmol) | 3FA 0.9g (8.4mmol) | s-ODPA 23.5g (75.8mmol) | s-BPDA 2.5g (8.4mmol) | 31,000 | |||
合成例11 | A-7 | AP-2 25.9g (72.0mmol) | D-400 3.2g (8.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 33,000 | |||
合成例12 | A-8 | AP-2 25.9g (72.0mmol) | RT-1000 8.0g (8.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 34,000 | |||
合成例13 | A-9 | AP-2 28.8g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 20.9g (67.4mmol) | DC-1 4.0g (16.8mmol) | 32,000 | |||
合成例14 | A-10 | AP-2 25.9g (72.0mmol) | ODA 1.6g (8.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 20.9g (67.4mmol) | DC-1 4.0g (16.8mmol) | 34,000 | ||
合成例15 | A-11 | AP-2 25.9g (72.0mmol) | APB 2.3g (8.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 20.9g (67.4mmol) | DC-1 4.0g (16.8mmol) | 33,000 | ||
比較 合成例1 | B-1 | BAP 20.7g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 26.1g (84.2mmol) | 34,000 | ||||
比較 合成例2 | B-2 | BAP 20.7g (80.0mmol) | PAP 0.9g (8.4mmol) | s-ODPA 20.9g (67.4mmol) | DC-1 4.0g (16.8mmol) | 33,000 | |||
II.感光性樹脂組成物之製備
使用在上述合成例5~合成例15及比較合成例1、2合成出之聚合物作為基礎樹脂,並以表2及表3中記載之組成與摻合量製備樹脂換算30質量%的樹脂組成物。之後,進行攪拌、混合,針對溶解後所得者以鐵氟龍(註冊商標)製之0.5μm濾材進行精密過濾而獲得感光性樹脂組成物。表中溶劑之GBL係表示γ-丁內酯。
[表2]
樹脂 | 感光劑 | 交聯劑 | 熱酸產生劑 | 溶劑 | 溶解性 | |||
(A)成分 | (B)成分 | (C)成分 | (E)成分 | (D)成分 | ||||
感光性樹脂組成物1 | A-1 100重量份 | 感光劑1 15重量份 | GBL 230重量份 | 溶解 | ||||
感光性樹脂組成物2 | A-9 100重量份 | 感光劑1 15重量份 | GBL 230重量份 | 溶解 | ||||
感光性樹脂組成物3 | A-1 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物4 | A-2 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物5 | A-3 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物6 | A-4 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物7 | A-5 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物8 | A-6 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物9 | A-7 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物10 | A-8 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物11 | A-9 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物12 | A-10 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物13 | A-11 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | ||
感光性樹脂組成物14 | A-2 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | E-1 2重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物15 | A-9 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | E-1 2重量份 | GBL 230重量份 | 溶解 | |
比較感光性樹脂組成物1 | B-1 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 不溶 | ||
比較感光性樹脂組成物2 | B-2 100重量份 | 感光劑1 15重量份 | CL-1 10重量份 | CL-2 15重量份 | GBL 230重量份 | 不溶 | ||
