CN111736423A - Laser direct writing optical proximity effect correction method based on model simulation - Google Patents
Laser direct writing optical proximity effect correction method based on model simulation Download PDFInfo
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- CN111736423A CN111736423A CN202010684834.4A CN202010684834A CN111736423A CN 111736423 A CN111736423 A CN 111736423A CN 202010684834 A CN202010684834 A CN 202010684834A CN 111736423 A CN111736423 A CN 111736423A
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- 238000000034 method Methods 0.000 title claims abstract description 34
- 230000003287 optical effect Effects 0.000 title claims abstract description 20
- 238000004088 simulation Methods 0.000 title claims abstract description 18
- 238000012937 correction Methods 0.000 title claims abstract description 13
- 230000000694 effects Effects 0.000 title claims abstract description 11
- 238000009826 distribution Methods 0.000 claims abstract description 27
- 238000012545 processing Methods 0.000 claims abstract description 13
- 238000010586 diagram Methods 0.000 description 13
- 241001270131 Agaricus moelleri Species 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
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- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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Abstract
The invention discloses a laser direct writing optical proximity effect correction method based on model simulation, which comprises the steps of firstly, carrying out digital processing on an original gds file, simulating by using an established optical model, and then obtaining a corresponding energy distribution map by using an adjacent region energy summation method; and then converting the energy distribution graph into a binary graph by using a threshold value method, performing addition and subtraction of pixels according to specified pixel values according to comparison between energy values at corresponding positions of angle energy decision points and edge energy decision points on the binary graph and an energy threshold value, and converting into a gds file and storing after multiple iterations until requirements are met, so that distortion can be corrected, and the quality of the pattern is improved.
Description
Technical Field
The invention relates to the technical field of mask manufacturing and integrated circuit pattern drawing, in particular to a laser direct writing optical proximity effect correction method based on model simulation.
Background
Laser direct writing is a way of processing gds files into products, and compared with traditional mask lithography, the laser direct writing technology has the advantages of no mask, flexible processing and low requirement on the surface flatness of the substrate. At this stage, laser direct writing is mainly used for processing masks, and also for processing diffractive optical elements. However, since the laser beam applied to laser direct writing is generally a gaussian beam or a modified flat-top beam, the energy distribution characteristics thereof easily cause a series of pattern distortions, such as shortening of line tails, rounding of corners, uneven density of lines, and the like, the modern laser direct writing scheme generally applies the flat-top beam, and the performance of the flat-top beam at the line edges is undoubtedly better, but the pattern distortion problem still exists. These distortions not only affect the quality of the pattern, but also may cause defects when severe.
Disclosure of Invention
The invention aims to provide a laser direct writing optical proximity effect correction method based on model simulation, which can correct distortion and improve the pattern quality.
In order to achieve the above object, the present invention provides a method for correcting laser direct writing optical proximity effect based on model simulation, comprising:
carrying out digital processing and simulation on the original gds file to obtain an energy distribution map;
converting the energy distribution map into a binary map by using a threshold value method;
performing pixel addition and subtraction on the binary image according to the energy judgment point pair energy value on the binary image;
and converting the binary image after the addition and subtraction of the pixels into a gds file.
The method comprises the following steps of performing digital processing and simulation on an original gds file to obtain an energy distribution diagram, wherein the energy distribution diagram comprises the following steps:
after the original gds file is subjected to digital processing, the obtained digital image is simulated by using an optical model, and the obtained laser direct-writing energy distribution of a single light spot is superposed by using an energy summation method according to a set step length to obtain a complete energy distribution map.
Wherein, judging point-to-point energy values according to the energy on the binary image, and performing pixel addition and subtraction on the binary image comprises the following steps:
and obtaining corresponding angle energy determination points and edge energy determination points according to the positions of the specified points on the angles and the edges on the binary image, and comparing the corresponding energy values of the angle energy determination points or the edge energy determination points with an energy threshold.
Wherein, judge the point pair energy value according to the energy on the said binary map, add and subtract the pixel to the said binary map, also include:
if the corresponding energy value of the angle energy determination point or the edge energy determination point is smaller than the energy threshold, adding a specified pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold;
if the corresponding energy value of the angle energy determination point or the edge energy determination point is greater than the energy threshold, reducing the designated pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold.
Converting the binary image after the addition and subtraction of the pixels into a gds file, wherein the converting comprises the following steps:
and converting the corresponding binary image after the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold value into a gds file, and storing the gds file.
