TWI797534B - Substrate conveying equipment for vertical continuous gilding equipment - Google Patents
Substrate conveying equipment for vertical continuous gilding equipment Download PDFInfo
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- TWI797534B TWI797534B TW110100650A TW110100650A TWI797534B TW I797534 B TWI797534 B TW I797534B TW 110100650 A TW110100650 A TW 110100650A TW 110100650 A TW110100650 A TW 110100650A TW I797534 B TWI797534 B TW I797534B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/02—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid
- B65G49/04—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
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Abstract
Description
本發明涉及基板移送設備,更具體地,涉及用於在鍍金區間連續移送沿著垂直方向配置的基板的基板移送設備。The present invention relates to a substrate transfer device, and more particularly, to a substrate transfer device for continuously transferring substrates arranged in a vertical direction in a gold plating section.
作為用於對印刷電路板(printed circuit board,PCB)等平板形態的基板進行鍍金的設備,使用垂直型連續鍍金設備(vertical continuous platting,VCP)。垂直型連續鍍金設備使基板浸漬在沿著移送方向延伸的鍍金槽的狀態下進行移送,並對基板表面等進行鍍金。A vertical continuous plating apparatus (vertical continuous plating, VCP) is used as an apparatus for plating a plate-shaped substrate such as a printed circuit board (PCB). The vertical type continuous gold plating equipment transfers the substrate while being dipped in the gold plating tank extending along the transfer direction, and gold-plates the surface of the substrate, etc.
在上述垂直型連續鍍金設備中,為了向鍍金區間移送基板而使用基板移送設備。基板移送設備將多個基板按規定間隔連續移送,當前,普遍使用利用鏈條的移送方式。In the above-mentioned vertical continuous gold plating equipment, a substrate transfer equipment is used to transfer the substrate to the gold plating section. The substrate transfer equipment continuously transfers a plurality of substrates at predetermined intervals, and currently, a transfer method using a chain is widely used.
只是,目前,上述鏈條移送方式浮現出多種問題。代表性地,當長時間使用鏈條時發生變形,由此,在鍍金區間,基板間隔無法恆定維持。並且,在鏈條的結構特性上,引發規定的脈動或振動,這種脈動等會對鍍金品質產生惡劣影響。上述問題最終將導致基板的鍍金品質的降低,並有可能引發不規則的鍍金偏差。尤其,最近的電子設備等追求極度的輕薄化,從而需要高的精密度,基板的鍍金品質變得更加重要。However, at present, various problems have emerged in the above-mentioned chain transfer method. Typically, when the chain is used for a long period of time, deformation occurs, and thus, the gap between the substrates cannot be kept constant in the plating section. In addition, predetermined pulsation or vibration occurs in the structural characteristics of the chain, and such pulsation or the like adversely affects the quality of the gold plating. The above-mentioned problems will eventually lead to a reduction in the quality of gold plating on the substrate, and may cause irregular gold plating deviations. In particular, recent electronic devices and the like pursue extreme thinning and require high precision, and the quality of gold plating on substrates becomes more important.
由此,提出了韓國授權專利第10-2030399號(發明名稱:鍍金用掛件移送裝置)、韓國授權專利第10-1434414號(發明名稱:鍍金裝置的掛件移送器具)等新的移送方式,但其實用度並不高。Thus, new transfer methods such as Korea Authorized Patent No. 10-2030399 (name of invention: pendant transfer device for gold-plating), Korea Authorized Patent No. 10-1434414 (name of invention: pendant transfer device for gold-plating device) have been proposed, but Its practicality is not high.
本發明的目的在於,提供用於在鍍金區間連續移送沿著垂直方向配置的基板的基板移送設備。An object of the present invention is to provide a substrate transfer facility for continuously transferring substrates arranged in a vertical direction in a gold plating section.
並且,本發明的目的在於,提供在移送基板的過程中,可以顯著減少脈動、晃動等,可以恆定維持基板之間的間隔的基板移送設備。In addition, it is an object of the present invention to provide a substrate transfer device that can significantly reduce pulsation, vibration, etc., and can maintain a constant interval between substrates during substrate transfer.
並且,本發明的目的在於,提供可以改善基板的鍍金品質,可以減少基板之間的鍍金偏差的基板移送設備。Furthermore, an object of the present invention is to provide a substrate transfer facility capable of improving the quality of gold plating on a substrate and reducing variation in gold plating between substrates.
根據本發明的一實施方式,本發明可提供基板移送設備,上述基板移送設備在鍍金區間連續移送沿著垂直方向配置的基板,上述基板移送設備包含:主框架;基板安裝部,用於安裝基板;軌道部,配置於上述主框架,用於提供上述基板安裝部的移送路徑;裝載部,用於向上述軌道部裝載上述基板,使上述基板沿著上述軌道部初始區間移送;夾持部,設置於上述基板安裝部;以及金屬線部,可以與上述夾持部結合及解除結合,用於移送上述基板安裝部。According to one embodiment of the present invention, the present invention can provide substrate transfer equipment, the above substrate transfer equipment continuously transfers the substrates arranged in the vertical direction in the gold plating section, the above substrate transfer equipment includes: a main frame; a substrate mounting part for mounting the substrate The track part is configured on the above-mentioned main frame and is used to provide the transfer path of the above-mentioned substrate installation part; the loading part is used to load the above-mentioned substrate on the above-mentioned track part, so that the above-mentioned substrate is transferred along the initial section of the above-mentioned track part; the clamping part, It is provided on the above-mentioned substrate mounting part; and the metal wire part can be connected and released from the above-mentioned clamping part, and is used for transferring the above-mentioned substrate mounting part.
與以往鏈條、帶方式等相比,本發明實施例的基板移送設備透過基於線的移送方式,在移送過程中,可以減少基板的脈動、晃動等。由此,可以改善基板的鍍金品質。Compared with the conventional chain and belt methods, the substrate transfer equipment of the embodiment of the present invention can reduce the pulsation and shaking of the substrate during the transfer process through the wire-based transfer method. Thus, the quality of gold plating on the substrate can be improved.
