TWI818820B - A method of mask map correction - Google Patents

Abstract

The present invention relates to the field of lithography-friendly technology, in particular to a mask map correction method, comprising providing the initial mask map to obtain the graphic point information in the initial mask map; matching the bad point information in the preset mask map matching library, and including the bad point information and the bad point information of the mask map corresponding to the bad point information of the initial mask map. In order to solve the problem that the existing mask map correction methods require huge computational resources, the present invention provides a mask map repair method.

Description

A mask layout correction method

The present invention relates to the technical field of photolithography machines, and in particular to a photolithography machine matching method.

The optical process is the modeling of light through the use of optical and chemical models with the help of mathematical formulas. Light is irradiated through the mask to form diffraction and converge on the surface of the photoresist, and the projected light stimulates a chemical reaction on the photoresist and bakes it to make the photoresist locally soluble in the developer. By simulating the reactions that occur on the photoresist, exploring ways to increase the photolithography resolution and process window from calculations is called photolithography OPC modeling.

In mass production, multiple lithography machines used in the same production line may come from different lithography machine suppliers. The functions and performance of the wafer photolithography process may be different in different photolithography machines. That is, different models of photolithography machines may bring about different performance differences in the same photolithography process, which may cause a decrease in the efficiency of mass production. , the yield decrease caused by performance degradation.

In order to solve the problem that existing mask layout correction methods consume huge computing resources, the present invention provides a mask layout repair method.

In order to solve the above technical problems, the present invention provides the following technical solution: a mask layout correction method, including the following steps: providing an initial mask layout, the initial mask layout includes a plurality of graphic points, each graphic point has a corresponding Graphic point information; match the graphic point information in the initial mask layout with the bad pixel information in the preset mask layout matching library. The matching library includes the mask layout bad pixel information and the mask layout bad pixel information. Corresponding correction point information; if there is bad pixel information that matches certain graphic point information in the initial mask layout, use the correction point information corresponding to the bad pixels in the mask layout to correct the initial mask layout.

Preferably, providing the initial mask layout also includes: establishing a bad pixel library containing bad pixels of the mask layout; correcting each of the mask layout bad pixels in the bad pixel library to obtain the The correction points corresponding to the bad pixels of the mask layout are stored in a correction library; the bad pixel library and the correction library are combined into the matching library.

Preferably, the method of correcting each of the mask layout bad pixels in the bad pixel library is: inputting each of the mask layout bad pixels into a preset simulation correction model; the simulation correction model The defective pixels of the mask layout are simulated and corrected to obtain the correction points corresponding to the defective pixels of the mask layout.

Preferably, matching the graphics point information in the initial mask layout with the bad pixel information in a preset bad pixel library includes: matching the graphics points in the initial mask layout with at least part of the bad pixel library. The pattern matching of bad pixels in the mask layout includes: matching the pattern point information in the initial mask layout with the bad pixel information in the preset bad pixel library according to preset matching rules.

Preferably, the preset matching rules include fuzzy matching and exact matching.

Preferably, the precise matching includes the following steps: locating the target line segment in the graphic point information and calculating the check value of the target graphic; searching for the line segment to be matched in the matching library; positioning rotation and mirroring according to the line segment to be matched information, use the graphics in the rectangular area formed by the line segments to be matched as the target graphics to be matched, and reversely convert them into the shape of the target graphics; calculate the check value based on the length of the line segments in the target to be matched, if the check value If the check value is the same as the target graphic, the match is successful.

Preferably, the precise matching includes the following steps: locating the target line segment in the graphic point information and calculating the check value of the target graphic; searching for the line segment to be matched in the matching library; positioning rotation and mirroring according to the line segment to be matched information, use the graphics in the rectangular area formed by the line segments to be matched as the target graphics to be matched, and reversely convert them into the shape of the target graphics; calculate the check value based on the length of the line segments in the target to be matched, if the check value If the check value is the same as the target graphic, the match is successful.

Preferably, the above method further includes the following steps after the correction: continue to match the graphic point information in the initial mask layout with the bad pixel information in the bad pixel library, and if the matching is successful, continue to match the initial mask. The mask layout is corrected; if the matching fails, the corrected mask layout is output.

