TWI815479B - 用於微影光罩之特徵化的方法與裝置 - Google Patents

用於微影光罩之特徵化的方法與裝置 Download PDF

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Publication number
TWI815479B
TWI815479B TW111119671A TW111119671A TWI815479B TW I815479 B TWI815479 B TW I815479B TW 111119671 A TW111119671 A TW 111119671A TW 111119671 A TW111119671 A TW 111119671A TW I815479 B TWI815479 B TW I815479B
Authority
TW
Taiwan
Prior art keywords
light
beam path
light source
mask
mirror array
Prior art date
Application number
TW111119671A
Other languages
English (en)
Chinese (zh)
Other versions
TW202305495A (zh
Inventor
尤瑞奇 馬泰卡
莎夏 普立茲
馬可斯 帝俊瑟
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 德商卡爾蔡司Ｓｍｔ有限公司 filed Critical 德商卡爾蔡司Ｓｍｔ有限公司
Publication of TW202305495A publication Critical patent/TW202305495A/zh
Application granted granted Critical
Publication of TWI815479B publication Critical patent/TWI815479B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8835—Adjustable illumination, e.g. software adjustable screen
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
TW111119671A 2021-05-27 2022-05-26 用於微影光罩之特徵化的方法與裝置 TWI815479B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021113780.2 2021-05-27
DE102021113780.2A DE102021113780B9 (de) 2021-05-27 2021-05-27 Verfahren zur Charakterisierung einer Maske für die Mikrolithographie

Publications (2)

Publication Number Publication Date
TW202305495A TW202305495A (zh) 2023-02-01
TWI815479B true TWI815479B (zh) 2023-09-11

Family

ID=81941168

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111119671A TWI815479B (zh) 2021-05-27 2022-05-26 用於微影光罩之特徵化的方法與裝置

Country Status (5)

Country Link
US (1) US20240061328A1 (https=)
JP (1) JP2024518810A (https=)
DE (1) DE102021113780B9 (https=)
TW (1) TWI815479B (https=)
WO (1) WO2022248216A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023101902B4 (de) * 2023-01-26 2025-10-23 Carl Zeiss Smt Gmbh Messvorrichtung, Verfahren zum Betreiben einer maskenmetrologischen Messvorrichtung und Computerprogrammprodukt
DE102024111144A1 (de) * 2024-04-22 2025-10-23 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Maskeninspektionsvorrichtung, EUV-Kamera, Maskeninspektionsvorrichtung, Computerprogrammprodukt

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200611081A (en) * 2004-06-08 2006-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TW201107798A (en) * 2009-06-30 2011-03-01 Asml Netherlands Bv Lithographic apparatus and an array of reflective elements
CN103843463A (zh) * 2011-10-07 2014-06-04 Asml荷兰有限公司 辐射源
TW201617743A (zh) * 2014-09-26 2016-05-16 Ａｓｍｌ荷蘭公司 檢測裝置及器件製造方法
TW201702756A (zh) * 2015-05-21 2017-01-16 卡爾蔡司Ｓｍｔ有限公司 微影投射設備的操作方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6738135B1 (en) * 2002-05-20 2004-05-18 James H. Underwood System for inspecting EUV lithography masks
DE102009047180A1 (de) * 2009-11-26 2010-12-16 Carl Zeiss Smt Ag Facettenspiegel, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102010009022B4 (de) * 2010-02-22 2019-10-24 Carl Zeiss Smt Gmbh Beleuchtungssystem sowie Projektionsobjektiv einer Maskeninspektionsanlage
DE102010030435A1 (de) * 2010-06-23 2011-12-29 Carl Zeiss Smt Gmbh Metrologiesystem
DE102010063337B9 (de) 2010-12-17 2020-05-07 Carl Zeiss Ag Verfahren zur Maskeninspektion sowie Verfahren zur Emulation von Abbildungseigenschaften
DE102011086345A1 (de) 2011-11-15 2013-05-16 Carl Zeiss Smt Gmbh Spiegel
DE102012208514A1 (de) * 2012-05-22 2013-11-28 Carl Zeiss Smt Gmbh Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung
DE102012209412A1 (de) * 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102013211269A1 (de) 2013-06-17 2014-04-30 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes
DE102013212613B4 (de) 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
NL2015073A (en) * 2014-07-15 2016-04-12 Asml Netherlands Bv Lithography apparatus and method of manufacturing devices.
US10025079B2 (en) * 2015-09-28 2018-07-17 Kenneth Carlisle Johnson Actinic, spot-scanning microscope for EUV mask inspection and metrology
DE102016212266B4 (de) * 2016-07-05 2018-11-15 Myestro Interactive Gmbh Vorrichtung zur Messung der Distanz mindestens eines Objektes von einer Referenzebene
DE102017115262B9 (de) * 2017-07-07 2021-05-27 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
JP6898557B2 (ja) * 2017-08-01 2021-07-07 株式会社東京精密 レーザー加工装置及び亀裂検出方法
DE102017217867A1 (de) * 2017-10-09 2018-07-26 Carl Zeiss Smt Gmbh EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage
US11968772B2 (en) * 2019-05-30 2024-04-23 Kla Corporation Optical etendue matching methods for extreme ultraviolet metrology

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200611081A (en) * 2004-06-08 2006-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TW201107798A (en) * 2009-06-30 2011-03-01 Asml Netherlands Bv Lithographic apparatus and an array of reflective elements
CN103843463A (zh) * 2011-10-07 2014-06-04 Asml荷兰有限公司 辐射源
TW201617743A (zh) * 2014-09-26 2016-05-16 Ａｓｍｌ荷蘭公司 檢測裝置及器件製造方法
TW201702756A (zh) * 2015-05-21 2017-01-16 卡爾蔡司Ｓｍｔ有限公司 微影投射設備的操作方法

Also Published As

Publication number Publication date
US20240061328A1 (en) 2024-02-22
WO2022248216A1 (en) 2022-12-01
JP2024518810A (ja) 2024-05-02
DE102021113780B4 (de) 2024-05-23
DE102021113780A1 (de) 2022-12-01
TW202305495A (zh) 2023-02-01
DE102021113780B9 (de) 2024-08-01

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