TWI800360B - 空白遮罩、使用其的光罩以及空白遮罩的製備方法 - Google Patents
空白遮罩、使用其的光罩以及空白遮罩的製備方法 Download PDFInfo
- Publication number
- TWI800360B TWI800360B TW111115732A TW111115732A TWI800360B TW I800360 B TWI800360 B TW I800360B TW 111115732 A TW111115732 A TW 111115732A TW 111115732 A TW111115732 A TW 111115732A TW I800360 B TWI800360 B TW I800360B
- Authority
- TW
- Taiwan
- Prior art keywords
- blank mask
- photomask
- same
- preparing method
- blank
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2021-0055698 | 2021-04-29 | ||
KR1020210055698A KR102444967B1 (ko) | 2021-04-29 | 2021-04-29 | 블랭크 마스크 및 이를 이용한 포토마스크 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202242539A TW202242539A (zh) | 2022-11-01 |
TWI800360B true TWI800360B (zh) | 2023-04-21 |
Family
ID=83445173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111115732A TWI800360B (zh) | 2021-04-29 | 2022-04-26 | 空白遮罩、使用其的光罩以及空白遮罩的製備方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220357647A1 (zh) |
JP (2) | JP7428741B2 (zh) |
KR (1) | KR102444967B1 (zh) |
CN (1) | CN115268209A (zh) |
DE (1) | DE102022110190A1 (zh) |
TW (1) | TWI800360B (zh) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102187275A (zh) * | 2008-11-26 | 2011-09-14 | Hoya株式会社 | 掩模板用基板 |
KR20140070660A (ko) * | 2012-03-23 | 2014-06-10 | 호야 가부시키가이샤 | 마스크 블랭크, 전사용 마스크 및 이들의 제조 방법 |
TW201617174A (zh) * | 2014-08-07 | 2016-05-16 | 旭硝子股份有限公司 | 光罩基底用玻璃基板及其製造方法 |
JP2017151427A (ja) * | 2016-02-24 | 2017-08-31 | 旭硝子株式会社 | 反射型マスクブランクおよび反射型マスクブランクの製造方法 |
JP2020074053A (ja) * | 2015-02-16 | 2020-05-14 | 大日本印刷株式会社 | フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法 |
TW202036153A (zh) * | 2019-02-13 | 2020-10-01 | 日商Hoya股份有限公司 | 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08286359A (ja) * | 1995-04-18 | 1996-11-01 | Toppan Printing Co Ltd | フォトマスクブランクおよびフォトマスク |
JP2005208282A (ja) * | 2004-01-22 | 2005-08-04 | Hoya Corp | ハーフトーン型位相シフトマスクブランクの製造方法、及びハーフトーン型位相シフトマスクの製造方法 |
JP4930964B2 (ja) * | 2005-05-20 | 2012-05-16 | Hoya株式会社 | 位相シフトマスクブランクの製造方法及び位相シフトマスクの製造方法 |
DE602006021102D1 (de) * | 2005-07-21 | 2011-05-19 | Shinetsu Chemical Co | Photomaskenrohling, Photomaske und deren Herstellungsverfahren |
WO2007062111A1 (en) * | 2005-11-23 | 2007-05-31 | Fsi International, Inc. | Process for removing material from substrates |
JP5412107B2 (ja) * | 2006-02-28 | 2014-02-12 | Hoya株式会社 | フォトマスクブランクの製造方法、及びフォトマスクの製造方法 |
KR101485754B1 (ko) * | 2008-09-26 | 2015-01-26 | 주식회사 에스앤에스텍 | 극자외선용 블랭크 마스크 및 이를 이용하여 제조되는 포토마스크 |
KR101593390B1 (ko) | 2009-04-22 | 2016-02-12 | (주) 에스앤에스텍 | 블랭크 마스크와 포토마스크 및 그의 제조방법 |
WO2010147172A1 (ja) * | 2009-06-18 | 2010-12-23 | Hoya株式会社 | マスクブランク及び転写用マスク、並びに転写用マスクの製造方法 |
KR20130051864A (ko) * | 2011-11-10 | 2013-05-21 | 주식회사 에스앤에스텍 | 블랭크 마스크 및 그의 제조방법 |
US9618836B2 (en) * | 2014-04-22 | 2017-04-11 | Asahi Glass Company, Limited | Reflective mask blank for EUV lithography, substrate with funtion film for the mask blank, and methods for their production |
JP2016057578A (ja) | 2014-09-12 | 2016-04-21 | 信越化学工業株式会社 | フォトマスクブランク |
TWI681940B (zh) * | 2016-06-03 | 2020-01-11 | 日商闊斯泰股份有限公司 | 二氧化矽玻璃構件及其製造方法 |
JP7061494B2 (ja) * | 2018-03-28 | 2022-04-28 | 三井化学株式会社 | 検査方法、ペリクルの製造方法、および検査装置 |
JP7469228B2 (ja) | 2018-09-11 | 2024-04-16 | パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカ | 三次元データ符号化方法、三次元データ復号方法、三次元データ符号化装置、及び三次元データ復号装置 |
KR102402742B1 (ko) * | 2021-04-30 | 2022-05-26 | 에스케이씨솔믹스 주식회사 | 포토마스크 블랭크 및 이를 이용한 포토마스크 |
KR102392332B1 (ko) * | 2021-06-08 | 2022-04-28 | 에스케이씨솔믹스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
KR102465982B1 (ko) * | 2021-07-13 | 2022-11-09 | 에스케이씨솔믹스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
KR102435818B1 (ko) * | 2021-09-03 | 2022-08-23 | 에스케이씨솔믹스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
KR102503790B1 (ko) * | 2021-10-07 | 2023-02-23 | 에스케이엔펄스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
