TWI799651B - 半導體矽晶圓之清洗處理裝置及清洗方法 - Google Patents

半導體矽晶圓之清洗處理裝置及清洗方法 Download PDF

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Publication number
TWI799651B
TWI799651B TW108135616A TW108135616A TWI799651B TW I799651 B TWI799651 B TW I799651B TW 108135616 A TW108135616 A TW 108135616A TW 108135616 A TW108135616 A TW 108135616A TW I799651 B TWI799651 B TW I799651B
Authority
TW
Taiwan
Prior art keywords
processing device
silicon wafer
semiconductor silicon
cleaning
cleaning method
Prior art date
Application number
TW108135616A
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English (en)
Other versions
TW202044396A (zh
Inventor
五十嵐健作
Original Assignee
日商信越半導體股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商信越半導體股份有限公司 filed Critical 日商信越半導體股份有限公司
Publication of TW202044396A publication Critical patent/TW202044396A/zh
Application granted granted Critical
Publication of TWI799651B publication Critical patent/TWI799651B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW108135616A 2018-10-11 2019-10-02 半導體矽晶圓之清洗處理裝置及清洗方法 TWI799651B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-192672 2018-10-11
JP2018192672A JP6988761B2 (ja) 2018-10-11 2018-10-11 半導体シリコンウェーハの洗浄処理装置および洗浄方法

Publications (2)

Publication Number Publication Date
TW202044396A TW202044396A (zh) 2020-12-01
TWI799651B true TWI799651B (zh) 2023-04-21

Family

ID=70163677

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108135616A TWI799651B (zh) 2018-10-11 2019-10-02 半導體矽晶圓之清洗處理裝置及清洗方法

Country Status (7)

Country Link
US (1) US20220059343A1 (zh)
EP (1) EP3866185A4 (zh)
JP (1) JP6988761B2 (zh)
KR (1) KR20210068017A (zh)
CN (1) CN112673458A (zh)
TW (1) TWI799651B (zh)
WO (1) WO2020075448A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7020507B2 (ja) * 2020-04-28 2022-02-16 信越半導体株式会社 半導体ウェーハの洗浄方法
JP7422606B2 (ja) 2020-05-25 2024-01-26 東京エレクトロン株式会社 基板処理装置および基板処理方法
CN113223934A (zh) * 2021-04-30 2021-08-06 苏州协鑫光伏科技有限公司 一种210大尺寸硅片的清洗方法
EP4266353A1 (de) * 2022-04-20 2023-10-25 Siltronic AG Verfahren zum reinigen einer halbleiterscheibe nach einer politur mittels cmp in einer reinigungsstrasse
CN114864744B (zh) * 2022-05-05 2024-04-02 普乐新能源科技(泰兴)有限公司 一种纳米硅浆料的高效清洗方法及系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001102343A (ja) * 1999-09-28 2001-04-13 Sony Corp 半導体ウェーハの洗浄方法
TW201241912A (en) * 2010-12-22 2012-10-16 Lam Res Ag Process for treating a semiconductor wafer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08107100A (ja) * 1994-10-06 1996-04-23 Sony Corp 薬液処理方法及び薬液処理装置
JP2003010795A (ja) * 2001-06-29 2003-01-14 Sekisui Chem Co Ltd 基板洗浄装置及び洗浄方法
DE10239773B3 (de) * 2002-08-29 2004-02-26 Wacker Siltronic Ag Halbleiterscheibe und Verfahren zur Reinigung einer Halbleiterscheibe
JP4827587B2 (ja) * 2006-03-31 2011-11-30 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 シリコンウェーハの製造方法
CN104380091B (zh) 2012-06-28 2016-06-22 西门子医疗保健诊断公司 信号放大的读出器设备和方法
JP2015023069A (ja) 2013-07-17 2015-02-02 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法
CN104157766A (zh) * 2014-08-06 2014-11-19 韩忠贺 一种芯片的砷化镓衬底的高温蚀刻方法
JP6610443B2 (ja) * 2016-06-07 2019-11-27 信越半導体株式会社 半導体シリコンウェーハの表面欠陥検査方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001102343A (ja) * 1999-09-28 2001-04-13 Sony Corp 半導体ウェーハの洗浄方法
TW201241912A (en) * 2010-12-22 2012-10-16 Lam Res Ag Process for treating a semiconductor wafer

Also Published As

Publication number Publication date
WO2020075448A1 (ja) 2020-04-16
JP2020061483A (ja) 2020-04-16
US20220059343A1 (en) 2022-02-24
KR20210068017A (ko) 2021-06-08
EP3866185A1 (en) 2021-08-18
CN112673458A (zh) 2021-04-16
TW202044396A (zh) 2020-12-01
JP6988761B2 (ja) 2022-01-05
EP3866185A4 (en) 2022-07-13

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