並且,本發明實施例的基板移送設備可以在進行鍍金處理時減少基板之間的間隔,可透過線的剛性恆定維持最初設定的間隔。由此,可減少基板之間的鍍金偏差,可以一部分貢獻於生產性改善。Moreover, the substrate transfer equipment according to the embodiment of the present invention can reduce the distance between the substrates during the gold plating process, and can maintain the initially set distance through the rigidity of the wire. Thereby, variation in gold plating between substrates can be reduced, and a part of it can contribute to productivity improvement.
以下將參照圖式說明本發明的實施例。只是,以下的實施例用於幫助理解本發明,本發明的範圍並不侷限於以下的實施例。以下的實施例是為了向本發明所屬技術領域中具有通常知識者完全說明本發明而提供,將省略對判斷為使本發明的技術思想不清楚的公知結構的詳細說明。Embodiments of the present invention will be described below with reference to the drawings. However, the following examples are used to help understand the present invention, and the scope of the present invention is not limited to the following examples. The following embodiments are provided to fully explain the present invention to those skilled in the art to which the present invention pertains, and detailed descriptions of known structures that are judged to make the technical idea of the present invention unclear will be omitted.
圖1a為本發明一實施例的基板移送設備的主要部分立體圖。圖1b為圖1a所示的基板移送設備的主視圖。圖1c為圖1a所示的基板移送設備的側視圖。圖1d為圖1a所示的基板移送設備的俯視圖。Fig. 1a is a perspective view of main parts of a substrate transfer device according to an embodiment of the present invention. Fig. 1b is a front view of the substrate transfer device shown in Fig. 1a. Fig. 1c is a side view of the substrate transfer apparatus shown in Fig. 1a. Fig. 1d is a top view of the substrate transfer device shown in Fig. 1a.
為了便利,以圖1a等所示的座標軸為基準,x軸方向為左右方向,y軸方向為前後方向,z軸方向為上下方向。For convenience, taking the coordinate axes shown in FIG. 1a as a reference, the x-axis direction is the left-right direction, the y-axis direction is the front-rear direction, and the z-axis direction is the up-down direction.
參照圖1a至圖1d,本實施例的基板移送設備10可用於移送基板1。Referring to FIG. 1 a to FIG. 1 d , the
基板1可包含印刷電路板(printed circuit board,PCB)。The
基板移送設備10可用於對基板1進行鍍金(plating)。或者,基板1可透過基板移送設備10移送並被鍍金處理。例如,基板1可透過基板移送設備10移送並透過銅(copper)或銅合金(copper alloy)鍍金處理。The
只是,基板移送設備10並不侷限於鍍金處理等。例如,基板移送設備10可廣泛用於在規定平面上移送上下配置的基板1並進行規定的加工處理,需要精密的振動、間隔等的控制的領域、用途等。However, the
並且,在本說明書中記載的「鍍金」基本上是指電鍍,但並不排除熔融金屬浸鍍、熱噴塗、蒸發鍍、陰極噴塗等其他公知的方式的鍍金。並且,根據情況,可廣泛包含各種表面處理加工。In addition, "gold plating" described in this specification basically refers to electroplating, but does not exclude other known forms of gold plating such as molten metal immersion plating, thermal spraying, evaporation plating, and cathodic spraying. And, depending on the situation, various surface treatment processes can be widely included.
根據情況,基板移送設備10可以構成鍍金設備的一部分。即,基板移送設備10可以在鍍金設備內移送基板1,並可構成鍍金設備的一部分。例如,上述鍍金設備可包含使基板1垂直豎立來移送,向基板1的表面等施加電流來執行鍍金的設備。作為參考,在本發明所屬技術領域中,將這種鍍金設備稱為垂直型連續鍍金設備(vertical continuous platting,VCP)。Depending on circumstances, the
整體上,本實施例的基板移送設備10可包含:主框架100;基板安裝部200,用於安裝基板1;軌道部300,用於提供基板安裝部200的移送路徑;裝載部400及卸載部500,用於向軌道部300裝載以及從軌道部300卸載基板;夾持部600,設置於基板安裝部200,可以與金屬線部700相結合;以及金屬線部700,與夾持部600相結合,用於向一側(圖中左側)移送基板安裝部200。Overall, the
觀察簡要工作,在基板安裝部200安裝基板1,基板安裝部200配置於初始位置(圖中右側端)。接著,裝載部400緊固在夾持部600,基板安裝部200透過設置於裝載部400的平板472,沿著軌道部300向一側(圖中左側)移送。若基板安裝部200向裝載部400的一側端(圖中左側端)移送,則夾持部600緊固在金屬線部700,夾持部600與裝載部400解除結合。Looking at the brief operation, the