Another technical solution of the present invention to solve the above technical problems is: a computer-readable storage medium with computer program instructions on it. When the computer program instructions are executed by the processor, the above-mentioned mask layout correction method is implemented.

Another technical solution of the present invention to solve the above technical problems is: a graphics repair device, including a device body and a device operating program. When the device body executes the device operating program, the above-mentioned mask layout correction method is implemented.

Compared with the existing technology, the mask layout repair method provided by the present invention has the following beneficial effects:

1. A mask layout correction method provided by the present invention includes the following steps: providing an initial mask layout, and the mask layout obtains graphic point information in the initial mask layout; combining the graphic point information in the initial mask layout with the preset Match the bad pixel information in the mask layout matching library, which includes the mask layout bad pixel information and the corrected pixel information corresponding to the mask layout bad pixels; if there is a defective pixel information that matches a certain graphic point in the initial mask layout If the information matches, the initial mask layout will be corrected using the correction point information corresponding to the bad pixels in the mask layout. By matching the initial mask layout with the bad pixels in the matching library, the initial mask layout can be better detected with bad pixels by matching the bad pixels in the library. The parts of the initial mask layout that successfully match the bad pixels in the matching library are directly replaced with the correction points corresponding to the bad pixels, reducing the time required for repair. For the global design graphics, simulate the key areas and match the graphics with the bad pixels in the matching library, and then use the correction points corresponding to the bad pixels to replace and correct the graphics with corrections, which can greatly save time and only require a small amount of time. calculation, saving resources. Solved the problem of using a small amount of resources to modify the design graphics.

2. A mask layout repair method provided by the present invention provides an initial mask layout, which also includes: establishing a bad pixel library with mask layout bad pixels; and performing repair on each mask layout bad pixel in the bad pixel library. The correction points corresponding to the bad pixels of the mask layout are obtained through correction, and the correction points corresponding to the bad pixels of the mask layout are stored in the correction library; the bad pixel library and the correction library are combined into a matching library. A bad pixel library is established based on the required bad pixels or past experience. The bad pixel library mainly contains bad pixels for the initial mask layout. Using the required bad pixels can avoid unnecessary matching in the subsequent matching process. , reducing time and saving resources. Use simulation software to correct the bad pixels to obtain the correction points that correspond to the bad pixels one-to-one and establish a correction library, which can directly replace and correct the bad pixels in the correction mask layout in the future, without the need to perform simulation correction again, saving time , reducing operations and saving resources. The matching library formed by the established bad pixel library and correction library can ensure that the subsequently matched bad pixels can find their corresponding correction points in the matching library. Directly replace the correction, and there will be no problem of correction errors, saving time, reducing calculations and saving resources.

3. A mask layout repair method provided by the present invention, the method of correcting the bad pixels of each mask layout in the bad pixel library is: input each mask layout bad pixel into the simulation correction model; the simulation correction model The defective pixels in the mask layout are simulated and corrected, and the correction points corresponding to the defective pixels in the mask layout are obtained. Input each mask layout defective pixel into the simulation repair model to simulate and correct the mask layout defective pixels to obtain correction points. Simulation repair can only be performed on the dead pixels of the mask layout, which facilitates direct replacement of the dead pixels later without the need for redundant simulation operations, thus saving resources.

4. A mask layout repair method provided by the present invention. Matching the graphic point information in the initial mask layout with the bad pixel information in the preset bad pixel library includes: matching the initial mask layout points with at least one in the bad pixel library. Part of the mask layout has bad pixels for pattern matching. Select the required bad pixels in the bad pixel library for matching. You can specifically select the required bad pixels in the bad pixel library to match the initial mask after confirming the type of bad pixels in the initial mask layout that needs to be solved. Membrane layout matching can reduce the amount of calculations required for matching, reduce time and save resources.

5. In a mask layout repair method provided by the present invention, graphics matching includes: matching the graphics point information in the initial mask layout with the bad pixel information in the preset bad pixel library according to the preset matching rules. By setting matching rules for graphics matching, you can set different matching rules according to the needs, thereby achieving the optimal matching effect and reducing unnecessary operations.

6. In the mask layout repair method provided by the present invention, the preset matching rules include fuzzy matching and exact matching. Selecting different matching rules according to different situations can better achieve the required effects without wasting resources. When you need to accurately find the bad pixels in the initial mask layout Use Exact Match to perform precise graphic matching to avoid errors. When a large number of bad pixels need to be detected, fuzzy matching can be used to perform matching, thereby reducing the time required for matching.

