TWI812074B - 封裝基板及其製法 - Google Patents
封裝基板及其製法 Download PDFInfo
- Publication number
- TWI812074B TWI812074B TW111109619A TW111109619A TWI812074B TW I812074 B TWI812074 B TW I812074B TW 111109619 A TW111109619 A TW 111109619A TW 111109619 A TW111109619 A TW 111109619A TW I812074 B TWI812074 B TW I812074B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- insulating layer
- packaging substrate
- wiring layer
- manufacturing
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000004806 packaging method and process Methods 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 238000005553 drilling Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 125
- 239000007769 metal material Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 7
- 239000012792 core layer Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002335 surface treatment layer Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68345—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Geometry (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Packages (AREA)
Abstract
一種封裝基板,其製法係將絕緣層包覆線路層及該線路層上之導電柱,再於該絕緣層對應該導電柱之處形成凹槽,以於該凹槽中形成佈線層,故無需鑽孔製作盲孔,因而能避免習知線路及導電盲孔之對位問題。
Description
本發明係有關一種半導體封裝技術,尤指一種具嵌埋型線路(Embedded Trace)之封裝基板及其製法。
隨著電子產業的蓬勃發展,電子產品在型態上趨於輕薄短小,在功能上則朝高性能、高功能、高速化的研發方向。因此,為滿足半導體裝置之高積集度(Integration)及微型化(Miniaturization)需求,故於封裝製程中,常常採用具有高密度及細間距之線路的封裝基板。
如圖1所示,習知封裝基板1係包含一具有複數導電柱100之核心層10、分別設於該核心層10相對兩側之複數介電層11、及設於各該介電層11上之線路層12,以藉由該複數導電柱100電性導通位於該核心層10相對兩側之該些線路層12,其中,該線路層12係藉由導電盲孔120電性連接該導電柱100。
惟,習知封裝基板1中,該導電盲孔120之製作係先於該介電層11上以雷射、機鑽等方式形成孔洞,再於該些孔洞中填入導電材,故於形成該孔洞之過程中,往往因工作誤差而偏位,導致該孔洞無法形成於預定之處,使得該導
電盲孔120無法有效連接該導電柱100與線路層12,造成該封裝基板1之電性連接不佳之問題。
因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。
鑑於上述習知技術之缺失,本發明係提供一種封裝基板,係包括:絕緣層,係於其中一側形成有凹槽;線路層,係嵌埋於該絕緣層之另一側;導電柱,係嵌埋於該絕緣層中以連接該線路層;以及佈線層,係形成於該凹槽中以連接該導電柱。
本發明亦提供一種封裝基板之製法,係包括:於承載件上依序形成線路層及至少一導電柱;於該承載件上形成絕緣層,以令該絕緣層包覆該線路層及該導電柱;於該絕緣層上形成具有複數鏤空區之止擋層,以令該絕緣層之部分表面外露於該鏤空區;於該絕緣層對應該鏤空區之表面上形成凹槽,以令各該導電柱對應外露於各該凹槽;移除該止擋層;以及於該凹槽中形成佈線層。
前述之製法中,該止擋層係為金屬層。
前述之製法中,復包括於該佈線層上進行增層作業。
前述之封裝基板及其製法中,復包括於該凹槽中形成該佈線層時,一併於該絕緣層上形成遮蓋該佈線層之對位部。例如,該對位部與該佈線層係為一體成形。
前述之封裝基板及其製法中,該佈線層係齊平該絕緣層之表面。
由上可知,本發明之封裝基板及其製法中,主要藉由該絕緣層對應該導電柱之處形成有凹槽,以於該凹槽中形成佈線層,故相較於習知技術,本發明無需鑽孔製作盲孔,因而能避免習知線路及導電盲孔之對位問題。
1,2,2a,3:封裝基板
10:核心層
100,22:導電柱
11:介電層
12,21:線路層
120:導電盲孔
20:承載件
23,33:絕緣層
230,330:凹槽
24:止擋層
240:鏤空區
25,35:佈線層
25a:金屬材
25b:晶種層
250:盲孔部
251:線路
26:對位部
27:光阻
38:絕緣保護層
380:開孔
39:墊部
390:表面處理層
圖1係為習知封裝基板之剖面示意圖。
圖2A至圖2I係為本發明之封裝基板之製法之剖視示意圖。
圖2J係為圖2I之另一製法之剖視示意圖。