表2中所示之感光性樹脂組成物1~15係關於上述本發明之正型感光性樹脂組成物。比較感光性樹脂組成物1及2,係於上述本發明之正型感光性樹脂組成物中,使用在比較合成例1及2合成出之聚合物來取代本發明之聚合物作為基礎樹脂者。感光性樹脂組成物1~15會於GBL中溶解,但比較感光性樹脂組成物1及2係不溶於GBL中,所以無法實施後述之圖案形成評價。
[表3]
樹脂 | 感光劑 | 交聯劑 | 溶劑 | 溶解性 | |||
(A)成分 | (B)成分 | (C)成分 | (D)成分 | ||||
感光性樹脂組成物16 | A-1 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物17 | A-2 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物18 | A-3 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物19 | A-4 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物20 | A-5 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物21 | A-6 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物22 | A-7 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物23 | A-8 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物24 | A-9 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物25 | A-10 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
感光性樹脂組成物26 | A-11 100重量份 | 光酸產生劑1 2重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 溶解 | |
比較感光性樹脂組成物3 | B-1 100重量份 | 感光劑1 15重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 不溶 | |
比較感光性樹脂組成物4 | B-2 100重量份 | 感光劑1 15重量份 | CL-3 15重量份 | CL-2 15重量份 | GBL 230重量份 | 不溶 | |
表3中所示之感光性樹脂組成物16~26係關於上述本發明之負型感光性樹脂組成物。比較感光性樹脂組成物3及4,係於上述本發明之負型感光性樹脂組成物中,使用在比較合成例1及2合成出之聚合物來取代本發明之聚合物作為基礎樹脂者。感光性樹脂組成物16~26會於GBL中溶解,但比較感光性樹脂組成物3及4係不溶於GBL中,所以無法實施後述之圖案形成評價。
另外,表2及表3中,係醌二疊氮化合物之感光劑(感光劑1)、光酸產生劑(光酸產生劑1)、交聯劑(CL-1)~(CL-3)、熱酸產生劑(E-1)之詳細說明如下。
感光劑(感光劑1)
式中,Q表示下列式(39)所示之1,2-重氮萘醌磺醯基或氫原子,Q之90%係經下列式(39)所示之1,2-重氮萘醌磺醯基取代。
光酸產生劑(光酸產生劑1)
交聯劑(CL-1)
交聯劑(CL-2)
環氧樹脂:ADEKA(股)公司製之EP4000L
交聯劑(CL-3)
熱酸產生劑(E-1)
III.圖案形成
藉由將上述感光性樹脂組成物1~26點膠5mL於聚矽氧基板上之後將基板旋轉,亦即,藉由旋轉塗覆法,以使在圖案形成後施行之後硬化之加熱後的膜厚成為10μm的方式進行塗佈。亦即,在後硬化步驟後,預先研究膜厚的減少,而以使後硬化後之成品膜厚成為10μm的方式調整塗佈時的轉速。
接著,在加熱板上施行100℃、2分鐘之預烘。再接著使用Nikon公司製之i線步進機NSR-2205i11進行i線曝光、圖案形成。在圖案形成中,係配合利用適當地使用了正型圖案用、負型圖案用之遮罩的感光性樹脂組成物。該遮罩具有可形成縱橫1:1配列之20μm孔洞的圖案,能形成50μm~20μm的節距為10μm,20μm~10μm的節距為5μm,10μm~1μm之節距為1μm之孔圖案。
接著,實施加熱步驟後所得者,係以如下表5中所示之條件實施。
顯影步驟中係將鹼性水溶液作為顯影液,係使用2.38%氫氧化四甲基銨水溶液作為顯影液。實施3次2.38%氫氧化四甲基銨(TMAH)水溶液之1分鐘的浸置顯影後,進行由超純水所為之沖洗。
然後,使用烘箱一邊將獲得之基板上圖案以190℃進行2小時之氮氣吹掃,一邊進行後硬化。
然後,為了能觀察獲得之孔圖案的形狀,將各基板切出,並使用掃描式電子顯微鏡(SEM)觀察孔圖案形狀。求取在後硬化後之膜厚10μm中為最小開口孔洞的口徑,並評價圖案的形狀。整合這些結果,將可形成最小圖案的感度表示於表4及表5中。
另外,孔洞的圖案形狀係以如下基準進行評價,並於表4及表5中顯示評價結果。
良好:觀察到孔洞為矩形或順錐形狀(孔洞上部之尺寸比底部之尺寸更大的形狀)者
不良:觀察到逆錐形狀(孔洞上部之尺寸比底部之尺寸更小的形狀)、外伸形狀(孔洞上部伸出的形狀)、顯著的膜損失者、或在孔洞底部觀察到殘渣者
首先,將使用正型感光性樹脂組成物(感光性樹脂組成物1~15)進行圖案化後的結果顯示於表4中。
[表4]
組成物 | 圖案 | 孔洞形狀 | 最小孔徑 (μm) | 感 度 (mJ/cm 2 ) | |
實施例 1 | 感光性樹脂組成物 1 | 正型 | 良 好 | 6 | 460 |