7. A mask layout repair method provided by the present invention selects part or all of the bad pixel information in the bad pixel library to form a default bad pixel library. The bad pixel library can be selected according to the initial mask layout situation or according to the type of dead pixels in the mask layout that needs to be repaired, so that the required bad pixels in the bad pixel library can be selected for summation. The mask layout to be repaired is matched. It can better reduce unnecessary calculations, save time and save resources.

8. A mask layout repair method provided by the present invention. If the matching is successful, the correction point information corresponding to the mask layout bad pixels is used to replace the initial mask layout information for correction. After the initial mask layout and the bad pixels in the bad pixel library are successfully matched, the corresponding correction points in the correction library corresponding to the matched bad pixels in the bad pixel library are used to replace the corresponding positions on the initial mask layout. , which can directly correct the bad pixels on the initial mask layout without the need for separate simulation correction, reducing the time to repair the bad pixels on the initial mask layout, reducing the process of re-simulation, and saving resources.

9. A mask layout repair method provided by the present invention. The above method also includes the following steps after correction: continue to match the graphic point information in the initial mask layout with the bad pixel information in the bad pixel library. If the matching is successful, Then continue to correct the initial mask layout; if the matching fails, output the corrected mask layout. After completing the initial graphics dead pixel replacement and correction, the corrected mask layout is output. There is no need to perform simulation operations on the initial mask layout to obtain the corrected mask layout, that is, the corrected mask layout can be directly output. It saves time to repair the mask layout and reduces the use of resources.

10. A computer-readable storage medium provided by the present invention has computer program instructions on it. When the computer program instructions are executed by a processor, the above method is implemented. The computer-readable storage medium has the same beneficial effects as the above-mentioned mask layout correction method, which will not be described in detail here.

11. A graphics repair device provided by the present invention includes a device body and a device operating program. When the device body executes the device operating program, the above-mentioned mask layout correction method is implemented. The pattern repair equipment has the same beneficial effects as the above-mentioned mask layout correction method, which will not be described in detail here.

100: Computer readable storage media

200:Graphic repair equipment

110: Computer program instructions

210:Equipment body

220:Device running program

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or description of the prior art will be briefly introduced below. Obviously, the drawings in the following description are only some of the present invention. Embodiments, for those of ordinary skill in the art, other drawings can also be obtained based on these drawings without exerting creative efforts.

Figure 1 is a flow chart of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 2 is a flow chart of step S0 of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 3 is a flow chart of step S0b of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 4 is a flow chart of step S1 of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 5 is a flow chart of step S12 of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 6 is a schematic diagram of a target pattern of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 7 is a schematic diagram of searching for candidate positions in a mask layout repair method according to the first embodiment of the present invention.

FIG. 8 is a schematic diagram of the tolerance value of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 9 is a schematic diagram of four situations when the target line segment 1 is horizontal in a mask layout repair method provided by the first embodiment of the present invention.

FIG. 10 is a schematic diagram of four situations when the target line segment 1 is vertical in a mask layout repair method provided by the first embodiment of the present invention.

FIG. 11 is a schematic diagram of an ignored frame of a mask layout repair method provided by the first embodiment of the present invention.

FIG. 12 is a flow chart for providing global graphics repair according to the second embodiment of the present invention.

Figure 13 is a 20um*20um circuit design pattern provided by the second embodiment of the present invention.

Figure 14 is a 1um*1um dead pixel pattern provided by the second embodiment of the present invention.

Figure 15 is a 1um*1um correction pattern provided by the second embodiment of the present invention.

Figure 16 is a global graph provided by the second embodiment of the present invention.

FIG. 17 is a partial cutout of a bad pixel graphic of the global graphic provided by the second embodiment of the present invention.

Figure 18 is a modified global graph provided by the second embodiment of the present invention.

FIG. 19 is a partial cutout of a corrected point figure in the corrected global figure provided by the second embodiment of the present invention.

Figure 20 is a schematic diagram of a computer-readable storage medium provided by the third embodiment of the present invention.

Figure 21 is a schematic diagram of a pattern repair device provided by the fourth embodiment of the present invention.