圖2K係為圖2I之局部放大上視示意圖。
圖3A至圖3B係為圖2I之後續製程之剖視示意圖。
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「下」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。
圖2A至圖2I係為本發明之封裝基板2之製法之剖視示意圖。於本實施例中,該封裝基板2係為具有核心層(core)或無核心層(coreless)之態樣。
如圖2A所示,於承載件20上依序形成線路層21及至少一導電柱22。
於本實施例中,該承載件20上係為如暫時性載板之耗材,且可藉由電鍍銅材之方式形成該線路層21及該導電柱22。例如,先形成該線路層21於該承載件20上,再形成圖案化光阻(圖略)於該承載件20與該線路層21上,以令局部該線路層21外露於該圖案化光阻,之後於該線路層21之外露表面上形成該導電柱22,最後移除該圖案化光阻。
如圖2B所示,於該承載件20上形成絕緣層23,以令該絕緣層23包覆該線路層21及該導電柱22。
於本實施例中,形成該絕緣層23之材質係為如味之素增層膜(Ajinomoto Build-up Film,簡稱ABF)或其它合適之介電材。例如,該絕緣層23以壓合方式形成於該承載件20上。
如圖2C所示,於該絕緣層23上形成具有複數鏤空區240之止擋層24,以令該絕緣層23之部分表面外露於該鏤空區240。
於本實施例中,形成該止擋層24之材質係為如銅材或其它合適之金屬材。例如,先以濺鍍方式形成銅材於該絕緣層23之全部頂面上,再於該銅材上形成圖案化光阻(圖略),並進行曝光顯影作業,以令局部銅材外露於該圖案化光阻,之後蝕刻移除該外露於該圖案化光阻之銅材,以形成該鏤空區240,最後剝除(striping)該圖案化光阻,使保留下之銅材作為該止擋層24。
如圖2D所示,於該絕緣層23對應該鏤空區240之表面上形成凹槽230,以令各該導電柱22對應外露於部分該凹槽230。
於本實施例中,係以電漿(Plasma)或化學蝕刻方式移除該絕緣層23之部分材質以形成該凹槽230。
如圖2E所示,以蝕刻方式移除該止擋層24,以外露該絕緣層23,再針對該絕緣層23與該凹槽230之表面進行除殘膠(Desmear)作業。
如圖2F至圖2G所示,於該絕緣層23上形成金屬材25a,且該金屬材25a填入該凹槽230中以接觸該導電柱22。
於本實施例中,可先於該絕緣層23之表面及該凹槽230之表面上形成一如銅材之晶種層25b,如圖2F所示,再藉由該晶種層25b以電鍍銅材之方式形成該金屬材25a,如圖2G所示。
如圖2H所示,移除該絕緣層23之表面上之至少部分該金屬材25a及其下之晶種層25b,而保留該凹槽230中之金屬材25a及該晶種層25b,供作為佈線層25。
於本實施例中,於該凹槽230中形成該佈線層25時,可保留該絕緣層23之表面上之至少部分該金屬材25a及其下之晶種層25b,以一併於該絕緣層23上形成遮蓋該佈線層25之對位部26。例如,先形成一圖案化光阻27於該金屬材25a之部分表面上,再移除該光阻27周圍之金屬材25a及其下之晶種層25b,使該光阻27下之金屬材25a及晶種層25b形成如環體之對位部26,故該對位部26與該佈線層25係為一體成形。
再者,該佈線層25係齊平該絕緣層23之表面。
如圖2I所示,移除該光阻27,以外露該對位部26。於後續製程中,可移除該承載件20,使該線路層21外露且齊平該絕緣層23之表面,如圖2J所示。
於本實施例中,若該佈線層25為最外層之線路配置,則可省略該對位部26之製作,可在如圖2G所示形成該金屬材25a後,移除該絕緣層23之表面上之該金屬材25a,而得到如圖2J所示之封裝基板2a。
因此,本發明之製法係藉由該導電柱22將線路結構墊高,再以電漿或化學蝕刻方式於該絕緣層23上形成凹槽230及內埋式線路(即該佈線層25),故可免除傳統雷射鑽孔製程。
再者,本發明之製法係先藉由止擋層24形成凹槽230,使該佈線層25能嵌埋於該絕緣層23中,以利於細間距/細線路之設計。
又,該佈線層25之線路251及盲孔部250(其連接該導電柱22)係形成於同一層,如圖2K所示,因而能避免該線路251及該盲孔部250之位置公差問題,故可設計無墊部(design landless)規格(如圖2J所示,該盲孔部250之寬度小於該導電柱22之寬度),以提升佈線密度。
另外,於其它實施例中,接續圖2I所示之製程,係重複圖2B至圖2I之製程進行增層作業,以形成複數層數之佈線層35,如圖3A所示,且於最外層之絕緣層33上可形成具有複數開孔380之絕緣保護層38,如圖3B所示之封裝基板3。例如,於最外層之佈線層35上可將原本預計形成該對位部之金屬材設計成複數外露於該些開孔380之墊部39,供作為接點。進一步,可於該開孔380中之墊部39上形成表面處理層390。
因此,本發明之製法藉由該對位部26之設計,以於進行該增層作業之過程中,可準確將該絕緣層33之凹槽330形成於預定之處,因而能避免工作誤差所致之偏位問題。
再者,可在該增層作業之任一層製作內埋式線路(即該佈線層35),故可提升該佈線層35之附著性,以避免製程中刮傷及提升信賴性。
應可理解地,本發明可依該增層作業之需求形成該對位部26,並無特別限制。
本發明提供一種封裝基板2,2a,3,係包括:具有相對兩側之絕緣層23、一嵌埋於該絕緣層23中之線路層21、至少一嵌埋於該絕緣層23中之導電柱22、以及至少一嵌埋於該絕緣層23中之佈線層25。
所述之絕緣層23係於其中一側形成有凹槽230。
所述之線路層21係嵌埋於該絕緣層23之另一側。
所述之導電柱22係嵌埋於該絕緣層23中以連接該線路層21。
所述之佈線層25係形成於該凹槽230中以連接該導電柱22。