接著,基板安裝部200透過金屬線部700向一側(圖中左側)移送,在移送過程中,可透過規定的鍍金設備進行鍍金處理。作為參考,圖1a等中,省略了鍍金設備。若基板安裝部200向金屬線部700的一側端(圖中左側端)移送,則卸載部500緊固在夾持部600,夾持部600從金屬線部700解除結合。並且,卸載部500朝向軌道部300的一側端(圖中左側端)移送基板安裝部200。Next, the
在卸載部500之後,基板1可以經過需要的後續工序。例如,基板1可經過水洗過程之後向下一工序傳遞,基板安裝部200可以與基板1分離並復原到初始位置。只是,在本發明中,卸載部500之後的工序並未受到特殊限制。After the
上述工作可以對多個基板安裝部200或基板1同時多發性地進行。即,基板移送設備10可包含多個基板安裝部200,上述工作可以對各個基板安裝部200同時多發性地進行。The above-described operations can be performed simultaneously and multiple times for a plurality of
上述基板移送設備10具有在鍍金過程中,透過金屬線部700移送基板1的特徵。基於金屬線部700的移送方式可以減少晃動或脈動,由此,可以恆定維持基板安裝部200之間的間隔。在另一方面,這可以幫助減少基板安裝部200之間的間隔,減少各個基板1之間的鍍金偏差。The
以下更加詳細地說明上述基板移送設備10的各個結構。Each structure of the
本實施例的基板移送設備10可包含主框架100。The
主框架100可形成基板移送設備10的整體外觀,並提供用於安裝結構部件的支撐結構。主框架100可以由骨架結構形成,若具有規定剛性並可提供支撐結構,則其結構或形狀並不受到特殊限制。The
本實施例的基板移送設備10可包含設置於主框架100的軌道部300。The
軌道部300基本上在主框架100的上部沿著左右方向延伸而成。在本實施例的情況下,軌道部300可以例示為與主框架100區分的額外的部件,根據情況,軌道部300可以在主框架100上形成為一體。The
軌道部300可具有規定的橫截面形狀並向左右延伸,從而可以提供後述的軌道托架的移動路徑。The
根據需要,軌道部300可以由前後隔開的一對形成。即,軌道部300可包含:前方軌道310;以及後方軌道320,沿著前方軌道310的後方隔開規定間隔,以與前方軌道310相對應的左右延伸。在上述情況下,前方軌道310可提供用於對基板1進行鍍金處理的移送路徑,後方軌道320可用於使基板安裝部200再次復原到初始位置。As needed, the
圖2a為圖1a所示的裝載部的放大立體圖。圖2b為圖2a所示的裝載部的主視圖。圖2c為圖2a所示的滑動單元的底部面立體圖。Fig. 2a is an enlarged perspective view of the loading part shown in Fig. 1a. Fig. 2b is a front view of the loading part shown in Fig. 2a. Fig. 2c is a bottom perspective view of the sliding unit shown in Fig. 2a.
參照圖2a至圖2c,本實施例的基板移送設備10可包含裝載部400。Referring to FIGS. 2 a to 2 c , the
裝載部400可基本上配置在與基板安裝部200的初始位置(圖中右側端)對應的主框架100的一側(右側)區域。裝載部400可以向金屬線部700的一側端(圖中左側端)移送配置於初始位置的基板安裝部200。在具有多個基板安裝部200的情況下,裝載部400可以向金屬線部700依次移送各個基板安裝部200。各個基板安裝部200可透過裝載部400按已設定的間隔適當隔開配置。The
具體地,裝載部400可包含固定軌道410及移動軌道420。Specifically, the
固定軌道410可以左右延伸而成,並可緊固在主框架100。固定軌道410可固定於主框架100。移動軌道420可以左右延伸而成,並可緊固在固定軌道410。其中,移動軌道420以可沿著固定軌道410滑動的方式緊固在固定軌道410。The fixed
作為參考,相對於固定軌道410的移動軌道420的滑動可透過後述的連接單元470被動實現。For reference, the sliding of the moving
另一方面,裝載部400可包含滑動單元430及升降單元440。On the other hand, the
滑動單元430以可沿著移動軌道420滑動的方式緊固在移動軌道420。滑動單元430可具有規定的驅動單元,可相對於移動軌道420前後移動。The sliding
升降單元440以可上下滑動的方式緊固在滑動單元430。升降單元440可具有規定的驅動單元,可相對於滑動單元430上下移動。The
作為參考,上述驅動單元可包含馬達、執行器等公知的驅動單元,根據需要,滑動單元430及升降單元440的各個驅動單元可以一體化或單獨分離。並且,在本實施例的情況下,滑動單元430及升降單元440可大致呈四角框或板形態,滑動單元430及升降單元440的的形態並不侷限於此,根據需要,可以具有多種形態。For reference, the above-mentioned driving unit may include known driving units such as motors and actuators, and the driving units of the sliding
另一方面,裝載部400可包含加壓塊450。On the other hand, the
加壓塊450可配置於升降單元440。在本實施例的情況下,加壓塊450基本上從升降單元440的底部面部位元朝向前方傾斜。The pressurizing
加壓塊450可包含放置槽451。放置槽451可以為從加壓塊450的下部朝向上側凹入的槽。放置槽451可以加壓支撐後述的夾持部600的推輥620。由此,優選地,放置槽451可具有與推輥620對應的形狀、大小等。The
根據需要,加壓塊450可包含傾斜面452。傾斜面452可以從放置槽451的下部朝向加壓塊450下端以逐漸變窄(taper)的方式延伸而成。由此,加壓塊450下端的開口部(opening)寬度可以形成為比放置槽451的寬度大規定程度。推輥620可以被傾斜面452引導並穩定地緊固在放置槽451。The
另一方面,裝載部400可包含工作塊460。On the other hand, the
工作塊460能夠以與加壓塊450相鄰的方式配置於升降單元440。在本實施例的情況下,工作塊460基本上從升降單元440的底部面部位元沿著加壓塊450後方隔開配置。The working
工作塊460能夠以與後述的夾持部600的轉輥632對應的方式配置,可根據升降單元440的工作加壓支撐轉輥632。並且,工作塊460可對轉輥632施加壓力來使其轉動,從而可以使夾持部600與金屬線部700結合或解除結合。這將在後述的夾持部600中說明。The working
