TWI800360B - 空白遮罩、使用其的光罩以及空白遮罩的製備方法 - Google Patents

空白遮罩、使用其的光罩以及空白遮罩的製備方法 Download PDF

Info

Publication number
TWI800360B
TWI800360B TW111115732A TW111115732A TWI800360B TW I800360 B TWI800360 B TW I800360B TW 111115732 A TW111115732 A TW 111115732A TW 111115732 A TW111115732 A TW 111115732A TW I800360 B TWI800360 B TW I800360B
Authority
TW
Taiwan
Prior art keywords
blank mask
photomask
same
preparing method
blank
Prior art date
Application number
TW111115732A
Other languages
English (en)
Other versions
TW202242539A (zh
Inventor
李乾坤
曺河鉉
申仁均
金星潤
崔石榮
李亨周
金修衒
孫晟熏
鄭珉交
金泰完
Original Assignee
南韓商Ｓｋｃ索米克斯股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商Ｓｋｃ索米克斯股份有限公司 filed Critical 南韓商Ｓｋｃ索米克斯股份有限公司
Publication of TW202242539A publication Critical patent/TW202242539A/zh
Application granted granted Critical
Publication of TWI800360B publication Critical patent/TWI800360B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
TW111115732A 2021-04-29 2022-04-26 空白遮罩、使用其的光罩以及空白遮罩的製備方法 TWI800360B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020210055698A KR102444967B1 (ko) 2021-04-29 2021-04-29 블랭크 마스크 및 이를 이용한 포토마스크
KR10-2021-0055698 2021-04-29

Publications (2)

Publication Number Publication Date
TW202242539A TW202242539A (zh) 2022-11-01
TWI800360B true TWI800360B (zh) 2023-04-21

Family

ID=83445173

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111115732A TWI800360B (zh) 2021-04-29 2022-04-26 空白遮罩、使用其的光罩以及空白遮罩的製備方法

Country Status (6)

Country Link
US (1) US20220357647A1 (zh)
JP (2) JP7428741B2 (zh)
KR (1) KR102444967B1 (zh)
CN (1) CN115268209A (zh)
DE (1) DE102022110190A1 (zh)
TW (1) TWI800360B (zh)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102187275A (zh) * 2008-11-26 2011-09-14 Hoya株式会社 掩模板用基板
KR20140070660A (ko) * 2012-03-23 2014-06-10 호야 가부시키가이샤 마스크 블랭크, 전사용 마스크 및 이들의 제조 방법
TW201617174A (zh) * 2014-08-07 2016-05-16 旭硝子股份有限公司 光罩基底用玻璃基板及其製造方法
JP2017151427A (ja) * 2016-02-24 2017-08-31 旭硝子株式会社 反射型マスクブランクおよび反射型マスクブランクの製造方法
JP2020074053A (ja) * 2015-02-16 2020-05-14 大日本印刷株式会社 フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法
TW202036153A (zh) * 2019-02-13 2020-10-01 日商Ｈｏｙａ股份有限公司 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08286359A (ja) * 1995-04-18 1996-11-01 Toppan Printing Co Ltd フォトマスクブランクおよびフォトマスク
JP2005208282A (ja) * 2004-01-22 2005-08-04 Hoya Corp ハーフトーン型位相シフトマスクブランクの製造方法、及びハーフトーン型位相シフトマスクの製造方法
JP4930964B2 (ja) * 2005-05-20 2012-05-16 Ｈｏｙａ株式会社 位相シフトマスクブランクの製造方法及び位相シフトマスクの製造方法
EP1746460B1 (en) * 2005-07-21 2011-04-06 Shin-Etsu Chemical Co., Ltd. Photomask blank, photomask and fabrication method thereof
KR20090130197A (ko) * 2005-11-23 2009-12-18 에프 에스 아이 인터내셔날,인코포레이티드 기판으로부터의 물질 제거 공정
KR101248740B1 (ko) * 2006-02-28 2013-03-28 호야 가부시키가이샤 포토마스크 블랭크 및 포토마스크와 그들의 제조 방법
KR101485754B1 (ko) * 2008-09-26 2015-01-26 주식회사 에스앤에스텍 극자외선용 블랭크 마스크 및 이를 이용하여 제조되는 포토마스크
KR101593390B1 (ko) 2009-04-22 2016-02-12 (주) 에스앤에스텍 블랭크 마스크와 포토마스크 및 그의 제조방법
KR101699995B1 (ko) * 2009-06-18 2017-01-26 호야 가부시키가이샤 마스크 블랭크 및 전사용 마스크와 전사용 마스크의 제조 방법
KR20130051864A (ko) * 2011-11-10 2013-05-21 주식회사 에스앤에스텍 블랭크 마스크 및 그의 제조방법
US9618836B2 (en) * 2014-04-22 2017-04-11 Asahi Glass Company, Limited Reflective mask blank for EUV lithography, substrate with funtion film for the mask blank, and methods for their production
JP2016057578A (ja) 2014-09-12 2016-04-21 信越化学工業株式会社 フォトマスクブランク
TWI681940B (zh) * 2016-06-03 2020-01-11 日商闊斯泰股份有限公司 二氧化矽玻璃構件及其製造方法
JP7061494B2 (ja) 2018-03-28 2022-04-28 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置
AU2019337164A1 (en) 2018-09-11 2021-03-25 Panasonic Intellectual Property Corporation Of America Three-dimensional data encoding method, three-dimensional data decoding method, three-dimensional data encoding device, and three-dimensional data decoding device
KR102402742B1 (ko) * 2021-04-30 2022-05-26 에스케이씨솔믹스 주식회사 포토마스크 블랭크 및 이를 이용한 포토마스크
KR102392332B1 (ko) * 2021-06-08 2022-04-28 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102465982B1 (ko) * 2021-07-13 2022-11-09 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102435818B1 (ko) * 2021-09-03 2022-08-23 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102503790B1 (ko) * 2021-10-07 2023-02-23 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102535171B1 (ko) * 2021-11-04 2023-05-26 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20230090601A (ko) * 2021-12-15 2023-06-22 에스케이엔펄스 주식회사 블랭크 마스크, 블랭크 마스크 성막장치 및 블랭크 마스크의 제조방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102187275A (zh) * 2008-11-26 2011-09-14 Hoya株式会社 掩模板用基板
KR20140070660A (ko) * 2012-03-23 2014-06-10 호야 가부시키가이샤 마스크 블랭크, 전사용 마스크 및 이들의 제조 방법
TW201617174A (zh) * 2014-08-07 2016-05-16 旭硝子股份有限公司 光罩基底用玻璃基板及其製造方法
JP2020074053A (ja) * 2015-02-16 2020-05-14 大日本印刷株式会社 フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法
JP2017151427A (ja) * 2016-02-24 2017-08-31 旭硝子株式会社 反射型マスクブランクおよび反射型マスクブランクの製造方法
TW202036153A (zh) * 2019-02-13 2020-10-01 日商Ｈｏｙａ股份有限公司 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法

