JP2024518810A - マイクロリソグラフィのマスクの特性評価方法および装置 - Google Patents

マイクロリソグラフィのマスクの特性評価方法および装置 Download PDF

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Publication number
JP2024518810A
JP2024518810A JP2023573235A JP2023573235A JP2024518810A JP 2024518810 A JP2024518810 A JP 2024518810A JP 2023573235 A JP2023573235 A JP 2023573235A JP 2023573235 A JP2023573235 A JP 2023573235A JP 2024518810 A JP2024518810 A JP 2024518810A
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Japan
Prior art keywords
light
mask
beam path
light source
outcoupled
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Pending
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JP2023573235A
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Japanese (ja)
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JP2024518810A5 (https=
Inventor
ウルリヒ マテイカ
ザシャ ペルリッツ
マルクス デギュンター
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2024518810A publication Critical patent/JP2024518810A/ja
Publication of JP2024518810A5 publication Critical patent/JP2024518810A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8835—Adjustable illumination, e.g. software adjustable screen
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP2023573235A 2021-05-27 2022-05-10 マイクロリソグラフィのマスクの特性評価方法および装置 Pending JP2024518810A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021113780.2 2021-05-27
DE102021113780.2A DE102021113780B9 (de) 2021-05-27 2021-05-27 Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
PCT/EP2022/062684 WO2022248216A1 (en) 2021-05-27 2022-05-10 Method and apparatus for characterization of a microlithography mask

Publications (2)

Publication Number Publication Date
JP2024518810A true JP2024518810A (ja) 2024-05-02
JP2024518810A5 JP2024518810A5 (https=) 2025-05-21

Family

ID=81941168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023573235A Pending JP2024518810A (ja) 2021-05-27 2022-05-10 マイクロリソグラフィのマスクの特性評価方法および装置

Country Status (5)

Country Link
US (1) US20240061328A1 (https=)
JP (1) JP2024518810A (https=)
DE (1) DE102021113780B9 (https=)
TW (1) TWI815479B (https=)
WO (1) WO2022248216A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023101902B4 (de) * 2023-01-26 2025-10-23 Carl Zeiss Smt Gmbh Messvorrichtung, Verfahren zum Betreiben einer maskenmetrologischen Messvorrichtung und Computerprogrammprodukt
DE102024111144A1 (de) * 2024-04-22 2025-10-23 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Maskeninspektionsvorrichtung, EUV-Kamera, Maskeninspektionsvorrichtung, Computerprogrammprodukt

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009047180A1 (de) * 2009-11-26 2010-12-16 Carl Zeiss Smt Ag Facettenspiegel, Beleuchtungssystem und Projektionsbelichtungsanlage
WO2011161024A1 (en) * 2010-06-23 2011-12-29 Carl Zeiss Smt Gmbh Metrology system
DE102012208514A1 (de) * 2012-05-22 2013-11-28 Carl Zeiss Smt Gmbh Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung
DE102012209412A1 (de) * 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102016212266A1 (de) * 2016-07-05 2018-01-11 Myestro Interactive Gmbh Vorrichtung zur Messung der Distanz mindestens eines Objektes von einer Referenzebene
DE102017217867A1 (de) * 2017-10-09 2018-07-26 Carl Zeiss Smt Gmbh EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage
JP2019027974A (ja) * 2017-08-01 2019-02-21 株式会社東京精密 レーザー加工装置及び亀裂検出方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6738135B1 (en) * 2002-05-20 2004-05-18 James H. Underwood System for inspecting EUV lithography masks
US7123348B2 (en) * 2004-06-08 2006-10-17 Asml Netherlands B.V Lithographic apparatus and method utilizing dose control
KR101658494B1 (ko) * 2009-06-30 2016-09-21 에이에스엠엘 네델란즈 비.브이. 반사성 요소의 어레이의 회전을 위한 마운팅 및 이를 포함하는 리소그래피 장치
DE102010009022B4 (de) * 2010-02-22 2019-10-24 Carl Zeiss Smt Gmbh Beleuchtungssystem sowie Projektionsobjektiv einer Maskeninspektionsanlage
DE102010063337B9 (de) 2010-12-17 2020-05-07 Carl Zeiss Ag Verfahren zur Maskeninspektion sowie Verfahren zur Emulation von Abbildungseigenschaften
NL2009426A (en) * 2011-10-07 2013-04-09 Asml Netherlands Bv Radiation source.
DE102011086345A1 (de) 2011-11-15 2013-05-16 Carl Zeiss Smt Gmbh Spiegel
DE102013211269A1 (de) 2013-06-17 2014-04-30 Carl Zeiss Smt Gmbh Beleuchtungsoptik zur Beleuchtung eines in einem Objektfeld anordenbaren, strukturierten Objektes sowie Metrologiesystem für die Untersuchung eines strukturierten Objektes
DE102013212613B4 (de) 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
NL2015073A (en) * 2014-07-15 2016-04-12 Asml Netherlands Bv Lithography apparatus and method of manufacturing devices.
WO2016045945A1 (en) * 2014-09-26 2016-03-31 Asml Netherlands B.V. Inspection apparatus and device manufacturing method
KR20180010242A (ko) * 2015-05-21 2018-01-30 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 투영 장치의 작동 방법
US10025079B2 (en) * 2015-09-28 2018-07-17 Kenneth Carlisle Johnson Actinic, spot-scanning microscope for EUV mask inspection and metrology
DE102017115262B9 (de) * 2017-07-07 2021-05-27 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
US11968772B2 (en) * 2019-05-30 2024-04-23 Kla Corporation Optical etendue matching methods for extreme ultraviolet metrology

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009047180A1 (de) * 2009-11-26 2010-12-16 Carl Zeiss Smt Ag Facettenspiegel, Beleuchtungssystem und Projektionsbelichtungsanlage
WO2011161024A1 (en) * 2010-06-23 2011-12-29 Carl Zeiss Smt Gmbh Metrology system
DE102012208514A1 (de) * 2012-05-22 2013-11-28 Carl Zeiss Smt Gmbh Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung
DE102012209412A1 (de) * 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102016212266A1 (de) * 2016-07-05 2018-01-11 Myestro Interactive Gmbh Vorrichtung zur Messung der Distanz mindestens eines Objektes von einer Referenzebene
JP2019027974A (ja) * 2017-08-01 2019-02-21 株式会社東京精密 レーザー加工装置及び亀裂検出方法
DE102017217867A1 (de) * 2017-10-09 2018-07-26 Carl Zeiss Smt Gmbh EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
US20240061328A1 (en) 2024-02-22
TWI815479B (zh) 2023-09-11
WO2022248216A1 (en) 2022-12-01
DE102021113780B4 (de) 2024-05-23
DE102021113780A1 (de) 2022-12-01
TW202305495A (zh) 2023-02-01
DE102021113780B9 (de) 2024-08-01

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