為了上述工作,工作塊460可透過規定的驅動單元上下移動。工作塊460的驅動單元可以與升降單元440區分,可以使工作塊460獨立升降移動。For the above work, the working
根據需要,工作塊460可包含水平面461及垂直面462。水平面461可以在升降單元440的底部面部位元基本上以水平的方式延伸而成,垂直面462可以在水平面461的一端(圖中前端)代替以垂直的方式延伸而成。在上述情況下,水平面461可以對轉輥632的上部面部位施加壓力,垂直面462接觸引導轉輥的滾動面部位來實現穩定的加壓工作。According to needs, the working
在上述情況下,工作塊460還可包含傾斜面463。傾斜面463可以使垂直面462的下端以規定程度傾斜的方式切削而成。當轉輥632向轉輥632的垂直面462下端進入時,傾斜面463可以使其順暢地進入。In the above case, the working
另一方面,裝載部400可包含連接單元470。On the other hand, the
連接單元470可配置於移動軌道420的底部面一側(圖中左側)部位,並緊固在移動軌道420。連接單元470可固定設置於移動軌道420,由此,連接單元470及移動軌道420可以沿著固定軌道410左右一起移動。更明確地,隨著移動軌道420與滑動單元430一起沿著一側(圖中左側)移動,移動軌道420可相對於固定軌道410左右移動。The connecting
連接單元470可包含連接托架471、平板472及執行器473。連接托架471可安裝於移動軌道420的底部面部位,平板472及執行器473可緊固在連接托架471。其中,平板472能夠以第一鉸鏈472a為介質緊固在連接托架471,執行器473可以使工作臂以第二鉸鏈473a為介質緊固在平板472。第一鉸鏈、第二鉸鏈可分別形成上下方向的旋轉軸,可相互前後隔開規定間隔。The connecting
根據上述結合結構,平板472能夠以第一鉸鏈472a為中心向一側轉動,從而沿著前方突出規定程度配置,或者透過執行器473向相反方向轉動,從而基本上沿著左右方向整齊地配置。在前者的情況下,平板472可以與後述的夾持部600的連接塊612接觸及干擾,在後者的情況下,平板472可以與連接塊612隔開。由此,將前者的情況稱為「干擾狀態」,將後者的情況稱為「非干擾狀態」。According to the combination structure, the
針對連接單元470的工作,透過後述的夾持部600進行說明。The operation of the connecting
另一方面,本實施例的基板移送設備10可包含卸載部500。On the other hand, the
參照圖1a等,卸載部500可基本上配置在裝載部400的相反側(圖中的左側端)。卸載部500可以使透過金屬線部700移送的基板安裝部200從金屬線部700解除結合。即,基板安裝部200可以從金屬線部700脫離,並可以被卸載部500支撐,可透過卸載部500向下一個工序適當移送。Referring to FIG. 1a etc., the unloading
卸載部500的配置或一部分功能不同,不僅如此,基本上與上述裝載部400相同或類似,因此,將省略對其的詳細說明。The unloading
圖3a為圖1a所示的基板安裝部的放大立體圖。圖3b為圖3a所示的基板安裝部的主視圖。Fig. 3a is an enlarged perspective view of the substrate mounting part shown in Fig. 1a. Fig. 3b is a front view of the board mounting part shown in Fig. 3a.
參照圖3a至圖3b,本實施例的基板移送設備10可包含基板安裝部200。Referring to FIGS. 3 a to 3 b , the
基板安裝部200以可沿著軌道部300移動的方式設置於軌道部300。並且,在基板安裝部200可安裝基板1。基板1以可在安裝於基板安裝部200的狀態沿著軌道部300移動,可透過規定的鍍金設備進行鍍金處理。The
基板安裝部200可設置多個。圖1a等中,為了便利,在兩側端僅分別設置1個基板安裝部200,基板安裝部200可以設置多個。多個基板安裝部200可以左右相鄰配置,從而可以沿著軌道部300移送。由此,在多個基板安裝部200中的鍍金處理可以連續或同時多發性地進行。A plurality of
另一方面,基板安裝部200可包含軌道安裝托架210。On the other hand, the
軌道安裝托架210可基本上配置於基板安裝部200的上部,可朝向軌道部300沿著一側(後方)延伸而成。The
軌道安裝托架210以可沿著軌道部300滾動的方式包含多個輥211、212。優選地,軌道安裝托架210可基本上包含:一對上部輥211,與軌道部300的上部側面接觸滾動;以及一對下部輥212,與軌道部300的下部側面接觸滾動。一對上部輥211及下部輥212可分別左右隔開配置。The
並且,上部輥211能夠以與軌道部300的一面(例如,前部面)接觸滾動的方式配置,下部輥212以與軌道部300的相反面(例如,後部面)接觸滾動的方式配置。由此,軌道安裝托架210可以兼備將基板安裝部200支撐在軌道部300的功能。In addition, the
另一方面,基板安裝部200可包含基板安裝框架220。On the other hand, the
基板安裝框架220可從軌道安裝托架210沿著前方延伸,從而可提供用於安裝基板1的支撐結構。基板安裝框架220可體現為規定形狀及結構的框架、板等的形態,在本實施例的情況下,大致呈四邊框架的形態。只是,基板安裝框架220的形態並不侷限於此,根據需要,可以適當改變。The
並且,基板安裝框架220可包含用於夾持基板1的上部夾持器221及下部夾持器222。多個上部夾持器221在基板安裝框架220的上側左右隔開配置,多個下部夾持器222可以在基板安裝框架220的下側左右隔開配置。Also, the
雖然未圖示,但根據需要,基板安裝部200可包含振動發生單元。Although not shown, the
振動發生單元可配置於基板安裝部200的一側,可以向基板安裝部200施加規定頻率的微細振動。例如,振動發生單元可安裝於軌道安裝托架210的一側,與軌道安裝托架210機械接觸,可以使軌道安裝托架210或被其支撐的基板1發生微細振動。只是,若振動發生單元只要是可以向基板1傳遞規定振動的位置,則可以安裝或配置於更多的位置,安裝位置並不侷限於軌道安裝托架210等。振動發生單元可以向基板1施加微細振動,透過形成於基板1的微細孔等來使鍍金液等適當流入,並貢獻於改善鍍金品質。The vibration generating unit may be arranged on one side of the
圖4a為圖1a所示的夾持部的放大立體圖。圖4b為圖4a所示的夾持部的側視圖。Fig. 4a is an enlarged perspective view of the clamping portion shown in Fig. 1a. Fig. 4b is a side view of the clamping portion shown in Fig. 4a.