KR102535171B1 (ko) * | 2021-11-04 | 2023-05-26 | 에스케이엔펄스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
KR20230090601A (ko) * | 2021-12-15 | 2023-06-22 | 에스케이엔펄스 주식회사 | 블랭크 마스크, 블랭크 마스크 성막장치 및 블랭크 마스크의 제조방법 |
-
2021
- 2021-04-29 KR KR1020210055698A patent/KR102444967B1/ko active IP Right Grant
-
2022
- 2022-03-11 JP JP2022038568A patent/JP7428741B2/ja active Active
- 2022-04-26 CN CN202210449936.7A patent/CN115268209A/zh active Pending
- 2022-04-26 US US17/729,419 patent/US20220357647A1/en active Pending
- 2022-04-26 TW TW111115732A patent/TWI800360B/zh active
- 2022-04-27 DE DE102022110190.8A patent/DE102022110190A1/de active Pending
-
2023
- 2023-12-13 JP JP2023210314A patent/JP2024028967A/ja active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102187275A (zh) * | 2008-11-26 | 2011-09-14 | Hoya株式会社 | 掩模板用基板 |
KR20140070660A (ko) * | 2012-03-23 | 2014-06-10 | 호야 가부시키가이샤 | 마스크 블랭크, 전사용 마스크 및 이들의 제조 방법 |
TW201617174A (zh) * | 2014-08-07 | 2016-05-16 | 旭硝子股份有限公司 | 光罩基底用玻璃基板及其製造方法 |
JP2020074053A (ja) * | 2015-02-16 | 2020-05-14 | 大日本印刷株式会社 | フォトマスク、フォトマスクブランクス、およびフォトマスクの製造方法 |
JP2017151427A (ja) * | 2016-02-24 | 2017-08-31 | 旭硝子株式会社 | 反射型マスクブランクおよび反射型マスクブランクの製造方法 |
TW202036153A (zh) * | 2019-02-13 | 2020-10-01 | 日商Hoya股份有限公司 | 光罩基底、相偏移光罩、相偏移光罩之製造方法及半導體裝置之製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202242539A (zh) | 2022-11-01 |
DE102022110190A1 (de) | 2022-11-03 |
JP7428741B2 (ja) | 2024-02-06 |
US20220357647A1 (en) | 2022-11-10 |
JP2022171559A (ja) | 2022-11-11 |
KR102444967B1 (ko) | 2022-09-16 |
JP2024028967A (ja) | 2024-03-05 |
CN115268209A (zh) | 2022-11-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3267253A4 (en) | Photomask blank, method for manufacturing photomask, and mask pattern formation method | |
EP3925954A4 (en) | FLUOROLACTONE AND METHOD FOR PRODUCTION THEREOF | |
EP4141080A4 (en) | ASSEMBLY OF ADHESIVE AGENT, AND ADHESION BODY AND METHOD FOR MANUFACTURING THE SAME | |
EP4130874A4 (en) | MASK BLANK AND METHOD FOR PRODUCING A TRANSFER MASK | |
EP3859029A4 (en) | METAL MASK MATERIAL, ITS PRODUCTION METHOD AND METAL MASK | |
EP3916024A4 (en) | COMPOSITION FOR MAKING A HYDROGEL, HYDROGEL AND METHOD FOR MAKING A COMPOSITION FOR MAKING A HYDROGEL | |
SG10202008936UA (en) | Method of Manufacturing Reflective Mask Blank, Reflective Mask Blank, and Method of Manufacturing Reflective Mask | |
EP4279067A4 (en) | NANOCOMPLEX, PRODUCTION METHOD THEREOF AND USE THEREOF | |
EP4267257A4 (en) | FACE MASKS | |
SG10202009482VA (en) | Halftone Phase Shift-Type Photomask Blank, Method of Manufacturing thereof, and Halftone Phase Shift-Type Photomask | |
EP4103300A4 (en) | NEW FILTER MATERIAL, FACE MASK CONTAINING SAME AND METHOD FOR THE PRODUCTION THEREOF | |
EP4053631A4 (en) | REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK | |
EP4117793A4 (en) | MASK | |
EP3916481A4 (en) | INTERMEDIATE FILM, FILM, METHOD FOR MAKING INTERMEDIATE FILM AND METHOD FOR MAKING FILM | |
TWI800360B (zh) | 空白遮罩、使用其的光罩以及空白遮罩的製備方法 | |
EP4098437A4 (en) | MICROPOROUS FILM AND METHOD FOR PRODUCING IT | |
EP3973942A4 (en) | BLANK FOR DENTAL CUTTER AND METHOD FOR PRODUCTION | |
EP3979001A4 (en) | PHOTOMASK BLANK, PROCESS FOR MAKING A PHOTOMASK AND PHOTOMASK | |
EP3608718A4 (en) | Photo mask blank, photo mask and photo mask manufacturing process | |
SG10201910692SA (en) | Photomask blank, and method of manufacturing photomask | |
EP4212875A4 (en) | BIOCHIP, ITS MANUFACTURING METHOD AND ITS USE | |
EP4108766A4 (en) | METHOD FOR PREPARING ENCAPSULATED FIBROSIS TUMOROID AND ASSOCIATED USE | |
EP4052591A4 (en) | METHOD FOR MANUFACTURING A SAUCE CONTAINING TEMPE AND SAUCE PRODUCED THEREFROM | |
EP4005978A4 (en) | HYDROPHOBIC ZEOLITE, PROCESS FOR PRODUCTION THEREOF AND USE THEREOF | |
EP4067994A4 (en) | DRAFT REFLECTIVE PHOTOMASK AND REFLECTIVE PHOTOMASK |