於一實施例中,該封裝基板2,3復包括至少一設於該絕緣層23上之對位部26,其遮蓋該佈線層25。例如,該對位部26與該佈線層25係為一體。
於一實施例中,該佈線層25係齊平該絕緣層23之表面。
綜上所述,本發明之封裝基板及其製法,係藉由凹槽之設計,使該佈線層能嵌埋於該絕緣層中,因而可免除習知鑽孔製程,故本發明不僅利於細間距/細線路之設計,且能避免習知線路及導電盲孔之對位問題。
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。
2a:封裝基板
21:線路層
22:導電柱
23:絕緣層
230:凹槽
25:佈線層
250:盲孔部
251:線路
Claims (10)
- 一種封裝基板,係包括:絕緣層,係於其中一側形成有凹槽;線路層,係嵌埋於該絕緣層之另一側;至少一導電柱,係嵌埋於該絕緣層中以連接該線路層;以及佈線層,係形成於該凹槽中以連接該導電柱,其中,該佈線層之寬度係小於該導電柱之寬度。
- 如請求項1所述之封裝基板,復包括設於該絕緣層上之對位部,其遮蓋該佈線層。
- 如請求項2所述之封裝基板,其中,該對位部與該佈線層係為一體。
- 如請求項1所述之封裝基板,其中,該佈線層係齊平該絕緣層之表面。
- 一種封裝基板之製法,係包括:於承載件上依序形成線路層及至少一導電柱;於該承載件上形成絕緣層,以令該絕緣層包覆該線路層及該導電柱;於該絕緣層上形成具有複數鏤空區之止擋層,以令該絕緣層之部分表面外露於該鏤空區;於該絕緣層對應該鏤空區之表面上形成凹槽,以令各該導電柱對應外露於各該凹槽;移除該止擋層;以及於該凹槽中形成佈線層,其中,該佈線層之寬度係小於該導電柱之寬度。
- 如請求項5所述之封裝基板之製法,其中,該止擋層係為金屬層。
- 如請求項5所述之封裝基板之製法,復包括於該凹槽中形成該佈線層時,一併於該絕緣層上形成遮蓋該佈線層之對位部。
- 如請求項7所述之封裝基板之製法,其中,該對位部與該佈線層係為一體成形。
- 如請求項5所述之封裝基板之製法,其中,該佈線層係齊平該絕緣層之表面。
- 如請求項5所述之封裝基板之製法,復包括於該佈線層上進行增層作業。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111109619A TWI812074B (zh) | 2022-03-16 | 2022-03-16 | 封裝基板及其製法 |
CN202210344607.6A CN116798980A (zh) | 2022-03-16 | 2022-03-31 | 封装基板及其制法 |
US18/180,502 US20230298986A1 (en) | 2022-03-16 | 2023-03-08 | Package substrate and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111109619A TWI812074B (zh) | 2022-03-16 | 2022-03-16 | 封裝基板及其製法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI812074B true TWI812074B (zh) | 2023-08-11 |
TW202339556A TW202339556A (zh) | 2023-10-01 |
Family
ID=88048550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111109619A TWI812074B (zh) | 2022-03-16 | 2022-03-16 | 封裝基板及其製法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20230298986A1 (zh) |
CN (1) | CN116798980A (zh) |
TW (1) | TWI812074B (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201108901A (en) * | 2009-08-25 | 2011-03-01 | Unimicron Technology Corp | Embedded wiring board and method for fabricating the same |
US20130192881A1 (en) * | 2010-07-08 | 2013-08-01 | Lg Innotek Co., Ltd. | Printed circuit board and the method for manufacturing the same |
US20190373720A1 (en) * | 2017-02-01 | 2019-12-05 | Institut Vedecom | Electronic card with printed circuit comprising an integrated diffraction structure and method for the production thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI242854B (en) * | 2004-10-12 | 2005-11-01 | Phoenix Prec Technology Corp | Method for fabricating semiconductor package structure |
CN102123566B (zh) * | 2010-01-12 | 2013-07-31 | 欣兴电子股份有限公司 | 内埋式线路板及其制造方法 |