In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below with reference to the accompanying drawings and implementation examples. It should be understood that the specific embodiments described here are only used to explain the present invention and are not intended to limit the present invention. Please refer to Figure 1. A first embodiment of the present invention provides a mask layout correction method, which includes the following steps: S1: Provide an initial mask layout. The initial mask layout includes multiple graphic points, and each graphic point has a corresponding graphic. Point information, obtain the graphic point information in the initial mask layout; S2: Match the graphic point information in the initial mask layout with the bad pixel information in the preset mask layout matching library, the matching library includes the mask layout The bad pixel information and the corrected point information corresponding to the mask layout bad pixel information; S3: If there is a bad pixel information that matches a certain graphic point information in the initial mask layout, use the corrected point information corresponding to the mask layout bad pixels to correct the initial The mask layout is corrected. It can be understood that in the first embodiment of the present invention, the initial mask layout is matched with the bad pixels in the matching library, so that the initial mask layout can be better detected with bad pixels by matching the bad pixels in the library.

Furthermore, in the first embodiment of the present invention, the parts of the initial mask layout that are successfully matched with the bad pixels in the matching library are directly replaced with correction points corresponding to the bad pixels, thereby reducing the time required for repair.

Furthermore, in the first embodiment of the present invention, for the global design graphics, key areas are simulated and the graphics are matched with the bad pixels in the matching library, and then the corrections corresponding to the bad pixels are used. Click to replace and correct the graphics to be corrected, which can greatly save time, and at the same time only requires a small amount of calculations, saving resources. Design graphics can be modified using a small amount of resources.

Please refer to Figure 2. The first embodiment of the present invention provides a mask layout correction method. Before step S1, it also includes steps S0: S0a: establishing a bad pixel library containing defective pixels in the mask layout; S0b: modifying each bad pixel in the bad pixel library. A mask layout's bad pixels are corrected to obtain the correction points corresponding to the mask layout's bad pixels, and the correction points corresponding to the mask layout's bad pixels are stored in the correction library; S0c: The bad pixel library and the correction library are combined into a matching library. It can be understood that in the first embodiment of the present invention, the bad pixel library and the correction library together form a bad pixel matching library. Specifically, in the first embodiment of the present invention, a bad pixel library can be established based on the required dead pixels or past experience. The bad pixel library mainly contains bad pixels for the initial mask layout, using the required bad pixels. Library elements can prevent redundant matching in the subsequent matching process, reducing time and saving resources at the same time. Specifically, in the first embodiment of the present invention, simulation software is used to correct the bad pixels to obtain correction points that correspond to the bad pixels one-to-one to establish a correction library, so that the subsequent correction of the bad pixels in the mask layout can be directly replaced and corrected. There is no need to perform simulation corrections again, which saves time, reduces calculations, and saves resources.

Furthermore, in the first embodiment of the present invention, the matching library formed by the established bad pixel library and the correction library can ensure that the subsequently matched bad pixels can be directly replaced and corrected by finding their corresponding correction points in the matching library, and without The problem of correcting errors will occur, saving time, reducing calculations and saving resources.

Please refer to Figure 3. The first embodiment of the present invention provides a mask layout correction method. In step S0b, the method of correcting the defective pixels of each mask layout in the defective pixel library is: S0b1: The layout defective pixels are input into the simulation correction model; S0b2: The simulation correction model simulates and corrects the mask layout defective pixels, and obtains the correction points corresponding to the mask layout defective pixels. It can be understood that in the first embodiment of the present invention, each mask layout defective pixel is input into the simulation repair model to simulate and repair the mask layout defective pixel. Yes, correction points are obtained. In this way, simulation repair of dead pixels in the mask layout can facilitate direct replacement of dead pixels in the later stage without the need for redundant simulation operations, thus saving resources.

Please refer to Figure 4. The first embodiment of the present invention provides a mask layout correction method. Step S1 includes: S11: input the initial mask layout; S12: convert at least part of the graphics points in the initial mask layout and the bad pixel library. Mask layout bad pixels for pattern matching. It can be understood that in the first embodiment of the present invention, the required bad pixels in the bad pixel library are selected for matching. The required bad pixels can be specifically selected after confirming the type of bad pixels in the initial mask layout that need to be solved. The dead pixels in the dead pixel library are matched with the initial mask layout, which can reduce the amount of calculations required for matching, reduce time and save resources.