參照圖4a至圖4b,本實施例的基板移送設備10可包含夾持部600。Referring to FIG. 4 a to FIG. 4 b , the
夾持部600可安裝於基板安裝部200的一側。更具體地,根據圖中所示,夾持部600可配置於上述軌道安裝托架210的上部面部位並可安裝於軌道安裝托架210。由此,夾持部600可以與基板安裝部200一起移動。The clamping
夾持部600能夠以與多個基板安裝部200相對應的方式形成多個。即,多個基板安裝部200可包含各個夾持部600。A plurality of clamping
夾持部600可緊固在裝載部400或卸載部500來透過裝載部400或卸載部500移送,或者可緊固在金屬線部700來透過金屬線部700移送。優選地,夾持部600可以至少在鍍金處理區間緊固在金屬線部700,由此,夾持部600或基板安裝部200可以在鍍金處理區間內透過金屬線部700移送。The clamping
另一方面,夾持部600可包含夾持部主體610。On the other hand, the clamping
夾持部主體610可緊固在軌道安裝托架210。夾持部主體610可呈安裝支撐夾持部600的各個結構要素的規定的框架、托架、主體等的形態。只是,夾持部600的形態並不侷限於此,也可以變形成具有與此相同或類似功能的多種形態。The
在夾持部主體610可形成第一夾槽611。第一夾槽611可基本上形成於夾持部主體610的後端部位,與金屬線部700相對應的部分可呈圓形或圓弧形形狀。第一夾槽611可以與後述的第二夾槽635a對應來提供用於把持金屬線部700的結合結構。A
並且,夾持部主體610可包含連接塊612。連接塊612可以從夾持部主體610的後端部位朝向上側突出規定高度而成。連接塊612可以與上述連接單元470發生干擾,從而可以使移動軌道420或基板安裝部200移動。這透過夾持部600的工作說明。In addition, the
夾持部主體610可包含引導孔613。引導孔613可以左右貫通夾持部主體610,可根據後述的移動軸634的移動軌跡以長孔形態延伸。由此,引導孔613可以引導移動軸634的移動。The
另一方面,夾持部600可包含推輥620。On the other hand, the clamping
推輥620可配置於夾持部主體610的前端部位,以可旋轉的方式被夾持部主體610支撐。推輥620可基本上具有前後方向的旋轉軸,並可緊固在夾持部主體610。The
推輥620可以與上述裝載部400的加壓塊450緊固。即,加壓塊450可透過升降單元440下降,使得推輥620被放置槽451 加壓支撐,由此可以與推輥620緊固。加壓塊450下端的傾斜面452可以校正上述放置槽451及推輥620的緊固位置。The
透過上述推輥620與加壓塊450之間的結合,基板安裝部200可以與上述滑動單元430一起左右移動。即,推輥620可起到用於基板安裝部200的左右移動的支撐單元的功能。Through the combination between the pushing
另一方面,夾持部600可包含轉動托架630。On the other hand, the clamping
轉動托架630可以與推輥620前後隔開規定間隔,以可轉動的方式緊固在夾持部主體610。具體地,轉動托架630可以在後端具有組裝軸631,可透過這種組裝軸631,以可轉動的方式緊固在夾持部主體610。組裝軸631可基本上形成左右方向的旋轉軸。The
並且,轉動托架630可包含轉輥632。轉輥632可具有左右方向的輥軸632a,以可轉動的方式緊固在轉動托架630的前端。作為參考,這與上述推輥620具有前後方向的旋轉軸成對比。Also, the rotating
轉輥632可透過上述工作塊460加壓移動。即,轉輥632可被工作塊460施加向下方的壓力來移動,或者解除加壓並回到上方。上述轉輥632的移動可透過以組裝軸631為中心的轉動托架630的轉動實現。The
其中,上述工作塊460的水平面461接觸加壓轉輥632的上側,垂直面462接觸引導轉輥632的前方,從而可以進行穩定的加壓工作。並且,工作塊460下端的傾斜面452可以使工作塊460與轉輥632之間的初始接觸順暢地實現。Wherein, the
並且,轉動托架630可包含彈簧軸633及移動軸634。彈簧軸633用於緊固後述的彈性支撐部640,根據例示,沿著輥軸632a的下側隔開配置來形成左右方向的旋轉軸。Moreover, the rotating
移動軸634可從彈簧軸633隔開規定間隔配置,可緊固在上述引導孔613。移動軸634可根據與轉輥632的移動對應的引導孔613進行移動,由此,可以引導轉輥632或轉動托架630的轉動工作。The moving
並且,轉動托架630可包含夾具635。夾具635可基本上從轉動托架630的後端部位朝向下方延伸而成。夾具635可包含第二夾槽635a,第二夾槽635a與上述第一夾槽611對應的部分可呈圓形或圓弧形形狀。夾持部600可以在第一夾槽611、第二夾槽635a之間加壓接觸金屬線部700,從而可以與金屬線部700緊固。Also, the rotating
另一方面,夾持部600可包含彈性支撐部640。On the other hand, the clamping
彈性支撐部640可以在夾持部主體610與轉動托架630之間彈性支撐轉動托架630。彈性支撐部640的一端(前端)以可轉動的方式緊固在夾持部主體610,相反側端部(後端)以可轉動的方式緊固在轉動托架630。The elastic supporting
彈性支撐部640可以沿著第一夾槽611、第二夾槽635a相互接近的方式彈性支撐轉動托架630。由此,在不施加外力的狀態下,第一夾槽611、第二夾槽635a沿著相互接近的方向被彈性支撐,從而可以緊固在金屬線部700等。The elastic supporting
並且,在上述狀態下,在施加外力的情況下(即,工作塊460對轉輥632施加壓力的情況下),透過外力,彈性支撐部640可以被彈性壓縮變形。在這種情況下,第一夾槽611、第二夾槽635a可以沿著相互隔開的方向移動,從而可以從金屬線部700等脫離。Moreover, in the above state, when an external force is applied (that is, when the working
根據需要,彈性支撐部640可包含:氣缸641,緊固在夾持部主體610的前端部位與彈簧軸633之間;以及壓簧642,彈性支撐氣缸641的前後端之間。並且,雖然未圖示,但在壓簧642等可覆蓋用於隔斷異物等的流入的蓋部件。According to requirements, the elastic supporting
圖4c為圖4a所示的夾持部的第一工作狀態圖。Fig. 4c is a diagram of the first working state of the clamping part shown in Fig. 4a.