Also Published As

Publication number Publication date
KR102444967B1 (ko) 2022-09-16
JP2022171559A (ja) 2022-11-11
JP7428741B2 (ja) 2024-02-06
DE102022110190A1 (de) 2022-11-03
CN115268209A (zh) 2022-11-01
JP2024028967A (ja) 2024-03-05
US20220357647A1 (en) 2022-11-10
TW202242539A (zh) 2022-11-01

Similar Documents

Publication Publication Date Title
EP3882369A4 (en) MASK AND ITS MANUFACTURING METHOD
SG10202102022VA (en) Method of Manufacturing Reflective Mask Blank, and Reflective Mask Blank
EP3847503A4 (en) RETICLES, METHODS OF USE AND MANUFACTURE
EP3979000A4 (en) BLANKS OF REFLECTIVE PHOTOMASK AND REFLECTIVE PHOTOMASK
EP4036061A4 (en) MOLYBDENUM TRIOXIDE POWDER AND PRODUCTION METHOD THEREFOR
SG11202109240PA (en) Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor device
EP3925954A4 (en) FLUOROLACTONE AND METHOD FOR PRODUCTION THEREOF
EP4141080A4 (en) ASSEMBLY OF ADHESIVE AGENT, AND ADHESION BODY AND METHOD FOR MANUFACTURING THE SAME
EP3982383A4 (en) CAPACITOR AND METHOD OF MANUFACTURE THEREOF AND CAPACITOR MOUNTING METHOD
EP3956394A4 (en) FUNCTIONALIZED SILICA NANORINGS, PROCESS FOR THEIR MANUFACTURE AND USE
EP3916024A4 (en) COMPOSITION FOR MAKING A HYDROGEL, HYDROGEL AND METHOD FOR MAKING A COMPOSITION FOR MAKING A HYDROGEL
SG10202008936UA (en) Method of Manufacturing Reflective Mask Blank, Reflective Mask Blank, and Method of Manufacturing Reflective Mask
SG10202009482VA (en) Halftone Phase Shift-Type Photomask Blank, Method of Manufacturing thereof, and Halftone Phase Shift-Type Photomask
EP4053631A4 (en) REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK
EP4130874A4 (en) MASK BLANK AND METHOD FOR PRODUCING A TRANSFER MASK
TWI800360B (zh) 空白遮罩、使用其的光罩以及空白遮罩的製備方法
EP4098437A4 (en) MICROPOROUS FILM AND METHOD FOR PRODUCING IT
EP3973942A4 (en) BLANK FOR DENTAL CUTTER AND METHOD FOR PRODUCTION
EP3859029A4 (en) METAL MASK MATERIAL, ITS PRODUCTION METHOD AND METAL MASK
EP3979001A4 (en) PHOTOMASK BLANK, PROCESS FOR MAKING A PHOTOMASK AND PHOTOMASK
EP3919202A4 (en) CAN BODY AND METHOD OF MANUFACTURING THEREOF
SG10202103491UA (en) Reflective Mask Blank, Method of Manufacturing Thereof, and Reflective Mask
EP3916481A4 (en) INTERMEDIATE FILM, FILM, METHOD FOR MAKING INTERMEDIATE FILM AND METHOD FOR MAKING FILM
EP4052591A4 (en) METHOD FOR MANUFACTURING A SAUCE CONTAINING TEMPE AND SAUCE PRODUCED THEREFROM
EP4005978A4 (en) HYDROPHOBIC ZEOLITE, PROCESS FOR PRODUCTION THEREOF AND USE THEREOF