TWI800360B - 空白遮罩、使用其的光罩以及空白遮罩的製備方法 - Google Patents

空白遮罩、使用其的光罩以及空白遮罩的製備方法 Download PDF

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Publication number
TWI800360B
TWI800360B TW111115732A TW111115732A TWI800360B TW I800360 B TWI800360 B TW I800360B TW 111115732 A TW111115732 A TW 111115732A TW 111115732 A TW111115732 A TW 111115732A TW I800360 B TWI800360 B TW I800360B
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TW
Taiwan
Prior art keywords
blank mask
photomask
same
preparing method
blank
Prior art date
Application number
TW111115732A
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English (en)
Other versions
TW202242539A (zh
Inventor
李乾坤
曺河鉉
申仁均
金星潤
崔石榮
李亨周
金修衒
孫晟熏
鄭珉交
金泰完
Original Assignee
南韓商Ｓｋｃ索米克斯股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 南韓商Ｓｋｃ索米克斯股份有限公司 filed Critical 南韓商Ｓｋｃ索米克斯股份有限公司
Publication of TW202242539A publication Critical patent/TW202242539A/zh
Application granted granted Critical
Publication of TWI800360B publication Critical patent/TWI800360B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
TW111115732A 2021-04-29 2022-04-26 空白遮罩、使用其的光罩以及空白遮罩的製備方法 TWI800360B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2021-0055698 2021-04-29
KR1020210055698A KR102444967B1 (ko) 2021-04-29 2021-04-29 블랭크 마스크 및 이를 이용한 포토마스크

Publications (2)

Publication Number Publication Date
TW202242539A TW202242539A (zh) 2022-11-01
TWI800360B true TWI800360B (zh) 2023-04-21

Family

ID=83445173

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111115732A TWI800360B (zh) 2021-04-29 2022-04-26 空白遮罩、使用其的光罩以及空白遮罩的製備方法

Country Status (6)

Country Link
US (1) US20220357647A1 (zh)
JP (2) JP7428741B2 (zh)
KR (1) KR102444967B1 (zh)
CN (1) CN115268209A (zh)
DE (1) DE102022110190A1 (zh)
TW (1) TWI800360B (zh)

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TW201617174A (zh) * 2014-08-07 2016-05-16 旭硝子股份有限公司 光罩基底用玻璃基板及其製造方法
JP2017151427A (ja) * 2016-02-24 2017-08-31 旭硝子株式会社 反射型マスクブランクおよび反射型マスクブランクの製造方法
JP2020074053A (ja) * 2015-02-16 2020-05-14 大日本印刷株式会社 フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法
TW202036153A (zh) * 2019-02-13 2020-10-01 日商Ｈｏｙａ股份有限公司 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法

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JP2005208282A (ja) * 2004-01-22 2005-08-04 Hoya Corp ハーフトーン型位相シフトマスクブランクの製造方法、及びハーフトーン型位相シフトマスクの製造方法
JP4930964B2 (ja) * 2005-05-20 2012-05-16 Ｈｏｙａ株式会社 位相シフトマスクブランクの製造方法及び位相シフトマスクの製造方法
DE602006021102D1 (de) * 2005-07-21 2011-05-19 Shinetsu Chemical Co Photomaskenrohling, Photomaske und deren Herstellungsverfahren
WO2007062111A1 (en) * 2005-11-23 2007-05-31 Fsi International, Inc. Process for removing material from substrates
JP5412107B2 (ja) * 2006-02-28 2014-02-12 Ｈｏｙａ株式会社 フォトマスクブランクの製造方法、及びフォトマスクの製造方法
KR101485754B1 (ko) * 2008-09-26 2015-01-26 주식회사 에스앤에스텍 극자외선용 블랭크 마스크 및 이를 이용하여 제조되는 포토마스크
KR101593390B1 (ko) 2009-04-22 2016-02-12 (주) 에스앤에스텍 블랭크 마스크와 포토마스크 및 그의 제조방법
WO2010147172A1 (ja) * 2009-06-18 2010-12-23 Hoya株式会社 マスクブランク及び転写用マスク、並びに転写用マスクの製造方法
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US9618836B2 (en) * 2014-04-22 2017-04-11 Asahi Glass Company, Limited Reflective mask blank for EUV lithography, substrate with funtion film for the mask blank, and methods for their production
JP2016057578A (ja) 2014-09-12 2016-04-21 信越化学工業株式会社 フォトマスクブランク
TWI681940B (zh) * 2016-06-03 2020-01-11 日商闊斯泰股份有限公司 二氧化矽玻璃構件及其製造方法
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JP7469228B2 (ja) 2018-09-11 2024-04-16 パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカ 三次元データ符号化方法、三次元データ復号方法、三次元データ符号化装置、及び三次元データ復号装置
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KR102392332B1 (ko) * 2021-06-08 2022-04-28 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102465982B1 (ko) * 2021-07-13 2022-11-09 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102435818B1 (ko) * 2021-09-03 2022-08-23 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102503790B1 (ko) * 2021-10-07 2023-02-23 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102535171B1 (ko) * 2021-11-04 2023-05-26 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20230090601A (ko) * 2021-12-15 2023-06-22 에스케이엔펄스 주식회사 블랭크 마스크, 블랭크 마스크 성막장치 및 블랭크 마스크의 제조방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102187275A (zh) * 2008-11-26 2011-09-14 Hoya株式会社 掩模板用基板
KR20140070660A (ko) * 2012-03-23 2014-06-10 호야 가부시키가이샤 마스크 블랭크, 전사용 마스크 및 이들의 제조 방법
TW201617174A (zh) * 2014-08-07 2016-05-16 旭硝子股份有限公司 光罩基底用玻璃基板及其製造方法
JP2020074053A (ja) * 2015-02-16 2020-05-14 大日本印刷株式会社 フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法
JP2017151427A (ja) * 2016-02-24 2017-08-31 旭硝子株式会社 反射型マスクブランクおよび反射型マスクブランクの製造方法
TW202036153A (zh) * 2019-02-13 2020-10-01 日商Ｈｏｙａ股份有限公司 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法

Also Published As

Publication number Publication date
TW202242539A (zh) 2022-11-01
DE102022110190A1 (de) 2022-11-03
JP7428741B2 (ja) 2024-02-06
US20220357647A1 (en) 2022-11-10
JP2022171559A (ja) 2022-11-11
KR102444967B1 (ko) 2022-09-16
JP2024028967A (ja) 2024-03-05
CN115268209A (zh) 2022-11-01

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