圖4c示出未施加外力的狀態。參照圖4c,在第一工作狀態下,彈性支撐部640彈性支撐轉動托架630,來使其沿著第一夾槽611、第二夾槽635a相互接近的方向配置。在此狀態下,第一夾槽611、第二夾槽635a可以與金屬線部700加壓接觸,從而可以與金屬線部700緊固。Figure 4c shows a state where no external force is applied. Referring to FIG. 4c, in the first working state, the
上述第一工作狀態可基本上維持在基於金屬線部700的夾持部600至基板安裝部200的移動區間。或者,第一工作狀態可以在基板1被鍍金處理的移動區間維持。即,夾持部600或基板安裝部200可透過第一工作狀態緊固在金屬線部700,根據金屬線部700的移動移送並被鍍金處理。The above-mentioned first working state can basically be maintained in the movement interval from the clamping
圖4d為圖4a所示的夾持部的第二工作狀態圖。Fig. 4d is a diagram of the second working state of the clamping part shown in Fig. 4a.
圖4d示出透過工作塊460向轉輥632施加壓力的狀態。參照圖4d,在第二工作狀態下,轉輥632可透過工作塊460向下方施加規定的程度的壓力,由此,轉動托架630能夠以組裝軸631為中心轉動規定程度(圖中逆時針方向)。並且,夾具635以組裝軸631為中心,向對應的方向(圖中逆時針方向)轉動,第一夾槽611、第二夾槽635a之間隔開,從而可以從金屬線部700解除結合。FIG. 4 d shows a state in which pressure is applied to the
上述第二工作狀態可以在除金屬線部700的移送區間之外的裝載部400或卸載部500的移送區間維持。或者,第二工作狀態可以在鍍金處理前後的移送區間維持。即,夾持部600或基板安裝部200可透過第二工作狀態被移送至金屬線部700前端區間,或者可從金屬線部700的後端脫離。The above-mentioned second operating state may be maintained in the transfer section of the
另一方面,參照上述圖1a等,本實施例的基板移送設備10可包含金屬線部700。On the other hand, referring to the above-mentioned FIG. 1a and the like, the
金屬線部700可被主框架100支撐,可左右移送基板安裝部200。金屬線部700可基本上在基板1的鍍金處理區間用作基板1的移送單元。The
金屬線部700可以由柔性材質的金屬線形成。優選地,金屬線部700可由具有耐蝕性,與基板1等的重量對應地可以維持適當張力的不銹鋼材質的金屬線形成。只是,金屬線部700的材質並不侷限於例示的不銹鋼等,根據情況,可以由與此相同或類似性質的其他材質代替。The
金屬線部700可以沿著長度方向(圖中左右方向)移送。由此,緊固在金屬線部700的基板安裝部200等可沿著金屬線部700移送,在移送過程中,可以進行規定的鍍金處理。The
雖然並未明確示出,但金屬線部700可透過牽引輪等規定的驅動單元向長度方向移送。並且,金屬線部700可形成閉環並沿著長度方向移送,根據需要,可附加用於維持適當張力的張力維持單元等。只是,在本實施例中,金屬線部700的移送路徑或形態等並未受到特殊限制。Although not explicitly shown, the
與以往的方式相比,上述金屬線部700可以減少移動時的脈動,可幫助減少基板1或基板安裝部200之間的間隔。Compared with the conventional method, the above-mentioned
具體地,以往普遍使用的方式為使用鏈條的方式,在此情況下,在鏈條的結構特性上,當進行移動時發生規定的脈動。並且,具有與基板安裝部對應的掛件等僅簡單放置在鏈條上並被移送的結構,因此,在長時間驅動之後,發生掛件的位置發生變形的問題。並且,已知透過其他方式使用帶的方式,但是,由於由氨基甲酸酯材料等製造的帶會被拉長,從而無法在相關技術領域中適當使用。本實施例的基板移送設備10導入使用金屬線部700的新方式的移送結構來解決這種現有問題。Specifically, the system that has been widely used in the past is the system using a chain. In this case, due to the structural characteristics of the chain, a predetermined pulsation occurs when the chain moves. In addition, there is a structure in which the hanger corresponding to the board mounting portion is simply placed on the chain and transferred, so that the position of the hanger is deformed after driving for a long time. In addition, it is known that a belt is used in other ways, but the belt made of urethane material or the like is stretched, so it cannot be properly used in the related technical field. The
以下說明上述基板移送設備10的工作。The operation of the above-mentioned
圖5a為圖1a所示的基板移送設備的第一工作狀態圖。Fig. 5a is a diagram of a first working state of the substrate transfer device shown in Fig. 1a.