The invention relates to a laser direct writing optical proximity effect correction method based on model simulation, which comprises the steps of firstly, carrying out digital processing on an original gds file, simulating by using an established optical model, and then obtaining a corresponding energy distribution map by using an energy summation method; and then converting the energy distribution graph into a binary graph by using a threshold value method, performing addition and subtraction of pixels according to specified pixel values according to comparison between energy values at corresponding positions of angle energy decision points and edge energy decision points on the binary graph and an energy threshold value, and converting into a gds file and storing after multiple iterations until requirements are met, so that distortion can be corrected, and the quality of the pattern is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of steps of a laser direct writing optical proximity correction method based on model simulation according to the present invention.
FIG. 2 is a diagram illustrating the opening of an original gds file according to the present invention.
Fig. 3 is a schematic diagram of a digital image provided by the present invention.
Fig. 4 is a distribution diagram of laser direct writing spots with different step sizes provided by the invention.
FIG. 5 is a schematic illustration of a development profile provided by the present invention.
FIG. 6 is a schematic diagram of the energy decision point provided by the present invention.
FIG. 7 is a schematic diagram of pixel addition provided by the present invention.
Figure 8 is a schematic view of a corner rounding correction scheme provided by the present invention.
FIG. 9 is a schematic diagram of the revised gds file provided by the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
Referring to fig. 1, the present invention provides a method for correcting laser direct write optical proximity effect based on model simulation, comprising:
s101, carrying out digital processing and simulation on the original gds file to obtain an energy distribution map.
Specifically, the original gds file is a vector pattern, which is inconvenient for simulation operation, and is shown in fig. 2 after being opened, so that in the first step, the layout file provided by the design company is digitized to obtain a digital image, as shown in fig. 3, where 0 represents a required image during mask manufacturing, and 1 represents a background. The digital image is simulated by adopting an optical model established based on a flat-top light beam, the laser direct-writing energy distribution of a single light spot can be obtained, then the energy distribution map of the whole layout which is completely overlapped can be obtained by adopting a mode of energy summation of adjacent regions according to a set step length, wherein the energy distribution map can be a gray scale map, the left and right maps of figure 4 respectively show the laser direct-writing light spot distribution under two different step lengths because the influence of factors such as the step length and the like is considered in the laser direct-writing energy simulation, and obviously, the energy distribution also has great difference. The step size is an important parameter that must be introduced in the summation process.
And S102, converting the energy distribution map into a binary map by using a threshold value method.
Specifically, if there is a need to obtain an intuitive development profile, the digitized pattern of the energy distribution can be directly rewritten into a binary pattern through a threshold, as shown in the development profile schematic diagram provided in fig. 5, which facilitates observation of the type and occurrence position of the defect. The binarization principle is as follows:
wherein, E is an energy value (visually represented by a gray value) of each point in the image, τ is a set threshold, and after the formula is applied, only two values, namely 0 and 1, remain in the image, which is binarization.
S103, determining point-to-point energy values according to the energy on the binary image, and performing pixel addition and subtraction on the binary image.
Specifically, energy decision points are searched on the binary image, and energy values at the energy decision points help to determine the increase and decrease of pixels and the termination time of the iteration process. The points in the left diagram (partially cut away) of fig. 6 are an alternative to energy decision points. The energy judging points are divided into angle energy judging points and edge energy judging points, wherein the angle energy judging points are generally selected at the positions of the angular points or the positions close to the angular points, and the edge energy judging points are generally selected at the middle points of all the edges or at other points with defined positions. It is noted that, as shown in the right diagram of FIG. 6, a is the position where the pixel needs to be increased, and b is the position where the pixel needs to be decreased.
Then comparing the corresponding energy value of the angle energy determination point or the edge energy determination point with an energy threshold, if the corresponding energy value of the angle energy determination point or the edge energy determination point is smaller than the energy threshold, adding a specified pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold; if the corresponding energy value of the angle energy determination point or the edge energy determination point is greater than the energy threshold, reducing the designated pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold. As shown in the pixel increase diagram provided in fig. 7, the dotted line represents the original graph, and the solid line represents the graph after passing through the detection edge energy determination point and increasing/decreasing the pixels. The energy threshold point is the point S, the coordinates are (m, n), the energy determination point coordinates are Q, the coordinates are (a, b), and the corresponding increased designated pixel values are respectively: a-k +1, b-k +1, where k is a predetermined constant to avoid collision where vertices meet. The method of energy judgment points is applied to iteration of compensation patterns, the method can ensure the accuracy of results, and errors can be almost ignored. The pattern shapes can be determined according to the difference between the model simulation and the original pattern, and the correction can be performed in a closed annular space by using the method, so that the accurate automatic control of the size of the corner compensation pattern can be realized, the distortion can be corrected, and the pattern quality can be improved.
And S104, converting the binary image after the addition and subtraction of the pixels into a gds file.