實施例 2 | 感光性樹脂組成物 2 | 正型 | 良 好 | 6 | 440 |
實施例 3 | 感光性樹脂組成物 3 | 正型 | 良 好 | 5 | 340 |
實施例 4 | 感光性樹脂組成物 4 | 正型 | 良 好 | 5 | 320 |
實施例 5 | 感光性樹脂組成物 5 | 正型 | 良 好 | 5 | 360 |
實施例 6 | 感光性樹脂組成物 6 | 正型 | 良 好 | 5 | 320 |
實施例 7 | 感光性樹脂組成物 7 | 正型 | 良 好 | 5 | 380 |
實施例 8 | 感光性樹脂組成物 8 | 正型 | 良 好 | 5 | 400 |
實施例 9 | 感光性樹脂組成物 9 | 正型 | 良 好 | 5 | 360 |
實施例 10 | 感光性樹脂組成物 10 | 正型 | 良 好 | 5 | 380 |
實施例 11 | 感光性樹脂組成物 11 | 正型 | 良 好 | 5 | 320 |
實施例 12 | 感光性樹脂組成物 12 | 正型 | 良 好 | 5 | 380 |
實施例 13 | 感光性樹脂組成物 13 | 正型 | 良 好 | 5 | 380 |
實施例 14 | 感光性樹脂組成物 14 | 正型 | 良 好 | 5 | 340 |
實施例 15 | 感光性樹脂組成物 15 | 正型 | 良 好 | 5 | 340 |
如表4中所示,可理解本發明之正型感光性樹脂組成物在鹼性水溶液顯影中係表現良好的圖案形狀,且因為最小孔洞尺寸表現出相較於成品膜厚10μm小的值,所以能達成1以上的縱橫比(aspect ratio)。
接著,將使用負型感光性樹脂組成物(感光性樹脂組成物16~26)進行圖案化後的結果顯示於表5中。
[表5]
組成物 | 圖案 | 曝光後烘烤 | 孔洞形状 | 最小孔徑 (μm) | 感 度 (mJ/cm 2 ) | |
實施例 16 | 感光性樹脂組成物 16 | 負型 | 100℃×120秒 | 良 好 | 6 | 680 |
實施例 17 | 感光性樹脂組成物 17 | 負型 | 100℃×120秒 | 良 好 | 6 | 660 |
實施例 18 | 感光性樹脂組成物 18 | 負型 | 100℃×120秒 | 良 好 | 6 | 680 |
實施例 19 | 感光性樹脂組成物 19 | 負型 | 100℃×120秒 | 良 好 | 6 | 660 |
實施例 20 | 感光性樹脂組成物 20 | 負型 | 100℃×120秒 | 良 好 | 6 | 680 |
實施例21 | 感光性樹脂組成物 21 | 負型 | 100℃×120秒 | 良 好 | 6 | 700 |
實施例 22 | 感光性樹脂組成物 22 | 負型 | 100℃×120秒 | 良 好 | 6 | 680 |
實施例 23 | 感光性樹脂組成物 23 | 負型 | 100℃×120秒 | 良 好 | 6 | 680 |
實施例 24 | 感光性樹脂組成物 24 | 負型 | 100℃×120秒 | 良 好 | 6 | 660 |
實施例 25 | 感光性樹脂組成物 25 | 負型 | 100℃×120秒 | 良 好 | 6 | 640 |
實施例 26 | 感光性樹脂組成物 26 | 負型 | 100℃×120秒 | 良 好 | 6 | 640 |
如表5中所示,可理解本發明之負型感光性樹脂組成物在鹼性水溶液顯影中係表現良好的圖案形狀,且因為最小孔洞尺寸表現出相較於成品膜厚10μm小的值,所以能達成1以上的縱橫比。
另外,本發明並不限定於上述實施形態。上述實施形態為例示,只要是具有本發明之申請專利範圍中記載之技術思想及實質相同的構成,並發揮相同作用效果者,皆包含於本發明之技術範圍中。
Claims (12)
- 一種聚合物,其特徵為:包含下列通式(2)表示之結構單元;
- 一種正型感光性樹脂組成物,其特徵為包含:(A)如請求項1或2之聚合物;(B)因為光而產生酸且使對於鹼性水溶液之溶解速度增大的感光劑,係具有醌二疊氮結構的化合物;及(D)溶劑。
- 一種圖案形成方法,其特徵為包括下列步驟:(1)形成步驟,將如請求項3或4之正型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;(2)加熱步驟,將該感光材皮膜加熱;(3)曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對該感光材皮膜進行曝光;及(4)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
- 一種圖案形成方法,其特徵為包括下列步驟:(I)形成步驟,將如請求項5之負型感光性樹脂組成物塗佈於基板上,形成感光材皮膜;(II)加熱步驟,將該感光材皮膜加熱; (III)曝光步驟,介隔光罩以波長190~500nm的高能射線或電子束對該感光材皮膜進行曝光;及(IV)顯影步驟,使用鹼性水溶液的顯影液進行顯影。
- 如請求項7之圖案形成方法,其中,在該曝光步驟(III)與該顯影步驟(IV)之間,更包括該感光材皮膜的曝光後加熱步驟。
- 一種硬化被覆膜形成方法,包括下列步驟:對藉由如請求項6至8中任一項之圖案形成方法所獲得之形成有圖案的被覆膜,於溫度100~300℃進行加熱、後硬化。
- 一種層間絕緣膜,其特徵為:係由如請求項3或4之正型感光性樹脂組成物、或請求項5之負型感光性樹脂組成物硬化而成之硬化被覆膜所構成。
- 一種表面保護膜,其特徵為:係由如請求項3或4之正型感光性樹脂組成物、或請求項5之負型感光性樹脂組成物硬化而成之硬化被覆膜所構成。
- 一種電子零件,其特徵為:具有如請求項10之層間絕緣膜或如請求項11之表面保護膜。