Please continue to refer to Figure 4. The first embodiment of the present invention provides a mask layout correction method. The pattern matching method in step S12 is: matching the pattern point information in the initial mask layout with the bad pixel information in the default bad pixel library according to Preset matching rules are performed. It can be understood that in the first embodiment of the present invention, graphics matching is performed by setting matching rules. Different matching rules can be set according to the needs, thereby achieving the optimal matching effect and reducing unnecessary operations.

Furthermore, in the first embodiment of the present invention, the matching method between the graphic points in the initial mask layout and the bad pixels in the preset bad pixel library is based on the hash value of the graphic. Specifically, the hash value is calculated for the bad pixels in the bad pixel library, and the hash value is calculated for the graphic points in the initial mask layout. The hash values of the same graphics are equal, that is, if the graphic points in the initial mask layout Having the same hash value as a bad pixel means that the graphics point matches a bad pixel.

Please refer to FIG. 5. The first embodiment of the present invention provides a mask layout correction method. Step S12 further includes the following steps: S12a: Set matching rules. The matching rules include fuzzy matching and exact matching. It can be understood that in the first embodiment of the present invention, graphics matching is performed by setting matching rules. With matching, you can set different matching rules according to the needs, thereby achieving the optimal matching effect and reducing unnecessary operations.

Specifically, in the first embodiment of the present invention, when it is necessary to accurately find out the bad pixels of the initial mask layout, precise matching can be used to perform precise pattern matching to avoid errors. When a large number of bad pixels need to be detected, fuzzy matching can be used to perform matching, thereby reducing the time required for matching.

It should be understood that exact matching uses two line segments with the largest distance and that are perpendicular to each other as target line segments. The graphics within the rectangular area formed by the target line segments are the graphics to be matched. It is judged whether the feature values of the graphics to be matched are completely consistent with the given graphics. That is, the two parties of exact matching are the graphics in the initial mask layout and the graphics in the mask layout matching library. Exact matching includes the following steps: locating the target line segment in the graphic point information as the subsequent line segment to be matched in the mask layout, and calculating the check value of the target graphic; searching for the length and spatial relationship with the line segment to be matched in the mask layout The same line segment combination; obtain the figure within the rectangle formed by the line segment combination as the target to be matched; based on the positioning, rotation and mirroring information of the line segments to be matched, reversely convert the target to be matched into the shape of the target figure; calculate based on the target to be matched Check value. If the check value is the same as the check value of the target graphic, the match is successful.

For example, to locate the target line segment in the target graphic: input the layout file and marker box and other information, and the target graphic is recorded as the area selected by the marker box. As shown in Figure 6, by sorting the distances from all the edges in the mark box to the lower left corner and lower right corner of the search box, respectively, find the edge whose midpoint is closest to the vertices of the two search boxes, based on the length of the two edges and the midpoint of the two edges. X-axis distance and Y-axis distance are used as matching basis.

Calculate the check value of the target graphic: Move the lower left corner of the target graphic frame to coincide with the coordinate origin, calculate the hash value of the X coordinate and Y coordinate of the first line segment of the target graphic, and gradually iterate to all line segments to calculate the hash value, and add The width and height of the mark box are used to calculate the hash value, which is the final verification value of the target graphic. Hash is a standard verification method that can convert a data into a series of unique long integers. For one of the line segments, perform the following calculation, let the initial hash value be 0, recalculate the hash value after adding a value, and add the x-coordinates and y-coordinates of the two endpoints of the line segment in turn. The formula is as follows hash _edge = hash ( hash ( hash ( hash (P1 _x )+P1 _y )+P2 _x )+P2 _y )

For a certain graphic, use the above method to traverse all line segments to obtain the final hash value, which is the check value of the target graphic.