為了便利,圖5a等中,以在裝載部400部位中的工作為中心進行說明。卸載部500部位中的工作可以按與此相反的順序相同或類似地進行。For convenience, in Fig. 5a and the like, the description will focus on the operation at the
並且,圖5a等中假設多個基板1-1、1-2連續裝載的情況,以在第一基板1-1先裝載及移送的狀態下,第二基板1-2新裝載的過程為中心進行說明。並且,為了便利,針對與第一基板1-1的移送對應的結構要素,稱為第一基板安裝部200-1等,針對與第二基板1-2的移送對應的結構要素,透過類似的方式稱為第二基板安裝部200-2等。In addition, in FIG. 5a and the like, it is assumed that a plurality of substrates 1-1, 1-2 are continuously loaded, and the process of newly loading the second substrate 1-2 is centered on the state where the first substrate 1-1 is loaded and transferred first. Be explained. Also, for convenience, the structural elements corresponding to the transfer of the first substrate 1-1 are referred to as the first substrate mounting part 200-1, etc., and the structural elements corresponding to the transfer of the second substrate 1-2 are described through similar The mode is referred to as the second substrate mounting part 200-2 or the like.
參照圖5a,在第一基板1-1安裝於第一基板安裝部200-1,並透過金屬線部700移送的過程中,安裝第二基板1-2的第二基板安裝部200-2配置在初始位置。Referring to FIG. 5a, in the process of mounting the first substrate 1-1 on the first substrate mounting part 200-1 and transferring it through the
若第二基板安裝部200-2配置於初始位置,則滑動單元430向對應的位置移動,加壓塊450將會下降。由此,加壓塊450緊固在配置於第二基板安裝部200-2的第二夾持部600-2(即,推輥620)。接著,工作塊460下降來向下方對第二夾持部600-2(即,轉輥632)施加壓力並進行支撐。即,第二夾持部600-2可具有如圖4d所示的第二工作狀態。If the second substrate installation part 200 - 2 is disposed at the initial position, the sliding
如上所述,配置於第一基板安裝部200-1的第一夾持部600-1與連接單元470相接觸。具體地,連接單元470的平板472向第一夾持部600-1的移動路徑上轉動,第一夾持部600-1的一側(即,連接塊612)與平板472相接觸。由此,連接單元470可以與第一夾持部600-1發生干擾,與第一夾持部600-1一起沿著金屬線部700移送。As mentioned above, the first clamping portion 600 - 1 disposed on the first substrate mounting portion 200 - 1 is in contact with the connecting
並且,移動軌道420及第二基板安裝部200-2與上述連接單元470一起沿著一側(圖中左側)牽引。And, the moving
圖5b為圖1a所示的基板移送設備的第二工作狀態圖。Fig. 5b is a diagram of a second working state of the substrate transfer device shown in Fig. 1a.
參照圖5b,若第一基板安裝部200-1移動至已設定的規定位置,則滑動單元430被驅動,使得第二基板安裝部200-2向與第一基板安裝部200-1相鄰的位置移送。其中,第二基板安裝部200-2按已設定的規定間隔與第一基板安裝部200-1隔開,基本上可配置於金屬線部700的前端部位。Referring to FIG. 5b, if the first substrate mounting part 200-1 moves to the set predetermined position, the sliding
接著,在第二基板安裝部200-2中,第二夾持部600-2可透過金屬線部700緊固。具體地,工作塊460上升,使得第二夾持部600-2(即,轉輥632)的限制被解除,透過第二彈性支撐部640-2,第二轉動托架630-2進行轉動。由此,第二夾持部600-2(即,夾具635)也緊固在金屬線部700。即,第二夾持部600-2變換成如圖4c所示的第一工作狀態。並且,加壓塊450也上升,使得第二基板安裝部200-2透過金屬線部700移送。Next, in the second substrate mounting part 200 - 2 , the second clamping part 600 - 2 can be fastened through the
如上所述,連接單元470從第一夾持部600-1脫離。即,連接單元470使平板472向相反方向轉動,與第一夾持部600-1的接觸被解除。由此,第一基板安裝部200-1在沒有與平板472發生干擾的情況下,透過金屬線部700移送。As described above, the
圖5c為圖1a所示的基板移送設備的第三工作狀態圖。Fig. 5c is a diagram of a third working state of the substrate transfer device shown in Fig. 1a.
參照圖5c,接著,滑動單元430復原到如圖5a所示的初始位置,為了新投入的第三基板安裝部200-3而處於待機狀態。滑動單元430透過與上述第二基板安裝部200-2類似的方式緊固在第三基板安裝部200-3,從而可以反復進行上述說明的工作過程。Referring to FIG. 5c, next, the
並且,連接單元470隨著平板472再次轉動,滑動單元430的復原及第二基板安裝部200-2移動,與第二夾持部600-2逐漸接近,並與第二夾持部600-2接觸干擾。由此,與上述類似,連接單元470可以與第二夾持部600-2發生干擾,從而可以沿著金屬線部700移送。And, the connecting
如上所述,本發明實施例的基板移送設備10可以在鍍金區間連續移送沿著垂直方向配置的基板1。As described above, the
尤其,與以往鏈條、帶方式等相比,本發明實施例的基板移送設備10透過基於線的移送方式,在移送過程中,可以減少基板的脈動、晃動等。由此,可以改善基板1的鍍金品質。In particular, compared with the conventional chain and belt methods, the
並且,本發明實施例的基板移送設備10可以在鍍金處理時適當調節基板1之間的間隔,透過線的剛性可以恆定維持最初設定的間隔。由此,可以減少基板1之間的鍍金偏差,並可幫助改善生產性。Moreover, the
以上,說明了本發明的實施例,只要是本發明所屬技術領域中具有通常知識者在不超出發明要求保護範圍所記載的本發明的思想的範圍內可透過結構要素的附加、變更、刪除或追加等對本發明進行多種修改及變形,這些也屬於本發明的發明要求保護範圍內。Above, the embodiments of the present invention have been described, as long as those with ordinary knowledge in the technical field to which the present invention belongs can add, change, delete, or Additions and other modifications and variations are made to the present invention, and these also belong to the protection scope of the present invention.