Specifically, the corresponding binary image after the corresponding energy value of the angular energy determination point or the edge energy determination point is equal to the energy threshold is converted into a gds file, as shown in fig. 9, and is stored, so that the output file format is consistent with the input file format. The invention can be used not only for model-based optical proximity correction, but also to assist in optimization and to verify whether rules in a rule-based optical proximity correction method are reasonable. The laser direct writing is widely applied to manufacturing of a mask plate and manufacturing of a part of integrated circuits, is a mature method, and aims to help the laser direct writing to obtain a better effect.
The invention relates to a laser direct writing optical proximity effect correction method based on model simulation, which comprises the steps of firstly, carrying out digital processing on an original gds file, simulating by using an established optical model, and then obtaining a corresponding energy distribution map by using an energy summation method; and then converting the energy distribution graph into a binary graph by using a threshold value method, performing addition and subtraction of pixels according to specified pixel values according to comparison between energy values at corresponding positions of angle energy decision points and edge energy decision points on the binary graph and an energy threshold value, and converting into a gds file and storing after multiple iterations until requirements are met, so that distortion can be corrected, and the quality of the pattern is improved.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (5)
1. A laser direct writing optical proximity effect correction method based on model simulation is characterized by comprising the following steps:
carrying out digital processing and simulation on the original gds file to obtain an energy distribution map;
converting the energy distribution map into a binary map by using a threshold value method;
performing pixel addition and subtraction on the binary image according to the energy judgment point pair energy value on the binary image;
and converting the binary image after the addition and subtraction of the pixels into a gds file.
2. The method according to claim 1, wherein the step of digitizing and simulating the original gds file to obtain the energy distribution map comprises:
after the original gds file is subjected to digital processing, the obtained digital image is simulated by using an optical model, and the obtained laser direct-writing energy distribution of a single light spot is superposed by using an energy summation method according to a set step length to obtain a complete energy distribution map.
3. The method of claim 1, wherein determining point-to-energy values from the energy on the binary image, and performing pixel addition and subtraction on the binary image comprises:
and obtaining corresponding angle energy determination points and edge energy determination points according to the positions of the specified points on the angles and the edges on the binary image, and comparing the corresponding energy values of the angle energy determination points or the edge energy determination points with an energy threshold.
4. The method of claim 3, wherein the determining point-to-energy values based on the energy on the binary map, and performing pixel addition and subtraction on the binary map, further comprises:
if the corresponding energy value of the angle energy determination point or the edge energy determination point is smaller than the energy threshold, adding a specified pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold;
if the corresponding energy value of the angle energy determination point or the edge energy determination point is greater than the energy threshold, reducing the designated pixel value at the corresponding angle energy determination point or the edge energy determination point until the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold.
5. The method according to claim 4, wherein converting the binary image after the addition and subtraction of pixels into the gds file comprises:
and converting the corresponding binary image after the corresponding energy value of the angle energy determination point or the edge energy determination point is equal to the energy threshold value into a gds file, and storing the gds file.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112859536A (en) * | 2021-01-11 | 2021-05-28 | 中国科学院微电子研究所 | Optical proximity effect correction method for annular pattern |
| CN113031390A (en) * | 2021-03-15 | 2021-06-25 | 广东省大湾区集成电路与系统应用研究院 | Laser direct writing and simulation method and device thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009259992A (en) * | 2008-04-16 | 2009-11-05 | Dainippon Printing Co Ltd | Generation method of pattern data for electron beam drawing, proximity effect correction method used for the same, and pattern formation method using the data |
| EP2965852A1 (en) * | 2014-07-10 | 2016-01-13 | UAB Altechna R&D | Optical arrangement for laser beam shaping |
| CN107145038A (en) * | 2017-03-14 | 2017-09-08 | 国家纳米科学中心 | A kind of figure carving and writing method based on large area super-resolution laser direct writing system |
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2020
- 2020-07-16 CN CN202010684834.4A patent/CN111736423A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009259992A (en) * | 2008-04-16 | 2009-11-05 | Dainippon Printing Co Ltd | Generation method of pattern data for electron beam drawing, proximity effect correction method used for the same, and pattern formation method using the data |
| EP2965852A1 (en) * | 2014-07-10 | 2016-01-13 | UAB Altechna R&D | Optical arrangement for laser beam shaping |
| CN107145038A (en) * | 2017-03-14 | 2017-09-08 | 国家纳米科学中心 | A kind of figure carving and writing method based on large area super-resolution laser direct writing system |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112859536A (en) * | 2021-01-11 | 2021-05-28 | 中国科学院微电子研究所 | Optical proximity effect correction method for annular pattern |
| CN112859536B (en) * | 2021-01-11 | 2023-08-11 | 中国科学院微电子研究所 | Optical proximity correction method for annular pattern |
| CN113031390A (en) * | 2021-03-15 | 2021-06-25 | 广东省大湾区集成电路与系统应用研究院 | Laser direct writing and simulation method and device thereof |
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Application publication date: 20201002 |