Find the position and transformation information of the candidate graphics: traverse all line segments in the mask layout matching library. When a line segment is equal in length to the first target line segment, it is determined that the candidate graphics may exist here, and all possible candidates are drawn. The picture frame, as shown in Figure 7, is used for subsequent filtering operations. Based on the directional relationship between the two target line segments, the rotation and mirroring information of the candidate graphics can be obtained. As shown in Figure 8 and Figure 9, there are 8 possible situations when the target line segment 1 is vertical and horizontal. Select the mark box and reversely convert the candidate graphics into the form of the target graphics to prepare for calibration value calculation. Calculate check value and match: Use the above method to calculate the hash value of all candidate frames. If the check value of a candidate frame is equal to the check value of the target graphic, the match is successful and the coordinate information of the candidate frame is output. Fuzzy matching is based on exact matching, removing the fuzzy parts of the matching graphics before calculating the check value to tolerate moderate changes in specific parts, including the following steps: locating the target line segment in the graphic point information, removing the fuzzy parts and calculating Target graphic check value; search the target line segment in the mask layout matching library to find candidate graphics; reversely convert the target graphic shape based on the target line segment positioning, rotation and mirroring information; remove the blurred part and calculate the calibration based on the remaining line segment length. If the check value is the same as the target graphic, the match is successful. It should be understood that the fuzzy parts can be divided into two categories. One is the ignore box, which deletes all the graphics in the ignored box when calculating the check value; the other is the tolerance line, which deletes the fuzzy part and connects it to the tolerance line when calculating the check value. String The segment is shortened to the minimum value of the tolerance interval. When there is information input for fuzzy edge segments or ignore boxes, the fuzzy matching function is turned on. Ignoring the frame is to directly delete all graphics in the candidate frame area for the target graphics. For the candidate frame, as shown in Figure 10 (the dotted box represents the ignored frame), first obtain its rotation and mirroring information through the above method, and delete all shapes in the corresponding location area. graphics. The fuzzy edge is an input edge that can be extended or shortened, and a tolerance value needs to be entered to set the applicable range of the fuzzy edge. The line segment connected to the fuzzy edge becomes a special target line segment, and is reduced to the lowest value of the tolerance value to calculate the verification value. As shown in Figure 11, the tolerance line does not participate in the calculation of the verification value.

Please continue to refer to FIG. 5. The first embodiment of the present invention provides a mask layout correction method. After step S12a, it also includes the following steps: S12b: Select part or all of the bad pixel information in the bad pixel library to form a default bad pixel library. . It can be understood that in the first embodiment of the present invention, the bad pixel library can be selected according to the initial mask layout situation or according to the type of bad pixels in the mask layout that needs to be repaired, so as to select the required ones. The dead pixels in the bad pixel library are matched with the mask layout to be repaired. It can better reduce unnecessary calculations, save time and save resources. Specifically, step S12a and step S12b are both performed between step S11 and step S12, and the order of step S12a and step S12b is not required in the embodiment of the present invention.

The first embodiment of the present invention provides a mask layout correction method. Step S3 includes: S31: Matching is successful; S32: Correction point information corresponding to mask layout bad pixels is used to replace the initial mask layout information for correction. It can be understood that in the first embodiment of the present invention, if the matching is successful, the correction point information corresponding to the bad pixels in the mask layout is used to replace the graphic point information in the initial mask layout for correction. Specifically, after the initial mask layout and the bad pixels in the bad pixel library are successfully matched, the corresponding correction points in the correction library of the matched bad pixels in the bad pixel library are used to correspond to the initial mask layout. By replacing the positions, the initial mask layout can be directly corrected for bad pixels without the need for separate simulation correction. It reduces the time to repair bad pixels on the initial mask layout, reduces the process of re-simulation, and saves resources.

The first embodiment of the present invention provides a mask layout correction method, which further includes the following steps after step S3: S4: Output the corrected mask layout. Understandably, in the first embodiment of the present invention, after completing the initial replacement and correction of bad pixels in the graphics, the corrected mask layout is output, and the corrected mask layout can be obtained without performing simulation operations on the initial mask layout. That is, the corrected mask layout can be output directly. It saves time to repair the mask layout and reduces the use of resources.

Preferably, outputting the corrected mask layout further includes the following steps: continuing to match the graphic point information in the initial mask layout with the bad pixel information in the bad pixel library, and if the matching is successful, continuing to match the bad pixel information in the bad pixel library. The initial mask layout is corrected; if the matching fails, the corrected mask layout is output.

In summary, the first embodiment of the present invention provides a mask layout correction method. First, a bad pixel library, a correction library, and a bad pixel matching library in which bad pixels and correction points correspond one-to-one are established. Secondly, the initial mask layout is input and the matching is set. Rules and select the dead pixels that need to be matched, and then replace the bad pixels on the initial mask layout with the correction points corresponding to the bad pixels that successfully match the bad pixels. Finally, the corrected initial mask layout is output.