如下所示: 1:基板 1-1:第一基板 1-2:第二基板 10:基板移送設備 100:主框架 200:基板安裝部 200-1:第一基板安裝部 200-2:第二基板安裝部 200-3:第三基板安裝部 210:軌道安裝托架 211:上部輥 212:下部輥 220:基板安裝框架 221:上部夾持器 222:下部夾持器 300:軌道部 310:前方軌道 320:後方軌道 400:裝載部 410:固定軌道 420:移動軌道 430:滑動單元 440:升降單元 450:加壓塊 451:放置槽 452:傾斜面 460:工作塊 461:水平面 462:垂直面 463:傾斜面 470:連接單元 471:連接托架 472:平板 472a:第一鉸鏈 473:執行器 473a:第二鉸鏈 500:卸載部 600:夾持部 600-1:第一夾持部 600-2:第二夾持部 610:夾持部主體 611:第一夾槽 612:連接塊 613:引導孔 620:推輥 630:轉動托架 631:組裝軸 632:轉輥 632a:輥軸 633:彈簧軸 634:移動軸 635:夾具 635a:第二夾槽 640:彈性支撐部 641:氣缸/彈性支撐氣缸 642:壓簧 700:金屬線部 x、y、z:座標軸 As follows: 1: Substrate 1-1: The first substrate 1-2: Second substrate 10: Substrate transfer equipment 100: main frame 200: Substrate mounting part 200-1: The first substrate installation part 200-2: Second substrate mounting part 200-3: The third substrate installation part 210: Rail mounting bracket 211: upper roller 212: lower roller 220: Substrate mounting frame 221: Upper gripper 222: Lower gripper 300: track department 310: front track 320: rear track 400:Loading department 410: fixed track 420:Move track 430: sliding unit 440: lifting unit 450: pressurized block 451: place slot 452: Inclined surface 460: work block 461: Horizontal plane 462: vertical plane 463: inclined surface 470: connection unit 471: connection bracket 472: tablet 472a: first hinge 473:Actuator 473a: Second hinge 500: unloading department 600: clamping part 600-1: The first clamping part 600-2: Second clamping part 610: clamping part main body 611: The first clamping groove 612: Connection block 613: guide hole 620: push roller 630: rotating bracket 631: Assembly shaft 632: Roller 632a: roller shaft 633: spring shaft 634: Move axis 635: fixture 635a: the second clip groove 640: elastic support part 641: cylinder / elastic support cylinder 642: Compression spring 700: Metal wire department x, y, z: coordinate axes
如下所示: 圖1a為本發明一實施例的基板移送設備的主要部分立體圖。 圖1b為圖1a所示的基板移送設備的主視圖。 圖1c為圖1a所示的基板移送設備的側視圖。 圖1d為圖1a所示的基板移送設備的俯視圖。 圖2a為圖1a所示的裝載部的放大立體圖。 圖2b為圖2a所示的裝載部的主視圖。 圖2c為圖2a所示的滑動單元的底部面立體圖。 圖3a為圖1a所示的基板安裝部的放大立體圖。 圖3b為圖3a所示的基板安裝部的主視圖。 圖4a為圖1a所示的夾持部的放大立體圖。 圖4b為圖4a所示的夾持部的側視圖。 圖4c為圖4a所示的夾持部的第一工作狀態圖。 圖4d為圖4a所示的夾持部的第二工作狀態圖。 圖5a為圖1a所示的基板移送設備的第一工作狀態圖。 圖5b為圖1a所示的基板移送設備的第二工作狀態圖。 圖5c為圖1a所示的基板移送設備的第三工作狀態圖。 As follows: Fig. 1a is a perspective view of main parts of a substrate transfer device according to an embodiment of the present invention. Fig. 1b is a front view of the substrate transfer device shown in Fig. 1a. Fig. 1c is a side view of the substrate transfer apparatus shown in Fig. 1a. Fig. 1d is a top view of the substrate transfer device shown in Fig. 1a. Fig. 2a is an enlarged perspective view of the loading part shown in Fig. 1a. Fig. 2b is a front view of the loading part shown in Fig. 2a. Fig. 2c is a bottom perspective view of the sliding unit shown in Fig. 2a. Fig. 3a is an enlarged perspective view of the substrate mounting part shown in Fig. 1a. Fig. 3b is a front view of the board mounting part shown in Fig. 3a. Fig. 4a is an enlarged perspective view of the clamping portion shown in Fig. 1a. Fig. 4b is a side view of the clamping portion shown in Fig. 4a. Fig. 4c is a diagram of the first working state of the clamping part shown in Fig. 4a. Fig. 4d is a diagram of the second working state of the clamping part shown in Fig. 4a. Fig. 5a is a diagram of a first working state of the substrate transfer device shown in Fig. 1a. Fig. 5b is a diagram of a second working state of the substrate transfer device shown in Fig. 1a. Fig. 5c is a diagram of a third working state of the substrate transfer device shown in Fig. 1a.
無。none.
1:基板 1: Substrate
10:基板移送設備 10: Substrate transfer equipment
100:主框架 100: main frame
200:基板安裝部 200: Substrate mounting part
300:軌道部 300: track department
310:前方軌道 310: front track
320:後方軌道 320: rear track
400:裝載部 400:Loading department
500:卸載部 500: unloading department
600:夾持部 600: clamping part
700:金屬線部 700: Metal wire department
x、y、z:座標軸 x, y, z: coordinate axes
Claims (9)
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KR (1) | KR102248854B1 (en) |
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KR102595459B1 (en) | 2022-01-12 | 2023-10-31 | 엔티피 주식회사 | apparatus for transferring circuit board and manufacturing device of circuit board using the same |
KR102380767B1 (en) * | 2022-01-12 | 2022-04-01 | (주)네오피엠씨 | Hanger moving apparatus for plating |
KR102619013B1 (en) * | 2023-08-11 | 2023-12-27 | 차태웅 | One-Touch Clamp for Plating Devices |
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