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04328127A (ja) * | 1991-04-26 | 1992-11-17 | Nippon Telegr & Teleph Corp <Ntt> | 感光性全フッ素化ポリイミド前駆体及びそれらの製造方法 |
KR20150102467A (ko) * | 2014-02-28 | 2015-09-07 | 주식회사 동진쎄미켐 | 감광성 폴리이미드 수지, 이를 포함하는 조성물 및 이를 이용한 고분자막 형성방법 |
CN111848954A (zh) * | 2019-04-25 | 2020-10-30 | 北京鼎材科技有限公司 | 一种改性聚酰亚胺前驱体树脂、光敏树脂组合物及其用途 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL177718C (nl) | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
JPS5545746A (en) | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Reactive polymer composition |
JP4665487B2 (ja) * | 2003-11-05 | 2011-04-06 | チッソ株式会社 | 新規ジアミンおよびそれを原料とするポリマー |
JP2005139302A (ja) * | 2003-11-06 | 2005-06-02 | Nippon Shokubai Co Ltd | ポリイミド前駆体およびこれを含む感光性ポリアミック酸ワニス |
JP4918968B2 (ja) | 2005-05-09 | 2012-04-18 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
JP4659678B2 (ja) | 2005-12-27 | 2011-03-30 | 信越化学工業株式会社 | フォトレジスト下層膜形成材料及びパターン形成方法 |
US8217928B2 (en) | 2009-03-03 | 2012-07-10 | Global Oled Technology Llc | Electroluminescent subpixel compensated drive signal |
JP5417623B2 (ja) | 2009-12-10 | 2014-02-19 | 信越化学工業株式会社 | ポリイミド系光硬化性樹脂組成物、パターン形成方法及び基板保護用皮膜 |
KR20140115387A (ko) * | 2013-01-21 | 2014-10-01 | 희성금속 주식회사 | 카보네이트공중합체에 사용되는 이미드계 중합체 및 그 제조방법 |
CN106146324A (zh) * | 2015-03-26 | 2016-11-23 | 东丽先端材料研究开发(中国)有限公司 | 5,5’双羟基4,4’二氨基联苯衍生物及其制备方法 |
JP2017138487A (ja) * | 2016-02-04 | 2017-08-10 | 東レ株式会社 | 感光性樹脂組成物 |
JP6663380B2 (ja) * | 2017-03-22 | 2020-03-11 | 信越化学工業株式会社 | ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
JP2019101439A (ja) * | 2017-11-30 | 2019-06-24 | 東レ株式会社 | ポジ型感光性樹脂組成物、硬化膜、半導体装置および硬化膜のレリーフパターンの製造方法 |
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- 2022-03-04 KR KR1020220028184A patent/KR20220126645A/ko not_active Application Discontinuation
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04328127A (ja) * | 1991-04-26 | 1992-11-17 | Nippon Telegr & Teleph Corp <Ntt> | 感光性全フッ素化ポリイミド前駆体及びそれらの製造方法 |
KR20150102467A (ko) * | 2014-02-28 | 2015-09-07 | 주식회사 동진쎄미켐 | 감광성 폴리이미드 수지, 이를 포함하는 조성물 및 이를 이용한 고분자막 형성방법 |
CN111848954A (zh) * | 2019-04-25 | 2020-10-30 | 北京鼎材科技有限公司 | 一种改性聚酰亚胺前驱体树脂、光敏树脂组合物及其用途 |
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US20220289911A1 (en) | 2022-09-15 |
CN115044040A (zh) | 2022-09-13 |
EP4056627B1 (en) | 2023-08-23 |
TW202239822A (zh) | 2022-10-16 |
KR20220126645A (ko) | 2022-09-16 |
JP2022137420A (ja) | 2022-09-22 |
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