With reference to Figures 12 to 19, a mask layout correction method is provided in a second embodiment of the present invention. It can be understood that the second embodiment of the present invention uses a 20um*20um circuit design pattern as the global design pattern and a bad pixel library containing a 1um*1um bad pixel pattern, and a bad pixel library containing a 1um*1um correction pattern. The correction library matches the bad pixel graphics in the bad pixel library in the global design graphics and replaces them with the correction graphics in the correction library. Specifically, in the second embodiment of the present invention, the specific process is: S201: input global design graphics; S202: perform graphic matching; S203: perform graphic matching. Shape replacement correction; S204: Output the corrected global graphics; It can be understood that the second embodiment of the present invention adopts a mask layout correction method described in the first embodiment, and has the same benefits as the first embodiment. The effect will not be described in detail here.

Please continue to refer to Figures 16 and 17. In the second embodiment of the present invention, matching rules are set for matching, that is, a hash value operation is performed on the global design graphics and the bad pixel graphics. If the hash values of the global design graphics and the bad pixel graphics are the same, the matching is successful. . It can be understood that Figure 16 is a global graph, and Figure 17 is a partial cutout of the bad pixel graph in the global graph.

Please continue to refer to Figures 18 and 19. In the second embodiment of the present invention, for the bad pixels after successful matching, the correction points in the correction library corresponding to the bad pixels in the bad pixel library are used to correct and replace the bad pixels in the global graphics. The corrected global graph is obtained. It can be understood that Figure 18 is the corrected global graph, and Figure 19 is a partial cutout of the corrected global graph with corrected point figures.

Referring to FIG. 20 , a third embodiment of the present invention provides a computer-readable storage medium 100 having computer program instructions 110 thereon. When the computer program instructions 110 are executed by a processor, the above-mentioned mask layout correction method is implemented. It can be understood that computer program instructions 110 are stored in the computer-readable storage medium 100 in the third embodiment of the present invention, and the computer program instructions 110 can be called by the processor to execute a mask layout described in the first embodiment. Correction method. The computer-readable storage medium 100 has the same beneficial effects as the above-mentioned mask layout correction method, which will not be described in detail here.

Specifically, the computer-readable storage medium 100 may be an electronic memory such as flash memory, EEPROM (electrically erasable programmable read-only memory), EPROM, hard disk or ROM. Optionally, the computer-readable storage medium 100 includes non-volatile computer-readable media. Specifically, the computer-readable storage medium 100 has storage space for computer program instructions 110 that execute any method steps in the above methods. These program instructions can be read from or written to one or more computer program products. or in multiple computer program products. Optionally, the computer program instructions 110 can be compressed in an appropriate form.

Referring to Figure 21, a fourth embodiment of the present invention provides a graphics repair device 200, which includes a device body 210 and a device running program 220. When the device body 210 executes the device running program 220, it implements the above-mentioned mask layout correction method. It can be understood that when the graphics repair device 200 in the fourth embodiment of the present invention is running and the device body 210 executes the device running program 220, the method described in the first embodiment can be implemented. The graphics repair device 200 has the same beneficial effects as the above-mentioned mask layout correction method, which will not be described in detail here.

In the embodiments provided by the present invention, it should be understood that "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean determining B solely based on A. B can also be determined based on A and/or other information.

It will be understood that reference throughout this specification to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic associated with the embodiment is included in at least one embodiment of the invention. Thus, the appearances of "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily referring to the same embodiment. Furthermore, the particular features, structures or characteristics may be combined in any suitable manner in one or more embodiments. Those skilled in the art should also know that the embodiments described in the specification are all optional embodiments, and the actions and modules involved are not necessarily necessary for the present invention.

The flowcharts and block diagrams in the accompanying drawings of the present application illustrate the architecture, functions and operations of possible implementations of systems, methods and computer program products according to various embodiments of the present application. In this regard, each box in the flowchart or block diagram may represent a module, segment, or portion of code that contains one or more components for implementing the provisions Executable instructions for logical functions. It should also be noted that in some alternative implementations, the boxes marked The functions may also occur in a sequence different from that noted in the figures. For example, two blocks shown one after another may actually execute substantially in parallel, or they may sometimes execute in the reverse order, depending upon the functionality involved. It is noted that each block in the block diagram and/or flowchart illustration, and combinations of blocks in the block diagram and/or flowchart illustration, can be configured with dedicated hardware-based hardware that performs the specified functions or operations. system, or can be implemented using a combination of dedicated hardware and computer instructions.