TWI417014B (zh) * | 2011-03-23 | 2013-11-21 | Unimicron Technology Corp | 線路板的內埋式線路結構的製造方法 |
TWI499023B (zh) * | 2012-10-11 | 2015-09-01 | Ind Tech Res Inst | 封裝基板及其製法 |
TWI558288B (zh) * | 2014-09-10 | 2016-11-11 | 恆勁科技股份有限公司 | 中介基板及其製法 |
CN113130411A (zh) * | 2019-12-30 | 2021-07-16 | 盛合晶微半导体(江阴)有限公司 | 半导体芯片封装结构及其制备方法 |
CN211088246U (zh) * | 2019-12-30 | 2020-07-24 | 中芯长电半导体(江阴)有限公司 | 半导体芯片封装结构 |
-
2022
- 2022-03-16 TW TW111109619A patent/TWI812074B/zh active
- 2022-03-31 CN CN202210344607.6A patent/CN116798980A/zh active Pending
-
2023
- 2023-03-08 US US18/180,502 patent/US20230298986A1/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201108901A (en) * | 2009-08-25 | 2011-03-01 | Unimicron Technology Corp | Embedded wiring board and method for fabricating the same |
US20130192881A1 (en) * | 2010-07-08 | 2013-08-01 | Lg Innotek Co., Ltd. | Printed circuit board and the method for manufacturing the same |
US20190373720A1 (en) * | 2017-02-01 | 2019-12-05 | Institut Vedecom | Electronic card with printed circuit comprising an integrated diffraction structure and method for the production thereof |
Also Published As
Publication number | Publication date |
---|---|
US20230298986A1 (en) | 2023-09-21 |
CN116798980A (zh) | 2023-09-22 |
TW202339556A (zh) | 2023-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8119516B2 (en) | Bump structure formed from using removable mandrel | |
KR101015704B1 (ko) | 칩 내장 인쇄회로기판 및 그 제조방법 | |
US20110042128A1 (en) | Coreless packaging substrate and method for fabricating the same | |
KR100990588B1 (ko) | 랜드리스 비아를 갖는 인쇄회로기판 및 그 제조방법 | |
TW201444426A (zh) | 承載基板及其製作方法 | |
JP2010103435A (ja) | 配線基板及びその製造方法 | |
US8756804B2 (en) | Method of manufacturing printed circuit board | |
JP5407470B2 (ja) | 多層回路基板の製造方法 | |
TWI812074B (zh) | 封裝基板及其製法 | |
JP2007214568A (ja) | 回路基板構造 | |
JP5176643B2 (ja) | 多層回路基板の製造方法 | |
KR20040023773A (ko) | 도체 배선 패턴의 형성 방법 | |
CN104105340A (zh) | 一种封装基板导通孔结构及制作方法 | |
TWI758756B (zh) | 封裝載板及其製作方法 | |
TW202310693A (zh) | 電路板及其製造方法 | |
KR101501902B1 (ko) | 금속 포스트를 구비한 인쇄회로기판 및 이의 제조 방법 | |
TWI809666B (zh) | 封裝基板及其製法 | |
TW201831067A (zh) | 線路板的製作方法 | |
TW201831066A (zh) | 線路板結構 | |
TW202029447A (zh) | 封裝基板及其製法 | |
TWI794034B (zh) | 基板結構 | |
JP7428837B2 (ja) | パッケージ基板を製造するための載置板、パッケージ基板構造及びその製造方法 | |
US11637060B2 (en) | Wiring board and method of manufacturing the same | |
TWI851135B (zh) | 承載結構之製法 | |
TWI802973B (zh) | 基板結構 |