The above is a detailed introduction to a mask layout correction method disclosed in the embodiments of the present invention. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention. and its core idea; at the same time, for those of ordinary skill in the art, there will be changes in the specific implementation and application scope according to the idea of the present invention. In summary, the content of this description should not be understood as a limitation of the present invention. Any modifications, equivalent substitutions and improvements made within the principles of the present invention shall be included in the protection scope of the present invention.

Claims (10)

A mask layout correction method, implemented by a device, characterized in that: the method includes the following steps: providing an initial mask layout with multiple graphic points, and obtaining information on the graphic points in the initial mask layout ; Match the information of the graphic points in the initial mask layout with the information of the mask layout bad pixels in the pre-established mask layout matching library, and the mask layout matching library includes the mask layout bad pixels; Point information and corrected point information corresponding to the defective pixels in the mask layout after preset simulation correction; and if there is information about the defective pixels in the mask layout that is consistent with one of the initial mask layout If the information of the graphic points matches, then use the information of the correction points corresponding to the bad points of the mask layout to replace the certain point in the initial mask layout with the correction point. Correction of the graphic points. The mask layout correction method of claim 1, wherein before the step of providing an initial mask layout, the following steps are also included: establishing a bad pixel library containing dead pixels of the mask layout; Each of the mask layout bad pixels is corrected to obtain the correction points corresponding to the mask layout bad pixels, and the correction points corresponding to the mask layout bad pixels are stored in a correction library; and The bad pixel library and the correction library are combined to form the matching library. The mask layout correction method of claim 2, wherein the method for correcting each of the mask layout bad pixels in the bad pixel library is: inputting each of the mask layout bad pixels into a preset a simulation correction model; and the simulation correction model simulates and corrects the defective pixels of the mask layout to obtain the correction points corresponding to the defective pixels of the mask layout. The mask layout correction method of claim 3, wherein the information of the graphic points in the initial mask layout is matched with the mask layout bad pixels in the pre-established mask layout matching library. Matching of information includes: converting the information in the initial mask layout to The graphic points are graphically matched with at least part of the mask layout bad pixels in the dead pixel library. The graphic matching includes: the information of the graphic points in the initial mask layout and the bad pixels. The bad pixel information in the library is matched according to preset matching rules. The mask layout correction method of claim 4, wherein the preset matching rules include fuzzy matching and exact matching. The mask layout correction method of claim 5, wherein the precise matching includes the following steps: locating the target line segment in the information of the graphic point, and calculating the check value of the target graphic; searching for the target line in the matching library Matching line segments; based on the positioning, rotation and mirroring information of the line segments to be matched, the graphics in the rectangular area formed by the line segments to be matched are used as the target graphics to be matched, and reversely converted into the shape of the target graphics; based on the information in the target to be matched Calculate the check value based on the length of the line segment. If the check value is the same as the check value of the target graphic, the match is successful. The mask layout correction method of claim 5, wherein the fuzzy matching includes the following steps: locating the target line segment in the information of the graphic point, removing the blurred part and calculating the target graphic check value; in the matching library Search the target line segment to find candidate graphics; position the rotation and mirroring information of the target line segment, and reversely convert it into the shape of the target graphic; remove the blurred part, and calculate the check value based on the length of the remaining line segment. If the check value is the same as the target shape, then Match successful. The mask layout correction method of claim 1 further includes the following steps: continuing to match the information of the graphic points in the initial mask layout with the information of the mask layout bad pixels in the bad pixel library , if the matching is successful, continue to modify the initial mask layout; if the matching fails, the corrected mask layout is output. A computer-readable storage medium on which computer program instructions are stored, characterized in that: when the computer program instructions are executed by a processor, the method described in any one of claims 1-8 is implemented. A graphics repair device, characterized in that: the device includes a device body and a device running program, and when the device body executes the device running program, it implements the method described in any one of claims 1-8.